Claims
- 1. A thermosetting bismaleimide resin system, comprising:
- a) 30 weight percent or greater of one or more thermosetting bismaleimide monomers;
- b) from 1 to about 30 weight percent of a low viscosity epoxy resin toughener effective to toughen said bismaleimide resin system;
- c) from 5 to about 30 weight percent, based on the total resin system, of one or more particulate thermoplastics which are soluble or swellable in said bismaleimide resin system upon cure of said system, and which are effective in toughening said bismaleimide resin system as reflected by an increase in the compression strength after impact when tested according to Boeing Support Specification BSS 7260; and
- d) from 5 to about 50 weight percent of a comonomer selected from the group consisting of alkenyl and alkynyl group containing compounds,
- wherein a substantial amount of said thermoplastic remains in the uncured resin system in particulate form having a mean particle size of from 2 .mu.m to about 80 .mu.m.
- 2. The resin system of claim 1 wherein said comonomer is selected from the group consisting of alkenylphenyl, alkynylphenyl, alkenylphenol, alkynylphenol, alkenylphenoxy, and alkynylphenoxy-terminated compounds.
- 3. The resin system of claim 2 wherein said comonomer is selected from the group consisting of the diallylbisphenols and the dipropenylbisphenols.
- 4. The resin system of claim 3 wherein said comonomer is selected from the group consisting of diallylbisphenol A and dipropenylbisphenol A.
- 5. The resin system of claim 4 wherein said bismaleimide (a) is the bismaleimide, nadicimide or allylnadicimide of a diamine selected from the group consisting of 1,6-hexanediamine, 2,2,4-trimethyl-1,6-hexanediamine, toluenediamine, methylenedianiline, isophoronediamine, and mixtures thereof.
- 6. The thermosetting bismaleimide resin system of claim 1, wherein said epoxy resin contains two epoxy groups.
- 7. The resin system of claim 6 wherein said comonomer is selected from the group consisting of alkenylphenyl, alkynylphenyl, alkenylphenol, alkynylphenol, alkenylphenoxy, and alkynylphenoxy-terminated compounds.
- 8. The resin system of claim 7 wherein said comonomer is selected from the group consisting of the diallylbisphenols and the dipropenylbisphenols.
- 9. The resin system of claim 8 wherein said comonomer is selected from the group consisting of diallylbisphenol A and dipropenylbisphenol A.
- 10. The resin system of claim 9 wherein said bismaleimide (a) is the bismaleimide, nadicimide, or allylnadicimide of a diamine selected from the group consisting of 1,6-hexanediamine, 2,2,4-trimethyl-1,6-hexanediamine, toluenediamine, methylenedianiline, isophoronediamine, and mixtures thereof.
- 11. A thermosetting bismaleimide resin system, comprising:
- a) 30 weight percent or greater of one or more thermosetting bismaleimide monomers;
- b) from 1 to about 30 weight percent of a low viscosity epoxy resin toughener effective to toughen said bismaleimide resin system;
- c) from 5 to about 30 weight percent of one or more particulate thermoplastics which are soluble or swellable in said bismaleimide resin system upon cure of said system, wherein a major portion of said thermoplastic comprises a thermoplastic polyimide whose repeating units correspond to those derived from
- i) a dianhydride comprising:
- Y--X--Y
- wherein Y is a phthalyl anhydride group and X is a linking group selected from the group consisting of a covalent bond, ##STR2## wherein R is phenyl, C.sub.6 -C.sub.10 cycloalkyl, C.sub.1 -C.sub.4 alkyl, -C(CF.sub.3).sub.2 -,
- pyromellitic dianhydride, or mixtures thereof; and
- ii) a diamine, wherein at least 50 weight percent of residues of said diamine comprise residues of toluene diamine and methylenedianiline; and
- d) from 5 to about 50 weight percent of a comonomer selected from the group consisting of alkenyl and alkynyl group containing compounds,
- wherein a substantial amount of said thermoplastic remains in the uncured resin system in particulate form having a mean particle size of from 2 .mu.m to about 80 .mu.m.
- 12. The thermosetting bismaleimide resin system of claim 11, wherein said epoxy resin is selected from the group consisting of bisphenol A diglycidyl ether, bisphenol F diglycidyl ether, resorcinol diglycidyl ether, and mixtures thereof.
- 13. The resin system of claim 12 wherein said comonomer is selected from the group consisting of alkenylphenyl, alkynylphenyl, alkenylphenol, alkynylphenol, alkenylphenoxy, and alkynylphenoxy-terminated compounds.
- 14. The resin system of claim 13 wherein said comonomer is selected from the group consisting of the diallylbisphenols and the dipropenylbisphenols.
- 15. The resin system of claim 14 wherein said comonomer is selected from the group consisting of diallylbisphenol A and dipropenylbisphenol A.
- 16. The resin system of claim 15 wherein said bismaleimide (a) is the bismaleimide, nadicimide, or allylnadicimide of a diamine selected from the group consisting of 1,6-hexanediamine, 2,2,4-trimethyl-1,6-hexanediamine, toluenediamine, methylenedianiline, isophoronediamine, and mixtures thereof.
- 17. The resin system of claim 11 wherein said comonomer is selected from the group consisting of alkenylphenyl, alkynylphenyl, alkenylphenol, alkynylphenol, alkenylphenoxy, and alkynylphenoxy-terminated compounds.
- 18. The resin system of claim 17 wherein said comonomer is selected from the group consisting of the diallylbisphenols and the dipropenylbisphenols.
- 19. The resin system of claim 18 wherein said comonomer is selected from the group consisting of diallylbisphenol A and dipropenylbisphenol A.
- 20. The resin system of claim 19 wherein said bismaleimide (a) is the bismaleimide, nadicimide, or allylnadicimide of a diamine selected from the group consisting of 1,6-hexanediamine, 2,2,4-trimethyl-1,6-hexanediamine, toluenediamine, methylenedianiline, isophoronediamine, and mixtures thereof.
- 21. A thermosetting bismaleimide resin system comprising:
- a) 30 weight percent or greater of one or more thermosetting bismaleimide monomers;
- b) from 1 to about 10 weight percent of one or more difunctional low viscosity epoxy resin tougheners which are the glycidyl ethers of a phenol selected from the group consisting of bisphenol A, bisphenol F, and resorcinol, said 1 to about 10 weight percent being effective to toughen said bismaleimide resin system;
- c) from 5 to about 30 weight percent of one or more particulate thermoplastics which are soluble or swellable in said bismaleimide resin system upon cure of said system, and wherein up to about one third of said thermoplastic comprises an engineering thermoplastic having a T.sub.g greater than about 150.degree. C. and the remainder comprises a thermoplastic polyimide the majority of whose repeating units correspond to those derived from benzophenone tetracarboxylic dianhydride, methylenedianiline, and toluenediamine; and
- d) from 5 to about 50 weight percent of a comonomer selected from the group consisting of alkenyl and alkynyl group-containing compounds
- wherein a substantial amount of said thermoplastic remains in the uncured resin system in particulate form having a mean particle size of from 2 .mu.m to about 80 .mu.m.
- 22. The resin system of claim 21 wherein said comonomer is selected from the group consisting of alkenylphenyl, alkynylphenyl, alkenylphenol, alkynylphenol, alkenylphenoxy, and alkynylphenoxy-terminated compounds.
- 23. The resin system of claim 22 wherein said comonomer is selected from the group consisting of the diallylbisphenols and the dipropenylbisphenols.
- 24. The resin system of claim 23 wherein said comonomer is selected from the group consisting of diallylbisphenol A and dipropenylbisphenol A.
- 25. The resin system of claim 24 wherein said bismaleimide (a) is the bismaleimide, nadicimide, or allylnadicimide of a diamine selected from the group consisting of 1,6-hexanediamine, 2,2,4-trimethyl-1,6-hexanediamine, toluenediamine, methylenedianiline, isophoronediamine, and mixtures thereof.
Parent Case Info
This is a continuation-in-part of copending application Ser. No. 312,526, filed Feb. 17, 1989,now U.S. Pat. No. 5,037,689 which is herein incorporated by reference.
US Referenced Citations (9)
Foreign Referenced Citations (2)
Number |
Date |
Country |
59-191726 |
Oct 1984 |
JPX |
62-30122 |
Feb 1987 |
JPX |
Continuation in Parts (1)
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Number |
Date |
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Parent |
312526 |
Feb 1989 |
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