The present invention relates to a film-margin adjuster.
On an existing production line for TFT-LCD (Thin Film Transistor-Liquid Crystal Display), a glass substrate is conveyed into a film-formation processing chamber for forming films. As shown in
However, because a glass substrate will be shifted during conveyance, after the glass substrate is conveyed into a processing chamber, a shift of the film-margin and uneven formation of films will be caused if the glass substrate is placed at an improper position. This will cause defects to be generated in subsequent exposing and etching processes, and even lead to breakage of the glass substrate, resulting in shut-down of equipments, and thus causing production delays, and affecting productivity and effectiveness of the entire production line.
According to an embodiment of the present invention, there is provided a film-margin adjuster, which comprises four shielding plates for shielding an area of peripheral edge-portions of a film-formation substrate respectively, wherein the four shielding plates are oppositely disposed in pairs, and at least one pair of the oppositely disposed shielding plates has a adjustable relative distance therebetween.
In some embodiments, the film-margin adjuster further comprises four fixed rims, which are oppositely disposed in pairs and joined into a fixed frame structure, the four shielding plates are provided on the four fixed rims in one-to-one correspondence, and at least one shielding plate is connected onto the fixed frame structure in a movable manner, and is movable with respect to the shielding plate that is disposed opposite thereto.
Preferably, the film-margin adjuster further comprises a first control device for controlling movement of the at least one pair of the oppositely disposed shielding plates.
Preferably, the film-margin adjuster further comprises a first position-sensing device for acquiring current position information of each of the shielding plates. The current position information of each of the shielding plates, acquired by the first position-sensing device, is provided to the first control device, so that the first control device controls the movement of the at least one pair of the oppositely disposed shielding plates according to the current position information of each of the shielding plates.
The film-margin adjuster may further comprise a first feedback device, which is connected with the first position-sensing device and the first control device respectively, wherein the current position information of each of the shielding plates, acquired by the first position-sensing device, is provided via the first feedback device to the first control device.
In some embodiments, the first position-sensing device is an optical sensor.
Preferably, the film-margin adjuster may further comprise an alignment mechanism for adjusting the position of the film-formation substrate to a predefined position.
For example, the alignment mechanism comprises a moving device for moving the film-formation substrate.
Preferably, the moving device may comprise four clamping structures for clamping and securing four corners of the film-formation substrate respectively, and each of the clamping structures comprises: a fixed bracket, and at least two spindles provided on the fixed bracket and spaced apart for clamping both outside edges of one corner of the film-formation substrate respectively to secure the film-formation substrate.
Preferably, the alignment mechanism may further comprises: a second position-sensing device, for acquiring current position information of the film-formation substrate; and a second control device, connected with the moving device, for controlling the moving device to move the film-formation substrate to a predefined position, according to the current position information of the film-formation substrate acquired by the second position-sensing device.
The film-margin adjuster may further comprises: a second feedback device, connected with the second position-sensing device and the second control device respectively, for providing the position information of the film-formation substrate acquired by the second position-sensing device to the second control device.
In some embodiments, the second position-sensing device is an optical sensor.
Preferably, the moving device further comprises: a driving structure, connected with the second control device, for driving the moving device to move the film-formation substrate, under the control of the second control device.
The driving structure may be an electric or pneumatic driving structure.
In order to clearly illustrate the technical solutions of the embodiments of the invention, the drawings showing the embodiments will be briefly described in the following. It is obvious that the described drawings are only related to some embodiments of the invention and thus are not limitative of the invention.
The principles and features of the present invention will be described below with reference to the drawings. The examples described are only for the purpose of explaining the present invention, but not intended to limit the scope of the invention.
According to an embodiment, there is provided a film-margin adjuster, which can achieve adjustment of the size of film-margin, during film-formation on a glass substrate that is conveyed into a film-formation processing chamber, on a TFT-LCD production line.
As shown in
With the above solution, the four shielding plates 100 for shielding the area of the peripheral edge-portions of the film-formation substrate, are designed as such a structure in which the oppositely disposed shielding plates 100 have an adjustable relative distance therebetween. After the film-formation substrate (e.g., a glass substrate) is conveyed into a film-formation processing chamber, since the portion on the film-formation substrate non-shielded by the shielding plates 100 is used for film-formation, by adjusting the relative distance between the oppositely disposed shielding plates 100, the shielded area of the peripheral edge-portions of the film-formation substrate by the shielding plates 100 can be adjusted. Thus, the control of the size of film-margin during film-formation can be achieved, thereby meeting design requirements and improving yield of production line.
It should be noted that, in the film-margin adjuster provided in this embodiment, among the two pairs of oppositely disposed shielding plates 100, there may be one pair of the oppositely disposed shielding plates 100 that has an adjustable relative distance therebetween. It is also possible that both the two pairs of oppositely disposed shielding plates 100 have an adjustable relative distance therebetween, respectively.
Specifically, as shown in
In this embodiment, preferably, as shown in
In addition, the film-margin adjuster can control the movement of each of the shielding plates 100 through manual manipulation. Preferably, the film-margin adjuster provided in this embodiment can further comprise: a first control device (not shown), for controlling the movement of each of the shielding plates 100. With the first control device, it is possible to precisely control the movement of the shielding plate 100.
In addition, in order to further precisely control the movement of the shielding plates 100 so as to achieve precise control of the size of film-margin, in this embodiment, preferably, the film-margin adjuster can further comprise: a first position-sensing device (not shown), for acquiring current position information of each of the shielding plates 100.
A first feedback device (not shown) is connected with the first position-sensing device and the first control device respectively, for feeding back the current position information of each of the shielding plates 100 to the first control device, so that the first control device controls the movement of the shielding plates 100, according to the current position information of each of the shielding plates 100.
With the above solution, the first position-sensing device acquires the current position information of each of the shielding plates 100, then the first feedback device feeds back the current position information of each of the shielding plates 100 to the first control device, and then the first control device controls the movement of each of the shielding plates 100, according to the current position information of each of the shielding plates 100, so that each of the shielding plates 100 is accurately controlled to be moved to a proper position.
It should be noted that, in this embodiment, the first position-sensing device can be an optical sensor, which is used to sense the position of each of the shielding plates 100. Certainly, in other embodiments, the first position-sensing device can be implemented with other devices.
In addition, in this embodiment, since the film-formation substrate is likely to be shifted in position as it is conveyed into a film-formation processing chamber, a deviation may still occur if the film-margin is controlled only by moving the shielding plates 100. Therefore, in order to further ensure the precision of film-margin control, in this embodiment, as shown in
In this embodiment, preferably, as shown in
With the above solution, the second position-sensing device 301 acquires the current position information of the film-formation substrate 10, then the current position information of the film-formation substrate 10 is fed back via the second feedback device 303 to the second control device, and then the second control device sends control signals to the moving device 302, according to the current position information of the film-formation substrate 10, and the moving device 302 in turn moves the film-formation substrate 10 to a predefined position.
It should be noted that, the second position-sensing device 301 can be an optical sensor, which acquires the current position information of the film-formation substrate 10. It should also be noted that, in a preferred embodiment of the present invention, the first position-sensing device and the second position-sensing device 301 can be the same device, which simultaneously acquires the position information of the shielding plates 100 and of the film-formation substrate 10.
In addition, the first control device and the second control device may also be integrated as the same control device, which can firstly control the film-formation substrate 10 to move to a predefined position, and then according to the positions of the shielding plates 100, control the shielding plates 100 to move to proper positions, so as to achieve automatic adjustment of the size of film-margin.
In addition, it should also be noted that, in this embodiment, the predefined position of the film-formation substrate 10 is preferably a position where the film-formation substrate 10 is located at an intermediate position of the fixed frame structure.
In addition, in this embodiment, the moving device 302 for moving the film-formation substrate 10 can be a variety of structures. In one example of this embodiment shown in
four clamping structures, for clamping and securing the four corners of the film-formation substrate 10 respectively, wherein each of the clamping structures comprises: a fixed bracket 3021, and two spindles 3022 provided on the fixed bracket 3021 and spaced apart; and
a driving structure (not shown), connected with the second control device, for driving the spindles 3022 to spin at both outside edges of one corner of the film-formation substrate 10, so as to move the film-formation substrate 10 under the control of the second control device.
The fixed bracket 3021 in each of the clamping structures is used to be fixed to the four corners of the fixed frame structure. The two spindles 3022 in each of the clamping structures are spaced apart, so that each corner of the film-formation substrate 10 can be disposed between the two spindles 3022. Thus, as shown in
In addition, it should also be noted that, in other embodiments, the moving device 302 is not limited to the structure described above, but can be other structures. For example, two clamping arms can be used to clamp the film-formation substrate 10, and a driving structure can be used to drive the clamping arms to move the film-formation substrate 10. Detailed description in this regard is omitted herein.
In summary, the film-margin adjuster provided in the embodiments of the present invention, can achieve adjustment of the alignment of the film-formation substrate 10. Such adjustment of the alignment can be performed in real time. In addition, it is also possible to adjust the shielding area of the shielding plates 100 automatically, thereby achieving automatic adjustment of the size of film-margin, during a film-forming process on the film-formation substrate 10 that is conveyed into a film-formation processing chamber on a production line, and thus design requirements are satisfied and product yield is improved.
In order to make the objects, technical details and advantages of the embodiments of the present invention more clear, the technical solutions of the embodiments have been described in a clearly and fully understandable way in connection with the drawings related to the embodiments of the invention. It is obvious that the described embodiments are just a part but not all of the embodiments of the invention. Based on the described embodiments herein, those skilled in the art can obtain other embodiment(s), without inventive labor, which should be within the scope of the invention.
| Number | Date | Country | Kind |
|---|---|---|---|
| 201310057293.2 | Feb 2013 | CN | national |
| Filing Document | Filing Date | Country | Kind |
|---|---|---|---|
| PCT/CN2013/073645 | 4/2/2013 | WO | 00 |