1. Field of the Invention
The present invention relates to a flexible and stretchable graphene film, preparing method thereof, and use of the flexible and stretchable graphene film.
2. Description of the Related Art
Stretchable, flexible or wearable electronics have been developed rapidly and led the electronic applications to a new class. Such emerging devices have attracted keen interest due to their tremendous potential in a wide field of future applications, such as wearable computer, highly flexible paper displays with stretchability, artificial electronic skin, biomedical applications for health monitoring, and biological actuation. Future “intelligent” stretchable or flexible electronic modules will require integrating multiple crucial electronic devices, such as logic memory, power supply, and display onto an elastic polymeric substrate. So far, successful progress for stretchable electronics has been reported on different core electronics such as transistors, light-emitting diodes (LEDs), sensors, antenna, solar cells and batteries. A crucial challenge for those electronics is how to fabricate and integrate multiple flexible and stretchable electronic devices onto a polymeric or nonconventional substrate. This hurdle arises from the fact that those nonconventional substrates are suffered from difficult handling requirements and poor tolerance for high temperature and chemical processing.
Recently, graphene, one of the thinnest known materials, has gained great attention of many researchers and companies because of its exceptional physical and electrical properties. The excellent mechanical flexibility and elastic properties, together with its superior carrier mobility, transparency and inexpensive feature make graphene outstanding electrode for next-generation flexible and foldable electronics. Successfully developed chemical vapor deposition (CVD) method for growing large-scale graphene film renders its appropriateness for practical applications and mass roll-to-roll manufacture. In addition, graphene provides a good interfacial and low contact resistance to organic materials. More importantly, combination of its flexibility and strong adhesive force to the substrate, i.e., Van der Waals (adhesive energy of 0.45 Jm−2 on SiO2), provides graphene an excellent electrode naturally adhered onto the elastic substrate for flexible and stretchable electronic applications.
However, traditional fabricating approaches, including well-established semiconducting techniques and organic solution processes, are first to deposit the graphene film on the selected rigid, flat, or smooth substrates, and then conduct the fabrication procedures on the conventional substrates following a bottom-up fabrication scheme. In those approaches, the substrate is pre-determined and restricted by the processing conditions, chemical solvent compatibility, and handling requirements. Such restrictions lead to the difficulty in fabricating devices on arbitrary non-conventional substrates for more advanced applications. Alternatively, a promising strategy is to carry out the well-established fabrication processes on a conventional planar substrate and then transfer the as-prepared devices onto the desired substrates such as soft plastic, non-planar substrates, functional devices or integrated circuits for avoiding unsuitable fabricating processes. However, to date, those fabrication processes are still complicated and there remains a need and further development for the graphene film.
One aspect of the present invention is to provide a flexible and stretchable graphene film, comprising a graphene layer and a functional layer formed on the graphene layer.
Preferably, the functional layer contains an insulating polymer and a conductive material. Preferably, the insulating polymer is at least one selected from of the group consisting of poly(methyl methacrylate), polyimide, polyacrylate, polyurethane, polyethylene terephthalate, polyethersulfone, polyether ether ketone, polycarbonate, poly(dimethylsiloxane), and a combination thereof. Preferably, the insulating polymer has a concentration in the range of 7 to 200 mg/ml.
Preferably, the conductive material is at least one selected from the group consisting of polyaniline, polythiophene, polyethylenedioxythiopene (PEDOT), polyimide, polystyrenesulfonate (PSS), polypyrrole, polyacetylene, poly(p-phenylene), poly(p-phenylene sulfide), poly(p-phenylene vinylene), polythiophene poly(thienylene vinylene), carbon nanotube, metal nanoparticles, and a combination thereof.
Preferably, the functional layer has a thickness of 1 to 400 nm.
Preferably, the flexible and stretchable graphene film is further transferred onto a substrate. Preferably, the substrate is an unconventional substrate.
Preferably, the flexible and stretchable graphene film further has a metal layer deposited on the functional layer, and exhibits a characteristic of a write-once-read-many-times (WORM) type memory or a re-writable type memory.
Another aspect of the present invention is to provide a method of producing a graphene film, comprising: (a) providing a carrier, and a graphene layer is formed on the surface of the carrier; (b) forming a functional layer containing an insulating polymer and a conductive material on a top portion of the graphene film; and (c) removing the carrier. Preferably, the method further comprises the following steps: (d) transferring the graphene film onto a pre-strained substrate; and (e) releasing the pre-strained substrate. Preferably, the pre-strained substrate is an elastomer.
Preferably, the graphene layer is formed by chemical vapor deposition (CVD) method. Preferably, the functional layer is formed by bar-coating, wire bar-coating, spin coating, dip coating, casting, micro gravure coating, gravure coating, roll coating, immersion coating, spray coating, screen printing, flexo printing, offset printing, or inkjet printing method.
Still another aspect of the present invention is to provide an apparatus, which has the flexible and stretchable graphene film of the present invention.
Non-limiting and non-exhaustive embodiments will be described in conjunction with the accompanying drawings. Understanding that these drawings depict only several embodiments in accordance with the disclosure and are, therefore, not to be intended to limit its scope, the disclosure will be described with specificity and detail through use of the accompanying drawings, in which:
Hereinafter, illustrative embodiments and examples of the present disclosure will be described in detail with reference to the accompanying drawings so that inventive concept may be readily implemented by those skilled in the art.
However, it is to be noted that the present disclosure is not limited to the illustrative embodiments but can be realized in various other ways. In the drawings, certain parts not directly relevant to the description are omitted to enhance the clarity of the drawings, and like reference numerals denote like parts throughout the whole document.
Throughout the whole document, the term “comprises or includes” and/or “comprising or including” used in the document means that one or more other components, steps, operations, and/or the existence or addition of elements are not excluded in addition to the described components, steps, operations and/or elements. The terms “about or approximately” or “substantially” are intended to have meanings close to numerical values or ranges specified with an allowable error and intended to prevent accurate or absolute numerical values disclosed for understanding of the present invention from being illegally or unfairly used by any unconscionable third party.
[Flexible and Stretchable Graphene Film and Apparatus Containing the Same]
The present invention is to provide a flexible and stretchable graphene film, comprising a graphene layer and a functional layer formed on the graphene layer. The term “functional layer” used herein refers to a layer functioned as a protective layer as well as an active layer. The protective layer acts as a support for the graphene layer and is used to minimize the damage to CVD-derived graphene during the stripping process from the metal carrier. The active layer gives the graphene film to have different properties so that the graphene film can be further used in wide variety applications such as data storage applications, transistors, light-emitting diodes, sensors and power supplies. In an illustrative embodiment, the functional layer contains an insulating polymer and a conductive material.
The insulating polymer is at least one selected from of the group consisting of poly(methyl methacrylate) (PMMA), polyimide, polyacrylate, polyurethane, polyethylene terephthalate, polyethersulfone, polyether ether ketone, polycarbonate, poly(dimethylsiloxane), and a combination thereof. Preferably, the insulating polymer is PMMA. The insulating polymer has a concentration in the range of 5 to 200 mg/ml, preferably 7 to 36 mg/ml for giving the graphene film of the present invention a characteristics of rewritable memory. However, to give the graphene film the characteristics of write-once-read-many-times (WORM) type memory, the insulating polymer shall has a concentration over 7 mg/ml.
The conductive material is at least one selected from the group consisting of polyaniline, polythiophene, polyethylenedioxythiopene (PEDOT), polyimide, polystyrenesulfonate (PSS), polypyrrole, polyacetylene, poly(p-phenylene), poly(p-phenylene sulfide), poly(p-phenylene vinylene), polythiophene poly(thienylene vinylene), carbon nanotube, metal nanoparticles, and a combination thereof. Selection of the conductive material is based on the application of the graphene film of the present invention. For example, if the graphene film is for organic memory application, then semiconducting macromolecular polymer may be selected as a conductive material; if the graphene film is for transistors or sensors, then carbon nanotube, metal nanoparticles may be selected, etc. With respect to the terms “conductive polymer” and “conductive inorganic material” throughout the whole document, the term “conductive” is construed to include both conductivity as a conductor and conductivity as a semiconductor. The concentration of the conductive material is not limited, preferably, higher than that of the insulating polymer.
In another illustrative embodiment, the functional layer may be a thin film having thickness of about 1 nm to 400 nm, preferably about 10 nm to 150 nm, and most preferably about 50 nm to 100 nm. However, the present disclosure is not limited thereto and persons having ordinary skill in the art can adjust the thickness to comply with their need.
The flexible and stretchable graphene film of the present invention is further transferred onto a substrate. The term “unconventional substrate” refers to any substrate such as a conductive substrate, an insulating substrate, a transparent substrate, a flexible substrate, or a transparent and flexible substrate. However, the present disclosure is not limited thereto. In the present invention, the graphene layer in the graphene film is used as an adhesive layer to be attached to the substrate.
According to the graphene film of the present invention, the graphene film can be applied to various apparatus. Thus, the present invention further provides an apparatus comprising the graphene film of the present invention, such as transferable transistors, light-emitting diodes, sensors and power supplies. For example, the present invention provides a graphene transparent electrode, including the above-described graphene film. An electrode including the graphene film may be applied to various fields such as a liquid crystal display device, an electronic paper display device, an organic light emitting display device, a tough screen, a flexible display apparatus, an organic LED, a solar cell, and the like.
Compared to conventional graphene film, the stretchable, transferable and flexible graphene film of the present invention offers numerous advantages. Firstly, the graphene film can be easily transferred onto desired substrates; hence harsh synthesis and unaccustomed fabrication steps on non-conventional substrates can be avoided. Secondly, the transferability onto organic devices of the graphene film can minimize the possible solvent damage issue suffered from traditional solution-phase techniques. This unique transfer feature could advance the development of 3D-stacked memories or multiple organic electronics modules. Thirdly, there is a freedom to transfer entire graphene film on substrates of various types, including rigid, flexible, stretchable, non-planar, rough, etc. The versatile substrate selection advantage could greatly broaden memory applications in advanced electronics such as flexible, wearable or epidermal electronics. Considering the cost-effective production, the graphene film of the present invention is simple and high-yield; moreover, the integration of the flexible graphene bottom electrode and the polymer memory composite is suitable for roll-to-roll industrial manufacturing.
[Method for Preparing the Flexible and Stretchable Graphene Film]
The present invention provides a method of producing a graphene film, comprising: (a) providing a carrier, and a graphene layer is formed on the surface of the carrier, (b) forming a functional layer containing an insulating polymer and a conductive material on a top portion of the graphene film; and (c) dissolving the carrier by an etchant.
As the method for forming the graphene film, any method generally used in the art of the present disclosure to grow graphene may be used without limitation. For example, a chemical vapor deposition (CVD) method may be used. However, the present disclosure is not limited thereto. The chemical vapor deposition method may include rapid thermal chemical vapour deposition (RTCVD), inductively coupled plasma-chemical vapor deposition (ICP-CVD), low pressure chemical vapor deposition (LPCVD), atmospheric pressure chemical vapor deposition (APCVD), metal organic chemical vapor deposition (MOCVD), and plasma-enhanced chemical vapor deposition (PECVD). However, the present disclosure is not limited thereto.
In another illustrative embodiment, the graphene film may be formed on a metal catalyst thin film (or carrier) through a chemical vapor deposition method. For example, the metal catalyst thin film may include one selected from the group consisting of Ni, Cu, Co, Fe, Pt, Au, Al, Cr, Mg, Mn, Mo, Rh, Si, Ta, Ti, W, U, V, Zr, Ge, Ru, Ir, brass, bronze, nickel, stainless steel, and a combination thereof.
For the preparation of the graphene film, graphene can be grown by injecting a vapor carbon supply source to carrier, and heating the carrier. In an illustrative embodiment, the carrier is placed in a chamber. While vaporously injecting, into the chamber, a carbon supply source such as carbon monoxide, methane, ethane, ethylene, ethanol, acetylene, propane, butane, butadiene, pentane, pentene, cyclopentadiene, hexane, cyclohexane, benzene, or toluene into the chamber, the substrate is heated, for example, at a temperature of about 300° C. to about 2,000° C. As a result, graphene is generated while carbon components existing in the carbon supply source are bonded to one another to form a hexagonal plate shape structure. By cooling the graphene, the graphene film in a uniformed arrangement state is obtained. However, the method for forming graphene on the carrier is not limited to the chemical vapor deposition method. In an illustrative embodiment of the present disclosure, any method that forms graphene on the carrier may be used. It is understood that the present disclosure is not limited to the certain method that forms graphene on the carrier.
The functional layer is then formed on the graphene film by various methods, such as bar-coating, wire bar-coating, spin coating, dip coating, casting, micro gravure coating, gravure coating, roll coating, immersion coating, spray coating, screen printing, flexo printing, offset printing, or inkjet printing method. However, the present disclosure is not limited thereto.
Dissolving or removing the carrier may be performed through dry etching using an etching apparatus such as reactive ion etching (RIE), inductively coupled plasma RIE (ICP-RIE), electron cyclotron resonance RIE (ECR-RIE), reactive ion beam etching (RIBE), or chemical assistant ion beam etching (CAIBE); wet etching using an etchant such as potassium hydroxide (KOH), tetra methyl ammonium hydroxide (TMAH), ethylene diamine pyrocatechol (EDP), burrered oxide etch (BOE), FeCl3, Fe(NO3)3, HF, H2SO4, HNO3, HPO4, HCl, NaF, KF, NH4F, AlF3, NaHF2, KHF2, NH4HF2, HBF4, and NH4BF4; or a chemical mechanical polishing process using an oxide film etching agent.
According to another illustrative embodiment, the graphene film is further transferred onto a substrate. For example, the substrate 110 may be a substrate formed of the following material: polyethylene terephthalate (PET), polybuthylene terephthalate (PBT), polysilane, polysiloxane, polysilazane, polyethylene (PE), polycarbosilane, polyacrylate, polymethacrylate, polymethylacrylate, PMMA, polyethylacrylate, cyclic olefin copolymer (COC), polyethylmetacrylate, cyclic olefin polymer COP, polypropylene (PP), polyimide (PI), polystyrene (PS), polyvinylchloride (PVC), polyacetal (POM), polyetheretherketone (PEEK), polyestersulfon (PES), polytetrafluoroethylene (PTFE), or polyvinylidenefloride (PVDF), perfluoroalkyl polymer (PFA). However, the present disclosure is not limited thereto. Preferably, the graphene film is transferred onto a pre-strained substrate, and then releasing the pre-strained substrate. Thus, the obtained graphene film is buckled and can be elongated by conversion of the vertical displacement and planar strain, which realizes the stretchability. In a preferable embodiment, the pre-strained substrate is an elastomer, such as unsaturated rubbers, saturated rubbers or other types of elastomer, such as theromoplastic elastomer, elastin, polysulfide rubber, and the like.
Compared to traditional method, where the protective layer is first spin-coated or inject printed onto the graphene film to act as a support, an etchant is then used to remove the metal catalyst (carrier), after which the protective layer/graphene stack is transferred to another substrate, and finally solvents are then used to remove the protective layer to complete the graphene film transfer, the present invention omits the step of removing the functional layer, which serves a protective layer as well as a conductive layer.
According to the present invention, the graphene film is ready to be transferred onto desired substrates with a simple one-step transfer process, which will be largely beneficial to a range of advanced electronic applications such as flexible, wearable computers, and epidermal electronics. In addition, unlike the conventional protective layer on graphene film shall be removed, the graphene film of the present invention can be simply transferred without removing the functional layer, thus paves a promising way for vertical stacking organic electronics and creating flexible 3D circuitries.
Hereinafter, the present disclosure will be specifically described with reference to examples and drawings. However, the present disclosure is not limited to the examples and the drawings.
a shows a schematic fabrication process of Example 1. A graphene layer was grown on copper foil (carrier) using CVD technique. Detailed synthesis of the CVD-derived graphene layer can be found in prior art and is not described herein. A polymer solution composed of poly(3-butylthiophene) (10 mg, Sigma-Aldrich), chlorobenzene (0.5 mL), and poly(methyl methacrylate) (0.5 mL, 950 k A4, Micro-Chem) was stirred at 50° C. for 1 day. The resulting solution was dropped on the graphene layer for 10 min before starting the spin coating process at a rate of 2500 rpm for 20 sec (˜120 nm by alpha step) to form a functional layer. To complete the device fabrication, an aluminum layer (300 nm) was thermally deposited on top of the functional layer at a pressure of 2×10−6 torr. The Al electrodes were circular patterns with a diameter of 0.54 mm and the typical active area defined by the overlapping of graphene and Al electrodes was 0.23 mm2. Finally, the sacrificial Cu foil was removed by immersing the device into an aqueous solution of iron nitrate (Fe(NO3)3) (0.05 g/mL) for ˜4 hours. Then, this graphene layer/PMMA:P3BT (functional layer)/Al memory label (GMML) was transferred to DI water to wash away the Cu etchant to obtain the graphene film of the present invention.
In order to perform I-V measurement, the graphene film was transferred to the polyethylene terephthalate (PET) substrate and dried naturally, and a contact metal (Ni) was pre-deposited on the border of the PET and partially contacted with the graphene film, as shown in
The electrical characterizations of the GMML were measured by an Agilent 4156C semiconductor parameter analyzer equipped with an Agilent 41501B. All electrical properties were characterized at room temperature and ambient conditions, unless otherwise stated.
We evaluated the electrical switching and memory effects of the GMML both on flat and under bending conditions.
Besides the low writing voltage and low misreading probability, the device stability, including data retention and stimulus effect of continuous pulse reading stress, is also an important character in practical WORM-type memory applications. For testing the data retention ability, the ON/OFF state was probed at regular intervals using the reading voltage of +1 V. As shown in
The GMML was further characterized under bending condition and the results were compared with that of the flat case. The GMML was bent into a concave with bending radius of 10 mm (inset in
After confirming the excellent performances of the GMML on the PET substrate with various geometric deformation, the GMML was further transferred onto various challenging non-conventional substrates.
From the above demonstrations, it is proved that GMML can be easily transferred onto diverse unconventional substrates, including soft, flexed ones or functional organic/inorganic devices with 100% fidelity.
The fabrication process was similar to Example 1. A graphene layer was grown on copper foil (carrier) using CVD technique. A polymer blending solution was prepared by mixing poly(methyl methacrylate) (PMMA, 18 mg, Mw=950 k, Sigma Aldrich Co.) and poly(3-hexylthiophene) (P3HT, 2 mg, Mw=40 k, Luminescence Technology Co.) in chlorobenzene (CB, 1 mL) with stirring at 50° C. for one day. Afterward, the as-prepared solution was spin-coated onto the graphene-grown copper foil at a rate of 2000 rpm for 20 sec (˜130 nm by alpha step) followed by drying under reduced pressure to form a functional layer. Subsequently, the underlay copper foil was dissolved by a Cu etchant, an aqueous solution of iron nitrate (Fe(NO3)3) (0.05 g/mL). Next, the sticker-type organic memory (ROSM) was firstly transferred to deionized water for washing away the Cu etchant to obtain the graphene film of the present invention. All of the electrical characterizations of the fabricated memory device were measured by a Keithley 4200 semiconductor parameter analyzer. All electrical properties were characterized at room temperature and ambient conditions.
In order to perform I-V measurement, the graphene film was transferred to the polyethylene terephthalate (PET) substrate and dried naturally. The top electrodes of the device, 300-nm-thick aluminum, were thermally deposited onto the top of sticker-type organic memory at a pressure of 2×10′6 torr through a shadow mask with circular patterns. The area of memory cell defined by the sandwich of the top Al electrode and graphene sheet was 0.23 mm2. In order to probe the bottom graphene electrode (graphene layer), a contact metal (Ni) for the graphene was pre-deposited on the margin of the PET substrate and partially connected with the bottom graphene electrode. The electrical switching behavior and bistable memory effect of the sticker-type memory (graphene layer/PMMA:P3HT (functional layer)/Al) are illustrated by the current-voltage (I-V) characteristics, as shown in
In order to investigate the re-writability of the erasable sticker-type memory, such writing and erasing processes were cyclically switched by dc sweeping mode, and the current was read out at the reading voltage of 0.5 V in each cyclic sweep. As shown in
For further evaluating the feasibility of the RSOM for flexible memory applications, the bistable switching behavior of the RSOM was examined after bending. As shown in the insert of
Subsequently, in order to broaden the technical application of the electrically erasable sticker-type memory, we transferred it onto various nonconventional substrates and test its electrical switching behaviors. The corresponding electrical measurements are presented alongside the photos of the RSOM on diverse substrates. Firstly, as shown in
To further confirm the conductivity switching behaviors of the rewritable RSOM, we then measured the impacts of PMMA concentrations (
Substrate Preparation: Starting at the preparation of the poly(dimethylsiloxane) (PDMS) substrate, a curing agent and PDMS prepolymer (Dow Corning Sylgard 184) were mixed in a 1:20 weight ratio. The mixture was degassed by reducing pressure for 1 hour to avoid any air bubble in the mixture, and then poured onto the polished side of a silicon wafer. After curing, the PDMS membranes were produced with a thickness of ˜2 mm. Following peeling off the PDMS membranes, the PDMS substrate was cut out into a rectangle with an area of 2 cm×6 cm. Subsequently, the elastic PDMS substrate was clipped one side onto a glass slide and stretched along the length to ˜50% pre-strain, and then clipped the other side with slight component force toward orthogonal direction.
The resulting film then spontaneously contracted and formed ripple on the released substrate. The fabrication here can be processed without any solvent and coating issue and post chemically washing away the protective layer for stripping graphene, which may be beneficial for the fabrication of devices on an elastic polymeric substrate and opens a way to vertically integrate with other stretchable organic devices. Also, combination of the organic memory and the protective layer of graphene may effectively reduce the fabricating processes and advantage for roll-to-roll industrial fabrication.
a) and 8(b) show the top-view and angled-view scanning electron microscopy images of the resulting rippled film. As shown in
The electrical switching behaviors and memory effects of the wrinkled organic memory are illustrated by the current-voltage (I-V) measurement, as shown in
After characterizing the WORM-type organic memory under relaxed conditions, we then analyzed a programmed ON-state under different stretching conditions to confirm that the coded high-conductivity ON-state can be maintained after strain. As shown in
For memory devices, the data storage time is an important characteristic for practical, stretchable WORM-type memory applications. Thus, the ability to retain the coded digital data under various stretching conditions was tested. Coding of memory began with the OFF/ON-state at the original un-strained length and then the device's data retention ability was tested before the device was stretched. As shown in
To evaluate the feasibility of using stretchable organic memory in stretchable electronic applications, the electrical switching behaviors from the different memory devices were tested under different stretching conditions. As shown in
Next, the durability of the programmed ON/OFF state under stretching conditions was further investigated. In exploring the effect of cyclical stretching, the buckled WORM-type organic memory was initially programmed to the ON-state (
As shown in
The transfer process presented here has several exceptional functions and features for generating stretchable organic memory. First, owing to the adhesive features and the ready-to-conduct graphene underlay without other supports, it is possible to transfer the memory devices onto stretchable electronics or circuitries while eliminating the solvent issue. In addition, using the transferrable organic memory with the graphene electrode may be beneficial for solving the handling and processing issue in the fabrication of organic memory devices on elastic polymeric substrates. Moreover, both of the organic materials and the bottom Cu/CVD-graphene are compatible with roll-to-roll fabricating processes. Consequently, the resultant stretchable organic memory may be beneficial for future industrial large-area printing and modular manufacture.
While example embodiments have been disclosed herein, it should be understood that other variations may be possible. Such variations are not to be regarded as a departure from the spirit and scope of example embodiments of the present application, and all such modifications as would be obvious to one skilled in the art are intended to be included within the scope of the following claims.