Claims
- 1. A functionalized silicon compound having a structure of Formula 2:
13wherein R1 and R2 are independently selected from the group consisting of alkoxy and halide, and R3 is selected from the group consisting of alkoxy, halide and alkyl; wherein L1 and L2 are both —(CH2)n—, wherein n=2 to 10; and wherein A1 is a moiety comprising one or more derivatizable functional groups.
- 2. The functionalized silicon compound of claim 1, wherein the derivatizable functional group is selected from the group consisting of hydroxyl, amino, amido, carboxyl, thio, halo and sulfonate.
- 3. The functionalized silicon compound of claim 2, wherein A1 comprises a plurality of derivatizable functional groups.
- 4. The functionalized silicon compound of claim 2, wherein A1 is a moiety comprising a hydroxyl group.
- 5. The functionalized silicon compound of claim 2, wherein the silicon compound is compound II:
14
- 6. A functionalized silicon compound having a structure of Formula 3:
15wherein R1 and R2 are independently selected from the group consisting of alkoxy or halide, and R3 is selected from the group consisting of alkoxy, halide and alkyl; wherein L1, L2, and L3 are independently —(CH2)n—, wherein n is 2-10; and wherein A1 and A2 are independently a moiety comprising one or more derivatizable functional groups or modified forms thereof.
- 7. The functionalized silicon compound of claim 6, wherein the one or more derivatizable functional groups are selected from the group consisting of hydroxyl, amino, carboxyl, thio, halo, amido and sulfonate.
- 8. The functionalized silicon compound of claim 7, wherein A1 and A2 each comprise a plurality of derivatizable functional groups.
- 9. The functionalized silicon compound of claim 7, wherein A1 and A2 each comprise a hydroxyl group.
- 10. The functionalized silicon compound of claim 7, wherein the functionalized silicon compound is compound V:
16
- 11. A functionalized silicon compound having a structure of Formula 4:
17wherein B is —SiR1R2R3, wherein R1, R2 and R3 are independently alkoxy, halide or alkyl; wherein x, y, and z are independently 2 to 3; wherein L1, L2 and L3 are independently —(CH2)m—, wherein m is 2-10; wherein A and C are independently moieties comprising derivatizable functional groups; and wherein n is about 10 to 10,000.
- 12. A functionalized silicon compound of Formula 6:
18wherein R1, R2 and R3 are independently alkoxy, halide or alkyl; and wherein m is about 1 to 5, and n is about 10 to 10,000.
- 13. A functionalized silicon compound of Formula 2
19
- 14. The silicon compound of claim 13, wherein the derivatizable functional groups are independently selected from the group consisting of hydroxyl, amino, carboxyl, thio, halo and sulfonate.
- 15. The silicon compound of claim 13 selected from the group consisting of
20
- 16. A functionalized silicon compound of Formulas 17, 18, 19, or 20:
21
- 17. The silicon compound of claim 16, wherein the derivatizable functional groups are independently selected from the group consisting of hydroxyl, amino, carboxyl, thio, halo, amido and sulfonate.
- 18. The silicon compound of claim 16, wherein the compound is selected from the group consisting of
22
- 19. A functionalized silicon compound of Formula 21:
23
- 20. The silicon compound of claim 19, wherein the derivatizable functional groups are independently selected from the group consisting of hydroxyl, amino, carboxyl, thio, halo amido and sulfonate.
- 21. A silicon compound of claim 19, selected from the group consisting of
24
- 22. A method of functionalizing a surface, the method comprising covalently attaching to the surface a functionalized silicon compound, wherein the functionalized silicon compound comprises at least one derivatizable functional group and a plurality of activated silicon groups.
- 23. The method of claim 22, wherein the method comprises covalently attaching a plurality of functionalized silicon compounds to the surface; and
forming an array of nucleic acids covalently attached to the functionalized silicon compounds on the surface.
- 24. The method of claim 22, wherein the silicon compound is a compound having a structure of Formula 2:
25wherein R1 and R2 are independently selected from the group consisting of alkoxy and halide, and R3 is selected from the group consisting of alkoxy, halide and alkyl; wherein L1 and L2 are both —(CH2)n—, wherein n=2 to 10; and wherein A1 is H or a moiety comprising one or more derivatizable functional groups.
- 25. The method of claim 24, wherein the derivatizable functional group is a hydroxyl group or modified form thereof.
- 26. The method of claim 24, wherein A1 comprises a plurality of derivatizable functional groups.
- 27. The method of claim 24, wherein the silicon compound is compound II:
26
- 28. The method of claim 22, wherein the method comprising covalently attaching to the surface a functionalized silicon compound having a structure of Formula 3:
27wherein R1 and R2 are independently alkoxy or halide, and R3 is selected from the group consisting of alkoxy, halide and alkyl; wherein L1, L2, and L3 are —(CH2)n—, wherein n is 2 to 10; and wherein A1 and A2 are independently H or a moiety comprising one or more derivatizable functional groups.
- 29. The method of claim 28, wherein the one or more derivatizable functional groups are hydroxyl groups or modified forms thereof.
- 30. The method of claim 28, wherein A1 and A2 each comprise a plurality of derivatizable functional groups.
- 31. The method of claim 28, wherein the functionalized silicon compound is compound V:
28
- 32. The method of claim 22, wherein the method comprises covalently attaching to the surface a functionalized silicon compound having a structure of Formula 4:
29wherein B is —SiR1R2R3, wherein R1, R2 and R3 are independently alkoxy, halide or alkyl; wherein x, y, and z are independently 2 to 3; wherein L1, L2 and L3 are independently —(CH2)m—, wherein m is 2 to 10; wherein A and C are independently moieties comprising derivatizable functional groups; and wherein n is about 10 to 10,000.
- 33. A method of functionalizing a surface, the method comprising covalently attaching to the surface a functionalized silicon compound according to claim 12.
- 34. A method of functionalizing a surface, the method comprising covalently attaching to the surface a functionalized silicon compound of claim 13.
- 35. The method of claim 34, wherein the method comprises covalently attaching a plurality of functionalized silicon compounds to the surface; and
forming an array of nucleic acids covalently attached to the functionalized silicon compounds on the surface.
- 36. The method of claim 34, wherein the derivatizable groups are hydroxyl groups or modified forms thereof.
- 37. The method of claim 34, wherein the compound is selected from the group consisting of
30
- 38. A method of functionalizing a surface, the method comprising covalently attaching to the surface a functionalized silicon compound of claim 16.
- 39. The method of claim 38, wherein the method comprises covalently attaching a plurality of functionalized silicon compounds to the surface; and
forming an array of nucleic acids covalently attached to the functionalized silicon compounds on the surface.
- 40. The method of claim 38, wherein the derivatizable groups are hydroxyl groups or modified forms thereof.
- 41. The method of claim 38, wherein the compound is selected from the group consisting of
31
- 42. A method of functionalizing a surface, the method comprising covalently attaching to the surface a functionalized silicon compound of claim 19.
- 43. The method of claim 42, wherein the method comprises covalently attaching a plurality of functionalized silicon compounds to the surface; and
forming an array of nucleic acids covalently attached to the functionalized silicon compounds on the surface.
- 44. The method of claim 42, wherein the derivatizable groups are hydroxyl groups or modified forms thereof.
- 45. The method of claim 42, wherein the compound is selected from the group consisting of
32
- 46. The method of claim 22, wherein the surface is the surface of a substrate comprising silica.
- 47. The method of claim 24, wherein the surface is the surface of a substrate comprising silica.
- 48. The method of claim 28, wherein the surface is the surface of a substrate comprising silica.
- 49. The method of claim 32 wherein the surface is the surface of a substrate comprising silica.
- 50. The method of claim 34, wherein the surface is the surface of a substrate comprising silica.
- 51. The method of claim 38, wherein the surface is the surface of a substrate comprising silica.
- 52. The method of claim 42, wherein the surface is the surface of a substrate comprising silica.
- 53. The method of claim 22, wherein the substrate is in a form selected from the group consisting of particles, films and chips.
CROSS REFERENCE TO RELATED APPLICATIONS
[0001] This application is a continuation-in-part of U.S. patent application Ser. No. 09/172,190, filed Oct. 13, 1998, the disclosure of which is incorporated herein by reference.
Divisions (1)
|
Number |
Date |
Country |
Parent |
09418044 |
Oct 1999 |
US |
Child |
09832656 |
Apr 2001 |
US |
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
09172190 |
Oct 1998 |
US |
Child |
09418044 |
Oct 1999 |
US |