Claims
- 1. A glass for making rigid disk substrates having the following composition (in % by weight based on oxides):SiO240 to 50.8Al2O35 to 20B2O30 to 5Li2O0 to 10Na2O0 to 12with the proviso that Li2O + Na2O5 to 12K2O0 to 5MgO0 to 20CaO0 to 6with the proviso that MgO + CaO4 to 20SrO + BaO0 to 10ZrO20 to 5TiO20 to 5CeO20 to 1La2O30 to 10Fe2O30 to 10Nb2O50 to 10V2O50 to 15with the proviso that TiO2 + ZrO2 + La2O3 +Fe2O3 +≧8Nb2O5 + V2O5As2O3 + Sb2O3 + F0.1 to 1,wherein said glass satisfies the following inequality formulae (1):(E/ρ)·+3,500 R>38.5 and 1000 R>1 (1), wherein R represents the relaxation rate of the glass and E/ρ represents specific elasticity modulus of the glass measured in GPA*cm3/g.
- 2. The glass as defined in claim 1, having an acid resistance of at least 2 according to ISO 8424 and a thermal expansion coefficient α20/300≧6×10−6/K.
- 3. A rigid disk substrate for a rigid disk operable at rotation speeds greater than 10,000 rpm, said rigid disk substrate comprising the glass as defined in claim 1.
- 4. A method of making a rigid disk substrate for a rigid disk operable at rotation speeds greater than 10,000 rpm, said method comprising the step of making the rigid disk substrate from a glass having the following composition (in % by weight based on oxides):SiO240 to 50.8Al2O35 to 20B2O30 to 5Li2O0 to 10Na2O0 to 12with the proviso that Li2O + Na2O5 to 12K2O0 to 5MgO0 to 20CaO0 to 6with the proviso that MgO + CaO4 to 20SrO + BaO0 to 10ZrO20 to 5TiO20 to 5CeO20 to 1La2O30 to 10Fe2O30 to 10Nb2O50 to 10V2O50 to 15with the proviso that TiO2 + ZrO2 + La2O3 +Fe2O3 +≧8Nb2O5 + V2O5As2O3 + Sb2O3 + F0.1 to 1,wherein said glass satisfies the following inequality formulae (1):(E/ρ)·+3,500 R>38.5 and 1000 R>1 (1), wherein R represents the relaxation rate of the glass and E/ρ represents specific elasticity modulus of the glass measured in GPA*cm3/g.
- 5. A glass for making rigid disk substrates having the following composition (in % by weight based on oxides):SiO240 to 50.8Al2O35 to 20B2O30 to 5Li2O0 to 10Na2O0 to 12with the proviso that Li2O + Na2O5 to 12K2O0 to 5MgO0 to 20CaO0 to 6with the proviso that MgO + CaO4 to 20SrO + BaO0 to 10ZrO20 to 5TiO20 to 5CeO20 to 1La2O30 to 10Fe2O30 to 10Nb2O50 to 10V2O50 to 15with the proviso that TiO2 + ZrO2 + La2O3 +Fe2O3 +≧18.7Nb2O5 + V2O5As2O3 + Sb2O3 + F0.1 to 1,wherein said glass satisfies the following inequality formulae (1):(E/ρ)·+3,500 R>38.5 and 1000 R>1 (1), wherein R represents the relaxation rate of the glass and E/ρ represents specific elasticity modulus of the glass measured in GPA*cm3/g.
- 6. A method of making a rigid disk substrate for a rigid disk operable at rotation speeds greater than 10,000 rpm, said method comprising the step of making the rigid disk substrate from a glass having the following composition (in % by weight based on oxides):SiO240 to 50.8Al2O35 to 20B2O30 to 5Li2O0 to 10Na2O0 to 12with the proviso that Li2O + Na2O5 to 12K2O0 to 5MgO0 to 20CaO0 to 6with the proviso that MgO + CaO4 to 20SrO + BaO0 to 10ZrO20 to 5TiO20 to 5CeO20 to 1La2O30 to 10Fe2O30 to 10Nb2O50 to 10V2O50 to 15with the proviso that TiO2 + ZrO2 + La2O3 +Fe2O3 +≧18.7Nb2O5 + V2O5As2O3 + Sb2O3 + F0.1 to 1,wherein said glass satisfies the following inequality formulae (1):(E/ρ)·+3,500 R>38.5 and 1000 R>1 (1), wherein R represents the relaxation rate of the glass and E/ρ represents specific elasticity modulus of the glass measured in GPA*cm3/g.
Priority Claims (1)
Number |
Date |
Country |
Kind |
198 02 919 |
Jan 1998 |
DE |
|
CROSS-REFERENCE TO RELATED APPLICATION
This is a divisional of U.S. patent application, Ser. No. 09/238,657 filing date Jan. 26, 1999, now U.S. Pat. No. 6,162,751.
US Referenced Citations (6)
Number |
Name |
Date |
Kind |
5804520 |
Morinaga et al. |
Sep 1998 |
|
5895767 |
Yamaguchi et al. |
Apr 1999 |
|
5900296 |
Hayashi et al. |
May 1999 |
|
5997977 |
Zou et al. |
Dec 1999 |
|
6001445 |
Itoh et al. |
Dec 1999 |
|
6040029 |
Yamamoto et al. |
Mar 2000 |
|
Foreign Referenced Citations (3)
Number |
Date |
Country |
01-167245 |
Jun 1989 |
JP |
03-040933 |
Feb 1991 |
JP |
10-025129 |
Jan 1998 |
JP |