Claims
- 1. A process for rendering porous, mineral-based building materials water-repellant, said process comprising:applying to the surface of said porous, mineral-based building materials, a coating composition containing an aqueous emulsion comprising: (A) organosilicone compositions (A1) C1-C20-alkyl-C2-C6-alkoxysilanes or (A2) organopolysiloxane containing alkoxy groups free of Si—C bonded basic nitrogen, (B) organopolysiloxane containing siloxane units having SiC-bonded radicals containing basic nitrogen, where the amine number of the organopolysiloxane is at least 0.01, and (C) an emulsifier.
- 2. The process of claim 1, wherein the C1-C20-alkyl-C2-C6-alkoxysilanes (A1) have one or two identical or different, unsubstituted or halogen-substituted, SiC-bonded monovalent C1-C6-alkyl radicals and any remaining radicals are identical or different C2-C6-alkoxy radicals.
- 3. The process of claim 1, wherein the organopolysiloxanes (A2) are built up of units of the formula RxSi(OR1)y(OH)zO4-x-y-z2,(I)whereR an identical or different monovalent, unsubstituted or halogen-substituted, SiC-bonded C1-C20-hydrocarbon radical, R1 is an identical or different monovalent, C1-C6-alkyl radical, x is 0, 1, 2 or 3, y is 0, 1, 2 or 3, z is 0, 1, 2 or 3, with the proviso that the sum of x, y and z is at most 3.5.
- 4. The process of claim 1, wherein the organopolysiloxanes (B) are built up of units of the formula Ra2Rb3(OR4)cSiO4-a-b-c2,(II)whereR2 are identical or different monovalent, unsubstituted or halogen-substimted, SiC-bonded C1-C20-hydrocarbon radicals free of basic nitrogen, R3 are an identical or different monovalent, unsubstituted or halogen-substituted, SiC-bonded C1-C30-hydrocarbon radicals containing basic nitrogen, R4 are identical or different, and are hydrogen or a C1-C6-alkyl radical, a is 0, 1, 2 or 3, b is 0, 1, 2or 3, c is 0, 1, 2 or 3, with the proviso that the sum of a, b and c is less than or equal to 3 and the amine number of the organopolysiloxane (1) is at least 0.01.
- 5. The process of claim 4, wherein the radical R3 is a radical of the formulaR52NR6— (III), whereR5 are identical or different and are hydrogen or a monovalent, unsubstituted or substituted C1-C10-hydrocarbon radical or a C1-C15 hydrocarbon radical.
- 6. The process of claim 1, wherein the organopolysiloxanes (B) have a viscosity of from 5 to 5000 mm2/s at 25° C.
- 7. The process of claim 1, wherein the emulsifier (C) is selected from the group consisting of polyvinyl alcohols having from 5% to 50% vinyl acetate units and a degree of polymerization of from 500 to 3,000; addition products of alkyl-amines having alkyl radicals from 8 to 22 carbon atoms with ethylene oxide or propylene oxide; alkyl polyglycosides of the formulaR*—O—Z0, whereR* is a linear or branched, saturated or unsaturated alkyl radical having on average of 8-24 carbon atoms, and Zo is an oligoglycoside radical where o has an average value of 1 to 10; and mixtures thereof.
- 8. The process of claim 1, wherein the proportion of the emulsifier (C) is from 0.1% to 30% by weight of the total amount of the components (A) and (B).
- 9. The process of claim 7 where the oligoglycoside is a hexose unit, pentose unit or mixture thereof.
- 10. A process for preparing a water-repellant coating composition for porous, mineral-based building materials, comprising admixing a coating composition comprising at least one pigment and a binder with an aqueous emulsion comprising;(A) organosilicone compositions (A1) C1-C20-alkyl-C2-C6-alkoxysilanes or (A2) organopolysiloxane containing alkoxy groups free of Si—C bonded basic nitrogen, (B) organopolysiloxane containing siloxane units having SiC-bonded radicals containing basic nitroen, where the amine number of the organopolysiloxane is at least 0.01, and (C) an emulsifier.
Priority Claims (1)
Number |
Date |
Country |
Kind |
195 17 346 |
Mar 1995 |
DE |
|
Parent Case Info
This is a continuation of copending application(s) Ser. No. 08/930,966 filed on Oct. 2, 1997, now abandoned which is a 371 of PCT/EP96/01993 filed May 10, 1996.
US Referenced Citations (7)
Foreign Referenced Citations (3)
Number |
Date |
Country |
43 06 796 |
Sep 1994 |
DE |
43 28 917 |
Mar 1995 |
DE |
0 340 816 A2 |
Nov 1989 |
EP |
Continuations (1)
|
Number |
Date |
Country |
Parent |
08/930966 |
|
US |
Child |
09/527510 |
|
US |