The disclosure relates to fluid distributors for falling film reactors and methods for forming them, and more particularly to fluid distributors adapted for use with or within honeycomb monolith substrate based falling film reactors and methods for forming them.
Referring to
A cross-section view of a falling film reactor assembly 100 with two stacked monolith substrates 20A and 20B is shown in
Rapid exothermic reactions within a falling film reactor can lead to explosions. The heat-exchange channels in the form of the closed channels 24 are positioned in close proximity to falling film reaction channels 22 to help prevent run-away thermal reactions. Some gas-liquid falling film reactors may be used with flammable liquid reactants and/or reaction products, while others may generate flammable or explosive chemical byproducts, liquid or gas. If combustion of these materials is initiated by a spark (via static electricity, for instance) a ripple effect may lead to rapid combustion throughout the entire reactor. Depending on how much heat is given off in the combustion reaction, an explosion may lead to destruction of the reactor and/or risk of injury.
Propagation of combustion flame fronts through frame barrier structures can be prevented as long as the size of flame barrier internal passageways does not exceed a maximum value. Flame barriers can be formed using fine mesh metal screens or inorganic or metallic materials with maximum open porosity on the order of 75-150 um. With reference to
A challenge with use of this type of flame barrier screen 84 is introduction of liquid reactants 21A into the falling film reaction channel 22 without wetting the flame barrier screen 84. The concern is that if the flame barrier screen 84 becomes excessively wetted by liquid reactants 21 as they enter the reaction channel 22, a liquid barrier may under certain conditions form across the screen 84. This liquid barrier may hamper the formation of a uniformly thick falling film in the reaction channel 22. The same challenge exists at the lower end face of the monolith substrate where gas-liquid separation takes place. If liquid reaction product 21B contacts the flame barrier screen 84 the presence of the liquid 21B on the screen 84 may interfere with the uniform flow of gas reactants 23 through the reaction channels 22.
One embodiment is a fluid distribution or fluid extraction structure for honeycomb-substrate based falling film reactors, the structure comprising a one or two-piece non-porous honeycomb substrate having a plurality of cells extending in parallel in a common direction from a first end of the substrate to a second and divided by cell walls, and a plurality of channels extending along a channel direction perpendicular to the common direction, the channels defined by the absence of cell walls or the breach of cell walls along the channel direction, the channels being closed or sealed to fluid passage in the common direction but open to the exterior of the structure through one or more ports in a side of the structure, the channels being in fluid communication with the plurality of cells via holes or slots extending through respective cell walls, the holes or slots having a width and a length, the width being equal to or less than the length, and the width at widest being less than 150 μm.
A further embodiment includes a method of forming a fluid distribution or fluid extraction structure, the method comprising providing a honeycomb substrate; breaching selected walls of the honeycomb substrate so as to form one or more channels perpendicular to the direction of the cells of the honeycomb substrate; forming slots or holes through sidewalls of the one or more channels; sealing above and below at least a portion of the slots or holes such that the one or more channels become one or more internal channels accessible through the slots or holes; and providing access to the one or more internal channels from the exterior of the substrate. The slots or holes have a width and a length, the width being equal to or less than the length, and the width at widest being less than 150 μm.
Additional features and advantages will be set forth in the detailed description which follows, and in part will be readily apparent to those skilled in the art from that description or recognized by practicing the embodiments as described herein, including the detailed description which follows, the claims, as well as the appended drawings.
It is to be understood that both the foregoing general description and the following detailed description are merely exemplary, and are intended to provide an overview or framework to understanding the nature and character of the claims. The accompanying drawings are included to provide a further understanding, and are incorporated in and constitute a part of this specification. The drawings illustrate one or more embodiment(s), and together with the description serve to explain principles and operation of the various embodiments.
The following description provides details of some embodiments of the present invention. Like features will generally be referred to with the same or similar reference characters across all of the figures herein.
Liquid reactant 21A flows into the porous monolith substrate 20A through lateral internal channels 46 defined in part by non-porous plugs 44. The fluid is fed to channels 46 via an internal or external fluid manifold (not shown in the cross section of the figure). The liquid reactant 21A flows through the porous walls of the monolith substrate 20A, forms a thin film on the sidewalls of the axial internal channels 41, and then flows downward into the non-porous monolith substrate falling film reaction channel 22. While this type of fluid distributor has many advantages, a potential challenge in this approach is that cells of the porous monolith substrate 20A must be well-aligned to cells of the nonporous monolith substrate 20. Since monolith substrate cells sometimes experience distortion in extrusion and/or sintering it may be difficult to make cells in two different monolith substrates 20A, 20 line up with each other.
The present disclosure accordingly focuses on improved honeycomb-extrusion based falling film reactor fluid distribution and collection structures, particularly those having improved registration or fit with an associated reactor, and low-cost fabrication methods for providing such structures. Throughout this document references made to fluid distributors at the top of a monolith-substrate-based falling film reactor will also be assumed to apply to fluid collectors at the bottom of the substrate. These structures can be formed using non-porous monolithic substrates mated with other non-porous falling film monolith substrates, or, in an alternative embodiment, can be integrated into the same substrate that houses the reaction channels. In both cases non-porous plugs are desirably used to confine fluids within the distribution structures. Improved fluid distribution channels and flame barriers can also be integrated into these structures, as will be shown below.
Reference will now be made in detail to the accompanying drawings which illustrate certain instances of the methods and devices described generally herein. Whenever possible, the same reference numerals will be used throughout the drawings to refer to the same or like parts. One embodiment of a falling film reactor with fluid distributors is shown in
To substantially avoid difficulties in aligning cells on mated fluid distributor and falling film reactor substrates 20A and 20, the substrates 20A and 20 can be fabricated from adjacent portions of a single extruded log. To maintain alignment during shrinkage that normally occurs during sintering both substrates are then sintered in identical conditions so that they are both non-porous. As another option, the full desired length of reactor plus fluid distributor(s) may be sintered as one piece, and then sawed apart. The following describes various techniques for incorporating fluid distribution and flame barrier structures into the resulting non-porous distributor structures.
The substrate 40 is preferably of relatively thin but uniform thickness in the direction of the channels from the first end 80 to the second end 82. For example, the substrate may be in the range of 3-15 mm thick, more preferably about 5-8 mm thick. A green extruded substrate may be relatively easily sawn to a size in this range, for example.
Desirably (but not necessarily in every instance) while the substrate 40 is still in the green state, selected cell walls 45, in this case those positioned between cells of the odd numbered rows 43, are breached so as to join selected ones of channels 86 so as to produce one or more open lateral passages 42 extending in a direction crossways to the direction of the channels. Breaching may be performed, for example, by removing the walls by machining them away, as shown in
Either before or after breaching, microchannels 70 are machined through the sidewalls 49 that divide the lateral passages 42 from the axial internal cells or channels 41. This machining may be performed by a laser L with the extruded substrate 40 in the green state or in the sintered state. The beam size and motion of the laser L are selected such that the width W of the microchannels 70 is not greater than 150 micrometers, desirably not greater than 100 micrometers, and most desirably, for some applications, not greater than 50 micrometers.
As depicted generally by the alignment of the laser L in
Where the microchannels are not round, but have a length (greatest dimension) and a width (lesser dimension), the largest width should be no more than 150 micrometers, desirably not greater than 100 micrometers, and most desirably, for some applications, not greater than 50 micrometers.
Either before or after machining microchannels 70, the lateral passages 42 are plugged at the top and bottom thereof with a non-porous plugging material 44, as shown in
As mentioned above, a non-porous substrate fluid distributor may also be integrated with a falling film reactor substrate in one extruded substrate. The laser machining process for fabricating non-porous fluid distributor sidewall microchannels can also be applied to the falling film substrate. In this case the separate distributor substrate (40A) is eliminated and all processing takes place on the central substrate of the falling film substrate 40, 20. As with the previous example a laser is directed at the non-porous substrate sidewall from the side, above or below to form one or more microchannels of the preferred size(s) mentioned above so as both pass fluid and prevent flame propagation.
This approach has the advantage that the fluid distributor and collector are integrated into the falling film substrate. Therefore it eliminates the step of joining any fluid distributor and collector substrates to the falling film substrate. The main challenge is that fabrication of the deep non-porous plugs involves a plug injection process that is most likely carried out serially over each end face. In a production-grade process plug injection could be performed more rapidly by providing multiple injectors so plugs can be injected at multiple locations on the substrate end face simultaneously.
In the previous non-porous fluid distributor approach microchannels were formed by directly a laser through selected walls of the falling film substrate. A similar microchannel structure for fluid distribution can be created by joining a separate distributor substrate with a falling film substrate as shown and described below with respect to
To create the microchannels 70 required for fluid transport from fluid distributor channels 46 to the falling film channels 22, narrow slots or trenches 71 are selectively machined at the distributor substrate/falling film substrate interface on the distributor substrate and/or falling film substrate, as shown in the magnified partial perspective view of
Once narrow slots 71 are selectively micromachined into the distributor and/or falling film substrates, porous plugs 88 and non-porous plugs 44, 51 are applied to the distributor as shown in
Next the distributor substrate 40A is mounted on the falling film substrate 40, aligned and then attached using chemically-resistant adhesive or pressure via an externally applied clamping approach. The narrow slots 71 form through-holes or microchannels 70 that are no more than 50-150 um wide. The small channel size enables fluid transport to the falling film channels while preventing flame propagation.
In an alternative approach the separate distributor substrate can be eliminated if the depth of the machined slots can be made to exceed the typical plugging depth. The resulting structure appears similar to the one shown in
Laser ablation of narrow trenches in green alumina substrate end face walls has been demonstrated under a variety of laser conditions. In one experiment a 6 mm thick slice sample from a 2″ diameter green 200/12 alumina substrate was mounted on a laser translation stage. A scanning laser beam system above the sample directed a focused laser beam downward upon the exposed edges of substrate channel walls. When operating, the laser beam is scanned along a linear path one or more times at a user-defined velocity.
In another laser experiment trenches as narrow as ˜30 um were fabricated in alumina using a Lumera Picosecond laser (355 nm wavelength, ˜20 um spot using 100 mm F-Theta lens, 100 kHz repetition rate, 10 cm/sec sweep speed). Laser cutting produced very clean cuts with no evidence of thermal damage.
The methods and/or devices disclosed herein are generally useful in performing any process that involves mixing, separation, extraction, crystallization, precipitation, or otherwise processing fluids or mixtures of fluids, including multiphase mixtures of fluids—and including fluids or mixtures of fluids including multiphase mixtures of fluids that also contain solids—within a microstructure. The processing may include a physical process, a chemical reaction defined as a process that results in the interconversion of organic, inorganic, or both organic and inorganic species, a biochemical process, or any other form of processing. The following non-limiting list of reactions may be performed with the disclosed methods and/or devices: oxidation; reduction; substitution; elimination; addition; ligand exchange; metal exchange; and ion exchange. More specifically, reactions of any of the following non-limiting list may be performed with the disclosed methods and/or devices: polymerisation; alkylation; dealkylation; nitration; peroxidation; sulfoxidation; epoxidation; ammoxidation; hydrogenation; dehydrogenation; organometallic reactions; precious metal chemistry/homogeneous catalyst reactions; carbonylation; thiocarbonylation; alkoxylation; halogenation; dehydrohalogenation; dehalogenation; hydro formylation; carboxylation; decarboxylation; amination; arylation; peptide coupling; aldol condensation; cyclocondensation; dehydrocyclization; esterification; amidation; heterocyclic synthesis; dehydration; alcoholysis; hydrolysis; ammonolysis; etherification; enzymatic synthesis; ketalization; saponification; isomerisation; quatemization; formylation; phase transfer reactions; silylations; nitrile synthesis; phosphorylation; ozonolysis; azide chemistry; metathesis; hydrosilylation; coupling reactions; and enzymatic reactions.
It will be apparent to those skilled in the art that various modifications and variations can be made without departing from the spirit or scope of the invention.
This application claims priority to U.S. patent application Ser. No. 61/238301, filed Aug. 31, 2009, titled “FALLING-FILM REACTOR FLUID DISTRIBUTORS AND METHODS”.
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/US10/47204 | 8/31/2010 | WO | 00 | 2/24/2012 |
Number | Date | Country | |
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61238301 | Aug 2009 | US |