Gas nozzle substrate processing apparatus

Information

  • Patent Grant
  • D783351
  • Patent Number
    D783,351
  • Date Filed
    Monday, November 9, 2015
    9 years ago
  • Date Issued
    Tuesday, April 11, 2017
    7 years ago
Abstract
Description


FIG. 1 is a perspective view of a gas nozzle substrate processing apparatus showing my new design;



FIG. 2 is a front elevational view thereof;



FIG. 3 is a rear elevational view thereof;



FIG. 4 is a top plan view thereof;



FIG. 5 is a bottom plan view thereof;



FIG. 6 is a left side elevational view thereof;



FIG. 7 is a right side elevational view thereof;



FIG. 8 is an enlarged right side elevational view thereof; and



FIG. 9 is an enlarged portion view taken along line 9-9 in FIG. 2;



FIG. 10 is a cross sectional view take along line 10-10 in FIG. 9; and,



FIG. 11 is a cross sectional view take along line 11-11 in FIG. 9.


Claims
  • We claim the ornamental design for a gas nozzle substrate processing apparatus, as shown and described.
Priority Claims (1)
Number Date Country Kind
2015-011864 May 2015 JP national
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