Claims
- 1. A contact lens formed from polymerization of a monomeric mixture of bis(1,1,1,3,3,3-hexafluoro-2-propyl) itaconate, bis(methacryloxypropyl)1,1,3,3-tetrakis (trimethyl siloxy) disiloxane, tris(trimethylsiloxy) silylpropyl methacrylate, n-vinyl pryyolidone, methacrylic acid and a cross linking agent.
- 2. A contact lens in accordance with claim 1, wherein said cross linking agent is tetraethylene glycol dimethacrylate.
- 3. A contact lens formed from polymerization of a monomeric mixture of bis(1,1,1,3,3,3-hexafluoro-2-propyl) itaconate, bis(methacryloxypropyl)1,1,3,3-tetrakis (trimethyl siloxy) disiloxane, tris(trimethylsiloxy) silylpropyl methacrylate, n-vinyl pyrrolidone, a cross linking agent, and a material selected from the class consisting of methylmethacrylate, methacrylic acid and mixture thereof.
- 4. A contact lens formed from polymerization of a monomeric mixture of bis(1,1,1,3,3,3-hexafluoro-2-propyl) itaconate, bis(methacryloxypropyl)1,1,3,3-tetrakis (trimethyl siloxy) disiloxane, tris(trimethylsiloxy) silylpropyl methacrylate, methylmethacrylate, methacrylic acid and a cross linking agent.
- 5. A contact lens in accordance with claim 4 wherein tetraethylene glycol dimethacrylate is said cross linking agent.
- 6. A contact lens in accordance with claim 4 and further comprising a neutral nomomer to increase hydrophilic properties.
- 7. An oxygen permeable dimensionally stable hydrophilic, contact lens of high transparency, comprising a polymer formed by free radical polymerization from
- (A) 5 to 60% by weight of a fluorine containing itaconate mono or diester having the structure: ##STR3## wherein: Z.sub.1 and Z.sub.2 can be the same or different and are each of a group selected from among the following with at least one of Z.sub.1 or Z.sub.2 containing fluorine:
- Hydrogen,
- straight chain alkyl groups or fluoro substituted alkyl groups containing from 1 to 18 carbon atoms,
- branched chain alkyl groups or fluoro substituted alkyl groups containing from 4 to 18 carbon atoms
- cyclic alkyl groups or fluoro substituted cyclic alkyl groups containing from 5 to 18 carbon atoms,
- phenyl groups and fluoro substituted phenyl groups, or
- benzyl and fluoro substituted benzyl groups, phenethyl and fluoro substituted phenethyl groups,
- ethers and polyethers of the general structure
- (C.sub.x P.sub.2x O).sub.e --(C.sub.y P.sub.2y+1)
- WHEREIN:
- "P" is hydrogen or fluorine
- "x" is an integer from 1 to 4
- "y" is an integer from 1 to 10
- "e" is an integer from 1 to 10,
- (B) from up to 95% by weight of at least one ethylenically unsaturated organosiloxane having the following formula: ##EQU6## WHEREIN: "X" is an ethylenically unsaturated group selected from the group consisting of vinyl, acryloxy, methacryloxy, vinyloxy, and carbovinyloxy,
- "Y" represents no group or is selected from the group consisting of a divalent alkane radical having from 1 to 10 carbon atoms, a divalent alkane radical having 2 to 10 carbon atoms, and a phenylene radical,
- "a" is an integer from 1 to 10,
- "n" is an integer from 2 to 30,
- "b" is an integer from 0 to 3 and may be the same or different within each "i" moiety,
- "R" is selected from the class consisting of hydrogen, hydroxy, alkoxy, carboalkoxy, alkyl and substituted alkyl groups containing from 1 to 20 carbon atoms, cyclic alkyl or substituted cyclic alkyl groups containing from 5 to 10 carbon atoms, phenyl and substituted phenyl groups, benzyl and substituted benzyl groups and phenethyl and substituted phenethyl groups, "R" and "b" may be the same or different within each "i" moiety,
- (C) 0 to 55% by weight of the entire composition of a vinyl monomer hardness modifying agent,
- (D) 0 to 55% by weight of the entire composition of a hydrophilic organic monomer,
- (E) 0 to 20% by weight of the entire composition of a non-siloxane containing cross-linking monomer.
RELATED APPLICATIONS
This application is a continuation of application Ser. No. 07/270,796, filed Nov. 10, 1988, now abandoned, which is a continuation of application Ser. No. 06/046,132, filed May 4, 1987, now abandoned, which is a continuation of U.S. Pat. No. 4,686,267, issued Aug. 11, 1987.
US Referenced Citations (10)
Foreign Referenced Citations (8)
Number |
Date |
Country |
0109355 |
May 1984 |
EPX |
0176481 |
Apr 1986 |
EPX |
59-102914 |
Jun 1984 |
JPX |
59-174177 |
Aug 1984 |
JPX |
59-185310 |
Oct 1984 |
JPX |
60-210899 |
Oct 1985 |
JPX |
61-57612 |
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JPX |
2137635A |
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GBX |
Continuations (3)
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Number |
Date |
Country |
Parent |
270796 |
Nov 1988 |
|
Parent |
46132 |
May 1987 |
|
Parent |
786846 |
Oct 1985 |
|