This application claims the priority benefit of Taiwan patent application no. 110137835, filed on Oct. 12, 2021. The entirety of the above-mentioned patent application is hereby incorporated by reference herein and made a part of this specification.
The disclosure relates to a fluid introduction module, and particularly, relates to a fluid introduction module for plasma system.
When atmospheric plasma is used to make a special surface functional group or a coating, in addition to maintaining a gas source required by the plasma, it is necessary to add a precursor fluid that may form the coating. If a plasma outlet nozzle is fixed, the precursor fluid may be introduced into the plasma outlet nozzle through a fixed pipeline connected to the plasma outlet nozzle. However, regarding a rotatable plasma outlet nozzle, how to set the fixed pipeline on the rotatable plasma outlet nozzle and how to prevent the pipeline from rotating when the plasma outlet nozzle rotates is a research direction of this field. In addition, different plasma and precursor fluids need to be mixed to different degrees, and how to meet different mixing needs is also a research direction of this field.
The disclosure is directed to a fluid introduction module for plasma system applied to a plasma system and including a rotating nozzle and a precursor supply device arranged on the rotating nozzle without being linked to the rotating nozzle. In addition, the fluid introduction module for plasma system is designed to meet different mixing needs of plasma and precursor fluid.
The disclosure provides a fluid introduction module for plasma system adapted for being disposed in a plasma system and including a rotating nozzle and a precursor supply device. The rotating nozzle includes a main flow channel adapted to communicate with the plasma system, a plasma outlet located at an end of the main flow channel, a mixing flow channel that penetrates through a side wall of the rotating nozzle and communicates with the main flow channel, an independent flow channel separated from the main flow channel, and a precursor independent outlet located at an end of the independent flow channel. The precursor supply device includes a fixed housing and a rotating bearing. The fixed housing is sleeved outside the rotating nozzle and includes a precursor inlet. The precursor inlet selectively communicates with either the mixing flow channel or the independent flow channel. The rotating bearing is disposed between the rotating nozzle and the fixed housing. When the precursor inlet is adjusted to communicate with the mixing flow channel, a precursor fluid is adapted to flow from the precursor inlet to the main flow channel through the mixing flow channel, mix with plasma flowing into the main flow channel, and flow out from the plasma outlet together with the plasma. When the precursor inlet is adjusted to communicate with the independent flow channel, the precursor fluid is adapted to flow from the precursor inlet to the independent flow channel, and flow out from the precursor independent outlet, and then mix with the plasma flowing out from the plasma outlet.
Based on the above, in the fluid introduction module for plasma system provided by the disclosure, the main flow channel of the rotating nozzle is adapted to communicate with the plasma system. The mixing flow channel of the rotating nozzle penetrates through the side wall of the rotating nozzle and communicates with the main flow channel, and the independent flow channel of the rotating nozzle is separated from the main flow channel. The fixed housing of the precursor supply device is sleeved outside the rotating nozzle through the rotating bearing, such that the fixed housing does not rotate along with the rotating nozzle. In addition, the precursor inlet of the fixed housing selectively communicates with either the mixing flow channel or the independent flow channel. Therefore, when the precursor inlet is adjusted to communicate with the mixing flow channel, the precursor fluid is adapted to flow from the precursor inlet to the main flow channel through the mixing flow channel, mix with the plasma flowing into the main flow channel, and flow out from the plasma outlet together with the plasma. Alternatively, when the precursor inlet is adjusted to communicate with the independent flow channel, the precursor fluid is adapted to flow from the precursor inlet to the independent flow channel, and flows out from the precursor independent outlet and then mixes with the plasma flowing out from the plasma outlet. Therefore, the fluid introduction module for plasma system provided by the disclosure may meet the different mixing needs of the plasma and the precursor fluid.
The accompanying drawings are included to provide a further understanding of the disclosure, and are incorporated in and constitute a part of this specification. The drawings illustrate embodiments of the disclosure and, together with the description, serve to explain the principles of the disclosure.
According to
Besides, the fluid introduction module for plasma system 100 further includes a rotating housing 140, and the rotating nozzle 110 is disposed under the rotating housing 140 and communicates with the rotating housing 140.
Refer to
When the voltage source provides a voltage to the inner electrode 12, the inner electrode 12, the rotating nozzle 110, and air in the plasma generating zone Z interact with one another to generate plasma F1. The plasma F1 may pass through the main flow channel 111 and flows out of the rotating nozzle 110 from the plasma outlet 112.
Referring to
To be specific, the precursor supply device 120 includes a fixed housing 121 and a rotating bearing 124. The fixed housing 121 includes a precursor inlet 123, and the precursor fluid F2 may enter the fluid introduction module for plasma system 100 from the precursor inlet 123. In other embodiments, a plurality of precursor inlets 123 may be provided, and the number of the precursor inlets 123 is not limited thereto.
The fixed housing 121 is sleeved outside the rotating nozzle 110, and the rotating bearing 124 is disposed between the rotating nozzle 110 and the fixed housing 121. In this embodiment, the rotating bearing 124 is, for example, a roller bearing, and in other embodiments, the rotating bearing may also be a ball bearing. The type of the rotating bearing 124 is not limited thereto.
The fixed housing 121 of the precursor supply device 120 is sleeved outside the rotating nozzle 110 through the rotating bearing 124, so that the fixed housing 121 does not rotate along with rotation of the rotating nozzle 110. Therefore, the precursor fluid F2 may be introduced into the rotating nozzle 110 through a channel 136 on the fixed housing 121.
As shown in
It should be noted that in this embodiment, the precursor supply device 120 further includes a blocking member 125, so that the precursor inlet 123 may selectively communicate with either the mixing flow channel 113 or the independent flow channel 115. For example, in this embodiment, the blocking member 125 is, for example, a set screw. The blocking member 125 includes an external thread, the mixing flow channel 113 includes a first internal thread corresponding to the external thread, and the independent flow channel 115 includes a second internal thread corresponding to the external thread.
As shown in
Therefore, when the precursor inlet 123 only communicates with the independent flow channel 115, the precursor fluid F2 is suitable to flow from the precursor inlet 123 to the independent flow channel 115. Further, after flowing out from the precursor independent outlet 117, the precursor fluid F2 is mixed with the plasma F1 flowing out of the plasma outlet 112. That is, the plasma F1 and the precursor fluid F2 are mixed outside the rotating nozzle 110 after flowing out from the plasma outlet 112 and the independent precursor outlet 117, respectively.
When the precursor inlet 123 is adjusted to only communicate with the mixing flow channel 113, the precursor fluid F2 is adapted to flow from the precursor inlet 123 to the main flow channel 111 (the plasma generating zone Z) through the mixing flow channel 113 to be mixed with the plasma F1 flowing into the main flow channel 111 and flows out from the plasma outlet 112 together with the plasma F1. In other words, the plasma F1 and the precursor fluid F2 flow out of the plasma outlet 112 after being mixed in the main flow channel 111 of the rotating nozzle 110.
It may be seen from the above that in the fluid introduction module for plasma system 100 provided by this embodiment, it may be determined whether the precursor inlet 123 communicates with the mixing flow channel 113 or the independent flow channel 115 through an arrangement position of the blocking member 125 to satisfy different mixing needs.
It should be noted that in other embodiments, the blocking member 125 may also be in a form of a plug and may be pluggably plugged in the mixing flow channel 113 or the independent flow channel 115. Certainly, the type of blocking member 125 is not limited thereto. Alternatively, in other embodiments, the channel 136 of the fixed housing 121 may also be provided with a switch or a valve to determine whether the precursor inlet 123 communicates with the mixing flow channel 113 or communicates with the independent flow channel 115. In addition, in an embodiment, arrangement of the blocking member 125 may be performed manually or automatically.
In an experiment, a 4-inch sapphire wafer is placed on a surface of a polishing rotating disk. A contact angle of the sapphire wafer measured at 10 points is 36.5±4 degrees before plasma treatment, and after plasma treatment with air (CDA), the contact angle of the sapphire wafer drops to 13 degrees to 15 degrees. Besides, the precursor fluid F2 containing water and the plasma F1 are introduced (as shown in
Referring to
To be specific, as shown in
In the embodiment, the first sealing ring 131 is sleeved outside the rotating nozzle 110. The first sealing ring 131 includes a first contact surface 132, and the first contact surface 132 contacts a first outer surface 118 of the rotating nozzle 110. The first contact surface 132 and the first outer surface 118 are, for example, two inclined surfaces with corresponding contours to increase an abutting area. In other embodiments, the first contact surface 132 and the first outer surface 118 may also be two stepped surfaces, for example.
The second sealing ring 133 is sleeved outside the positioning member 126. The second sealing ring 133 includes a second contact surface 134, and the second contact surface 134 contacts a second outer surface 127 of the positioning member 126. The second contact surface 134 and the second outer surface 127 are, for example, two inclined surfaces with corresponding contours to increase the abutting area. In other embodiments, the second contact surface 134 and the second outer surface 127 may also be two stepped surfaces, for example.
The two inner ribs 128 of the fixed housing 121 have at least one through hole 129. The sealing set 130 further includes at least one elastic member 135. The elastic member 135 passes through the through hole 129 and is located between the first sealing ring 131 and the second sealing ring 133 to push against the first sealing ring 131 and the second sealing ring 133. In this way, the first sealing ring 131 abuts against the rotating nozzle 110 and the fixed housing 121 closely, and the second sealing ring 133 abuts against the rotating nozzle 110 and the positioning member 126 closely.
In other words, the first sealing ring 131 is used to seal a gap between the rotating nozzle 110 (the moving part) and the fixed housing 121 (the fixed part). The second sealing ring 133 is used to seal a gap between the rotating nozzle 110 (the moving part) and the positioning member 126 (the fixed part) to prevent the plasma F1 or the precursor fluid F2 from overflowing into the gap between the rotating nozzle 110 (the moving part) and the fixed housing 121 (the fixed part) or overflowing into the gap between the rotating nozzle 110 (the moving part) and the positioning member 126 (the fixed part). In this embodiment, the first sealing ring 131 and the second sealing ring 133 are graphite friction sealing rings, but the materials of the first sealing ring 131 and the second sealing ring 133 are not limited thereto.
In addition, in this embodiment, since the fixed housing 121 is configured to be connected to an injection pipeline (not shown) of the precursor fluid F2, the fixed housing 121 cannot rotate along with the rotating nozzle 110. In order to avoid damage to the injection pipeline when the rotating bearing 124 does not function well and the fixed housing 121 thereby rotates along with the rotating nozzle 110, the fluid introduction module for plasma system 100 of the embodiment is further designed to include a safety switch 144.
To be specific,
In this embodiment, the safety switch 144 is, for example, electrically connected to the rotating nozzle 110 through a controller (not shown). When the safety switch 144 is triggered, the controller instructs the rotating nozzle 110 to stop rotating, for example, to power off a motor that rotates the rotating nozzle 110 to achieve a protection effect.
The failure of the rotating bearing may be caused by high heat generated during the operation of the plasma system 10, which causes the rotating bearing to expand and then to become stuck. Therefore, in other embodiments, the fluid introduction module for plasma system 100 may also sense a temperature of the rotating bearing through a temperature sensor (not shown) and provides temperature feedback to the controller, so as to power off the motor rotating the rotating nozzle 110. Alternatively, when it is sensed that the temperature of the rotating bearing rises to a specific value, a cooling system (not shown) is used to cool down the fluid introduction module for plasma system 100 to prevent the rotating bearing from expanding and becoming stuck.
In view of the foregoing, in the fluid introduction module for plasma system provided by the disclosure, the main flow channel of the rotating nozzle of is adapted to communicate with the plasma system. The mixing flow channel of the rotating nozzle penetrates through the side wall of the rotating nozzle and communicates with the main flow channel, and the independent flow channel of the rotating nozzle is separated from the main flow channel. The fixed housing of the precursor supply device is sleeved outside the rotating nozzle through the rotating bearing, so that the fixed housing does not rotate along with the rotating nozzle. In addition, the precursor inlet of the fixed housing selectively communicates with either the mixing flow channel or the independent flow channel. Therefore, when the precursor inlet is adjusted to communicate with the mixing flow channel, the precursor fluid is adapted to flow from the precursor inlet to the main flow channel through the mixing flow channel, is mixed with the plasma flowing into the main flow channel, and flows out from the plasma outlet together with the plasma. Alternatively, when the precursor inlet is adjusted to communicate with the independent flow channel, the precursor fluid is adapted to flow from the precursor inlet to the independent flow channel, flows out from the precursor independent outlet, and then is mixed with the plasma flowing out from the plasma outlet. Therefore, through the fluid introduction module for plasma system provided by the disclosure, different mixing needs of the plasma and the precursor fluid may be satisfied.
It will be apparent to those skilled in the art that various modifications and variations can be made to the disclosed embodiments without departing from the scope or spirit of the disclosure. In view of the foregoing, it is intended that the disclosure covers modifications and variations provided that they fall within the scope of the following claims and their equivalents.
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