The present invention relates to a heater used in e.g. a laser printer for thermally fixing toner transferred to recording paper. The present invention also relates to a method for manufacturing such a heater.
The heater X has a drawback that the separation of the heating resistor 92 and the electrode 93 may occur. The separation can be caused by generation of bubbles or deterioration of the bonding strength due to the diffusion of Ag contained in the electrode 93. The separation generally tends to occur at the portion where the heating resistor 92 and the electrode 93 overlap each other. When the separation occurs in the manufacturing process, the heater X is disposed of as a defective product. When the bonding between the heating resistor 92 and the electrode 93 is deteriorated during the use, the heating resistor 92 is not heated sufficiently, which hinders proper printing.
Patent Document 1: JP-A-2004-6289
The present invention has been proposed under the circumstances described above. It is, therefore, an object of the present invention to provide a heater which is capable of preventing the separation of a heating resistor and an electrode and a method for manufacturing such a heater.
To achieve the object, the present invention takes the following technical measures.
A heater provided according to a first aspect of the present invention includes a substrate, a heating resistor formed on the substrate, and an electrode electrically connected to the heating resistor and containing a metal component. The heater further includes a diffusion prevention layer which is held in contact with at least part of the electrode and prevents the metal component from diffusing from the electrode.
In a preferred embodiment of the present invention, the diffusion prevention layer is disposed between the heating resistor and the electrode.
In a preferred embodiment of the present invention, the diffusion prevention layer contains a higher percentage of Pd than the electrode.
In a preferred embodiment of the present invention, the heater further includes a protective film covering the heating resistor and made of glass. The diffusion prevention layer contains glass having a softening point that is equal to or higher than the softening point of the glass forming the protective film.
In a preferred embodiment of the present invention, the electrode comprises a connection pad spaced from the heating resistor and an extension extending from the connection pad to the heating resistor.
A method for manufacturing a heater provided according to a second aspect of the present invention includes the steps of: applying a conductor paste, a glass conductor paste and a resistor paste on a substrate in a manner such that the glass conductor paste is disposed between the conductor paste and the resistor paste; and forming an electrode, a diffusion prevention layer and a heating resistor by collectively baking at least the glass conductor paste and the resistor paste.
In a preferred embodiment of the present invention, the method further includes the step of forming a protective film to cover the heating resistor by utilizing glass having a softening point that is equal to or lower than the softening point of the glass contained in the glass conductor paste after the baking step.
Other features and advantages of the present invention will become more apparent from the detailed description given below with reference to the accompanying drawings.
Preferred embodiments of the present invention will be described below with reference to the accompanying drawings.
The substrate 1 is in the form of an elongated rectangle and made of an insulating material. Examples of the insulating material include AlN and Al2O3.
The heating resistor 2 is provided on the substrate 1 and in the form of a generally U-shaped strip. The heating resistor 2 includes, as a resistive material, Ag—Pd. The proportion of Pd in Ag—Pd is e.g. 50 to 60 wt %. The particle size of Ag contained in the heating resistor 2 is about 1.0 to 3.0 μm. The heating resistor 2 further includes crystallized glass such as SiO2—B2O3—R-based glass or SiO2—B2O3—Al2O3—R-based glass (where R is any of ZnO2, LiO2 and TiO2). The sheet resistance of the heating resistor 2 is e.g. 100 to 2000 mΩ/□.
The electrode 3 is used for supplying electrical power from a power supply (not shown) to the heating resistor 2. The electrode 3 is mainly made of Ag. The particle size of Ag contained in the electrode 3 is about 1.0 to 3.0 μm. The electrode 3 may contain 5 wt % or less of Pd. The sheet resistance of the electrode 3 is e.g. 1 to 10 mΩ/□. The electrode 3 includes a connection pad 3a and an extension 3b. The connection pad 3a is substantially square and spaced from the heating resistor 2. In incorporating the heater A1 into e.g. a laser printer, e.g. a connector (not shown) is connected to the connection pad 3a. The extension 3b is in the form of a strip extending from the connection pad 3a to the heating resistor 2 and has a width smaller than the length of a side of the connection pad 3a.
The diffusion prevention layer 4 is mainly made of Ag and held in contact with at least part of the electrode 3. The particle size of Ag contained in the diffusion prevention layer 4 is about 1.0 to 3.0 μm. In this embodiment, the diffusion prevention layer 4 further contains Pd and glass. The content percentage of Pd in the diffusion prevention layer 4 is higher than that in the electrode 3 and may be 5 to 15 wt %. The glass contained in the diffusion prevention layer 4 is crystallized glass such as SiO2—BaO—Al2O3—ZnO. In this embodiment, the diffusion prevention layer 4 covers the entirety of the electrode 3. Thus, the diffusion prevention layer 4 intervenes between the heating resistor 2 and the electrode 3, and the heating resistor 2 and the electrode 3 are not held in direct contact with each other. For easier understanding, the glass contained in the diffusion prevention layer 4 is illustrated as small circles in
The protective film 5 is provided for protecting the heating resistor 2 and covers the heating resistor 2 and part of the electrode 3 and diffusion prevention layer 4. The protective film 5 is made of glass whose softening point is equal to or lower than that of the glass contained in the diffusion prevention layer 4. In this embodiment, the diffusion prevention layer 4 has a laminated structure made up of e.g. a crystallized glass such as SiO2—BaO—Al2O3—ZnO-based glass, a semi-crystalline glass such as BaO—SiO2-based glass and an amorphous glass such as SiO2—ZnO—MgO-based glass.
A method for manufacturing the heater A1 will be described below with reference to
First, as shown in
Then, as shown in
The advantages of the heater A1 and the manufacturing method will be described below.
The present invention aims to prevent the separation of the heating resistor 2 and the electrode 3. The generation of bubbles at the portion where the heating resistor 2 and the electrode 3 overlap each other is considered to be a cause of the separation. The inventors of the present invention have found that the generation of bubbles is promoted by the diffusion of Ag from the electrode 3 to the heating resistor 2 in the manufacturing process.
In this embodiment, the heating resistor 2 and the electrode 3 are not arranged in direct contact with each other. The diffusion prevention layer 4 intervening between these elements contains a relatively large amount of Pd. Since Pd has a function to bind Ag, Ag is hardly diffused from the diffusion prevention layer 4. Further, the diffusion prevention layer 4 prevents the diffusion of Ag from the electrode 3 to the heating resistor 2. Thus, this arrangement is suitable for preventing the separation of the heating resistor 2. The diffusion prevention layer 4 containing a relatively large amount of Pd easily becomes porous. Thus, even when bubbles are generated from the substrate 1 or the nearby portion, the bubbles are properly released.
The extension 3b and the diffusion prevention layer 4 overlap each other at the region between the connection pad 3a and the heating resistor 2. The resistance of the diffusion prevention layer 4 is relatively high, because glass, which is an insulator, is contained in the layer. As compared to this, the resistance of the extension portion 3b made of Ag, which is a good conductor, is considerably low. Thus, at the region where the diffusion prevention layer 4 and the extension 3b overlap each other, current flows selectively to the extension 3b. Thus, the resistance of the entire heater A1 is prevented from increasing.
In the baking process to form the protective film 5, the baking temperature is so set that the glass in the protective film 5 is sufficiently solidified and does not unduly move due to baking. Such a baking temperature is not much higher than the softening point of the glass. The diffusion prevention layer 4 contains glass whose softening point is equal to or higher than that of the glass forming the protective film 5. Thus, in the baking process to form the protective film 5, the diffusion prevention layer 4 formed in advance reliably keeps the solidified state and does not become flowable. Thus, Ag, which is the main component of the diffusion prevention layer 4, is bound by glass. Thus, diffusion of Ag from the diffusion prevention layer 4 to the heating resistor 2 is prevented. As a result, bubbles are not generated at the portion where the heating resistor 2 and the electrode 3 overlap each other, so that the separation of the heating resistor 2 and the electrode 3 is prevented.
For comparison with this embodiment, a method is considered in which the resistor paste 2A is applied after the electrode 3 and the diffusion prevention layer 4 are formed by baking. In this case, in the process of applying, drying and baking the resistor paste 2A, Ag diffuses from the diffusion prevention layer 4 having a higher Ag concentration to the resistor paste 2A or the heating resistor 2 having a lower Ag concentration. As a result, minute pores are formed in the diffusion prevention layer 4 at the portion held in contact with the heating resistor 2. The minute pores may induce the separation of the heating resistor 2 and the diffusion prevention layer 4.
In this embodiment, however, the baking of the resistor paste 2A is begun, with the conductor paste 3A and the glass conductor paste 4A unbaked. Thus, even when Ag diffuses from the glass conductor paste 4A having a higher Ag concentration to the resistor paste 2A having a lower Ag concentration, the minute regions in the glass conductor paste 4A in which Ag has existed are filled with glass. Thus, minute pores are prevented from being formed in the diffusion prevention layer 4 at the region held in contact with the heating resistor 2. Thus, the bonding strength between the heating resistor 2 and the diffusion prevention layer 4 is enhanced. Alternatively, the diffusion prevention layer 4 and the heating resistor 2 may be formed by the above-described process after the electrode 3 is formed by baking. With this method again, the bonding strength between the heating resistor 2 and the diffusion prevention layer 4 is enhanced.
In this embodiment again, the separation of the heating resistor 2 and the electrode 3 is prevented. The diffusion prevention layer 4 overlaps at least one of the heating resistor 2 and the electrode 3. Thus, the current applied to the heater A2 flows to both of the diffusion prevention layer 4 and the heating resistor 2 or both of the diffusion prevention layer 4 and the electrode 3. This prevents excessive heat generation at part of the diffusion prevention layer 4.
The heater and the manufacturing method according to the present invention are not limited to the foregoing embodiments. The specific structure of the heater and the manufacturing method may be varied in design in many ways.
In the heater according to the present invention, it is preferable that the content percentage of Pd in the diffusion prevention layer is higher than that in the electrode. Thus, the electrode may not contain Pd at all. Further, unlike the foregoing embodiment, the glass contained in the diffusion prevention layer may not be the same glass as that forming the protective film. For instance, a glass whose softening point is higher than the glass forming the protective film may be contained in the diffusion prevention layer.
Number | Date | Country | Kind |
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2007-031639 | Feb 2007 | JP | national |
2007-161040 | Jun 2007 | JP | national |
Filing Document | Filing Date | Country | Kind | 371c Date |
---|---|---|---|---|
PCT/JP2008/052224 | 2/12/2008 | WO | 00 | 8/13/2009 |
Publishing Document | Publishing Date | Country | Kind |
---|---|---|---|
WO2008/099798 | 8/21/2008 | WO | A |
Number | Date | Country |
---|---|---|
2002075599 | Mar 2002 | JP |
2002108120 | Apr 2002 | JP |
2002289328 | Oct 2002 | JP |
2004-6289 | Jan 2003 | JP |
2003-109727 | Apr 2003 | JP |
2003109727 | Apr 2003 | JP |
2004006289 | Jan 2004 | JP |
2006351366 | Dec 2006 | JP |
Number | Date | Country | |
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20100032427 A1 | Feb 2010 | US |