Electrostatic particle collector

Abstract

ESP particle collector (1) for collecting particles in a particle containing gas stream, comprising an inlet section (4), a collector section (6), and an electrode arrangement (8), the inlet section comprising a flow tube (10) defining a gas flow channel (12) therein bounded by a guide wall (24) extending between an entry end (14) and a collector end (16) that serves as an inlet to the collector section (6), the entry end comprising an inlet (28) for the particle gas stream and a sheath flow inlet portion (26) for generating a sheath flow around the particle gas stream, the collector section comprising a housing (18) coupled to the flow tube, and a collector plate (20) mounted therein having a particle collection surface (23). The ESP particle collector is configured to allow optical analysis of the collector plate particle collection surface to measure particles collected thereon. The electrode arrangement comprises at least a base electrode (8a) positioned below the collection surface and a counter-base electrode (8b) positioned at a separation distance L2 above the collection surface such that an electrical field is generated between the electrodes configured to precipitate said particles on the collection surface, wherein the electric field is in a range of 0.1 kV per mm to 1.5 kV per mm, with an absolute voltage on any said electrode that is less than 10 kV, and wherein a ratio ratio I of a radius LI of said inlet at the collector end divided by said separation distance L2 is in a range of 0.8 to 1.2.

Description

This application is the U.S. national phase of International Application No. PCT/EP2021/084610 filed Dec. 7, 2022. which designated the U.S. and claims priority to EP patent application No. 20213247.8 filed Dec. 10, 2020, the entire contents of each of which are hereby incorporated by reference.

FIELD OF THE INVENTION

This invention relates to an electrostatic particle collector, for collecting particles carried in a gas, for instance airborne particles. The invention relates in particular to a particle collector for obtaining samples of particles carried in a gaseous environment, for instance for measuring or characterizing particles that may represent contaminants, pollen, pollutants and other substances in air or in other gaseous environments.

BACKGROUND OF THE INVENTION

Various particle collectors using electrostatic charges to collect particles are known. These devices are known as electrostatic precipitators (ESP) which may either have a general inlet gas flow that is substantially parallel to the electrostatic collection surface (linear ESP), or generally orthogonal to the collection surface (radial ESP) whereby the gas flows radially outwards as it impinges against the collection surface.

One of the drawbacks of linear ESP systems is the generally lower collection efficiency and higher particle size dependency compared to radial ESP systems. All conventional ESP's however suffer from one or more drawbacks including: low spatial uniformity in deposition pattern; high size dependency in deposition pattern such that particles in different size are not uniformly distributed; poor collection efficiency in that the yield of particles collected is low compared to the particles in the gas stream; low collection mass flux leading to slow particle accumulation; and high chemical interference whereby reactive molecules such as ozone, NOx and others are produced from the high electric field strength of the ESP electrodes due to corona discharge.

In particle sampling applications, it is important not to generate reactive gases that could modify the properties of collected particles (described herein as chemical interference). For the sampling of various particle containing gases, for instance with spectroscopic measurement devices, it is advantageous to have a uniform spatial distribution with low size dependence such that the observation of the collection area is representative of the particles contained in the sampled gas. In order to perform sampling rapidly with high accuracy, it is also advantageous to have a high particle collection efficiency over a short duration.

Sampling applications may include sample collections for spectroscopy and spectrometry or other types of chemical analyses for studies in air quality, atmospheric science, or industries that involve generation of particles such as in manufacturing industries, construction and e-cigarettes where customer safety is a consideration. The aforementioned advantageous properties of ESP's would also be useful in seeding applications for subsequent epitaxial film growth of crystals that can prove useful in membrane technology and nanocrystal technology. Further applications that use particle collection with ESP systems may include biological samples needed for optical analysis or other in vitro studies. ESP particle collection may also be used in certain coating applications.

An orthogonal electrostatic particle collection device comprising sheath flow is known from U.S. Pat. No. 8,044,350B2, however the particles precipitated on the electrode in the disc precipitator portion are not observed, rather it is the particles that pass through the precipitator that are counted. The particle size distribution may be obtained by stepping the precipitation voltage through the entire voltage range and measuring the electrical charges associated with penetrating particles. The purpose of the precipitator is thus to act as a cut-off “filter” that retains particles above a certain size and allow particles below said threshold to pass through, such cut-off threshold being dependent inter alia on the voltage applied across the electrodes which can be varied in order to perform a full analysis of the particles in the gas flow. In such a classification system, the distribution of particles on the electrode in the disc precipitator is unimportant and the problem of having a uniform distribution which is not particle size dependent is not considered.

SUMMARY OF THE INVENTION

In view of the foregoing, an object of the invention is to provide an electrostatic particle collector apparatus for optical analysis of the collected particles that has a high spatial uniformity in the deposition pattern with low size dependence of the particles and low chemical interference.

It is advantageous to provide a particle collector that has a high collection efficiency.

It is advantageous to provide a particle collector that has a high collection mass flux enabling rapid particle accumulation for a given period of time.

It is advantageous to provide a particle collector that is economical to manufacture and operate.

It is advantageous to provide a particle collector that is compact.

It is advantageous to provide a particle collector that is easy to operate and maintain.

Objects of this invention have been achieved by providing a particle collector according to claim 1.

Disclosed herein is an ESP particle collector for collecting particles in a particle containing gas stream, comprising an inlet section, a collector section, and an electrode arrangement. The inlet section comprises a flow tube defining a gas flow channel therein bounded by a guide wall extending between an entry end and a collector end that serves as an inlet to the collector section. The entry end comprises an inlet for the particle gas stream and a sheath flow inlet portion for generating a sheath flow around the particle gas stream. The collector section comprises a housing coupled to the flow tube, and a collector plate mounted therein having a particle collection surface. The ESP particle collector is configured to allow optical analysis of the collector plate particle collection surface to measure particles collected thereon. The electrode arrangement comprises at least a base electrode positioned below the collection surface and a counter-base electrode positioned at a separation distance L2 above the collection surface such that an electrical field is generated between the electrodes configured to precipitate said particles on the collection surface, wherein the electric field is in a range of 0.1 kV per mm to 1.5 kV per mm, with an absolute voltage on any said electrode that is less than 10 kV, and wherein a ratio ratio_1 of a radius L1 of said inlet at the collector end divided by said separation distance L2 is in a range of 0.8 to 1.2.

In an advantageous embodiment, the collector plate is mounted on a collector plate holder (removably mounted in the housing to allow the collector plate to be optically analysed by an external instrument for measurement of particles collected thereon.

In an advantageous embodiment, the ESP particle collector further comprises a particle measurement instrument arranged in the housing above or below the particle collection surface to measure the particles collected on the particle collection surface.

In an advantageous embodiment, a ratio_2 (L1/L4) of the radius L1 of said inlet divided by a radius L4 of the base electrode is less than 1.

In an advantageous embodiment, said ratio_2 (L1/L4) is less than 0.7, for instance 0.5 or lower.

In an advantageous embodiment, a ratio lim_s (Ls/L1) of an inner radius Ls of the said sheath flow relative to the inlet radius L1 is less than 0.6.

In an advantageous embodiment, said ratio lim_s (Ls/L1) is in a range of 0.2 to 0.5.

In an advantageous embodiment, a ratio ratio_3 of the radius L1 of said inlet divided by a radius L3 of the collector plate (L1/L3) is in a range of 0.05 to 20.

In an advantageous embodiment, said ratio ratio_3 (L1/L3) is in a range of 0.1 to 5.

In an advantageous embodiment, the electrode arrangement further comprises a tube electrode around the collector end forming the inlet to the collector section.

In an advantageous embodiment, the sheath flow inlet portion comprises a sheath flow gas inlet, a gas chamber and an annular sheath flow gas outlet surrounding the centre of the flow channel and configured to generate an annular sheath flow along the guide wall of the flow channel surrounding the particle gas stream.

In an advantageous embodiment, the ESP particle collector further comprises a particle charger arranged upstream of the inlet section configured to electrically charge the particles of the gas stream entering the inlet section.

In an advantageous embodiment, the particle charger is configured to impart a charge on the particles contained in the gas stream in a range of about 1 elementary charge per 10 nm (1 nm=10⁻⁹ m) to about 1 elementary charge per 50 nm diameter of a particle.

In an advantageous embodiment, the particle charger is configured to impart a charge on the particles contained in the gas stream in a range of about 1 elementary charge per 10 nm diameter to about 1 elementary charge per 30 nm diameter of a particle.

In an advantageous embodiment, the collector plate is made of a transparent conductive or semi-conductor material.

Further objects and advantageous aspects of the invention will be apparent from the claims, and from the following detailed description and accompanying figures.

BRIEF DESCRIPTION OF THE DRAWINGS

The invention will now be described with reference to the accompanying drawings, which by way of example illustrate embodiments of the present invention and in which:

FIG. 1 is a cross-sectional schematic simplified view of a particle collector according to an embodiment of the invention;

FIG. 2 is a view similar to FIG. 1 of another embodiment of the invention;

FIG. 3 is a view similar to FIGS. 1 and 2 of yet another embodiment of the invention;

FIG. 4a is a perspective view of a particle collector according to embodiment of the invention;

FIG. 4b is a cross-sectional view of the particle collector of FIG. 4a;

FIG. 4c is a detail view of an inlet portion of the particle collector of FIG. 4a;

FIG. 4d is a perspective exploded view of the particle collector of FIG. 4a;

FIG. 4e is a cross-sectional view of the particle collector of FIG. 4d;

FIG. 5a illustrates: (a) schematically dimensions and gas axial velocity flow profiles of a particle collector according to an embodiment such as illustrated in FIG. 1; and (b) a simulated graphical distribution of particles and an electric field of the particle collector represented in (a);

FIGS. 5b and 5c are similar to FIG. 5a however for different dimensions and ratios;

FIG. 6 is a schematic representation of inlet flow profiles;

FIGS. 7a, 7b are similar to FIG. 5a illustrating the effect of the sheath position on the collection performance and spatial uniformity of deposition, FIG. 7a illustrating the case for no sheath and FIG. 7b with a sheath having in radius of 50% of the channel radius;

FIGS. 8a, 8b are similar to FIGS. 7a, 7b illustrating the effect of changing the ratio of the inlet parameter versus the separation distance between the counter-base electrode and the collector plate;

FIG. 8a illustrates a ratio 1 and FIG. 8b a ratio of 4;

FIGS. 9a, 9b illustrate plots of the electrical field strength over the collector plate, in particular FIG. 9a illustrating an average electric field strength (normalized by maximum) over the collector plate and FIG. 9b illustrating a variation of the electric field strength (normalized by maximum) over the collector plate both for different ratio_1 and ratio_3 values, ratio_1 defined by the radius of the inlet of the collection section over a separation distance between the collector plate and counter-base electrode, and ratio_3 being defined by the radius of the inlet of the collection section over a radius of the collector plate;

FIG. 10 illustrates a plot of the effect of ratio_2 defined by a ratio between the inlet tube radius at the collector end over a radius of the collector plate including the collector disc and filler, whereby in the FIG. 10 the ratio_1 has a value of two;

FIG. 11 illustrates an example of flow limits for a collector disc radius R3=12.7 mm, and an electric field strength of 1 kV/mm; (i) Each subplot (for different x_geo=lim_s×ratio₃) shows the final deposition position (color-bar) for different sizes (y-axis) and flow rates (x-axis). The vertical dotted line represents the minimum flow rate where the size-dependence is low. (ii) A diagram similar to that in part (i) with overlaid plot that shows the change in variation (red line) with the flow rate and point where this variation is low. (iii) Change in flow rate (left y-axis) as a function of x_geo=lim_s×ratio₃. The final deposition area can be smaller or larger than the collector plate radius and this normalized collection spot area is shown on the right y-axis. By dividing the flow rate with its spot area we get the flux representation (dotted horizontal line).

FIG. 12 illustrates an example of a collection efficiency (dotted line) at the analyzed operation flow rate such that we are close to increase collection volume flux (product of particle flow rate and the efficiency) for different collector plate and sheath conditions: (i) Collector plate radius (L3)=12.7 mm and sheath position (lim_s=0.2). (ii) Collector plate radius (L3)=12.7 mm and sheath position (lim_s=0.4). (iii) Collector plate radius (L3)=127 mm (i.e. 10 times) and sheath position (lim_s=0.4).

FIG. 13 illustrates an example of (i) average collection volume flux vs. the collector plate radius (each value at a collector plate radius is obtained by averaging the values for different lim_s×ratio₃ values (dotted line in FIG. 11(iii)). (ii) The average collection volume flux vs. sheath starting position for a fixed collector plate radius L3=12.7 mm (each value at a sheath position is obtained by averaging the values for different lim_s×ratio₃ values).

FIG. 14 illustrates plots of an example of an extent of the particle focusing (drift) towards the center line because of tube electrode based on different ratio₃ and lim_s values (i) Extent of drift (expressed as percentage) (ii) Size-based variation (expressed as normalized median absolute deviation) in the final position after drift only i.e. does not include particle collection change.

FIG. 15 illustrates plots of an example if the operating aerosol flow rate is derived from the maximum operating volume flux φ_max then the upper and lower limits on collector plate radius (y-axis) over which the analytical model would be valid for different ratio₃ values (x-axis) for different sheath positions: (a) lim_s=0.1 (b) lim_s=0.2 (c) lim_s=0.4 (d) lim_s=1.

DETAILED DESCRIPTION OF EMBODIMENTS OF THE INVENTION

Referring to the figures, an ESP particle collector 1 according to embodiments of the invention comprises an inlet section 4, a collector section 6, and an electrode arrangement 8. The particle collector may further comprise a particle charger 2 arranged upstream of the inlet section 4 configured to electrically charge the particles of the gas stream entering the inlet section 4.

The particle charger is configured to impart a small charge on the particles contained in the gas stream to be sampled preferably in a range of about 1 elementary charge per 10 nm (1 nm=10⁻⁹ m) to about 1 elementary charge per 50 nm diameter of a particle. Preferably the charge is in a range of 1 elementary charge per 10 nm diameter to about one elementary charge per 40 nm diameter for instance around 1 elementary charge per 20 nm diameter. The relatively small charge allows the particles to be charged with a low generation of reactive species such as ions and radicals such as ozone, in order to ensure low chemical interference on the particles contained in the gas stream. Various per se known particle chargers may be used, such known chargers using field charging, diffusion charging, or ultraviolet charging, provided that they have a low reactive species generation on the particles in the gas stream.

An example of a charger that may be used for the invention is for instance described in Han [5] which describes a wire-wire charger with a low ozone production.

The charging of the particle stream, although optional in embodiments of the invention, advantageously assists in improving uniforms spatial distribution of particles on the collector plate.

The inlet section 4 comprises a flow tube 10 defining a gas flow channel 12 therein bounded by a guide wall 24 that is preferably of a generally axisymmetric shape. The flow tube that may be generally cylindrical as illustrated in embodiment of FIG. 1 or may have other axisymmetric shapes for instance as illustrated in FIGS. 2 and 3. The flow tube may however also have non-axisymmetric cross-sectional profiles such as polygonal (square, pentagon, hexagon or other polygons).

The flow tube 10 extends between an entry end 14 and a collector end 16 that serves as an inlet to the collector section 6.

The entry end 14 comprises an inlet 28 for the particle gas stream and a sheath flow inlet portion 26 for generating a sheath flow around the particle gas stream. By the term “particle gas stream” it is meant the gas stream containing the particles to be collected in the collector section 6.

The sheath flow inlet portion 26 comprises a sheath flow gas inlet 27, a gas chamber 29 and a sheath flow gas outlet 31 surrounding the centre of the flow channel 12 and configured to generate and annular sheath flow along the wall 24 of the flow channel 12 surrounding the particle gas flow. The chamber 29 serves to contain a volume of gas with a low or essentially no pressure gradient within the chamber with respect to the sheath gas inlet, such that the radial nozzle defining the sheath flow outlet 31 generates an even circumferential sheath flow.

The flow rates of the sheath flow and particle gas flow may be calibrated such that the two gas streams have laminar flow properties and the boundary layer between the sheath flow stream and particle gas stream remains laminar substantially without mixing. The gas flow streams are configured such that the Reynolds number is below 2200, preferably below 500, for instance around 200.

The flow tube 10 has an overall length D that is configured to ensure that the velocity of the sheath gas stream and particle gas stream at the interface therebetween accelerates such that the velocity profile of the gas stream within the flow channel collector end is a substantially continuous single rounded profile with a substantially flatter profile compared to the gas stream as the entry end. In effect, at the sheath flow outlet, the laminar flow profile is substantially parabolic and joins the particle gas stream at the boundary interface with a velocity close to zero that accelerates as the gas stream flows away from the sheath flow outlet.

The sheath flow separating the particle gas flow from the guide wall 24 reduces or avoids deposition of particles on the guide wall 24 and has further advantages in improving spatial uniformity of the particle deposition in the collector section 6, reducing also chemical interference, reducing size dependence in the collection and improving collection efficiency. This is not only because it reduces the gradient in axial velocity of the particle gas stream that flows on to the collector plate, but also due to the separation of the gas stream from the flow channel walls, it reduces interference of the charge particles with the flow channels walls.

The collector section 6 comprises a housing 18 coupled to the flow tube 10, and a collector plate 20 mounted therein on a collector plate holder 22.

In an embodiment, the inlet section 4 may be coupled removably to the collector section 6 for instance by means of an assembly ring 33. In an embodiment, the collection section 6 comprises a removable cap 35 allowing access to a chamber inside the housing 18 for insertion and removal of the collector plate 20.

The collector plate may for instance comprise a transparent disc, for instance made of a crystal such as a Silicon, Zinc Selenide, or Germanium crystal, that may be used for optical analysis, for instance infrared spectroscopy. In such applications, the collector disc may be removably mounted within the housing for placement in observation of a spectroscopic instrument for analysing the particles deposited on the collector plate 20. In other applications it would however be possible to integrate this spectroscopic optical instrument or other measuring instruments within the housing 18 of the particle collector for automated measurement of the particles collected on the collector plate. The collector plate 20 may comprise a filler material 21 arranged around the collector plate 20. The gas stream flow over the collector plate is thus defined not only by the collector end 16 of the flow tube 10 but also the radius of the collector plate 20 and the filler material 21 therearound.

The electrode arrangement 8 comprises at least a base electrode 8a positioned adjacent or on an underside 25 of the collector plate 20, below the collection surface 23 where particles are deposited. The electrode arrangement 8 further comprises a counter-base electrode 8b positioned at a certain separation distance L2 above the collector plate 20 and which may be arranged substantially parallel to the base electrode 8a such that an electrical field is generated between the electrodes 8a, 8b.

In embodiments, the electrode arrangement may optionally further comprise a tube electrode 8c around the collector end 16 forming the inlet to the collector section 6. The tube electrode 8c may be at the same voltage as the counter-base electrode 8b or at a different voltage therefrom separated by an insulating element from the counter-base electrode 8b.

It may be noted that the various electrodes may be at a certain voltage with respect to ground or one of the electrodes may be connected to ground and the other at a potential different from ground.

The inlet channel at the collector end has a radius defined as L1. The collector plate has a radius defined as L3. The base electrode has a radius defined as L4. The distance between the counter-base electrode 8a and the collector plate 20 has a separation distance defined as L2.

At least two ratios, namely

• • the ratio L1/L2 between the inlet channel collector end radius L1 and counter-base electrode to collector plate separation distance L2 named hereinafter for convention as ratio_1, and
  • the ratio L1/L3 between the inlet channel and radius L1 and the collection plate radius L3 named hereinafter by convention ratio_3are within certain ranges that according to an aspect of the invention allow to provide a high spatial uniformity and low size dependence, as well as a high collection efficiency of particles to be sampled on the collector plate 20.

An optimal ratio_1 (L1/L2) affects the variation in the electric field under the inlet tube which may be optimized to improve spatial uniformity and collection efficiency.

A lower bound value for an optimal ratio_3 may be constrained by any value where impaction affects the final deposition pattern, however collection mass flux is generally higher if this ratio is more than 1. An upper bound value may be constrained by a fixed limit on operating voltage (and maximum electric field strength) and on ratio₁ above, for example by,

${\mathrm{ratio}}_3\le \frac{V_{\max }}{E_{\max }}\times \frac{{\mathrm{ratio}}_1}{\mathrm{collection}\mathrm{disc}\mathrm{radius}}$ The upper bound value may also be constrained by a desired efficiency, for example by,

${\mathrm{ratio}}_3\le \frac{1}{\mathrm{efficiency}\times \mathrm{radial}\mathrm{sheath}\mathrm{position}\mathrm{lim\_s}}.$

Advantageously, another ratio L1/L4 of interest for high spatial uniformity and low chemical interference is a ratio between the radius L1 of the inlet channel collector end and the base electrode radius L4, named hereinafter by convention as ratio_2. The ratio_2 controls the electric field concentration effects on the collector plate's edges. An optimal ratio_2 may thus serve to improve spatial uniformity and lowers the electric field strengths in some regions, in particular to lower the variation in electric field strength under the inlet tube.

According to an aspect of the invention, the ratio_1 (L1 divided by L2) is in a range of 0.3 to 1.8, preferably in a range of 0.8 to 1.2.

According to an aspect of the invention, the ratio_2 (L1/L4) is less than 1, preferably less than 0.7, for instance 0.5 or lower.

According to an aspect of the invention, the ratio_3 (L1 divided by L3) is preferably in a range of 0.05 to 20, preferably in a range of 0.1 to 5.

The electric field generated between the base electrode 8a and counter-base electrode 8b is preferably in a range of 0.1 kV per mm to 3 kV per mm, preferably from 0.5 kV per mm to 1.5 kV per mm for instance around 1 kV per mm, with an absolute voltage on any electrode that is less than 10 kV, to reduce chemical interference while ensuring high collection efficiency.

The inner radius Ls of the sheath flow relative to outer radius L1 of the sheath flow at the collector end 16 forming the inlet to the collector section 6, is defined herein as ratio hill s (Ls/L1). Ratio hill s is in a range of 0.1 to 0.9, preferably in a range of 0.1 to 0.6, for instance around 0.4, to ensure a sheath flow layer sufficient to provide a good separation between the gas particle stream and the flow channel wall 24 as well as ensuring that the particle gas stream impinging upon the collector plate 20 allows optimal uniform spatial distribution of the particles on the collector plate.

The above mentioned ratios are important in achieving the following advantages of embodiments of the invention:

Advantage          Features
Spatially uniform  Sheath flow: the method of introducing sheath flow described herein results
deposition pattern in high spatial uniformity in the deposition pattern.
                   Defining the geometric length ratios greatly reduces effect of impaction with
                   larger inlet tube radius size.
                   The absence of electrodes/sheets in the inlet flow tube avoids disturbance in
                   the gas flow stream.
Low size-          Defining the geometric length ratios: mainly, increasing the inlet tube radius
dependence         L1 relative to collection plate radius L3 will lower particle size dependence.
                   However, this could generally mean a loss of collection efficiency. Hence,
                   the value is limited in the range where the collected mass flux is higher on
                   the collection plate.
                   Sheath flow: This is an artificial method of tuning this ratio described above,
                   as even for a larger tube, a sheath flow limits the incoming particles to a
                   certain radial distance.
Low Chemical       Defining the geometric length ratios: Define separation distance L2 required
interference       to maintain a low electric field strength, and keep deposited particles further
                   away from high-voltage counter-base electrode 8b. Moreover, increasing the
                   ratio of inlet radius L1 to the base electrode 8a radius L4 is useful for
                   reducing local electric field strengths.
                   Sheath flow: This keeps particle laden air streams farther away from the
                   high-voltage counter-base electrode 8b in the collection region.
High collection    Focusing particles to the center using a) tube electrode 8c and b) sheath flow
efficiency
High collection    Defining the geometric length ratios: mainly, increasing the inlet tube radius
mass flux          L1 to collection plate radius L3 will increase the flow rate that one can
                   achieve for keeping the same lower size-dependence, but the efficiency will
                   go down.
                   Note:
                   Constraints exist on this ratio because of the constraints on
                   the ratio of the inlet tube radius L1 to the separation distance L2.
                   Sheath flow: depending on the axial velocity profile, this increases the
                   operable flow rate limit for a similar size-dependence performance.
                   Moreover, the increase in collection efficiency also directly effects the
                   collection mass flux.

Embodiments of the invention may advantageously be used in various applications, including:

• • Aerosol sample collection for spectroscopy and spectrometry—or other types of chemical analyses—for studies in air quality, atmospheric science, or industries that involve particle generation (e.g., fabrication and manufacturing, construction, e-cigarettes) where worker or customer safety is a consideration.
  • Seeding applications for subsequent epitaxial film growth of bulk/film crystals can prove useful in membrane technology and nanocrystal technology.
  • Health studies where collection of biological sample is needed for subsequent optical analysis or other in-vitro/in-vivo studies.
  • Coating applications.

An unexpected finding by the inventors of the present invention is that the particle velocity distribution at the plane of deposition (just before collection on the collector plate 20) is not a direct representation of the final distribution of deposited particles. This finding contradicts conventional thinking such as found in the work of Dixkens and Fissans [1] and Preger et al. [2], but is an important consideration predicting and therefore optimizing particle deposition patterns.

Examples of Implementation

Use Case: “Aerosol Sampling Device for Quantitative Spectroscopic Analysis”

It is important to characterize the composition of aerosol particles in air, which causes adverse health effects and millions of deaths each year. Aerosol, or particulate matter (PM), is difficult to characterize because of its wide range of particle sizes (few nanometers to several micrometers); constituents (various organic and inorganic compounds); concentration (one to hundreds of μg/m³, for PM<2.5 μm); morphology; state (liquid or solid); and time-dependent modification.

An ideal collector would enable collecting an aerosol sample that is an identical copy of the aerosol in air at an instant of time. Such a collector, when used with an ideal characterization method, will allow an ideal quantitative measurement of the composition of the aerosol. However, most conventional particle collectors modify or preferentially sample certain size ranges, chemical composition, morphology or state. Furthermore, collected sample is characterized for the constituents and/or their composition using numerous spectrometric techniques, which can induce further modifications. For example, most spectroscopic techniques require collecting aerosol on a surface for a prolonged period to make a confident claim about its constituents' composition.

Infrared (IR) spectroscopy is a non-destructive method, which provides useful chemical information about the constituents. Current methods for collecting samples use filters that are made of material which interferes with the IR spectra and thus lowers detection capabilities. Hence, collection on an IR-transparent substrate (for example, chalcogenide crystals) is desirable. A particle collector according to embodiments of the invention that achieves the advantages mentioned above allows to make a good quantitative measurement using IR-spectroscopy. Specifically, “Low size-dependence”, “Low chemical interference” and “High collection efficiency” is required to collect an aerosol sample that is identical to the aerosol in air, “High spatial uniformity in deposition pattern” is required to reduce optical artefacts or spectrometer dependence, and “High collection mass flux” is required to reduce the collection time needed for making a confident claim.

Electrostatic precipitation (ESP) is a versatile method of collection and does not suffer from high pressure drop (which can modify the aerosol chemical composition, for example in filtration), or from bounce-off effects (which preferentially samples the size range and liquids, for example in impaction). ESP is a common device for dust removal but is also used for particle deposition.

Example 1: Referring to the exemplary embodiment illustrated schematically in FIG. 5a, the plot in 5a (ii), which is aligned along the vertical axis (z) with the particle collector schematically shown in FIG. 5a (i), shows results from particle deposition simulations done using a simulation program (COMSOL Multiphysics). The difference between the outer radius of deposition of various sizes is low and the spatial deposition is close to the ideal profile. In this example the collector plate radius is L3=12.7 mm.

Inlet and operating conditions:

• • 1. Inlet flow condition—Sheath flow: Sheath flow is used starting from a radial position that is lim_s=⅓, i.e the radial position of commencement of sheath, Ls is ⅓^rd that of the inlet tube radius (L1) at the collector end. However, if needed, the sheath limit can be varied while it is lower than 0.5. This is important for the spatial uniformity of the final deposition.
  • 2. Inlet charge condition—Particles are pre-charged before entering the collector section. The charging is selected to be at a level such that different sized particles are charged to a level corresponding to about 1 elementary charge for every 20 nm particle diameter.
  • 3. Operating condition—electric field strength and voltage: The voltage was fixed at 10 kV on the counter-base electrode, while the base electrode is grounded. This leads to an electric field strength of 1 kV/mm. However, if needed, the voltage on the counter-base electrode can be varied while the electric field is lower than the breakdown strength in air (around 3 kV/mm), and while the absolute voltage on any electrode is lower than 10 kV, preferably.
  • 4. Operating condition—flow rate: For the given collector disc size (L3=12.7 mm), given electric field strength of 1 kV/mm and the given charge condition of 1 elementary charge every 20 nm particle diameter, the flow rate is tuned such that the maximum deposition flux is obtained. This happens around 2 LPM (liters per minute) of aerosol (particle) flow. With the given sheath flow limit, lim_s=⅓, this aerosol flow rate corresponds with a sheath flow rate of 7.5 LPM. If the sheath flow limit is changed to lim_s=0.5 as shown in FIG. 5c, then the only change for operating condition would be to change the sheath flow to 4.6 LPM. If there is any change in the electric field strength, the degree of charge and the area of collection, the aerosol flow rate can be changed in direct proportion to either of those changes, in order to keep operating at the maximum deposition flux limit.

Example 2: This example shown in FIG. 5b, has the same collection plate radius and differs from Example 1 above mainly in the ratio₃ value L1/L3.

Inlet and operating conditions:

• • 1. Inlet flow condition—Sheath flow: Sheath flow limit is lim_s=½, instead of the ⅓ in the previous example 1.
  • 2. Inlet charge condition—Same as Example 1, at 1 elementary charge for every 20 nm particle diameter.
  • 3. Operating condition—electric field strength and voltage: The electric field strength was the same as that in Example 1, at 1 kV/mm. As ratio₃ is halved, the operating voltage in order to keep the same electric field strength was also halved, thus, 5 kV was applied on the counter-base electrode, while the base electrode is grounded.
  • 4. Operating condition—flow rate: Same aerosol flow as Example 1, as the electric field strength, charge condition and the collector plate radius L3 is the same. Thus, 2 LPM of aerosol flow. However, With the given sheath flow limit, lim_s=½, this aerosol flow rate corresponds with a sheath flow rate of 4.6 LPM. If the device in Example 1 is operated with a sheath limit of lim_s=½ as well, then the sheath flow would have been kept the same at 4.6 LPM.Equations of Radial ESP Systems Affecting Operating Conditions

Referring to FIG. 6, the basic equation for the radial ESP system is:

$\frac{r_f}{R_c}=\frac{r_0}{R}\left(\frac{R}{R_c}\right)\sqrt{1+\frac{v_{\mathrm{in}}}{v_{\mathrm{elec}}}{\left(\frac{r_0}{R}\right)}^{-1}{\stackrel{\_}{f}}_v\left(r_0\right)}\Rightarrow \frac{r_f}{R_c}=\sqrt{{\left(\frac{r_0}{R}\frac{R}{R_c}\right)}^2+3\left(\frac{Q\mu }{e{E}_0{R}_c}\right)\left(\frac{D_p}{n{C}_c{R}_c}\right)\left(\frac{r_0}{R}\right)\overline{f_{\nu }}\left(r_0\right)}$

• • where, Q=Total flow rate (aerosol flow rate+sheath flow rate),
  • E₀=Electrostatic field strength,
  • D_p=Particle diameter,
  • C_c=Drag correction factor,
  • R_c=Collection plate radius (L3),
    • R=Inlet tube radius (L2),
  • e=charge on an electron,
  • n=no. of elementary charges on the particle of size D_p, and
  • μ=dynamic viscosity of air.

The equation is different for the two representative theoretical inlet flow profiles illustrated in FIG. 6: a) plug-flow and b) parabolic flow, based on the different expression of f_v(r₀) and Q for both the cases. For the limiting case of

$\frac{r_0}{R}=\frac{r_{0,\max }}{R}={\lim }_s$ the final position for the outermost particle for both the equations become:

r                                                  f                          ,                          max                                                                                            R                        c                                                              =                                                                                                                        (                                                                                                                            r                                                                      0                                    ,                                    max                                                                                                  R                                                            ⁢                                                              R                                                                  R                                  c                                                                                                                      )                                                    2                                                +                                                  3                          ⁢                                                      (                                                                                                                            Q                                  a                                                                ⁢                                μ                                                                                                                              eE                                  0                                                                ⁢                                                                  R                                  c                                                                                                                      )                                                    ⁢                                                      (                                                                                          D                                p                                                                                            n                                ⁢                                                                  C                                  c                                                                ⁢                                                                  R                                  c                                                                                                                      )                                                    ⁢                                                      (                                                                                                                                                                                                                                              r                                                                                  0                                          ,                                          max                                                                                                                    /                                      R                                                                        )                                                                    2                                                                [                                                                  2                                  -                                                                                                            (                                                                                                                        r                                                                                      0                                            ,                                            max                                                                                                                          /                                        R                                                                            )                                                                        2                                                                                                                                                                                                                                    (                                                                          lim                                      s                                                                        )                                                                    2                                                                [                                                                  2                                  -                                                                                                            (                                                                              lim                                        s                                                                            )                                                                        2                                                                                                  ]                                                                                      )                                                                                                                                             Parabolic-flow inlet
r                                                  f                          ,                          max                                                                                            R                        c                                                              =                                                                                                                        (                                                                                                                            r                                                                      0                                    ,                                    max                                                                                                  R                                                            ⁢                                                              R                                                                  R                                  c                                                                                                                      )                                                    2                                                +                                                  3                          ⁢                                                      (                                                                                                                            Q                                  a                                                                ⁢                                μ                                                                                                                              eE                                  0                                                                ⁢                                                                  R                                  c                                                                                                                      )                                                    ⁢                                                      (                                                                                          D                                p                                                                                            n                                ⁢                                                                  C                                  c                                                                ⁢                                                                  R                                  c                                                                                                                      )                                                    ⁢                                                      (                                                                                                                                                                                                      r                                                                              0                                        ,                                        max                                                                                                              /                                    R                                                                    )                                                                2                                                                                            lim                                s                                2                                                                                      )                                                                                                                                             Uniform-flow inlet
where, Qa = Aersol flow rate (particle containing air stream)

• • where, Q_a=Aerosol flow rate (particle containing air stream)

Furthermore, this equation is in terms of the aerosol flow rate, which is the flow rate of interest as it contains the particle and if possible maximizing this flow rate while keeping the collection efficiency high would be ideal. Some key implications of the analytical model:

• • 1. Results and analysis are scalable—as the model is dimensionless: The analytical model generalizes device performance in one geometry to a wide range of others due to its dimensionless form. For a given inlet flow condition (parabolic or uniform) and a fixed sheath position (lim_s), there are mainly 4 dimensionless parameters:

$\left(\frac{r_{0,\max }}{R}\frac{R}{R_c}\right)$ —relating to geometry,

$\left(\frac{Q_a\mu }{e{E}_0{R}_c}\right)$ —relating to operating parameters,

$\left(\frac{D_p}{n{C}_c{R}_c}\right)$ —relating to particle properties and

$\left(\frac{r_{f,\max }}{R_c}\right)$ —relating to particle collection performance. All these four parameters scale with the collection plate radius (L3=R_c).

• • 2. For operation conditions, Q_a/E is present in a term, meaning that doubling the electric field strength and the aerosol flow rate would result in the exact same aerosol collection performance.
  • 3. For particle based dependence, D/n is present in a term, meaning that if the amount of charge on a particle scales proportional to its diameter (which is many times the case), then there is negligible effect on particle size performance because of charge alone. However, the size dependence emerges because the drift correction, C_c ranges over orders of magnitude for particle sizes between 100 nm and 1 μm. This is the mathematical representation of the size-dependence in the ESP device.
  • 4. Collection performance is related to the outermost final potion of the particle on the collector plate,

$\left(\frac{r_{f,\max }}{R_c}\right),$ as larger this value, the more spread out the collection and thus lower the collection efficiency. If the final spatial deposition is uniform, then the collection efficiency can be represented as

$\eta =\frac{\pi R_c^2}{\pi t_{f,\max }^2}={\left(\frac{r_{f,\max }}{R_c}\right)}^{-2}.$

• • 5. Most importantly, this analytical model is original in that it includes this vast number of geometric, operating and performance parameters, allowing using it to propose geometries for a desired performance and operating condition, or to find operating conditions for a given geometry and desired performance or to simply evaluate the performance of a given device operating at certain conditions.Factors Important for “High Spatial Uniformity in Deposition Pattern”.
  • 1. Inlet condition—Sheath flow and axial velocity profile: The axial velocity profile under laminar flow conditions (mostly the case in this invention), can either be parabolic-like (when near fully developed for example), or plug-flow-like (when entering a sudden contraction, or exiting a nozzle for example). Both conditions are possible and result in different spatial deposition pattern—and ultimately the spatial uniformity. For the case of plug-flow-like inlet some sheath might be required depending on how the plug-flow is developed (orifice, nozzle, flow straightener, others).
    • For parabolic-flow-like inlet makes the deposition uniform—the closer to the center the sheath flow starts, the greater is the effect of making the final deposition uniform. A radial starting position of 0.5 (as a ratio to the inlet tube radius, L₁) is desirable for parabolic flow. This helps achieve spatial uniformity, even for a parabolic like axis velocity at the inlet. An example of using no sheath vs using a sheath flow for parabolic-flow-like inlet, is shown in FIGS. 7, 7b.
  • 2. Device geometry—Ratio of the inlet tube radius L1 to the separation distance L2 (ratio₁): As this ratio changes, the radial distribution of the electric field strength over the collector plate changes. This change in electric field strength just under the inlet tube is evident in all the simulations (COMSOL Multiphysics simulations). An example of the effect of ratio₁ (for values equal to 1.00 and 4.00) is shown in FIGS. 8a, 8b. A very high value results in non-uniformity in deposition because of the non uniformity in the electric field strength. The average and the variation of the electric field strength (normalized to maximum) over the collector plate is shown in FIG. 9a, as a function of both ratio₁ and ratio₃. ratio₁<1.5 results in low variations. Moreover, there is a clear advantage of using lower values of ratio₁ as the average electric field strength over the collector plate is high over a wide range of ratio₃.Factors Important for “Low Size-Dependence”.
  • 1. Device geometry—Ratio of the inlet tube radius to the collector plate radius (ratio₃): Some points that affect ratio₃ are discussed here.
    • Firstly, FIG. 12, shows that the values of (lim_s)×ratio₃>1.1 reduces the efficiency to below 50%, which is not desirable. Hence, desirable values are

${\mathrm{ratio}}_3<\frac{1.1}{{\lim }_s}.$ For example, if radial sheath position (position where sheath begins as a ratio of the inlet radius, L₁) is 0.5, then ratio₃<2.2. This consideration of efficiency is high in priority, though it can be overruled if low efficiency is justified for the process.

• • Secondly, very low values of the inlet radius L1, can result in impaction of particles, which is not desired. With a smaller radius inlet tube there are higher chances of irregularities affecting the deposition. Furthermore, as ratio₁ would be fixed, making the inlet radius small, would also bring the electrodes closer the collector plate, which increases the likelihood of electrical discharge. For these reasons, operating at low inlet radius sizes is not desirable. As these considerations are quite subjective, the actual scale of the collector plate is needed to make better estimate on this value. Tentatively, if we are on the scale of 10 s of mm for the collector plate, then a ratio of ratio₃>0.1 is desirable, with a higher value being better. The consideration of the effect of impaction and electrical discharge possibility is of high priority.
    • Lastly, FIG. 9b, apart from showing the effect of ratio₁ also shows range of ratio₃ values that can adversely affect the electric field strength above the collector plate (and hence, the uniformity). Very low ratios ratio₃<0.1 have a low variation and a high average value of the electric field strength. Similarly, higher values, ratio₃>2 also reduces the variations because of ratio₁ (though the average electric field strength is not as high at these values). This consideration, though important, can also be solved by choosing the correct, ratio₁ values, and is hence of lower priority.
  • 2. Inlet condition—Sheath flow: Particles are focused towards the center because of the tube electrode. Details of the extent of focusing is shown and discussed in FIG. 14. The effect is different for different particle sizes and smaller particles are focused more and hence, induces size-dependence. The closer to the center the sheath flow starts, i.e. lower the value of lim_s, the extent of size dependence is lower (for both uniform flow and parabolic flow inlet). Thus, lower values of lim_s is desirable.Factors Important for “Low Chemical Interference”.
  • 1. Operating condition—Electric field strength (E₀): Very high electric field strengths are undesired as chemical interference can increase through generation of reactive free radicals that react with the particles. The electrical breakdown of air is around 3 kV/mm. An average electric field strength is the ratio of the applied voltage (between counter-base electrode and the base electrode), and the separation distance L2. However, the presence of edges and of charged particle inside this electric field can enhance the local electric field strength values. Hence, a factor of safety (of 1.5 or 2 for example) should be used to limit the design electric field strength. Furthermore, some studies on streamer discharge also mention onset conditions from electric field strength of 2.28 kV/mm [4].
    • In the two embodiment examples 1 and 2, a safety factor of 3 is used on the breakdown voltage in which manner it is also below the 2.28 kV/mm limit.
  • 2. Operating condition—Counter-base electrode Voltage: Apart from an electrical discharge stemming from the local electric field strength, there are a few processes which also limit the voltage directly, to a degree. For example, Trichel discharge from electrodes (generally sharp) with high negative potential or streamer discharge from electrodes (generally sharp) with high positive potential have similar onset conditions [3]. Trichel discharge has been shown to have lesser dependence on the separation distance and onset from above 10 kV in magnitude. For these reasons, the examples 1 and 2 are to be operated at 10 kV and 5 kV respectively.
  • 3. Inlet condition—Sheath flow: The closer to the center the sheath flow starts (i.e. lower the value of lim_s), the further away particles are kept from the high voltage on the tube electrode and the counter-base electrode. Some studies [6] have shown that any ozone produced between electrodes has a hyperbolic concentration profile which decreases further away from the discharge electrode. Thus, lower values of lim_s is desirable.
  • 4. Device geometry—Ratio of the inlet tube radius to the base electrode radius (ratio₂): The sudden increase in electric field strength values because of ratio₂>0.5, is undesirable also because it might result in possible chemical modification. Thus, values of ratio₂<0.5 is desirable.Factors Important for “High Collection Efficiency” and “High Collection Mass Flux”.
  • 1. Inlet condition—Charge: It is assumed that the particles are charged prior to introducing into the device. Any charger that charges the particles using field charging/diffusion charging/UV charging can be used. The number of elementary charges on a particle charged using a combination of field charging and space charging is approximately directly proportional to the particle size. In the examples 1 and 2, it has been assumed that 1 elementary charge per 20 nm diameter is present. The charger used in Examples 1 and 2 is a wire-wire charger per se known as a part of a bioaerosol sampling device that has low ozone generation (hence, low chemical interference).
  • 2. Operating condition—Flow Rate and collection flux: The relationship between the total operating flow rate and the particle-laden aerosol flow rate (Q_a) is shown in FIG. 6. An example of determining the operating aerosol flow rate for a design such that size-dependence is low and collection flux is high is shown FIG. 11. The variables affecting this flow rate is illustrated in FIG. 8. FIG. 11 shows the minimum aerosol flow rate limit for different designs on the same collector plate are and the same charging and electric field conditions. Note that the focusing effect because of tube electrode is present in these calculations. Surprisingly, the volume flux of deposition is nearly a constant i.e. by changing the geometry (sheath position and ratio₃) the proportion of change in the flow rate limit for a said size-dependence is the same as the proportion change in the collection spot area on the collector plate.
    • Hence, we can see that for a given charge condition, particle size range and electric field strength, the collection volume flux is more or less a constant at φ_max=Q_a/(πR_c²=0.3936 LPM/cm². Moreover, on this value, there is absolutely no variation because of the collector plate radius (over orders of magnitude) and very small variation if the sheath position changed as shown in FIG. 13.
    • For the examples 1 and 2, as the collector plate radius is 12.7 mm, we operate the device at 0.3936×3.14×1.27²≅2 LPM. The charging condition used was 1 elementary charge for every 20 nm diameter, and the particle size range was from 100 nm to 2.5 μm (though the difference for a range of 100 nm to 1 μm was very little).
    • The collection mass flux can be calculated by multiplying the collection volume flux with the particle concentration and the mass density of each particle.
  • 3. Device geometry—Tube electrode: The presence of tube electrode results in particles being focused towards the center. This effect is very prominent and results in increase in collection efficiency (as the particles are closer to the center). The extent of focusing is different for different flow rate, electric field strength and particle size. If the device is operated at the flow rate limit (as discussed above), then for a given collector plate radius, the drift effect is shown for different geometric parameters. For a parabolic flow inlet profile, FIG. 14 (i) and (ii) shows the extent of drift (as percentage drift away from the initial position in the tube, sheath position lim_s), and the size-based variation in the extent of drift (shown as the ratio if median absolute deviation (MAD) and the median). The size-based dependence is not desirable.
  • 5. Inlet condition—Sheath flow: For a given ratio₃ value, the sheath position can be lowered in order to operate at a higher efficiency. As shown in FIG. 12, values of ratio₃×lim_s>0.8 (approximately), the maximum collection efficiency decreases as the minimum operating flow rate for “acceptable” size-dependent variation is high. Thus, for a given ratio₃ value, lim_s can be lowered till ratio₃×lim_s<0.8, if possible. Furthermore, lower lim_s would result in lower size-dependent variation because of the tube electrode focusing. Thus, lower values of lim_s is desirable.
  • 4. Device geometry—Ratio of the inlet tube radius to the separation distance (ratio₁): As shown in FIGS. 8a, 8b, a higher value of ratio₁ results in a more non-uniform electric field strength, which not only changes the spatial uniformity but also the collection efficiency (as FIG. 11b has the final particle deposition more spread out than in FIG. 11a). This is because the high non-uniformity of the electric field strength is coupled with lower values (especially closer to the center), which results in less particle deposition in the region under the tube.Other Factors that are Important in the Particle Collector Device Design.Upper Limit on the Collector Plate Radius (L3) to Keep the Flow Laminar

The analytical model is valid for the case where flow is laminar. Hence, for any given combination of L3 value and ratio₃ value, the operating flow rates can be adjusted such that the Reynold's number (Re) is within laminar limit. However, if we operate at the collection volume flux limit (which is related to velocity), and with Re<1800 (such that the flow is laminar), we have an upper limit of collector plate radius (L3) for various sheath flow positions (lim_s) and ratio₃. Some examples of the limit is shown in FIG. 15 if the system is made to operate at the volume flux limit (φ_max) where the upper limit is because of Reynolds number and the lower limit is to avoid particle impaction. As the volume flux limit is higher for higher electric field strength, three different operating electric field strengths are used to find the limits on the collector plate radius.

$\mathrm{Re}=\frac{4\rho Q}{\pi \mu D},\mathrm{where},Q=\frac{{\mathrm{\pi \phi }}_{\max }{R}_c^2}{{\lim }_s^2\left(2-{\lim }_s^2\right)},\mathrm{and}$ $D=2R_c\left({\mathrm{ratio}}_3\right)$ Lower Limit on the Collector Plate Radius (L3) to have Negligible Impaction

The analytical model is valid for the case where particles are not impacting onto the surface. Hence, for any given combination of L3 value and ratio₃ value, the operating flow rates can be adjusted such that the Stokes number (St) is low (lower than 0.1 as then the impaction efficiency is lower than 1%). However, if we operate at the collection volume flux limit (which is related to velocity), and with St<0.1 (such that impaction is negligible), we have a lower limit of collector plate radius (L3) for various sheath flow positions (lim_s) and ratio₃. The examples in FIG. 15 have the lower limit to have negligible impaction (i.e. impaction efficiency around 1%) for particles with density of 1 g/cc and diameter 2.5 μm.

$\mathrm{St}=\frac{4\rho D_p^{2}Q}{9\pi \mu D^3}$ Materials

Various considerations in choosing exemplary materials for various parts of embodiments of the invention are presented below:

			Example
Part	Required properties	Optional properties	materials
Inlet tube	Low static electricity affinity: To	Conducting: Important	Steel,
	avoid local electric fields.	when inner wall is in	Aluminum,
	Smooth inner surface: Flow	proximity of charged	Copper, ABS,
	profile should not be affected.	particles.	Polycarbonate,
			Nitrile Rubber,
			etc.
Tube	High conductivity.	Low thermal expansion:	SS, Tungsten,
electrode	Low corrosion potential: The	If the electrodes gets	Platinum, Gold,
and	material should not ablate	heated this can be useful	Silver, Copper,
counter-	considerably under high voltage.	to consider.	etc.
base
electrode
Base	High conductivity.	Low thermal expansion:	Gold, Nickle,
Electrode	Low corrosion potential: The	If the electrodes gets	Tin, Silver, etc.
	material should not ablate	heated this can be useful
	considerably under high voltage	to consider.
	nor degrade through galvanic	Very high thermal
	corrosion.	conductivity: As charge
	Low oxidation potential.	will flow through a solid-
		solid contact.
Collector	Conductivity: A level of		Highly
plate	conductivity that can help carry		dependent on the
	away the charge from the		user.
	deposited particles is required.		Most
	Low corrosion potential: The		conductors,
	material should not ablate		semiconductors
	considerably through the		(eg., Silicon,
	particles depositing on its		Zinc Selenide,
	surface.		Germanium),
			and some
			insulators might
			also be used.
Filler	Relative permittivity comparable	Conductivity: A level of	Wide range of
	to that of the collector plate	conductivity that can	materials
	material.	help carry away the	possible ABS.
		charge from the
		deposited particles is
		required
Dielectric	Low conductivity: This would	High relative	High-k
around	act as an insulation around the	permittivity: This would	dielectrics are
counter-	electrodes.	not dampen the electric	preferable. Very
base and		field strength.	thin layer of
tube			low-k dielectric
electrodes			would also find
			application.

LITERATURE REFERENCES

• 1. Dixkens, J., & Fissan, H. (1999). Development of an electrostatic precipitator for off-line particle analysis. Aerosol Science and Technology, 30(5), 438-453. https://doi.org/10.1080/027868299304480
• 2. Preger, C., Overgaard, N. C., Messing, M. E., Magnusson, M. H., Preger, C., Overgaard, N. C., . . . Magnusson, M. H. (2020). Predicting the deposition spot radius and the nanoparticle concentration distribution in an electrostatic precipitator. Aerosol Science and Technology, 0(0), 1-11. https://doi.org/10.1080/02786826.2020.1716939
• 3. Rees, J. a. (1973). Chapter 5 Electrical breakdown in gases. High Voltage Engineering: Fundamentals, V, 294. https://doi.org/10.1016/B978-0-7506-3634-6.50006-X
• 4. Heiszler, M. (1971). Dissertation. Iowa State University. Analysis of streamer propagation in atmospheric air. https://lib.dr.iastate.edu/cgi/viewcontent.cgi?article=5458&context=rtd
• 5. Han, T. T., Thomas, N. M., & Mainelis, G. (2017). Design and development of a self-contained personal electrostatic bioaerosol sampler (PEBS) with a wire-to-wire charger. Aerosol Science and Technology, 51(8), 903-915. https://doi.org/10.1080/02786826.2017.1329516
• 6. Jodzis, S., & Patkowski, W. (2016). Kinetic and Energetic Analysis of the Ozone Synthesis Process in Oxygen-fed DBD Reactor. Effect of Power Density, Gap Volume and Residence Time. Ozone: Science and Engineering, 38(2), 86-99. https://doi.org/10.1080/01919512.2015.1128320

LIST OF REFERENCES IN THE DRAWINGS

• • Particle gas stream 3
  • Sheath gas stream 5
  • Particle collector 1
  • Particle charger 2
  • Inlet section 4
  • Flow tube 10
  • Flow channel 12
  • Guide wall 24
  • Inlet end 14
  • Sheath flow inlet portion 26
  • sheath flow gas inlet 27
  • gas chamber 29
  • sheath flow gas outlet 31
  • Particle inlet 28
  • Collector end 16
  • Collector section 6
  • Housing 18
  • Collector plate 20
  • Particle collection side 23
  • Underside 25
  • Transparent (e.g. crystal) disc
  • Collector plate holder 22
  • Filler material 21
  • Outlet 30
  • Assembly ring 33
  • Cap 35
  • Electrode arrangement 8a, 8b, 8c
  • Base electrode (attracting electrode) 8a
  • Collector inlet electrode(s) (repulsing electrodes)
  • Counter-base electrode 8b
  • Tube electrode 8c
  • Inlet channel collector end radius L1
  • Counter-base electrode to collector plate separation distance L2
  • Collector plate radius L3
  • Collector plate filler radius L4
  • Particle stream radius (inner radius of sheath stream) r

Claims

1. An electrostatic precipitator (ESP) particle collector for collecting particles in a particle containing gas stream, comprising an inlet section, a collector section, and an electrode arrangement, the inlet section comprising a flow tube defining a gas flow channel therein bounded by a guide wall extending between an entry end and a collector end that serves as an inlet to the collector section, the entry end comprising an inlet for the particle gas stream and a sheath flow inlet portion for generating a sheath flow around the particle gas stream, the collector section comprising a housing coupled to the flow tube, and a collector plate mounted therein having a particle collection surface, the ESP particle collector configured to allow optical analysis of the collector plate particle collection surface to measure particles collected thereon, the electrode arrangement comprising at least a base electrode positioned below the collection surface and a counter-base electrode positioned at a separation distance L2 above the collection surface such that an electrical field is generated between the electrodes configured to precipitate said particles on the collection surface, wherein the electric field is in a range of 0.1 kV per mm to 1.5 kV per mm, with an absolute voltage on any said electrode that is less than 10 kV, and wherein a ratio 1 of a radius L1 of said inlet at the collector end divided by said separation distance L2 is in a range of 0.8 to 1.2.

2. The ESP particle collector according to claim 1 wherein the collector plate is mounted on a collector plate holder removably mounted in the housing to allow the collector plate to be optically analysed by an external instrument for measurement of particles collected thereon.

3. The ESP particle collector according to claim 1 further comprising a particle measurement instrument arranged in the housing above or below the particle collection surface to measure the particles collected on the particle collection surface.

4. The ESP particle collector according to claim 1 wherein a ratio 2 (L1/L4) of the radius L1 of said inlet divided by a radius L4 of the base electrode is less than 1.

5. The ESP particle collector according to claim 4 wherein said ratio 2 (L1/L4) is less than 0.7, for instance 0.5 or lower.

6. The ESP particle collector according to claim 1 wherein a ratio lims (Ls/L1) of an inner radius Ls of the said sheath flow relative to the inlet radius L1 is less than 0.6.

7. The ESP particle collector according to claim 6 wherein said ratio lims (Ls/L1) is in a range of 0.2 to 0.5.

8. The ESP particle collector according to claim 1 wherein a ratio 3 of the radius L1 of said inlet divided by a radius L3 of the collector plate (L1/L3) is in a range of 0.05 to 20.

9. The ESP particle collector according to claim 8 wherein said ratio 3 (L1/L3) is in a range of 0.1 to 5.

10. The ESP particle collector according to claim 1 wherein the collector plate is made of a transparent conductive or semi-conductor material.

11. An electrostatic precipitator (ESP) particle collector for collecting particles in a particle containing gas stream, comprising an inlet section, a collector section, and an electrode arrangement, the inlet section comprising a flow tube defining a gas flow channel therein bounded by a guide wall extending between an entry end and a collector end that serves as an inlet to the collector section, the entry end comprising an inlet for the particle gas stream and a sheath flow inlet portion for generating a sheath flow around the particle gas stream, the collector section comprising a housing coupled to the flow tube, and a collector plate mounted therein having a particle collection surface, the ESP particle collector configured to allow optical analysis of the collector plate particle collection surface to measure particles collected thereon, the electrode arrangement comprising at least a base electrode positioned below the collection surface and a counter-base electrode positioned at a separation distance L2 above the collection surface such that an electrical field is generated between the electrodes configured to precipitate said particles on the collection surface, wherein the electric field is in a range of 0.1 kV per mm to 1.5 kV per mm, with an absolute voltage on any said electrode that is less than 10 kV, and wherein a ratio 1 of a radius L1 of said inlet at the collector end divided by said separation distance L2 is in a range of 0.8 to 1.2 and wherein the electrode arrangement further comprises a tube electrode around the collector end forming the inlet to the collector section.

12. An electrostatic precipitator (ESP) particle collector for collecting particles in a particle containing gas stream, comprising an inlet section, a collector section, and an electrode arrangement, the inlet section comprising a flow tube defining a gas flow channel therein bounded by a guide wall extending between an entry end and a collector end that serves as an inlet to the collector section, the entry end comprising an inlet for the particle gas stream and a sheath flow inlet portion for generating a sheath flow around the particle gas stream, the collector section comprising a housing coupled to the flow tube, and a collector plate mounted therein having a particle collection surface, the ESP particle collector configured to allow optical analysis of the collector plate particle collection surface to measure particles collected thereon, the electrode arrangement comprising at least a base electrode positioned below the collection surface and a counter-base electrode positioned at a separation distance L2 above the collection surface such that an electrical field is generated between the electrodes configured to precipitate said particles on the collection surface, wherein the electric field is in a range of 0.1 kV per mm to 1.5 kV per mm, with an absolute voltage on any said electrode that is less than 10 kV, and wherein a ratio 1 of a radius L1 of said inlet at the collector end divided by said separation distance L2 is in a range of 0.8 to 1.2 and wherein the sheath flow inlet portion comprises a sheath flow gas inlet, a gas chamber and an annular sheath flow gas outlet surrounding the centre of the flow channel and configured to generate an annular sheath flow along the guide wall of the flow channel surrounding the particle gas stream.

13. An electrostatic precipitator (ESP) particle collector for collecting particles in a particle containing gas stream, comprising an inlet section, a collector section, and an electrode arrangement, the inlet section comprising a flow tube defining a gas flow channel therein bounded by a guide wall extending between an entry end and a collector end that serves as an inlet to the collector section, the entry end comprising an inlet for the particle gas stream and a sheath flow inlet portion for generating a sheath flow around the particle gas stream, the collector section comprising a housing coupled to the flow tube, and a collector plate mounted therein having a particle collection surface, the ESP particle collector configured to allow optical analysis of the collector plate particle collection surface to measure particles collected thereon, the electrode arrangement comprising at least a base electrode positioned below the collection surface and a counter-base electrode positioned at a separation distance L2 above the collection surface such that an electrical field is generated between the electrodes configured to precipitate said particles on the collection surface, wherein the electric field is in a range of 0.1 kV per mm to 1.5 kV per mm, with an absolute voltage on any said electrode that is less than 10 kV, and wherein a ratio 1 of a radius L1 of said inlet at the collector end divided by said separation distance L2 is in a range of 0.8 to 1.2 further comprising a particle charger arranged upstream of the inlet section configured to electrically charge the particles of the gas stream entering the inlet section.

14. The ESP particle collector according to claim 13 wherein the particle charger is configured to impart a charge on the particles contained in the gas stream in a range of about 1 elementary charge per 10 nm (1 nm=10−9 m) to about 1 elementary charge per 50 nm diameter of a particle.

15. The ESP particle collector according to claim 14 wherein the particle charger is configured to impart a charge on the particles contained in the gas stream in a range of about 1 elementary charge per 10 nm diameter to about 1 elementary charge per 30 nm diameter of a particle.