The present invention relates to a permanent magnet structure and undulator using the same, and in particular to a helical permanent magnet structure and undulator using the same.
An undulator is developed in modern times and has been widely applied to various fields, such as radiation experiment, solid state physics, biology and medical science. Nowadays, other applications for new uses of the undulator is still being researched.
Linear Accelerator is one type of the undulators in early days, in which an electric field occurs through several field generators arranged in line, e.g., electrode collar, so as to accelerate the charged particle continuingly by changing the electric property of the surface of the electric field. However, with the charged particle becomes faster and faster, the field generators must keep high voltage during the acceleration process, it leads not only the high cost but also the risk of safety. In addition, the electric charges exist on the surface of the high-voltage electric field may increase the interference to the charged particle. Further, in terms of the linear accelerators, the length of the path of the charged particle is decided by the length of the field generators, the features results in the linear accelerator with huge size so a waste of space.
Another type of the undulators is Synchrotron, such as a polarizing undulator published by SLAC National Accelerator Laboratory of Stanford University in 2014 (COMMISSIONING OF THE DELTA POLARIZING UNDULATOR AT LCLS, SLAC-PUB-16404), in which the charged particle is acted by a helical magnetic field and an electric field simultaneously so that to move helically in the undulator. Therefore, the path of the charged particle can be extended in the same linear distance.
However, the mentioned helical magnetic field is simulated by four magnetic fields in X-Y plane which are generated by the magnet assemblies set around the charged particle in four directions. Hence, the efficiency of polarization and the magnetic strength are both lower than real helical magnetic field. Moreover, the magnet structure causes the limitation in space to the four magnet assemblies, as a result, the lower uniformity of whole of the magnet field takes a toll on the application of the undulator.
According to one aspect of the present disclosure, a helical permanent magnet structure includes at least one magnet assembly. The magnet assembly includes a plurality of permanent magnets and poles. The permanent magnets are with a magnetization direction, and formed as helical shape and arranged as a helical surface, the center of the helical surface has a longitudinal passage for being passed through by a charged particle. The poles are with the same amount of the permanent magnets, wherein the poles are magnetized by the permanent magnets and absorb on one side of the permanent magnets.
According to another aspect of the present disclosure, an undulator includes the helical permanent magnet structure of the aspect as mentioned above.
To make it easier for the examiner to understand the objects, characteristics and effects of this invention, we use a preferred embodiment together with the attached drawings for the detailed description of the present disclosure.
With reference to
To overcome the magnetic force between each of the magnet assemblies 200, a plurality of recesses, corresponded to the shape of the positioning member 400, are disposed on the outside of each of the permanent magnets 210 and each of the poles 220. Consequently, each of the magnet assembly 200 can be aligned accurately by positioning the permanent magnet 210 and the pole 220 with the positioning member 400.
As shown in
With reference to
With reference to
With and 4B for a schematic view of the magnet assembly and the distribution of magnetic field of
With reference to
The helical permanent magnet structure 100 of the present disclosure can be applied to an undulator, including but not limited to a free electron laser or a synchrotron radiation accelerator.
Accordingly, for the embodiment as mentioned, the present application provides magnetic fields with higher circularly polarized rate, magnetic strength and uniformity with the helical permanent magnet structure, therefore to enhance the performance of the undulators.
While the invention has been described by means of specific embodiments, numerous modifications and variations could be made thereto by those skilled in the art without departing from the scope and spirit of the invention set forth in the claims.
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H.-D. Nuhn—Commissioning of the Delta Polarizing Undulator at LCLS—Presented at the 37th International Free-Electron-Laser Conference (FEL15), Daejeon Korea SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, CA 94025; 7 pgs. |
Number | Date | Country | |
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20190075646 A1 | Mar 2019 | US |