The disclosure relates generally to an antenna unit and, in particular, to an antenna unit incorporating a variety of Fresnel zone plate lens designs utilizing patterned masks. Deployment of the 5G network has required the installation of many new antennas to send and receive 5G signals. Such antennas relay data throughout the network in a highly directional manner. Efficient sending and receiving of these 5G signals allows for the 5G network to be built out in an economical manner.
In one aspect, embodiments of the disclosure relate to an antenna unit. The antenna unit includes an antenna array having a plurality of antennas and a lens plate comprising a mask pattern. The antenna array defines a first plane, and the lens plate defines a second plane. The lens plate is spaced apart from the antenna array, and the second plane of the lens plate is substantially parallel to the first plane of the antenna array. The mask pattern is configured to focus first waves incident on the lens plate through diffraction to a first region of the antenna array. The first waves are incident on the lens plate at a first angle relative to an axis normal to the second plane of the lens plate. The mask pattern is also configured to focus second waves incident on the lens plate through diffraction to the first region of the antenna array. The second waves are incident on the lens plate at a second angle relative to the axis in which the second angle is different from the first angle.
In another aspect, embodiments of the disclosure relate an antenna unit. The antenna unit includes an antenna array comprising a plurality of antennas and a lens plate comprising a mask pattern. The antenna array defines a first plane, and the lens plate defines a second plane. The lens plate is spaced apart from the antenna array, and the second plane of the lens plate is substantially parallel to the first plane of the antenna array. The mask pattern includes a Fresnel zone plate having a center ring centered on a first axis normal to the second plane of the lens plate. The mask pattern is configured to focus waves incident on the lens plate along a second axis normal to second plane of the lens plate to a region of the antenna array that is located on the first axis. The first axis is spaced apart from the second axis.
In still another aspect, embodiments of the disclosure relate to an antenna unit. The antenna unit includes an antenna array having a plurality of antennas and a lens plate comprising a mask pattern. The antenna array defines a first plane, and the lens plate defines a second plane. The lens plate is spaced apart from the antenna array, and the second plane of the lens plate is substantially parallel to the first plane of the antenna array. The mask pattern is configured to focus waves incident on the lens plate to at least two different focal points within the antenna array.
Additional features and advantages will be set forth in the detailed description that follows, and, in part, will be readily apparent to those skilled in the art from the description or recognized by practicing the embodiments as described in the written description and claims hereof, as well as the appended drawings.
It is to be understood that both the foregoing general description and the following detailed description are merely exemplary, and are intended to provide an overview or framework to understand the nature and character of the claims.
The accompanying drawings are included to provide a further understanding and are incorporated in and constitute a part of this specification. The drawings illustrate one or more embodiment(s), and together with the description serve to explain principles and the operation of the various embodiments. In the drawings:
Embodiments of the present disclosure relate to an antenna unit having a Fresnel zone plate lens with a mask pattern that manipulates the focal point(s) and/or direction of an incident incoming wave. In embodiments, the mask pattern allows for waves having two different incident angles to have the same focal spot on an antenna array of the antenna unit. Further, in embodiments, the mask pattern allows for the focal spot to be offset vertically and/or horizontally from the center position. In still further embodiments, the mask pattern is created by superimposing multiple Fresnel zone plates to produce multiple focal points that can be spaced out vertically and/or horizontally.
The mask patterns disclosed herein include alternating opaque (absorbing or reflecting) and transparent sections or sections with alternating thicknesses whose spacings are dictated by the lens focal length at the specified microwave frequency. The mask patterns can be produced through various deposition or coating or printing techniques, such as screen printing, spray coating, slot coating, and thin film deposition techniques. Further, in embodiments, the mask patterns can be produced trough material removal or addition.
Applicant believes that the antenna units described herein are applicable to the 5G infrastructure. As used herein, “5G” refers to signals transmitted via microwaves, in particular having a frequency of 20 GHz to 100 GHz. The 5G network includes many antenna units that transmit directional waves to other antenna units. Applicants have found a way to enhance the lens gain of the antenna units by focusing the waves incident upon the antenna units to specific, desired regions of an antenna array. In this way, the antenna units can transmit and receive over greater distances, thereby reducing the required number of antenna units in the network. Various embodiments of an antenna unit, in particular that is usable in the 5G infrastructure, are disclosed herein. These embodiments are presented by way of example and not by way of limitation.
In order to focus the radiation, the lens plate 14 includes a mask pattern 18 including a series of first sections 20 and second sections 22. As will be appreciated from the discussion that follows, the mask pattern 18 focuses the incident waves via diffraction from the first sections 20 and the second sections 22. In embodiments, the first sections 20 are opaque, and the second sections 22 are transparent. By “opaque,” it is meant that the first sections 20 block electromagnetic radiation of a particular wavelength from passing through the lens in the area of the first sections 20. By “transparent,” it is meant that the second sections 22 permit electromagnetic radiation of a particular wavelength to pass through the lens in the area of the second sections 22. In embodiments, the second sections 22 transmit at least 90% of electromagnetic radiation of a particular wavelength through the lens in the area of the second sections 22. In other embodiments, the second sections 22 transmit at least 95% of electromagnetic radiation of a particular wavelength through the lens in the area of the second sections 22, and in still other embodiments, the second sections 22 transmit at least 98% of electromagnetic radiation of a particular wavelength through the lens in the area of the second sections 22. In other embodiments, the first sections 20 have a different thickness than the second sections 22.
In particular embodiments, a difference in thickness of the lens plate 16 is provided between the first sections 20 and the second sections 22. In embodiments, a difference in thickness between the first sections 20 and the second sections 22 is chose to result in a path length difference equivalent to the wavelength of the incident wave divided by two.
The mask pattern 18 is based on the diffraction pattern produced by a wave of electromagnetic radiation incident on a Fresnel zone plate (FZP) as shown in
In this equation, rn is the radius of the nth ring of the FZP, n is the integer number of rings, λ is the wavelength of the incident wave, and f is the focal length. The equation considers a wave that is incident at an incident angle θinc of 0°. When the incident angle θinc is 0° (i.e., the incident wave is substantially normal (e.g., within)+/−5° to the plane of the lens plate 16), the FZP will focus the waves through diffraction to a spot directly in line with an axis perpendicular to and passing through the center of the Fresnel zone at the focal length f away from the lens plate 16. Thus, in designing the antenna 10 of
To illustrate,
In order to re-center and concentrate the intensity of an incident wave that is off-axis, the mask pattern 18 is based off the intensity distribution pattern shown in
In other embodiments, the mask pattern 18 can be used to deliberately move the focal spot 24 off-center. For example, with reference to
The mask pattern 18 of
In still other embodiments, the mask pattern 18 is configured to provide multiple focal spots 24.
The embodiments of
Having described various embodiments of the mask pattern 18, the following discussion will be directed to how to fabricate the mask pattern 18 on the lens plate 16. In embodiments, the mask pattern 18 is fabricated using screen printing or sputter coating. In an exemplary embodiment of screen printing, modelled data for the mask pattern 18 can be converted to screen-printable file using pattern design software. Thereafter, the screen mesh, emulsion thickness, and tension based on the pattern resolution are determined for the screen printing process. The material of the lens plate (e.g., glass having a thickness of 0.3-0.7 mm) is cleaned. For the screen printing ink, a microwave opaque material is selected for screen printing. The material can be absorbing or reflecting of microwaves. Examples include silver-based ink, silver nanowire-based ink. The screen area is flooded with the selected screen ink for the printing step, and when sufficient wetting of the screen surface is achieved, the print step is applied using varying print speed (mm/sec), gap (mm) and print pressure (KgF or psi). In embodiments, the thickness of the opaque material deposited onto the lens plate is about 10 to 15 μm thick. Once the ink is applied, it is baked or UV-cured. Alternatively, low E coating (such as those used for window applications) can be vacuum deposited on a pre-masked glass substrate and followed by the removal of the mask after deposition. Resistitivity values of 0.03-10 Ω/m indicate that the layer will be opaque to microwave in the frequency of interest.
Unless otherwise expressly stated, it is in no way intended that any method set forth herein be construed as requiring that its steps be performed in a specific order. Accordingly, where a method claim does not actually recite an order to be followed by its steps or it is not otherwise specifically stated in the claims or descriptions that the steps are to be limited to a specific order, it is in no way intended that any particular order be inferred. In addition, as used herein, the article “a” is intended to include one or more than one component or element, and is not intended to be construed as meaning only one.
It will be apparent to those skilled in the art that various modifications and variations can be made without departing from the spirit or scope of the disclosed embodiments. Since modifications, combinations, sub-combinations and variations of the disclosed embodiments incorporating the spirit and substance of the embodiments may occur to persons skilled in the art, the disclosed embodiments should be construed to include everything within the scope of the appended claims and their equivalents.
This application claims the benefit of priority under 35 U.S.C. § 119 of U.S. Application No. 62/867,481 filed on Jun. 27, 2019 the contents of which are relied upon and incorporated herein by reference in their entirety as if fully set forth below.
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Number | Date | Country | |
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20200412009 A1 | Dec 2020 | US |
Number | Date | Country | |
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62867481 | Jun 2019 | US |