The invention generally relates to thin-film forming apparatuses and crucibles used in evaporation apparatuses for thin film forming. Particularly, it relates to crucibles for evaporation of alloys or metals. Specifically it relates to an evaporation crucible and to an evaporation apparatus.
For thin-film coating of a material on a substrate, an evaporator can be used. For example, coatings with metal films, which e.g. provide a capacitor of a large panel display or a protective layer on a web, can be applied with evaporators. Specifically, for large panel displays, a substrate, which can be provided as a large and relatively thin glass plate, might be vertically positioned in a coating process and coated with a vertical evaporator.
Particularly for vertical evaporation, a source for a material vapor to be deposited on a substrate is commonly provided with a vertical nozzle pipe, which defines a linear vertically extending source for coating a vertically aligned substrate.
The linear sources provided thereby have a high complexity and are expensive to manufacture and to maintain.
Additionally, different temperature areas, which have been suggested for evaporation crucibles, can have an insufficient stability because the material to be evaporated can migrate in various areas of a crucible and can also dissolve portions of the crucible, whereby a temperature customization can be deteriorated.
In light of the above, the present invention provides an evaporation crucible according to independent claims 1, 3 and 22, and an evaporation apparatus according to claim 24.
According to one embodiment, an evaporation crucible is provided. The evaporation crucible includes: an electrically conductive chamber tube having a wall forming an enclosure, the chamber tube having a tube axis; a first electrical connection; a second electrical connection, wherein the first and the second electrical connection being adapted for providing a heating current substantially parallel to the tube axis; at least one feeding opening; and at least one distributor orifice.
According to another embodiment, an evaporation crucible is provided. The evaporation crucible includes: an electrically conductive chamber tube having a wall forming an enclosure; at least two distributor orifices or a distributor orifice being slit-shaped shaped, the at least two distributor orifices or the distributor orifice being slit-shaped are formed in the wall of the chamber tube and define a preferential direction; a first electrical connection; a second electrical connection, wherein the first and the second electrical connection being adapted for providing a heating current substantially parallel to the preferential direction; and at least one feeding opening.
According to yet another embodiment, an evaporation crucible is provided. The evaporation crucible includes: an electrically conductive chamber tube having a wall such that an enclosure is formed, the chamber tube having a tube axis; a first electrical connection; a second electrical connection, wherein the enclosure includes a melting-evaporation area; at least one feeding opening; and at least one distributor orifice.
According to another embodiment, an evaporation apparatus including at least one evaporation crucible is provided. The evaporation crucible includes: an electrically conductive chamber tube having a wall, the chamber tube having a tube axis; a first electrical connection; a second electrical connection, wherein the first and the second electrical connection being adapted for providing a heating current substantially parallel to the tube axis; at least one feeding opening; and at least one distributor orifice in the wall of the chamber
Further advantages, features, aspects and details that can be combined with the above embodiments are evident from the dependent claims, the description and the drawings.
Embodiments are also directed to apparatuses for carrying out the disclosed methods and including apparatus parts for performing each described method steps. These method steps may be performed by way of hardware components, a computer programmed by appropriate software, by any combination of the two or in any other manner. Furthermore, embodiments are also directed to methods by which the described apparatus operates or is manufactured. It includes method steps for carrying out functions of the apparatus or manufacturing parts of the apparatus.
Some of the above indicated and other more detailed aspects of the invention will be described in the following description and partially illustrated with reference to the figures. Therein:
a shows a schematic view of an even further evaporation crucible including electrical connections and a chamber tube according to the embodiments described herein;
b and 3c show other schematic views of the evaporation crucible of
a to 4d show schematic views of evaporation crucibles, and illustrate different distributor orifices according to the embodiments described herein;
a to 6c show schematic views of evaporation crucibles including electric connections, a chamber tube and differently shaped distributor orifices according to embodiments described;
a and 9b show schematic views of connections between chamber tube portions.
Without limiting the scope of the present application, in the following aluminum is mainly described as a material to be deposited on a substrate. The invention is also directed to metals, alloys or other materials to be evaporated and, e.g., used for the coating of a substrate. Further, without limiting the scope of the present invention, a substrate is typically referred to as a glass substrate as often used for display technology, e.g., displays. Embodiments of the present invention can be applied to thin-film vapor deposition on other substrates and for other technologies.
Without limiting the scope of the present application a cylinder is herein mainly described as a circular cylinder. A cylinder as claimed and as described herein can also be directed to other forms of cylinders like elliptical cylinders or cylinders based in geometrical shapes like squares, rectangles, triangles, pentagons or the like.
Within the following description of the drawings, the same reference numbers refer to the same components. Generally, only the differences with respect to the individual embodiments are described.
According to one embodiment, the cylinder can be a circular cylinder. According to other embodiments described herein, the chamber tube 120 may also be provided as a cylinder based on other geometrical shapes. Thereby, according to other embodiments, also elliptical cylinders, oval cylinders or angular cylinders may be provided. The evaporation crucible 100 and the chamber tube 120, respectively have a tube axis 2. The tube axis 2 corresponds with the axis of the cylinder, that is, the tube axis is parallel to the height of the cylinder.
In
According to embodiments defined herein, the direction of the heating current is such that at least 70% of the heating current flows parallel or substantially parallel to the tube axis within the chamber tube or within the area of the chamber tube including an orifice 170. Accordingly, currents flowing around openings in the chamber tube wall are a minority of the entire current flowing in the chamber tube.
Generally, the portions of the evaporation crucible can be, for example, provided as follows. Thereby, it is to be understood that the portions of the evaporation crucible can overlap or at least partly overlap with each other. The wide portion of the electrical connections 162 and 182 respectively, have a large cross-sectional area to provide a relatively low current density and, thereby, a relatively cool portion that can be in contact with e.g. connecting elements including copper. The cross-sectional area reducing portion 163 provides transition to the heating portion 164. The heating portion and the chamber tube have a smaller cross-sectional area as compared to the electrical connections. Thereby, the heating portion and the chamber tube are heated by the heating current. The cross-sectional area reducing portion 163 and the heating portion 164 provide a customization of the heat generation, which is conducted in the chamber tube for melting and evaporating material.
The connecting portion of the electrical connections may, according to further embodiments, also be formed by one or more protrusions, which extend radially outward with respect to the axis 2. Thereby, a clamp of a connecting element of an evaporation apparatus to contact an electrical connection of the evaporation crucible can contact the protrusion. As another example, a connection element 182 in
The material to be deposited is melted and evaporated by heating the evaporator crucible 100. Heating can be conducted by providing a power source (not shown) connected to the first electrical connection 162 and the second electrical connection 182. Thereby, heating is conducted by the current flowing through the body 120 of the crucible 100. Generally, within the regions having a smaller cross-sectional area, the resistance of the body of the evaporation crucible is increased. Thereby, the heating power can be calculated according to equation P=R I2, wherein P is the power, R is the resistance and I is the current. As a result of the proportion between the resistance and the cross-sectional area, the temperature is increased in regions having a smaller cross-sectional area. Thus, it is possible to control the resistances of the different areas of the crucible such that desired temperatures are provided in the different areas. For example, the temperature in the melting-evaporation area in the chamber 130 can be in the range of 700° C. to 1600° C. or 1300° C.-1600° C.
As another example, the temperature in the melting-heating area of the chamber 130 is above the evaporation temperature of the material to be deposited. However, a wire provided for feeding the material results in a local decrease in the temperature in a small portion of the melting-evaporation area. Accordingly, according to further embodiments, the temperature is at least 200° C. above the evaporation temperature, e.g., 200° C. to 900° C. or 600° C. to 870° C. above the evaporation temperature. For example, for aluminum, the temperature can be above 900° C. or above 1150° C.
Typically, a lower limit of the temperature depends on the melting temperature of the material to be deposited and the chamber pressure. Typically, an upper limit of the temperature can be given by the temperature stability of the evaporation crucible.
According to further embodiments, the resistance of different areas of the evaporator crucible 100 can further be controlled by changing the material composition of the evaporator crucible.
Generally, according to embodiments described herein, the materials of the crucible should be conductive, the materials should be temperature resistant to the temperatures used for melting and evaporating, and the materials should be resistant with regard to the liquid materials or the material vapor, respectively. For example, liquid aluminum is highly reactive and can provide significant damage to crucibles for melting aluminum. According thereto, materials selected from the group consisting of a metallic boride, a metallic nitride, a non-metallic boride, a non-metallic nitride, nitrides, borides, graphite, TiB2, a combination of TiB2 and AIN, a combination of TiB2 and BN, and combinations thereof can be used.
The difference in electrical resistivity of these materials can be used to further adapt the heat generation in the crucible. Thereby, the material composition in the different regions can be chosen to have a corresponding resistivity depending on the desired heat generation in the respective regions.
As show in
Typically, the material to be evaporated can be fed into the chamber tube with a material wire passing through the opening. Thereby, the wire can be fed in the chamber at an inclined angle with respect to the chamber surface. Particularly for the inclined feeding, an inner portion of the heated chamber wall may be contacted with the wire. Thereby, the material of the wire is melted.
In
According to embodiments described herein, an distributor orifice is a distributor orifice of the chamber tube or distributor orifices are distributor orifices of the chamber tube.
According to embodiments described herein, the melting-evaporation area is closed to a maximum degree. Thus, only a small amount of vapor leaves the chamber in an undesired direction (e.g. in the direction of the opening for feeding the material).
Typically, a lower limit of the temperature depends on the melting temperature of the material to be deposited and the chamber pressure. Typically, an upper limit of the temperature can be given by the temperature stability of the evaporation crucible.
As shown in
Vapor deposition of thin films may, for example, be applied for organic light emitted diodes (OLED), for other display devices (e.g. TFT), or generally for thin-film coating on glass substrates or foils. As an example, thin metal films are provided for display applications in order to control individual pixels of a display.
Typically, for applications providing a vapor deposition for vertically arranged substrates, a linear evaporator unit with a nozzle pipe, which redirects vapor emitted by an evaporation area of an elongated crucible, can be used. Thereby, the vertically arranged substrate can be transported past the linear evaporation apparatus in a horizontal direction for thin film coating of the substrate. However, the system of the nozzle pipe for redirecting the material vapor out of a vertical pipe along horizontal evaporation axes and the commonly used crucibles are complex and difficult to maintain. Since vertical substrate arrangement is desired in light of particle contamination and bending of the substrates, it is desirable to have a simplified evaporation source for vertical evaporation applications. Embodiments of evaporation crucibles described herein can be used as a linear source for a vertical evaporation apparatus.
Evaporation crucibles as described herein can be utilized for inline evaporation apparatuses for vertically transported substrate with a directed evaporation direction (e.g. line-shaped). The arrangement of the evaporation crucible can be simplified and, thereby, reduces costs. For example, this is due to the limited number of components requiring maintenance.
As a further example, the embodiments described herein can be utilized for the coating of substrates for display technology or the like. Thereby, substrate size may be as follows: A typical glass substrate and, thereby, also a coating area can have dimensions of about 0.7 mm×370 mm×470 mm. Yet, next generation substrates can have a size of about 1100 mm×1300 mm or larger. For example, applications described herein refer typically to large substrates. Thereby, a large substrate can have a height and length of 500 mm or above. This can typically be 680 mm×880 mm, 1100 mm×1300 mm or larger in the case of glass substrates. Typical large flexible substrates, e.g., foils, can have a width of at least 500 mm.
According to the embodiments described with respect to
Within the chamber, the material is melted and upon further heating evaporated in the melting-evaporation area. The material vapor leaves the chamber through distributor orifices 170 and can thereafter be deposited on a substrate.
According to even further embodiments, which might be combined with other embodiments herein, a distributor orifice can be provided with a channel length of 3 to 20 mm along an evaporation axis. According to even further embodiments, the width of the orifice is above 2 mm, for example, in the range of 5 to 6 mm. The length of a slit can, for example, be up to 80 mm or higher and might extend substantially along the axial length of the chamber tube.
According to different embodiments, the chamber has a dimension in the direction of the axis 2 in the range of 80 mm to 1500 mm, or even up to 2000 mm. According to further embodiments, the diameter of chambers can be in the range of 10 mm to 200 mm, or in the range of 20 mm to 50 mm.
According to embodiments described herein, the melting-evaporation area is to be understood as an area in which the material to be evaporated is melted and evaporated. Thereby, a one chamber system with similar pressure conditions within the chamber may be provided. Additionally or alternatively, other separation means for separating a melting area and an evaporation area within the chamber might, according to embodiments described herein, be omitted. Accordingly, problems with migration of the very thin liquid material films or problems with a timely variation of customized temperature profiles in light of dissolving of portions of the evaporation crucible can be prevented.
According to embodiments described herein, the melting zone (e.g., a surface) of the melting evaporation area is within the evaporation zone.
A melting zone within the evaporation zone can e.g., be understood as having a reduced gas pressure region within the evaporation zone, for example in the range of 10% or 20%, in the melting-evaporation-area.
A melting zone within the evaporation zone can, as another example, be understood as having the melting zone (e.g., a surface) within the main evaporation zone, that is, for example, the zone in which at least 50% or 75% of the evaporation is conducted.
Thereby, the possibility of a splashboard, a faceplate for controlling splashing or the like does not affect the functionality of the melting-evaporation area.
The evaporation crucible 100 includes an enclosure wherein the material to be deposited is melted and evaporated. If the material, for example aluminum, is provided by continuously feeding the material to be deposited with a feeding wire or pellets, an equilibrium can be maintained such that the amount of material in the system is substantially constant. Thereby, the amount of material inserted in the system is provided by the diameter and the feeding speed of the feeding wire. In order to provide an equilibrium, the amount of material which is evaporated from the evaporator crucible 100, and the amount of material fed in the system should be similar. The evaporation amount can additionally or alternatively be controlled by the heating current. Further, according to embodiments described herein, non-continuous feeding with a wire, pellets and the like can be realized.
As shown in
According to embodiments described herein, the shape of the evaporation crucible can be designed to have different cross-sections. As shown in
The heating portions on both sides and adjacent to the chamber provide an improved symmetric heating as compared to only locally heating the chamber. By providing a heat generation in the chamber that is not extensive as compared to the heat generation in the adjacent heating portions 164 results in a more homogeneous temperature within the chamber and, thereby, the melting-evaporation area.
According to further embodiments, if for example the chamber tube in the form of a circular cylinder is provided, and the first electrical connection and the second electrical connection are also rotational symmetric, a highly symmetric arrangement of an evaporation crucible can be realized. Thereby, besides the small irregularities of the openings 134 and the distributor orifices 170, a symmetric heat current distribution and a symmetric heating is provided.
According to an even further embodiment, if the distributor orifices 170 are provided on a straight line parallel to the chamber tube axis 2, a heat generation irregularity is only provided along one line on the cylinder wall 132.
Within the wall of the chamber tube 120 two openings 134 for feeding the material to be evaporated is provided. For example, the material can be inserted in the chamber 130 by a material wire.
Generally, for embodiments described herein, at least one feeding opening is provided. According to other embodiments, two or more feeding openings can be provided. According to even further embodiments, one or more of the feeding openings can be provided in the wall of the chamber tube, the electrical connection element 162, and/or the cover 150.
According to further embodiments, the feeding opening can be provided with a bushing (not shown) to insert the wire in the chamber through the bushing. According to an even further embodiment, which can be combined with the bushing or which can be provided separately, the opening in the chamber wall 132 is inclined with respect to the chamber wall. Thereby, the wire can be inserted towards the bottom of the chamber. According to an even further embodiment, the opening in the chamber wall is provided with a chamfered edge.
At another portion of the chamber tube (in
A further embodiment of an evaporation crucible 300 is explained with respect to
a shows an opening 134 for feeding a wire 102 into the chamber 130. As indicated by the oval shape of the sectional view of the opening 134, an, e.g., round bore in the wall 132 of the chamber tube is provided such that the inserted wire can be directed on the inner chamber wall of the chamber tube. A schematic further sectional side view is shown in
At a different portion of the chamber wall, the distributor orifices 170 are provided along a straight line in the wall of the chamber tube. According to other embodiments, the distributor orifices are not necessarily provided on a straight line, but may also be provided on two or more straight lines or may be arranged otherwise with regard to the chamber tube. As shown in
Accordingly, for embodiments described herein, two or more distributor orifices can be arranged arbitrarily, to be essentially on a straight line, or to be on a straight line. Thereby, a preferential direction of the two or more distributor orifices is defined by the straight line. Further, in the case of one distributor orifice being a slit, the long dimension of the slit can define the preferential direction of the distributor orifice.
Generally, for embodiments described herein, the heating current that is the majority of the heating current, e.g. at least 70%, in the chamber tube or within the area of the chamber tube including an orifice 170 can be substantially parallel to the tube axis and/or to the preferential direction of the distributor orifice or of the distributor orifices, respectively.
Further embodiments of distributor orifices will next be described with respect to
a shows a circular distributor orifice 470. The distributor orifice can be provided as a symmetric bore in the wall of the chamber tube. According to other embodiments, the bore can be provided with chamfered edges or may be inclined with respect to the surface of the wall of the chamber tube. Thereby, an inclination towards the direction of axis 2 and/or perpendicular to axis 2 can be realized. According to a further embodiment, two or more distributor orifices 470 can be provided.
b shows a square distributor orifice 470′. Similarly to the orifice described with respect to
d shows an evaporation crucible 400 including two distributor orifices 470′″. Contrary to the embodiments shown with respect to
According to the embodiments of orifices described above, an evaporation distribution is provided that can be customized by the shape, the diameter, the bore in the wall, and by the wall thickness, which defines a length along the directional evaporation axis of the orifice. According to different embodiments, the shape of the distributor orifice can be round, oval, elliptical, angular, cylindrical, slit shaped, or formed in another way. According to yet another embodiment, which might be combined therewith, the direction of the bore can be horizontal or inclined with respect to the chamber wall surface. Further, it is additionally or alternatively possible to have the edges of the bore chamfered.
According to even further embodiments, which might be combined with other embodiments herein, a distributor orifice can be provided with a channel length of 3 to 20 mm along an evaporation axis. According to even further embodiments, the width of the orifice is above 2 mm, for example, in the range of 5 to 6 mm. The length of a slit can, for example, be up to 80 mm or higher and might extend substantially along the axial length of the chamber tube.
A further evaporation crucible 500 is shown in
According to one embodiment, the connections between the electrical connections and the first chamber tube portion can be realized by a step like or groove like (tongue and groove connections) centering element in one or both of the components to be connected.
In some embodiments described herein, the chamber tube and the first and second electrical connection are formed as separate elements connected to each other. Thus, with regard to
According to different embodiments, a connection between chamber portions or between a chamber portion and a connection element can also be realized as shown in
a shows a further evaporation crucible 600. The evaporation crucible 600 includes a first electric connection 162 at a chamber tube end and a second electric connection 182 at another chamber tube end. The electrical connection, the chamber tube, and the other electrical connection are arranged in this order along the direction of the axis of the chamber tube. As shown in
According to even further embodiments (see
As an exemplary embodiment, a method of forming a thin film with an evaporation crucible described herein can be carried out by using an apparatus which is entirely placed in a vacuum atmosphere of 10−2 to 10−6 mbar. Thereby, the thin film can be vapor deposited on a substrate or a carrier foil without contamination of particles from the ambient atmosphere.
According to embodiments described herein, a method of evaporating a material includes: providing a chamber with a melting-evaporation area, and inserting a solid material to be evaporated in the melting-evaporation area.
A further arrangement of evaporation crucibles 100 in an evaporation apparatus 800 is shown in
It is further possible that within one crucible, distributor orifices are also inclined with respect to the tube axis. Thereby, they can be vertically or horizontally arranged in spite of the inclination of the crucible itself. According to a further embodiment, the rotated distributor orifices may, however, still be provided on a straight line. According to embodiments described herein, in which distributor orifices are arranged along a straight line that is parallel to the tube axis of the evaporation crucible, the influence of the distributor orifices on the heating current distribution is minimized.
Evaporation crucibles as described herein can be utilized for inline evaporation apparatuses for vertically transported substrate with a directed evaporation direction (e.g. line-shaped). The arrangement of the evaporation crucible can be simplified and, thereby, reduces costs. For example, this is due to the limited number of components requiring maintenance.
According to embodiments described herein, a chamber tube is provided which is closed at the axial ends of the tube by two elements, each selected from the group consisting of: a cover and an electrical connection. The one or more openings for feeding a material to be evaporated and one or more distributor orifices are provided in the wall of the chamber tube. According to different, further embodiments, the distributor orifices can be formed and arranged with various forms and dimensions, such as one slit, a plurality of shorter slits, a plurality of bores, and the like. Thereby the distribution of the emitted vapor can be influenced. Thus, the necessity for distribution controlling apertures can be reduced.
The evaporation crucibles according to embodiments described herein, which are easy to manufacture and maintain, can be used at different orientations, that is vertical, horizontal, or at other orientations there between. According to other embodiments, the vapor beam is directed along a directional evaporation axes to better control the distribution of the vapor.
While the foregoing is directed to embodiments of the invention, other and further embodiments of the invention may be devised without departing from the basic scope thereof, and the scope thereof is determined by the claims that follow.
Number | Date | Country | Kind |
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07004793.1 | Mar 2007 | EP | regional |
This application claims benefit of U.S. provisional patent application Ser. No. 60/893,777 (ZIMR/0062L), filed Mar. 8, 2007, which is incorporated herein by reference.
Number | Date | Country | |
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60893777 | Mar 2007 | US |