The invention pertains to a gas-filled discharge gap such as a spark gap or an overvoltage arrestor.
A gas-filled discharge gap is known from German patent application DE 198 14 631 A1 and corresponding U.S. Pat. No. 6,326,724. In this case, a vitreous-type electrode-activation mass is used that comprises a plurality of components, including, among others, a base component in the form of cesium tungstate (Cs2WO4).
Another gas-filled discharge gap is known from German patent application DE 197 01 816 A1 and corresponding U.S. Pat. No. 5,995,355.
Embodiments of the invention disclose a gas-filled discharge gap with adequate quenching properties.
Embodiments of the invention disclose a gas-filled discharge gap with at least two electrodes, wherein an electrode-activation mass containing potassium tungstate (K2WO4) is applied to at least one of the electrodes in order to ensure ignition properties. Potassium tungstate has the properties of a getter material. This material is chemically very stable and can also exert a gettering effect following a surge current. An additional property consists of the generation of free potassium and/or potassium oxide due to the reduction of the K2WO4 in the gas-filled cavity, resulting in a low work function of the activation mass.
Potassium tungstate melts at a soldering temperature of approximately 820°, whereby, specifically, loose activation particles are bound so as to prevent the escape of loose activation particles from the activation mass.
The inventive utilization of an activation mass containing potassium tungstate or one of the other potassium compounds ensures very good quenching properties of the overvoltage arrestor gap downstream of an electric load. An overvoltage arrestor with an activation mass containing K2WO4 automatically and reliably quenches after a discharge process despite an applied DC voltage.
Reference is now made to
The activation mass 4 is arranged on the active surfaces of the opposing electrodes 2 and 3. The active surfaces may feature at least one or more depressions in the form of a waffle-like structure for accommodating the activation mass 4. The term “waffle-like structure” should be interpreted to mean in the form of intersecting depressions. Alternately, the active surface of an electrode may feature several depressions that do not intersect.
Referring to
The activation mass 4 is suitable for being applied to the center electrode 5 as well as on the end electrodes 2 and 3 of the overvoltage arrestor. The center electrode 5 may be provided with a peripheral groove not shown) for accommodating the activation mass 4.
In both embodiments, the activation mass 4 may be arranged on the end electrodes 2 and 3 on the opposing active electrode surfaces, i.e., in the depressions provided for this purpose.
The activation mass 4 may include a base component, e.g., K2WO4.
The activation mass 4 may contain several components, particularly base components. In one advantageous variant, K2WO4 is provided as one base component of the activation mass, e.g., in a quantity between approximately 20 and 90 wt %, preferably in a quantity between 30 and 60 wt %.
In one embodiment, the activation mass 4 may contain at least one base component and other additives. Here, one of the base components is K2WO4.
Other base components to be considered specifically include
The activation mass may furthermore contain a glass fraction or silicates, e.g., sodium silicate, cesium silicate and potassium silicate. BaTiO3, TiO2, LiNbO3, Na2B4O7 and MgO may also be considered. Na2B4O7 and MgO are particularly suitable as additives.
The base components may be respectively provided in a quantity of approximately 10 to 90 wt %, and the additives may be respectively provided in a quantity of less than approximately 10 wt %.
According to another embodiment, K2WO4 may be provided as an additive, e.g., in a quantity between 1 and 20 wt %, preferably in a quantity between 5 and 10 wt %.
Number | Date | Country | Kind |
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10 2005 013 499 | Mar 2005 | DE | national |
This application is a continuation of co-pending International Application No. PCT/DE2006/00347, filed Feb. 24, 2006, which designated the United States and was not published in English, and which is based on German Application No. 10 2005 013 499.8 filed Mar. 23, 2005. This application also claims priority to U.S. Provisional Application No. 60/974,320, filed Sep. 21, 2007. Each of these applications is incorporated herein by reference.
Number | Name | Date | Kind |
---|---|---|---|
4670360 | Habermann et al. | Jun 1987 | A |
5671114 | Däumer et al. | Sep 1997 | A |
5892648 | Bobert et al. | Apr 1999 | A |
5995355 | Daeumer | Nov 1999 | A |
6326724 | Däumer et al. | Dec 2001 | B1 |
6529361 | Petschel et al. | Mar 2003 | B1 |
20060209485 | Imai et al. | Sep 2006 | A1 |
Number | Date | Country |
---|---|---|
3430485 | Feb 1986 | DE |
197 01 816 | Jul 1997 | DE |
198 14 631 | Sep 1999 | DE |
1 612 899 | Jan 2006 | EP |
2003-007420 | Jan 2003 | JP |
WO 2004091060 | Oct 2004 | WO |
Number | Date | Country | |
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20080048545 A1 | Feb 2008 | US |
Number | Date | Country | |
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60974320 | Sep 2007 | US |
Number | Date | Country | |
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Parent | PCT/DE2006/000347 | Feb 2006 | US |
Child | 11859586 | US |