Claims
- 1. An emission measuring device, comprising:
an analyzer that is capable of measuring a characteristic of an emitted material that is emitted from an emission source; and means connected to the analyzer for calculating an amount of a particular material contained in the emitted material by using a mass flow rate value.
- 2. The emission measuring device of claim 1, wherein the amount of a material that is calculated is a concentration of material.
- 3. The emission measuring device of claim 1, wherein the mass flow rate value is based on a molar flow rate value.
- 4. The emission measuring device of claim 1, further comprising:
a dilution probe that receives emitted material and dilution gas which forms a mixture known as diluted sample gas, and that is in communication with the analyzer, said mass flow rate value being a value corresponding to one of a mass flow rate of dilution gas, a mass flow rate of sample gas, and a mass flow rate of emitted material.
- 5. The emission measuring device of claim 4, wherein the dilution probe is located in one of a stack and a duct.
- 6. The emission measuring device of claim 1, wherein the means for calculating the amount of a particular material calculates by using a dilution ratio based on the mass flow rate value.
- 7. The emission measuring device of claim 6, further comprising:
a dilution probe connected to said means for calculating and configured to receive a sample gas that includes the emitted material and a dilution gas, wherein the dilution ratio is determined as follows: 6D=1+565.338 FdaTstackM[1+y(Tstack-530)]Pabsolute[1+β(Tstack-530)]2where D is the dilution ratio, Fda is a mass flow rate of the dilution gas, Tstack is an emission source temperature, M is a molecular weight of the emitted material, y is a constant, Pabsolute is total emission source pressure, and β is a thermal expansion coefficient of orifice material located on the dilution probe.
- 8. The emission measuring device of claim 6, wherein the dilution ratio is determined as follows:
- 9. The emission measuring device of claim 6, wherein the dilution ratio is determined as follows:
- 10. The emission measuring device of claim 1, further comprising:
a dilution probe connected to said means for calculating, wherein the emitted material is combined with a dilution gas to form a sample gas, and the means for calculating the amount of a particular material calculates by using a mass flow rate of sample gas determined as follows: 7ms=α CdPabsoluteMAo[1+β(Tstack-530)]2Tstackwhere ms is a mass flow rate of the sample gas, Cd is a constant, Cd is a discharge coefficient, Pabsolute is a total emission source pressure, M is a molecular weight of the sample gas, β is a thermal expansion coefficient of an orifice material of the dilution probe, Ao is a throat area of a critical orifice of the dilution probe, and Tstack s an emission source temperature.
- 11. The emission measuring device of claim 10, wherein Tstack is the critical orifice upstream stagnation temperature.
- 12. The emission measuring device of claim 10, wherein Pabsolute is the critical orifice upstream stagnation pressure.
- 13. The emission measuring device of claim 1, wherein the means for calculating includes a data analyzer that is adapted for use with an existing plant data handling and acquisition system.
- 14. The emission measuring device of claim 13, wherein the data analyzer includes an output line that can be connected to the existing plant data handling and acquisition system to transfer dilution ratio data.
- 15. A system for use with an emission source, comprising:
a data medium for receiving emission data collected from one of an analyzer and a transmitter, the emission data including one of a pressure, a temperature, and an amount of a particular material emitted from the emission source; and means for calculating an amount of the particular material emitted from the emission source using a mass flow rate value.
- 16. The system for use with an emission source of claim 15, wherein the mass flow rate value includes a mass flow rate of dilution gas measured by one of a transmitter and an analyzer.
- 17. The system for use with an emission source of claim 16, wherein the transmitter is a flow meter.
- 18. The system for use with an emission source of claim 15, wherein the mass flow rate value includes a mass flow rate of a sample gas.
- 19. The system for use with an emission source of claim 18, further comprising:
a dilution probe connected to said means for calculating and configured to receive a sample gas that includes said emitted material and a dilution gas, wherein said mass flow rate of sample gas is calculated as follows: 8ms=α CdPabsoluteMAo[1+β(Tstack-530)]2Tstackwhere ms is a mass flow rate of sample gas, α is a constant, Cd is a discharge coefficient, Pabsolute is total emission source pressure, M is a molecular weight of the sample gas, β is a thermal expansion coefficient of an orifice material of the dilution probe, Ao is a throat area of a critical orifice of the dilution probe, and Tstack is an emission source temperature.
- 20. The system for use with an emission source of claim 15, wherein the means for calculating an amount of the particular material emitted from the emission source calculates a concentration of the particular material using a dilution ratio.
- 21. The system for use with an emission source of claim 20, further comprising:
a dilution probe that has an orifice for receiving a sample gas which includes the particular material combined with a dilution gas, wherein the dilution ratio is calculated as follows: 9D=1+565.338 FdaTstackM[1+y(Tstack-530)]Pabsolute[1+β(Tstack-530)]2where D is the dilution ratio, Fda is a mass flow rate of dilution gas, Tstack is an emission source temperature, M is a molecular weight of the sample gas, y is a constant, Pabsolute is total emission source pressure, and β is a thermal expansion coefficient of an orifice material of the dilution probe.
- 22. The system for use with an emission source of claim 20, wherein the dilution ratio is calculated as follows:
- 23. The system for use with an emission source of claim 20, wherein the dilution ratio is determined using a molar flow rate value.
- 24. The system for use with an emission source of claim 20, further comprising:
a dilution probe connected to an analyzer, the analyzer connected in communication with the means for calculating a total amount of a particular material.
- 25. The system for use with an emission source of claim 15, wherein the means for calculating includes a data analyzer that is adapted for use with an existing plant data handling and acquisition system.
- 26. The system for use with an emission source of claim 25, wherein the data analyzer includes an output line that can be connected to an existing plant data handling and acquisition system to transfer dilution ratio data.
- 27. A method for calculating an amount of a material emitted from a source, comprising the steps of:
sensing an emission gas emitted from the source; determining a mass flow rate value of the emission gas; calculating a dilution ratio based on the determined mass flow rate value of the emission gas; and determining a characteristic of the emission gas using the calculated dilution ratio.
- 28. The method of claim 27, wherein said emission gas is a calibration reference gas used for verifying the accuracy of the method.
- 29. The method of claim 27, further comprising:
determining a molecular weight for the sampled emission gas.
- 30. The method of claim 27, wherein the step of determining a mass flow rate includes determining a molar flow rate of the emission gas.
- 31. The method of claim 27, wherein the step of sensing includes using a dilution probe configured to receive a sample gas that includes the emission gas and a dilution gas.
- 32. The method of claim 31, wherein the step of calculating a dilution ratio includes calculating the dilution ratio as follows:
- 33. The method of claim 31, wherein the step of calculating a dilution ratio includes calculating the dilution ratio as follows:
- 34. The method of claim 31, wherein said step of determining a mass flow rate includes determining the mass flow rate as follows:
- 35. The method of claim 27, wherein the characteristic of the emission gas is a concentration.
- 36. The method of claim 27, further comprising the step of:
sending a signal corresponding to the value of the calculated dilution ratio to a data acquisition and handling system.
- 37. The method of claim 27, wherein the step of calculating includes providing a data analyzer to perform the calculation of the dilution ratio, the data analyzer being capable of retrofitting to an existing data handling and acquisition system at an industrial facility.
- 38. The method of claim 27, further comprising:
determining a mass flow rate of dilution gas; and determining emission and dilution gas molecular weights; wherein the step of calculating a dilution ratio is also based on determined mass flow rate value of the dilution gas, and determined emission and dilution gas molecular weights.
- 39. An emission measuring device, comprising:
an analyzer that is capable of measuring a characteristic of an emitted material that is emitted from an emission source; and a data system connected to the analyzer and configured to calculate an amount of a particular material contained in the emitted material by using a molar flow rate value.
- 40. The emission measuring device of claim 39, wherein the data system calculates a concentration of the particular material using a dilution ratio, and the dilution ratio is calculated as follows:
Parent Case Info
[0001] This application claims priority and benefit of U.S. Provisional Patent Application No. 60/200,502 (Attorney Docket No.: 002349-0182), filed on Apr. 28, 2000 and entitled Emission Monitoring System and Method, which is hereby incorporated by reference.
Provisional Applications (1)
|
Number |
Date |
Country |
|
60200502 |
Apr 2000 |
US |