The present invention relates to apparatus for, and a method of, combusting a plurality of exhaust gases.
A primary step in the fabrication of semiconductor devices is the formation of a thin film on a semiconductor substrate by chemical reaction of vapour precursors. One known technique for depositing a thin film on a substrate is chemical vapour deposition (CVD). In this technique, process gases are supplied to a process chamber housing the substrate and react to form a thin film over the surface of the substrate. For example, silane is commonly used as a source of silicon, and ammonia is used as a source of nitrogen.
CVD deposition is not restricted to the surface of the substrate, and this can result, for example, in the clogging of gas nozzles and the clouding of chamber windows. In addition, particulates may be formed, which can fall on the substrate and cause a defect in the deposited thin film, or interfere with the mechanical operation of the deposition system. As a result of this, the inside surface of the process chamber is regularly cleaned to remove the unwanted deposition material from the chamber. One method of cleaning the chamber is to supply a cleaning gas such as molecular fluorine (F2) to react with the unwanted deposition material.
Following the deposition or cleaning process conducted within the process chamber, there is typically a residual amount of the gas supplied to the process chamber contained in the gas exhaust from the process chamber. Process gases such as silane, ammonia and cleaning gases such as fluorine are highly dangerous if exhausted to the atmosphere, and so in view of this, before the exhaust gas is vented to the atmosphere, abatement apparatus is often provided to treat the exhaust gas to convert the more hazardous components of the exhaust gas into species that can be readily removed from the exhaust gas, for example by conventional scrubbing, and/or can be safely exhausted to the atmosphere.
One known type of abatement apparatus is described in EP-A-0 819 887. This abatement apparatus comprises a combustion chamber having an exhaust gas combustion nozzle for receiving the exhaust gas to be treated. An annular combustion nozzle is provided outside the exhaust gas nozzle, and a gas mixture of a fuel and air is supplied to the annular combustion nozzle for forming a reducing flame inside the combustion chamber for burning the exhaust gas received from the process chamber to destroy the harmful components of the exhaust gas.
In such an apparatus, the amount of fuel supplied to the combustion chamber is pre-set so that it is sufficient to destroy both the process and the cleaning gases contained within the exhaust gas. Due to the requirement to ensure a high destruction and removal efficiency (DRE) for fluorine-containing cleaning gases such as F2, NF3 and SF6, the total amount of fuel is typically determined by the calorific requirement to abate the maximum flow rate of cleaning gases that will enter the combustion chamber. CVD processes alternate between deposition and clean steps with a frequency that is determined by the tool type. Typically the process applications where the device described in EP-A-0 819 887 is used have a deposition step followed by a clean step. As a result, the abatement apparatus operates for around 50% of its time with a higher usage of fuel than is actually required to destroy the process gases associated with the deposition onto the substrate that is being processed.
Another problem that has been encountered with the use of a reducing flame is that a high DRE is not achieved when a high flow rate (for example, around 60 slpm) of exhaust gas containing ammonia is received, for example, from a flat panel display device process chamber.
It is an aim of at least the preferred embodiment of the present invention to seek to solve these and other problems.
In a first aspect, the present invention provides a method of combusting exhaust gases using a plurality of exhaust gas combustion nozzles for conveying exhaust gas into a combustion chamber, the method comprising the steps of conveying a respective exhaust gas to each nozzle, and, for each nozzle, selectively supplying a fuel and an oxidant for use in forming a combustion flame within the chamber, and adjusting the supply of fuel and oxidant with variation of the chemistry of the exhaust gas conveyed to the nozzle.
In a second aspect, the present invention provides apparatus for combusting exhaust gases, the apparatus comprising a combustion chamber, a plurality of exhaust gas combustion nozzles each for conveying a respective exhaust gas into the chamber, each nozzle having associated therewith respective means for receiving a fuel and an oxidant for use in forming a combustion flame within the chamber, and control means for receiving, for each exhaust gas, data indicative of a variation of the chemistry of the exhaust gas, and for adjusting the supply of fuel and oxidant for combusting that exhaust gas in response thereto.
In a third aspect the present invention provides combustion apparatus comprising a combustion chamber; a plurality of combustion nozzles each for receiving a respective exhaust gas for combustion within the combustion chamber, and for conveying the exhaust gas into the combustion chamber; a plenum chamber having an inlet for receiving a combustion gas comprising a fuel and an oxidant for forming combustion flames within the combustion chamber and a plurality of outlets each extending about a respective nozzle for supplying the combustion gas to the combustion chamber, wherein each combustion nozzle has associated therewith respective means for receiving fuel and oxidant for selectively adjusting the relative amounts of fuel and oxidant supplied to the combustion chamber through the respective outlet from the plenum chamber, the apparatus comprising means for selectively varying the relative amounts of fuel and oxidant supplied to each of said means according to the chemistry of the exhaust gas contained within the nozzle associated therewith.
Features described above in relation to method aspects of the invention are equally applicable to apparatus aspects of the invention, and vice versa.
Preferred features of the present invention will now be described with reference to the accompanying drawing, in which
With reference first to
In this embodiment, deposition processing is performed within each layer to deposit one or more layers of material over the surfaces of substrates located within the process chambers. The nature of the process gases supplied to each process chamber may be the same, or they may be different. In order to remove unwanted deposition material from the process chambers, cleaning gases such as F2, NF3 and SF6 are periodically supplied to the process chambers. The duration of the process gas/cleaning gas supply cycles may the same or different for each of the process chambers. Again, as only a portion of the cleaning gases will be consumed, the gases exhaust from the process chambers during the cleaning cycle will contain admixture of the cleaning gases supplied to the chamber, and; by-products from the chamber cleaning. Certain processes may use a remote plasma system to decompose the cleaning gases into fluorine prior to their admittance into the process chamber.
The exhaust gases are drawn from the outlets of the process chambers by respective pumping systems 14a to 14d. As illustrated in
The gases exhaust from the pumping systems 14a to 14d are each conveyed to a respective inlet 20 of the abatement apparatus 10. As illustrated in
Each combustion nozzle 22 includes an oxidant inlet 30 for receiving an oxidant, such as oxygen, from a source 32 thereof (illustrated in
Each combustion nozzle 22 further includes a fuel inlet 40 for receiving a fuel preferably methane, from a source 42 thereof (also illustrated in
As illustrated in
As also illustrated in
In response to the data contained in the received signals 72, the controller 70 may selectively control the relative amounts of fuel and oxidant supplied to each combustion nozzle 22. With reference to
By varying the relative amounts of fuel and oxidant supplied to each nozzle 22, the controller 70 can selectively modify each combustion flame generated within the combustion chamber 24 in dependence on the chemistry of the exhaust gases. For example, the relative amounts of fuel and oxidant supplied to a nozzle 22 can be adjusted to produce an oxidising combustion flame when the exhaust gas contains ammonia, or to produce a reducing combustion flame when the exhaust gas contains F2, NF3 or SF6 cleaning gas.
Increasing the relative amount of just one of the fuel and oxidant may vary the nature of the combustion flame. For example, the controller 70 may be configured to pre-set minimum amounts of fuel and oxidant to be supplied to each nozzle, with the relative amount of a chosen one of the fuel and oxidant being selectively increased at each nozzle 22 as required (by operating selected ones of the devices 76, 80 as required) to change the nature of the combustion flames.
Returning to
In summary, apparatus is described for combusting exhaust gases output from a plurality of process chambers. The apparatus comprises a plurality of exhaust gas combustion nozzles connected to a combustion chamber. Each nozzle receives a respective exhaust gas, and comprises means for receiving a fuel and an oxidant for use in forming a combustion flame within the chamber. A controller receives data indicative of the chemistry of the exhaust gas supplied to each nozzle, and adjusts the relative amounts of fuel and oxidant supplied to each nozzle in response to the received data. This can enable the nature of each combustion flame to be selectively modified according to the nature of the exhaust gases to be destroyed by that flame, thereby enhancing the destruction rate efficiency of the exhaust gas and optimising fuel consumption.
The ability to modulate the flame conditions at each combustion nozzle also ensures that sufficient fuel is made available to act both as a heat source and as a chemical reagent in the abatement of fluorine and fluorine containing gases. This is essential in maximising the abatement efficiency that is achieved by the abatement equipment whilst reducing the fuel usage.
Whilst in the preferred embodiments described above a single combustion nozzle is used to convey the exhaust gas from a process chamber to the combustion chamber, the exhaust gas may be “split” into two or more streams, each of which is conveyed to a respective combustion nozzle. This has been found to increase further the efficiency at which the exhaust gases are destroyed.
The invention enables the nature of each combustion flame to be selectively modified depending on the nature of the received exhaust gas. This can enhance the destruction rate efficiency of the exhaust gas and optimise fuel consumption. For example, the amounts of fuel and oxidant supplied to a nozzle may be adjusted to produce an oxidising combustion flame when a first exhaust gas containing, for example, ammonia, is conveyed to the nozzle, and to produce a reducing combustion flame when a second exhaust gas different from the first exhaust gas, containing, for example, a cleaning gas such as one of F2, NF3 and SF6, is conveyed to the nozzle.
High DRE rates can thus be achieved for both process and cleaning gases whilst allowing the fuel consumption at each nozzle to be individually optimised according to the nature of the exhaust gas conveyed to that nozzle. This can enable fuel consumption to be minimised, thereby reducing operating costs, and can enable a single combustion chamber to be provided for treating a plurality of different exhaust gases exhaust, for example, from a plurality of process chambers operating with different deposition and cleaning cycles.
The adjustment of the supply of the fuel and oxidant to a nozzle may be timed according to the deposition and cleaning cycles conducted within a process chamber. Alternatively, for each nozzle, data may be received which is indicative of a variation of the chemistry of the exhaust gas conveyed to that nozzle, the amounts of fuel and oxidant supplied to that nozzle being adjusted in response to the received data. In the preferred embodiment, each exhaust gas is exhausted from a process chamber of a process tool, with the data being supplied by the process tool. Alternatively, a gas sensor may be located within a conduit system for conveying the exhaust gas to the nozzle, with this sensor being configured to supply the data.
While the foregoing description and drawings represent the preferred embodiments of the present invention, it will be apparent to those skilled in the art that various changes and modifications may be made therein without departing from the true spirit and scope of the present invention.
Number | Date | Country | Kind |
---|---|---|---|
0509944.5 | May 2005 | GB | national |
Filing Document | Filing Date | Country | Kind | 371c Date |
---|---|---|---|---|
PCT/GB2006/001604 | 5/3/2006 | WO | 00 | 11/16/2007 |
Publishing Document | Publishing Date | Country | Kind |
---|---|---|---|
WO2006/123092 | 11/23/2006 | WO | A |
Number | Name | Date | Kind |
---|---|---|---|
3946198 | Foote | Mar 1976 | A |
4555389 | Soneta et al. | Nov 1985 | A |
5310334 | Spiros | May 1994 | A |
5603905 | Bartz et al. | Feb 1997 | A |
5957678 | Endoh et al. | Sep 1999 | A |
6051197 | Park | Apr 2000 | A |
6234787 | Endoh et al. | May 2001 | B1 |
6408611 | Keller et al. | Jun 2002 | B1 |
6736635 | Takemura et al. | May 2004 | B1 |
7165405 | Stuttaford et al. | Jan 2007 | B2 |
20010012500 | Krodel et al. | Aug 2001 | A1 |
20020106599 | Weisenstein et al. | Aug 2002 | A1 |
20020111526 | Seeley | Aug 2002 | A1 |
20040006990 | Stuttaford et al. | Jan 2004 | A1 |
Number | Date | Country |
---|---|---|
88101392 | Oct 1988 | CN |
0 311 317 | Apr 1989 | EP |
0 819 887 | Jan 1998 | EP |
1 205 707 | May 2002 | EP |
Entry |
---|
Prosecution history of corresponding Chinese Application No. 200680017049.1 including: First Office Action dated Aug. 28, 2009; Response dated Mar. 9, 2010; Second Office Action dated Jul. 30, 2010; Third Office Action dated Nov. 18, 2010. |
Prosecution history of corresponding European Application No. 06726981.1 including: Office Action dated Oct. 25, 2012; Response dated Mar. 4, 2013. |
Prosecution history of corresponding Japanese Application No. 2008-511770 including: Notification of Reason for Rejection dated Oct. 11, 2011; Response dated Dec. 21, 2011. |
Prosecution history of corresponding Korean Application No. 2007-7026605 including: Notice of Preliminary Rejection dated Oct. 19, 2012; Response dated Mar. 14, 2013. |
Prosecution history of corresponding Taiwanese Application No. 095117062 including: Office Action dated Apr. 20, 2012; Search Report dated Mar. 5, 2012; Response dated Oct. 16, 2012. |
United Kingdom Search Report of Application No. GB 0509944.5; mailed Sep. 26, 2005; Claims searched: 1, at least; Date of Search: Sep. 23, 2005. |
PCT Notification of Transmittal of the International Search Report and the Written Opinion of the International Searching Authority, or the Declaration of International Application No. PCT/GB2006/001604; Date of mailing: Aug. 14, 2006. |
PCT International Search Report of International Application No. PCT/GB2006/001604; Date of mailing of the International Search Report: Aug. 14, 2006. |
PCT Written Opinion of the International Searching Authority of International Application No. PCT/GB2006/001604; Date of mailing: Aug. 14, 2006. |
Number | Date | Country | |
---|---|---|---|
20090035709 A1 | Feb 2009 | US |