This application is based on and claims priority under 35 U.S.C. ยง 119 to Japanese Patent Application No.2004-131633, filed on Apr. 27, 2004, the entire content of which is incorporated herein by reference.
This invention generally relates to an embroidering and dyeing system. More particularly, this invention pertains to an embroidering and dyeing system for applying embroidery on a work piece before or after the work piece is dyed.
In the sewing industry, it has been obviously known that decorative performance may be further improved in cases where printing is applied on a fabric and then embroidery is additionally applied on a part of the printing. Japanese Patent No. 3066937 discloses a method for producing such a decorative work. According to the method disclosed, by using a printing machine and the like, required printing is first applied on fabric. Then, the fabric with the printing applied is set on an embroidery frame so that embroidery is formed by means of a known embroidering machine.
According to the aforementioned method, however, it may be difficult to apply an embroidery pattern so as to precisely position with a printing pattern that has been already formed. Therefore, a misalignment may occur between the printing pattern and the embroidery pattern, thereby generating a large problem, i.e. appearance as a product or quality may deteriorate.
The present invention has been made in view of the above circumstances and provides such a system.
According to an aspect of the present invention, an embroidering and dyeing system includes a dyeing apparatus for forming a dyeing pattern on a fabric, and an embroidering machine for forming an embroidery pattern on the fabric before or after the dyeing pattern is formed on the fabric. The embroidery pattern and the dyeing pattern are formed on the basis of a common reference point formed on the fabric.
The foregoing and additional features and characteristics of the present invention will become more apparent from the following detailed description considered with reference to the accompanying drawings, wherein:
An embodiment of the present invention is explained with reference to the attached drawings.
As shown in
In cases where dyeing is performed after embroidery is applied on the fabric W, a positional relationship of a dyeing pattern to an embroidery pattern is precisely controlled as follows.
As shown in
Next, the frame apparatus 40 pulling and holding the fabric W on which the embroidery pattern E has been formed is removed from the embroidering machine 20 and set on the dyeing apparatus 30. The control unit 10 recognizes, by means of a sensor (not shown), the four corner points RA, RB, RC and RD of the rectangular R formed on the fabric W as (XA1, YA1), (XA2, YA2), (XA3, YA3), and (XA4, YA4) respectively while the frame apparatus 40 is driven. The coordinates (XA1, YA1), (XA2, YA2), (XA3, YA3), and (XA4, YA4) precisely correspond to the coordinates (XA1, YA1), (XB2, YB2), (XC3, YC3), and (XD4, YD4), which have been uniquely determined relative to the dyeing pattern P as mentioned above. Therefore, if the dyeing pattern P is formed based on the coordinates (XA1, YA1), (XA2, YA2), (XA3, YA3), and (XA4, YA4), the dyeing pattern P may be precisely formed without deteriorating the relative positional relationship of the dyeing pattern P with the embroidery pattern E. The rectangular R is afterwards removed from the fabric W by removing stitches.
In cases where the dyeing pattern P is first formed on the fabric W and then the frame apparatus 40 is removed from the dyeing apparatus 30 to be set on the embroidering machine 20, the four corner points RA, RB, RC, and RD of the rectangular R are colored with a special ink, i.e. the ink is injected, (ink is vanished after a predetermined time has elapsed) in the dyeing apparatus 30. The coordinates of the respective four corner points RA, RB, RC, and RD are read into the sensor after the frame apparatus 40 with the dyeing pattern P formed and the four corner points RA, RB, RC and RD colored is set on the embroidering machine 20.
Since the common reference point to the embroidery pattern E and the dyeing pattern P is applied to the fabric W, the relative positional relationship between the embroidery pattern E and the dyeing pattern P may be determined with a degree of certitude even if frame apparatuses 40 different from each other are respectively used for embroidering and dyeing, or the fabric W is moved between the identical frame apparatuses 40.
According to the aforementioned embodiment, the relative positional relationship between the dyeing pattern P and the embroidery pattern E is corrected. Thus, misalignment therebetween may be prevented, which is caused by shrinkage of the fabric W, misalignment of setting the frame apparatuses 40, and the like.
Instead of the fabric, a leaser is available.
The principles, preferred embodiment and mode of operation of the present invention have been described in the foregoing specification. However, the invention which is intended to be protected is not to be construed as limited to the particular embodiments disclosed. Further, the embodiments described herein are to be regarded as illustrative rather than restrictive. Variations and changes may be made by others, and equivalents employed, without departing from the sprit of the present invention. Accordingly, it is expressly intended that all such variations, changes and equivalents which fall within the spirit and scope of the present invention as defined in the claims, be embraced thereby.
Number | Date | Country | Kind |
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2004-131633 | Apr 2004 | JP | national |