This application claims priority from Japanese Patent Application Serial No. 2009-254483 filed Nov. 6, 2009, the contents of which are incorporated herein by reference in their entirety.
The present invention relates to an excimer lamp, and, especially, an excimer lamp in which rare gas and fluorine are enclosed in an arc tube made of translucent ceramics.
In an excimer lamp, an arc tube, which serves as dielectrics, is arbitrarily filled up with light emission gas and halogen, wherein excimer molecules are generated in the arc tube by dielectric barrier discharge, so that excimer light is emitted from the excimer molecules. Such a lamp is used as an ultraviolet ray light source for photochemical reactions. In such an excimer lamp, rare gas (argon, krypton, xenon, etc.) and fluorine are enclosed as an electric discharge gas depending on the wavelength of excimer light to be obtained.
The present invention relates to an excimer lamp that has a translucent ceramics arc tube that encloses a rare gas and a fluorine; and at least one of a set of external electrodes formed on an outer surface of the translucent ceramics arc tube where 2.5+0.5 log(CF)≦G≦14−4 log(CF) is satisfied when 0.1≦CF≦10. G (mm) is a discharge gap in the arc tube and CF (%) is a molar concentration of fluorine.
Other features and advantages of the present excimer lamp will be apparent from the ensuing description, taken in conjunction with the accompanying drawings, in which:
A problem exists where an optical output emitted from an excimer lamp decreases. Rare gas and fluorine are needed for an excimer lamp's optical output when that excimer lamp uses fluorine, as discharge gas, and has a silica glass electric discharge container. When the fluorine is taken up into the silica glass, the fluorine amount in the electrical discharge space decreases. Thus, because the fluorine decreases the production amount of excimer molecules generated by the rare gas and the fluorine also decrease, and, in turn, the optical output emitted from the excimer lamp decreases.
The cause of fluorine being taken up into the silica glass maybe for the reasons considered below. That is, when the silica glass, which forms the electric discharge container receives irradiation of a lot of ultraviolet rays emitted from excimer molecules, a part of (═Si—O—Si═) binding of a surface is broken, which forms a defect, such as ═Si. (“.” means an unpaired electron, and “=” means “combined with oxygen”) that reacts with the fluorine in the electrical discharge space. Therefore, the amount of production of the excimer molecules generated by the fluorine and the rare gas decreases, thereby decreasing the optical output thereof.
To solve such a problem, Japanese Patent Application Publication No. 2009-59606 used an excimer lamp, in which an arc tube is formed using material other than silica glass, for example, sapphire, which is less reactive with fluorine. On the other hand, because high illuminance and illuminance stability are required for an excimer lamp it is difficult to find out the optimal lamp conditions, where they are simultaneously satisfied.
In view of the above-mentioned problems, it is an object of the present invention to offer an excimer lamp that can simultaneously fulfill the requirements of high illuminance and illuminance stability without decreasing an optical output emitted from the excimer lamp despite the passage of time.
To solve the above-mentioned problem, in the present excimer lamp, in which an arc tube made of translucent ceramics encloses a rare gas and fluorine, and external electrodes are provided on an outer face of the arc tube, a condition of 2.5+0.5 log(CF)≦G≦14−4 log(CF) should be satisfied when 0.1≦CF≦10, where is G (mm) is a discharge gap in the arc tube and CF (%) is a molar concentration of fluorine.
According to the present invention, it is possible to realize an excimer lamp with high illuminance and high illuminance stability by meeting these conditions.
Description of an embodiment of the present invention will be given below, referring to
A gas pipe 23 made of nickel is provided in one of the caps 22, and after air in the arc tube 2 is discharged and the pressure is reduced through the gas pipe 23, rare gas and fluorine are enclosed. After enclosing these substances, an end portion of the gas pipe 23 is sealed by pressure welding, which forms a sealed structure of the arc tube 2.
When nickel or an alloy whose main ingredient is nickel is used for the caps 21 and 22, reactivity with fluorine is low, which allows the reduction speed of the halogen in the arc tube 2 to be controlled. Thus, even if a lamp is lighted for a long time, it is possible to reduce a drop of an optical output.
A pair of external electrodes 3 is arranged on an outer surface of the arc tube 2. As shown in
Electric discharge is generated between the pair of external electrodes 3 through the arc tube 2 by impressing voltage between the external electrodes 3 at the time of lamp lighting. When argon (Ar) and sulfur hexafluoride (SF6) are enclosed in the arc tube 2, they are ionized so that argon ions and fluorine ions are formed, and excimer molecules that are made of argon-fluorine are formed. Thus, light with a wavelength of approximately 193 nm is emitted from the arc tube 2.
As shown in
These excimer lamps, whose discharging gap (G) and F2 molar concentration (CF) in enclosed gas were changed variously, were prepared. By electric discharge, which was formed in the discharge space by supplying electric power from high voltage/high frequency power supply for lighting (peak voltage was 3 kV, and lighting frequency was 50 kHz), illuminance of ArF excimer light with wavelength of 193 nm (illuminance at a distance of 5 mm from a lamp surface) and illuminance stability (illuminance stability at a distance of 5 mm from a lamp surface) were examined.
As shown in Table 1, there are big differences in illuminance depending on a value of the discharging gap (G), and the illuminance becomes rapidly high, when the discharging gap (G) is a certain size (2 mm) or larger. On the other hand, when the discharging gap (G) becomes larger than a certain size (18 mm), the illuminance stability becomes worse, and it becomes impossible to turn on the lamp. More specifically, although discharge plasma is uniformly distributed over the electrical discharge space when the discharging gap (G) is small (less than 2 mm), as the discharging gap (G) is larger (2 mm or more), a filament, which is formed by convergence of plasma, comes to be included therein. It is presumed that high intensity radiation comes out from the filament. When the discharging gap (G) is widened to some extent (18 mm), the above-mentioned filament moves around in the space, that is, the filament wobbles whereby the illuminance instability becomes worse.
Because of the above mentioned reasons, as shown in Tables 1-6, when the F2 molar concentration (CF) was changed (that is, 0.1%, 0.5%, 1.0%, 2.0%, 5.0%, and 10.0%) the range in which overall judgment was considered acceptable (symbol “∘”) was identified.
2.5+0.5 log (CF)≦G≦14−4 log(CF)
In addition, the lowest of log in this formula is 10.
Although in the experimental results shown in Tables 1-6, argon is used for the rare gas, since the behavior of the filament depends on fluorine even when krypton or xenon is used as the rare gas, there is no change in the numerical value range.
The preceding description has been presented only to illustrate and describe exemplary embodiments of the present excimer lamp. It is not intended to be exhaustive or to limit the invention to any precise form disclosed. It will be understood by those skilled in the art that various changes may be made and equivalents may be substituted for elements thereof without departing from the scope of the invention. In addition, many modifications may be made to adapt a particular situation or material to the teachings of the invention without departing from the essential scope. Therefore, it is intended that the invention not be limited to the particular embodiment disclosed as the best mode contemplated for carrying out this invention, but that the invention will include all embodiments falling within the scope of the claims. The invention may be practiced otherwise than is specifically explained and illustrated without departing from its spirit or scope.
Number | Date | Country | Kind |
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2009-254483 | Nov 2009 | JP | national |
Number | Name | Date | Kind |
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6379024 | Kogure et al. | Apr 2002 | B1 |
7187138 | Kogure | Mar 2007 | B2 |
20090058299 | Oda et al. | Mar 2009 | A1 |
Number | Date | Country |
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2009-59606 | Mar 2009 | JP |
Number | Date | Country | |
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20110109225 A1 | May 2011 | US |