Gallium and nitrogen containing triangular or diamond-shaped configuration for optical devices

Information

  • Patent Grant
  • 9450143
  • Patent Number
    9,450,143
  • Date Filed
    Tuesday, January 24, 2012
    12 years ago
  • Date Issued
    Tuesday, September 20, 2016
    8 years ago
Abstract
A gallium and nitrogen containing optical device has a base region and no more than three major planar side regions configured in a triangular arrangement provided from the base region.
Description
BACKGROUND OF THE INVENTION

This invention relates generally to lighting techniques. More specifically, embodiments of the invention include techniques for manufacturing optical devices, such as light emitting diodes (LEDs) using a separation process of thick gallium and nitrogen containing substrate members, such as GaN configured in polar crystalline orientations. In some embodiments, the gallium and nitrogen containing substrate is configured in a triangular shape or a diamond shape. The invention can be applied to applications such as white lighting, multi-colored lighting, general illumination, decorative lighting, automotive and aircraft lamps, street lights, lighting for plant growth, indicator lights, lighting for flat panel displays, and other optoelectronic devices.


In the late 1800's, Thomas Edison invented the light bulb. The conventional light bulb, commonly called the “Edison bulb,” has been used for over one hundred years. The conventional light bulb uses a tungsten filament enclosed in a glass bulb sealed in a base, which is screwed into a socket. The socket is coupled to an AC power or DC power source. The conventional light bulb can be found commonly in houses, buildings, and outdoor lightings, and other areas requiring light. Unfortunately, drawbacks exist with the conventional Edison light bulb. That is, the conventional light bulb dissipates more than 90% of the energy used as thermal energy. Additionally, the conventional light bulb routinely fails often due to thermal expansion and contraction of the filament element.


Solid state lighting techniques are known. Solid state lighting relies upon semiconductor materials to produce light emitting diodes, commonly called LEDs. At first, red LEDs were demonstrated and introduced into commerce. Red LEDs use Aluminum Indium Gallium Phosphide or AlInGaP semiconductor materials. Most recently, Shuji Nakamura pioneered the use of InGaN materials to produce LEDs emitting light in the blue color range for blue LEDs. The blue colored LEDs led to innovations such as solid state white lighting, the blue laser diode, which in turn enabled the Blu-Ray™ (trademark of the Blu-Ray Disc Association) DVD player, and other developments. Other colored LEDs have also been proposed.


High intensity UV, blue, and green LEDs based on GaN have been proposed and even demonstrated with some success. Efficiencies have typically been highest in the UV-violet, dropping off as the emission wavelength increases to blue or green. Unfortunately, achieving high intensity, high-efficiency GaN-based green LEDs has been particularly problematic. Additionally, GaN based LEDs have been costly and difficult to produce on a wide-scale in an efficient manner.


BRIEF SUMMARY OF THE INVENTION

Conventional LED fabrication process typically employs a wafer scribing and breaking procedure to generate individual LED chips. These wafers are typically scribed along two substantially orthogonal axes, wherein these individual axes are respectively parallel to and co-planar with two non-equivalent crystal plane orientations of the wafer. For example, for an LED wafer comprising GaN on sapphire singulated into square or rectangular chips, the two orthogonal scribe axes are respectively parallel to and co-planar with m-plane and a-plane orientations of the sapphire wafer, wherein the m-planes and a-planes are not equivalent by definition.


In a specific embodiment, the present method includes a scribe and break process for bulk c-plane GaN wafers. The wafers are scribed along two or more non-orthogonal axes. These two or more axes are respectively parallel to and co-planar with equivalent crystal planes of the GaN wafer. For example, a bulk c-plane GaN wafer is scribed along three axes (with an angle of 60° between each of these three axes) wherein these three axes are respectively parallel to and co-planar with three m-plane orientations of the c-plane GaN wafer. In a specific embodiment, the three m-plane orientations are equivalent by definition. In one or more aspects, the present invention includes a method to fabricate a triangular-shaped or diamond-shaped chip geometry in the case of c-plane GaN wafers, which may have several advantages over conventional square or rectangular geometries. This present invention utilizes the in-plane 6-fold rotational symmetry and crystallography unique to c-plane GaN wafers—GaN has the Wurtzite crystal structure according to a specific embodiment. In an alternative preferred embodiment, the bulk c-plane GaN wafer may be scribed along three axes (with an angle of 60 degrees between each of these three axes) wherein these three axes are respectively parallel to and co-planar with three a-plane orientations of the c-plane GaN wafer, the three a-plane orientations being equivalent by definition.


In a specific embodiment, the present invention provides a gallium and nitrogen containing substrate configured in a triangular shape consisting of no more than five surface regions. Preferably, the five surface regions comprise three surface regions configured from respective first equivalent planes and two surface regions configured from second equivalent planes.


In alternative embodiments, the invention provides a diamond shape substrate consisting of no more than six surface regions. Preferably, the six surface regions comprise four surface regions configured from respective first equivalent planes and two surface regions configured from second equivalent planes. A first surface region configured in a c plane orientation and a second surface region configured in the c-plane orientation. The method also includes exposing at least a first m-plane region, a second m-plane region, and a third m-plane region. Moreover, the present invention provides a method of separating die from a gallium and nitrogen containing substrate. The invention also includes a gallium and nitrogen containing optical device. The device includes a gallium and nitrogen containing substrate having a base region and no more than three major planar side regions configured in a triangular arrangement provided from the base region.


In a preferred embodiment, the present method and structure can include one or more of the following elements that can include variations, modifications, and alternatives.


1. A bulk c-plane GaN wafer with an overlying LED epitaxial structure and with p-type and n-type metallizations is fabricated, such that there are ‘scribe streets’ along three directions (at 60° angles relative to each other) separating individual LED traces on the wafer. The scribe streets are aligned to be respectively parallel to three m-plane orientations of the c-plane GaN wafer, and are designed to intersect such that the triangle shape defined by three scribe lines is an equilateral triangle.


2. The LED wafer is laser-scribed on a first surface of the wafer, along a first ‘scribe street’ direction. The scribe depth in the scribed regions on the first surface is typically 20-50% of the thickness of the LED wafer.


3. The LED wafer is then laser-scribed on a first surface of the wafer, along a second ‘scribe street’ direction. The scribe depth in the scribed regions on the first surface is typically 20-50% of the thickness of the LED wafer.


4. The LED wafer is laser-scribed on a first surface of the wafer, along the third ‘scribe street’ direction. The scribe depth in the scribed regions on the first surface is typically 20-50% of the thickness of the LED wafer.


5. The scribe depth in the scribed regions on the second surface is typically 20-50% of the thickness of the LED wafer.


6. The scribed LED wafer is then broken using an anvil breaker setup along the three ‘scribe street’ orientations. Breaking occurs along the planes defined by scribed regions on the first surface of the wafer in a specific embodiment. Breaking along the third ‘scribe street’ orientation yields individual triangle-shaped LED chips.


In a specific embodiment, the invention provides for a method for singulation of thick c-plane GaN wafers into triangle-shaped LED chips defined by three equivalent m-plane oriented sidewalls. In one or more embodiments, the m-plane is a natural break plane, which easily cleaves, in the case of c-plane GaN wafers, and therefore, a singulation process involving breaking exclusively or predominately along a set of m-plane orientations will have a higher yield than a process involving breaking along both m-plane orientations and a-plane orientations. In another specific embodiment, the present invention provides for a method for singulation of c-plane GaN wafers into triangle-shaped LED chips defined by three equivalent m-plane oriented sidewalls. In one or more embodiments, break along the a-plane yields a characteristic surface texture which results in improved light extraction.


The invention provides triangle-shaped chips characterized by improved light extraction when compared to conventional square- or rectangle-shaped chips, due to an increase in the per-pass probability of escape of in-plane emission arising from a decrease in the probability of total internal reflection at the sidewalls. Additionally, triangle-shaped chips provide fewer trapped trajectories of light than square or rectangle chips, so that the chip light extraction efficiency can be increased.





BRIEF DESCRIPTION OF THE DRAWINGS


FIGS. 1 through 3 are diagrams illustrating a method for forming triangular shaped gallium and nitrogen containing material.



FIGS. 4 through 6 are diagrams illustrating a method for forming a diamond shaped gallium and nitrogen containing material.



FIG. 7 is a diagram showing relative orientations of m-planes (red lines) and a-planes (green lines), wherein the plane of the diagram represents a c-plane, in the case of the GaN (Wurtzite) crystal structure.



FIG. 8 is a side-view diagram depecting a laser scribing process for an optical device.



FIG. 9 is a side-view diagram depecting a breaking process for an optical device.



FIG. 10 is the light extraction diagram obtained from modeling light extraction in a square and a triangular chip.



FIG. 11 is a simulation of light extraction efficiency of a triangular chip as a function of sidewall surface roughening.





DETAILED DESCRIPTION OF THE INVENTION


FIGS. 1 through 3 are simplified diagrams illustrating a method for forming a triangular shaped gallium and nitrogen containing material according to an embodiment of the present invention. As shown in FIG. 1, the invention provides a gallium and nitrogen containing substrate member. The member includes a gallium and nitrogen containing thickness of material configured in a triangular shape consisting of no more than five surface regions. Preferably, the five surface regions comprises a three surface regions configured from respective first equivalent planes and the five surface regions excluding the three surface regions comprises two surface regions configured from second equivalent planes. As shown is a top-view of a triangular shaped chip showing orientation of three edges relative to GaN m-planes according to a specific embodiment (see dashed and dotted lines).


In a specific embodiment, the gallium and nitrogen containing substrate is triangular shaped. The triangular shaped substrate may be an extruded triangular shape. In a specific embodiment, the three surface regions of the triangular shaped regions are respective first equivalent planes, which are either m-planes or a-planes, see FIG. 2. The second surface regions of the triangular shaped regions are respective second equivalent planes, which are c-planes. In a specific embodiment, the gallium and nitrogen containing substrate is a GaN substrate. Of course, there can be other variations, modifications, and alternatives.


In a specific embodiment, the three surface regions of the triangular shaped regions are configured from respective scribes provided on respective first equivalent planes. As an example, the three surface regions are configured by an interior region of 180 Degrees or the like. In other examples, the two surface regions are configured in parallel arrangement to each other.


Referring now to FIG. 3, an optical micrograph of a triangular shaped LED chip is illustrated. As shown, the GaN substrate is configured from bulk c-plane GaN having three m-plane surface orientations exposed. As also shown, the gallium and nitrogen containing member comprises at least an optical device thereon in at least one specific embodiment. The optical device can be a light emitting diode, a laser device, or other device, as well as combinations of optical and electrical devices. Other types of devices can include electrical switching devices, mechanical devices, and any combination of these and the like.



FIGS. 4 through 6 are simplified diagrams illustrating a method for forming a triangular shaped gallium and nitrogen containing material according to an embodiment of the present invention. As shown, the substrate shows four edges relative to GaN m-planes (see dashed and dotted lines). The substrate member includes a gallium and nitrogen containing thickness of material configured in a diamond shape consisting of no more than six surface regions. Preferably, the six surface regions comprises four surface regions configured from respective first equivalent planes and the six surface regions excluding the four surface regions comprises two surface regions configured from second equivalent planes.


In a specific embodiment, the substrate that is the diamond shape is free from a 90 degree intersection between any two of the first four surface regions out of the six surface regions. In a specific embodiment, the diamond shape includes the first equivalent planes that are either m-planes or a-planes, as illustrated by FIG. 5. As shown, the four edges are associated with GaN a-planes (dotted or dashed lines). In a specific embodiment, the diamond shape includes the second equivalent planes that are c-planes.


The four surface regions of the diamond shape are configured from respective scribes provided on respective first equivalent planes in a specific embodiment. Preferably, the four surface regions are configured by an interior region free from a 90 degree angle. Preferably, the two surface regions are configured in parallel arrangement to each other.


Referring now to FIG. 6, an optical micrograph of a diamond shaped LED chip is illustrated. As shown, the GaN substrate is configured from bulk c-plane GaN having four m-plane surface orientations exposed. As also shown, the gallium and nitrogen containing member comprises at least an optical device thereon in at least one specific embodiment. The optical device can be a light emitting diode, a laser device, or other device, as well as combinations of optical and electrical devices.



FIG. 7 is a simplified diagram showing relative orientations of m-planes (solid lines) and a-planes (dashed lines), wherein the plane of the diagram represents a c-plane, in the case of the GaN (Wurtzite) crystal structure according to an embodiment of the present invention.



FIG. 8 is a simplified side-view diagram depicting a laser scribing process for an optical device according to an embodiment of the present invention. In a specific embodiment, the LED wafer is laser-scribed within the ‘scribe streets’ on a first surface of the wafer, along one or more axes according to a specific embodiment. In other embodiments, the scribing can occur using a saw, a diamond scribe, a chemical etchant (with or without a photo-assisted component), reactive ion or plasma etchant or milling, or combinations, and the like. The scribe depth in the scribed regions on the first surface is typically 20-50% of the thickness of the LED wafer according to a specific embodiment. In other embodiments, the scribe depth can vary and have other dimension.


In a specific embodiment, the LED wafer is then flipped over, and is then laser-scribed within the ‘scribe streets’ on a second surface of the wafer, along one or more axes, taking care to ensure that the scribes on the second surface are aligned to be substantially overlying the scribes on the first side of the wafer. In a specific embodiment, the scribe depth in the scribed regions on the second surface is typically 20-50% of the thickness of the LED wafer The scribed LED wafer is then broken using an anvil breaker setup, such as the one further described below.



FIG. 9 is a simplified side-view diagram depicting a breaking process for an optical device according to an embodiment of the present invention. As shown, breaking occurs along the planes defined by two aligned scribed regions on the two opposing sides of the wafer. In a specific embodiment, the present method provides for the singulation of thick GaN wafers, thereby eliminating the need for expensive and time-consuming lapping and polishing steps in the LED fabrication process.



FIG. 10 displays modeling results which compare the light extraction efficiency Cex of square and triangular chips. The simulation yields the light extraction diagram, e.g. the extraction efficiency versus the direction of emission of photons (kx,ky). As can be seen, square chips offer 5 extraction cones (one per face) yielding Cex=46%. Triangular chips offer 7 extraction cones (each vertical sidewall can extract in-plane light directly or after a bounce off another sidewall) yielding Cex=57%. These numbers pertain to realistic structures (including loss in the metals and GaN substrate) and do not integrated any surface roughening of the chip walls.



FIG. 11 illustrates the impact of sidewall roughening on light extraction efficiency, as predicted by modeling. For efficient sidewall roughness, the light extraction efficiency of a triangular chip can exceed 80% (versus 57% for smooth sidewalls).


In a specific embodiment, the present method provides for the singulation of thick GaN wafers into individual LED chips with lateral chip dimensions that are significantly smaller than those enabled by standard single-sided scribe methods. In other embodiments, the present method provides higher process yields at the scribe and break process steps than conventional methods. Additionally, there is a reduced incidence of chip-outs, as well as doublets (pairs of chips that are not separated during the break step). In other embodiments, the scribed regions may induce surface roughening on the side-walls of the generated LED chips which may enhance light extraction from the chips when compared to chips generated by scribing on a single side.


In other embodiments, the present method can also include other variations, combinations, and modifications, as described below.


1. The LED wafer may be a c-plane GaN wafer


2. An individual LED wafer may be scribed on at least one of the two surfaces using at least one of a plurality of scribe methods in other embodiments. The scribe methods may include at least two or more methods selected from laser scribing, diamond scribing, and sawing/dicing.


3. In a specific embodiment, the scribe depth on any one side of the LED wafer may be varied between 0.5% and 99.5% of the thickness of the LED wafer.


4. In an alternative embodiment, the scribed regions may have continuous scribe lines, or may comprise of dashed or dotted scribe lines. The scribed regions along two or more axes may or may not intersect in the regions defined by intersecting ‘scribe streets,’ by design according to a specific embodiment.


5. Also, scribing may be performed along at least one ‘scribe street’ orientation on a first surface, and along at least one ‘scribe street’ orientation on the second surface, such that at least two ‘scribe street’ orientations chosen are non-parallel according to a specific embodiment.


6. The scribed LED wafer may be broken using a method or a plurality of methods chosen from a group including anvil breaker, roller breaker or breaker bar, combinations, and the like.


While the above is a full description of the specific embodiments, various modifications, alternative constructions and equivalents may be used. The present specification describes one or more specific gallium and nitrogen containing surface orientations, but it would be recognized that any one of a plurality of family of plane orientations can be used. The above description and illustrations should not be taken as limiting the scope of the present invention which is defined by the appended claims.

Claims
  • 1. A lamp comprising: an light emitting diode (LED) device comprising at least: a gallium and nitrogen containing substrate having first, second, and third a-planes forming an equilateral triangle;a light-emitting epitaxial structure overlying said substrate;p-type metallized contact; andan n-type metallized contact;wherein said LED device comprises no more than five sides, wherein three sides of said five sides are along said first, second and third a-planes; and the remaining two sides of said five sides have a triangular shape and are configured from equivalent crystal planes.
  • 2. The lamp of claim 1, wherein the two sides are in parallel to each other.
  • 3. The lamp of claim 1, wherein at least one of the three surfaces is roughened.
  • 4. The lamp of claim 1, wherein said substrate comprises bulk GaN.
  • 5. The lamp of claim 1, wherein said equivalent crystal planes are c-planes.
  • 6. The lamp of claim 1, wherein said first, second and third sides are cleaved sides.
  • 7. The lamp of claim 6, wherein said first, second and third sides have striations along said a-planes.
  • 8. The lamp of claim 7, wherein said striations are perpendicular to said fourth and fifth sides.
  • 9. The lamp of claim 1, wherein said optical device has only five sides.
  • 10. A light emitting diode (LED) device comprising: a gallium and nitrogen containing substrate having first, second, and third a-planes forming a triangle; anda light-emitting epitaxial structure overlying said substrate;a p-type metallized contact; andn-type metallized contact;wherein said LED device comprises no more than five sides, wherein three of said five sides are along said first, second, and third a-planes, and the remaining two sides of said five sides have a triangular shape and are configured from equivalent crystal planes.
  • 11. The LED device of claim 10, wherein the equivalent crystal planes are c-planes.
  • 12. The LED device of claim 10, wherein the three surface regions are configured from respective scribes provided within a vicinity of respective a-planes.
  • 13. The LED device of claim 10, wherein the two surfaces are parallel to each other.
  • 14. The LED of claim 10, wherein at least one of the three surfaces is roughened.
  • 15. The LED device of claim 10, wherein said substrate comprises bulk GaN.
  • 16. The LED device of claim 15, wherein said light-emitting epitaxial structure comprises GaN.
  • 17. The LED device of claim 10, wherein said first, second and third sides are cleaved sides.
  • 18. The LED device of claim 17, wherein said first, second and third sides have striations along said a-planes.
  • 19. The LED device of claim 18, wherein said striations are perpendicular to said fourth and fifth sides.
  • 20. The LED device of claim 10, wherein said optical device has only five sides.
  • 21. A lamp comprising: an optical device comprising at least: a gallium and nitrogen containing substrate having first, second, and third a-planes forming an equilateral triangle; anda light-emitting epitaxial structure overlying said substrate;wherein said optical device comprises no more than five sides, wherein three sides of said five sides are along said first, second and third a-planes; and the remaining two sides of said five sides have a triangular shape and are configured from equivalent crystal planes, wherein said first, second and third sides are sufficiently rough to achieve a light extraction efficiency of over 80%.
  • 22. An optical device comprising: a gallium and nitrogen containing substrate having first, second and third a-planes forming a triangle; anda light-emitting epitaxial structure overlying said substrate;wherein said optical device comprises no more than five sides, wherein three of said five sides are along said first, second, and third a-planes, and the remaining two sides of said five sides have a triangular shape and are configured from equivalent crystal planes, wherein said first, second and third sides are sufficiently rough to achieve a light extraction efficiency of over 80%.
CROSS REFERENCE TO RELATED APPLICATIONS

This application claims priority to U.S. Provisional Application No. 61/436,155, filed Jan. 25, 2011; and is a continuation-in-part of U.S. application Ser. No. 13/163,432, filed Jun. 17, 2011; which claims priority to U.S. Provisional Application No. 61/356,473, filed Jun. 10, 2010, all of which are incorporated herein by reference for all purposes.

US Referenced Citations (336)
Number Name Date Kind
3647522 Single Mar 1972 A
4065688 Thornton Dec 1977 A
4870045 Gasper et al. Sep 1989 A
5331654 Jewell et al. Jul 1994 A
5366953 Char et al. Nov 1994 A
5607899 Yoshida et al. Mar 1997 A
5632812 Hirabayashi May 1997 A
5685885 Khandros et al. Nov 1997 A
5764674 Hibbs-Brenner et al. Jun 1998 A
5813753 Vriens et al. Sep 1998 A
5926493 O'Brien et al. Jul 1999 A
6069394 Hashimoto et al. May 2000 A
6072197 Horino et al. Jun 2000 A
6147953 Duncan Nov 2000 A
6195381 Botez et al. Feb 2001 B1
6335771 Hiraishi Jan 2002 B1
6379985 Cervantes et al. Apr 2002 B1
6498355 Harrah et al. Dec 2002 B1
6501154 Morita et al. Dec 2002 B2
6509651 Matsubara et al. Jan 2003 B1
6533874 Vaudo et al. Mar 2003 B1
6547249 Collins, III et al. Apr 2003 B2
6586762 Kozaki Jul 2003 B2
6639925 Niwa et al. Oct 2003 B2
6680959 Tanabe et al. Jan 2004 B2
6734461 Shiomi et al. May 2004 B1
6809781 Setlur et al. Oct 2004 B2
6858882 Tsuda et al. Feb 2005 B2
6860628 Robertson et al. Mar 2005 B2
6936488 D'Evelyn et al. Aug 2005 B2
6956246 Epler et al. Oct 2005 B1
7009199 Hall Mar 2006 B2
7012279 Wierer, Jr. et al. Mar 2006 B2
7019325 Li et al. Mar 2006 B2
7128849 Setlur et al. Oct 2006 B2
7285801 Eliashevich et al. Oct 2007 B2
7303630 Motoki et al. Dec 2007 B2
7341880 Erchak et al. Mar 2008 B2
7348600 Narukawa et al. Mar 2008 B2
7358542 Radkov et al. Apr 2008 B2
7358543 Chua et al. Apr 2008 B2
7390359 Miyanaga et al. Jun 2008 B2
7419281 Porchia et al. Sep 2008 B2
7470555 Matsumura Dec 2008 B2
7470938 Lee et al. Dec 2008 B2
7483466 Uchida et al. Jan 2009 B2
7489441 Scheible et al. Feb 2009 B2
7491984 Koike et al. Feb 2009 B2
7518159 Masui et al. Apr 2009 B2
7566639 Kohda Jul 2009 B2
7598104 Teng et al. Oct 2009 B2
7622742 Kim et al. Nov 2009 B2
7733571 Li Jun 2010 B1
7772585 Uematsu et al. Aug 2010 B2
7816238 Osada et al. Oct 2010 B2
7858408 Mueller et al. Dec 2010 B2
7862761 Okushima et al. Jan 2011 B2
7871839 Lee et al. Jan 2011 B2
7884538 Mitsuishi et al. Feb 2011 B2
7923741 Zhai et al. Apr 2011 B1
7976630 Poblenz et al. Jul 2011 B2
8044412 Murphy et al. Oct 2011 B2
8142566 Kiyomi et al. Mar 2012 B2
8148801 D'Evelyn Apr 2012 B2
8188504 Lee May 2012 B2
8198643 Lee et al. Jun 2012 B2
8207548 Nagai Jun 2012 B2
8207554 Shum Jun 2012 B2
D662899 Shum et al. Jul 2012 S
D662900 Shum et al. Jul 2012 S
8247886 Sharma et al. Aug 2012 B1
8247887 Raring et al. Aug 2012 B1
8252662 Poblenz et al. Aug 2012 B1
8269245 Shum Sep 2012 B1
8293551 Sharma et al. Oct 2012 B2
8299473 D'Evelyn et al. Oct 2012 B1
8304265 Nakamura et al. Nov 2012 B2
8310143 Van De Ven et al. Nov 2012 B2
8314429 Raring et al. Nov 2012 B1
8324835 Shum et al. Dec 2012 B2
8350273 Vielemeyer Jan 2013 B2
8351478 Raring et al. Jan 2013 B2
8355418 Raring et al. Jan 2013 B2
8455894 D'Evelyn et al. Jun 2013 B1
8477259 Kubota et al. Jul 2013 B2
8502465 Katona et al. Aug 2013 B2
8524578 Raring et al. Sep 2013 B1
8575728 Raring et al. Nov 2013 B1
8597967 Krames et al. Dec 2013 B1
8686431 Batres et al. Apr 2014 B2
8786053 D'Evelyn et al. Jul 2014 B2
8791499 Sharma et al. Jul 2014 B1
20010009134 Kim et al. Jul 2001 A1
20010043042 Murazaki et al. Nov 2001 A1
20010048114 Morita et al. Dec 2001 A1
20010055208 Kimura Dec 2001 A1
20020027933 Tanabe et al. Mar 2002 A1
20020050488 Nikitin et al. May 2002 A1
20020070416 Morse et al. Jun 2002 A1
20020096994 Iwafuchi et al. Jul 2002 A1
20020105986 Yamasaki Aug 2002 A1
20020127824 Shelton et al. Sep 2002 A1
20020155691 Lee et al. Oct 2002 A1
20020182768 Morse et al. Dec 2002 A1
20020190260 Shen et al. Dec 2002 A1
20030000453 Unno et al. Jan 2003 A1
20030001238 Ban Jan 2003 A1
20030020087 Goto et al. Jan 2003 A1
20030045042 Biwa et al. Mar 2003 A1
20030047076 Liu Mar 2003 A1
20030080345 Motoki et al. May 2003 A1
20030164507 Edmond et al. Sep 2003 A1
20030178617 Appenzeller et al. Sep 2003 A1
20030216011 Nakamura et al. Nov 2003 A1
20040051107 Nagahama Mar 2004 A1
20040070004 Eliashevich et al. Apr 2004 A1
20040080256 Hampden-Smith et al. Apr 2004 A1
20040104391 Maeda et al. Jun 2004 A1
20040109486 Kinoshita Jun 2004 A1
20040116033 Ouderkirk et al. Jun 2004 A1
20040124435 D'Evelyn et al. Jul 2004 A1
20040161222 Niida et al. Aug 2004 A1
20040196877 Kawakami et al. Oct 2004 A1
20040207998 Suehiro et al. Oct 2004 A1
20040238810 Dwilinski Dec 2004 A1
20040245543 Yoo Dec 2004 A1
20040251471 Dwilinski et al. Dec 2004 A1
20050001227 Niki et al. Jan 2005 A1
20050012446 Jermann et al. Jan 2005 A1
20050045894 Okuyama et al. Mar 2005 A1
20050082544 Narukawa Apr 2005 A1
20050087753 D'Evelyn et al. Apr 2005 A1
20050109240 Maeta et al. May 2005 A1
20050121679 Nagahama et al. Jun 2005 A1
20050140270 Henson et al. Jun 2005 A1
20050167680 Shei et al. Aug 2005 A1
20050199899 Lin et al. Sep 2005 A1
20050214992 Chakraborty et al. Sep 2005 A1
20050224830 Blonder et al. Oct 2005 A1
20050230701 Huang Oct 2005 A1
20050232327 Nomura et al. Oct 2005 A1
20050263791 Yanagihara et al. Dec 2005 A1
20060038542 Park et al. Feb 2006 A1
20060060131 Atanackovic Mar 2006 A1
20060060872 Edmond et al. Mar 2006 A1
20060077795 Kitahara et al. Apr 2006 A1
20060079082 Bruhns et al. Apr 2006 A1
20060118799 D'Evelyn et al. Jun 2006 A1
20060163589 Fan et al. Jul 2006 A1
20060166390 Letertre et al. Jul 2006 A1
20060169993 Fan et al. Aug 2006 A1
20060186418 Edmond et al. Aug 2006 A1
20060189098 Edmond Aug 2006 A1
20060204865 Erchak et al. Sep 2006 A1
20060205199 Baker et al. Sep 2006 A1
20060213429 Motoki et al. Sep 2006 A1
20060214287 Ogihara et al. Sep 2006 A1
20060255343 Ogihara et al. Nov 2006 A1
20060256482 Araki et al. Nov 2006 A1
20060273339 Steigerwald et al. Dec 2006 A1
20060288928 Eom et al. Dec 2006 A1
20070045200 Moon et al. Mar 2007 A1
20070054476 Nakahata et al. Mar 2007 A1
20070062440 Sato et al. Mar 2007 A1
20070072324 Krames et al. Mar 2007 A1
20070093073 Farrell, Jr. et al. Apr 2007 A1
20070096239 Cao et al. May 2007 A1
20070105351 Motoki et al. May 2007 A1
20070114569 Wu et al. May 2007 A1
20070121690 Fujii et al. May 2007 A1
20070131967 Kawaguchi et al. Jun 2007 A1
20070164292 Okuyama Jul 2007 A1
20070202624 Yoon et al. Aug 2007 A1
20070210074 Maurer et al. Sep 2007 A1
20070217462 Yamasaki Sep 2007 A1
20070228404 Tran et al. Oct 2007 A1
20070231978 Kanamoto et al. Oct 2007 A1
20070264733 Choi et al. Nov 2007 A1
20070280320 Feezell et al. Dec 2007 A1
20070290224 Ogawa Dec 2007 A1
20080023691 Jang et al. Jan 2008 A1
20080030976 Murazaki et al. Feb 2008 A1
20080054290 Shieh et al. Mar 2008 A1
20080073660 Ohno et al. Mar 2008 A1
20080083741 Giddings et al. Apr 2008 A1
20080083929 Fan et al. Apr 2008 A1
20080087919 Tysoe et al. Apr 2008 A1
20080099777 Erchak et al. May 2008 A1
20080106212 Yen et al. May 2008 A1
20080121906 Yakushiji May 2008 A1
20080121913 McKenzie et al. May 2008 A1
20080128752 Wu Jun 2008 A1
20080142781 Lee Jun 2008 A1
20080164489 Schmidt et al. Jul 2008 A1
20080164578 Tanikella et al. Jul 2008 A1
20080173884 Chitnis et al. Jul 2008 A1
20080179607 DenBaars et al. Jul 2008 A1
20080179610 Okamoto et al. Jul 2008 A1
20080191192 Feezell et al. Aug 2008 A1
20080191223 Nakamura et al. Aug 2008 A1
20080194054 Lin et al. Aug 2008 A1
20080198881 Farrell et al. Aug 2008 A1
20080210958 Senda et al. Sep 2008 A1
20080211416 Negley et al. Sep 2008 A1
20080217745 Miyanaga et al. Sep 2008 A1
20080230765 Yoon et al. Sep 2008 A1
20080237569 Nago et al. Oct 2008 A1
20080261381 Akiyama et al. Oct 2008 A1
20080272463 Butcher et al. Nov 2008 A1
20080282978 Butcher et al. Nov 2008 A1
20080283851 Akita Nov 2008 A1
20080284346 Lee Nov 2008 A1
20080285609 Ohta et al. Nov 2008 A1
20080291961 Kamikawa et al. Nov 2008 A1
20080298409 Yamashita et al. Dec 2008 A1
20080303033 Brandes Dec 2008 A1
20090028204 Hiroyama et al. Jan 2009 A1
20090032828 Romano et al. Feb 2009 A1
20090058532 Kikkawa et al. Mar 2009 A1
20090065798 Masui et al. Mar 2009 A1
20090071394 Nakahata et al. Mar 2009 A1
20090072252 Son et al. Mar 2009 A1
20090078944 Kubota et al. Mar 2009 A1
20090078955 Fan et al. Mar 2009 A1
20090081857 Hanser et al. Mar 2009 A1
20090086475 Caruso et al. Apr 2009 A1
20090095973 Tanaka et al. Apr 2009 A1
20090140279 Zimmerman et al. Jun 2009 A1
20090146170 Zhong et al. Jun 2009 A1
20090155989 Uematsu et al. Jun 2009 A1
20090194796 Hashimoto et al. Aug 2009 A1
20090206354 Kitano et al. Aug 2009 A1
20090227056 Kyono et al. Sep 2009 A1
20090250686 Sato et al. Oct 2009 A1
20090252191 Kubota et al. Oct 2009 A1
20090267098 Choi Oct 2009 A1
20090267100 Miyake et al. Oct 2009 A1
20090273005 Lin Nov 2009 A1
20090309110 Raring et al. Dec 2009 A1
20090309127 Raring et al. Dec 2009 A1
20090315480 Yan et al. Dec 2009 A1
20090321745 Kinoshita et al. Dec 2009 A1
20090321778 Chen et al. Dec 2009 A1
20100001300 Raring et al. Jan 2010 A1
20100006873 Raring et al. Jan 2010 A1
20100006876 Moteki et al. Jan 2010 A1
20100025656 Raring et al. Feb 2010 A1
20100032691 Kim Feb 2010 A1
20100055819 Ohba et al. Mar 2010 A1
20100067241 Lapatovich et al. Mar 2010 A1
20100096615 Okamoto et al. Apr 2010 A1
20100108985 Chung et al. May 2010 A1
20100109030 Krames et al. May 2010 A1
20100117101 Kim et al. May 2010 A1
20100117106 Trottier May 2010 A1
20100117118 Dabiran et al. May 2010 A1
20100140634 van de Ven et al. Jun 2010 A1
20100148145 Ishibashi et al. Jun 2010 A1
20100149814 Zhai et al. Jun 2010 A1
20100155746 Ibbetson et al. Jun 2010 A1
20100195687 Okamoto et al. Aug 2010 A1
20100200837 Zimmerman et al. Aug 2010 A1
20100219505 D'Evelyn Sep 2010 A1
20100220262 DeMille et al. Sep 2010 A1
20100240158 Ter-Hovhannissian Sep 2010 A1
20100264446 Niki Oct 2010 A1
20100276663 Enya et al. Nov 2010 A1
20100290208 Pickard Nov 2010 A1
20100295054 Okamoto et al. Nov 2010 A1
20100295088 D'Evelyn et al. Nov 2010 A1
20100302464 Raring et al. Dec 2010 A1
20100309943 Chakraborty et al. Dec 2010 A1
20100316075 Raring et al. Dec 2010 A1
20110017298 Lee Jan 2011 A1
20110031508 Hamaguchi et al. Feb 2011 A1
20110056429 Raring et al. Mar 2011 A1
20110057167 Ueno et al. Mar 2011 A1
20110062415 Ohta et al. Mar 2011 A1
20110064100 Raring et al. Mar 2011 A1
20110064101 Raring et al. Mar 2011 A1
20110064102 Raring et al. Mar 2011 A1
20110064103 Ohta et al. Mar 2011 A1
20110075694 Yoshizumi et al. Mar 2011 A1
20110100291 D'Evelyn May 2011 A1
20110101400 Chu et al. May 2011 A1
20110101414 Thompson et al. May 2011 A1
20110103418 Hardy et al. May 2011 A1
20110108081 Werthen et al. May 2011 A1
20110121331 Simonian et al. May 2011 A1
20110124139 Chang May 2011 A1
20110175200 Yoshida Jul 2011 A1
20110177631 Gardner et al. Jul 2011 A1
20110180781 Raring et al. Jul 2011 A1
20110182056 Trottier et al. Jul 2011 A1
20110186860 Enya et al. Aug 2011 A1
20110186874 Shum Aug 2011 A1
20110186887 Trottier et al. Aug 2011 A1
20110188530 Lell et al. Aug 2011 A1
20110204378 Su et al. Aug 2011 A1
20110216795 Hsu et al. Sep 2011 A1
20110220912 D'Evelyn Sep 2011 A1
20110247556 Raring et al. Oct 2011 A1
20110256693 D'Evelyn et al. Oct 2011 A1
20110262773 Poblenz et al. Oct 2011 A1
20110266552 Tu et al. Nov 2011 A1
20110279054 Katona et al. Nov 2011 A1
20110281422 Wang et al. Nov 2011 A1
20110315999 Sharma et al. Dec 2011 A1
20110317397 Trottier et al. Dec 2011 A1
20120000415 D'Evelyn et al. Jan 2012 A1
20120007102 Feezell et al. Jan 2012 A1
20120043552 David et al. Feb 2012 A1
20120073494 D'Evelyn Mar 2012 A1
20120091465 Krames et al. Apr 2012 A1
20120104412 Zhong et al. May 2012 A1
20120118223 D'Evelyn May 2012 A1
20120135553 Felker et al. May 2012 A1
20120137966 D'Evelyn et al. Jun 2012 A1
20120178215 D'Evelyn Jul 2012 A1
20120187412 D'Evelyn et al. Jul 2012 A1
20120199841 Batres et al. Aug 2012 A1
20120199952 D'Evelyn et al. Aug 2012 A1
20120235201 Shum Sep 2012 A1
20120288974 Sharma et al. Nov 2012 A1
20130016750 Raring et al. Jan 2013 A1
20130022064 Raring et al. Jan 2013 A1
20130022758 Trottier Jan 2013 A1
20130044782 Raring Feb 2013 A1
20130064261 Sharma et al. Mar 2013 A1
20130112987 Fu et al. May 2013 A1
20130126902 Isozaki et al. May 2013 A1
20130234108 David et al. Sep 2013 A1
20140103356 Krames et al. Apr 2014 A1
20140175492 Steranka et al. Jun 2014 A1
20140346524 Batres et al. Nov 2014 A1
20140346546 D'Evelyn et al. Nov 2014 A1
Foreign Referenced Citations (22)
Number Date Country
0961328 Dec 1999 EP
2381490 Oct 2011 EP
06-334215 Dec 1994 JP
1997-036430 Feb 1997 JP
1997-082587 Mar 1997 JP
11-340507 Dec 1999 JP
1999-340507 Dec 1999 JP
1999-340576 Dec 1999 JP
2001-160627 Jun 2001 JP
2001-177146 Jun 2001 JP
2002-185085 Jun 2002 JP
2003-031844 Jan 2003 JP
2000-294883 Feb 2004 JP
2006-173621 Jun 2006 JP
2007-110090 Apr 2007 JP
2008-084973 Apr 2008 JP
2008-172040 Jul 2008 JP
2008-311640 Dec 2008 JP
2009-21824 Jan 2009 JP
WO 2006062880 Jun 2006 WO
WO 2009001039 Dec 2008 WO
WO 2010138923 Feb 2010 WO
Non-Patent Literature Citations (131)
Entry
Cich et al., ‘Bulk GaN based violet light-emitting diodes with high efficiency at very high current density’, Applied Physics Letters, 101, Nov. 29, 2012, pp. 223509-1-223509-3.
USPTO Notice of Allowance for U.S. Appl. No. 12/720,593 dated Jul. 11, 2012.
USPTO Office Action for U.S. Appl. No. 12/749,476 dated Apr. 11, 2011.
USPTO Office Action for U.S. Appl. No. 12/749,476 dated Nov. 8, 2011.
USPTO Notice of Allowance for U.S. Appl. No. 12/749,476 dated May 4, 2012.
USPTO Notice of Allowance for U.S. Appl. No. 12/749,476 dated Jun. 26, 2012.
USPTO Office Action for U.S. Appl. No. 12/861,765 dated Jul. 2, 2012.
USPTO Office Action for U.S. Appl. No. 12/880,889 dated Sep. 19, 2012.
USPTO Office Action for U.S. Appl. No. 12/936,238 dated Aug. 30, 2012.
USPTO Office Action for U.S. Appl. No. 13/465,976 dated Aug. 16, 2012.
Iso et al., ‘High Brightness Blue InGaN/GaN Light Emitting Diode on Nonpolar m-Plane Bulk GaN Substrate,’ Japanese Journal of Applied Physics, 2007, vol. 46, No. 40, pp. L960-L962.
USPTO Office Action for U.S. Appl. No. 12/569,841 dated Dec. 23, 2011.
USPTO Office Action for U.S. Appl. No. 12/569,844 dated Oct. 12, 2012.
USPTO Notice of Allowance for U.S. Appl. No. 12/569,844 dated Mar. 7, 2013.
USPTO Notice of Allowance for U.S. Appl. No. 12/754,886 dated May 17, 2012.
USPTO Notice of Allowance for U.S. Appl. No. 12/754,886 dated Jun. 5, 2012.
USPTO Notice of Allowance for U.S. Appl. No. 12/754,886 dated Jun. 20, 2012.
USPTO Office Action for U.S. Appl. No. 12/861,765 dated Mar. 7, 2013.
USPTO Office Action for U.S. Appl. No. 12/936,238 dated Jan. 30, 2013.
USPTO Office Action for U.S. Appl. No. 13/025,833 dated Jul. 12, 2012.
USPTO Office Action for U.S. Appl. No. 13/179,346 dated Aug. 17, 2012.
USPTO Office Action for U.S. Appl. No. 13/179,346 dated Dec. 13, 2012.
Motoki et al., ‘Dislocation reduction in GaN crystal by advanced-DEEP’, Journal of Crystal Growth, vol. 305, Apr. 1, 2007, pp. 377-383.
USPTO Office Action for U.S. Appl. No. 12/569,841 dated Feb. 14, 2014, 20 pages.
USPTO Office Action for U.S. Appl. No. 13/012,674 dated Jan. 17, 2014, 15 pages.
Benke et al., ‘Uncertainty in Health Risks from Artificial Lighting due to Disruption of Circadian Rythm and Melatonin Secretion: A Review’, Human and Ecological Risk Assessment: An International Journal, vol. 19, No. 4, 2013, pp. 916-929.
Hanifin et al., ‘Photoreception for Circadian, Neuroendocrine, and Neurobehavioral Regulation’, Journal of Physiological Anthropology, vol. 26, 2007, pp. 87-94.
International Search Report & Written Opinion of PCT Application No. PCT/US2013/029453, dated Jul. 25, 2013, 11 pages total.
http://www.philipslumileds.com/products/luxeon-flash, ‘LUXEON Flash’, Philips Lumileds, Aug. 8, 2013, pp. 1-2.
Rea et al., ‘White Lighting’, COLOR Research and Application, vol. 38, No. 2, Sep. 3, 2011, pp. 82-92.
USPTO Office Action for U.S. Appl. No. 12/569,841 dated Aug. 13, 2013, 21 pages.
USPTO Office Action for U.S. Appl. No. 12/861,765 dated Sep. 17, 2013, 10 pages.
USPTO Office Action for U.S. Appl. No. 13/281,221 dated Jun. 21, 2013, 6 pages.
Kim et al., ‘High Brightness Light Emitting Diodes Using Dislocation-Free Indium Gallium Nitride/Gallium Nitride Multiquantum-Well Nanorod Arrays’, Nano Letters, vol. 4, No. 6, 2004, pp. 1059-1062.
Communication from the Korean Patent Office re 10-2012-7009980, dated Apr. 15, 2013.
USPTO Office Action for U.S. Appl. No. 12/569,841 dated Mar. 26, 2013.
USPTO Office Action for U.S. Appl. No. 12/749,466 dated Jul. 3, 2012.
USPTO Notice of Allowance for U.S. Appl. No. 12/936,238 dated Apr. 16, 2013.
USPTO Office Action for U.S. Appl. No. 13/019,897 dated Jan. 16, 2013.
USPTO Office Action for U.S. Appl. No. 13/328,978 dated May 15, 2013.
USPTO Office Action for U.S. Appl. No. 13/465,976 dated Dec. 20, 2012.
International Search Report for PCT application PCT/US2011/41106 (Jan. 5, 2012).
Aguilar, ‘Ohmic n-contacts to Gallium Nitride Light Emitting Diodes’, National Nanotechnologhy Infrastructure Network, 2007, p. 56-81.
Baker et al., ‘Characterization of Planar Semipolar Gallium Nitride Films on Spinel Substrates’, Japanese Journal of Applied Physics, vol. 44, No. 29, 2005, p. L920-L922.
Founta et al., ‘Anisotropic Morphology of Nonpolar a-Plane GaN Quantum Dots and Quantum Wells’, Journal of Applied Physics, vol. 102, vol. 7, 2007, p. 074304-1-074304-6.
Lu et al., ‘Etch-Pits of GaN Films with Different Etching Methods’, Journal of the Korean Physical Society, vol. 45, Dec. 2004, p. S673-S675.
Rickert et al., ‘n-GaN Surface Treatments for Metal Contacts Studied Via X-ray Photoemission Spectroscopy’, Applied Physics Letters, vol. 80, No. 2, Jan. 14, 2002, p. 204-206.
Sato et al., ‘High Power and High Efficiency Semipolar InGaN Light Emitting Diodes’, Journal of Light and Visible Environment, vol. 32, No. 2, Dec. 13, 2007, p. 57-60.
Sato et al., ‘Optical Properties of Yellow Light-Emitting Diodes Grown on Semipolar (1122) Bulk GaN Substrate’, Applied Physics Letters, vol. 92, No. 22, 2008, p. 221110-1-221110-3.
Selvanathan et al., ‘Investigation of Surface Treatment Schemes on n-type GaN and Al0.20Ga0.80N’, Journal of Vacuum Science and Technology B, vol. 23, No. 6, May 10, 2005, p. 2538-2544.
Semendy et al., ‘Observation and Study of Dislocation Etch Pits in Molecular Beam Epitaxy Grown Gallium Nitride with the use of Phosphoric Acid and Molten Potassium Hydroxide’, Army Research Laboratory, Jun. 2007, 18 pages.
Communication from the Japanese Patent Office re 2012-529969, dated Oct. 15, 2013, (6 pages).
Weaver et al., ‘Optical Properties of Selected Elements’, Handbook of Chemistry and Physics, 94th Edition, 2013-2014, p. 12-126-12-150.
USPTO Office Action for U.S. Appl. No. 12/491,169 dated Oct. 22, 2010 (9 pages).
USPTO Office Action for U.S. Appl. No. 12/491,169 dated May 11, 2011 (9 pages).
USPTO Office Action for U.S. Appl. No. 12/497,289 dated Feb. 2, 2012 (6 pages).
USPTO Notice of Allowance for U.S. Appl. No. 12/497,289 dated May 22, 2012 (7 pages).
USPTO Office Action for U.S. Appl. No. 12/785,953 dated Apr. 12, 2012 (11 pages).
USPTO Office Action for U.S. Appl. No. 12/785,953 dated Jan. 11, 2013 (14 pages).
USPTO Office Action for U.S. Appl. No. 12/785,953 dated Oct. 3, 2013 (10 pages).
USPTO Office Action for U.S. Appl. No. 12/880,803 dated Feb. 22, 2012 (8 pages).
USPTO Notice of Allowance for U.S. Appl. No. 12/880,803 dated Jul. 18, 2012 (5 pages).
USPTO Office Action for U.S. Appl. No. 12/995,946 dated Jan. 29, 2013 (25 pages).
USPTO Office Action for U.S. Appl. No. 12/995,946 dated Aug. 2, 2013 (15 pages).
USPTO Office Action for U.S. Appl. No. 13/019,897 dated Dec. 2, 2013 (17 pages).
USPTO Notice of Allowance for U.S. Appl. No. 13/281,221 dated Nov. 12, 2013 (10 pages).
USPTO Office Action for U.S. Appl. No. 13/328,978 dated Sep. 26, 2013 (25 pages).
USPTO Office Action for U.S. Appl. No. 13/548,635 dated Jun. 14, 2013 (5 pages).
USPTO Notice of Allowance for U.S. Appl. No. 13/548,635 dated Sep. 16, 2013 (6 pages).
USPTO Office Action for U.S. Appl. No. 13/548,770 dated Mar. 12, 2013 (5 pages).
USPTO Notice of Allowance for U.S. Appl. No. 13/548,770 dated Jun. 25, 2013 (6 pages).
USPTO Office Action for U.S. Appl. No. 13/629,366 dated Oct. 31, 2013 (7 pages).
USPTO Office Action for U.S. Appl. No. 13/723,968 dated Nov. 29, 2013 (23 pages).
Mastro et al., ‘Hydride vapor phase epitaxy-grown AlGaN/GaN high electron mobility transistors’, Solid-State Electronics, vol. 47, Issue 6, Jun. 2003, pp. 1075-1079.
Morkoc, ‘Handbook of Nitride Semiconductors and Devices’, vol. 1, 2008, p. 704.
USPTO Office Action for U.S. Appl. No. 13/014,622 dated Jun. 20, 2014 (15 pages).
USPTO Notice of Allowance for U.S. Appl. No. 13/304,182 dated Aug. 27, 2014 (8 pages).
USPTO Office Action for U.S. Appl. No. 13/465,976 dated Aug. 25, 2014 (21 pages).
USPTO Office Action for U.S. Appl. No. 13/553,691 dated Sep. 17, 2014 (14 pages).
USPTO Office Action for U.S. Appl. No. 14/054,234 dated Aug. 14, 2014 (24 pages).
Farrell et al., ‘Continuous-Wave Operation of AIGaN-Cladding-Free Nonpolar m-Plane InGaN/GaN Laser Diodes’, 2007, Japanese Journal of Applied Physics, vol. 46, No. 32, 2007, p. L761-L763.
Feezell et al., ‘AIGaN-Cladding-Free Nonpolar InGaN/GaN Laser Diodes’, Japanese Journal of Applied Physics, vol. 46, No. 13, 2007, p. L284-L286.
Haskell et al., ‘Defect Reduction in (1100) m-plane gallium nitride via lateral epitaxial overgrowth by hydride vapor phase epitaxy’, Applied Physics Letters 86, 111917, 2005, p. 1-3.
Kojima et al., ‘Stimulated Emission at 474 nm From an InGaN Laser Diode Structure Grown on a (1122) GaN Substrate’, Applied Physics Letters, vol. 91, 2007, p. 251107-251107-3.
Kubota et al., ‘Temperature Dependence of Polarized Photoluminescence From Nonpolar m-Plane InGaN Multiple Quantum Wells for Blue Laser Diodes’, Applied Physics Letter, vol. 92, 2008, p. 011920-1-011920-3.
PCT Communication Including Partial Search and Examination Report for PCT/US2011/041106, dated Oct. 4, 2011, 4 pages total.
International Search Report of PCT Application No. PCT/US2011/041106, dated Jan. 5, 2012, 4 pages total.
Tsuda et al., ‘Blue Laser Diodes Fabricated on m-Plane GaN Substrates’, Applied Physics Express, vol. 1, 2008, pp. 011104-1-011104-3.
Tyagi et al., ‘Semipolar (1011) InGaN/GaN Laser Diodes on Bulk GaN Substrates’, Japanese Journal of Applied Physics, vol. 46, No. 19, 2007, p. L444-L445.
USPTO Office Action for U.S. Appl. No. 12/478,736 dated Feb. 7, 2012 (6 pages).
USPTO Office Action for U.S. Appl. No. 12/481,543 dated Jun. 27, 2011 (9 pages).
USPTO Office Action for U.S. Appl. No. 12/634,665 dated Mar. 12, 2012 (9 pages).
USPTO Notice of Allowance for U.S. Appl. No. 12/785,953 dated Mar. 20, 2014 (8 pages).
USPTO Office Action for U.S. Appl. No. 12/861,765 dated Mar. 28, 2014 (12 pages).
USPTO Office Action for U.S. Appl. No. 12/879,784 dated Jan. 25, 2012 (6 pages).
USPTO Notice of Allowance for U.S. Appl. No. 12/879,784 dated Apr. 3, 2012 (7 pages).
USPTO Office Action for U.S. Appl. No. 12/880,889 dated Feb. 27, 2012 (12 pages).
USPTO Office Action for U.S. Appl. No. 12/995,946 dated Mar. 28, 2012 (17 pages).
USPTO Notice of Allowance for U.S. Appl. No. 13/012,674 dated Apr. 30, 2014 (8 pages).
USPTO Office Action for U.S. Appl. No. 13/014,622 dated Nov. 28, 2011 (13 pages).
USPTO Office Action for U.S. Appl. No. 13/014,622 dated Apr. 30, 2012 (13 pages).
USPTO Office Action for U.S. Appl. No. 13/019,897 dated Mar. 30, 2012 (14 pages).
USPTO Office Action for U.S. Appl. No. 13/019,897 dated Jun. 12, 2014 (8 pages).
USPTO Notice of Allowance for U.S. Appl. No. 13/163,482 dated Jul. 31, 2012 (5 pages).
USPTO Office Action for U.S. Appl. No. 13/304,182 dated May 9, 2014 (12 pages).
USPTO Office Action for U.S. Appl. No. 13/629,366 dated Apr. 18, 2014 (7 pages).
Enya, ‘531nm Green Lasing of InGaN Based Laser Diodes on Semi-Polar {20-21} Free-Standing GaN Substrates’, Applied Physics Express, Jul. 17, 2009, vol. 2, pp. 082101.
Fujii et al., ‘Increase in the Extraction Efficiency of GaN-Based Light-Emitting Diodes Via Surface Roughening’, 2Applied Physics Letters, vol. 84, No. 6, 2004, pp. 855-857.
Kendall et al., ‘Energy Savings Potential of Solid State Lighting in General Lighting Applications’, Report for the Department of Energy, 2001, pp. 1-35.
International Search Report of PCT Application No. PCT/US2011/023622, dated Apr. 1, 2011, 2 pages total.
International Preliminary Report & Written Opinion of PCT Application No. PCT/US2011/037792, dated Dec. 6, 2012, 8 pages total.
Schmidt et al., ‘High Power and High External Efficiency m-Plane InGaN Light Emitting Diodes’, Japanese Journal of Applied Physics, vol. 46, No. 7, 2007, pp. L126-L128.
Shchekin et al., ‘High Performance Thin-film Flip-Chip InGaN—GaN Light-Emitting Diodes’, Applied Physics Letters, vol. 89, 2006, pp. 071109-1-071109-3.
Tyagi et al., ‘High Brightness Violet InGaN/GaN Light Emitting Diodes on Semipolar (1011) Bulk GaN Substrates’, Japanese Journal of Applied Physics, vol. 46, No. 7, 2007, pp. L129-L131.
Communication from the German Patent Office re 11 2010 003 697.7 dated Apr. 11, 2013, (6 pages).
Communication from the Japanese Patent Office re 2012-529905 dated Apr. 19, 2013, (4 pages).
Communication from the Chinese Patent Office re 201180029188.7 dated Sep. 29, 2014 (7 pages).
Communication from the Japanese Patent Office re 2013-515583 dated Sep. 12, 2014 (4 pages).
Wierer et al., ‘High-Power AlGaInN Flip-Chip Light-Emitting Diodes’, Applied Physics Letters, vol. 78, No. 22, 2001, pp. 3379-3381.
Yamaguchi, ‘Anisotropic Optical Matrix Elements in Strained GaN-Quantum Wells With Various Substrate Orientations’, Physica Status Solidi (PSS), vol. 5, No. 6, 2008, pp. 2329-2332.
Yoshizumi et al., ‘Continuous-Wave Operation of 520nm Green InGaN-Based Laser Diodes on Semi-Polar {2021} GaN Substrates’, Applied Physics Express, vol. 2, 2009, pp. 092101-1-092101-3.
USPTO Office Action for U.S. Appl. No. 12/883,652 dated Jan. 11, 2013 (11 pages).
USPTO Office Action for U.S. Appl. No. 12/942,817 dated Feb. 20, 2013 (11 pages).
USPTO Office Action for U.S. Appl. No. 13/019,897 dated Dec. 5, 2014 (18 pages).
USPTO Notice of Allowance for U.S. Appl. No. 13/108,645 dated Jan. 28, 2013 (8 pages).
USPTO Office Action for U.S. Appl. No. 13/291,922 dated Feb. 20, 2013 (9 pages).
USPTO Notice of Allowance for U.S. Appl. No. 13/425,304 dated Aug. 22, 2012 (7 pages).
USPTO Office Action for U.S. Appl. No. 13/425,354 dated Feb. 14, 2013 (12 pages).
USPTO Office Action for U.S. Appl. No. 13/606,894 dated Feb. 5, 2013 (7 pages).
USPTO Office Action for U.S. Appl. No. 14/181,386 dated Oct. 28, 2014 (10 pages).
USPTO Notice of Allowance for U.S. Appl. No. 14/301,520 dated Nov. 25, 2014 (8 pages).
Related Publications (1)
Number Date Country
20130026483 A1 Jan 2013 US
Provisional Applications (2)
Number Date Country
61436115 Jan 2011 US
61356473 Jun 2010 US
Continuation in Parts (1)
Number Date Country
Parent 13163482 Jun 2011 US
Child 13357578 US