This application claims all benefits accruing under 35 U.S.C. §119 from China Patent Application No. 201210518136.2, filed on Dec. 6, 2012 in the China Intellectual Property Office, the disclosure of which is incorporated herein by reference.
1. Technical Field
The present application relates to a field emission cathode device and field emission equipment using the field emission cathode device.
2. Discussion of Related Art
Conventional field emission cathode device includes an insulating substrate, a cathode electrode fixed on the insulating substrate, a plurality of electron emitters fixed on the cathode electrode, a dielectric layer fixed on the insulating substrate, and a gate electrode fixed on the dielectric layer. The gate electrode provides an electrical potential to extract electrons from the plurality of electron emitters. When a field emission display using the field emission cathode device is operated, an anode electrode provides an electrical potential to accelerate the extracted electrons to bombard the anode electrode for luminance.
However, the electron emitters such as carbon nanotubes, carbon nanofibres, or silicon nanowires have equal length. The electron emitters close to the gate electrode have large field strength, and the electron emitters away from the gate electrode have very small field strength. Therefore, the electron emitters close to the gate electrode can emit more electrons, the electron emitters away from the gate electrode can emit very few electron, which affects the emission current of the electron emitters.
What is needed, therefore, is to provide a field emission cathode device and field emission equipment using the field emission cathode device to overcome the afore mentioned shortcomings.
Many aspects of the embodiments can be better understood with references to the following drawings. The components in the drawings are not necessarily drawn to scale, the emphasis instead being placed upon clearly illustrating the principles of the embodiments. Moreover, in the drawings, like reference numerals designate corresponding parts throughout the several views.
The disclosure is illustrated by way of example and not by way of limitation in the figures of the accompanying drawings in which like references indicate similar elements. It should be noted that references to “an” or “one” embodiment in this disclosure are not necessarily to the same embodiment, and such references mean at least one.
Referring to
The cathode electrode 104 is located on a surface of the insulating substrate 102. The dielectric layer 108 is located on a surface of the cathode electrode 104. The dielectric layer 108 defines a first opening 1080, such that a part of the cathode electrode 104 is exposed. The electron emitter 106 is located on a surface of the cathode electrode 104 and electrically connected to the cathode electrode 104, wherein the surface is exposed through the first opening 1080.
The electron extracting electrode 110 is located on a surface of the dielectric layer 108. The electron extracting electrode 110 is spaced from the cathode electrode 104 by the dielectric layer 108. The electron extracting electrode 110 defines a through-hole 1100, exposing the electron emitter 106. In one embodiment, the through-hole 1100 of the electron extracting electrode 110 is upside of the electron emitter 106. The field emission cathode device 100 further includes a fixing element 112 located on a surface of the electron extracting electrode 110. The fixing element 112 is used to fix the electron extracting electrode 110 on the dielectric layer 108.
The dielectric layer 108 can be directly located on the cathode electrode 104 or directly located on the insulating substrate 102. The dielectric layer 108 is located between the cathode electrode 104 and the electron extracting electrode 110, such that there is insulation between the cathode electrode 104 and the electron extracting electrode 110. The dielectric layer 108 can be a layer structure having the first opening 1080. The dielectric layer 108 can be a plurality of strip-shaped structures spaced from each other. A gap between two adjacent strip-shaped structures is the first opening 1080.
A material of the insulating substrate 102 can be ceramics, glass, resins, quartz, or polymer. The size, shape, and thickness of the insulating substrate 102 can be chosen according to need. The insulating substrate 102 can be a square plate, a round plate, or a rectangular plate. In one embodiment, the insulating substrate 102 is a square glass plate, wherein the length of side of the square glass plate is about 10 millimeters, the thickness of the square glass plate is about 1 millimeter.
The cathode electrode 104 can be a conductive layer or a conductive plate. The size, shape, and thickness of the cathode electrode 104 can be chosen according to need. The cathode electrode 104 can be made of metal, alloy, conductive slurry, or indium tin oxide (ITO). In one embodiment, the cathode electrode 104 is an aluminum layer with a thickness of about 1 micrometer.
The dielectric layer 108 can be made of resin, glass, ceramic, oxide, photosensitive emulsion, or combination thereof. The oxide can be silicon dioxide, aluminum oxide, or bismuth oxide. The size and shape of the dielectric layer 108 can be chosen according to need. In one embodiment, the dielectric layer 108 is a ring-shaped SU-8 photosensitive emulsion with a thickness of about 100 micrometers. In one embodiment, the first opening 1080 is coaxial with the through-hole 1100.
The electron extracting electrode 110 can be a layer electrode defining the through-hole 1100 or a plurality of strip-shaped electrodes. There is a distance between two adjacent strip-shaped electrodes. The electron emitter 106 is exposed through the through-hole 1100 or the distance between two adjacent strip-shaped electrodes. The electron extracting electrode 110 can be made of metal, alloy, conductive slurry, carbon nanotube, or ITO. The metal can be copper, aluminum, gold, silver, or iron. A thickness of the electron extracting electrode 110 can be greater than or equal to 10 micrometers. In one embodiment, the thickness of the electron extracting electrode 110 is in a range from about 30 micrometers to about 60 micrometers.
The through-hole 1100 of the electron extracting electrode 110 is shaped as an inverted funnel such that the width thereof is narrowed as it goes apart from the insulating substrate 102 or the cathode electrode 104. The width of the through-hole 1100 close to the cathode electrode 104 can be in a range from about 80 micrometers to about 1 millimeter. The width of the through-hole 1100 away from the cathode electrode 104 can be in a range from about 10 micrometers to about 1 millimeter. A secondary electron emission layer can be formed on the sidewall of the through-hole 1100 of the electron extracting electrode 110. When the electrons emitted from the electron emitter 106 pass the dielectric layer 108 and collide against the sidewall of the through-hole 1100, the secondary electron emission layer emits secondary electrons, thereby increasing the amount of electrons. The secondary electron emission layer can be formed with an oxide, such as magnesium oxide.
A height of the electron emitter 106 gradually reduces from a center of the electron emitter 106 out. The thickness and the size of the electron emitter 106 can be chosen according to need. The shape of the electron emitter 106 is consistent with the shape of the sidewall of the through-hole 1100.
The electron emitter 106 includes a plurality of sub-electron emitters 1060, such as carbon nanotubes, carbon nanofibres, or silicon nanowires. Each sub-electron emitter 1060 has an emission end 10602 and a terminal end 10604 opposite to the emission end 10602. The terminal end 10604 of each sub-electron emitter 1060 electrically connects to the cathode electrode 104. In one embodiment, the emission end 10602 of each sub-electron emitter 1060 is in the through-hole 1100 of the electron extracting electrode 110. That is, the height of each sub-electron emitter 1060 is greater than the thickness of the dielectric layer 108. A connecting line of the emission end 10602 of each sub-electron emitter 1060 is consistent with the shape of the sidewall of the through-hole 1100.
A shortest distance between the emission end 10602 of each sub-electron emitter 1060 and the sidewall of the through-hole 1100 is substantially equal. The shortest distances between the emission end 10602 of each sub-electron emitter 1060 and the sidewall of the through-hole 1100 can be in a range from about 5 micrometers to about 300 micrometers. A difference between the shortest distances between the emission end 10602 of each sub-electron emitter 1060 and the sidewall of the through-hole 1100 can be in a range from about 0 micrometers to about 100 micrometers. In one embodiment, the shortest distances between the emission end 10602 of each sub-electron emitter 1060 and the sidewall of the through-hole 1100 are equal, and each sub-electron emitter 1060 is substantially perpendicular to the cathode electrode 104. In one embodiment, the shortest perpendicular distances between the emission end 10602 of each sub-electron emitter 1060 and the sidewall of the through-hole 1100 are equal, and each sub-electron emitter 1060 is substantially perpendicular to the cathode electrode 104. The shortest perpendicular distances between the emission end 10602 of each sub-electron emitter 1060 and the sidewall of the through-hole 1100 are in a range from about 5 micrometers to about 250 micrometers.
Furthermore, the electron emitter 106 can be coated with a protective layer (not shown) to improve stability and lifespan of the electron emitter 106. The protective layer can be made of anti-ion bombardment materials such as zirconium carbide, hafnium carbide, and lanthanum hexaborid. The protective layer can be coated on a surface of each sub-electron emitter 1060.
In one embodiment, the electron emitter 106 is a carbon nanotube array having a hill-like shape, as shown in
The fixing element 112 can be made of insulating material. A thickness of the fixing element 112 can be chosen according to need. The shape of the fixing element 112 is the same as the shape of the dielectric layer 108. The fixing element 112 defines a second opening 1120 opposite to the first opening 1080, such that the electron emitter 106 is exposed through the second opening 1120. In one embodiment, the fixing element 116 is an insulating slurry layer.
Referring to
The cathode substrate 12 and the anode substrate 14 are spaced from each other by an insulating supporter 15. The cathode substrate 12, the anode substrate 14, and the insulating supporter 15 form a vacuum space. The field emission cathode device 100, the anode electrode 16, and the fluorescent layer 18 are accommodated in the vacuum space. The anode electrode 16 is located on a surface of the anode substrate 14. The fluorescent layer 18 is located on a surface of the anode electrode 16. The field emission cathode device 100 is located on a surface of the cathode substrate 12. There is a distance between the fluorescent layer 18 and the field emission cathode device 100. In one embodiment, the cathode substrate 12 is the insulating substrate 102.
The cathode substrate 12 can be made of insulating material. The insulating material can be ceramics, glass, resins, quartz, or polymer. The anode substrate 14 is a transparent plate. The thickness, size and shape of the anode substrate 14 can be selected according to need. In one embodiment, the cathode substrate 12 and the anode substrate 14 are a glass plate. The anode electrode 16 is an ITO film with a thickness of about 100 micrometers. The fluorescent layer 18 can be round. The diameter of the fluorescent layer 18 can be greater than or equal to the inner diameter of the electron emitter 106 and less than or equal to the outer diameter of the electron emitter 106. In one embodiment, the fluorescent layer 18 is round and has a diameter approximately equal to the outer diameter of the electron emitter 106.
Referring to
The first substrate 302 and the second substrate 304 form a resonator. The lens 306 is located on one end of the resonator to form an output terminal. The field emission cathode device 100 is located on a surface of the second substrate 304 close to the first substrate 302. The first grid electrode 310 is located on narrowest of the through-hole 1100 of the electron extracting electrode 110. The first grid electrode 310 covers the through-hole 1100. The reflecting layer 308 is located on a surface of the first substrate 302 close to the second substrate 304 to reflect electrons. The reflecting layer 308 is opposite to the field emission cathode device 100. The second grid electrode 312 is suspended between the first grid electrode 310 and the reflecting layer 308. The electrons extracted from the electron emitter 106 of the field emission cathode device 100 are reflected by the reflecting layer 308 and oscillated in the resonator. The electrons are finally exported through the output terminal.
The first substrate 302 and the second substrate 304 can be made of metal, polymer or silicon. In one embodiment, the first substrate 302 and the second substrate 304 are made of silicon.
The first grid electrode 310 and the second grid electrode 312 can be a plane structure having a plurality of meshes. The shape of the plurality of meshes can be chosen according to need. An area of each of the plurality of meshes can be in a range from about 1 square micron to about 800 square microns, such as about 10 square microns, about 50 square microns, about 100 square microns, about 150 square microns, about 200 square microns, about 250 square microns, about 350 square microns, about 450 square microns, and about 600 square microns. The first grid electrode 310 and the second grid electrode 312 can be made of metal, alloy, conductive slurry, carbon nanotube, or ITO. The metal can be copper, aluminum, gold, silver, or iron. In one embodiment, the first grid electrode 310 and the second grid electrode 312 are made of at least two stacked carbon nanotube films. The carbon nanotube film includes a plurality of successive and oriented carbon nanotubes joined end-to-end by van der Waals attractive force therebetween. An angle between the aligned directions of the carbon nanotubes in two adjacent carbon nanotube films can be in a range from about 0 degrees to about 90 degrees. The area of each mesh of the first grid electrode 310 and the area of each mesh of the second grid electrode 312 are approximately equal, and the area of each mesh is in a range from about 10 micrometers to about 100 micrometers.
Referring to
The carbon nanotube linear structure includes a plurality of carbon nanotube wires substantially parallel with each other or a plurality of carbon nanotube wires twisted with each other. That is, the carbon nanotube wire can be twisted or untwisted. The twisted carbon nanotube wire can be formed by twisting a drawn carbon nanotube film using a mechanical force to turn the two ends of the drawn carbon nanotube film in opposite directions. Each carbon nanotube wire includes a plurality of carbon nanotubes helically oriented around an axial direction of the carbon nanotube wire. Therefore, the carbon nanotube wire has a larger mechanical strength.
The untwisted carbon nanotube wire can be obtained by treating the drawn carbon nanotube film drawn from the carbon nanotube array with the volatile organic solvent. Each carbon nanotube wire includes a plurality of carbon nanotubes parallel to the axial direction of the carbon nanotube wire.
The carbon nanotube linear structure includes a first end and a second end opposite to the first end. The first end of the carbon nanotube linear structure is electrically connected to the cathode electrode 104. The second end of the carbon nanotube linear structure includes a plurality of taper-shape structures, as shown in
The plurality of taper-shape structures includes one carbon nanotube close to the narrowest of the through-hole 1100 than the other adjacent carbon nanotubes, and the carbon nanotube can emit more electrons. The carbon nanotube close to narrowest of the through-hole 1100 than the other adjacent carbon nanotubes is fixed with the other adjacent carbon nanotubes by van der Waals attractive force. Therefore, the carbon nanotube can bear large working voltage. Additionally, there can be a gap between tops of the two adjacent taper-shape structures. That can prevent the shield effect caused by the adjacent taper-shape structures.
An envelope curve of the second end of the carbon nanotube linear structure is consistent with the shape of the sidewall of the through-hole 1100. A shortest distance between one end of the carbon nanotube linear structure away from the cathode electrode 104 and the sidewall of the through-hole 1100 is substantially equal. A shortest distance between the tops of the taper-shape structures and the sidewall of the through-hole 1100 is substantially equal, wherein the shortest distance can be in a range from about 5 micrometers to about 300 micrometers. In one embodiment, the shortest distances between the tops of the taper-shape structures and the sidewall of the through-hole 1100 are equal. In one embodiment, the shortest perpendicular distances between the tops of the taper-shape structures and the sidewall of the through-hole 1100 are approximately equal. A difference between the shortest distances between the tops of the taper-shape structures and the sidewall of the through-hole 1100 can be in a range from about 0 micrometers to about 100 micrometers.
Referring to
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It is to be understood the shape of the electric conductors 114 or 214 is consistent with the shape of the sidewall of the through-hole 1100.
In summary, the shortest distance between each of the plurality of sub-electron emitters 1060 and the sidewall of the through-hole 1100 is substantially equal, such that the electric field of each of the plurality of sub-electron emitters 1060 is substantially equal, improving the emission current destiny of the electron emitter 106. Furthermore, the electron emitter 106 has a height gradually reducing from a center of the electron emitter 106 out, or is a carbon nanotube linear structure including at least one taper-shape structure. Therefore, the shield effect caused by adjacent sub-electron emitters 1060 can be prevented, improving the emission current destiny of the electron emitter 106. Moreover, the through-hole 1100 of the electron extracting electrode 110 is shaped as an inverted funnel such that the width thereof is narrowed away from the insulating substrate 102. That can focus the electron beam extracted from the electron emitter 106, further improving the emission current destiny of the electron emitter 106.
It is to be understood that the above-described embodiment is intended to illustrate rather than limit the disclosure. Variations may be made to the embodiment without departing from the spirit of the disclosure as claimed. The above-described embodiments are intended to illustrate the scope of the disclosure and not restricted to the scope of the disclosure.
It is also to be understood that the above description and the claims drawn to a method may include some indication in reference to certain steps. However, the indication used is only to be viewed for identification purposes and not as a suggestion as to an order for the steps.
Number | Date | Country | Kind |
---|---|---|---|
2012 1 05181362 | Dec 2012 | CN | national |
Number | Name | Date | Kind |
---|---|---|---|
5229331 | Doan et al. | Jul 1993 | A |
5903092 | Akama | May 1999 | A |
6062931 | Chuang et al. | May 2000 | A |
6064149 | Raina | May 2000 | A |
6084245 | Hsu et al. | Jul 2000 | A |
6097138 | Nakamoto | Aug 2000 | A |
6339281 | Lee et al. | Jan 2002 | B2 |
6440763 | Hsu | Aug 2002 | B1 |
6445123 | Tjaden et al. | Sep 2002 | B1 |
6448701 | Hsu | Sep 2002 | B1 |
6632114 | Choi et al. | Oct 2003 | B2 |
6642639 | Choi et al. | Nov 2003 | B2 |
6809464 | Choi et al. | Oct 2004 | B2 |
6812635 | Cho et al. | Nov 2004 | B2 |
6911767 | Takai | Jun 2005 | B2 |
6927534 | Choi et al. | Aug 2005 | B2 |
6976897 | Choi et al. | Dec 2005 | B2 |
7279085 | Hudspeth et al. | Oct 2007 | B2 |
7652418 | Choi et al. | Jan 2010 | B2 |
8229074 | Mahapatra | Jul 2012 | B2 |
8237347 | Liu et al. | Aug 2012 | B2 |
20070029918 | Raina et al. | Feb 2007 | A1 |
20080018228 | Choi et al. | Jan 2008 | A1 |
20080164798 | Baik et al. | Jul 2008 | A1 |
20090115306 | Wei et al. | May 2009 | A1 |
20090134766 | Kim et al. | May 2009 | A1 |
20090322200 | Kolake et al. | Dec 2009 | A1 |
20100045158 | Kim et al. | Feb 2010 | A1 |
20100328582 | Yoo et al. | Dec 2010 | A1 |
20110005191 | Ready et al. | Jan 2011 | A1 |
20110038465 | Mahapatra | Feb 2011 | A1 |
Number | Date | Country |
---|---|---|
201142895 | Dec 2011 | TW |
Number | Date | Country | |
---|---|---|---|
20140159566 A1 | Jun 2014 | US |