Claims
- 1. A process for preparing a halogencontaining polyether comprising repeating units of the formula:
- --(CH.sub.2 CF.sub.2 CF.sub.2 O).sub.a --(CHClCF.sub.2 CF.sub.2 O).sub.b --(CCl.sub.2 CF.sub.2 CF.sub.2 O).sub.c --(CHFCF.sub.2 CF.sub.2 O).sub.d --(CFClCF.sub.2 CF.sub.2 O).sub.e --(CF.sub.2 CF.sub.2 CF.sub.2 O).sub.f --(I)
- wherein a, b, c, d, e and f are each an integer not less than 0 and satisfy the following equations:
- .ltoreq. a+b+c+d+e+f .ltoreq.200
- and
- 1.ltoreq.a+c+d+f,
- comprising a ring-opening polymerizing of 2,2,3,3, tetrafluorooxetane in an aprotic solvent in the presence of an alkali metal halide polymerization initiator to give a polyether comprising repeating units of the formula:
- --(CH.sub.2 CF.sub.2 CF.sub.2 O).sub.a -- (II)
- wherein a is the same as defined above, and optionally fluorinating and/or chlorinating the polyether (II).
- 2. The process according to claim 1, wherein the ring-opening polymerization in the aprotic solvent is in the presence of an alkali metal fluoride and additionally an acyl fluoride which reacts with the alkali metal fluoride to generate alkoxy anion.
- 3. The process according to claim 1, wherein the aprotic solvent is a polyethylene glycol dimethyl ether of the formula:
- CH.sub.3 O(CH.sub.2 CH.sub.2 O).sub.n CH.sub.3
- wherein n is an integer of 2 to 4.
- 4. The process according to claim 2, wherein the aprotic solvent is a polyethylene glycol dimethyl ether of the formula:
- CH.sub.3 O(CH.sub.2 CH.sub.2 O).sub.n CH.sub.3
- wherein n is an integer of 2 to 4. .--
- 5. The process according to claim 1, wherein the ring-opening polymerization in the aprotic solvent is additionally carried out in the presence of a large cyclic polyether as a polymerization accelerator.
- 6. The process according to claim 5, wherein the aprotic solvent is selected from the group consisting of acetonitrile and a polyethylene glycol dimethyl ether of the formula:
- CH.sub.3 O(CH.sub.2 CH.sub.2 O).sub.m CH.sub.3
- wherein m is an integer of 1 to 4.
- 7. A process for preparing a fluorine-containing polyether comprising repeating units of the formula:
- --(CH.sub.2 CF.sub.2 CF.sub.2 O).sub.a --(CHFCF.sub.2 CF.sub.2 O).sub.d --(CF.sub.2 CF.sub.2 CF.sub.2 O).sub.f -- (III)
- wherein a, d and f are each an integer not less than 0 and satisfy the following equations:
- 2 .ltoreq.a+d+f .ltoreq.200,
- and
- 1 .ltoreq.d+f,
- which process comprises fluorinating a fluorine-containing polyether comprising repeating units of the formula:
- --(CH.sub.2 CF.sub.2 CF.sub.2 O).sub.a -- (II)
- wherein a is the same as defined above.
- 8. The process according to claim 7, wherein the fluorinating is carried out with fluorine gas.
- 9. A process for preparing a fluorine-chlorine-containing polyether comprising repeating units of the formula:
- --(CH.sub.2 CF.sub.2 CF.sub.2 O).sub.a --(CHClCF.sub.2 CF.sub.2 O).sub.b --(CCl.sub.2 CF.sub.2 CF.sub.2 O).sub.c --(CHFCF.sub.2 CF.sub.2 O).sub.d --(CFClCF.sub.2 CF.sub.2 O).sub.e --(CF.sub.2 CF.sub.2 CF.sub.2 O).sub.f --(IV)
- wherein a, b, c, d, e, and f are each an integer not less than 0 and satisfy the following equations:
- 2 .ltoreq.a+b+c+d+e+f+200,
- 1 .ltoreq.a+c+d+f
- and
- 1 .ltoreq.b+c+e,
- which comprises fluorinating and chlorinating a fluorine-containing polyether comprising repeating units of the formula:
- --(CH.sub.2 CF.sub.2 CF.sub.2 O).sub.a -- (II)
- wherein a is the same as defined above.
- 10. The process according to claim 9, wherein the chlorinating is carried out with chlorine gas and the fluorinating is carried out with fluorine gas.
- 11. The process according to claim 9, wherein the chlorinating is carried out with radiation of light having a wavelength of from 200 to 500 nm.
- 12. A process for preparing a halogen-containing polyether comprising repeating units of the formula:
- --(CH.sub.2 CF.sub.2 CF.sub.2 O).sub.a --(CHClCF.sub.2 CF.sub.2 O).sub.b --(CCl.sub.2 CF.sub.2 CF.sub.2 O).sub.c (CHFCF.sub.2 CF.sub.2 O)hd d--(CFClCF.sub.2 CF.sub.2 O).sub.e 13 (CF.sub.2 CF.sub.2 CF.sub.2).sub.f --(I)
- wherein a, b, c, d, e, and f are each an integer not less than 0 and satisfy the following equations:
- 2 .ltoreq.a+b+c+d+e+f .ltoreq.200
- and
- 1 .ltoreq.a+c+d+f,
- comprising a ring-opening polymerizing of 2,2,3,3 tetrafluorooxetane at a temperature of -30 to +100.degree. C. in the presence of a strong Lewis acid and optionally a solvent to give a polyether comprising repeating units of the formula:
- --(CH.sub.2 CF.sub.2 CF.sub.2 O).sub.a -- (II)
- wherein a is the same as defined above, and optionally fluorinating and/or chlorinating the polyether (II).
- 13. The process according to claim 12, wherein the solvent is present and is a dimer or trimer of hexafluoropropylene.
- 14. The process according to claim 12, wherein the storing Lewis acid is antimony pentafluoride.
- 15. The process according to claim 12, wherein the solvent is present and is a dimer or trimer of hexafluoropropylene, and the strong Lewis acid is antimony pentafluoride.
- 16. The process of claim 1, wherein the ring opening polymerization of 2,2,3,3-tetrafluorooxetane is carried out at a temperature of -30.degree. to 100.degree. C.
- 17. The process of claim 1, wherein the ring opening polymerization of 2,2,3,3-tetrafluorooxetane is carried out at a temperature of -30 to +50.degree. C.
- 18. The process according to claim 1, wherein the alkali metal halide polymerization initiator is present in an amount of 0.001% to 30% by mole, based on the amount of 2,2,3,3-tetrafluorooxethane present.
- 19. The process according to claim 8, wherein fluorinating is carried out at a temperature of 160.degree. to 300.degree. C.
- 20. The process according to claim 8, wherein fluorinating is carried out at a temperature of 180.degree. to 250.degree. C.
- 21. The process of claim 10, wherein the fluorinating is carried out at a temperature of 160.degree. to 300.degree. C.
- 22. The process of claim 10, wherein the chlorinating is carried out at a temperature of 30.degree. to 200.degree. C.
- 23. The process of claim 11, wherein the chlorinating is carried out at a temperature of 30.degree. to 200.degree. C.
- 24. A process for preparing a halogen-containing polyether comprising repeating units of the formula:
- --(CH.sub.2 CF.sub.2 CF.sub.2 O).sub.a --(CHClCF.sub.2 CF.sub.2 O).sub.b --(CCl.sub.2 CF.sub.2 CF.sub.2 O).sub.c --(CHFCF.sub.2 CF.sub.2 O).sub.d --(CFClCF.sub.2 CF.sub.2 O).sub.e --(CF.sub.2 CF.sub.2 CF.sub.2 O).sub.f --(I)
- wherein a, b, c, d, e, and f are each an integer not less than 0 and satisfy the following equations:
- 2 .ltoreq.a+b+c+d+e+f.ltoreq.200
- and
- 1 .ltoreq.a+c+d+f,
- the process comprising: the ring-opening polymerizing of 2,2,3,3-tetrafluorooxetane in the presence of a polyethylene glycol dimethyl ether solvent of the formula:
- CH.sub.3 O(CH.sub.2 CH.sub.2 O).sub.n CH.sub.3
- wherein n is an integer of 2 to 4, and in the presence of 0.001 to 30% by mole, based on the amount of 2,2,3,3-tetrafluorooxetane present, of an alkali metal halide polymerizing initiator, and at a temperature of -30.degree. to 100.degree. C.; to give a polyether comprising a repeating unit(s) of the formula:
- --(CH.sub.2 CF.sub.2 CF.sub.2 O).sub.a -- (II)
- wherein a is the same as defined above, and thereafter fluorinating and/or chlorinating the polyether repeating unit(s) of Formula II, by fluorinating with fluorine gas at a temperature of 160.degree. to 300.degree. C., and chlorinating with chlorine gas at a temperature of 30.degree. to 200.degree. C. in the presence of radiation from a light having a wavelength of from 200 to 500 nm.
- 25. The process of claim 24, wherein said repeating unit(s) of Formula II are fluorinated, as optionally provided for, to give a fluorine containing polyether comprising repeating unit(s) of the formula:
- --(CH.sub.2 CF.sub.2 CF.sub.2 O).sub.a --(CHFCF.sub.2 CF.sub.2 O).sub.d --(CF.sub.2 CF.sub.2 CF.sub.2 O).sub.f -- (III)
- wherein a, d and f satisfy the requirement of claim 24, and the equation 1 .ltoreq.d+f.
- 26. The process of claim 24, wherein said repeating unit(s) of Formula II are both fluorinated and chlorinated, as optionally provided for in claim 24, to give a fluorine/chlorine-containing polyether of the formula:
- --(CH.sub.2 CF.sub.2 CF.sub.2 O).sub.a --(CHClCF.sub.2 CF.sub.2 O).sub.b --(CCl.sub.2 CF.sub.2 CF.sub.2 O).sub.c --(CHFCF.sub.2 CF.sub.2 O).sub.d --(CFClCF.sub.2 CF.sub.2 O).sub.e --(CF.sub.2 CF.sub.2 CF.sub.2 O).sub.f --(IV)
- wherein a, b, c, d, e, and f satisfy the requirements in claim 24, and the equation 1 .ltoreq.b+c+e.
- 27. A process for preparing a halogen-containing polyether comprising repeating units of the formula:
- --(CH.sub.2 CF.sub.2 CF.sub.2 O).sub.a --(CHClCF.sub.2 CF.sub.2 O).sub.b --(CCl.sub.2 CF.sub.2 CF.sub.2 O).sub.c --(CHFCF.sub.2 CF.sub.2 O).sub.d --(CFClCF.sub.2 CF.sub.2 O).sub.e --(CF.sub.2 CF.sub.2 CF.sub.2 O).sub.f --(I)
- wherein a, b, c, d, e, and f are each an integer not less than 0 and satisfy the following equations:
- 2 .ltoreq.a+b+c+d+e+f.ltoreq.200 and
- 1 .ltoreq.a+c+d+f,
- the process comprising: the ring-opening polymerizing of 2,2,3,3-tetrafluorooxetane in the presence of a polyethylene glycol dimethyl ether solvent of the formula:
- CH.sub.3 O(CH.sub.2 CH.sub.2 O).sub.n CH.sub.3
- wherein n is an integer of 2 to 4, and in the presence of 0.001 to 30% by mole, based on the amount of 2,2,3,3-tetrafluorooxetane present, of an alkali metal halide polymerizing initiator, and at a temperature of -30 .degree. to 100.degree. C., to give a polyether comprising a repeating unit(s) of the formula:
- --(CH.sub.2 CF.sub.2 CF.sub.2 O).sub.a -- (II)
- wherein a is the same as defined above.
Priority Claims (3)
Number |
Date |
Country |
Kind |
58-251069 |
Dec 1983 |
JPX |
|
59-058877 |
Mar 1984 |
JPX |
|
59-235610 |
Nov 1984 |
JPX |
|
Parent Case Info
This application is a divisional of copending application Ser. No. 940,191, filed on Dec. 9, 1986, now U.S. Pat. No. 4,845,268, which is a Dec. 20, 1984, now abandoned.
US Referenced Citations (1)
Number |
Name |
Date |
Kind |
4845268 |
Ohsaka et al. |
Jul 1989 |
|
Divisions (1)
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Number |
Date |
Country |
Parent |
940191 |
Dec 1986 |
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Continuations (1)
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Number |
Date |
Country |
Parent |
684345 |
Dec 1984 |
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