Forming method of pattern film with narrower width and thin-film magnetic head having magnetic pole layer with narrower width

Abstract

A method for forming a pattern film with a narrower width than the resolution of an exposure machine and a resist used independently of etching is provided. The method comprises the steps of: forming a first frame layer having end surfaces facing each other across a space having a width W1; forming a second frame layer having end surfaces facing each other across a space having a width W2 that is larger than the width W1, the space having the width W2 being located right above the space having the width W1; forming a trench-forming film provided with a trench having a minimum width W3 that is smaller than the width W1 so as to fill at least a part of the spaces having the width W1 and the width W2 respectively; and forming a pattern film so as to fill at least a part of the trench.

Description

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS

FIG. 1 is a perspective view showing one embodiment of a thin-film magnetic head manufactured by using a manufacturing method according to the present invention;

FIG. 2 a is a cross-sectional view along an A-A line of FIG. 1 showing a main part of the thin-film magnetic head when the head of FIG. 1 is provided with an electromagnetic coil element for perpendicular magnetic recording;

FIG. 2 b is a cross-sectional view along an A-A line of FIG. 1 showing a main part of the thin-film magnetic head when the head of FIG. 1 is provided with an electromagnetic coil element for longitudinal magnetic recording;

FIGS. 3 a and 3b are schematic diagrams showing the end of the electromagnetic coil element on the head end surface in FIG. 2a;

FIG. 3 c is a schematic diagram showing the end of the electromagnetic coil element on the head end surface in FIG. 2b;

FIG. 4 is a flow chart schematically showing one embodiment of the manufacturing method of the thin-film magnetic head according to the present invention;

FIGS. 5 a to 5f are cross-sectional views along an A-A line in FIG. 1, illustrating one embodiment of the forming process of the MR effect element and the electromagnetic coil element;

FIGS. 6 a to 6d are schematic diagrams viewed from the head end surface side, illustrating the forming process of the main magnetic pole layer of the electromagnetic coil element for perpendicular magnetic recording in FIG. 2a;

FIGS. 7 a to 7d are schematic diagrams viewed from the head end surface side, illustrating the forming process of the upper and lower magnetic pole layers in the magnetic coil element for longitudinal magnetic recording in FIG. 2b; and

FIG. 8 is a schematic diagram showing the result of an observation of the configuration in the vicinity of the main magnetic pole layer on the head end surface on the ABS side of the thin-film magnetic head manufactured by using the manufacturing method according to the present invention.

Claims

1. A forming method of a pattern film with a narrower width, comprising the steps of: forming a base layer on/above an element forming surface of a substrate;forming a first frame layer having end surfaces facing each other across a space having a width W1 on said base layer;forming a second frame layer having end surfaces facing each other across a space having a width W2 in the same direction as said width W1 which is larger than said width W1, said space having said width W2 being located right above said space having said width W1;forming a trench-forming film provided with a trench having a minimum width W3 which is smaller than said width W1 in the same direction as said width W1 so as to fill at least a part of said space having said width W1 and said space having said width W2; andforming a pattern film so as to fill at least a part of said trench.

2. A manufacturing method of a thin-film magnetic head, comprising the steps of: forming a base layer on/above an element forming surface of a substrate;forming a first frame layer made of a non-magnetic material, having end surfaces facing each other across a space having a width W1 in a track width direction on said base layer;forming a second frame layer made of a non-magnetic material, having end surfaces facing each other across a space having a width W2 in the track width direction which is larger than said width W1, said space having said width W2 being located right above said space having said width W1;forming a trench-forming film made of a non-magnetic material, provided with a trench having a minimum width W3 in the track width direction which is smaller than said width W1 so as to fill at least a part of said space having said width W1 and said space having said width W2;forming a pattern film made of a soft magnetic material so as to fill at least a part of said trench; andpolishing said pattern film by using a chemical mechanical polishing method to form a main magnetic pole layer.

3. The manufacturing method as claimed in claim 2, wherein said first frame layer, said second frame layer and said trench-forming film are formed by depositing Alumina or silicon dioxide with a sputtering method.

4. The manufacturing method as claimed in claim 2, wherein a ratio W2/W1 of said width W2 and said width W1 is not less than 1.1 and not more than 1.5, and a ratio t2/t1 of a layer thickness t2 of said second frame layer and a layer thickness t1 of said first frame layer is not less than 1.2 and not more than 2.3.

5. A manufacturing method of a thin-film magnetic head, comprising the steps of: forming a base layer on/above an element forming surface of a substrate;forming a first frame layer made of a soft magnetic material, having end surfaces facing each other across a space having a width W1 in a track width direction on said base layer;forming a second frame layer made of a soft magnetic material, having end surfaces facing each other across a space having a width W2 in the track width direction which is larger than said width W1, said space having said width W2 being located right above said space having said width W1;forming a trench-forming film made of a non-magnetic material, provided with a trench having a minimum width W3 in the track width direction which is smaller than said width W1 so as to fill at least a part of said space having said width W1 and said space having said width W2;forming a pattern film made of a soft magnetic material so as to fill at least a part of said trench; andpolishing said pattern film by using a chemical mechanical polishing method to form a main magnetic pole layer.

6. The manufacturing method as claimed in claim 5, wherein said first frame layer and said second frame layer are formed by plating a soft magnetic material with a frame plating method and said trench-forming film is formed by depositing alumina or silicon dioxide with a sputtering method.

7. The manufacturing method as claimed in claim 5, wherein said pattern film is formed by using a plating method while applying a magnetic field in the track width direction from outside.

8. The manufacturing method as claimed in claim 5, wherein a ratio W2/W1 of said width W2 and said width W1 is not less than 1.1 and not more than 1.5, and a ratio t2/t1 of a layer thickness t2 of said second frame layer and a layer thickness t1 of said first frame layer is not less than 1.2 and not more than 2.3.

9. A manufacturing method of a thin-film magnetic head, comprising the steps of: forming a base layer made of a soft magnetic material on/above an element forming surface of a substrate to provide a lower magnetic pole layer;forming a first frame layer made of a non-magnetic material, having end surfaces facing each other across a space having a width W1 in a track width direction on said base layer;forming a second frame layer made of a non-magnetic material, having end surfaces facing each other across a space having a width W2 in the track width direction which is larger than said width W1, said space having said width W2 being located right above said space having said width W1;forming a trench-forming film made of a non-magnetic material, provided with a trench having a minimum width W3 in the track width direction which is smaller than said width W1 so as to fill at least a part of said space having said width W1 and said space having said width W2, a portion on said lower magnetic pole layer of said trench-forming film provided as a write gap portion;forming a pattern film made of a soft magnetic material so as to fill at least a part of said trench; andpolishing said pattern film by using a chemical mechanical polishing method to form a upper magnetic pole layer.

10. The manufacturing method as claimed in claim 9, wherein said first frame layer, said second frame layer and said trench-forming film are formed by depositing alumina or silicon dioxide with a sputtering method.

11. A thin-film magnetic head comprising: a substrate having an element forming surface;a first frame layer made of a non-magnetic material, formed on said element forming surface and having end surfaces facing each other across a space having a width W1 in a track width direction;a second frame layer made of a non-magnetic material, formed on said first frame layer, and having end surfaces facing each other across a space having a width W2 in the track width direction which is larger than said width W1, said space having said width W2 being located right above said space having said width W1;a trench-forming film made of a non-magnetic material, comprising a trench with a minimum width W3 which is smaller than said width W1 in the track width direction so as to fill at least a part of said space having said width W1 and said space having said width W2; anda magnetic pole layer made of a soft magnetic material, formed so as to fill at least a part of said trench.

12. A thin-film magnetic head comprising: a substrate having an element forming surface;a first frame layer made of a soft magnetic material formed on said element forming surface, and having end surfaces facing each other across a space having a width W1 in a track width direction;a second frame layer made of a soft magnetic material, formed on said first frame layer, and having end surfaces facing each other across a space having a width W2 which is larger than said width W1 in the track width direction, said space having said width W2 being located right above said space having said width W1;a trench-forming film made of a non-magnetic material, provided with a trench having a minimum width W3 which is smaller than said width W1 in the track width direction so as to fill at least a part of said space having said width W1 and said space having said width W2; anda magnetic pole layer made of a soft magnetic material formed so as to fill at least a part of said trench.

13. The thin-film magnetic head claimed in claim 12, wherein said magnetic pole layer is made of a magnetic film formed by using a plating method while applying a magnetic field in the track width direction from outside.