1. Field of the Invention
The present invention relates to a film laminated structure, a method for producing the film laminated structure, and a gas sensor.
2. Description of the Related Art
There are gas sensors that include a sensor device for determining the concentration of a predetermined gas, such as NOx, in a gas to be measured, such as an automobile exhaust gas. In such gas sensors, it is known that a porous protective film is disposed on a surface of each of such sensor devices. For example, in Patent Literature 1, a slurry for forming a porous protective film is injected into a cavity of a mold, a detection part of a sensor device is placed in the slurry, and the slurry is cured to form a porous protective film around the detection part. The slurry contains ceramic particles, silica sol, and nitric acid and has a pH of 3.4 or less. It is stated that this can solve a problem of an uneven film thickness when a dip method is applied. However, the slurry is strongly acidic, and a metallic mold may be corroded.
Patent Literature 2 describes a method for forming a cylindrical compact having a recessed portion from a slurry containing a gelling agent that is curable by a chemical reaction, inserting a metal substrate into the recessed portion, and fixing the compact to the metal substrate utilizing firing shrinkage. This slurry is not strongly acidic and does not corrode metallic molds.
PTL 1: JP 2013-217733 A
PTL 2: JP 2013-224253 A
However, Patent Literature 2 does not describe insertion of a ceramic substrate, instead of the metal substrate, into the recessed portion of the cylindrical compact. Unlike metal substrates, ceramic substrates have great variations in dimensions and warping. Thus, when a ceramic substrate is inserted into a recessed portion of a compact, firing of the compact into which the ceramic substrate has been inserted may cause cracking or insufficient fixing of the compact to the ceramic substrate. Furthermore, the finally formed film may have variations in thickness.
The present invention has been made to solve such problems, and it is a principal object of the present invention to fix a green body to a ceramic substrate without cracks before firing and to ensure consistency in the thickness of a finally formed film in a method for producing a film laminated structure by inserting a ceramic substrate into a recessed portion or through-hole of a green body, which is formed by molding and hardening a slurry containing a gelling agent, and by firing the ceramic substrate and the green body.
In order to achieve the principal object, the present invention has employed the following means.
A method for producing a film laminated structure according to the present invention includes the steps of
(a) preparing a ceramic substrate,
(b) charging a mold with a slurry that contains a raw material powder, a gelling agent containing at least two polymerizable organic compounds, and an organic solvent serving as a dispersion medium, and molding and hardening the slurry through a polymerization reaction of the gelling agent to form a green body having a recessed portion or through-hole,
(c) inserting the ceramic substrate into the recessed portion or through-hole of the green body and then drying the green body to form a green structure, and
(d) firing the green structure to form a film laminated structure, the film laminated structure including a film formed from the green body by firing,
wherein in the step (c), before drying, a clearance x [μm] between the recessed portion or through-hole of the green body and the ceramic substrate inserted into the recessed portion or through-hole of the green body and a volume percentage y [vol %] of the dispersion medium in the slurry satisfy the following formulae:
0≦x≦250,
y≧0.067x+30,
y≦0.1x+60, and
y≦70.
In accordance with this method for producing a film laminated structure, setting of x and y in the step (c) so as to satisfy these formulae results in adequate drying shrinkage, thereby allowing the green body to be fixed to the ceramic substrate without cracks. After firing in the step (d), the film can be fixed to the ceramic substrate by firing without cracks. A film precursor is molded in advance with a mold and is formed into a film on the ceramic substrate. Thus, the thickness of the finally formed film is more consistent than the thickness of a film formed by a dip method as described in Patent Literature 1.
The term “clearance”, as used herein, refers to the width of a space between the external wall of the ceramic substrate and the inner wall of the recessed portion or through-hole of the green body. The clearance is constant all around the ceramic substrate. The term “hardening”, as used herein, includes a step of shape retention by the reaction of a gelling agent and removal of a dispersion medium.
In a method for producing a film laminated structure according to the present invention, the recessed portion or through-hole of the green body may be formed using a core in the step (b). The clearance x before drying in the step (c) can be freely determined by changing the size of the core. The core may be separated from the mold or may be integral with the mold. A recessed portion or through-hole may be formed in a compact without using the core.
In a method for producing a film laminated structure according to the present invention, the film laminated structure may have a thickness in the range of 100 to 1000 μm. A production method according to the present invention is suitable for formation of such a thick film on a ceramic substrate. The term “film thickness”, as used herein, refers to the thickness of a film alone. For example, in the case that a film is formed on both sides of a ceramic substrate, the film thickness refers to the thickness of the film on one side.
In a method for producing a film laminated structure according to the present invention, the raw material powder may be a ceramic powder, and the slurry may contain a sintering aid for the ceramic powder. This allows the ceramic powder to be fired at a relatively low temperature in the step (d), and therefore the green body can be easily fired. The sintering aid may be, but is not limited to, one selected from aluminum oxide, zirconium oxide, zinc oxide, silicon oxide, calcium carbonate, barium carbonate, magnesium carbonate, silicon nitride, aluminum nitride, titania, and spinel, or a composite oxide or composite nitride containing two or more of these materials. The specific material of the sintering aid may be appropriately selected for the material of the ceramic powder. The specific material of the sintering aid may be selected so as to facilitate bonding between ceramic particles even at low firing temperatures (temperatures lower than the temperatures at which the ceramic powder is sintered without the aid). Formation of a fired product from the ceramic powder in the green film at low temperatures can reduce thermal damage to the substrate. The sintering aid is preferably a sintering aid containing a component for forming a glass layer or a sintering aid that has a large specific surface area and promotes sintering of the ceramic powder even at low temperatures.
In a method for producing a film laminated structure according to the present invention, a resin may be added to the slurry. The resin may be of any type. The resin may impart elasticity or plasticity to the green body. Thus, even when the substrate has variations in dimensions or warping, the green body can come into close contact with the substrate without defects. This can further reduce the occurrence of cracking due to volume contraction resulting from drying or demolding or the occurrence of cracking due to contact between the ceramic substrate and the green body when the ceramic substrate is inserted into the green body.
In a method for producing a film laminated structure according to the present invention, the mold may be composed of a plurality of divided molds closely attached with no spaces therebetween. The green body can be easily released from the divided molds by separating the divided molds. The mold may have any shape and may include runners, gates, and bents branched from one inlet such that a plurality of molded products can be formed. The mold may be tapered to facilitate demolding.
In a method for producing a film laminated structure according to the present invention, the ceramic substrate may be a sensor device that includes a solid electrolyte layer composed mainly of zirconia. Such a sensor device can be easily covered with a film. Although such a sensor device includes a metal portion (for example, an electrode) on its surface, the metal portion is not corroded by acids because the slurry contains an organic solvent as a dispersion medium rather than water.
A film laminated structure according to the present invention is produced by a production method according to the present invention as described above. A film of a film laminated structure according to the present invention is formed from the slurry with a mold and therefore has a constant thickness.
A recessed portion or through-hole of a green body may be charged with a paste in advance, and a ceramic substrate may be inserted into the recessed portion or through-hole of the green body. The paste may contain filler or an organic component. The paste may be injected by any method. The paste may be applied to a ceramic substrate and then inserted into a recessed portion or through-hole of a green body.
A film laminated structure according to the present invention includes a film on at least part of a surface of a ceramic substrate. The ceramic substrate is a rectangular parallelepiped and has longitudinal rectangular end faces, and a standard deviation σ of a thickness d of the film is 10 or less, wherein in a cross-section of the film laminated structure along a line passing through midpoints of opposite long sides of the rectangular end faces, the thickness d is a length of a perpendicular line from a surface of the film to the surface of the substrate, the perpendicular line being orthogonal to the surface of the film and passing through each of five measurement positions, the five measurement positions being two points spaced inwardly at a distance of X/6 from each longitudinal end of the surface of the film and three points that divide a line segment between the two points into quarters, X being a longitudinal length of the film. Thus, the film has a uniform thickness. Such a film laminated structure can be produced by a production method according to the present invention as described above.
A gas sensor according to the present invention includes the film laminated structure. Like the film laminated structure, the gas sensor also has a uniform film thickness.
A general structure of a gas sensor 100 that includes a sensor device 101 according to an embodiment of the present invention will be described below.
As illustrated in
A gas inlet 10, a first diffusion controlling portion 11, a buffer space 12, a second diffusion controlling portion 13, a first internal vacancy 20, a third diffusion controlling portion 30, and a second internal vacancy 40 disposed in this order at an end (front end) of the sensor device 101 and between an undersurface of the second solid electrolyte layer 6 and a top surface of the first solid electrolyte layer 4 are in communication with each other.
The gas inlet 10, the buffer space 12, the first internal vacancy 20, and the second internal vacancy 40 are spaces hollowed from the spacer layer 5 in the sensor device 101. The top of the spaces are defined by the undersurface of the second solid electrolyte layer 6. The bottom of the spaces are defined by the top surface of the first solid electrolyte layer 4. The sides of the spaces are defined by the side surfaces of the spacer layer 5.
Each of the first diffusion controlling portion 11, the second diffusion controlling portion 13, and the third diffusion controlling portion 30 is composed of two long slits (the longitudinal direction of the slits is perpendicular to the drawing). The portion from the gas inlet 10 to the second internal vacancy 40 is also referred to as a gas flow portion.
A reference gas inlet space 43 is disposed further away from the front end than the gas flow portion and between a top surface of the third substrate layer 3 and an undersurface of the spacer layer 5. The sides of the reference gas inlet space 43 are defined by the side surfaces of the first solid electrolyte layer 4. For example, the atmosphere is introduced into the reference gas inlet space 43 as a reference gas for the measurement of the NOx concentration.
An atmosphere inlet layer 48 is formed of a porous ceramic. The reference gas is introduced into the atmosphere inlet layer 48 through the reference gas inlet space 43. The atmosphere inlet layer 48 covers a reference electrode 42.
The reference electrode 42 is disposed between the top surface of the third substrate layer 3 and the first solid electrolyte layer 4 and, as described above, is surrounded by the atmosphere inlet layer 48, which communicates with the reference gas inlet space 43. As described below, the reference electrode 42 can be used to measure the oxygen concentration (oxygen partial pressure) of the first internal vacancy 20 or the second internal vacancy 40.
In the gas flow portion, the gas inlet 10 opens to the external space. A gas to be measured is introduced from the external space into the sensor device 101 through the gas inlet 10. The first diffusion controlling portion 11 applies predetermined diffusion resistance to the gas to be measured introduced through the gas inlet 10. The buffer space 12 is a space for directing a gas to be measured introduced through the first diffusion controlling portion 11 to the second diffusion controlling portion 13. The second diffusion controlling portion 13 applies predetermined diffusion resistance to a gas to be measured introduced into the first internal vacancy 20 through the buffer space 12. When a gas to be measured is introduced from the outside of the sensor device 101 into the first internal vacancy 20, the gas to be measured rapidly introduced into the sensor device 101 through the gas inlet 10 due to pressure fluctuation of the gas to be measured (exhaust pressure pulsation in the case that the gas to be measured is an automobile exhaust gas) in the external space is introduced into the first internal vacancy 20 not directly but after variations in the concentration of gas to be measured are cancelled through the first diffusion controlling portion 11, the buffer space 12, and the second diffusion controlling portion 13. Thus, variations in the concentration of the gas to be measured introduced into the first internal vacancy 20 become almost negligible. The first internal vacancy 20 is a space for adjusting the oxygen partial pressure of a gas to be measured introduced through the second diffusion controlling portion 13. The oxygen partial pressure is adjusted by operation of a main pump cell 21.
The main pump cell 21 is an electrochemical pump cell that is composed of an inner pump electrode 22, an outer pump electrode 23, and the second solid electrolyte layer 6 disposed between these electrodes. The inner pump electrode 22 includes a ceiling electrode 22a over substantially the entire undersurface of the second solid electrolyte layer 6 facing the first internal vacancy 20. The outer pump electrode 23 is disposed on a top surface of the second solid electrolyte layer 6 in a region opposite the ceiling electrode 22a and is exposed to the external space.
The inner pump electrode 22 is disposed on the upper and lower solid electrolyte layers that define the first internal vacancy 20 (the second solid electrolyte layer 6 and the first solid electrolyte layer 4) and on the spacer layer 5, which forms a side wall. More specifically, the ceiling electrode 22a is disposed on the undersurface of the second solid electrolyte layer 6, which forms a ceiling surface of the first internal vacancy 20, a bottom electrode 22b is disposed on the top surface of the first solid electrolyte layer 4, which forms a bottom of the first internal vacancy 20, and side electrodes (not shown) are disposed on the side walls (an inner surface) of the spacer layer 5, which form the side walls of the first internal vacancy 20, so as to connect the ceiling electrode 22a to the bottom electrode 22b. The side electrodes constitute a tunnel structure.
The inner pump electrode 22 and the outer pump electrode 23 are porous cermet electrodes (for example, Pt—ZrO2 cermet electrodes containing 1% Au). The inner pump electrode 22 to be in contact with a gas to be measured is formed of a material having a decreased ability to reduce a NOx component in the gas to be measured.
In the main pump cell 21, a desired pump voltage Vp0 is applied between the inner pump electrode 22 and the outer pump electrode 23 to pass a pump current Ip0 between the inner pump electrode 22 and the outer pump electrode 23 in a positive or negative direction, thereby pumping oxygen from the first internal vacancy 20 to the external space or pumping oxygen from the external space into the first internal vacancy 20.
In order to determine the oxygen concentration (oxygen partial pressure) of the atmosphere of the first internal vacancy 20, the inner pump electrode 22, the second solid electrolyte layer 6, the spacer layer 5, the first solid electrolyte layer 4, the third substrate layer 3, and the reference electrode 42 constitute an electrochemical sensor cell, that is, an oxygen partial pressure detection sensor cell 80 for controlling a main pump.
The oxygen concentration (oxygen partial pressure) of the first internal vacancy 20 can be determined by measuring the electromotive force V0 of an oxygen partial pressure detection sensor cell 80 for controlling a main pump. The pump current Ip0 is controlled by feedback control of the pump voltage Vp0 of a variable power supply 25 so as to hold the electromotive force V0 constant. Thus, the oxygen concentration of the first internal vacancy 20 can be held constant at a predetermined value.
The third diffusion controlling portion 30 applies predetermined diffusion resistance to a gas to be measured and directs the gas to be measured to the second internal vacancy 40. The oxygen concentration (oxygen partial pressure) of the gas to be measured is controlled by operation of the main pump cell 21 in the first internal vacancy 20.
The second internal vacancy 40 is a treatment space for the measurement of the nitrogen oxide (NOx) concentration of a gas to be measured introduced through the third diffusion controlling portion 30. The NOx concentration is principally measured by operation of the measurement pump cell 41 in the second internal vacancy 40 in which the oxygen concentration is adjusted with the auxiliary pump cell 50.
In the second internal vacancy 40, after the oxygen concentration (oxygen partial pressure) is adjusted in advance in the first internal vacancy 20, a gas to be measured introduced through the third diffusion controlling portion is subjected to adjustment of the oxygen partial pressure with the auxiliary pump cell 50. Thus, the oxygen concentration of the second internal vacancy 40 can be held constant with high precision, and the gas sensor 100 can measure the NOx concentration with high precision.
The auxiliary pump cell 50 is an auxiliary electrochemical pump cell that is composed of an auxiliary pump electrode 51, the outer pump electrode 23 (this is not limited to the outer pump electrode 23 and may be an appropriate electrode disposed outside the sensor device 101), and the second solid electrolyte layer 6. The auxiliary pump electrode 51 includes a ceiling electrode 51a over substantially the entire undersurface of the second solid electrolyte layer 6 facing the second internal vacancy 40.
Like the inner pump electrode 22 in the first internal vacancy 20, the auxiliary pump electrode 51 has a tunnel structure in the second internal vacancy 40. More specifically, the ceiling electrode 51a is disposed on the second solid electrolyte layer 6, which forms a ceiling surface of the second internal vacancy 40, a bottom electrode 51b is disposed on the first solid electrolyte layer 4, which forms a bottom of the second internal vacancy 40, and side electrodes (not shown) that connect the ceiling electrode 51a to the bottom electrode 51b are disposed on the wall surfaces of the spacer layer 5, which form the side walls of the second internal vacancy 40. These electrodes constitute a tunnel structure. Like the inner pump electrode 22, the auxiliary pump electrode 51 is also formed of a material having a decreased ability to reduce a NOx component in a gas to be measured.
In the auxiliary pump cell 50, a desired pump voltage Vp1 is applied between the auxiliary pump electrode 51 and the outer pump electrode 23 to pump oxygen from the atmosphere of the second internal vacancy 40 to the external space or from the external space into the second internal vacancy 40.
In order to control the oxygen partial pressure of the atmosphere of the second internal vacancy 40, the auxiliary pump electrode 51, the reference electrode 42, the second solid electrolyte layer 6, the spacer layer 5, the first solid electrolyte layer 4, and the third substrate layer 3 constitute an electrochemical sensor cell, that is, an oxygen partial pressure detection sensor cell 81 for controlling an auxiliary pump.
Pumping with the auxiliary pump cell 50 is powered with a variable power supply 52. The voltage of the variable power supply 52 is controlled on the basis of the electromotive force V1 determined with the oxygen partial pressure detection sensor cell 81 for controlling an auxiliary pump. The oxygen partial pressure of the atmosphere of the second internal vacancy 40 is decreased so as not to substantially affect NOx measurement.
Furthermore, together with this, the pump current Ip1 is used to control the electromotive force of the oxygen partial pressure detection sensor cell 80 for controlling a main pump. More specifically, the pump current Ip1 is input as a control signal to the oxygen partial pressure detection sensor cell 80 for controlling a main pump to control the electromotive force V0 such that the oxygen partial pressure of a gas to be measured introduced into the second internal vacancy 40 through the third diffusion controlling portion 30 consistently has a constant gradient. For use as a NOx sensor, the oxygen concentration of the second internal vacancy 40 is maintained at approximately 0.001 ppm by operation of the main pump cell 21 and the auxiliary pump cell 50.
The measurement pump cell 41 measures the NOx concentration of a gas to be measured in the second internal vacancy 40. The measurement pump cell 41 is an electrochemical pump cell that is composed of a measuring electrode 44, the outer pump electrode 23, the second solid electrolyte layer 6, the spacer layer 5, and the first solid electrolyte layer 4. The measuring electrode 44 is disposed on the top surface of the first solid electrolyte layer 4 facing the second internal vacancy 40 and is separated from the third diffusion controlling portion 30.
The measuring electrode 44 is a porous cermet electrode. The measuring electrode 44 also functions as a NOx reduction catalyst for reducing NOx in the atmosphere of the second internal vacancy 40. The measuring electrode 44 is covered with a fourth diffusion controlling portion 45.
The fourth diffusion controlling portion 45 is a film composed of a porous ceramic material. The fourth diffusion controlling portion 45 functions to limit the NOx flow to the measuring electrode 44 and also functions as a protective layer for the measuring electrode 44. The measurement pump cell 41 can pump oxygen produced by decomposition of nitrogen oxides in the ambient atmosphere of the measuring electrode 44 and determine the amount of produced oxygen as a pump current Ip2.
In order to determine the oxygen partial pressure around the measuring electrode 44, the first solid electrolyte layer 4, the third substrate layer 3, the measuring electrode 44, and the reference electrode 42 constitute an electrochemical sensor cell, that is, an oxygen partial pressure detection sensor cell 82 for controlling a measurement pump. A variable power supply 46 is controlled on the basis of the electromotive force V2 determined with the oxygen partial pressure detection sensor cell 82 for controlling a measurement pump.
A gas to be measured introduced into the second internal vacancy 40 reaches the measuring electrode 44 through the fourth diffusion controlling portion 45 while the oxygen partial pressure is controlled. Nitrogen oxides in a gas to be measured around the measuring electrode 44 are reduced to produce oxygen (2NO→N2+O2). The produced oxygen is pumped by the measurement pump cell 41. The voltage Vp2 of the variable power supply 46 is controlled such that the control voltage V2 determined with the oxygen partial pressure detection sensor cell 82 for controlling a measurement pump is constant. The amount of oxygen produced around the measuring electrode 44 is proportional to the concentration of nitrogen oxides in a gas to be measured. Thus, the concentration of nitrogen oxides in a gas to be measured can be calculated from the pump current Ip2 in the measurement pump cell 41.
An oxygen partial pressure detection means serving as an electrochemical sensor cell composed of the measuring electrode 44, the first solid electrolyte layer 4, the third substrate layer 3, and the reference electrode 42 can determine the electromotive force depending on the difference between the amount of oxygen produced by reduction of a NOx component in the atmosphere around the measuring electrode 44 and the amount of oxygen in the reference atmosphere and thereby determine the concentration of the NOx component in a gas to be measured.
The second solid electrolyte layer 6, the spacer layer 5, the first solid electrolyte layer 4, the third substrate layer 3, the outer pump electrode 23, and the reference electrode 42 constitute an electrochemical sensor cell 83. The oxygen partial pressure of a gas to be measured on the outside of the sensor can be determined from the electromotive force Vref of the sensor cell 83.
In the gas sensor 100 having such a structure, the main pump cell 21 and the auxiliary pump cell 50 supply the measurement pump cell 41 with a gas to be measured having a consistently low oxygen partial pressure (so as not to substantially affect NOx measurement). Thus, the NOx concentration of a gas to be measured can be determined from the pump current Ip2 resulting from pumping oxygen produced by reduction of NOx approximately in proportion to the NOx concentration of a gas to be measured out of the measurement pump cell 41.
The sensor device 101 also includes a heater unit 70 that has a temperature control function by heating and insulating the sensor device 101 in order to increase the oxygen ion conductivity of the solid electrolyte. The heater unit 70 includes a heater connector electrode 71, a heater 72, a through-hole 73, a heater insulating layer 74, and a pressure release hole 75.
The heater connector electrode 71 is an electrode in contact with an undersurface of the first substrate layer 1. The heater unit 70 can be supplied with electricity from the outside by connecting the heater connector electrode 71 to an external power supply.
The heater 72 is an electrical resistor between the second substrate layer 2 and the third substrate layer 3. The heater 72 is coupled to the heater connector electrode 71 via the through-hole 73 and generates heat by the supply of electricity from the outside via the heater connector electrode 71, thereby heating and insulating the solid electrolyte of the sensor device 101.
The heater 72 is embedded throughout the entire region from the first internal vacancy 20 to the second internal vacancy 40 and can control the activation temperature of the solid electrolyte throughout the sensor device 101.
The heater insulating layer 74 is an insulating layer formed of an insulator, such as alumina, on the top and bottom surfaces of the heater 72. The heater insulating layer 74 is formed in order for electrical insulation between the second substrate layer 2 and the heater 72 and electrical insulation between the third substrate layer 3 and the heater 72.
The pressure release hole 75 passes through the third substrate layer 3 and communicates with the reference gas inlet space 43 and is formed in order to decrease an increase in internal pressure resulting from a temperature rise in the heater insulating layer 74.
As illustrated in
In the present embodiment, as illustrated in
The porous protective film 91 is a porous sintered body composed mainly of alumina. The porous protective film 91 may contain a zirconia component. The porosity of the porous protective film 91 is not particularly limited and may range from 10%; to 60%. The porous protective film 91 has a thickness t (see
A method for producing the gas sensor 100 will be described below with reference to
In the step (a), the sensor device 101 illustrated in
In the step (b), first, a front end of a core 201 that imitates the sensor device 101 is placed at a predetermined position in a rectangular recessed portion 112 of the mold 110 (see
The slurry will be described in detail below. The slurry for gel casting contains a ceramic powder, a sintering aid, an organic solvent, a dispersant, and a gelling agent.
The ceramic powder is alumina to which zirconia (for example, yttria-stabilized zirconia) is added. The material of the ceramic powder may be appropriately selected for the material of the sensor device 101. For example, the material of the ceramic powder may be selected so as to decrease the difference in thermal expansion coefficient between the material of the ceramic powder and the material of the sensor device 101.
The sintering aid may be appropriately selected depending on the type of ceramic powder and may be one selected from aluminum oxide, zirconium oxide, zinc oxide, silicon oxide, calcium carbonate, barium carbonate, magnesium carbonate, silicon nitride, aluminum nitride, titania, and spinel, or a composite oxide or composite nitride containing two or more of these materials. The specific material of the sintering aid may be selected so as to facilitate bonding between ceramic particles even at low firing temperatures (temperatures lower than the temperatures at which the ceramic powder is sintered without the aid). Formation of a fired product from the ceramic powder in the green film at low temperatures can reduce thermal damage to the substrate. The sintering aid is preferably a sintering aid containing a component for forming a glass layer or a sintering aid that has a large specific surface area and promotes sintering of the ceramic powder even at low temperatures.
The organic solvent may be any solvent that can dissolve the dispersant and the gelling agent and may be a hydrocarbon solvent (such as toluene, xylene, or solvent naphtha), an ether solvent (such as ethylene glycol monoethyl ether, butyl carbitol, or butyl carbitol acetate), an alcohol solvent (such as isopropanol, 1-butanol, ethanol, 2-ethylhexanol, terpineol, ethylene glycol, or glycerin), a ketone solvent (such as acetone or methyl ethyl ketone), an ester solvent (such as butyl acetate, dimethyl glutarate, or triacetin), or a polybasic acid solvent (such as glutaric acid). Among these, preferred is an ester solvent, in particular a solvent having two or more ester bonds, such as a polybasic acid ester (such as dimethyl glutarate) or an acid ester of a polyhydric alcohol (such as triacetin).
The dispersant may be any dispersant that can uniformly disperse a ceramic powder in an organic solvent and may be a polycarboxylic acid copolymer, a polycarboxylic acid salt, a sorbitan fatty acid ester, a polyglycerin fatty acid ester, a phosphate copolymer, a sulfonate copolymer, or a polyurethane polyester copolymer having a tertiary amine. In particular, a polycarboxylic acid copolymer or a polycarboxylic acid salt is preferred. The addition of such a dispersant can reduce the viscosity and increase the flowability of the slurry before molding.
The gelling agent may be any gelling agent that contains at least two polymerizable organic compounds and may be a gelling agent that contains two organic compounds that can undergo a urethane reaction. Such two organic compounds may be an isocyanate and a polyol. The isocyanate may be any substance that has an isocyanate group as a functional group and may be isophorone diisocyanate (IPDI), hexamethylene diisocyanate (HDI), tolylene diisocyanate (TDI), diphenylmethane diisocyanate (MDI), or a modified product thereof. The isocyanate may have a reactive functional group other than the isocyanate group and may have a plurality of isocyanate groups like a polyisocyanate. The polyol may be any substance that has two or more hydroxy groups reactive with an isocyanate group and may be ethylene glycol (EG), poly(ethylene glycol) (PEG), propylene glycol (PG), poly(propylene glycol) (PPG), poly(tetramethylene glycol) (PTMG), poly(hexamethylene glycol) (PHMG), poly(vinyl alcohol) (PVA), or poly(vinyl acetal). A resin having a high molecular weight can reduce the occurrence of cracking during molding. This increases film strength. This also provides elasticity or plasticity. This can further reduce the occurrence of cracking due to volume contraction resulting from drying or demolding. Such a resin may be used alone as a polyol or isocyanate or may be used in combination. A resin not involved in a urethane reaction may be added. The gelling agent may contain a catalyst for promoting a polymerization. The catalyst may be a catalyst for promoting a urethane reaction between an isocyanate and a polyol, such as triethylenediamine, hexanediamine, or 6-dimethylamino-1-hexanol.
In the preparation of a slurry, first, a ceramic powder, a sintering aid, an organic solvent, and a dispersant are mixed at a predetermined ratio for a predetermined time to prepare a slurry precursor. The slurry precursor is mixed with a gelling agent immediately before use of the slurry to prepare the slurry. The slurry gels in minutes or hours. One or two of an isocyanate, a polyol, a resin, a plasticizer, and a catalyst of the gelling agent may be added to the slurry precursor in advance, and the remaining components may be added to prepare the slurry. The mixing method for the preparation of the slurry precursor is not particularly limited, and a ball mill may be used. The mixing method for the preparation of the slurry is also not particularly limited, and a planetary mixer, a propeller mixer, or a static mixer may be used. After the gelling agent is added to the slurry precursor, a chemical reaction (urethane reaction) of the gelling agent proceeds with time in the slurry. Thus, the slurry is preferably rapidly charged into the mold 110.
In the step (c), the front end of the sensor device 101 including the outer pump electrode 23 is inserted into a recessed portion 191a of the green cap 191 (see
0≦x≦250
y≦70
y≧0.067x+30
y≦0.1x+60
In the step (d), the green structure 102 is fired to produce the gas sensor 100 (see
The correspondence between the constituents of the present embodiment and the constituents of the present invention will be described below. The gas sensor 100 according to the present embodiment corresponds to a film laminated structure according to the present invention, the sensor device 101 corresponds to a ceramic substrate, the green cap 191 corresponds to a green body, and the porous protective film 91 corresponds to a film.
In accordance with the method for producing the gas sensor 100 according to the present embodiment described above in detail, setting of x and y in the step (c) so as to satisfy the formulae results in adequate drying shrinkage of the green cap 191, thereby allowing the green cap 191 to be fixed to the sensor device 101 without cracks. After firing in the step (d), the porous protective film 91 can be fixed to the sensor device 101 by firing without cracks. In the step (d), the green cap 191 can be fired to form the porous protective film 91 at relatively low temperatures by the action of the aid. Also in this regard, the porous protective film 91 rarely has cracks. A film precursor is molded in advance with a mold and is formed into a film on the ceramic substrate. Thus, the thickness of the finally formed porous protective film 91 is more consistent than the thickness of a film formed by a dip method as described in Patent Literature 1. The porous protective film 91 can have a large thickness in the range of 100 to 1000 μm.
The clearance x before drying in the step (c) can be freely determined by changing the size of the core 201.
Furthermore, because the mold 110 is composed of the half molds 110a and 110b closely attached with no spaces therebetween, the green cap 191 can be easily released from the mold 110 by dividing the mold 110.
Although the sensor device 101 includes a metal portion, that is, the outer pump electrode 23 on its surface, the metal portion is not corroded by acids because the slurry contains an organic solvent as a dispersion medium rather than water.
Furthermore, because the gas sensor 100 is produced by the method described above, the porous protective film 91 has substantially uniform porosity in the inside of its cross section, although the porosity is higher on the outermost surface than in the inside of the cross section.
The present invention should not be limited to the embodiments described above and can be implemented in various aspects within the scope of the present invention.
For example, in the embodiments described above, as illustrated in
Although the length L is greater than the width and thickness of the sensor device 101 in the embodiments described above, the length L is not limited to this. For example, the length L may be smaller than at least one of the width and thickness of the sensor device 101.
Although the core 201 is separated from the mold 110 in the embodiments described above, the core 201 may be integral with the mold 110.
Although the mold 110 is composed of two vertical half molds 110a and 110b closely attached with no spaces therebetween in the embodiments described above, the mold 110 may be composed of three or more vertically divided molds closely attached with no spaces therebetween. The direction and position of the division are not particularly limited, provided that the divided molds allow demolding without defects.
Although the mold 110 has the rectangular recessed portion 112 in the embodiments described above, the mold 110 may have any shape. For example, the mold 110 may have runners, gates, and bents branched from one inlet such that a plurality of molded products can be formed. The mold may be tapered to facilitate demolding.
Although the green cap 191 includes the recessed portion 191a in the embodiments described above, the bottom of the recessed portion 191a may be opened, that is, the green cap 191 may include a through-hole instead of the recessed portion 191a. In this case, the sensor device 101 is inserted into the through-hole.
The thickness, surface conditions (for example, roughness and waviness), and internal shape of the porous protective film can be controlled by changing the shape of the rectangular recessed portion 112 or the core 201 in the embodiments described above. For example, the porous protective film 91 can have round corners and a boundary (the rear end of the porous protective film 91 in
Although the sensor device 101 of the gas sensor 100 includes the first internal vacancy 20 and the second internal vacancy 40 in the embodiments described above, the present invention is not limited to this. For example, the sensor device 101 of the gas sensor 100 may further include a third internal vacancy.
Production of the gas sensor 100 is described in detail in the following examples. However, the present invention is not limited to these examples.
In Example 1, the gas sensor 100 was produced by the method described above in the embodiments. First, the sensor device 101 was produced in the step (a). The sensor device 101 had a length of 70 mm in the front-back direction (longitudinal direction), a width of 4 mm in the left-right direction, and a vertical thickness of 1.5 mm. The sensor device 101 had 1.5 mm×4 mm longitudinal rectangular end faces. In the production of the sensor device 101, ceramic green sheets were formed by tape casting of a mixture of zirconia particles to which 4 mol % yttria was added as a stabilizing agent, an organic binder, and an organic solvent.
In the step (b), the green cap 191 was formed by a gel casting process using an organic solvent as a dispersion medium. The mold 110 was designed such that when the core 201 is placed in the rectangular recessed portion 112, the green cap 191 has a length of 12 mm in the front-back direction and a thickness of 450 μm. The sensor device 101 was fixed by holding the sensor device 101 with a silicone rubber rather than a metal. The core 201 had a size such that the space between the inner circumferential surface of the green cap 191 and the outer circumferential surface of the sensor device 101 is approximately 50 μm when the green cap 191 is placed around the sensor device 101. The slurry S was prepared as described below. 2 parts by mass of silicon oxide was added as a sintering aid (a component for forming a glass layer) to a mixed powder of 71 parts by mass of an alumina powder (average particle size 2 μm, purity 99.9%) and 16 parts by mass of zirconia (average particle size 0.3 μm, purity 90%). These were poured into a liquid mixture of 32 parts by mass of a polybasic acid ester serving as an organic solvent, 4 parts by mass of a polycarboxylic acid copolymer serving as a dispersant, and 0.9 parts by mass of ethylene glycol serving as a polyol. The liquid mixture and cobblestones were mixed in a pot for 12 hours to prepare a slurry precursor. The slurry precursor was mixed with a polymethylene polyphenyl polyisocyanate serving as an isocyanate, which constituted 5% by volume of the slurry precursor, and 0.1 parts by mass of a catalyst 6-dimethylamino-1-hexanol in a planetary mixer for 90 seconds, thereby preparing a slurry S. The slurry S was charged into the rectangular recessed portion 112 and, after one hour, was cured such that the cured product could be released from the mold, thereby forming the green cap 191.
In the step (c), the front end of the sensor device 101 including the outer pump electrode 23 was inserted into the recessed portion 191a of the green cap 191, and the sensor device 101 and the green cap 191 were dried at 80° C. for 12 hours to form the green structure 102. The green cap 191 was fixed to the sensor device 101 by drying shrinkage. The clearance between the green cap 191 and the sensor device 101 was 50 μm, which was the same as the clearance defined by the core 201. The volume percentage of the organic solvent in the slurry used in the gel casting process was 55% by volume.
In the step (d), the green structure 102 was fired to produce the gas sensor 100. More specifically, the green structure 102 was placed in a setter, was heated to a predetermined temperature (1100° C.) at 100° C./h, was held at this temperature for 2 hours, and was naturally cooled to room temperature. The green cap 191 was converted into the porous protective film 91, and the porous protective film 91 was fixed to the sensor device 101 by firing. The porous protective film 91 had a length of 12 mm in the front-back direction and a thickness of 450 μm.
First, a dipping slurry was prepared. This slurry forms a porous protective film by firing. 7 parts by mass of silicon oxide was added as a sintering aid (a component for forming a glass layer) to a mixed powder of 44 parts by mass of an alumina powder (average particle size 2 μm, purity 99.9%) and 49 parts by mass of zirconia (average particle size 0.3 μm, purity 90%). Added to this were 24 parts by mass of a xylene/butanol mixture serving as an organic solvent and 4 parts by mass of a polycarboxylic acid polymer serving as a dispersant. A rheology control agent was added to adjust the viscosity to be in the range of 300,000 to 500,000 cP at a shear rate of 0.1 s−1. The same sensor device as in Example 1 was then dipped in the dipping slurry to form a green film on the surface of the sensor device. As in Example 1, the green film had a length of 12 mm in the front-back direction (longitudinal direction). The drawing speed at which the sensor device was drawn from the slurry was 1 mm/s. The drawing direction was the vertical direction. The sensor device on which the green film was formed was then dried twice in a drying furnace at a temperature in the range of 80° C. to 90° C. for 15 minutes each, thereby drying the green film. During drying, a portion of the sensor device on which the green film was formed faced downward. The green film was then fired. The firing conditions were the same as in Example 1 and are not described here. A gas sensor according to Comparative Example 1 was thus produced. The porous protective film of the gas sensor according to Comparative Example 1 had a length of 12 mm in the front-back direction and a thickness of 450 μm.
Variations in Thickness of Porous Protective Film
The film thickness of the porous protective film 91 of the gas sensor 100 according to Example 1 was examined.
Relationship Between Clearance and Dispersion Medium Concentration Before Drying in Step (c)
Many gas sensors 100 were produced in the same manner as in Example 1. In the step (c), before drying, the clearance x [μm] between the recessed portion 191a of the green cap 191 and the sensor device 101 inserted into the recessed portion 191a and the volume percentage y [vol %] of the dispersion medium (organic solvent) in the slurry used in the gel casting process satisfied the relationship listed in Table 2. The green cap 191 was observed after drying at 80° C. for 12 hours. Table 2 shows the results.
As is clear from
0≦x≦250
y≧0.067x+30
y≦0.1x+60
y≦<70
The present application claims priority from Japanese Patent Application No. 2014-68564 filed on Mar. 28, 2014, and Japanese Patent Application No. 2014-200788 filed on Sep. 30, 2014, the entire contents of both of which are incorporated herein by reference.
It goes without saying that these examples do not limit the present invention.
Number | Date | Country | Kind |
---|---|---|---|
2014-068564 | Mar 2014 | JP | national |
2014-200788 | Sep 2014 | JP | national |