Evaporation source and method of depositing thin film using the same

Abstract

An evaporation source and method for depositing a thin film, including a crucible having a predetermined space for placing a deposition material and at least one baffle, the baffle positioned inside the crucible and parallel to the predetermined space to divide the crucible into a plurality of channels, a heating unit, and at least one spray nozzle in fluid communication with the crucible, the spray nozzle having a plurality of spray orifices.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other features and advantages of the present invention will become more apparent to those of ordinary skill in the art by describing in detail exemplary embodiments thereof with reference to the attached drawings, in which:

FIG. 1 illustrates a perspective view of an apparatus for depositing a thin films using an evaporation source according to an embodiment of the present invention;

FIG. 2A illustrates a cross-sectional view of an evaporation source according to an embodiment of the present invention taken along the line I-I′ of FIG. 1;

FIG. 2B illustrates a cross-sectional view of a direction of movement of an evaporated deposition material inside an evaporation source according to an embodiment of the present invention taken along the line I-I′ of FIG. 1;

FIG. 3A illustrates a plan view of an evaporation source according to an embodiment of the present invention taken along the line II-II′ of FIG. 1; and

FIG. 3B illustrates a plan view of a direction of movement of an evaporated deposition material inside an evaporation source having a shower head structure according to an embodiment of the present invention taken along the line II-II′ of FIG. 1.

Claims

1. An evaporation source, comprising: a crucible including a predetermined space for placing a deposition material and at least one baffle, the baffle positioned inside the crucible and parallel to the predetermined space to divide the crucible into a plurality of channels;a heating unit; andat least one spray nozzle in fluid communication with the crucible, the spray nozzle having a plurality of spray orifices.

2. The evaporation source as claimed in claim 1, wherein the baffle comprises a plurality of baffle plates.

3. The evaporation source as claimed in claim 2, wherein the plurality of baffle plates comprises at least three parallel baffle plates.

4. The evaporation source as claimed in claim 1, wherein the crucible further comprises an induction channel.

5. The evaporation source as claimed in claim 1, further comprising a deposition rate measuring unit.

6. The evaporation source as claimed in claim 1, further comprising at least one reflector positioned between the heating unit and a housing wall of the evaporation source.

7. The evaporation source as claimed in claim 1, further comprising an insulating plate.

8. The evaporation source as claimed in claim 7, wherein the spray nozzle protrudes through the insulating plate.

9. The evaporation source as claimed in claim 1, wherein the evaporation source is movable.

10. The apparatus as claimed in claim 1, wherein the deposition material is an organic light-emitting material.

11. A method of depositing a thin film, comprising: providing an evaporation source including a heating unit, at least one spray nozzle, and a crucible with at least one baffle into a processing chamber;placing a substrate in the processing chamber, such that a surface of the substrate to be coated is facing the evaporation source;activating the heat unit, such that a deposition material in the crucible is evaporated;passing the evaporated deposition material through the baffle of the crucible to form a uniform deposition fluid; andspraying the uniform deposition fluid through the spray nozzle onto the substrate to form a thin film.

12. The method as claimed in claim 11, wherein passing the evaporated deposition material through a baffle comprises passing the evaporated deposition material through a plurality of baffle plates.

13. The method as claimed in claim 11, further comprising operating a deposition rate measuring unit.

14. The method as claimed in claim 11, wherein spraying the uniform deposition fluid comprises moving the evaporation source.

15. The method as claimed in claim 11, wherein activating the heating unit comprises evaporating an organic light-emitting material.

16. The method as claimed in claim 11, further comprising providing a vacuum environment in the processing chamber.