Claims
- 1. A tension mask comprising an Fe—Ni alloy having an improved dorming property and creep property, which has cathode-ray passing apertures, in the form of dots or slots formed by etching, and to which tension is then vertically applied without undergoing press-forming, said Fe—Ni alloy containing from 30% by weight to 50% by weight of Ni, the balance consisting of iron and unavoidable impurities, and having not less than 30% and not more than 57% of the final working degree in the final temper state of the tension mask.
- 2. A tension mask according to claim 1, wherein the impurity components are 0.01% by weight or less of C, 0.20% by weight or less of Si, 0.5% by weight or less of Mn, 0.015% by weight or less of P, and 0.010% by weight or less of S.
- 3. An Fe—Ni alloy having an improved dorming property and creep property, which has cathode-ray passing apertures, in the form of dots or slots formed by etching, and to which tension is then vertically applied without undergoing press-forming, containing from 30% by weight to 50% by weight of Ni, the balance consisting of iron and unavoidable impurities, and having not less than 30% and not more than 57% of the final working degree in a final temper state wherein the final temper state is cold-working finish and having 620 N/mm2 or more of tensile strength.
- 4. An Fe—Ni alloy according to claim 3, wherein the final temper state is cold-rolling finish and having 610 N/mm2 or more of yield strength (0.2%).
- 5. A tension mask which has cathode-ray passing apertures, in the form of dots or slots formed by etching, and to which tension is then vertically applied without undergoing press-forming, and which consists of an Fe—Ni alloy containing from 30% by weight to 50% by weight of Ni, the balance consisting of iron and unavoidable impurities, and having not less than 30% and not more than 57% of the final working degree.
- 6. A tension mask according to claim 5, characterized by the impurity components of 0.01% by weight or less of C, 0.20% by weight; or less of Si, 0.5% by weight or less of Mn, 0.015% by weight or less of P, and 0.010% by weight or less of S.
- 7. A tension mask according to claim 5 or 6, characterized by being finally cold worked and subsequently shape corrected.
- 8. A tension mask according to claim 7, being further stress-relief annealed.
- 9. A tension mask according to claim 1 or 2, characterized by being finally cold worked and subsequently shape corrected.
- 10. A tension mask according to claim 9, being further stress-relief annealed.
- 11. A color Braun-tube, which comprises a tension mask which has the cathode-ray passing apertures in the form of dots or slots formed by etching, and to which tension is then vertically applied without undergoing press-forming, and which consists of an Fe—Ni alloy containing from 30% by weight to 50% by weight of Ni, the balance consisting of iron and unavoidable impurities, and having not less than 30% and not more than 57% of the final working degree.
- 12. A color Braun-tube according to claim 11, wherein the impurity components are 0.01% by weight or less of C, 0.20% by weight or less of Si, 0.5% by weight or less of Mn, 0.015% by weight or less of P, and 0.010% by weight or less of S.
- 13. A color Braun tube according to claim 11 or 12, characterized by being finally cold worked and subsequently shape corrected.
- 14. A color Braun-tube according to claim 13, being further stress-relief annealed.
- 15. A color Braun-tube according to claim 11, further comprising an electron gun, a glass panel having a face-screen surface, a frame member and a panel pin.
- 16. A tension mask according to claim 1 or 2, wherein the Fe—Ni alloy has a final temper state that is cold-working finish and has 620 N/mm2 or more of tensile strength.
- 17. A tension mask according to claim 1, wherein the Fe—Ni alloy has a final temper state that is cold-rolling finish and has 610 N/mm2 or more of yield strength (0.2%).
- 18. A color Braun-tube according to claim 13, further comprising an electron gun, a glass panel having a face-screen surface, a frame member and a panel pin.
Priority Claims (1)
Number |
Date |
Country |
Kind |
10-356219 |
Dec 1998 |
JP |
|
Parent Case Info
This application is the national phase under 35 U.S.C. §371 of PCT International Application No. PCT/JP99/05802 which has an International filing date of Oct. 21, 1999 which designated the United States of America and was not filed in English.
PCT Information
Filing Document |
Filing Date |
Country |
Kind |
PCT/JP99/05802 |
|
WO |
00 |
Publishing Document |
Publishing Date |
Country |
Kind |
WO00/36172 |
6/22/2000 |
WO |
A |
US Referenced Citations (1)
Number |
Name |
Date |
Kind |
6306229 |
Ide et al. |
Oct 2001 |
B1 |
Foreign Referenced Citations (2)
Number |
Date |
Country |
62-120432 |
Jun 1987 |
JP |
62-185860 |
Aug 1987 |
JP |