Claims
- 1. A glass-ceramic plate suitable for covering heating elements, the glass-ceramic plate comprising silicon, aluminum and lithium oxides, whereinthe glass-ceramic plate has as its single crystalline phase a solid solution of β-spodumene crystals; the glass-ceramic plate has a light transmission, TL, of between 5 and 40%; and the glass-ceramic plate has a diffuse transmission factor of at least 50%.
- 2. The glass-ceramic plate of claim 1, wherein the plate has a diffuse transmission factor greater than 70%.
- 3. The glass-ceramic plate of claim 1, wherein the plate has a diffuse transmission factor greater than 90%.
- 4. The glass-ceramic plate of claim 1, wherein the plate has a light transmission, TL, of between 5 and 10%.
- 5. The glass-ceramic plate of claim 1, wherein the plate has a light transmission, TL, of between 6 and 9%.
- 6. The glass-ceramic plate of claim 1, wherein the size of the individual crystallites of the β-spodumene crystals is smaller than 100 nm.
- 7. The glass-ceramic plate of claim 1, wherein the plate has a coefficient of thermal expansion smaller than 15×10−7/° C. in the temperature range of from 20° C. to 700° C.
- 8. The glass-ceramic plate of claim 1, wherein the plate has a coefficient of thermal expansion equal to 9×10−7/° C. in the temperature range of from 20° C. to 700° C.
- 9. The glass-ceramic plate of claim 1, wherein the plate comprises63-70 wt % SiO2, 18-22 wt % Al2O3, and 2.5-4.5 wt % Li2O.
- 10. A process for manufacturing a glass ceramic plate, the process comprisingproviding a glass plate based on silicon, aluminum and lithium oxides; performing on the glass plate a heat treatment cycle; and producing the glass-ceramic plate of claim 1.
- 11. The process according to claim 10, whereinthe duration, t′, of the heat treatment cycle is longer by at least 5% than a duration, t, of from 10 to 25 minutes of a ceramization plateau in a ceramization cycle for formation of a β-quartz crystalline phase, and/or the maximum temperature, T′, of the heat treatment cycle is higher by at least 5% than a temperature, T, of between 900° C. and 960° C. of the ceramization plateau in a ceramization cycle for formation of a β-quartz crystalline phase.
- 12. The process of claim 11, wherein the difference T′−T is at least 40° C.
- 13. The process of claim 11, wherein the difference T′−T is at least 100° C.
- 14. The process of claim 1, wherein the difference t′−t is at least 15 minutes.
- 15. A device for cooking and/or holding at high temperature, the device comprisingthe glass-ceramic plate of claim 1, and one or more heating elements selected from the group consisting of radiant heating elements, halogen-lamp elements atmospheric gas burners, and induction-heating means.
Priority Claims (1)
Number |
Date |
Country |
Kind |
97 09912 |
Aug 1997 |
FR |
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Parent Case Info
This application is the U.S. national stage of International Application No. PCT/FR98/01676 filed Jul. 29, 1998.
US Referenced Citations (13)
Foreign Referenced Citations (1)
Number |
Date |
Country |
0437228 |
Jul 1991 |
EP |