A gas-barrier film comprising a gas-barrier laminate on a substrate film, wherein the gas-barrier laminate comprises at least one three-layer unit consisting of a silicon oxinitride layer, an organic interlayer and a silicon oxinitride layer disposed in this order being adjacent with each other. The film has excellent transparency, gas-barrier performance and bending resistance.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is an explanatory view showing an inductively-coupled plasma CVD device used for producing samples Nos. 1 to 14, 16 and 17.
FIG. 2 is an explanatory view showing a sputtering device used for producing samples Nos. 15, and 18 to 20.
Claims
1. A gas-barrier film comprising a substrate film and a gas-barrier laminate on the substrate film, wherein the gas-barrier laminate comprises at least one three-layer unit consisting of a silicon oxinitride layer, an organic interlayer and a silicon oxinitride layer disposed in this order being adjacent with each other.
2. The gas-barrier film according to claim 1, which has a water-vapor permeability at 40° C. and a relative humidity 90% of at most 0.01 g/m2·day.
3. The gas-barrier film according to claim 1, wherein the substrate film comprises a polymer having a glass transition temperature of 120° C. or higher.
4. The gas-barrier film according to claim 1, wherein the organic interlayer comprises silicon and oxygen.
5. The gas-barrier film according to claim 4, wherein at least one layer of the silicon oxinitride layers or the organic interlayer is formed through inductively-coupled plasma CVD.
6. The gas-barrier film according to claim 1, wherein the constitution ratio of oxygen to nitrogen (oxygen/nitrogen) in at least one layer of the silicon oxinitride layers is from 0.2 to 5.
7. The gas-barrier film according to claim 6, wherein the organic interlayer contains silicon.
8. The gas-barrier film according to claim 6, wherein the organic interlayer comprises a cured acrylate compound.
9. The gas-barrier film according to claim 1, which comprises a transparent conductive layer on the gas-barrier laminate.
10. The gas-barrier film according to claim 1, which is produced according to a process where the substrate film is fed in a roll-to-roll system and the gas-barrier laminate is continuously formed thereon.
11. A substrate film for image display devices, which comprises the gas-barrier film of claim 1.
12. An organic electroluminescent device, which comprises the substrate film for image display devices of claim 11.
13. An organic electroluminescent device fabricated by forming a film of the organic electroluminescent device of claim 12, then providing, in an vacuum not exposing it to air, at least one three-layer unit consisting of a silicon oxinitride layer, an organic interlayer and a silicon oxinitride layer disposed in this order being adjacent with each other, and sealing it up.
Patent Application
20070224430
