Claims
- 1. A film formed from an ethylene copolymer composition comprising:(A-4) an ethylene/α-olefin copolymer of ethylene with an α-olefin of 3 to 20 carbon atoms having such properties that (i) the density (d) is in the range of 0.880 to 0.960 g/cm3, (ii) the melt flow rate (MFR) at 190° C. under a load of 2.16 kg is in the range of 0.01 to 200 g/10 min, (iii) the temperature (Tm(° C.)) at which the endothermic curve of said copolymer measured by a differential scanning calorimeter (DSC) shows the maximum peak and the density (d) satisfy the relation Tm<400×d−250, (iv) the melt tension (MT(g)) at 190° C. and the melt flow rate (MFR) satisfy the relation MT≦2.2×MFR−0.84, and (v) the amount (W(% by weight)) of a decane-soluble portion at 23° C. and the density (d) satisfy the relation, in the case of MFR≦10 g/10 min, W<80×exp(−100(d−0.88))+0.1 in the case of MFR>10 g/10 min, W<80×(MFR−9)0.26×exp(−100(d−0.88))+0.1; and (B-4) a high pressure radical polymerization low-density polyethylene having such properties that (i) the melt flow rate (MFR) is in the range of 0.1 to 50 g/10 min, and (ii) the molecular weight distribution (Mw/Mn, Mw=weight-average molecular weight, Mn=number-average molecular weight) measured by GPC and the melt flow rate (MFR) satisfy the relation 7.5×log(MFR)−1.2≦Mw/Mn≦7.5×log(MFR)+12.5; a weight ratio ((A-4):(B-4)) between said ethylene/α-olefin copolymer (A-4) and said high pressure radical polymerization low-density polyethylene (B-4) being in the range of 98:2 to 70:30.
- 2. The film formed from the ethylene copolymer composition of claim 1 wherein the ethylene/α-olefin (A-4) contains ethylene units in an amount of from 55 to 99% by weight and α-olefin units in an amount of from 1 to 45% by weight.
- 3. The film formed from the ethylene copolymer composition of claim 1 wherein the ethylene/α-olefin copolymer (A-4) contains unsaturated bonds in an amount of not more than 0.5 per 1000 carbon atoms and less than 1 per molecule of the ethylene copolymer.
- 4. The film formed from the ethylene copolymer composition of claim 1 wherein the high-pressure radical polymerization low-density polyethylene (B-4) has a density in the range of from 0.910 to 0.930 g/cm3.
- 5. The film formed from the ethylene copolymer composition of claim 1 wherein the weight ratio of (A-4) to (B-4) is in the range of from 98:2 to 80:20.
- 6. The film formed from the ethylene copolymer composition of claim 1 wherein the ethylene/α-olefin copolymer (A-4) is obtained by copolymerizing ethylene and α-olefin having 3 to 20 carbon atoms in the presence of an olefin polymerization catalyst formed from (a) a metallocene compound, (b) an organoaluminum oxy-compound, (c) a carrier, and, optionally, (d) an organoaluminum compound catalyst component.
- 7. The film formed from the ethylene copolymer composition of claim 1 wherein the ethylene/α-olefin copolymer (A-4) is obtained by copolymerizing ethylene and α-olefin having 3 to 20 carbon atoms in the presence of an olefin polymerization catalyst formed from (a) transition metal compound catalyst component represented by the following formula (VI), (b) an organoaluminum oxy-compound, (c) a carrier, and, optionally, (d) an organoaluminum compound catalyst component;MLX (VI) whereinM is a transition metal atom selected from Group IVB of the periodic table, L is a ligand coordinating to the transition metal atom, at least two of L are cyclopentadienyl groups, methylcyclopentadienyl groups, ethylcyclopentadienyl groups or substituted cyclopentadienyl groups having at least one substituent selected from hydrocarbon groups of 3 to 20 carbon atoms, and L other than the (substituted) cyclopentadienyl group is a hydrocarbon group of 1 to 12 carbon atoms, an alkoxy group, an aryloxy group, a halogen atom, a trialkylsilyl group or a hydrogen atom, and X is a valence of the transition metal M.
Priority Claims (8)
Number |
Date |
Country |
Kind |
4-157937 |
Jun 1992 |
JP |
|
4-157938 |
Jun 1992 |
JP |
|
4-239279 |
Sep 1992 |
JP |
|
4-239280 |
Sep 1992 |
JP |
|
5-68281 |
Mar 1993 |
JP |
|
5-68850 |
Mar 1993 |
JP |
|
5-68851 |
Mar 1993 |
JP |
|
5-682821 |
Mar 1993 |
JP |
|
CROSS-REFERENCE TO RELATED APPLICATIONS
This application is a continuation of Ser. No. 09/628,713, filed Jul. 28, 2000, now abandoned; which is a continuation of Ser. No. 09/204,553, filed Dec. 3, 1998 (ABN); which is a continuation of Ser. No. 08/816,043, filed Mar. 11, 1997 (ABN); which is a division of Ser. No. 08/429,010, filed Apr. 26, 1995 (U.S. Pat. No. 5,674,945); which is a continuation of Ser. No. 08/077,352, filed Jun. 16, 1993 (ABN).
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Continuations (4)
|
Number |
Date |
Country |
Parent |
09/628713 |
Jul 2000 |
US |
Child |
09/949675 |
|
US |
Parent |
09/204553 |
Dec 1998 |
US |
Child |
09/628713 |
|
US |
Parent |
08/816043 |
Mar 1997 |
US |
Child |
09/204553 |
|
US |
Parent |
08/077352 |
Jun 1993 |
US |
Child |
08/429010 |
|
US |