The present invention concerns a flat resonator spiral for a sprung balance obtained by a manufacturing method for improving isochronism by acting, on the one hand, on construction parameters of the spiral as such, and on the other hand, on a mode of securing it to the balance arbour for reducing the geometrical deviation inherent to conventional securing modes between the point of origin of the spiral of Archimedes and the rotational axis of the balance. In the following description, isochronism means the working deviations as a function of variations in the oscillation amplitude of the balance, as well as working deviations between the horizontal position and the vertical positions of the watch.
In a known manner a spiral, having turns of uniform section and pitch, via a particular conformation of the inside curve and the outside curve in the plane of the spiral or most often in different planes, enables one to obtain a concentric development of the spiral and a movement of the centre of the spiral weight and a variation in the spiral's inertia during development minimising working disruptions as a function of the amplitude and positions of the spiral with respect to the gravity vector. In addition to the fact that making such a spiral requires great skill, the space required in height constitutes a certain drawback for its use in wristwatches that have to have, for evident aesthetical reasons, the smallest possible thickness.
For this reason, use of a flat spiral is preferred, such as that shown in
With respect to this state of the art, as regards the pitch between the turns, CH Patent No. 465 537, filed in 1966, should be mentioned, wherein there is disclosed a method for manufacturing spirals of any configuration, particularly with a variable pitch, from a metal strip or wire of constant section, wound in the groove of a die, then annealed and hardened. To the knowledge of the Applicant, no products of this type have been put on the market, which leads one to assume that the manufacturing method was not, technically or economically, satisfactory.
As regards the variation in thickness of a wound metal strip, GB Patent No. 1020 456 can be mentioned, which discloses the manufacture of a mainspring by buttwelding of strips having sections that increase from the centre to the periphery. Such a spring is designed, with equal space requirement, to increase the power reserve, but it is clear that by applying this manufacturing method to a spiral, the presence of welds would prevent a concentric development and would not allow reproducible isochronism to be obtained from one spiral to another.
This same principle had, moreover, already been proposed in U.S. Pat. No. 209,642 dating 1878, for improving the isochronism of a spiral made with an inside turn of smaller section. As will be seen in the detailed description, experiments contradict this assertion.
The invention thus concerns a flat spiral and micro-machining or galvanic growth manufacturing methods, for selecting the most favourable construction parameters in a convenient way for the purpose of improving isochronism by the shape of the spiral as well as by the securing means.
The invention therefore concerns a flat spiral, formed of a strip made up of a succession of turns having a pitch “p” between them, for a regulating balance mechanism, said spiral being obtained by a manufacturing method which allows almost perfect isochronism. The turns of rectangular section are formed in a single continuous material from the inside curve to the outside curve, but, on certain portions comprised between the point of attachment at the centre and the point of attachment at the exterior, have a section “s” that is non uniform and/or one or more portions shaped outside the tracing of a perfect spiral. The expression “non uniform section” means that, for a strip having a constant height “h”, the thickness “e” of a selected portion can be either greater or less than the thickness of the rest of the strip forming the spiral.
As will be explained hereinafter in the detailed description, the manufacturing method relies on micro-techniques, such as photolithography and electroplating a metal or metal alloy, or micro-machining a plate of thickness “h” made of an amorphous or crystalline material such as silicon in mono-crystalline or polycrystalline form.
According to a first embodiment, the section “s” of the turns increases progressively from the outside curve to the inside curve.
According to a second embodiment, which can be combined with the first embodiment, the pitch “p” between the turns decreases regularly from the outside curve to the inside curve.
According to yet another embodiment, it is possible to select a determined turn portion and vary the width of the strip locally in order to act on other parameters favourable to isochronism. This increase may be achieved for example on the inside curve, on the outside curve or on both curves at once, or in many other places on other portions of the spiral.
It is also possible to obtain a spiral having a turn portion that deviates from the curve of a perfect spiral, by having, for example, a Grossmann type inside curve.
The invention also offers the advantage of being able to manufacture at the same time both the actual spiral and the means for securing it onto the balance arbour, this securing means being formed by a self-locking washer having at the centre, for example a star-shaped contour and including recesses in its periphery to give it sufficient elasticity for assembly and preventing a deviation between the point of origin of the spiral of Archimedes and the rotational axis of the balance.
For a metal or metal alloy spiral, the manufacturing method basically consists in applying the LIGA technique to form a mould corresponding to the desired profile of the spiral. Given the properties of the photoresists currently available on the market, it is possible to adjust the thickness of the photoresist layer to obtain the entire range of spirals with strip heights of up to several tens of a millimetre.
For a spiral made of amorphous or crystalline material, the method basically consists in etching a plate of said material through masks.
Other features and advantages of the present invention will appear in the following description of different embodiment examples given by way of non-limiting illustration with reference to the annexed drawings, in which:
With reference now to
With reference now to
In the diagram shown in
a portion 12 of inside curve 11 over an angular sector of approximately 80° the median part of which is at substantially −110° from a reference axis Ox, and
a portion 15 of outside curve 14 over an angular sector of approximately 20° the median part of which is at substantially +115° from reference axis Ox.
In the diagram shown in
Of course, given the freedom of configuration provided by the manufacturing methods according to the invention, it is possible to combine the embodiments previously described to obtain a spiral according to the invention having improved isochronism.
A spiral according to the invention made of an amorphous or crystalline material such as silicon can be manufactured by adapting the micro-machining methods already used for example for manufacturing integrated circuits or acceleration meters from a silicon wafer. Reference can be made in particular to the methods disclosed in U.S. Pat. Nos. 4,571,661 and 5,576,250 concerning acceleration meters. The method basically consists of the following steps:
applying a silicon wafer to a substrate creating an insulating SiO2 interface;
thinning the plate to the desired strip height “h” in accordance with the method described by C. Harendt et al. (“Wafer bonding and its application to silicon-on-insulator fabrication” Technical Digest MNE'90, 2nd Workshop, Berlin, November 90, p. 81-86);
forming a mask by photolithography corresponding to the desired spiral contour;
etching the silicon wafer to the substrate, in accordance with known methods, such as wet method chemical etching, dry plasma etching or a combination of the two; and
separating the spiral from the substrate.
Given the very small dimensions of a spiral, it is obviously possible and advantageous to manufacture them in batches from a single silicon wafer.
In order to manufacture a metal or metal alloy spiral according to the invention, the LIGA method, known since the middle of the 70s is used. In a first step, the method basically consists in spreading a positive or negative photoresist on a substrate previously coated with a sacrificial layer, over a thickness corresponding to the desired strip height “h” and forming a hollow structure corresponding to the desired spiral contour by means of a mask by photolithography and chemical etching. In a second step, said hollow structure is filled with a metal or a metal alloy either by electroplating as indicated for example in U.S. Pat. No. 4,661,212, or by nanoparticle compression and sintering, as indicated for example in US Patent Application No. 2001/0038803.
In a last step the spiral is released from the substrate by removing the sacrificial layer.
Number | Date | Country | Kind |
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03075362.8 | Feb 2003 | EP | regional |
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/EP04/00931 | 2/2/2004 | WO | 8/5/2005 |