Claims
- 1. A gas mixing device for mixing a plurality of gases, comprising:
- a substrate having a plurality of grooves formed thereon by etching including a plurality of inlet grooves and at least one outlet groove, each of said inlet grooves being branched into a plurality of gas passage grooves, and each of said at least one outlet groove being connected with at least two of said inlet grooves through said gas passage grooves, and said inlet grooves and said at least one outlet groove having dimensions of cross-section greater than said gas passage grooves, and said gas passage grooves having width and depth dimensions that are smaller than 1 mm;
- a plate having a flat smooth surface, a plurality of inlet ports each communicating with a respective one of said inlet grooves and through each of which a gas to be mixed is introduced from respective gas sources, and at least one outlet port which is to be communicated with a respective said at least one outlet groove and through which a gas mixture is discharged, said plate being bonded at said flat smooth surface to said substrate to define therebetween gas passages which have predetermined flow resistances and are constituted by said gas passage grooves, whereby gases to be mixed together are introduced from said inlet ports into said at least one outlet groove and are mixed together into the gas mixture; and
- pressure regulating means for each of said inlet ports for maintaining the pressures of a plurality of gases to be supplied to said inlet grooves substantially at the same level.
- 2. A gas mixing device according to claim 1, wherein said plurality of gas passage grooves have cross-sectional areas and lengths which are determined to produce desired levels of flow resistance.
- 3. A gas mixing device according to claim 1, wherein said plurality of gases include carbon dioxide gas and air.
- 4. A gas mixing device according to claim 1, wherein gases passing through said respective gas passages meet one another at said outlet groove and flow out from said device through said outlet port.
- 5. A gas mixing device according to claim 4, wherein each of said gas passage grooves has a uniform cross-sectional area along the length thereof.
- 6. A gas mixing device according to claim 5, wherein said pressure regulating means maintains a constant pressure of the gas to be supplied to the inlet ports between 0.2 kgf/cm.sup.2 and 0.4 kgf/cm.sup.2.
- 7. A gas mixing device according to claim 6, wherein said substrate is made of silicon, and said plate is made of transparent glass, and wherein said substrate and said plate are bonded together by means of anodic bonding.
- 8. A gas mixing device according to claim 5, wherein said substrate is made of silicon, and said plate is made of transparent glass, and wherein said substrate and said plate are bonded together by means of anodic bonding.
- 9. A gas mixing device according to claim 4, wherein said pressure regulating means maintains a constant pressure of the gas to be supplied to the inlet ports between 0.2 kgf/cm.sup.2 and 0.4 kgf/cm.sup.2.
- 10. A gas mixing device according to claim 9, wherein said substrate is made of silicon, and said plate is made of transparent glass, and wherein said substrate and said plate are bonded together by means of anodic bonding.
- 11. A gas mixing device according to claim 4, wherein said substrate is made of silicon, and said plate is made of transparent glass, and wherein said substrate and said plate are bonded together by means of anodic bonding.
- 12. A gas mixing device according to claim 1, wherein each of said gas passage grooves has a uniform cross-sectional area along the length thereof.
- 13. A gas mixing device according to claim 12, wherein said pressure regulating means maintains a constant pressure of the gas to be supplied to the inlet ports between 0.2 kgf/cm.sup.2 and 0.4 kgf/cm.sup.2.
- 14. A gas mixing device according to claim 13, wherein said substrate is made of silicon, and said plate is made of transparent glass, and wherein said substrate and said plate are bonded together by means of anodic bonding.
- 15. A gas mixing device according to claim 12, wherein said substrate is made of silicon, and said plate is made of transparent glass, and wherein said substrate and said plate are bonded together by means of anodic bonding.
- 16. A gas mixing device according to claim 1, wherein said pressure regulating means maintains a constant pressure of the gas to be supplied to the inlet ports between 0.2 kgf/cm.sup.2 and 0.4 kgf/cm.sup.2.
- 17. A gas mixing device according to claim 16, wherein said substrate is made of silicon, and said plate is made of transparent glass, and wherein said substrate and said plate are bonded together by means of anodic bonding.
- 18. A gas mixing device according to claim 1, wherein said substrate is made of silicon, and said plate is made of transparent glass, and wherein said substrate and said plate are bonded together by means of anodic bonding.
Priority Claims (1)
Number |
Date |
Country |
Kind |
62-139792 |
Jun 1987 |
JPX |
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Parent Case Info
This is a divisional application of Ser. No. 201,738, filed June 3, 1988 now U.S. Pat. No. 4,905,497.
US Referenced Citations (8)
Foreign Referenced Citations (3)
Number |
Date |
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0107631 |
May 1984 |
EPX |
1557189 |
Mar 1970 |
DEX |
2049225 |
Dec 1980 |
GBX |
Divisions (1)
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Number |
Date |
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Parent |
201738 |
Jun 1988 |
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