Embodiments of the present invention relate to fluxonic devices. In particular, some embodiments, relate to fluxon generation or combination.
Fluxons are conventionally generated by applying a strong magnetic field to a Josephson transmission line. When a driving electric current is applied, a flow of fluxons is realized. However, such a system has significant drawbacks. It is very sensitive to electric current fluctuations and external noise. In addition, the strong magnetic fields used affect adjacent equipment.
According to one embodiment of the invention there is provided a fluxonic device comprising: a closed loop transmission line; an additional transmission line; and a junction at which the closed loop transmission line and the additional transmission line meet.
Such a device enables the generation and use of fluxons without the need for strong magnetic fields and with reduced sensitivity to noise.
According to another embodiment of the invention there is provided an apparatus comprising: a fluxon container for containing one or more fluxons; a fluxon interface along which a fluxon can propagate; a junction where the fluxon container and fluxon interface meet; and a controller for controlling a fluxon at the junction.
A fluxon container is a structure that is arranged to contain fluxons permanently or temporarily. An example of a fluxon container is a long Josephson junction formed as a closed loop.
A fluxon interface is an input interface for fluxons via which a fluxon is provided to the fluxon or an output interface for fluxons via which a fluxon is provided from the container. The fluxon interface typically comprises a transmission line for propagating fluxons.
The junction is where the fluxon container and fluxon interface meet. The angle at which the fluxon interface and fluxon container meet may affect the characteristics of the apparatus.
The controller may control the energy of a fluxon as it approaches the junction.
Such an apparatus enables the generation and use of flow of fluxons without the need for strong magnetic fields and with reduced sensitivity to noise.
For a better understanding of the present invention reference will now be made by way of example only to the accompanying drawings in which:
The first superconducting layer 2 has a width W (into the page) and extends in a first plane (perpendicular to the plane of the page). The second superconducting layer 6 has a width W (into the page) and extends in a second plane parallel to first plane. The insulating film 4 has a width W (into the page) and extends in a third plane parallel to and positioned between the first and third planes.
The superconducting layers 2, 6 may for example be formed from niobium or high temperature superconductors (HTSC). In the case of HTSC, the device can be implemented either as a stack containing multiple layers or a single layer.
The insulating film 4 is typically oxide in case of fabricated Josephson junctions or is naturally formed between intrinsic layers of high temperature superconductors (HTSC). Typically a few nm thick.
A fluxon 12 propagates freely parallel to the third plane. It is positioned across the contact interfaces between the first superconducting layer 2 and the insulating film 4 and between the second superconducting layer 6 and the insulating film 4. A fluxon 12 is a Josephson vortex. It is a self-generating circulating superconducting current IF with an associated magnetic flux quantum. A fluxon 12 corresponds to a 2π kink of the quantum phase difference between the two superconducting layers 2,6.
If a net electrical current IA 14 is applied across the long Josephson junction 10, it causes the fluxon 12 to move with a net velocity 16. The greater the net applied electric current IA the greater the net velocity of the fluxon (until a relativistic limit).
The long Josephson junction is therefore able to operate as a Josephson transmission line (JTL) along which a fluxon 12 can propagate.
The energy of a fluxon within a JTL increases with fluxon velocity (increases with increasing applied electric current) and the relativistic mass of the fluxon (increases with increasing width W of the JTL).
A first sheet 20 of superconducting material overlies at least a portion of a second sheet 26 of superconducting material and is separated therefrom by a thin insulating film 4 (not illustrated in
The first sheet 20 of superconducting material forms the first superconducting layer 2 of the closed loop JTL structure 30. The first sheet 20 has a curved extremity 21 that is used to define an outer edge of the closed loop JTL structure 30. The first sheet 20 comprises a hole 24. The hole 24 has a curved inner edge 22 that is used to define an inner edge of the closed loop JTL structure 30.
The second sheet 26 of superconducting material forms the second superconducting layer 6 of the closed loop JTL structure 30. The second sheet 26 has a curved extremity 27 that is used to define an outer edge of the closed loop JTL structure 30. The second sheet 26 comprises a hole 24. The hole 24 has a curved inner edge 22 that is used to define an inner edge of the closed loop JTL structure 30.
In the example illustrated, the overlap region is an annulus defined by an inner radius R1 and an outer radius R2. The outer radius is defined by the radius of curvature of the curved extremities 21, 27. The inner radius is defined by the shared hole 24 and the radius of curvature of the hole's inner edge 22.
A closed loop continuous JTL structure 30 may be used in the fluxonic devices illustrated in
The closed loop structure is continuous in that as one traverses the loop one travels along the Josephson junction and not through multiple Josephson junctions.
The fluxonic devices comprise a closed loop JTL structure 30 which operates as a fluxon container/trap containing at least one fluxon 12. An additional JTL 32, meets, at junction region 34, with the closed loop JTL structure 30 in the same planes as the closed loop JTL structure 30. The respective first superconducting layer 2, insulating film 4 and second superconducting layer 6 of the closed loop JTL structure 30 and the additional JTL 32 are aligned.
The additional JTL 32 operates in an output fluxon generator implementation as a fluxon output that propagates fluxons from the closed loop JTL structure 30.
The additional JTL 32 operates in a fluxon input generator implementation as a fluxon input providing fluxons to the closed loop JTL structure 30 for containment.
The angle of attack of the additional JTL 32 to the closed loop JTL structure 30 at junction 34 may be varied. In
The controlled creation of fluxons at the junction of two straight JTLs is described in ‘Flux Cloning in Josephson Transmission Lines’, Phys Rev Lett, 017004-1 to 4, Gulevich and Kusmartsev.
The process of creating a new ‘baby’ fluxon 13 at a junction 34 depends upon the kinetic energy of the original ‘mother’ fluxon 12. If a fluxon 12 is moving very slowly, it does not have enough kinetic energy to give birth to a new fluxon 13. Then the junction 34 acts as a barrier and the fluxon 12 is just reflected from it. However, if the fluxon 12 has enough energy to overcome the barrier, that fluxon 12 acts as a mother and a new fluxon 13 is born in the additional JTL.
The container/trap 42 will typically be a closed loop JTL structure 30. The output 48 is typically an additional JTL 32 joined to the closed loop JTL structure 30 at a junction 34. The fluxon controller 44 controls the electric current passing across the long Josephson junction of the closed loop JTL structure 30.
The use of a closed loop JTL structure 30 as a container for a fluxon, enables a driving electric current 14 to be applied increasing the velocity of the fluxon and its kinetic energy. When the energy of the fluxon exceeds a threshold output fluxon generation occurs at the junction 34 (see
The generated fluxon 13 moves along the additional JTL 32, while the “mother” fluxon 12 continues its rotation in the closed loop JTL structure 30. Then the cycle repeats.
Thus a train of baby fluxons 13 can be created—a flow of fluxons (fluxon current) 45. The number of fluxons created per second depends upon the speed of the trapped fluxon, which depends upon the applied electrical driving current and the width of the JTL forming the closed loop JTL structure 30.
No external magnetic field is needed to generate a flow of fluxons (fluxon current).
There is an energy barrier associated with the T junction 34 (
where γ=j/jc, j is a density of the driving current and jc is the critical current density, W0 is the width of the closed loop JTL structure 30 and W is the width of the additional JTL 32.
The T-junction fluxon generator may generate either fluxons or antifluxons depending on the direction of the applied current. This symmetry is reflected in its I-V characteristic (
A σ-fluxonic device (
Let the width of the closed loop TJL structure 30 grow linearly along its circumference,
with R=Ri+ΔR and fixed internal radius of the ring Ri. x is a coordinate along circumference of the ring. In 1D approximation the potential energy of the trapped fluxon is given by the integral
where L=2πR. Here and further we work with normalized units with coordinates and distances normalized to the Josephson penetration length λ, velocity normalized to the Swihart velocity c time scaled by ωp−1 where ωp is the plasma frequency, the energy normalized to
jcλj2Φ0/2π
where
Φ0=h/2e
standing for the unitary flux quantum and jc for the critical current density.
In case of boundary conditions
with constant magnetic field component induced by the driving current and parallel to the boundary of the Josephson junction. Assuming the width W(x) is a slowly varying function of x and substituting soliton solution
φ(x,t)=4 arctan exp(x−x0)
describing a resting fluxon to (9) we obtain the effective potential energy
V(x0)=8W(x0)−γ(ΔR+W/2)2πx0
Thus, the threshold value of the driving current required to activate the fluxon generation process is:
The σ-fluxonic device can only generate output fluxons. The asymmetry of the σ is reflected in its I-V characteristic (
The fluxon container will typically be a closed loop JTL structure 30. The input 49 is typically an additional JTL 32 joined to the closed loop JTL structure 30. The fluxon controller may for example control the flow of fluxons (fluxon current) 46 along the additional JTL by controlling the net electrical current 14 applied across the additional JTL 32. Controlling this net electrical current controls the speed of the fluxons.
The input fluxon trap may be operated as a input fluxon generator 40 as illustrated in
A flow of fluxons (fluxon current) 46 is created by a current pulse at the end of the additional JTL 32 and then moves towards the junction 34 with closed loop JTL structure 30.
A fluxon 12 in the flow of fluxons (fluxon current) 46 propagates in the additional JTL 49 towards the junction 34. For velocities of the incident fluxon greater than a threshold T, the fluxon 12 passes through the junction 34 without reflection and splits into two solutions—a fluxon and an antifluxon which have opposite polarity. The junction 34 has a Y shape with a sharp edge 41 directed towards an arriving fluxon 12. This sharp edge reduces the energy threshold required for fluxon and antifluxon pair creation.
A dashed arrow in
In order to trap the pair of fluxon/antifluxon in the closed loop JTL structure 30 some minimal damping is needed. In this case (illustrated in
In order to create a trapping potential for a fluxon-antifluxon pair and a breather, the closed loop JTL structure 30 may be made thinner on the side 47 opposite to the junction 34. The fluxon and antifluxon move in opposite directions on the closed loop JTL structure 30 and collide at the narrowest point 47 of the closed loop JTL structure 30. At the point 47 the fluxon and the antifluxon 12A, 12B have the maximal kinetic energy as well as the strongest dissipation of energy.
In
W(x)≅ΔR+d cos(x/R),
where ΔR=Re−Ri is the average width, R=(Re+Ri)/2 is the average radius and 0<x<L.
It can be shown that the theoretical critical initial fluxon velocity, below which the incident fluxon should be traveling, for breather formation is:
where W0 is width of the additional JTL
E
0=8W0/√{square root over (1−u02)}
The fluxon controller 44 may be used to make sure the incident fluxon propagating along the additional JTL 32 is below this critical velocity.
The fluxonic devices illustrated in
In a case of zero or low damping (illustrated in
A closed loop JTL structure 30 may be used in the fluxonic devices illustrated in
An output fluxon generator 38 may be used to generate THz radiation. In the examples of
A fluxon trap may be operated as an input fluxon generator to generate THz radiation. An oscillating breather may emit in the THz region.
A fluxonic device that generates THz radiation may be incorporated into a remote sensing device 60, as illustrated in
A fluxon arriving via the input 32A is converted to a fluxon and antifluxon pair as described in relation to
A fluxon generator may also be used as a detector for a magnetic field. The fluxon generator may be operated on one side (just below/just above) its operational threshold. The application of a magnetic field alters the fluxon energy and changes the state of operation of the fluxonic device to the other side of the operational threshold (just above/just below). The fluxonic device therefore acts as a two-state bi-stable device that is switched by an applied magnetic field.
The fluxon entangler 80 is very similar to the fluxon interferometer 70, but the operation and purpose of this device is different. It is designed for quantum fluxons. Therefore, the width of the input JTL 32A is much smaller than the Josephson penetration depth.
The fluxonic device 90 comprises a closed loop JTL structure 30. It also comprises a first additional JTL 32A and a second additional JTL 32B at opposing sides of the closed loop structure 30 which operate as a fluxon input and fluxon output. Between the first and second additional JTLs there is placed a microshort impurity 92.
A fluxon 12A is trapped within the closed loop structure 30. The position of the trapped fluxon within the closed loop structure 30 is controlled by an applied magnetic field.
The Fig includes a co-ordinate system 15 which defines three orthogonal vertices (x,y,z). The fluxon transmission line 10 has a length in the x-direction, a width in the y-direction and a depth in the z-direction.
A mechanism (not illustrated) applies a driving electric current 14 that causes the fluxon 12 to move with a net velocity 16 in the length-wise direction (+x).
The fluxon transmission line 10 illustrated in
The perturbation region 3 is used to transform energy of a fluxon. As a fluxon moves from an upstream area 5A that is upstream of the perturbation region 3, a portion of its kinetic energy is converted into potential energy. Then as the fluxon moves from the perturbation region 3 to a downstream area 5B, some or all of the potential energy is converted into elastic energy. The perturbation causes the fluxon in the downstream area 5B to vibrate and radiate electromagnetic (EM) waves.
The applied magnetic field B may be used to maintain coherence in the EM radiation as it constrains the direction of vibration of the fluxons 12.
The perturbation region 3 is a region in which one or more characteristics of the fluxon transmission line 10 are different to the upstream and downstream regions 5A, 5B. As the perturbation region 3 is traversed by a fluxon 12 moving in the length-wise direction (+x) its kinetic energy is changed.
The perturbation region 3 may increase (compared to the upstream and downstream regions 5A,5B) a superconducting critical current for the fluxon transmission line 10.
The perturbation region 3 may have a different width W2 compared to the widths of the fluxon transmission line 10 in the upstream and downstream regions 5A, 5B.
The perturbation region 3 may have a different composition compared to the upstream and downstream regions 5A, 5B of the fluxon transmission line 10. For example, the perturbation region 3 may be doped with one or more impurities, the region 3 may have a different type of thickness of insulating film 4 and/or first superconducting layer 2 and/or second superconducting layer 6.
The size of the perturbation region 3 in the length-wise direction may be shorter than a Josephson length.
The frequency of the EM radiation emitted by the downstream region 5B of the fluxon transmission line 10 may be controlled by the width of the downstream region 5B.
The intensity of the EM radiation emitted by the downstream region 5B of the fluxon transmission line 10 may be controlled by controlling the amplitude of the driving electric current.
Fluxon transmission lines with perturbations, such as for example those described above, may be used in a remote sensing device such as that illustrated in
Although embodiments of the present invention have been described in the preceding paragraphs with reference to various examples, it should be appreciated that modifications to the examples given can be made without departing from the scope of the invention as claimed.
Whilst endeavoring in the foregoing specification to draw attention to those features of the invention believed to be of particular importance it should be understood that the Applicant claims protection in respect of any patentable feature or combination of features hereinbefore referred to and/or shown in the drawings whether or not particular emphasis has been placed thereon.
Number | Date | Country | Kind |
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0622211.1 | Nov 2006 | GB | national |
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/GB2007/004261 | 11/8/2007 | WO | 00 | 12/14/2009 |