Electrostatic chuck with improved spacing and charge migration reduction mask

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Information

Patent Grant
D420022

References
Source

Patent Number
D420,022
Date Filed
Wednesday, December 24, 1997
27 years ago
Date Issued
Tuesday, February 1, 2000
25 years ago

Inventors
Original Assignees
- Applied Materials, Inc.
Examiners
- Davis; Antoine Duval
Agents
- Thomason & Moser

US Classifications
- D15 - Machines not elsewhere specified
Field of Search
- US
- D15 140
- 361 234
- 361 235
- 279 128
- 269 8
- 269 903
International Classifications
- 1509
- Term of Grant
  14Years

Information

Abstract

Description

Claims

The ornamental design for an electrostatic chuck with improved spacing and charge migration reduction mask, as shown and described.

US Referenced Citations (1)

Number	Name	Date	Kind
5528451	Su	Jun 1996

Continuation in Parts (1)

	Number	Date	Country
Parent	639841	May 1996