Claims
- 1. An integrated circuit comprising
- a logic portion having at least 30K logic gates, said logic gates having first dopant-type and second dopant-type MOS transistors, said first dopant-type MOS transistors having sources connected to a first voltage supply line, said second dopant-type MOS transistors having sources connected to a second voltage supply line, and said second dopant-type MOS transistors placed in a substrate region connected to third voltage supply line, said third voltage supply different than said second voltage supply; and
- a memory portion interconnected with said logic portion, said memory portion having a capacity of at least 2 megabits.
- 2. The integrated circuit of claim 1 wherein said substrate region is connected to said third voltage supply line by taps.
- 3. The integrated circuit of claim 1 wherein said first dopant-type MOS transistors comprise PMOS transistors, said second dopant-type MOS transistors comprise NMOS transistors, and said third voltage supply is lower than said second voltage supply.
- 4. An integrated circuit comprising
- a logic portion having at least 40K logic gates, said logic gates having first dopant-type and second dopant-type MOS transistors, said first dopant-type MOS transistors having sources connected to a first voltage supply line, said second dopant-type MOS transistors having sources connected to a second voltage supply line, and said second dopant-type MOS transistors placed in a substrate region connected to a third voltage supply line, said third voltage supply different than said second voltage supply; and
- a memory portion interconnected with said logic portion, said memory portion having a capacity of at least 7.3 megabits.
- 5. The integrated circuit of claim 4, wherein said substrate region is connected to said third voltage supply line by taps.
- 6. The integrated circuit of claim 4, wherein said first dopant-type MOS transistors comprise PMOS transistors, said second dopant-type MOS transistors comprise NMOS transistors, and said third voltage supply is lower than said second voltage supply.
- 7. In an integrated circuit having a logic portion having at least 30K logic gates and a memory portion coupled to said logic portion, said memory portion having a capacity of at least 2 megabits, a capacitor comprising
- a first dopant-type transistor in an a second dopant-type well in a first dopant-type semiconductor substrate, said first dopant-type transistor having a gate, first and second source/drains, said first source/drain connected in common to said second source/drain to form a first terminal of said capacitor, said gate forming a second terminal of said capacitor, said a second dopant-type well connected to a first power supply, and said substrate connected to a second power supply at a negative voltage with respect to said first power supply;
- whereby said capacitor is isolated from electrical noise in said substrate.
- 8. The capacitor of claim 7, wherein said second power supply is generated from a substrate bias generator.
- 9. The capacitor of claim 7, wherein said first dopant-type transistor comprises a PMOS transistor, said second dopant-type well comprises an N-well, and said first dopant-type semiconductor substrate comprises a P-type substrate.
- 10. The capacitor of claim 9, wherein said second power supply is generated from a substrate bias generator.
- 11. The capacitor of claim 10, wherein said second power supply is at approximately -1.5 volts.
- 12. The capacitor of claim 10, wherein said first power supply is at approximately +3.3 volts.
- 13. The capacitor of claim 7, wherein said logic portion has at least 40K logic gates; and said memory portion has a capacity of at least 7.3 megabits.
- 14. The capacitor of claim 13, wherein said second power supply is generated from a substrate bias generator.
- 15. The capacitor of claim 14, wherein said second power supply is at approximately -1.5 volts.
- 16. The capacitor of claim 14, wherein said first power supply is at approximately +3.3 volts.
- 17. The capacitor of claim 14, wherein said first dopant-type transistor comprises a PMOS transistor, said second dopant-type well comprises an N-well, and said first dopant-type semiconductor substrate comprises a P-type substrate.
- 18. An integrated circuit comprising
- a logic portion having at least 30K logic gates;
- a memory portion coupled to said logic portion, said memory portion having a capacity of at least 2 megabits, and
- an analog circuit having a capacitor, said capacitor comprising a first dopant-type transistor in a second dopant-type well in a first dopant-type semiconductor substrate, said first dopant-type transistor having a gate, first and second source/drains, said first source/drain connected in common to said second source/drain to form a first terminal of said capacitor, said gate forming a second terminal of said capacitor, said second dopant-type well connected to a first power supply, and said substrate connected to a second power supply at a negative voltage with respect to said first power supply;
- whereby said capacitor is isolated from electrical noise in said substrate.
- 19. The integrated circuit of claim 18 wherein said second power supply is generated from a substrate bias generator.
- 20. The integrated circuit of claim 18, wherein said first dopant-type transistor comprises a PMOS transistor, said second dopant-type well comprises an N-well, and said first dopant-type semiconductor substrate comprises a P-type substrate.
- 21. The integrated circuit of claim 20 wherein said second power supply is generated from a substrate bias generator.
- 22. The integrated circuit of claim 21, wherein said second power supply is at approximately -1.5 volts.
- 23. The integrated circuit of claim 21, wherein said first power supply is at approximately +3.3 volts.
- 24. The integrated circuit of claim 18, wherein said logic portion has at least 40K logic gates; and said memory portions has a capacity of at least 7.3 megabits.
- 25. The integrated circuit of claim 24 wherein said second power supply is generated from a substrate bias generator.
- 26. The integrated circuit of claim 24 wherein said first dopant-type transistor comprises a PMOS transistor, said second dopant-type well comprises an N-well, and said first dopant-type semiconductor substrate comprises a P-type substrate.
- 27. The integrated circuit of claim 26 wherein said second power supply is generated from a substrate bias generator.
- 28. The integrated circuit of claim 27, wherein said second power supply is at approximately -1.5 volts.
- 29. The integrated circuit of claim 27, wherein said first power supply is at approximately +3.3 volts.
Parent Case Info
This is a Continuation of application Ser. No. 08/262,412 filed Jun. 20, 1994 now abandoned.
US Referenced Citations (5)
Continuations (1)
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Number |
Date |
Country |
Parent |
262412 |
Jun 1994 |
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