The present invention relates to apparatus for, and a method of, combusting an exhaust gas containing at least ammonia.
A primary step in the fabrication of semiconductor devices is the formation of a thin film on a semiconductor substrate by chemical reaction of vapour precursors. One known technique for depositing a thin film on a substrate is chemical vapour deposition (CVD). In this technique, process gases are supplied to a process chamber housing the substrate and react to form a thin film over the surface of the substrate.
An example of a material commonly deposited on to a substrate is gallium nitride (GaN). GaN, and related material alloys (such as InGaN, AlGaN and InGaAlN) are compound semiconductors used for the manufacture of green, blue and white light emitting devices (such as LEDs and laser diodes) and power devices (such as HBTs and HEMTS). These compound semiconductors are usually formed using a form of CVD usually known as MOCVD (metal organic chemical vapour deposition). In overview, this process involves reacting together volatile organometallic sources of the group III metals Ga, In and/or Al, such as trimethyl gallium (TMG), trimethyl indium (TMI) and trimethyl aluminium (TMA), with ammonia at elevated temperatures to form thin films of material on wafers of a suitable substrate material (such as Si, SiC, sapphire or AlN). Hydrogen gas is generally also present, providing a carrier gas for the organometallic precursor and the other process gases.
Following the deposition process conducted within the process chamber, there is typically a residual amount of the gases supplied to the process chamber contained in the gas exhaust from the process chamber. Process gases such as ammonia and hydrogen are highly dangerous if exhausted to the atmosphere, and so in view of this, before the exhaust gas is vented to the atmosphere, abatement apparatus is often provided to treat the exhaust gas to convert the more hazardous components of the exhaust gas into species that can be readily removed from the exhaust gas, for example by conventional scrubbing, and/or can be safely exhausted to the atmosphere.
One known type of abatement apparatus is described in EP-A-0 819 887. This abatement apparatus comprises a combustion chamber having an exhaust gas combustion nozzle for receiving the exhaust gas to be treated. An annular combustion nozzle is provided outside the exhaust gas nozzle, and a gas mixture of a fuel and air is supplied to the annular combustion nozzle for forming a flame inside the combustion chamber for burning the exhaust gas received from the process chamber to destroy the harmful components of the exhaust gas.
This form of abatement apparatus is generally located downstream from a pumping system for drawing the exhaust gas from the process chamber. To prevent damage to the pumping system as the exhaust gas passes therethrough, a nitrogen purge gas is typically supplied to one or more purge ports of the pumping system for pumping with the exhaust gas. As a result, the gas received by the abatement apparatus usually also contains a significant amount of nitrogen.
Nitrogen is safe and requires no abatement. With the apparatus such as that described in EP-A-0 819 887, we have found that the destruction and removal efficiency (DRE) of hydrogen is very high, often exceeding 99.99%, whilst the DRE of ammonia is highly variable depending on the other gases contained within the exhaust gas entering the abatement apparatus. Ammonia is highly toxic, having a threshold limit value, or TLV, of 25 ppm, and we have found that the amount of ammonia exhaust from the abatement apparatus can be as high as 2400 ppm depending on the chemistry and the relative amounts of the gases contained within the exhaust gas.
It is an aim of at least the preferred embodiment of the present invention to seek to provide a method of, and apparatus for, combusting ammonia with a consistently high DRE irrespective of the other gases, and the relative amounts thereof, present in an exhaust gas containing the ammonia.
In a first aspect, the present invention provides a method of combusting ammonia, the method comprising the steps of conveying an exhaust gas containing varying amounts of at least ammonia and hydrogen from a chamber to a combustion nozzle connected to a combustion chamber, supplying to the chamber a combustion gas for forming a combustion flame within the chamber, and selectively adding hydrogen to the exhaust gas depending on the relative amounts of ammonia and hydrogen exhaust from the chamber so that, when the exhaust gas contains ammonia, the gas combusted by the flame contains at least a predetermined amount of hydrogen.
In a second aspect, the present invention provides apparatus for combusting exhaust gas, the apparatus comprising a combustion chamber, means for supplying to the chamber a combustion gas for forming a combustion flame within the chamber, a combustion nozzle connected to the combustion chamber, means for conveying an exhaust gas containing varying amounts of at least ammonia and hydrogen from a chamber to the nozzle, and means for selectively adding hydrogen to the exhaust gas depending on the relative amounts of ammonia and hydrogen exhaust from the chamber.
Features described above in relation to method aspects of the invention are equally applicable to apparatus aspects of the invention, and vice versa.
Preferred features of the present invention will now be described with reference to the accompanying drawing, in which
With reference first to
An exhaust gas is drawn from the outlet of the process chamber 12 by a pumping system 20. During the processing within the chamber, only a portion of the process gases will be consumed, and so the exhaust gas will contain a mixture of the process gases supplied to the chamber, and by-products from the processing within the chamber. As illustrated in
The gas exhaust from the pumping system 22 is conveyed to an inlet 32 of the combustion apparatus 10. As illustrated in
In this embodiment of the invention, each combustion nozzle 34 includes a hydrogen inlet 42 for receiving hydrogen from a source 44 thereof (illustrated in
As illustrated in
As also illustrated in
In response to the data contained in the received signals 72, the controller 70 may selectively control the supply of hydrogen to each combustion nozzle 34. With reference to
When the valves 76 are open, hydrogen is conveyed from the hydrogen source 44 to each hydrogen inlet 42. The hydrogen passes downwards (as illustrated) within the annular gap 46, and is output from the hydrogen outlets 50 into the combustion chamber 36 for combustion with the exhaust gas.
By selectively adding hydrogen to the gas combusted within the combustion chamber 36, the controller 70 can maintain the relative amounts of ammonia and hydrogen combusted within the combustion chamber 36 at or around predetermined values, for example at least 1:1, thereby maintaining a high DRE of ammonia. We have found experimentally that mixtures of hydrogen, ammonia and nitrogen in approximate ratios of 1:1:1 and 2:1:1 respectively can be combusted below the TLV of ammonia using only a pilot flame of the combustion chamber, and it is anticipated that combustion of mixtures with lower amounts of hydrogen will be similarly achievable. As there is thus no longer any requirement to provide combustion gas to the combustion chamber 36 for the combustion of ammonia at least, fuel consumption may be significantly reduced.
Returning to
We have found that the destruction and removal efficiency (DRE) of ammonia is significantly enhanced when a predetermined amount of hydrogen is present in the gases to be combusted by the flame. By selectively adding hydrogen to the exhaust gas when the exhaust gas contains ammonia but not a sufficient amount of hydrogen to achieve a high DRE of ammonia, the DRE of ammonia can be maintained at a consistently high level.
In one preferred embodiment the hydrogen is conveyed to the nozzle for addition to the exhaust gas, where the hydrogen is preferably injected into the combustion chamber from a plurality of apertures extending about the combustion nozzle. In another preferred embodiment, the hydrogen is added to the exhaust gas upstream from the combustion nozzle, thereby promoting mixing of the additional hydrogen with the exhaust gas.
The addition of hydrogen to the exhaust gas may be timed according to the cycle of gas supply to the chamber. Alternatively, the amount of hydrogen added to the exhaust gas may be adjusted in response to the reception of data indicative of a variation of the chemistry of the gas exhaust from the chamber. The data indicative of the variation of the chemistry of the exhaust gas being supplied by the process tool, for example when the gases supplied to the chamber do not contain sufficient hydrogen to achieve a high ammonia DRE. Alternatively, a gas sensor may be located within a conduit system for conveying the exhaust gas to the nozzle, with this sensor being configured to supply the data.
Hydrogen is preferably added to the exhaust gas so that the ratio by volume of hydrogen to ammonia combusted by the flame is at least 1:1. We have found that mixtures of hydrogen, ammonia and nitrogen in approximate ratios of 1:1:1 and 2:1:1 respectively can be combusted below the TLV of ammonia using only a pilot flame of the combustion chamber. The pilot flame is typically formed from a mixture of fuel and oxidant, for example methane and air, in a ratio by volume of between 1:8 and 1:12. Consequently, the amount of methane or other fuel supplied to the chamber to form the combustion flame can be significantly reduced, thereby reducing operating costs.
While the foregoing description and drawings represent the preferred embodiments of the present invention, it will be apparent to those skilled in the art that various changes and modifications may be made therein without departing from the true spirit and scope of the present invention.
Number | Date | Country | Kind |
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0509163.2 | May 2005 | GB | national |
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/GB2006/001577 | 4/28/2006 | WO | 00 | 11/5/2007 |
Publishing Document | Publishing Date | Country | Kind |
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WO2006/117531 | 11/9/2006 | WO | A |
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Number | Date | Country | |
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20090064909 A1 | Mar 2009 | US |