Patent Grant
9729155
The present disclosure relates to devices including field programmable gate arrays. A field programmable gate array (FPGA) is an integrated circuit that can be configured after manufacturing. It is a flexible device having a great number of potential configuration modes to interact with various other hardware and software designs (e.g., on a computer motherboard). The FPGA configuration is generally specified using a hardware description language, similar to that used for an application specific integrated circuit (ASIC). Generally speaking, an FPGA can be configured to implement most or all logic functions that an ASIC could execute, yet also can be at least partially reconfigured after shipping. Coupled with relatively low design costs typically associated with ASIC design, FPGAs offer significant advantages for a wide array of electronic devices and applications.
The FPGA architecture generally comprises a set of programmable logic components, or logic blocks, and reconfigurable interconnects for selectively connecting a subset of the logic blocks with other subsets thereof. Logic blocks can be configured to execute complex algorithms, or simple logic functions like AND, NAND, NOR, etc. Most FPGAs also include memory elements that can include flip-flops, memory registers, memory arrays, or the like.
Like most integrated circuits, design goals for the FPGA include reducing minimum component size, increasing calculation speed, lowering power consumption, and others. As more applications are found for these devices, demand for improved technology comes from many sectors. Although FPGAs were largely used exclusively in telecommunications and networking in early implementations, their versatility has found these devices implemented in other industries, consumer, automotive and industrial applications.
One recent development of the general FGPA architecture was to combine embedded microprocessors with the traditional logic blocks and interconnects of the FPGA. This development has lead to what are referred to as system-on-chip or system on programmable chip devices. Many examples of system-on-chip devices have emerged, generally combining processor and analog peripheral components with the FPGA architecture. The system-on-chip has enabled the miniaturization of microprocessors to achieve a new paradigm. However, as is typical with electronics technology, new paradigms very rapidly lead to applications requiring smaller, faster or lower power devices, generating new demand for research and development.
A recent innovation for integrated circuit technology has been the concept of a resistive random access memory (RRAM). In theory, RRAM is a non-volatile memory technology that induces a filament (or many filaments) in a dielectric material. In a normal state, the dielectric has high resistance, and is non-conductive. However, application of a suitable voltage across the dielectric can induce a conduction path therein. Various physical mechanisms enable generation of a conduction path in a dielectric, including defects in the material (whether natural or induced via doping), metal migration, and so on. Once the filament is formed within the dielectric, it can be activated—resulting in a low resistance conduction path through the dielectric—or deactivated—rendering the dielectric a high resistance electrical insulator—through application of a suitable program voltage. Thus, the conduction path can be referred to as a programmable conduction path, yielding similar electric characteristics as a conventional three-terminal transistor. In practice, however, the inventors of the present invention believe that the RRAM has not been commercially successful for reasons including incompatibility of RRAM fabrication materials with traditional CMOS processes, the incompatibility of RRAM processes as part of back end CMOS fabrication, and the like.
The inventors of the present invention believe that a basic memory cell architecture employing the RRAM technology could be a configuration of parallel bitlines intersected by perpendicular wordlines. A programmable resistance dielectric can be formed at the junction of each bitline and wordline. Such a basic memory cell would be referred to as a cross-point cell. One application of the RRAM cross-point cell, for instance, would be a block of reconfigurable interconnects within a FPGA. The RRAM cross-point cell may utilize RRAM memory cells of much smaller area than the comparable static random access memory (SRAM) counterpart. This reduction in area may lead to much greater component density. The RRAM cell also would have significantly lower power consumption, would be non-volatile memory (compared with volatile SRAM), radiation immune, would have quicker power-up, as well as other benefits. However, the inventors envision that the basic cross-point cell design may have large parasitic currents in non-activated memory cells, which may lead to slow read access. Moreover, the ratio of resistance in activated and deactivated states may not often be high enough for many sensitive applications, which might require such a ratio of 106 or greater. Thus, the inventors believe that utilizing RRAM memory cells in conjunction with the FPGA technology may provide some benefits, additional improvements in particular areas will help to make the RRAM cross-point cell suitable for a wider range of applications.
The following presents a simplified summary of the subject disclosure in order to provide a basic understanding of some aspects described herein. This summary is not an extensive overview of the disclosed subject matter. It is intended to neither identify key or critical elements of the disclosed subject matter nor delineate the scope of the subject innovation. Its sole purpose is to present some concepts of the disclosed subject matter in a simplified form as a prelude to the more detailed description that is presented later.
Various aspects of the subject disclosure provide a field programmable gate array (FPGA) utilizing resistive random access memory (RRAM) technology. The FPGA can comprise a switching block interconnect having parallel signal input lines crossed by perpendicular signal output lines. A RRAM memory cell is formed at respective intersections of the signal input lines and signal output lines. The RRAM memory cell can include a voltage divider comprising multiple resistive elements arranged electrically in series across a common-collector voltage (VCC) and source-supply voltage (VSS) of the RRAM memory cell. A common node of the voltage divider drives a gate of a switching transistor (also referred to as a pass gate transistor) interposed between a signal input line and a signal output line at one intersection of the switching block interconnect. The pass gate transistor is therefore configured to activate or deactivate the intersection.
According to particular aspects, a voltage divider for an RRAM memory cell can comprise a pull up resistor and a pull down resistor. The pull up resistor and pull down resistor comprise programmable resistance material(s), which can be programmed to a high resistance state (non-conductive) or a low resistance state (conductive). When the pull up resistor is programmed to the low resistance state, a pass gate transistor associated with the voltage divider is activated. When the pull down resistor is programmed to the low resistance state, the pass gate transistor is deactivated. Also, the voltage divider arrangement yields fast program and erase times for switching block intersections compared to conventional approaches, such as embedded Flash memories. Moreover, the RRAM memory cell of the subject disclosure yields low power consumption, significant die-size reduction and resistance or immunity to soft errors and electromagnetic radiation errors. Accordingly, various disclosed aspects provide significant improvements in FPGA technology.
According to one aspect of the invention, a field programmable gate array (FPGA) is disclosed. One apparatus includes a switching block routing array comprising a plurality of signal inputs and a plurality of signal outputs, and a transistor element coupled to the switching block routing array, wherein the transistor element comprises a gate, a first terminal and a second terminal, wherein the first terminal is coupled to a signal input from the plurality signal inputs, and wherein the second terminal is coupled to a signal output from the plurality of signal outputs, and wherein the gate is configured to electrically couple the signal input to the signal output in response to a gate control signal. A device may include a plurality of resistive elements coupled to the transistor element, wherein each resistive element from the plurality of resistive elements each comprise a first electrode and a second electrode, wherein each resistive element is characterized by a plurality of resistive states including a low resistive state and a high resistive state, wherein each resistive element is characterized a polarity, wherein the polarity for each resistive element is characterized by a high resistive state in response to a first voltage applied from the first electrode to the second electrode exceeding an erase voltage and is characterized by a low resistive state in response to a second voltage applied from the second electrode to the first electrode exceeding a programming voltage, wherein the plurality of resistive elements includes a first resistive element and a second resistive element, wherein a first electrode of the first resistive element is selectively coupled to a first plurality of voltages, wherein a second electrode of the second resistive element is selectively coupled to a second plurality of voltages, wherein the plurality of resistive elements provides the gate control signal in response to a first resistive state of the first resistive element, to a second resistive state of the second resistive element, to a first voltage from the first plurality of voltages and to a second voltage from the second plurality of voltages, and a shared node coupled to a second electrode of the first resistive element, to a first electrode of the second resistive element, and to the gate of the transistor element. A system may include a programming circuit coupled exclusively to the shared node of the first resistive element and the second resistive element via an output path, wherein the programming circuit is configured to facilitate entry to the first resistive state of the first resistive element in response to a first voltage applied to the shared node, and wherein the programming circuit is configured to facilitate entry of the second resistive state of the second resistive element in response to a second voltage applied to the shared node.
According to another aspect of the invention, a method for forming a field programmable gate array (FPGA) is disclosed. One methodology includes forming a transistor element coupled to a switching block routing array comprising a plurality of signal inputs and a plurality of signal outputs, wherein the transistor element comprises a gate, a first terminal and a second terminal, wherein the first terminal is coupled to a signal input from the plurality signal inputs, and wherein the second terminal is coupled to a signal output from the plurality of signal outputs, and wherein the gate is configured to electrically couple the signal input to the signal output in response to a gate control signal, and forming a plurality of resistive elements coupled to the transistor element, wherein each resistive element from the plurality of resistive elements each comprise a first electrode and a second electrode, wherein each resistive element is characterized by a plurality of resistive states including a low resistive state and a high resistive state, wherein each resistive element is characterized a polarity, wherein the polarity for each resistive element is characterized by a high resistive state in response to a first voltage applied from the first electrode to the second electrode exceeding an erase voltage and is characterized by a low resistive state in response to a second voltage applied from the second electrode to the first electrode exceeding a programming voltage, wherein the plurality of resistive elements includes a first resistive element and a second resistive element, wherein a first electrode of the first resistive element is selectively coupled to a first plurality of voltages, wherein a second electrode of the second resistive element is selectively coupled to a second plurality of voltages, wherein the plurality of resistive elements provides the gate control signal in response to a first resistive state of the first resistive element, to a second resistive state of the second resistive element, to a first voltage from the first plurality of voltages and to a second voltage from the second plurality of voltages, wherein a shared node is coupled to a second electrode of the first resistive element, to a first electrode of the second resistive element, and to the gate of the transistor element. A process includes forming a programming circuit coupled exclusively to the shared node of the first resistive element and the second resistive element via an output path, wherein the programming circuit is configured to facilitate entry to the first resistive state of the first resistive element in response to a first voltage applied to the shared node, and wherein the programming circuit is configured to facilitate entry of the second resistive state of the second resistive element in response to a second voltage applied to the shared node.
According to yet another aspect of the invention. a process for operating an FPGA is disclosed. One technique includes coupling a first electrode of a first resistive element to a first input voltage and coupling a second electrode of a second resistive element to a second input voltage. A process includes applying a first programming voltage to a shared node of a second electrode of the first resistive element, a first electrode of the second resistive element, and to a gate of a transistor element, and changing a resistance state of the first resistive element to a low resistance state while maintaining a resistance state of the second resistive element, when a voltage difference between the first programming voltage at the second terminal and the first input voltage at the first terminal exceeds a programming voltage associated with the first resistive element.
The following description and the annexed drawings set forth in detail certain illustrative aspects of the disclosed subject matter. These aspects are indicative, however, of but a few of the various ways in which the principles of the innovation can be employed and the disclosed subject matter is intended to include all such aspects and their equivalents. Other advantages and novel features of the disclosed subject matter will become apparent from the following detailed description of the innovation when considered in conjunction with the drawings.
The disclosed subject matter is described with reference to the drawings, wherein like reference numerals are used to refer to like elements throughout the description. In the following description, for purposes of explanation, numerous specific details are set forth in order to provide a thorough understanding of the subject innovation. It may be evident, however, that the disclosed subject matter may be practiced without these specific details. In other instances, well-known structures and devices are shown in block diagram or schematic form in order to facilitate describing the subject innovation.
As utilized herein, terms “component,” “system,” “architecture” and the like are intended to refer to a computer or electronic-related entity, either hardware, a combination of hardware and software, software (e.g., in execution), or firmware. For example, a component can be one or more transistors, a memory cell, an arrangement of transistors or memory cells, a gate array, a programmable gate array, an application specific integrated circuit, a controller, a processor, a process running on the processor, an object, executable, program or application accessing or interfacing with semiconductor memory, a computer, or the like, or a suitable combination thereof. The component can include erasable programming (e.g., process instructions at least in part stored in erasable memory) or hard programming (e.g., process instructions burned into non-erasable memory at manufacture).
By way of illustration, both a process executed from memory and the processor can be a component. As another example, an architecture can include an arrangement of electronic hardware (e.g., parallel or serial transistors), processing instructions and a processor, which implement the processing instructions in a manner suitable to the arrangement of electronic hardware. In addition, an architecture can include a single component (e.g., a transistor, a gate array, . . . ) or an arrangement of components (e.g., a series or parallel arrangement of transistors, a gate array connected with program circuitry, power leads, electrical ground, input signal lines and output signal lines, and so on). A system can include one or more components as well as one or more architectures. One example system can include a switching block architecture comprising crossed input/output lines and pass gate transistors, as well as power source(s), signal generator(s), communication bus(ses), controllers, I/O interface, address registers, and so on. It is to be appreciated that some overlap in definitions is anticipated, and an architecture or a system can be a stand-alone component, or a component of another architecture, system, etc.
In addition to the foregoing, the claimed subject matter can be implemented as a method, apparatus, or article of manufacture using typical manufacturing, programming or engineering techniques to produce hardware, firmware, software, or any suitable combination thereof to control an electronic device to implement the disclosed subject matter. The terms “apparatus” and “article of manufacture” where used herein are intended to encompass an electronic device, a semiconductor device, a computer, or a computer program accessible from any computer-readable device, carrier, or media. Computer-readable media can include hardware media, or software media. In addition, the media can include non-transitory media, or transport media. In one example, non-transitory media can include computer readable hardware media. Specific examples of computer readable hardware media can include but are not limited to magnetic storage devices (e.g., hard disk, floppy disk, magnetic strips . . . ), optical disks (e.g., compact disk (CD), digital versatile disk (DVD) . . . ), smart cards, and flash memory devices (e.g., card, stick, key drive . . . ). Computer-readable transport media can include carrier waves, or the like. Of course, those skilled in the art will recognize many modifications can be made to this configuration without departing from the scope or spirit of the claimed subject matter.
Field programmable gate arrays (FPGAs) are employed in a wide range of electronic technology, serving as reconfigurable systems. In some applications, FPGAs can be integrated with microprocessors to serve as system-on-chip devices, which can be employed as a primary controller for various computer components, such as set top boxes and others. A wide range of uses for these devices exist, including telecommunications and networking, robotics, micro-electronics, small-scale industrial manufacturing, consumer electronics including handset computers, smart-phones and personal digital assistants, and the like, as well as other applications and technologies. Additionally, new applications are invented routinely as capabilities of FPGA and FPGA-based devices improve.
One basic FPGA architecture is the programmable switching block, which acts as a programmable signal routing matrix. A switching block comprises a set of parallel signal input lines intersected by a set of perpendicular signal output lines. At a junction of respective signal input lines and signal output lines is a configuration cell (also referred to herein as a configuration bit). Activation and deactivation of subsets of configuration cells at respective signal input/signal output junctions facilitate configuration of a programmable switching block. Particularly, a configuration cell at a given junction can be activated to electrically connect or route a signal input line to a signal output line at that junction, or can be deactivated to electrically isolate the signal input line and signal output line at that junction. The ability to activate or deactivate respective junctions is the basis for configurability of the programmable switching block. Thus, for instance, a set of electrical components connected to the signal inputs and signal outputs can be selectively inter-connected by activating particular junctions and deactivating other junctions. This selective inter-connection can enable some functionality, while disabling other functionality, in effect configuring the programmable switching block for the enabled functionality (which is a subset of all possible functionality thereof).
One of the more common FPGA configuration cells is the SRAM configuration cell. Probably the most typical SRAM configuration cell comprises six or more transistors, referred to as a 6T SRAM cell. Four of the SRAM transistors form a pair of cross-coupled inverters, or latches. The SRAM cell has two stable states that denote respective states of a binary bit, 0 and 1. The remaining two transistors of the 6T SRAM cell control access to a storage cell during read and write operations, and are referred to as access transistors.
In addition to the basic 6T SRAM, other SRAM chips use eight transistors, ten transistors or more to store a single bit. Generally, the fewer transistors needed per cell the smaller the cell and the lower the cost of manufacture. The relatively large area of the 6T SRAM cell (often greater than 125F2—where F denotes the minimum feature size, such as 65 nanometer, etc.) increases cost of manufacture while reducing transistor density, as compared with technologies having smaller component size. In addition, SRAM is volatile memory, requiring continuous power to maintain stored information, and is susceptible to memory loss from high frequency electromagnetic radiation (e.g., cosmic rays, high frequency ultraviolet, X-Ray, etc.). Moreover, a system designed with SRAM based FPGA typically requires external Flash memory to configure the SRAM bits during powerup sequence, slowing down the powerup sequence, and further adding to manufacture costs and increasing chip size.
Aspects of the subject disclosure provide alternatives to SRAM memory cells for FPGA technology. In one aspect, a programmable switching block is formed from resistive random access memory (RRAM), rather than SRAM memory. RRAM technology is based on dielectric material having programmable resistance (e.g., a resistance that can be altered between two or more states by application of an external force, such as a voltage). A simple RRAM memory cell can include a programmable resistance dielectric—having programmable high resistance and low resistance states—positioned between two otherwise isolated conductors. Thus, this simple RRAM memory cell can be conducting or non-conducting in response to a program voltage, mimicking the basic property of a pass gate transistor.
RRAM memory cells have several advantages over SRAM memory cells. First, RRAM technology is generally much smaller than SRAM, consuming silicon area on the order of 4F2 per adjacent RRAM device (e.g., a memory cell comprising two RRAM devices would therefore be approximately 8F2 if constructed in adjacent silicon space). Non-adjacent RRAM devices, e.g., stacked above or below each other, can consume as little as 4F2 for a set of multiple non-adjacent devices. This leads to much greater semiconductor component density, and lower manufacturing costs for a given number of transistors. Like SRAM, RRAM also has fast programming speed and low programming current, but unlike SRAM has high logic utilization. Further, RRAM is non-volatile memory; RRAM has the capacity to store data without continuous application of power. Therefore, RRAM based FPGAs utilizing non-volatile embedded RRAM as configuration bits can have a much faster power up cycle than the SRAM FPGAs, since external non-volatile memory is generally not required. In addition to the foregoing, RRAM cells can generally be built between metal interconnect layers, enabling RRAM FPGAs to be usable for two-dimension as well as three-dimension FPGA architectures.
One simple RRAM programmable switching block arrangement is called a RRAM cross-point cell. The RRAM cross-point cell comprises a dielectric material having discrete programmable resistances positioned at a signal junction of a programmable switching block (e.g., between a signal input line and a signal output line). The RRAM cross-point cell can operate as a configuration cell or configuration bit for the signal junction, as described herein. For instance, when activated the RRAM cross-point cell can configure the signal junction to pass a signal (e.g., when a programmable resistance of the RRAM cross-point cell is programmed to a low resistance state), and when deactivated the RRAM cross-point cell can configure the signal junction to block the signal (e.g., when the programmable resistance is erased, and in a high resistance state). Thus, the cross-point cell comprises a simple RRAM dielectric that acts as a switching device between the signal input and signal output. Generally, the cross-point cell is programmed or erased by application of a suitable program or erase voltage to the signal lines.
Although the RRAM cross-point cell is a simple device, it has some drawbacks relative to metal oxide semiconductor (MOS) or complementary metal oxide semiconductor (CMOS) configuration cells. First, a resistance value of a typical RRAM when on or programmed (also referred to as the on resistance, or Ron) is usually higher than a MOS transistor's resistance, in a similar programmed state. This means that a signal will propagate more slowly through a signal intersection activated with an RRAM configuration cell based on the simple cross-point cell, as compared to a MOS or CMOS-based configuration cell. In addition, typical RRAM cross-point cells often have lower erase resistance (also referred to as off resistance, or Roff) than typical MOS or CMOS transistors. This lower Roff, can result in a sizable parasitic signal through the signal intersection when the RRAM cross-point cell is erased. A MOS Roff/Ron ratio (also referred to herein as a cutoff ratio) is usually more than 106, while typical RRAM can reliably deliver cutoff ratios of up to 103, but are less reliable above that quantity. Thus, FPGA configuration cells implemented only with the RRAM cross-point cell as a switching device may be unsuitable for applications requiring higher cutoff ratios, unless the cutoff ratio is improved to reasonably match typical cutoff ratios of MOS or CMOS transistors. Therefore, FPGA manufacturers are limited for many applications to a MOS or CMOS based switching transistor (pass gate transistor), connected to an SRAM cell to activate and deactivate the switching transistor.
Additional aspects of the subject disclosure provide an RRAM-based configuration cell having a significantly higher activation/deactivation resistance ratio (cutoff ratio), in conjunction with a die size much smaller than SRAM configuration cells. In some aspects, an RRAM configuration cell is provided having a plurality of resistive elements and one or more transistor elements. In one such aspect, the resistive elements can form a voltage divider having a common node that drives a gate of a pass gate transistor. Moreover, the pass gate transistor can include a transistor having a cutoff ratio on the order of 106 or greater. In at least one aspect, the pass gate transistor can comprise a CMOS transistor.
According to further aspects, the RRAM-based configuration cell comprises programming circuitry that is independent of signal input and signal output lines of an associated FPGA programmable switching block. The independent programming circuitry can improve input signal to output signal propagation performance since the programming circuits are not generating additional load capacitance and leakage on the input signal and output signal lines. In a particular aspect, the programming circuitry can include a transistor element that facilitates complementary programming of resistive elements of a voltage divider. The complementary programming can in turn drive alternate states of a pass gate transistor, activating or deactivating the pass gate transistor.
The RRAM-based configuration cell can yield significant advantages over other programmable switching blocks implemented with simple RRAM cross-point cells. For instance, because input signal lines and output signal lines of an FPGA are connected or isolated by a pass gate transistor having a high cutoff ratio, rather than an RRAM dielectric with 103 cutoff ratio, high speed applications can be served with good noise immunity. Moreover, better signal integrity and disturb immunity can be achieved because the signal path is not routed through the RRAM cell. Because programming circuitry is independent of the signal lines, related signal degradation can be mitigated or avoided.
Referring now to the drawings,
RRAM configuration cell 100 can comprise a transistor element 102. Transistor element 102 can comprise a gate-driven transistor having relatively high cutoff ratio. Examples of transistor element 102 can include an NMOS transistor, a PMOS transistor, or a CMOS transistor (e.g., an NMOS+PMOS transistor), or other suitable three-terminal transistor. In at least one aspect of the subject disclosure, transistor element 102 can be selected for suitable electrical characteristics, including switching speed, power consumption, cutoff ratio (e.g., about 106, about 107, or greater), or the like, or a suitable combination thereof. The electrical characteristics can be matched to an anticipated application or group of applications in which RRAM configuration cell 100 is intended for use.
Further, transistor element 102 has at least a gate and a channel region. The gate of transistor element 102 can be driven by a common node of a voltage divider 104. Voltage divider 104 therefore controls activation/deactivation states of transistor element 102. In at least one aspect of the subject disclosure, voltage divider 104 can be a programmable voltage divider. Particularly, voltage divider 104 can comprise two programmable resistive elements (e.g., first programmable resistive element 104A, second programmable resistive element 104B) having respective programmable resistances. For instance, the resistive elements 104A, 104B can have at least a first programmable resistance and a second programmable resistance, where the second programmable resistance is a different resistance value from the first programmable resistance. In a first aspect of the subject disclosure, the first and second programmable resistive elements 104A, 104B can be programmed or erased to have the first and second programmable resistances, respectively (e.g., low resistance and high resistance). In a second aspect, the first and second programmable resistive elements 104A, 104B can be erased or programmed to have the second and first programmable resistances, respectively (e.g., high resistance and low resistance). In a third aspect, the first and second programmable resistive elements 104A, 104B can be erased to the second programmable resistance (e.g., both high resistance). In a fourth aspect, the first and second programmable resistive elements 104A, 104B can be programmed to have the first programmed resistance (e.g., both low resistance).
One operational example for voltage divider 104 is as follows. The first programmable resistive element 104A can be programmed to a low resistance and the second programmable resistive element 104B can be erased to a high resistance. This state can be utilized, for instance, to activate or to turn on transistor element 102. In another state, the first programmable resistive element 104A can be erased to a high resistance and the second programmable resistive element 104B can be programmed to a low resistance. This state can be utilized, for instance, to turn off transistor element 102. In yet another state, both the first programmable resistive element 104A and the second programmable resistive element 104B can be erased to the high resistance state. This third state can be utilized, for instance, as an intermediate state while changing resistance states (e.g. from high to low or low to high). In at least one aspect, the third state can also serve as a suitable initial factory setting.
The programmable resistance of voltage divider 104 determines whether a positive source voltage (not depicted) is applied to the gate of transistor element 102 (activating transistor element 102), or whether ground or its equivalent is applied to the gate of transistor element 102 (deactivating transistor element 102). Accordingly, the program state of voltage divider 104 determines activation/deactivation state of transistor element 102.
A programming circuit 106 is depicted for RRAM configuration cell 100. As depicted, programming circuit 106 can be independent of signal lines of associated communication circuitry (e.g., signal input and signal output lines of a programmable switching block). Programming circuit 106 can include at least one program transistor that, in conjunction with pull up and pull down voltage sources (not depicted), can program the resistive elements of voltage divider 104. In at least one aspect, programming circuit 106 can be operated to program the resistive elements in a complementary fashion, as is described in more detail herein (e.g., see
As depicted, in
Voltage divider circuit 200 can comprise a first resistive element, resistive element1 202 and a second resistive element, resistive element2 204. As depicted, resistive element1 202 and resistive element2 204 are arranged electrically in series. Additionally, resistive elements 202 and 204 can have programmable resistance values.
In some aspects of the subject disclosure, resistive elements 202 and 204 can be formed of a suitable dielectric material that can be programmed to have two or more discrete resistance values. In one particular aspect, resistive element1 202 and resistive element2 204 are comprised of the same dielectric material and have substantially the same two or more discrete resistance values. In another aspect, resistive element1 202 and resistive element2 204 can be comprised of different dielectric materials, or can have different discrete resistance values, or a combination thereof.
According to at least one aspect of the subject disclosure, resistive element1 202 can serve as a pull up resistor for a RRAM configuration cell, whereas resistive element2 204 can serve as a pull down resistor for the RRAM configuration cell. Further, the pull up resistor has a first programmable resistance that can be programmed at least to a first resistance value or a second resistance value, where the first resistance value is smaller than the second resistance value. Moreover, the pull down resistor has a second programmable resistance. In at least one aspect of the subject disclosure, the second programmable resistance can be set at least to a third resistance value or a fourth resistance value. In a particular aspect, the third resistance value of the pull down resistor can be substantially equal to the first or second resistance value (of the pull up resistor), or the fourth resistance value of the pull down resistor can be substantially equal to the first or second resistance values, or a suitable combination thereof.
In other aspects, a ratio of respective resistance values of the pull up resistor and pull down resistor can determine a cutoff ratio of the respective resistors. A general convention for the cutoff ratio is to divide a higher of the programmable resistances by a lower of the programmable resistances (e.g., 1 giga-ohms/100 kilo-ohms). For instance, a cutoff ratio of the pull up resistor can be equal to the first resistance value divided by the second resistance value, whereas a cutoff ratio of the pull down resistor can be equal to the third resistance value divided by the fourth resistance value. In a particular aspect, resistive element1 202 or resistive element2 204 can have a cutoff ratio at least of 103. In one aspect, one or more of the cutoff ratios can be 104 or more, and in yet another aspect, one or more of the cutoff ratios can be 105 or more.
In various embodiments, resistive elements such as resistive elements 202 and 204 are associated with a polarity configuration based upon the structure of the resistive element. As an example, under a first polarity configuration (e.g. a forward polarity configuration), a positive voltage applied across a first and a second terminal of the resistive element may cause the resistive element to enter a low resistance state. In some embodiments, the conduction may be caused by formation of a conductive filament within the resistive element, or the like. Further, under a second polarity configuration (e.g. a reverse polarity configuration), a positive voltage across the first and second terminal of the resistive element may cause the resistive element to enter a high resistance state. In some embodiments, the conduction may be caused by rupture of a conductive filament within the resistive element, or the like. In various embodiments resistive elements 202 and 204 will be oriented with the same polarity configuration (e.g. both forward polarity configuration or both reverse polarity configuration). In other embodiments, the polarities may be different for resistive elements 202 and 204. Accordingly, various embodiments of the present invention disclosed herein will have different behavior depending upon structure or polarity configurations of the resistive elements.
In addition to the foregoing, the pull up resistor and pull down resistor can be programmed in a complementary fashion, such that when the pull up resistor is programmed to the first resistance value (RPU ON—conducting state for RPU), the pull down resistor is erased to the second resistance value (RPD off—non-conducting state for RPD), and vice versa. Resistive elements 202 and 204 can be set to a particular resistance value by application of a suitable voltage across the respective resistance elements 202 and 204. For instance, resistive elements 202 and 204 can be set to RPU ON (low resistance, conducting state) or RPD ON, respectively, upon application of the voltage to the pull up resistor or the pull down resistor, respectively. If an erase voltage is applied to the pull up resistor or pull down resistor, these resistors will have the RPU OFF (e.g., the second resistance value) or RPD OFF (e.g., the fourth resistance value), respectively. Said differently, programming either resistor to the low resistance, conducting state can be accomplished by applying a program voltage to the resistor, whereas the respective resistors are in a high resistance, non-conductive state when an erase voltage is applied thereto (whether for unipolar or bipolar RRAM).
Voltage can be applied to the pull up resistor and pull down resistor via three voltage contacts, a program contact 206, pull up contact 208 and pull down contact 210. Moreover, the three voltage contacts can be operated to program the resistive elements 202 and 204 in a complementary fashion. Particularly, by applying substantially the same voltage at the program contact 206 and one other of the two contacts (208, 210), a substantially zero voltage drop can be applied across one of the resistive elements. Further, by applying a second voltage having a difference in magnitude of at least the program voltage, the remaining of the two resistive elements observes the program voltage (in a forward polarity configuration) or the erase voltage (reverse polarity configuration). As a more specific example, applying the program voltage to both program contact 206 and pull up contact 208 results in substantially no voltage drop across resistive element1 202, rendering the pull up resistor un-programmed. Applying zero volts (or ground) at the pull down contact 210 then causes a voltage drop substantially equivalent to the program voltage across resistive element2 204, thus programming the pull down resistor (in a forward polarity configuration) to be in a low resistance state. When the resistive element 204 is in reverse polarity configuration, the voltage drop is substantially equivalent to an erase voltage, thus the pull down resistor is erased and in a high resistance state.
In contrast, application of high voltage at pull up contact 208, zero voltage at pull down resistor 210 and zero voltage at program contact 206 results in programming of the pull up resistor 202 (in a forward polarity configuration) (which observes program voltage at pull up contact 208 and zero volts at program contact 206) to be in a low resistance state and non-programming of the pull down resistor (which observes zero volts at both pull down contact 210 and program contact 206). When the resistive element 202 in in reverse polarity configuration, the voltage drop may be substantially equivalent to an erase voltage, thus even if the pull up resistor 202 is erased and in a high resistance state.
In the foregoing example, it can be understood that complementary programming of an initially erased pull up resistor and initially erased pull down resistor can be accomplished by tying pull up contact 208 to the program voltage (e.g., three volts), and tying pull down contact 210 to zero volts, and simply applying program contact 206 to zero volts or to the program voltage. Under a forward polarity configuration, zero volts on contact 206 will program the pull up resistor (resistive element1 202), and program voltage on contact 206 will program the pull down resistor (resistive element2 204) in this configuration. This is only one example implementation, however, and is not intended to limit the scope of the subject disclosure. Under a reverse polarity configuration, zero volts on contact 206 will erase the pull up resistor (resistive element1 202), and program voltage on contact 206 will erase the pull down resistor (resistive element2 204). Regardless of how complementary programming is implemented, voltage divider 200 results in distinct voltages at cell gate contact 212, depending on respective states of the pull up resistor and pull down resistor. These distinct voltages can configure a pass gate transistor to be active or inactive. For instance, where pull up contact 208 is set to the program voltage and pull down contact 210 is set to zero volts, activating the pull up resistor (to be in a low resistance state) and deactivating the pull down resistor (to be in a high resistance state) results in charging up cell gate contact 212; in effect passing the positive voltage source applied at node 208 to cell gate contact 212. In RRAM configuration cell 100 of
In addition to the foregoing, circuit 300A has a transistor 306A comprising a gate 308B and a channel region. Transistor 306A can be a suitable three-terminal transistor device (e.g., an NMOS, a PMOS or a CMOS transistor). As depicted, gate 308A can be driven by a common node 310A of resistive elements 302A and 304A. Additionally, first resistive element 302A is connected to voltage contact 312A, having a voltage value suitable for programming resistive element 302A to a low resistance state, also referred to as activating resistive element 302A. Resistive element 304A, on the other hand, is connected to a voltage contact 314A having low voltage (e.g., ground, a negative voltage, or other suitable voltage lower than the voltage applied at voltage contact 312A), as indicated.
As depicted, resistive element 302A is programmed, having low resistance. Being complementary, resistive element 304A is erased, having high resistance. Accordingly, a program voltage generated at voltage contact 312A can drive common node 310A, thereby activating transistor 306A. Thus, transistor 306A is in the conducting state. In various embodiments, when resistive element 302A and 304A are in a forward polarity configuration, the voltage across resistive element 302A is small, whereas the voltage across resistive element 304A may be closer to a programming voltage. The inventors recognize that in some rare conditions, the voltage across resistive element 304A may be high enough to be a programming voltage and to change the high resistance state of resistive element 304A to a low resistance state. Accordingly, in various embodiments, when resistive element 302A and 304A are in a reverse polarity configuration, the voltage across resistive element 302A is small, whereas the voltage across resistive element 304A may be closer to an erase voltage. The inventors recognize that if the voltage across resistive element 304A is high enough to be an erase voltage the high resistance state of resistive element 304A will more readily remain in a high resistance state.
Different from circuit 300A, first resistive element 302B has high resistance (e.g., erased) whereas second resistive element 304B has low resistance (e.g., programmed). This can be accomplished, for instance, by applying high voltage 312B at common node 310B. Thus, first resistive element 302B experiences substantially no voltage drop, whereas second resistive element 304B experiences a voltage drop substantially equal to the voltage applied at voltage contact 312B (e.g., the program voltage). Accordingly, current can flow to voltage contact 314B, thus programming the pull down resistor to a low resistance state. During read operation, VCC is applied to voltage contact 312B, and ground is applied to voltage contact 314B, draining charge from gate 308B. This in turn deactivates transistor 306B, rendering transistor 306B in the non-conducting state. As described, circuit 300A and circuit 300B can depict alternate states of RRAM configuration cell 100, in at least one aspect of the subject disclosure.
In various embodiments, when resistive element 302B and 304B are in a forward polarity configuration, the voltage across resistive element 304B is small, whereas the voltage across resistive element 302B may be closer to a programming voltage. The inventors recognize that in some rare conditions, the voltage across resistive element 302B may be high enough to be a programming voltage and to change the high resistance state of resistive element 302B to a low resistance state. Accordingly, in various embodiments, when resistive element 302B and 304B are in a reverse polarity configuration, the voltage across resistive element 304B is small, whereas the voltage across resistive element 302B may be closer to an erase voltage. The inventors recognize that if the voltage across resistive element 302B is high enough to be an erase voltage the high resistance state of resistive element 302B will more readily remains in a high resistance state.
As depicted, programming circuit 400 can comprise a program transistor 402. Program transistor 402 can be any suitable switching transistor or pass gate transistor device. In one aspect of the subject disclosure, program transistor 402 can comprise a three-terminal transistor device. Additionally, programming circuit 400 can comprise a row programming contact 404 connected to a gate of program transistor 402. By applying a suitable positive voltage to row programming contact 404, program transistor 402 is activated. By applying a lesser voltage, or ground, to row programming contact 404, program transistor 402 is deactivated.
Further to the above, programming circuit 400 can comprise a column programming contact 406. Column programming contact 406 is connected to a channel region of program transistor 402. This arrangement causes a voltage applied at column programming contact 406 to be propagated to program contact 408 when program transistor 402 is activated, as described above, and causes column programming contact 406 to be isolated from program contact 408 when program transistor 402 is deactivated (e.g., during a read or standby operation). Where program contact 408 is connected to one or more programmable resistances, programming circuit 400 can facilitate programming (or erasing) the programmable resistance(s). This can be accomplished in part by first activating program transistor 402 and then applying a suitable program voltage at column programming contact 406. This program voltage is propagated to program contact 408 by programming circuit 400, applying at least one voltage to one or more of the programmable resistances.
According to a particular aspect of the subject disclosure, program contact 408 can be substantially equivalent to program contact 206 of
As a particular example, consider the case where programming circuit 400 is connected to common node 310A/310B of
The programming and erasing of pull up and pull down resistors described above can in turn drive activation/deactivation of a pass transistor having its gate connected to program contact 408 (e.g., transistor 306A transistor 306B, transistor element 102, etc.). Specifically, programming circuit 400 can be utilized in part to program or erase pull up and pull down resistors, which in turn control activation/deactivation of the pass gate transistor. This controlled activation/deactivation of the pass gate transistor provides one mechanism for configuring the programmable switching block junction.
Programmable switching block 500 can comprise a set of signal inputs 502 intersecting a set of signal outputs 504 that are parallel to set of signal inputs 502. Moreover, a RRAM junction cell is formed at respective junctions of signal input lines 502 and signal output lines 504. In at least one aspect, the RRAM junction cells can correspond with the junction cell schematic 506.
The RRAM junction cell is configured, in an activated or programmed state, to electrically connect a signal input line and a signal output line at a particular junction, and in a deactivated or erased state, to electrically isolate the signal input line and the signal output line. A connected junction is a programmed junction, depicted by a black square at the respective junction. An isolated junction is an open junction, depicted by a white square at the respective junction.
It should be appreciated that respective junctions of programmable switching block 500 can be reprogrammed (e.g., by changing activation/deactivation states of configuration cells positioned at the respective junctions). Thus, although a particular program state is depicted by the connected junctions and open junctions of
In addition to the foregoing, in at least some aspects of the subject disclosure, programmable switching block 500 can have bidirectional signal inputs and signal outputs. Said differently, one (or more) of signal outputs 504 can initiate a signal, which can be received at a corresponding one (or more) of signal inputs 502. As described herein, whether this signal is received or not received at the signal input is determined from a configuration state of an associated RRAM configuration cell. If the associated RRAM configuration cell is configured as a closed circuit, the signal can be received at the corresponding signal input; otherwise, the signal is not received. Therefore, although programmable switching block 500 identifies respective signal inputs 502 and signal inputs 504, it should be appreciated that in the above-described aspects signal inputs 502 and signal outputs 504 can be renamed signal contacts 505 (not depicted) having a first end 505A and second end 505B, that can be employed for either transmitting or receiving a signal, or both, under suitable conditions (e.g., signals of different frequency, phase, or other suitable distinguishing characteristic could be transmitted concurrently at first end 505A and second end 505B, and received at the corresponding other end 505B and 505A, respectively).
Respective cells 602A-602D comprise respective RRAM-based configuration cells. In at least one aspect of the subject disclosure, the RRAM-based configuration cells can be substantially similar to RRAM configuration cell 100. A pass gate transistor of the RRAM-based configuration cells is interposed between respective junctions of input signal columns and output signal rows. This arrangement enables respective pass gate transistors to activate or deactivate the respective junctions. Thus, a junction of input_column1 604 and output_row0 608 is controlled (e.g., activated or deactivated) by the pass gate transistor of 1-0 cell 602B. Likewise, a junction of input_column0 606 and output_row0 608 is controlled by the pass gate transistor of 0-0 cell 602A, a junction of input_column1 604 and output_row1 610 is controlled by the pass gate transistor of 1-1 cell 602D, and a junction of input_column0 and output_row1 610 is controlled by 0-1 cell 602C.
Respective program transistors associated with row0 and row1 are activated and deactivated by voltages applied at programming_row0 616, and by programming row1 618, respectively. A voltage applied at programming_column1 612 is passed to a common node of the voltage divider of 1-0 cell 602B when row0 program transistors are activated by programming_row0 616. Likewise, a voltage applied at programming_column0 614 is passed to a common node of the voltage divider of 0-0 cell 602A when row0 program transistors are activated. Thus, programming/erasing row0 voltage dividers is accomplished by applying an activation voltage (e.g., three volts) at programming_row0 616, and applying suitable program or erase voltages at programming_column1 612 (for 1-0 cell 602B) and at programming_column0 614 (for 0-0 cell 602A). Moreover, a pull up voltage source 620 applies a voltage to respective pull up resistors of voltage dividers in row 0, whereas a pull up voltage source 624 applies a voltage to respective pull up resistors of voltage dividers in row 1. Pull down activation contact 617 can activate or deactivate a row0 pull down transistor, enabling a voltage applied at a pull down source 622 to be applied to pull down resistors of voltage dividers in row 0. Likewise, pull down activation contact 619 can activate or deactivate a row1 pull down transistor, enabling a voltage applied at pull down source 626 to be applied to pull down resistors of voltage dividers in row 1.
In addition to the foregoing, a read enable circuit is provided that facilitates application of a VCC voltage to the pull up resistors of cells 602A-602D. The read enable circuit comprises a read enable voltage source 630. Additionally, the read enable circuit comprises respective PMOS transistors 632. A drain of the respective PMOS transistors 632 is connected to respective pull up transistors of voltage dividers in row 0, as depicted.
Various operating examples of switching block 600 are depicted at
Assuming that all RRAM resistors are in an erase state (high resistance state), high voltage HV 704 is applied to program_row0, which is applied directly to program transistor gates of row0, activating those program transistors, and also enables the HV 704 applied at pull up voltage source 620 to be propagated to pull up resistors of row0. Moreover, high voltage HV 704 is applied at program_column1 and zero volts 0V 706 is applied at program_column0. Accordingly, HV 704 is propagated to the common node of the voltage divider in 1-0 cell 602B. The resulting voltage drop across the pull down resistor of 1-0 cell 602B and current 708 in 1-0 cell 602B programs the pull down resistor of 1-0 cell 602B to a low resistance state when the pull down resistor is in a forward polarity configuration. When the pull down resistor is in a reverse polarity configuration, the voltage drop erases the pull down resistor to a high resistance state. In contrast, a low voltage drop (e.g., about zero volts) across both terminals of the pull up resistor maintains the pull up resistor in a current state (its initial erased state), which is the erased state in this example. Using forward polarity resistors, the high resistance state of the pull up resistor and low resistance state of the pull down resistor deactivates the pass gate transistor of 1-0 cell 602B during normal read operation.
Zero voltage 0V 706 at program_column0 is applied at the common node of the voltage divider of 0-0 cell 602A. The resulting voltage drop across the pull up resistor of 0-0 cell 602A and the current 710 in 0-0 cell 602A programs the pull up resistor to low resistance, whereas about zero volts applied to both terminals of the pull down resistor (at pull down source 622 and programming_column0 614) maintains the pull down resistor in the erased state (since all pull down and pull up resistors start in the erased state for the row0 programming operation of
Each RRAM resistor in the respective cells 602C-602D is in an erased state prior to application of the voltages listed in schematic diagram 800. The zero volts 0V 806 applied to programming_row0 616 deactivates program transistors of row0, resulting in no voltage being driven at common nodes of the voltage dividers of 0-0 cell 602A and 1-0 cell 602B. Moreover, 0V 806 applied to programming_row0 616 deactivates the pull up transistor of row0, such that no voltage is applied to the pull up resistors of row0. Finally, 0V 806 applied at pull down activation source 617 isolates pull down resistors of row0 from pull down source 622. Because no voltage is applied to nodes of the voltage divider, row0 voltage dividers remain unchanged and in their initial erased states or previously programmed state.
With regard to row1, high voltage HV 804 applied to programming_row1 618 activates program resistors of row1. The program resistor of 1-1 cell 602D transfers 0V 806 to the common node of the voltage divider of 1-1 cell 602D. In addition, HV 804 applied at pull up source 624 results in a voltage drop across the pull up resistor of this cell that is approximately equal to HV 804. This voltage drop and the resulting current 808 of 1-1 cell 602D programs the pull up resistor of 1-1 cell 602D to low resistance when the pull up resistor is in a forward polarity configuration. When the pull up resistor is in a reverse polarity configuration, the voltage drop erases the pull up resistor to a high resistance state. 0V 806 applied at pull down source 626 results in approximately zero volts across the pull down resistor, maintaining the pull down resistor in its initial erased, high resistance state. When using forward polarity resistors, because the pull up resistor of 1-1 cell 602D is programmed and the pull down resistor erased, the pass gate transistor of 1-1 cell 602D will be activated during normal read operation (e.g., see
In contrast, high voltage HV 804 applied at programming_column0 614 results in HV 804 at the common node of the voltage divider of 0-1 cell 602C. In conjunction with HV 804 at pull up source 624, this results in approximately zero volts across the pull up resistor of 0-1 cell 602C, maintaining this pull up resistor in its existing state (the erased state in this example). The 0V 806 applied at pull down source 626 results in a voltage differential of about HV 804 across the pull down resistor of 0-1 cell 602C, leading to the depicted current 810 of this cell and programming the pull down resistor to low resistance when the pull up resistor is in a forward polarity configuration. When the pull up resistor is in a reverse polarity configuration, the voltage drop erases the pull up resistor to a high resistance state. Moreover, this configuration deactivates the pass gate transistor of 0-1 cell 602C during normal read operation.
As depicted, row erase operation 900 includes a VCC 902 applied at read enable contact 630. This deactivates PMOS transistors 632. In addition, an erase voltage EV 907 is applied to pull down voltage source 622 which is activated with HV 904 applied at pull down activation contact 617. Further, HV 904 is applied to programming_row0 616, while EV 907 is also applied to programming_column0 614. Approximately zero volts 0V 906 is applied at pull up voltage source 620, pull down activation contact 619, programming_row1 618, and to programming_column1 612. As described above, 0V 906 applied at programming_row1 618 prohibits programmable resistors of row1 from changing state (e.g., maintaining them in respective initial states prior to implementing the erase operation). The programmed pull down resistor of 1-0 cell 602B, is erased by application of EV 907 to the bottom terminal of this pull down resistor and 0V 906 applied to programming_column1 612. The resulting reverse potential difference across the pull down resistor of 1-0 cell 602B and the reverse current 908 generated in this pull down resistor erases the pull down resistor to a high resistance state when the pull down resistor is in a forward polarity configuration. When the pull down resistor is in a reverse polarity configuration, the voltage drop programs the pull down resistor to a low resistance state. The approximately zero volt potential across the pull up resistor of 1-0 cell 602B from 0V 906 at programming_column1 612 and at pull up voltage source 620 maintains the pull up resistor in its initial erased state.
Erase voltage EV 907 can be a suitable voltage that, in conjunction with a voltage applied to the common node of the voltage divider of 1-0 cell 602B, results in a potential difference across the pull down transistor that erases the pull down transistor to a high resistance state. Thus, EV 907 can vary depending on a type of RRAM technology employed for the pull down resistor (or pull up resistor when erasing the pull up resistor). For unipolar RRAM technology, a suitable positive potential difference distinct from HV 904 is generally employed for erasing the pull down resistor to the high resistance state. For bipolar RRAM technology, a potential difference that can be similar in magnitude to HV 904 but opposite in polarity is generally suitable for erasing the pull down resistor to the high resistance state (in the forward polarity configuration). Other voltages will be suitable for other RRAM technology, as is known in the art or made known to one of ordinary skill in the art by way of the context provided herein. Such other voltages and RRAM technologies are generally considered within the scope of the subject disclosure.
Regarding 0-0 cell 602A, EV 907 is applied to programming_column0 614. This results in no significant potential difference across the pull down resistor of 0-0 cell 602A, as the pull down resistor observes the EV 907 at its upper and lower terminals (the latter being applied at pull down voltage source 624 and activated by HV 904 applied at pull down activation source 617). Accordingly, the pull down resistor of 0-0 cell 602A does not change state. The pull up resistor of 0-0 cell 602A, on the other hand, observes 0V 906 at its upper terminal applied at pull up voltage source 620, and EV 907 applied at programming_column0 614, which causes a reverse current 910 through this pull up resistor, erasing the pull up resistor to the high resistance state when the pull up resistor is in a forward polarity configuration. When the pull up resistor is in a reverse polarity configuration, the voltage drop programs the pull up resistor to a low resistance state. Following erase operation 900, the pull up and pull down resistors of 0-0 cell 602A and 1-0 cell 602B can be in their original factory settings (e.g., erased state).
Turning to row erase operation 1000, VCC 1002 is applied at read enable contact 630 to deactivate PMOS transistors 632, and erase voltage EV 1007 is applied at pull down voltage source 626 which is activated with high voltage HV 1004 applied to pull down activation contact 619. HV 1004 is also applied at programming_row1 618, while EV 1007 is applied at programming_column1 612. Approximately zero volts 0V 1006 is applied at pull up voltage source 624 and to pull down activation contact 617, programming_row0 616 and programming_column0 614. Row0 program transistors are deactivated, leaving the initial erase states of the voltage dividers of 0-0 cell 602A and 1-0 cell 602B unchanged. HV 1004 at programming_row1 618 activates program transistors of row1. EV 1007 applied at programming_column1 612 and at pull down voltage source 626 results in approximately zero voltage differential across the pull down resistor of 1-1 cell 602D, leaving this pull down resistor in its initial erase state. In contrast, 0V 1006 applied at pull up voltage source 624 and the EV 1007 applied at programming_column1 612 results in a potential difference approximately of EV 1007 across the pull up resistor of 1-1 cell 602D and current 1008, erasing this pull up resistor when the pull up resistor is in a forward polarity configuration. When the pull up resistor is in a reverse polarity configuration, the voltage drop programs the pull up resistor to a low resistance state. 1-1 cell 602D is therefore in its initial factory setting after the depicted row erase operation (e.g., the pull up resistor and pull down resistor in the erase state). 0-1 cell 602C observes approximately zero volts at the common node of the pull up and pull down resistors of this cell. Accordingly, approximately zero volts applied at pull up voltage source 624 results in substantially no voltage dropped across the pull up resistor of 0-1 cell 602C, maintaining this resistor in its previous erase state. The EV 1007 applied at pull down voltage source 626 results in a voltage drop across the pull down resistor of 0-1 cell 602C, and the depicted current 1010. The voltage drop and current erases this pull downresistor to be in a low resistance state when the pull down resistor is in a forward polarity. When the pull down resistor is in a reverse polarity configuration, the voltage drop programs the pull down resistor to a low resistance state.
Using forward polarity resistors, embodiments leave the pull up and pull down resistors of 0-1 cell 602C in the erase state (e.g., initial factory setting).
To implement the read operation, VCC 1102 is applied at pull down activation contacts 617 and 619, and as a result the zero volts applied at pull down sources 622 and 626 are transferred to the lower contacts of the pull down resistors of row0 and row1. The pull up transistors are deactivated in response to zero volts being applied at programming_row0 616 and at programming_row1 618. However, read-enable PMOS transistors 632 are activated by zero volts applied at read-enable contact 630, and VCC 1102 applied at respective source nodes of read-enable PMOS transistors 632 is therefore observed at the upper contacts of the pull up resistors of row0 and row1. Program transistors of row0 and row1 are deactivated, and thus the respective voltage dividers observe only VCC at the upper contact, and zero volts at the lower contact, maintaining respective pull up and pull down resistors in their existing states.
In response to voltage settings described above, the pass gate transistors of 0-0 cell 602A and 1-1 cell 602D are activated, and in a conductive state 1108, while the pass gate transistors of 1-0 cell 602B and 0-1 cell 602C are deactivated, and in a non-conductive state 1110, as depicted. Accordingly, because 1-1 cell 602D and 0-0 cell 602A are configured to be active, signal input 604 is electrically connected with signal output 610 at 1-1 cell 602D, and signal input 606 is electrically connected with signal output 608 at 0-0 cell 602A. Current flow (in this case, signal current) is depicted by the dashed lines for the connected signal inputs, e.g., from signal input 604 through the pass gate transistor of 1-1 cell 602D, and out signal output 610, and also from signal input 606 through the pass gate transistor of 0-0 cell 602A and out signal output 608. Because 0-1 cell 602C and 1-0 cell 602B are configured to be inactive, signal input 604 is electrically isolated from signal output 608, and signal input 606 is electrically isolated from signal output 610.
In should also be appreciated that in some aspects of the subject disclosure, the programmable switching block of
The aforementioned diagrams have been described with respect to interaction between several components, or memory architectures. It should be appreciated that such diagrams can include those components and architectures specified therein, some of the specified components/architectures, and/or additional components/architectures. For example, a memory cell architecture could include a combination of voltage divider component 200, programming circuit component 400, in conjunction with transistor element 102, signal input 110 and signal output 108. Sub-components could also be implemented as electrically connected to other sub-components rather than included within a parent architecture. Additionally, it should be noted that one or more disclosed processes could be combined into a single process providing aggregate functionality. For instance, a program process can comprise an erase process, or vice versa, to facilitate programming and erasing a semiconductor cell by way of a single process. In addition, it should be appreciated that respective rows of disclosed switching blocks can be programmed or erased in groups (e.g., multiple rows programmed or erased concurrently) or individually. Components of the disclosed architectures can also interact with one or more other components not specifically described herein but known by those of skill in the art.
In view of the exemplary diagrams described supra, process methods that can be implemented in accordance with the disclosed subject matter will be better appreciated with reference to the flow charts of
What has been described above includes examples of the subject innovation. It is, of course, not possible to describe every conceivable combination of components or methodologies for purposes of describing the subject innovation, but one of ordinary skill in the art can recognize that many further combinations and permutations of the subject innovation are possible. Accordingly, the disclosed subject matter is intended to embrace all such alterations, modifications and variations that fall within the spirit and scope of the appended claims. Furthermore, to the extent that the term “includes” “has” or “having” are used in either the detailed description or the claims, such term is intended to be inclusive in a manner similar to the term “comprising” as “comprising” is interpreted when employed as a transitional word in a claim.
Moreover, the word “exemplary” is used herein to mean serving as an example, instance, or illustration. Any aspect or design described herein as “exemplary” is not necessarily to be construed as preferred or advantageous over other aspects or designs. Rather, use of the word exemplary is intended to present concepts in a concrete fashion. As used in this application, the term “or” is intended to mean an inclusive “or” rather than an exclusive “or”. That is, unless specified otherwise, or clear from context, “X employs A or B” is intended to mean any of the natural inclusive permutations. That is, if X employs A; X employs B; or X employs both A and B, then “X employs A or B” is satisfied under any of the foregoing instances. In addition, the articles “a” and “an” as used in this application and the appended claims should generally be construed to mean “one or more” unless specified otherwise or clear from context to be directed to a singular form.
Additionally, some portions of the detailed description have been presented in terms of algorithms or process operations on data bits within electronic memory. These process descriptions or representations are mechanisms employed by those cognizant in the art to effectively convey the substance of their work to others equally skilled. A process is here, generally, conceived to be a self-consistent sequence of acts leading to a desired result. The acts are those requiring physical manipulations of physical quantities. Typically, though not necessarily, these quantities take the form of electrical and/or magnetic signals capable of being stored, transferred, combined, compared, and/or otherwise manipulated.
It has proven convenient, principally for reasons of common usage, to refer to these signals as bits, values, elements, symbols, characters, terms, numbers, or the like. It should be borne in mind, however, that all of these and similar terms are to be associated with the appropriate physical quantities and are merely convenient labels applied to these quantities. Unless specifically stated otherwise or apparent from the foregoing discussion, it is appreciated that throughout the disclosed subject matter, discussions utilizing terms such as processing, computing, calculating, determining, or displaying, and the like, refer to the action and processes of processing systems, and/or similar consumer or industrial electronic devices or machines, that manipulate or transform data represented as physical (electrical and/or electronic) quantities within the registers or memories of the electronic device(s), into other data similarly represented as physical quantities within the machine and/or computer system memories or registers or other such information storage, transmission and/or display devices.
In order to provide a context for the various aspects of the disclosed subject matter,
A column controller 1406 can be formed adjacent to programmable switching block 1406. Moreover, column controller 1406 can be electrically coupled with bit lines of programmable switching block 1402. Column controller 1406 can control respective bitlines, applying suitable program, erase or read voltages to selected bitlines.
In addition, operating and control environment 1400 can comprise a row controller 1404. Row controller 1404 can be formed adjacent to programmable switching block 1406, and electrically connected with word lines of programmable switching block 1402. Row controller 1404 can select particular rows of memory cells with a suitable selection voltage. Moreover, row controller 1404 can facilitate program, erase or read operations by applying suitable voltages at selected word lines.
A clock source(s) 1408 can provide respective clock pulses to facilitate timing for read, write, and program operations of row control 1404 and column control 1406. Clock source(s) 1408 can further facilitate selection of word lines or bit lines in response to external or internal commands received by operating and control environment 1400. An input/output buffer 1412 can be connected to an external host apparatus, such as a computer or other processing device (not depicted) by way of an I/O buffer or other I/O communication interface. Input/output buffer 1412 can be configured to receive write data, receive an erase instruction, output readout data, and receive address data and command data, as well as address data for respective instructions. Address data can be transferred to row controller 1404 and column controller 1406 by an address register 1410. In addition, input data is transmitted to programmable switching block 1402 via signal input lines, and output data is received from programmable switching block 1402 via signal output lines. Input data can be received from the host apparatus, and output data can be delivered to the host apparatus via the I/O buffer.
Commands received from the host apparatus can be provided to a command interface 1414. Command interface 1414 can be configured to receive external control signals from the host apparatus, and determine whether data input to the input/output buffer 1412 is write data, a command, or an address. Input commands can be transferred to a state machine 1416.
State machine 1416 can be configured to manage programming and reprogramming of programmable switching block 1402. State machine 1416 receives commands from the host apparatus via input/output interface 1412 and command interface 1414, and manages read, write, erase, data input, data output, and like functionality associated with programmable switching block 1402. In some aspects, state machine 1416 can send and receive acknowledgments and negative acknowledgments regarding successful receipt or execution of various commands.
To implement read, write, erase, input, output, etc., functionality, state machine 1416 can control clock source(s) 1408. Control of clock source(s) 1408 can cause output pulses configured to facilitate row controller 1404 and column controller 1406 implementing the particular functionality. Output pulses can be transferred to selected bit lines by column controller 1406, for instance, or word lines by row controller 1404, for instance.
In regard to the various functions performed by the above described components, architectures, circuits, processes and the like, the terms (including a reference to a “means”) used to describe such components are intended to correspond, unless otherwise indicated, to any component which performs the specified function of the described component (e.g., a functional equivalent), even though not structurally equivalent to the disclosed structure, which performs the function in the herein illustrated exemplary aspects of the embodiments. In this regard, it will also be recognized that the embodiments include a system as well as a computer-readable medium having computer-executable instructions for performing the acts and/or events of the various processes.
In addition, while a particular feature may have been disclosed with respect to only one of several implementations, such feature may be combined with one or more other features of the other implementations as may be desired and advantageous for any given or particular application. Furthermore, to the extent that the terms “includes,” and “including” and variants thereof are used in either the detailed description or the claims, these terms are intended to be inclusive in a manner similar to the term “comprising.”
The present disclosure claims priority to and is a continuation-in-part of U.S. patent application Ser. No. 14/166,700 filed Jan. 28, 2014, which is a continuation of U.S. patent application Ser. No. 13/194,500, filed Jul. 29, 2011, that issued as U.S. Pat. No. 8,674,724 on Mar. 18, 2014, and claims priority to and is a continuation-in-part of U.S. patent application Ser. No. 14/304,572 filed Jun. 13, 2014, which is a continuation of U.S. patent application Ser. No. 13/194,479, filed Jul. 29, 2011, that issued as U.S. Pat. No. 8,754,671 on Jun. 17, 2014, which are hereby incorporated by reference for all purposes.
| Number | Name | Date | Kind |
|---|---|---|---|
| 4433468 | Kawamata | Feb 1984 | A |
| 4684972 | Owen et al. | Aug 1987 | A |
| 4741601 | Saito | May 1988 | A |
| 5139911 | Yagi et al. | Aug 1992 | A |
| 5242855 | Oguro | Sep 1993 | A |
| 5278085 | Maddox, III et al. | Jan 1994 | A |
| 5315131 | Kishimoto et al. | May 1994 | A |
| 5335219 | Ovshinsky et al. | Aug 1994 | A |
| 5360981 | Owen et al. | Nov 1994 | A |
| 5457649 | Eichman et al. | Oct 1995 | A |
| 5538564 | Kaschmitter | Jul 1996 | A |
| 5541869 | Rose et al. | Jul 1996 | A |
| 5594363 | Freeman et al. | Jan 1997 | A |
| 5614756 | Forouhi et al. | Mar 1997 | A |
| 5645628 | Endo et al. | Jul 1997 | A |
| 5714416 | Eichman et al. | Feb 1998 | A |
| 5751012 | Wolstenholme et al. | May 1998 | A |
| 5840608 | Chang | Nov 1998 | A |
| 5970332 | Pruijmboom et al. | Oct 1999 | A |
| 5998244 | Wolstenholme et al. | Dec 1999 | A |
| 6122318 | Yamaguchi et al. | Sep 2000 | A |
| 6128214 | Kuekes et al. | Oct 2000 | A |
| 6143642 | Sur, Jr. et al. | Nov 2000 | A |
| 6180998 | Crafts | Jan 2001 | B1 |
| 6255848 | Schultz et al. | Jul 2001 | B1 |
| 6259116 | Shannon | Jul 2001 | B1 |
| 6291836 | Kramer et al. | Sep 2001 | B1 |
| 6436765 | Liou et al. | Aug 2002 | B1 |
| 6436818 | Hu et al. | Aug 2002 | B1 |
| 6492694 | Noble et al. | Dec 2002 | B2 |
| 6627530 | Li et al. | Sep 2003 | B2 |
| 6762474 | Mills, Jr. | Jul 2004 | B1 |
| 6768157 | Krieger et al. | Jul 2004 | B2 |
| 6806526 | Krieger et al. | Oct 2004 | B2 |
| 6809981 | Baker et al. | Oct 2004 | B2 |
| 6815286 | Krieger et al. | Nov 2004 | B2 |
| 6838720 | Krieger et al. | Jan 2005 | B2 |
| 6848012 | LeBlanc et al. | Jan 2005 | B2 |
| 6849891 | Hsu et al. | Feb 2005 | B1 |
| 6855975 | Gilton | Feb 2005 | B2 |
| 6858481 | Krieger et al. | Feb 2005 | B2 |
| 6858482 | Gilton | Feb 2005 | B2 |
| 6864127 | Yamazaki et al. | Mar 2005 | B2 |
| 6864522 | Krieger et al. | Mar 2005 | B2 |
| 6867618 | Li et al. | Mar 2005 | B2 |
| 6881994 | Lee et al. | Apr 2005 | B2 |
| 6927430 | Hsu | Aug 2005 | B2 |
| 6939787 | Ohtake et al. | Sep 2005 | B2 |
| 6946719 | Petti et al. | Sep 2005 | B2 |
| 7020006 | Chevallier et al. | Mar 2006 | B2 |
| 7023093 | Canaperi et al. | Apr 2006 | B2 |
| 7026702 | Krieger et al. | Apr 2006 | B2 |
| 7102150 | Harshfield et al. | Sep 2006 | B2 |
| 7122853 | Gaun et al. | Oct 2006 | B1 |
| 7167387 | Sugita et al. | Jan 2007 | B2 |
| 7187577 | Wang et al. | Mar 2007 | B1 |
| 7221599 | Gaun et al. | May 2007 | B1 |
| 7238607 | Dunton et al. | Jul 2007 | B2 |
| 7254053 | Krieger et al. | Aug 2007 | B2 |
| 7274587 | Yasuda et al. | Sep 2007 | B2 |
| 7289353 | Spitzer et al. | Oct 2007 | B2 |
| 7324363 | Kerns et al. | Jan 2008 | B2 |
| 7365411 | Campbell | Apr 2008 | B2 |
| 7402847 | Kozicki et al. | Jul 2008 | B2 |
| 7405418 | Happ et al. | Jul 2008 | B2 |
| 7426128 | Scheuerlein | Sep 2008 | B2 |
| 7433253 | Gogl et al. | Oct 2008 | B2 |
| 7474000 | Scheuerlein et al. | Jan 2009 | B2 |
| 7479650 | Gilton | Jan 2009 | B2 |
| 7499355 | Scheuerlein et al. | Mar 2009 | B2 |
| 7511532 | Derharcobian et al. | Mar 2009 | B2 |
| 7521705 | Liu | Apr 2009 | B2 |
| 7534625 | Karpov et al. | May 2009 | B2 |
| 7541252 | Eun et al. | Jun 2009 | B2 |
| 7550380 | Elkins et al. | Jun 2009 | B2 |
| 7566643 | Czubatyi et al. | Jul 2009 | B2 |
| 7579612 | Tang et al. | Aug 2009 | B2 |
| 7606059 | Toda | Oct 2009 | B2 |
| 7615439 | Schricker et al. | Nov 2009 | B1 |
| 7629198 | Kumar et al. | Dec 2009 | B2 |
| 7704788 | Youn et al. | Apr 2010 | B2 |
| 7719001 | Nomura et al. | May 2010 | B2 |
| 7728318 | Raghuram et al. | Jun 2010 | B2 |
| 7729158 | Toda et al. | Jun 2010 | B2 |
| 7749805 | Pinnow et al. | Jul 2010 | B2 |
| 7760538 | Paak | Jul 2010 | B1 |
| 7772581 | Lung | Aug 2010 | B2 |
| 7778063 | Brubaker et al. | Aug 2010 | B2 |
| 7786464 | Nirschl et al. | Aug 2010 | B2 |
| 7786589 | Matsunaga et al. | Aug 2010 | B2 |
| 7791060 | Aochi et al. | Sep 2010 | B2 |
| 7824956 | Schricker et al. | Nov 2010 | B2 |
| 7829875 | Scheuerlein | Nov 2010 | B2 |
| 7830698 | Chen et al. | Nov 2010 | B2 |
| 7835170 | Bertin et al. | Nov 2010 | B2 |
| 7859884 | Scheuerlein | Dec 2010 | B2 |
| 7875871 | Kumar et al. | Jan 2011 | B2 |
| 7881097 | Hosomi et al. | Feb 2011 | B2 |
| 7897953 | Liu | Mar 2011 | B2 |
| 7898838 | Chen et al. | Mar 2011 | B2 |
| 7920412 | Hosotani et al. | Apr 2011 | B2 |
| 7924138 | Kinoshita et al. | Apr 2011 | B2 |
| 7968419 | Li et al. | Jun 2011 | B2 |
| 7972897 | Kumar et al. | Jul 2011 | B2 |
| 7984776 | Sastry et al. | Jul 2011 | B2 |
| 8004882 | Katti et al. | Aug 2011 | B2 |
| 8018760 | Muraoka et al. | Sep 2011 | B2 |
| 8021897 | Sills et al. | Sep 2011 | B2 |
| 8045364 | Schloss et al. | Oct 2011 | B2 |
| 8054674 | Tamai et al. | Nov 2011 | B2 |
| 8054679 | Nakai et al. | Nov 2011 | B2 |
| 8067815 | Chien et al. | Nov 2011 | B2 |
| 8071972 | Lu et al. | Dec 2011 | B2 |
| 8084830 | Kanno et al. | Dec 2011 | B2 |
| 8088688 | Herner | Jan 2012 | B1 |
| 8097874 | Venkatasamy et al. | Jan 2012 | B2 |
| 8102018 | Bertin et al. | Jan 2012 | B2 |
| 8102698 | Scheuerlein | Jan 2012 | B2 |
| 8143092 | Kumar et al. | Mar 2012 | B2 |
| 8144498 | Kumar et al. | Mar 2012 | B2 |
| 8164948 | Katti et al. | Apr 2012 | B2 |
| 8168506 | Herner | May 2012 | B2 |
| 8183553 | Phatak et al. | May 2012 | B2 |
| 8187945 | Herner | May 2012 | B2 |
| 8198144 | Herner | Jun 2012 | B2 |
| 8207064 | Bandyopadhyay et al. | Jun 2012 | B2 |
| 8218350 | Kozicki | Jul 2012 | B2 |
| 8227787 | Kumar et al. | Jul 2012 | B2 |
| 8231998 | Sastry et al. | Jul 2012 | B2 |
| 8233308 | Schricker et al. | Jul 2012 | B2 |
| 8237146 | Kreupl et al. | Aug 2012 | B2 |
| 8258020 | Herner | Sep 2012 | B2 |
| 8265136 | Hong et al. | Sep 2012 | B2 |
| 8269203 | Greene et al. | Sep 2012 | B2 |
| 8274812 | Nazarian et al. | Sep 2012 | B2 |
| 8315079 | Kuo et al. | Nov 2012 | B2 |
| 8320160 | Nazarian | Nov 2012 | B2 |
| 8351241 | Lu et al. | Jan 2013 | B2 |
| 8369139 | Liu et al. | Feb 2013 | B2 |
| 8374018 | Lu | Feb 2013 | B2 |
| 8385100 | Kau et al. | Feb 2013 | B2 |
| 8394670 | Herner | Mar 2013 | B2 |
| 8441835 | Jo et al. | May 2013 | B2 |
| 8456892 | Yasuda et al. | Jun 2013 | B2 |
| 8467226 | Bedeschi et al. | Jun 2013 | B2 |
| 8467227 | Jo | Jun 2013 | B1 |
| 8502185 | Lu et al. | Aug 2013 | B2 |
| 8587989 | Manning et al. | Nov 2013 | B2 |
| 8658476 | Sun et al. | Feb 2014 | B1 |
| 8659003 | Herner et al. | Feb 2014 | B2 |
| 8659933 | Jo | Feb 2014 | B2 |
| 8674724 | Nazarian et al. | Mar 2014 | B2 |
| 8675384 | Kuo et al. | Mar 2014 | B2 |
| 8754671 | Nazarian et al. | Jun 2014 | B2 |
| 8767441 | Lu et al. | Jul 2014 | B2 |
| 20030141565 | Hirose et al. | Jul 2003 | A1 |
| 20030174574 | Perner et al. | Sep 2003 | A1 |
| 20030206659 | Hamanaka | Nov 2003 | A1 |
| 20040026682 | Jiang | Feb 2004 | A1 |
| 20040170040 | Rinerson et al. | Sep 2004 | A1 |
| 20050020510 | Benedict | Jan 2005 | A1 |
| 20050029587 | Harshfield | Feb 2005 | A1 |
| 20050041498 | Resta et al. | Feb 2005 | A1 |
| 20050052915 | Herner et al. | Mar 2005 | A1 |
| 20050062045 | Bhattacharyya | Mar 2005 | A1 |
| 20050073881 | Tran et al. | Apr 2005 | A1 |
| 20050175099 | Sarkijarvi et al. | Aug 2005 | A1 |
| 20060017488 | Hsu | Jan 2006 | A1 |
| 20060231910 | Hsieh et al. | Oct 2006 | A1 |
| 20060279328 | Kozicki et al. | Dec 2006 | A1 |
| 20060281244 | Ichige et al. | Dec 2006 | A1 |
| 20070008773 | Scheuerlein | Jan 2007 | A1 |
| 20070015348 | Hsu et al. | Jan 2007 | A1 |
| 20070045615 | Cho et al. | Mar 2007 | A1 |
| 20070087508 | Herner | Apr 2007 | A1 |
| 20070090425 | Kumar et al. | Apr 2007 | A1 |
| 20070091685 | Guterman et al. | Apr 2007 | A1 |
| 20070105284 | Herner | May 2007 | A1 |
| 20070105390 | Oh | May 2007 | A1 |
| 20070133250 | Kim | Jun 2007 | A1 |
| 20070146012 | Murphy | Jun 2007 | A1 |
| 20070205510 | Lavoie et al. | Sep 2007 | A1 |
| 20070228414 | Kumar et al. | Oct 2007 | A1 |
| 20070284575 | Li et al. | Dec 2007 | A1 |
| 20070290186 | Bourim et al. | Dec 2007 | A1 |
| 20070291527 | Tsushima et al. | Dec 2007 | A1 |
| 20070295950 | Cho et al. | Dec 2007 | A1 |
| 20070297501 | Hussain et al. | Dec 2007 | A1 |
| 20080002481 | Gogl et al. | Jan 2008 | A1 |
| 20080006907 | Lee et al. | Jan 2008 | A1 |
| 20080043521 | Liaw et al. | Feb 2008 | A1 |
| 20080048164 | Odagawa | Feb 2008 | A1 |
| 20080089110 | Robinett et al. | Apr 2008 | A1 |
| 20080090337 | Williams | Apr 2008 | A1 |
| 20080106925 | Paz De Araujo et al. | May 2008 | A1 |
| 20080106926 | Brubaker et al. | May 2008 | A1 |
| 20080185567 | Kumar et al. | Aug 2008 | A1 |
| 20080192531 | Tamura et al. | Aug 2008 | A1 |
| 20080198934 | Hong et al. | Aug 2008 | A1 |
| 20080205179 | Markert et al. | Aug 2008 | A1 |
| 20080206931 | Breuil et al. | Aug 2008 | A1 |
| 20080220601 | Kumar et al. | Sep 2008 | A1 |
| 20080232160 | Gopalakrishnan | Sep 2008 | A1 |
| 20080278990 | Kumar et al. | Nov 2008 | A1 |
| 20080304312 | Ho et al. | Dec 2008 | A1 |
| 20080311722 | Petti et al. | Dec 2008 | A1 |
| 20090001345 | Schricker et al. | Jan 2009 | A1 |
| 20090003717 | Sekiguchi et al. | Jan 2009 | A1 |
| 20090014707 | Lu et al. | Jan 2009 | A1 |
| 20090052226 | Lee et al. | Feb 2009 | A1 |
| 20090095951 | Kostylev et al. | Apr 2009 | A1 |
| 20090152737 | Harshfield | Jun 2009 | A1 |
| 20090168486 | Kumar | Jul 2009 | A1 |
| 20090231910 | Liu et al. | Sep 2009 | A1 |
| 20090250787 | Kutsunai | Oct 2009 | A1 |
| 20090256130 | Schricker | Oct 2009 | A1 |
| 20090257265 | Chen et al. | Oct 2009 | A1 |
| 20090267047 | Sasago et al. | Oct 2009 | A1 |
| 20090298224 | Lowrey | Dec 2009 | A1 |
| 20090321789 | Wang et al. | Dec 2009 | A1 |
| 20100007937 | Widjaja et al. | Jan 2010 | A1 |
| 20100012914 | Xu et al. | Jan 2010 | A1 |
| 20100019221 | Lung et al. | Jan 2010 | A1 |
| 20100019310 | Sakamoto | Jan 2010 | A1 |
| 20100032638 | Xu | Feb 2010 | A1 |
| 20100032640 | Xu | Feb 2010 | A1 |
| 20100034518 | Iwamoto et al. | Feb 2010 | A1 |
| 20100039136 | Chua-Eoan et al. | Feb 2010 | A1 |
| 20100044708 | Lin et al. | Feb 2010 | A1 |
| 20100046622 | Doser et al. | Feb 2010 | A1 |
| 20100084625 | Wicker et al. | Apr 2010 | A1 |
| 20100085798 | Lu et al. | Apr 2010 | A1 |
| 20100090192 | Goux et al. | Apr 2010 | A1 |
| 20100101290 | Bertolotto | Apr 2010 | A1 |
| 20100102290 | Lu et al. | Apr 2010 | A1 |
| 20100110767 | Katoh et al. | May 2010 | A1 |
| 20100124093 | Shigs et al. | May 2010 | A1 |
| 20100157651 | Kumar et al. | Jun 2010 | A1 |
| 20100157656 | Tsuchida | Jun 2010 | A1 |
| 20100157710 | Lambertson et al. | Jun 2010 | A1 |
| 20100163828 | Tu | Jul 2010 | A1 |
| 20100176367 | Liu | Jul 2010 | A1 |
| 20100176368 | Ko et al. | Jul 2010 | A1 |
| 20100219510 | Scheuerlein et al. | Sep 2010 | A1 |
| 20100221868 | Sandoval | Sep 2010 | A1 |
| 20100237314 | Tsukamoto et al. | Sep 2010 | A1 |
| 20100243983 | Chiang et al. | Sep 2010 | A1 |
| 20100321095 | Mikawa et al. | Dec 2010 | A1 |
| 20110001115 | Greene et al. | Jan 2011 | A1 |
| 20110006275 | Roelofs et al. | Jan 2011 | A1 |
| 20110033967 | Lutz et al. | Feb 2011 | A1 |
| 20110063888 | Chi et al. | Mar 2011 | A1 |
| 20110089391 | Mihnea et al. | Apr 2011 | A1 |
| 20110122679 | Chen et al. | May 2011 | A1 |
| 20110128779 | Redaelli et al. | Jun 2011 | A1 |
| 20110133149 | Sonehara | Jun 2011 | A1 |
| 20110136327 | Han et al. | Jun 2011 | A1 |
| 20110155991 | Chen | Jun 2011 | A1 |
| 20110194329 | Ohba et al. | Aug 2011 | A1 |
| 20110198557 | Rajendran et al. | Aug 2011 | A1 |
| 20110204312 | Phatak | Aug 2011 | A1 |
| 20110205780 | Yasuda et al. | Aug 2011 | A1 |
| 20110205782 | Costa et al. | Aug 2011 | A1 |
| 20110212616 | Seidel et al. | Sep 2011 | A1 |
| 20110227028 | Sekar et al. | Sep 2011 | A1 |
| 20110284814 | Zhang | Nov 2011 | A1 |
| 20110299324 | Li et al. | Dec 2011 | A1 |
| 20110305064 | Jo et al. | Dec 2011 | A1 |
| 20110310656 | Kreupl et al. | Dec 2011 | A1 |
| 20110312151 | Herner | Dec 2011 | A1 |
| 20110317470 | Lu et al. | Dec 2011 | A1 |
| 20120001146 | Lu et al. | Jan 2012 | A1 |
| 20120007035 | Jo et al. | Jan 2012 | A1 |
| 20120008366 | Lu | Jan 2012 | A1 |
| 20120012806 | Herner | Jan 2012 | A1 |
| 20120015506 | Jo et al. | Jan 2012 | A1 |
| 20120025161 | Rathor et al. | Feb 2012 | A1 |
| 20120033479 | Delucca et al. | Feb 2012 | A1 |
| 20120043519 | Jo et al. | Feb 2012 | A1 |
| 20120043520 | Herner et al. | Feb 2012 | A1 |
| 20120043621 | Herner | Feb 2012 | A1 |
| 20120043654 | Lu et al. | Feb 2012 | A1 |
| 20120044751 | Wang et al. | Feb 2012 | A1 |
| 20120075910 | Yasuda et al. | Mar 2012 | A1 |
| 20120076203 | Sugimoto et al. | Mar 2012 | A1 |
| 20120080798 | Harshfield | Apr 2012 | A1 |
| 20120104351 | Wei et al. | May 2012 | A1 |
| 20120108030 | Herner | May 2012 | A1 |
| 20120120712 | Kawai et al. | May 2012 | A1 |
| 20120122290 | Nagashima | May 2012 | A1 |
| 20120140816 | Franche et al. | Jun 2012 | A1 |
| 20120142163 | Herner | Jun 2012 | A1 |
| 20120145984 | Rabkin et al. | Jun 2012 | A1 |
| 20120155146 | Ueda et al. | Jun 2012 | A1 |
| 20120176831 | Xiao et al. | Jul 2012 | A1 |
| 20120205606 | Lee et al. | Aug 2012 | A1 |
| 20120220100 | Herner | Aug 2012 | A1 |
| 20120235112 | Huo et al. | Sep 2012 | A1 |
| 20120236625 | Ohba et al. | Sep 2012 | A1 |
| 20120236650 | Nazarian et al. | Sep 2012 | A1 |
| 20120269275 | Hannuksela | Oct 2012 | A1 |
| 20120305874 | Herner | Dec 2012 | A1 |
| 20120305879 | Lu et al. | Dec 2012 | A1 |
| 20120314472 | Chung | Dec 2012 | A1 |
| 20120320660 | Nazarian et al. | Dec 2012 | A1 |
| 20120326265 | Lai et al. | Dec 2012 | A1 |
| 20130020548 | Clark et al. | Jan 2013 | A1 |
| 20130027081 | Nazarian et al. | Jan 2013 | A1 |
| 20130264534 | Hwang et al. | Oct 2013 | A1 |
| 20140231740 | Ohba | Aug 2014 | A1 |
| 20140284544 | Miyagawa et al. | Sep 2014 | A1 |
| Number | Date | Country |
|---|---|---|
| 101501850 | Aug 2009 | CN |
| 2405441 | Jan 2012 | EP |
| 2408035 | Jan 2012 | EP |
| 2005-506703 | Mar 2005 | JP |
| 2006-032951 | Feb 2006 | JP |
| 2007-067408 | Mar 2007 | JP |
| 2007-281208 | Oct 2007 | JP |
| 2007-328857 | Dec 2007 | JP |
| 201123645 | Feb 2011 | JP |
| 10-2011-0014248 | Feb 2011 | KR |
| WO 03034498 | Apr 2003 | WO |
| WO 2009005699 | Jan 2009 | WO |
| 2011005266 | Jan 2011 | WO |
| Entry |
|---|
| Jian Hu et al., “Area-Dependent Switching in Thin Film-Silicon Devices”, Materials Research Society Proceedings, 2003, pp. AI8.3.1-AI8.3.6, vol. 762, No. 1, Cambridge University Press. |
| Andre Dehon, “Array-Based Architecture for FET-Based, Nanoscale Electronics”, IEEE Transactions on Nanotechnology, Mar. 2003, pp. 23-32, vol. 2, No. 1. |
| Herb Goronkin et al., “High-Performance Emerging Solid-State Memory Technologies”, MRS Bulletin, Nov. 2004, pp. 805-813, www.mrs.org/publications/bulletin. |
| Gerhard Muller et al., “Status and Outlook of Emerging Nonvolatile Memory Technologies”, IEEE, 2004, pp. 567-570. |
| A.E. Owen et al., “Memory Switching in Amorphous Silicon Devices”, Journal of Non-Crystalline Solids 59 & 60, 1983, pp. 1273-1280, North-Holland Publishing Company. |
| J. Campbell Scott, “Is There an Immortal Memory?”, www.sciencemag.org, Apr. 2, 2004, pp. 62-63, vol. 304, No. 5667. |
| S.H. Lee et al., “Full Integration and Cell Characteristics for 64Mb Nonvolatile PRAM”, 2004 Symposium on VLSI Technology Digest of Technical Papers, pp. 20-21, 2004 IEEE. |
| Stephen Y. Chou et al., “Imprint Lithography With 25-Nanometer Resolution”, Science, Apr. 5, 1996, pp. 85-87, vol. 272. |
| S. Zankovych et al., “Nanoimprint Lithography: Challenges and Prospects”, Institute of Physics Publishing, Nanotechnology 12, 2001, pp. 91-95. |
| A. Avila et al., “Switching in Coplanar Amorphous Hydrogenated Silicon Devices”, Solid-State Electronics 44, 2000, pp. 17-27. |
| Jian Hu et al., “Switching and Filament Formation in Hot-Wire CVD P-Type A-Si:H Devices”, Science Direct, Thin Solid Films 430, 2003, pp. 249-252, www.sciencedirect.com. |
| S. Hudgens et al,. “Overview of Phase-Change Chalcogenide Nonvolatile Memory Technology”, MRS Bulletin, Nov. 2004, pp. 829-832, www.mrs.org/publications/bulletin. |
| K. Terabe et al., “Quantized Conductance Atomic Switch”, Nature, vol. 433, Jan. 6, 2005, pp. 47-50, www.nature.com/ nature. |
| Michael Kund et al., “Conductive Bridging RAM (CBRAM): An Emerging Non-Volatile Memory Technology Scalable to Sub 20nm”, IEEE, 2005. |
| W. Den Boer, “Threshold Switching in Hydrogenated Amorphous Silicon”, American Institute of Physics, 1982, pp. 812-813. |
| P.G. Lecomber et al., “The Switching Mechnism in Amorphous Silicon Junctions”, Journal of Non-Crystalline Solids 77 & 78, 1985, pp. 1373-1382, North-Holland, Amsterdam. |
| A. E. Owen et al., “Switching in Amorphous Devices”, Int. J. Electronics, 1992, pp. 897-906, vol. 73, No. 5. |
| M. Jafar et al., “Switching in Amorphous-Silicon Devices”, The American Physical Society, 1994, pp. 611-615, vol. 49, No. 19. |
| Stikeman, Alexandra, “Polymer Memory—The Plastic Path to Beller Data Storage,” Technology Review, Sep. 2002, p. 31, www.technology review.com. |
| Yong Chen et al. “Nanoscale molecular-switch crossbar circuits,” Nanotechnology 14, 2003, pp. 462-468, vol. 1.14, Institute of Physics Publishing. |
| C.P. Collier et al. “Electronically Configurable Molecular-Based Logic Gates,” Science, Jul. 16, 1999, pp. 391-395, vol. 285, No. 5426. |
| Office Action for U.S. Appl. No. 11/875,541, dated Jul. 22, 2010. |
| Office Action for U.S. Appl. No. 11/875,541, dated Mar. 30, 2011. |
| Office Action for U.S. Appl. No. 11/875,541, dated Oct. 5, 2011. |
| Office Action for U.S. Appl. No. 11/875,541, dated Jun. 8, 2012. |
| Choi, Jang Wook, “Molecular Electronic Crossbar Memory Circuits”, Bistable [2]Rotaxane Based Molecular Electronics: Fundamentals and Applications, Chapter 3, pp. 79-124, Dissertation, California Institute of Technology. |
| Sung-Hyun Jo et al., “A Silicon-Based Crossbar Ultra-High-Density Non-Volatile Memory”, SSEL Annual Report 2007. |
| International Search Report for PCT/US2009/060023, filed on Oct. 8, 2009. |
| Waser, R et al., “Nanoionics-based Resistive Switching Memories”, Nature Materials, Nov. 2007, pp. 833-835, vol. 6. |
| Written Opinion of the International Searching Authority for PCT/US2009/060023, filed on Oct. 8, 2009. |
| Ex Parte Quayle Action for U.S. Appl. No. 12/826,653, dated May 8, 2012. |
| International Search Report for PCT/US2011/040090, filed on Jun. 10, 2011. |
| Written Opinion of the International Searching Authority for PCT/US2011/040090, filed on Jun. 10, 2011. |
| Notice of Allowability for U.S. Appl. No. 13/158,231, dated Apr. 17, 2012. |
| Office Action for U.S. Appl. No. 12/835,704, dated Sep. 21, 2011. |
| Office Action for U.S. Appl. No. 12/835,704, dated Mar. 1, 2012. |
| Advisory Action for U.S. Appl. No. 12/835,704, dated Jun. 8, 2012. |
| International Search Report and Written Opinion for PCT/US2011/046035, filed on Jul. 29, 2011. |
| Office Action for U.S. Appl. No. 12/861,650, dated Jan. 25, 2012. |
| Notice of Allowability for U.S. Appl. No. 12/861,650, dated Jun. 19, 2012. |
| Sung Hyun Jo et al., “Programmable Resistance Switching in Nanoscale Two-Terminal Devices,” Supporting Information, Dec. 29, 2008, pp. 1-4, vol. 9. No. 1, Department of Electrical Engineering and Computer Science, the University of Michigan, Ann Arbor, Michigan. |
| Kuk-Hwan Kim et al., “Nanoscale resistive memory with intrinsic diode characteristics and long endurance,” Applied Physics Letters, 2010, pp. 053106-1-053106-3, vol. 96, American Institute of Physics. |
| Sung Hyun Jo et al., Si-Based Two-Terminal Resistive Switching Nonvolatile Memory, 2008, IEEE. |
| Sung Hyun Jo et al., “Nanoscale Memristor Device as Synapse in Neuromorphic Systems”, Nano Letters, 2010, pp. 1297-1301, pubs.acs.org/NanoLett, A-E, American Chemical Society Publications. |
| Wei Lu et al., “Nanoelectronics from the bottom up,” Nature Materials—Review Articles | Insight, www.nature.com/naturematerials, Nov. 2007, pp. 841-850, vol. 6, Nature Publishing Group. |
| Sung Hyun Jo et al., “Ag/a-Si:H/c-Si Resistive Switching Nonvolatile Memory Devices,” 2006. |
| Sung Hyun Jo et al., “Experimental, Modeling and Simulation Studies of Nanoscale Resistance Switching Devices,” 2009, IEEE. |
| Sung Hyun Jo et al., “Nonvolatile Resistive Switching Devices Based on Nanoscale Metal/Amorphous Silicon/Crystalline Silicon Junctions,” Mater. Res. Soc. Symp. Proc., 2007, vol. 997, Materials Research Society. |
| Sung Hyun Jo et al., “Si Memristive Devices Applied to Memory and Neuromorphic Circuits.” |
| Wei Lu et al., “Supporting Information,” 2008. |
| Sung Hyun Jo et al., “High-Density Crossbar Arrays Based on a Si Memristive System,” Nano Letters, 2009, pp. 870-874, vol. 9, No. 2, American Chemical Society Publications. |
| Sung Hyun Jo et al., “High-Density Crossbar Arrays Based on a Si Memristive System,” Supporting Information, 2009, pp. 1-4. |
| Sung Hyun Jo et al., “Programmable Resistance Switching in Nanoscale Two-Terminal Devices,” Nano Letters, 2009, pp. 496-500, vol. 9, No. 1, American Chemical Society Publications. |
| Shubhra Gangopadhyay et al., “Memory Switching in Sputtered Hydrogenated Amorphous Silicon (a-Si:H)”, Japanese Journal of Applied Physics, Short Notes, 1985, pp. 1363-1364, vol. 24, No. 10, Jpn. J. Appl. Phys. |
| S. K. Dey, “Electrothermal model of switching in amorphous silicon films”, J. Vac. Sci. Technol., Jan./Feb. 1980, pp. 445-448, vol. 17, No. 1, American Vacuum Society. |
| J. Hajto et al., “The Programmability of Amorphous Silicon Analogue Memory Elements”, Mat. Res. Soc. Symp. Proc., 1990, pp. 405-410, vol. 192, Materials Research Society. |
| M. J. Rose et al., “Amorphous Silicon Analogue Memory Devices”, Journal of Non-Crystalline Solids 115, 1989, pp. 168-170, Elsevier Science Publishers B.V., North-Holland. |
| A. Moopenn et al., “Programmable Synaptic Devices for Electronic Neural Nets”, Control and Computers, 1990, pp. 37-40, vol. 18, No. 2. |
| P.G. Le Comber, “Present and Future Applications of Amorphous Silicon and Its Alloys”, Journal of Non-Crystalline Solids 115, 1989, pp. 1-13, Elsevier Science Publishers B.V., North-Holland. |
| Hu, J., et al. “AC Characteristics of Cr/p/sup +/ A-Si:HIV Analog Switching Devices.” IEEE Transactions on Electronic Devices, Sep. 2000, pp. 1751-1757, vol. 47, No. 9. |
| Owen, A.E. et al., “New amorphous-silicon electrically programmable nonvolatile switching device,” Solid-State and Electron Devices, IEEE Proceedings I, Apr. 1982, pp. 51-54, vol. 129, No. 2. |
| J. Hajto et al., “Amorphous & Microcrystalline Semiconductor Devices: vol. 2, Materials and Device Physics”, Mar. 1, 2004, pp. 640-700, Artech House Publishers. |
| J. Hajto et al., “Analogue memory and ballistic electron effects in metal-amorphous silicon structures,” Philosophical Magazine B, 1991, pp. 349-369, vol. 63, No. 1, Taylor & Francis Ltd. |
| A. J. Holmes et al., “Design of Analogue Synapse Circuits using Non-Volatile a-Si:H Memory Devices”, Proceedings of ISCAS, 1994, pp. 351-354. |
| Dong, Y., et al., “Si/a-Si Core/Shell Nanowires as Nonvolatile Crossbar Switches”, Nano Letters, Jan. 2008, pp. 386-391, vol. 8, No. 2. |
| European Search Report for Application No. EP 09 81 9890.6 of Mar. 27, 2012. |
| D. A. Muller, et al., “The Electronic Structure at the Atomic Scale of Ultrathin Gate Oxides”, Nature, Jun. 1998, pp. 758-761, vol. 399, No. 24. |
| Sune, J. et al., “Nondestructive Multiple Breakdown Events in Very Thin SiO2 Films.” Applied Physics Letters, 1989, vol. 55 No. 128. |
| Herve Marand, “Materials Engineering Science”, MESc 5025, Chapter 7, University of Vermont, http://www.files.chem.vt.edu/chemdeptimarand/MEScchap6-1 c.pdf. |
| Owen, A.E. et al., “Electronic switching in amorphouse silicon devices: properties of the conducting filament”, Proceedings of the 5th International Conference on Solid-State and Integrated Circuit Technology, 1998, pp. 830-833. |
| Jo, Sung Hyun, “Nanoscale Memristive Devices for Memory and Logic Applications”, Thesis, University of Michigan, 2010. |
| Office Action for U.S. Appl. No. 12/894,098, dated Aug. 1, 2012. |
| Sung Hyun Jo et al., “CMOS Compatible Nanoscale Nonvolatile Resistance Switching Memory,” Nano Letters, 2008, pp. 392-397, vol. 8, No. 2, American Chemical Society Publications. |
| Office Action for U.S. Appl. No. 12/582,086, dated Apr. 19, 2011. |
| Office Action for U.S. Appl. No. 12/582,086, dated Sep. 6, 2011. |
| Notice of Allowance for U.S. Appl. No. 12/582,086, dated Oct. 21, 2011. |
| International Search Report for PCT/US2009/061249, filed on Oct. 20, 2009. |
| Written Opinion of the International Searching Authority for PCT/US2009/061249, filed on Oct. 20, 2009. |
| Office Action for U.S. Appl. No. 12/861,650, dated Oct. 16, 2012. |
| Notice of Allowance for U.S. Appl. No. 12/894,087, dated Oct. 25, 2012. |
| Notice of Allowance for U.S. Appl. No. 13/149,807, dated Oct. 29, 2012. |
| Notice of Allowance for U.S. Appl. No. 12/861,666, dated Nov. 14, 2012. |
| Office Action for U.S. Appl. No. 13/156,232, dated Nov. 26, 2012. |
| Notice of Allowance for U.S. Appl. No. 13/290,024, dated Nov. 28, 2012. |
| Notice of Allowance for U.S. Appl. No. 12/814,410, dated Jan. 8, 2013. |
| Corrected Notice of Allowance for U.S. Appl. No. 12/861,666, dated Jan. 11, 2013. |
| Supplemental Notice of Allowance for U.S. Appl. No. 12/894,087, dated Jan. 11, 2013. |
| Notice of Allowance for U.S. Appl. No. 13/314,513, dated Jan. 24, 2013. |
| Notice of Allowance for U.S. Appl. No. 13/118,258, dated Feb. 6, 2013. |
| International Search Report and Written Opinion for PCT/US2012/040242, filed May 31, 2012. |
| Office Action for U.S. Appl. No. 13/174,264, dated Mar. 6, 2013. |
| Office Action for U.S. Appl. No. 13/679,976, dated Mar. 6, 2013. |
| Notice of Allowance for U.S. Appl. No. 12/894,098, dated Mar. 15, 2013. |
| Office Action for U.S. Appl. No. 13/465,188, dated Mar. 19, 2013. |
| Office Action for U.S. Appl. No. 12/861,432, dated Mar. 29, 2013. |
| Notice of Allowance for U.S. Appl. No. 13/748,490, dated Apr. 9, 2013. |
| Office Action for U.S. Appl. No. 13/725,331, dated May 20, 2013. |
| International Search Report and Written Opinion for PCT/US2012/045312, filed on Jul. 2, 2012. |
| Office Action for U.S. Appl. No. 13/466,008, dated Jul. 29, 2013. |
| Russo, Ugo et al., “Self-Accelerated Thermal Dissolution Model for Reset Programming in Unipolar Resistive-Switching Memory (RRAM) Devices”, IEEE Transactions on Electron Devices, Feb. 2009, pp. 193-200, vol. 56, No. 2. |
| Cagli, C. et al., “Evidence for threshold switching in the set process of NiO-based RRAM and physical modeling for set, reset, retention and disturb prediction”, IEEE International Electron Devices Meeting, Dec. 15-17, 2008, pp. 1-4, San Francisco, CA. |
| Office Action for U.S. Appl. No. 13/077,941, dated Aug. 12, 2013. |
| Office Action for U.S. Appl. No. 13/436,714, dated Aug. 27, 2013. |
| Notice of Allowance for U.S. Appl. No. 13/679,976, dated Sep. 17, 2013. |
| Office Action for U.S. Appl. No. 13/189,401, dated Sep. 30, 2013. |
| Office Action for U.S. Appl. No. 13/462,653, dated Sep. 30, 2013. |
| Corrected Notice of Allowance for U.S. Appl. No. 13/733,828, dated Oct. 1, 2013. |
| Notice of Allowance for U.S. Appl. No. 13/733,828, dated Aug. 8, 2013. |
| Office Action for U.S. Appl. No. 13/594,665, dated Aug. 2, 2013. |
| Notice of Allowance for U.S. Appl. No. 13/769,152, dated Oct. 8, 2013. |
| Notice of Allowance for U.S. Appl. No. 13/905,074, dated Oct. 8, 2013. |
| Notice of Allowance for U.S. Appl. No. 13/452,657, dated Oct. 10, 2013. |
| Notice of Allowance for U.S. Appl. No. 13/174,264, dated Oct. 16, 2013. |
| Notice of Allowance for U.S. Appl. No. 13/417,135, dated Oct. 23, 2013. |
| Notice of Allowance for U.S. Appl. No. 13/725,331, dated Jan. 17, 2014. |
| Office Action for U.S. Appl. No. 13/739,283, dated Jan. 16, 2014. |
| Office Action for U.S. Appl. No. 13/920,021, dated Jan. 10, 2014. |
| Office Action for U.S. Appl. No. 12/861,432, dated Jan. 8, 2014. |
| Office Action for U.S. Appl. No. 13/586,815, dated Jan. 29, 2014. |
| International Search Report and Written Opinion for PCT/US2013/061244, filed on Sep. 23, 2013. |
| Office Action for U.S. Appl. No. 13/434,567, dated Feb. 6, 2014. |
| Office Action for U.S. Appl. No. 13/620,012, dated Feb. 11, 2014. |
| Notice of Allowance for U.S. Appl. No. 13/468,201, dated Feb. 20, 2014. |
| Office Action for U.S. Appl. No. 12/625,817, dated Feb. 28, 2014. |
| Office Action for U.S. Appl. No. 12/835,704, dated Mar. 14, 2014. |
| Office Action for U.S. Appl. No. 13/870,919, Dated Apr. 3, 2014. |
| Office Action for U.S. Appl. No. 13/167,920, dated Mar. 12, 2014. |
| International Search Report and Written Opinion for PCT/US2013/077628, filed on Dec. 23, 2013. |
| Office Action for U.S. Appl. No. 13/143,047, dated Apr. 11, 2014. |
| Office Action for U.S. Appl. No. 13/761,132, dated Apr. 25, 2014. |
| Office Action for U.S. Appl. No. 14/072,657, dated Jun. 17, 2014. |
| Office Action for U.S. Appl. No. 12/814,410 dated Apr. 17, 2012. |
| Office Action for U.S. Appl. No. 12/835,699 dated Aug. 24, 2011. |
| Notice of Allowance for U.S. Appl. No. 12/835,699 dated Feb. 6, 2012. |
| Office Action for U.S. Appl. No. 12/833,898 dated Apr. 5, 2012. |
| European Search Report for Application No. EP 1100 5207.3 of Oct. 12, 2011. |
| Notice of Allowance for U.S. Appl. No. 12/833,898 dated May 30, 2012. |
| Notice of Allowance for U.S. Appl. No. 12/939,824 dated May 11, 2012. |
| Notice of Allowance for U.S. Appl. No. 12/940,920 dated Oct. 5, 2011. |
| Office Action for U.S. Appl. No. 13/314,513 dated Mar. 27, 2012. |
| Shong Yin, “Solution Processed Silver Sulfide Thin Films for Filament Memory Applications”, Technical Report No. UCB/EECS-2010-166, http://www.eecs.berkeley.edu/Pubs/TechRpts/2010/EECS-2010-166.html, Dec. 17, 2010, Electrical Engineering and Computer Sciences, University of California at Berkeley. |
| Office Action for U.S. Appl. No. 13/149,653 dated Apr. 25, 2012. |
| International Search Report for PCT/US2011/045124 filed on Jul. 22, 2011. |
| Written Opinion of the international Searching Authority for PCT/US2011/045124 filed on Jul. 22, 2011. |
| Peng-Heng Chang et al, “Aluminum spiking at contact windows in Al/Ti-W/Si”, Appl. Phys. Lett., Jan. 25, 1988, pp. 272-274, vol. 52 No. 4, American Institute of Physics. |
| J. Del Alamo et al., “Operating limits of Al-alloyed high-low junction for BSF solar cells”, Solid-State Electronics, 1981, pp. 415-420, vol. 24, Pergamon Press Ltd., Great Britain. |
| Hao-Chih Yuan et al., “Silicon Solar Cells with Front Hetero-Contact and Aluminum Alloy Back Junction”, NREL Conference Paper CP-520-42566, 33rd IEEE Photovoltaic Specialists Conference, May 11-16, 2008, National Renewable Energy Laboratory, San Diego, California. |
| Notice of Allowance for U.S. Appl. No. 12/939,824 dated Jul. 24, 2012. |
| Office Action for Application No. EP 1100 5207.3 mailed Aug. 8, 2012. |
| Office Action for U.S. Appl. No. 13/417,135 dated Oct. 9, 2012. |
| Notice of Allowance for U.S. Patent Application No. dated Nov. 14, 2012. |
| Office Action for U.S. Appl. No. 13/149,653 dated Nov. 20, 2012. |
| Office Action of U.S. Appl. No. 13/436,714 dated Dec. 7, 2012. |
| Office Action dated Sep. 25, 2013 for U.S. Appl. No. 13/194,479, 20 pages. |
| Liu, et al., “rFPGA: CMOS-Nano Hybrid FPGA Using RRAM Components”, IEEE/ACM International Symposium on Nanoscale Architectures, 2008, pp. 93-98. |
| Miyamura, et al., “Programmable Cell Array Using Rewritable Solid-Electrolyte Switch Integrated in 90 nm CMOS”, IEEE International Solid-State Circuits Conference, 2011, pp. 228-229. |
| Office Action dated Dec. 17, 2012 for U.S. Appl. No. 13/194,479, 26 pages. |
| Office Action dated Aug. 8, 2013 for U.S. Appl. No. 13/764,710, 16 pages. |
| Notice of Allowance dated Dec. 31, 2013 for U.S. Appl. No. 13/481,696, 26 pages. |
| International Search Report and Written Opinion for PCT/US2013/042746 mailed Sep. 6, 2013, 7 pages. |
| Notice of Allowability dated Oct. 28, 2013 for U.S. Appl. No. 13/651,169, 21 pages. |
| Notice of Allowance dated Oct. 28, 2013 for U.S. Appl. No. 13/194,500, 24 pages. |
| Liauw, et al., “Nonvolatile 3D-FPGA with Monolithically Stacked RRAM-Based Configuration Memory”, 2012, IEEE Solid State Circuits Conference, pp. 406-408. |
| Office Action dated Jun. 30, 2014 for U.S. Appl. No. 13/531,449, 20 pages. |
| Office Action dated Jul. 9, 2014 for U.S. Appl. No. 14/166,691, 19 pages. |
| Notice of Allowance dated Feb. 4, 2015 for U.S. Appl. No. 14/304,572, 32 pages. |
| Office Action dated Aug. 3, 2015 for U.S. Appl. No. 14/717,185, 26 pages. |
| Office Action dated Dec. 6, 2013 for U.S. Appl. No. 13/960,735, 19 pages. |
| Office Action dated Mar. 17, 2015 for U.S. Appl. No. 14/573,770, 19 pages. |
| Wouters, “Scaling challenges for 2-terminal select devices,” ITRS ERD Selector Workshop, Apr. 2012, 41 pages, IMEC, Noorderwijk, NL. |
| Office Action dated May 27, 2015 for U.S. Appl. No. 14/588,185, 23 pages. |
| Office Action dated Jun. 19, 2012 for U.S. Appl. No. 13/149,757, 11 pages. |
| International Search Report and Written Opinion for PCT Application No. PCT/US2015/17370 mailed Jul. 13, 2015, 17 pages. |
| Office Action dated Oct. 3, 2013 for U.S. Appl. No. 13/921,157, 10 pages. |
| International Search Report and Written Opinion for PCT Application No. PCT/US2012/040232 mailed Feb. 26, 2013, 9 pages. |
| Office Action dated May 7, 2013 for U.S. Appl. No. 13/585,759, 12 pages. |
| Office Action dated May 23, 2013 for U.S. Appl. No. 13/592,224, 9 pages. |
| Notice of Allowance dated Sep. 19, 2013 for U.S. Appl. No. 13/585,759, 9 pages. |
| Office Action dated Dec. 6, 2013 for U.S. Appl. No. 13/960,735, 10 pages. |
| International Search Report and Written Opinion for PCT Application No. PCT/US2013/054976 mailed Dec. 16, 2013, 9 pages. |
| Notice of Allowance dated Jul. 22, 2015 for U.S. Appl. No. 14/612,025, 11 pages. |
| Chinese Office Action (with English translation) dated Nov. 23, 2015 for Chinese Patent Application No. 201280027066.9, 12 pages. |
| Office Action dated Feb. 5, 2015 for U.S. Appl. No. 14/166,700, 32 pages. |
| International Search Report for PCT Application No. PCT/US2012/048712 dated Mar. 19, 2013, 2 pages. |
| Extended Search Report for European Application No. EP12819708.4 dated Jun. 22, 2015, 11 pages. |
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