This application claims priority under 35 U.S.C. § 119 to Korean Patent Application No. 10-2023-0017422, filed on Feb. 9, 2023, the content of which in its entirety is herein incorporated by reference.
The present disclosure relates to a display device and more specifically, to a foldable display device and a manufacturing method of the foldable display device.
Recently, a flexible display device that can be deformed into various shapes has been developed. Unlike a conventional flat panel display, a flexible display device can be folded, bent, or rolled like paper. The flexible display device is convenient and easy to carry.
Recently, among flexible display devices, a foldable display device is in the limelight. The foldable display device can be repeatedly folded and unfolded to a noticeable degree without cracking or otherwise sustaining damage. The foldable display may include an impact buffer to increase impact resistance of the foldable display. Such an impact buffer may be provided in a form of a film.
A display device, according to an embodiment of the present disclosure, includes a display panel including a first non-folding area, a second non-folding area, and a folding area disposed between the first non-folding area and the second non-folding area. A buffer is disposed on the display panel and has a thickness decreasing from a central portion thereof toward an edge thereof overlapping the display panel. A cover window is disposed on the buffer.
In an embodiment, the buffer may directly contact the display panel.
In an embodiment, the buffer may include a curable resin.
In an embodiment, the buffer may include a urethane acrylate-based resin.
In an embodiment, the buffer may further include 2-propenoic acid, (5-ethyl-1,3-dioxin-5-yl) methyl ester.
In an embodiment, a modulus of the buffer may be in a range of about 65 Mpa to about 150 Mpa.
In an embodiment, a thickness of the central portion of the buffer may be in a range of about 25 micrometers to about 100 micrometers.
In an embodiment, the display panel may include a circuit element layer including at least one transistor, a light emitting element layer including at least one light emitting diode and disposed on the circuit element layer, and an encapsulation layer disposed on the light emitting element layer.
In an embodiment, the buffer may directly contact the encapsulation layer.
In an embodiment, the display panel may further include a functional layer disposed on the encapsulation layer.
In an embodiment, the buffer may directly contact the functional layer.
In an embodiment, the display device may further include an adhesive layer disposed on the buffer, disposed under the cover window, and having a thickness decreasing from a central portion thereof toward an edge thereof overlapping the display panel.
In an embodiment, the adhesive layer may directly contact each of the buffer and the cover window.
In an embodiment, the adhesive layer may include a curable resin.
In an embodiment, a thickness of the central portion of the adhesive layer may be in a range of about 35 micrometers to about 100 micrometers.
In an embodiment, each of the adhesive layer and the buffer may have a viscosity of greater than 0 cP and less than about 50 cP at room temperature.
In an embodiment, the display device may further include an adhesive layer disposed on the display panel, disposed under the buffer, and having a thickness decreasing from a central portion thereof toward an edge thereof overlapping the display panel.
In an embodiment, the adhesive layer may directly contact each of the display panel and the buffer.
In an embodiment, the buffer may directly contact each of the adhesive layer and the cover window.
A method of manufacturing a display device according to an embodiment of the present disclosure includes forming a display panel including a first non-folding area, a second non-folding area, and a folding area disposed between the first non-folding area and the second non-folding area. A buffer having a thickness decreasing from a central portion thereof toward an edge thereof overlapping the display panel is formed on the display panel. A cover window is formed on the buffer.
In an embodiment, the buffer may be formed through an inkjet process.
In an embodiment, the forming the buffer may include forming a first uncured resin layer on the display panel by the inkjet process and curing the first uncured resin layer to form the buffer.
In an embodiment, the buffer may be formed of a urethane acrylate-based resin.
In an embodiment, the buffer may be formed of a resin containing 2-propenoic acid, (5-ethyl-1,3-dioxin-5-yl) methyl ester.
In an embodiment, the method may further include forming an adhesive layer having a thickness decreasing from a central portion thereof toward an edge thereof overlapping the display panel, on the buffer.
In an embodiment, the adhesive layer may be formed by an inkjet process.
In an embodiment, the forming the adhesive layer may include forming a second uncured resin layer on the buffer by the inkjet process and curing the second uncured resin layer to form the adhesive layer.
In an embodiment, the method may further include forming an adhesive layer having a thickness decreasing from a central portion thereof toward an edge thereof overlapping the display panel, on the display panel.
In an embodiment, the forming the adhesive layer may include forming a second uncured resin layer on the display panel by the inkjet process and curing the second uncured resin layer to form the adhesive layer.
A more complete appreciation of the present disclosure and many of the attendant aspects thereof will be readily obtained as the same becomes better understood by reference to the following detailed description when considered in connection with the accompanying drawings, wherein:
The invention will now be described more fully hereinafter with reference to the accompanying drawings, in which various embodiments are shown. This invention may, however, be embodied in many different forms, and should not necessarily be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. Like reference numerals may refer to like elements throughout the specification and figures.
Referring to
The display device 10 may have a stacked structure. For example, the display device 10 may include several layers having different functions all stacked upon each other. Each of the various layers may be flexible, and thus the display device 10 may be flexible.
The display device 10 may include a first non-folding area NFA1, a second non-folding area NFA2, and a folding area FA disposed between the first non-folding area NFA1 and the second non-folding area NFA2.
The display device 10 might not be folded in the first and second non-folding areas NFA1 and NFA2. The display device 10 may have a flat surface in the first and second non-folding areas NFA1 and NFA2.
The display device 10 may be folded and unfolded in the folding area FA. The display device 10 may be folded (e.g., a folded state in
However, embodiments according to the present invention are not necessarily limited thereto, and in an embodiment, the display device 10 may further include a third non-folding part adjacent to the second non-folding area NFA2. In addition, the display device 10 may further include a folding area disposed between the second non-folding area NFA2 and the third non-folding part. Also, in an embodiment, a width of the folding area FA may be relatively large. Therefore, the display device 10 may slide in the folding area FA, and thus an area of the display surface 101 may be adjusted.
Referring to
The support SM may support the display panel PNL and may emit or disperse heat generated from the display panel PNL. Also, the support SM may prevent foreign matter from being introduced into the display panel PNL from outside the display device.
An opening OP overlapping the folding area FA may be defined in the support SM. The filling FM may overlap the folding area FA and fill the opening OP. However, the present invention is not necessarily limited thereto.
The display panel PNL may be disposed on the support SM. The display panel PNL may include a plurality of pixels, and the image may be generated by combining light emitted from each of the pixels.
In an embodiment, the buffer CM may be disposed on the display panel PNL. The buffer CM may directly contact the display panel PNL and may be attached on the display panel PNL.
In an embodiment, the adhesive layer AL may be disposed on the buffer CM. The adhesive layer AL may directly contact each of the buffer CM and the cover window CW. For example, the adhesive layer AL may bond the buffer CM and the cover window CW.
The cover window CW may be disposed on the adhesive layer AL. The cover window CW may protect the display panel PNL. The cover window CW may be formed of a transparent material. The cover window CW may be bonded to the display panel PNL through the adhesive layer AL.
For example, the cover window CW may include ultra-thin tempered glass. The ultra-thin tempered glass may be strengthened to have a predetermined stress profile. The ultra-thin tempered glass, which has been strengthened, may be more resistant to crack generation, propagation of cracks, damage, or the like due to external impact than before tempering. The ultra-thin tempered glass strengthened through a strengthening process may have various stresses for each region.
When the glass is formed of an ultra-thin film or a thin film, the glass may be flexible and may have a property that can be bent, folded, or rolled. The ultra-thin tempered glass of the cover window CW may be thin glass that is chemically strengthened to have high strength. However, the present invention is not necessarily limited thereto, and the ultra-thin tempered glass of the cover window CW may be a thermally strengthened thin film glass.
The protective film PL may be disposed on the cover window CW. The protective film PL may perform scattering of the cover window CW, shock absorption, stamping prevention, fingerprint prevention, and/or glare prevention. The protective film PL may include a transparent polymer film. The transparent polymer film may include epoxy resin, polyurethane, polyester, polyethylene terephthalate, polyethylene naphthalate, polyimide, polyarylate, polycarbonate, polymethyl methacrylate, ethyl vinyl acetate, polyamide resin, and/or the like.
Referring to
The circuit element layer 210 may be disposed on the substrate SUB, and include a buffer layer BFR, at least one transistor TR, a connection electrode CP, a first insulating layer IL1, a second insulating layer IL2, a third insulating layer IL3, and a fourth insulating layer IL4. The transistor TR may include an active layer ACT, a gate electrode GE, a source electrode SE, and a drain electrode DE. The light emitting element layer 220 may be disposed on the circuit element layer 210 and include a fifth insulating layer IL5, a spacer SPC, and at least one light emitting diode LD. The light emitting diode LD may include a first electrode E1, a light emitting layer LEL, and a second electrode E2.
The substrate SUB may be an insulating substrate formed of a transparent material. The substrate SUB may include glass and/or plastic.
The buffer layer BFR may be disposed on the substrate SUB. The buffer layer BFR may prevent diffusion of metal atoms or impurities from the substrate SUB into the active layer ACT.
The active layer ACT may be disposed on the buffer layer BFR. The active layer ACT may be divided into a source region and a drain region doped with impurities and a channel region between the source region and the drain region.
The first insulating layer IL1 may be disposed on the buffer layer BFR. The first insulating layer IL1 may cover the active layer ACT and may have substantially a same thickness along a profile of the active layer ACT. However, the present invention is not necessarily limited thereto. For example, the first insulating layer IL1 may include an inorganic material.
The gate electrode GE may be disposed on the first insulating layer IL1. In an embodiment, the gate electrode GE may overlap the channel region of the active layer ACT.
The second insulating layer IL2 may be disposed on the first insulating layer IL1. In addition, the second insulating layer IL2 may cover the gate electrode GE and may be disposed with substantially a same thickness along a profile of the gate electrode GE. However, the present invention is not necessarily limited thereto. For example, the second insulating layer IL2 may include an inorganic material.
The source electrode SE and the drain electrode DE may be disposed on the second insulating layer IL2. The source electrode SE may contact the source region of the active layer ACT through a first contact hole formed in the first and second insulating layers IL1 and IL2. The drain electrode DE may contact the drain region of the active layer ACT through a second contact hole formed in the first and second insulating layers IL1 and IL2.
The third insulating layer IL3 may be disposed on the second insulating layer IL2. In addition, the third insulating layer IL3 may cover the source and drain electrodes SE and DE, and have a substantially flat upper surface without creating a step around the source and drain electrodes SE and DE. For example, the third insulating layer IL3 may include an organic material.
The connection electrode CP may be disposed on the third insulating layer IL3. The connection electrode CP may contact the source electrode SE or the drain electrode DE through a third contact hole formed in the third insulating layer IL3.
The fourth insulating layer IL4 may be disposed on the third insulating layer IL3. In addition, the fourth insulating layer IL4 may cover the connection electrode CP and may have a substantially flat upper surface without creating a step around the source and drain electrodes SE and DE. For example, the fourth insulating layer IL4 may include an organic material.
The first electrode E1 may be disposed on the fourth insulating layer IL4. The first electrode E1 may have reflective or light-transmitting properties. For example, the first electrode E1 may include metal.
The first electrode E1 may contact the connection electrode CP through a fourth contact hole formed in the fourth insulating layer IL4. Through this, the first electrode E1 may be connected to the transistor TR.
The fifth insulating layer IL5 may be disposed on the fourth insulating layer IL4, and an opening exposing an upper surface of the first electrode E1 may be defined in the fifth insulating layer IL5. For example, the fifth insulating layer IL5 may include an organic material or an inorganic material.
The spacer SPC may be disposed on the fifth insulating layer IL5. For example, the spacer SPC may include an organic material or an inorganic material. The spacer SPC may maintain a gap between the encapsulation layer 300 and the substrate SUB.
The spacer SPC may include a material that is different from a material of the fifth insulating layer IL5. The spacer SPC may be formed after the fifth insulating layer IL5 is formed. However, embodiments according to the present invention are not necessarily limited thereto, and the spacer SPC may include a same material as a material of the fifth insulating layer IL5. For example, the fifth insulating layer IL5 and the spacer SPC may include an organic material such as polyimide. Also, the fifth insulating layer IL5 and the spacer SPC may be simultaneously formed using a halftone mask.
The light emitting layer LEL may be disposed on the first electrode E1. The light emitting layer LEL may be disposed in the opening formed in the fifth insulating layer IL5. In an embodiment, the light emitting layer LEL may have a multilayer structure including a hole injection layer, a hole transport layer, an organic light emitting layer, an electron transport layer, and an electron injection layer. The organic light emitting layer may include a light emitting material.
The second electrode E2 may cover the light emitting layer LEL and may be disposed on the fifth insulating layer IL5 and the spacer SPC. In an embodiment, the second electrode E2 may have a plate shape. In addition, the second electrode E2 may have light transmitting or reflecting properties. For example, the second electrode E2 may include metal.
The encapsulation layer 300 may be disposed on the light emitting element layer 220. The encapsulation layer 300 may prevent moisture and oxygen from penetrating into the light emitting diode LD from the outside the display device. For example, the encapsulation layer 300 may include a first inorganic encapsulation layer IEL1, an organic encapsulation layer OEL, and a second inorganic encapsulation layer IEL2.
The first inorganic encapsulation layer IEL1 may be disposed on the second electrode E2 with substantially a same thickness along a profile of the second electrode E2. The organic encapsulation layer OEL may be disposed on the first inorganic encapsulation layer IEL1, and may have a substantially flat upper surface without creating a step around the first inorganic encapsulation layer IEL1. The second inorganic encapsulation layer IEL2 may be disposed on the organic encapsulation layer OEL.
Referring to
A thickness of the buffer CM may decrease from a central portion thereof toward an edge of a portion of an edge overlapping the display panel PNL. For example, a thickness of the central portion of the buffer CM and a thickness of the edge of the buffer CM may be different from each other, and the thickness of the buffer CM may gradually decrease toward the edge of the buffer CM.
In an embodiment, the buffer CM may be formed by an inkjet process. The buffer CM may include a curable resin. For example, the buffer CM may include a urethane acrylate-based resin. In addition, the buffer CM may further include 2-propenoic acid, (5-ethyl-1,3-dioxin-5-yl) methyl ester. For example, the buffer CM may include a compound represented by Chemical Formula 1 below.
In an embodiment, a modulus of the buffer CM may be in a range of about 65 Mpa to about 150 Mpa. When the modulus of the buffer CM is smaller than about 65 Mpa, the buffer CM might not absorb an external shock and may transmit a shock to the display panel PNL. When the modulus of the buffer CM is greater than about 150 Mpa, the cover window CW and the display panel PNL may also be damaged because the buffer CM is broken or damaged by an external impact.
In addition, Table 1 below shows a pen drop evaluation (crack height of the cover window) according to the modulus of the buffer CM. The crack height of the cover window may mean a minimum height at which the cover window is damaged by the pen. Experimental structures according to Example 1, Comparative Example 1, and Comparative Example 2 are formed in a form of a buffer having a modulus according to Table 1 below, a cover window disposed on the buffer, and a protective film disposed on the cover window.
Referring to Table 1 above, in Example 1, when the modulus of the buffer was about 150 MPa, the crack height of the cover window was about 13 cm. In Comparative Example 1, when the modulus of the buffer was about 300 MPa greater than 150 MPa, the crack height of the cover window was about 8 cm. In Comparative Example 2, when the modulus of the buffer was about 600 MPa greater than 150 MPa, the crack height of the cover window was about 10 cm. Through this, it can be confirmed that when the modulus of the buffer is about 150 MPa or less, the crack height of the cover window increases. For example, when the modulus of the buffer is about 150 MPa or less, it can be confirmed that the impact resistance of the structure including the buffer is increased.
The thickness of the central portion of the buffer CM may be in a range of about 25 micrometers to about 100 micrometers. When the thickness T1 of the central portion of the buffer CM is less than about 25 micrometers, the buffer CM might not sufficiently absorb an external shock, and thus the impact resistance of the display device 10 may deteriorate. When the thickness T1 of the central portion of the buffer CM is greater than about 100 micrometers, the thickness of the display device 10 may increase due to the buffer CM. Also, when the thickness T1 of the central portion of the buffer CM is greater than about 100 micrometers, it might not be easy to fold the display device 10 due to the buffer CM.
A viscosity of the buffer CM may be greater than 0 cP and less than or equal to about 50 cP at room temperature (e.g., about 25° C.). When the viscosity of the buffer CM is greater than about 50 cP, it might not be easy to form the buffer CM by an inkjet process.
In an embodiment, a thickness of the adhesive layer AL may decrease from a central portion thereof toward an edge of a portion of an edge overlapping the display panel PNL. For example, a thickness of the central portion of the adhesive layer AL and a thickness of the edge of the adhesive layer AL may be different from each other, and the thickness of the adhesive layer AL may gradually decrease toward the edge of the adhesive layer AL.
In an embodiment, the adhesive layer AL may include a curable resin. For example, the adhesive layer AL may include an acrylate-based polymer material. However, the present invention is not necessarily limited thereto. Therefore, the adhesive layer AL may be formed by an inkjet process.
Also, the thickness T2 of the central portion of the adhesive layer AL may be in a range of about 35 micrometers to about 100 micrometers. When the thickness T2 of the central portion of the adhesive layer AL is smaller than about 35 micrometers, bonding strength between the cover window CW and the buffer CM may decrease. In addition, since the adhesive layer AL also has impact resistance, the adhesive layer AL does not sufficiently absorb an external shock, and thus the impact resistance of the display device 10 may be deteriorated. When the thickness T2 of the central portion of the adhesive layer AL is greater than about 100 micrometers, the thickness of the display device 10 may increase due to the adhesive layer AL. Also, when the thickness T2 of the central portion of the adhesive layer AL is greater than about 100 micrometers, folding of the display device 10 might not be easy due to the adhesive layer AL.
A viscosity of the adhesive layer AL may be greater than 0 cP and less than or equal to about 50 cP at room temperature (e.g., about 25° C.). When the viscosity of the adhesive layer AL is greater than about 50 cP, it might not be easy to form the adhesive layer AL by an inkjet process.
In an embodiment, since the display device 10 includes the buffer CM and the adhesive layer AL formed of a curable resin on the display panel PNL, material costs may be reduced during the process of manufacturing the display device 10. Thus, productivity of the display device 10 may be increased. In addition, since the display device 10 includes the buffer CM and the adhesive layer AL, impact resistance of the display device 10 may be increased from an external shock such as a pen drop.
Also, since the display device 10 includes only the buffer CM and the adhesive layer AL, a thickness of the display device 10 may be reduced. Accordingly, when the display device 10 is folded, folding stress of the display device 10 may be alleviated.
For example, the display panel PNL′ described with reference to
Referring to
The circuit element layer 210 may be disposed on the substrate SUB. The light emitting element layer 220 may be disposed on the circuit element layer 210. The encapsulation layer 300 may be disposed on the light emitting element layer 220. The functional layer may be disposed on the encapsulation layer 300.
For example, the first functional layer FL1 may be disposed on the encapsulation layer 300. For example, the first functional layer FL1 may be a touch sensing layer. The first functional layer FL1 may directly contact the encapsulation layer 300. However, the present invention is not necessarily limited thereto, and the first functional layer FL1 may be attached to the encapsulation layer 300 through an adhesive layer.
The second functional layer FL2 may be disposed on the first functional layer FL1. The second functional layer FL2 may be an anti-reflection layer. For example, the second functional layer FL2 may include a polarizer. When the second functional layer FL2 includes the polarizer, the second functional layer FL2 may be attached to the first functional layer FL1 through an adhesive layer. For example, the second functional layer FL2 may include a color filter layer. When the second functional layer FL2 includes the color filter layer, the second functional layer FL2 may directly contact the first functional layer FL1. However, the present invention is not necessarily limited thereto.
The present invention is not necessarily limited thereto, and the display device 10 may include only one of the first functional layer FL1 and the second functional layer FL2. Further referring to
The display device 11 described with reference to
Referring to
In an embodiment, the adhesive layer AL may be disposed on the display panel PNL. The adhesive layer AL may contact the display panel PNL on the display panel PNL. For example, the adhesive layer AL may contact the encapsulation layer 300 included in the display panel PNL.
The buffer CM may be disposed on the adhesive layer AL. The buffer CM may be disposed between the adhesive layer AL and the cover window CW. The buffer CM may directly contact each of the adhesive layer AL and the cover window CW.
The thickness of the buffer CM may decrease from a central portion thereof toward an edge of a portion of an edge overlapping the display panel PNL. Also, the thickness of the buffer CM may decrease from the central portion to the edge of a portion of the edge overlapping the display panel PNL.
A display device described with reference to
Referring to
For example, the manufacturing method of the display device described with reference to
Referring to
Further referring to
Referring to
In an embodiment, the first uncured resin layer RSL1 may be formed of a curable resin. For example, the first uncured resin layer RSL1 may be formed of a urethane acrylate-based resin. In addition, the first uncured resin layer RSL1 may be formed of a resin containing 2-propenoic acid, (5-ethyl-1,3-dioxin-5-yl) methyl ester. For example, the first uncured resin layer RSL1 may be formed of a compound represented by Chemical Formula 1 below.
Referring to
In this case, the thickness T1 of the central portion of the buffer CM may be formed in a range of about 25 micrometers to about 100 micrometers. When the thickness T1 of the central portion of the buffer CM is in a range of about 25 micrometers to about 100 micrometers, the buffer CM sufficiently absorbs an external shock to increase the impact resistance of the display device. Folding of the display device may also be facilitated.
Further referring to
Referring to
Referring to
The thickness T2 of the central portion of the adhesive layer AL may be formed in a range of about 35 micrometers to about 100 micrometers. When the thickness T2 of the central portion of the adhesive layer AL is in a range of about 35 micrometers to about 100 micrometers, the adhesive layer AL may better bond the cover window CW and the buffer CM, and sufficiently absorb an external impact together with the buffer CM to increase impact resistance of the display device. In addition, folding of the display device may be facilitated.
Further referring to
Also, the adhesive layer AL may be formed such that a thickness decreases from the central portion thereof toward the edge at a portion of the edge overlapping the display panel PNL. For example, the adhesive layer AL may be formed by an inkjet process and gradually decrease in thickness toward the edge of adhesive layer AL.
Further referring to
Also, the support SM may be formed under the display panel PNL. The opening OP overlapping the folding area FA may be formed in the support SM. The filling FM may be filled in the opening OP. Thus, the display device 10 may be formed.
In an embodiment, since each of the buffer CM and the adhesive layer AL is formed through an inkjet process, material costs may be reduced during the manufacturing process of the display device 10. Accordingly, productivity of the display device 10 may be increased.
For example, the method of manufacturing the display device according to
Referring to
Referring to
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Further referring to
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Further referring to
The buffer CM may be formed such that a thickness decreases from the central portion thereof toward the edge at a portion of the edge overlapping the display panel PNL. For example, the buffer CM may be formed by an inkjet process and gradually decrease in thickness toward the edge of the buffer CM.
Further referring to
The invention should not necessarily be construed as being limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete and will fully convey the concept of the invention to those skilled in the art.
While example embodiments of the invention has been particularly shown and described with reference to embodiments thereof, it will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit or scope of present disclosure.
Number | Date | Country | Kind |
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10-2023-0017422 | Feb 2023 | KR | national |