Exhaust wall liner for semiconductor manufacturing apparatus

Information

  • Patent Grant
  • D1051081
  • Patent Number
    D1,051,081
  • Date Filed
    Thursday, May 11, 2023
    a year ago
  • Date Issued
    Tuesday, November 12, 2024
    3 months ago
  • US Classifications
    Field of Search
    • US
    • D13 182
    • D13 184
    • D13 199
    • D15 144
    • D15 1441
    • D15 199
    • CPC
    • F02F1/004
    • F02F1/08
    • F02F1/16
    • F02F1/42
    • F02F1/4235
    • F02F1/4257
    • F02F1/4264
    • F02F1/4271
    • F02F1/4285
    • F02F1/4292
    • F02F2001/4278
    • C23C16/4412
    • C23C16/44
    • C23C16/4581
    • C23C16/458
    • H01L21/67109
    • H01L21/67092
    • H01L21/67011
    • H01L21/67005
    • H01L21/67
    • H01L21/67248
  • International Classifications
    • 1303
    • Term of Grant
      15Years
Abstract
Description


FIG. 1 is a perspective view of an exhaust wall liner for a semiconductor manufacturing apparatus showing our new design;



FIG. 2 is a front view thereof;



FIG. 3 is a rear view thereof;



FIG. 4 is a left side view thereof;



FIG. 5 is a right side view thereof;



FIG. 6 is a top plan view thereof; and,



FIG. 7 is a bottom plan view thereof.


Claims
  • The ornamental design for an exhaust wall liner for a semiconductor manufacturing apparatus, as shown and described.
Priority Claims (1)
Number Date Country Kind
30-2022-0049282 Nov 2022 KR national
US Referenced Citations (13)
Number Name Date Kind
4117672 Yamazaki Oct 1978 A
5260116 Hamanaka Nov 1993 A
5414993 Kon May 1995 A
6134881 Strasser Oct 2000 A
D876504 Lee Feb 2020 S
10989137 Kloss Apr 2021 B2
11319894 Andruskiewicz, IV May 2022 B2
11486293 Samdaeng Nov 2022 B2
D983151 Murata Apr 2023 S
D1034493 Kwon Jul 2024 S
20040137175 Dillon Jul 2004 A1
20140260282 Pinnick Sep 2014 A1
20190329355 Gradl Oct 2019 A1
Foreign Referenced Citations (1)
Number Date Country
D214307 Sep 2021 TW