Claims
- 1. A centrifugal vortex system for vaporizing a fluid, comprising:a fluid flow path having a high pressure end and a low pressure end; a vortex housing defining a vortex chamber through which a fluid flow is directed, the vortex chamber being positioned along the fluid flow path and interposed between the high pressure end and the lower pressure end to permit a fluid to flow from the high pressure end to the low pressure end; a plurality of input apertures formed in the vortex housing to allow the input of fluid tangentially into the vortex chamber for vaporizing the fluid; wherein the apertures are located at different distances relative to the low pressure end; a pressure differential supply associated with the input apertures to allow a differential pressure of fluid at the input apertures according to the location of the apertures relative to the low pressure end; an ambient air supply coupled to the vortex chamber.
- 2. A vortex system for vaporizing a fluid according to claim 1 wherein the plurality of input apertures are arranged in a plurality of rows and a plurality of columns.
- 3. A vortex system for vaporizing a fluid according to claim 1 wherein the pressure differential supply comprises a jacket.
- 4. A vortex system for vaporizing a fluid according to claim 1 wherein the pressure differential supply comprises a jacket having an increasing diameter inner surface.
- 5. A vortex system for vaporizing a fluid according to claim 1 wherein the pressure differential supply comprises a jacket having a tapered inner surface.
- 6. A vortex system for vaporizing a fluid according to claim 1 wherein the pressure differential supply comprises a jacket having an inner surface, the jacket inner surface defining a variable width gap between the jacket inner surface and a vortex housing exterior surface.
- 7. A vortex system for vaporizing a fluid according to claim 1 wherein the pressure differential supply comprises a jacket having a variable diameter inner surface, the inner surface having a maximum diameter end and a minimum diameter end;wherein the minimum diameter end is positioned adjacent to an aperture closer to the low pressure end to reduce a tendency of the aperture closer to the low pressure end to receive more flow than an aperture located farther from the low pressure end.
CONTINUITY
This is a continuation of U.S. patent application Ser. No. 09/532,171, filed Mar. 20, 2000, now U.S. Pat. No. 6,347,789 which is a divisional of U.S. patent application Ser. No. 09/040,666, filed Mar. 18, 1998, now U.S. Pat. No. 6,113,078.
US Referenced Citations (38)
Foreign Referenced Citations (9)
Number |
Date |
Country |
1108666 |
Jun 1961 |
DE |
35 11 094 |
Oct 1986 |
DE |
G94 02 811.7 |
Jul 1994 |
DE |
44 27 466 |
Feb 1996 |
DE |
746984 |
Jun 1933 |
FR |
1156341 |
May 1958 |
FR |
2 296 037 |
Jun 1996 |
GB |
1357032 |
Dec 1987 |
SU |
WO 8503741 |
Aug 1985 |
WO |
Continuations (1)
|
Number |
Date |
Country |
Parent |
09/532171 |
Mar 2000 |
US |
Child |
10/078731 |
|
US |