Claims
- 1. A method for treating a substrate having an electrically conductive surface comprising:
contacting at least a portion of the surface with a medium comprising at least one silicate and having a basic pH and wherein said medium is substantially free of chromates, introducing a current to said medium wherein said surface is employed as a cathode; and recovering the substrate.
- 2. An aqueous medium for use in electrically treating a conductive surface comprising a combination comprising at least one polar carrier, at least one silicate soluble within said carrier, at least one dopant and wherein the medium has a basic pH and is substantially free of chromates.
- 3. A method for treating a metallic or an electrically conductive surface comprising:
exposing at least a portion of the surface to a medium comprising a combination comprising at least one polar carrier and at least one silicate that is soluble within said carrier wherein said medium has a basic pH, introducing an energy source into said first medium thereby treating the surface; recovering the surface from the medium; and contacting the treated surface with at least one composition that adheres to the treated surface.
- 4. The method of claim 1 wherein the silicate containing medium comprises sodium silicate.
- 5. The method of claim 1 wherein the surface comprises at least one member selected from the group consisting of copper, nickel, tin, iron, zinc, aluminum, magnesium, stainless steel and steel and alloys thereof.
- 6. The method of claim 1 wherein further comprising a post-treatment comprising contacting the surface with a second medium comprising a combination comprising water and at least one water soluble compound selected from the group consisting of chlorides, fluorides, nitrates, zironates, titanates, sulphates and water soluble lithium compounds.
- 7. The method of claim 1 further comprising a post-treatment comprising contacting with at least one carbonate comprises at least one member chosen from the group of lithium carbonate, lithium bicarbonate, sodium carbonate, sodium bicarbonate, potassium carbonate, potassium bicarbonate, rubidium carbonate, rubidium bicarbonate, rubidium acid carbonate, cesium carbonate, ammonium carbonate, ammonium bicarbonate, ammonium carbamate and ammonium zirconyl carbonate.
- 8. The method of claim 1 further comprising a post treatment comprising contacting with at least one member selected from the group consisting of nitric acid, citric acid, and ammonium dibasic citrate.
- 9. The method of claim 8 comprising applying at least one coating upon the post-treated surface.
- 10. The medium of claim 2 wherein the medium comprises greater than 3 wt. % of at least one silicate.
- 11. The method of claim 1 further comprising forming a layer comprising silica upon the mineral.
- 12. The medium of claim 3 wherein said water soluble compound comprises at least one member selected from the group consisting of from the group of titanium chloride, tin chloride, zirconium acetate, zirconium oxychloride, calcium fluoride, tin fluoride, titanium fluoride, zirconium fluoride; ammonium fluorosilicate, aluminum nitrate; magnesium sulphate, sodium sulphate, zinc sulphate, copper sulphate; lithium acetate, lithium bicarbonate, lithium citrate, lithium metaborate, lithium vanadate and lithium tungstate.
- 13. The method of claim 8 wherein said anode comprises platinum or nickel.
- 14. The method of claim 3 wherein the silicate containing medium further comprises at least one dopant.
- 15. The method of claim 14 wherein the dopant comprises at least one member selected from the group consisting of molybdenum, chromium, titanium, zircon, vanadium, phosphorus, aluminum, iron, boron, bismuth, gallium, tellurium, germanium, antimony, niobium, magnesium, manganese, and their oxides and salts.
- 16. The method of claim 3 further comprising prior to said exposing contacting said surface with at least one member selected from the group consisting of nitric acid, citric acid and ammonium dibasic citrate.
- 17. The method of claim 14 wherein the dopant is provided by the anode of the electrolytic environment.
- 18. The method of claim 3 wherein said adherent composition comprises at least one member chosen from the group of latex, silanes, epoxies, silicone, amines, alkyds, urethanes and acrylics.
- 19. An article comprising an electrically conductive substrate at least a portion of which has an inorganic and chromate free surface and at least one composition adhered to said surface.
- 20. A product formed according to the method of claim 1 or 3 wherein said product comprises a zinc surface and has an ASTM B117 exposure to white rust of greater than 72 hours.
- 21. A substrate having a surface treated according to the method of claim 1 or 3 wherein the surface comprises an ablative surface that reduces molten metal adhesion to the surface relative to an untreated surface.
Parent Case Info
[0001] The subject matter herein claims benefit of U.S. patent application Ser. No. 09/775,072, filed on Feb. 1, 2001 that is a continuation in part of U.S. Ser. No. 09/532,982, filed on Mar. 22, 2000 that is a continuation in part of U.S. Ser. No. 09/369,780, filed on Aug. 6, 1999 (now U.S. Pat. No. 6,153,080) that is a continuation in part of Ser. No. 09/122,002, filed on Jul. 24, 1998 that is a continuation in part of Ser. No. 09/016,250, filed on Jan. 30, 1998 (now U.S. Pat. No. 6,149,794) in the names of Robert L. Heimann et al. and entitled “An Electrolytic Process For Forming A Mineral”; the entire disclosures of which are hereby incorporated by reference. The subject matter of this invention claims benefit under 35 U.S.C. 111(a), 35 U.S.C. 119(e) and 35 U.S.C. 120 of U.S. Provisional Patent Application Serial Nos. 60/036,024, filed on Jan. 31, 1997 and Ser. No. 60/045,446, filed on May 2, 1997 and entitled “Non-Equilibrium Enhanced Mineral Deposition”. The disclosure of the previously filed provisional patent applications is hereby incorporated by reference.
Divisions (1)
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Number |
Date |
Country |
Parent |
09814641 |
Mar 2001 |
US |
Child |
10378983 |
Mar 2003 |
US |
Continuation in Parts (5)
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Number |
Date |
Country |
Parent |
09775072 |
Feb 2001 |
US |
Child |
09814641 |
Mar 2001 |
US |
Parent |
09532982 |
Mar 2000 |
US |
Child |
09775072 |
Feb 2001 |
US |
Parent |
09369780 |
Aug 1999 |
US |
Child |
09532982 |
Mar 2000 |
US |
Parent |
09122002 |
Jul 1998 |
US |
Child |
09369780 |
Aug 1999 |
US |
Parent |
09016250 |
Jan 1998 |
US |
Child |
09122002 |
Jul 1998 |
US |