The present disclosure relates to a force attenuator for a force sensor that extends the maximum load of the force sensor.
Microelectromechanical systems (MEMS) force sensors are designed with certain maximum load in mind for certain applications. The maximum load of a MEMS force sensor is typically in the range of 10 kilograms (kg) or less. It is very difficult to increase the maximum load applied to a MEMS force sensor as MEMS force sensors typically have small form factor in the range of a couple square millimeters (mm2) in area. With the known fractural strength of silicon, there is a fixed maximum load the sensor is capable of handling. It is intuitive to increase the size to accommodate the larger maximum load. However, this approach is not cost effective and not flexible to accommodate various demands of maximum load range. A better solution is required to fit one sensor for multiple applications.
In one implementation, the present disclosure pertains to a force attenuator for a force sensor. The force attenuator can be made of rubber material. This attenuator serves as a force transformer in the reduction manner, for example, attenuating the applied force to facilitate a force sensor's ability to sense larger loads. The surface area ratio between the force attenuator and the force sensor linearly defines the “turn ratio” of this force transformer. Multiple implementations of such force attenuator to different types of force sensors and the simulation data to support the linear relationship are described below.
An example force attenuated force sensor is described herein. The force attenuated force sensor can include a force attenuator including a deformable slab having two opposing surfaces, where the force attenuator defines a surface area for receiving an applied force. The force attenuated force sensor can also include a cavity formed on one of the two opposing surfaces of the deformable slab, and a force sensor arranged in the cavity. The force sensor can define a surface area for receiving the applied force, and a ratio of the surface area of the force sensor to the surface area of the force attenuator can have a linear relationship with the sensitivity attenuation of the force sensor.
Additionally, the deformable slab and the force sensor can be configured for mounting on a solid surface.
Alternatively or additionally, the deformable slab can be made of rubbery material.
Alternatively or additionally, the force attenuator can further include a solid non-deformable slab disposed on the deformable slab. The solid non-deformable slab can be disposed on a surface of the deformable slab opposite to a mounting surface.
Alternatively or additionally, the force sensor can be a microelectromechanical system (MEMS) force sensor. In some implementations, the MEMS force sensor can be a chip scale packaged MEMS force sensor including a piezoresistive sensing element. In some implementations, the MEMS force sensor can be a chip scale packaged MEMS force sensor including a piezoelectric sensing element. In some implementations, the MEMS force sensor can be a chip scale packaged MEMS force sensor including both piezoresistive and piezoelectric sensing elements. Optionally, the chip scale packaged MEMS force sensor can include a sealed cavity.
Alternatively or additionally, the force attenuated force sensor can include a package substrate, where the chip scale packaged MEMS force sensor can be electrically and mechanically connected to the package substrate. The chip scale packaged MEMS force sensor and the package substrate can be arranged in the cavity.
Alternatively or additionally, the sensitivity attenuation of the force sensor increases as the area ratio increases, and the sensitivity attenuation of the force sensor decreases as the area ratio decreases.
Alternatively or additionally, the deformable slab can define a cylindrical shape.
Alternatively or additionally, the two opposing surfaces of the deformable slab can be parallel surfaces.
An example force attenuator is described herein. The force attenuator can include a deformable slab having two opposing surfaces, where the force attenuator defines a surface area for receiving an applied force. The force attenuator can also include a cavity formed on one of the two opposing surfaces of the deformable slab. The cavity can be configured to accommodate a force sensor. Additionally, a ratio of a surface area of the force sensor to the surface area of the force attenuator can have a linear relationship with the sensitivity attenuation of the force sensor.
Alternatively or additionally, the force sensor can be a microelectromechanical system (MEMS) force sensor.
Alternatively or additionally, the deformable slab can be made of rubbery material.
Alternatively or additionally, the force attenuator can further include a solid non-deformable slab disposed on the deformable slab. The solid non-deformable slab can be disposed on a surface of the deformable slab opposite to a mounting surface.
Alternatively or additionally, the two opposing surfaces of the deformable slab can be parallel surfaces.
Other systems, methods, features and/or advantages will be or may become apparent to one with skill in the art upon examination of the following drawings and detailed description. It is intended that all such additional systems, methods, features and/or advantages be included within this description and be protected by the accompanying claims.
The components in the drawings are not necessarily to scale relative to each other. Like reference numerals designate corresponding parts throughout the several views. These and other features of will become more apparent in the detailed description in which reference is made to the appended drawings wherein:
The present disclosure can be understood more readily by reference to the following detailed description, examples, drawings, and their previous and following description. However, before the present devices, systems, and/or methods are disclosed and described, it is to be understood that this disclosure is not limited to the specific devices, systems, and/or methods disclosed unless otherwise specified, and, as such, can, of course, vary. It is also to be understood that the terminology used herein is for the purpose of describing particular aspects only and is not intended to be limiting.
The following description is provided as an enabling teaching. To this end, those skilled in the relevant art will recognize and appreciate that many changes can be made, while still obtaining beneficial results. It will also be apparent that some of the desired benefits can be obtained by selecting some of the features without utilizing other features. Accordingly, those who work in the art will recognize that many modifications and adaptations may be possible and can even be desirable in certain circumstances, and are contemplated by this disclosure. Thus, the following description is provided as illustrative of the principles and not in limitation thereof.
As used throughout, the singular forms “a,” “an” and “the” include plural referents unless the context clearly dictates otherwise. Thus, for example, reference to “a sensing element” can include two or more such sensing elements unless the context indicates otherwise.
The term “comprising” and variations thereof as used herein is used synonymously with the term “including” and variations thereof and are open, non-limiting terms.
Ranges can be expressed herein as from “about” one particular value, and/or to “about” another particular value. When such a range is expressed, another aspect includes from the one particular value and/or to the other particular value. Similarly, when values are expressed as approximations, by use of the antecedent “about,” it will be understood that the particular value forms another aspect. It will be further understood that the endpoints of each of the ranges are significant both in relation to the other endpoint, and independently of the other endpoint.
As used herein, the terms “optional” or “optionally” mean that the subsequently described event or circumstance may or may not occur, and that the description includes instances where said event or circumstance occurs and instances where it does not.
The present disclosure relates to a force attenuator with a cavity designed to fit a force sensor inside the cavity. The force attenuators described herein can optionally be used when the load on a force sensor (e.g., MEMS force sensor) is expected to be equal to or greater than about 10 Newtons (N). For example, this disclosure contemplates that the force attenuators described herein can be used to allow the use of a force sensor (e.g., MEMS force sensor) in applications including, but not limited to, automotive applications (e.g., car seat/passenger weight sensing), medical applications (e.g., patient bed monitoring), or weight scales (e.g., body weight, vehicle weigh stations, etc.). The force attenuator acts as a force transformer and adapts the same force sensor for use in applications with different maximum load requirements. As described herein, the force attenuator can be used to increase the maximum load of a given force sensor. In other words, the force attenuator can significantly extend the maximum sensing range of a given force sensor.
Referring now to
The force attenuator 101 can include a cavity 102. The dimensions (e.g., size and/or shape) of the cavity 102 can be designed to accommodate a force sensor. In other words, the force sensor can be arranged or placed inside of the cavity 102. In some implementations, the force sensor can be fitted inside the cavity 102. In this way, the force that is applied to the force attenuator 101 is transferred to the force sensor. Optionally, the force sensor can be a MEMS force sensor as described herein. Example MEMS force sensors are described in U.S. Pat. No. 9,487,388, issued Nov. 8, 2016 and entitled “Ruggedized MEMS Force Die;” U.S. Pat. No. 9,493,342, issued Nov. 15, 2016 and entitled “Wafer Level MEMS Force Dies;” U.S. Pat. No. 9,902,611, issued Feb. 27, 2018 and entitled “Miniaturized and ruggedized wafer level mems force sensors;” U.S. Patent Application Publication No. 2016/0363490 to Campbell et al., filed Jun. 10, 2016 and entitled “Ruggedized wafer level mems force sensor with a tolerance trench;” WO2018/148503 to NextInput, Inc., filed Feb. 9, 2018 and entitled “INTEGRATED DIGITAL FORCE SENSORS AND RELATED METHODS OF MANUFACTURE;” and WO2018/148510 to NextInput, Inc., filed Feb. 9, 2018 and entitled “INTEGRATED PIEZORESISTIVE AND PIEZOELECTRIC FUSION FORCE SENSOR,” the disclosures of which are incorporated by reference in their entireties. As shown in
Optionally, the force attenuator 101 can be in the shape of a stacked slab. For example, the force attenuator 101 can optionally further include a solid non-deformable slab 106 disposed on top of the deformable slab 105, e.g., forming the stacked slab as shown in
Referring now to
As described above, the force sensor system 201 can include the force sensor 202. The force sensor system 201 can also include a package substrate 208 such as a printed circuit board (PCB) or a flexible printed circuit board (FPC). The force sensor 202 and the package substrate 208 can be arranged in the cavity 102 of the force attenuator. The force sensor 202 can include a dielectric layer 203, a sensor substrate 204 (e.g., a sensor die), and a piezoresistive sensing element 205. In some implementations, the force sensor 202 can include a plurality of piezoresistive sensing elements 205. This disclosure contemplates that the piezoresistive sensing element(s) 205 can be diffused, deposited, or implanted on a surface of the force sensor 202. The force sensor 202 can also include a metal layer 206 and a solder bump 207. The metal layer 206 and solder bump 207 can be used to electrically and mechanically connect the force sensor 202 to the package substrate 208. Additionally, as shown in
Referring now to
As described above, the force sensor system 301 can include the force sensor 202. The force sensor system 301 can also include a package substrate 208 such as a PCB or an FPC. The force sensor 202 and the package substrate 208 can be arranged in the cavity 102 of the force attenuator. The force sensor 202 can include a dielectric layer 203, a sensor substrate 204 (e.g., a sensor die), and a piezoresistive sensing element 205. In some implementations, the force sensor 202 can include a plurality of piezoresistive sensing elements 205. This disclosure contemplates that the piezoresistive sensing element(s) 205 can be diffused, deposited, or implanted on a surface of the force sensor 202. Additionally, the force sensor 202 can include a piezoelectric sensor. A piezoelectric sensor can include a piezoelectric sensing element 312 arranged between opposing electrodes. In
Referring now to
As described above, the force sensor system 401 can include the force sensor 402. The force sensor system 401 can also include a package substrate 410 such as a PCB or an FPC. The force sensor 402 and the package substrate 410 can be arranged in the cavity 102 of the force attenuator. The force sensor 402 can include a dielectric layer 403, a sensor substrate 404 (e.g., a sensor die), and a piezoresistive sensing element 405. In some implementations, the force sensor 402 can include a plurality of piezoresistive sensing elements 405. This disclosure contemplates that the piezoresistive sensing element(s) 405 can be diffused, deposited, or implanted on a surface of the force sensor 402. Optionally, in some implementations, the force sensor 402 can include piezoelectric sensing element(s). The force sensor 402 can also include a cap substrate 408, which is attached to the sensor substrate 404 through a bonded oxide layer 407. The internal surfaces between the sensor substrate 404 and the cap substrate 408 form a sealed cavity 450. The sealed cavity 450 can be formed by etching a trench from the sensor substrate 404 and then sealing a volume between the bonded sensor substrate 404 and cap substrate 408. For example, the volume is sealed between the sensor substrate 404 and the cap substrate 408 when adhered together, which results in formation of the sealed cavity 450. The force sensor 202 can also include a metal layer 406 and a solder bump 409. The metal layer 406 and solder bump 409 can be used to electrically and mechanically connect the force sensor 402 to the package substrate 410. Additionally, as shown in
Referring now to
Although the subject matter has been described in language specific to structural features and/or methodological acts, it is to be understood that the subject matter defined in the appended claims is not necessarily limited to the specific features or acts described above. Rather, the specific features and acts described above are disclosed as example forms of implementing the claims.
This application is a national stage application filed under 35 U.S.C. § 371 of PCT/US2018/061509 filed Nov. 16, 2018, which claims the benefit of U.S. provisional patent application No. 62/587,088, filed on Nov. 16, 2017, and entitled “FORCE ATTENUATOR FOR FORCE SENSOR,” the disclosures of which are expressly incorporated herein by reference in their entireties.
| Filing Document | Filing Date | Country | Kind |
|---|---|---|---|
| PCT/US2018/061509 | 11/16/2018 | WO |
| Publishing Document | Publishing Date | Country | Kind |
|---|---|---|---|
| WO2019/099821 | 5/23/2019 | WO | A |
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