High carrier concentration p-type transparent conducting oxide films

Abstract

A p-type transparent conducting oxide film is provided which is consisting essentially of, the transparent conducting oxide and a molecular doping source, the oxide and doping source grown under conditions sufficient to deliver the doping source intact onto the oxide.

Description

TECHNICAL FIELD

[0003] The invention relates to p-Type transparent conducting oxide films and a method for making high quality p-Type transport conducting oxide films.

BACKGROUND ART

[0004] Zinc oxide (ZnO), like other transparent conducting oxides, is an important material for-next generation short-wavelength optoelectronic devices such as low cost, optically transparent light-emitting diodes (LEDs) and laser diodes, transparent p-n junctions, large area flat-panel displays, and solar cells. J. Hu and R. Gordon, Solar cells, 30, 437 (1991); A. E. Delahoy and M. Cherny, Mater. Res. Soc. Symp.Proc. 426, 467 (1996); and P. Yu, Z. K. Tang, G. K. L. Wong, M. Kawasaki, A. Ohtomo, H. Koinuma, and Y. Segawa, Proc. 23th Int. Conf. Physics of Semiconductors, Berlin, 1996, vol. 2, p. 1453.

[0005] To obtain these device applications, it is important to provide the technology necessary for fabrication of both high quality p-type and n-type ZnO films. However, like most wide-band-gap semiconductors, ZnO has the asymmetric doping limitations, G. F. Neumark, Phys. Rev. Lett. 62,1800 (1989), T. Minami, H. Sato, H. 25 Nanto, and S. Tanaka, Jpn. J. Appl. Phys. 24, L781 (1985), S. B. Zhang, S. -H. Wei, and A. Zunger, J. Appl. Phys. 83, 3192 (1998), D. J. Chadi, Phys. Rev. Lett. 72, 534 (1994); S. B. Zhang, S. -H. Wei, and A. Zunger, Phys. Rev. Lett. 84, 1232 (2000), i.e., it can be easily doped high quality n-type, T. Minami, H. Sato, H. Nanto, and S. Tanaka, Jpn. J. Appl. Phys. 24, L781 (1985), ibid. 25, L776 (1986), J. Hu and R. G. Gordon, Solar Cells 30,437 (1991), but difficult to dope p-type.

[0006] Accordingly, fabricating high quality p-type films is the existing challenge in order to obtain the device application of ZnO. Nitrogen, a good p-type dopant for other II-VI semiconductors, R. M. Park, M. B. Troffer, C. M. Rouleau, J. M. DePuydt, and M. A. Haase, Appl. Phys. Lett. 57, 2127 (1990), has long been considered as a possible dopant for p-type ZnO. A. Kobayashi, O. F. Sankey, and J. D. Dow, Phys. Rev. B 28, 946 (1983). Recent theoretical studies have revealed that the difficulty of making p-type ZnO results from the compensation of low formation energy donor like defects, mainly O vacancies (Vo). A. F. Kohan, G. Ceder, D. Morgan and C. G. van de Walle, Phys. Rev. B 61, 15019 (2000), S. B. Zhang, S. -H. Wei, and A. Zunger, Phys. Rev. B 63, 75205 (2001), Y. Yan, S, J. Pennycook, and S. T. Pantelides, (to be published).

[0007] Yamamoto and Katayama-Yoshida proposed that high carrier concentration p-type ZnO films can be achieved by Ga and N codoping approach, T. Yamamoto and H. Katayama-Yoshida, Jpn. J. Appl. Phys. 38, L 1 66 (1999), based on their theoretical findings, i.e., the formation of acceptor-donor-acceptor complexes (No—Gazn—No) to significantly reduce the Madelung energy of the system. By applying this approach, Joseph et al. reported that high carrier concentration (4×1019 cm−3), but very low mobility (0.07 cm2/V.s) p-type ZnO films have been observed using N2O gas with electron cyclotron resonance (ECR) plasma and an additional Ga source. M. Joseph, H. Tabata, and T. Kawai, Jpn. J. Appl. Phys. 38, L1205 (1999). However, the codoping approach can only be realized successfully at a very narrow growth window, e.g., low substrate temperature and restrictedly controlled vapor pressure. H. Katayama-Yoshida, MRS Workshop on Transparent Conducting Oxides, (Denver, 2000). These stringent restrictions are due to the complexity of utilizing specific metastable configuration of No—Gzn—No, multidopant sources and plasma. Thus, the application of the codoping approach is limited, and new methods for fabricating high carrier concentration p-type ZnO films are needed.

[0008] We are aware of only three reports on p-type ZnO films. However, they used different dopants. In one report, ammonia was used as a dopant (K. Minegishi, Y.Koiwai, Y. Kikuchi, K. Yano, M.Kasuga, and A. Shimizu, Jpn, J. Appl. Phys.36, L1453 (1997)). In the other two reports, N2O gas was used as a dopant (M. Joseph, J. Tabata, and T. Kawai, Jpn. J Appl.Phys. 38, L1205 (1999); X. L. Guo, H. Tabata, and T. Kawai, J. Crystal Growth 223, 135 (2001)). Some advantages of our invention have been addressed in our provisional application.

[0009] U.S. Pat. Nos. 5,578,501; 5,420,043; and 5,324,365 each disclose methods for manufacturing solar cells in which a ZnO transparent conducting layer is used as electrodes. The ZnO layer used in these three patents are not made to be p-type conductors.

[0010] A method for continuously depositing transparent oxide material (including ZnO) by chemical pyrolysis is disclosed in U.S. Pat. No. 5,180,686. This patent only disclose a method for making regular ZnO films for solar cell use, in which the ZnO is an n-type conductor.

[0011] U.S. Pat. No. 5,612,229 discloses a method for manufacturing solar cells in which a ZnO transparent conductor layer is used as electrodes. This patent does not disclose how to make p-type ZnO and other metal oxide films.

[0012] U.S. Pat. Nos. 5,804,466 and 6,238,808 B1 disclose methods of producing high quality ZnO films for use in solar cells. These patents do not disclose any method for making p-type ZnO films.

[0013] Methods for manufacturing solar cells is disclosed in U.S. Pat. Nos. 5,716,480 and 5,913,986; however, these patents do not disclose methods for making p-type ZnO films. U.S. Pat. No. 5,458,753 disclose better quality ZnO films containing Ga. The ZnO films are n-type materials.

[0014] A method of producing n-type ZnO film used as window layers in solar cells is disclosed in U.S. Pat. No. 6,040,521.

[0015] U.S. Pat. No. 5,990,416 discloses a method to reduce a dopant in metal oxide films. The dopant is a metal element. This patent does not disclose any method for making p-type ZnO films.

[0016] U.S. Pat. No. 5,078,803 discloses a method for manufacturing solar cells incorporating transparent electrodes comprising hazy ZnO. This patent does not disclose any method for making p-type ZnO films.

[0017] A method for manufacturing a thin film photovoltaic device comprising a transparent conductive film, which may be ZnO is disclosed in U.S. Pat. No. 6,187,150 B1. This patent does not disclose any method for making p-type ZnO films.

[0018] U.S. Pat. No. 5,620,924 discloses a method of preventing deterioration of film quality of transparent conductive film, which may be ZnO. This patent does not disclose any method for making p-type ZnO films.

[0019] A process for producing a thin film solar cell is disclosed in U.S. Pat. No. 6,242,687 B1. This patent does not disclose any method for making p-type ZnO films.

[0020] U.S. Pat. No. 6,107,116 discloses a method for producing a photovoltaic element with ZnO as a layer having increasing F content in the layer thickness direction. This patent does not disclose a method for making p-type ZnO films.

[0021] A method for manufacturing photovoltaic devices is disclosed in U.S. Pat. No. 6,043,427. The method does not disclose making p-type ZnO films. A method for manufacturing photovoltaic devices comprising ZnO films is disclosed in U.S. Pat. No. 5,604,133. This patent does not disclose making p-type ZnO films.

[0022] U.S. Pat. No. 4,612,411 discloses a method for producing thin film solar cells with ZnO window layers. This patent does not disclose methods for making p-type ZnO films.

DISCLOSURE OF INVENTION

[0023] One object of the present invention is to provide a method for fabricating high quality p-type transparent conducting films, including ZnO films using either NO or N02 gas as a dopant and under Zn-rich growth conditions.

[0024] Another object of the present invention to provide high quality p-type films of transparent conducting oxides, such as ZnO, CdO, In2O3, SnO2, Ga2O3 and the alloys thereof.

[0025] A further object of the present invention is to use the films objects in the formation of shallow acceptor defects via multi-site substitution of NO or NO2 molecules, i. e., one molecule occupies more than one normally O sites, (which is highly energetically preferred) to provide high hole concentrations.

[0026] A still further object of the present invention is to use a NO or NO2 gas to further suppress the formation of donor-like defects such as Vo and Zni, to provide high hole mobility.

[0027] In general, the problems of the prior art methods are surmounted by providing a p-type transparent conducting oxide consisting essentially of a transparent conducting oxide and a molecular doping source, the oxide and doping source being grown under conditions sufficient to deliver the doping source intact onto the oxide before it dissociates.

BRIEF DESCRIPTION OF DRAWINGS

[0028] FIG. 1(a) shows the structure of the NO and NO2 molecule.

[0029] FIG. 1(b) shows the single —O— site substitutional NO, denoted as (NO)O—O, which is formed by a NO molecule substituting an O atom.

[0030] FIG. 1(c) shows the double —O— site substitutional NO: (NO)oo.

[0031] FIG. 1(d) shows the triple -0- site substitutional NO2, (NO2)OOO.

[0032] FIG. 2(a) shows the calculated formation energies as fumctions of the O chemical potential for the defects formed by: NO and NO2 molecules; and

[0033] FIG. 2(b) shows the calculated formation energies as functions of the 0 chemical potential for the defects formed by: N2O molecule. μ0=−3.3 is the Zn-rich limit condition where μ0=0 is the O-rich limit condition.

BEST MODE FOR CARRYING OUT THE INVENTION

[0034] Following hereafter is an illustration of the utility of solutions for fabricating the high quality p-type ZnO films, according to the present invention. High quality p-type ZnO films through first-principles total energy calculations are: High quality p-type ZnO films achieved using either NO or NO2 gas as a dopant under Zn-rich growth conditions. The formation of shallow acceptor defects via multi-site substitution of NO or NO2 molecules, i.e., one molecule occupies more than one normally O sites, is energetically highly preferred, and results in high hole concentrations. The use of NO or NO2 gas further suppresses the formation of donor-like defects such as Vo and Zni, leading to high hole mobility.

EXAMPLE

[0035] Calculations supporting the principles were carried out using density-functional theory, the generalized gradient approximation (GGA) for exchange-correlation, ultrasoft pseudopotentials, and plane waves. M. C. Payne, M. T. Teter, D. C. Allan, T. A. Arias, and J. D. Joannopoulos, Rev. Mod. Phys. 64,1045 (1992). A suitable energy cutoff for the plane waves was determined to be 380 eV. Å 32-atom supercell was used for defect calculations, which was found to be adequate. In all the calculations, all the atoms were allowed to relax until the Hellmann-Feynman forces acting on them become less than 0.01 eV/Å.

[0036] High quality p-type ZnO films can be achieved using either NO or NO2 gas as a dopant. It is known that in the equilibrium condition, the solubility of a point defect is mainly related to its formation energy, which usually depends on the atomic chemical potentials μπ. (the energy of the relevant atoms in their respective reservoirs). The reservoir energies can vary over certain ranges but are limited by the formation of elemental solid or gas. Thus, the chemical potentials for Zn and O satisfy

μZn O<μZn<μ(Zn metal) and μzno<μO<μ(O2 gas)  (1)

[0037] Here, μzno′=&Brketopenst;μzn+&Brketopenst;μo is the formation enthalpy of ZnO. Our calculated μπzno is −3.3 eV, close to the experimental value of −3.6 eV. In the equilibrium film growth conditions, the dopant sources are normally atomic elements, here N. Thus, the formation energy of a defect containing a N in ZnO films is given by

Eƒ=E (nzn, no, N)−nznμzn−nOμX−μvφ  (2)

[0038] where E (nzn, no, N)is the total energy of a system containing nzn Zn atoms, nO O atoms and one N atom and μN is the chemical potential of the N dopant. The upper bond of μN is determined by the chemical potential of N2 molecules because some atomic N will unavoidably form N2 molecules. This puts the upper limit on the chemical potential of the atomic N.

[0039] If instead of atomic N, NO or NO2 gas is used as dopants, the formation energy of the same defect described by eq. (2) is then given by:

E f =E (nzn,n0,N)−nznmzn−(nO−1)μO−μNO  (3)

[0040] or

E f =E (nzn,n0,N)−nznμzn−(nO−2)μO−μNO2  (4)

[0041] Here, eqs (3) and (4) are Eƒ for the NO gas and the NO2 gas, respectively. In this case, the formation of N2 requires the dissociation of NO or NO2, which is kinetically limited due to the large dissociation barriers. Thus, NO or NO2 molecules are not broken until they are incorporated in the film. According to eqs. (2), (3) and (4), the difference between the formation energies for the defect formed by atomic N and by NO (or by NO2) molecule can be written as ΔEƒ=μNO−(μN+μO) (or μNO2−(μN2μO)). Our calculations reveal that ΔEƒis −1.0 eV at the O-rich limit and −4.3 eV at the Zn-rich limit for using the NO gas, and 0.8 eV at the O-rich limit and −5.8 eV at the Zn-rich limit for using the NO2 gas. Thus, the formation energies of N related defects are largely reduced at the Zn rich condition when NO or NO2 gas is used as dopants, leading to significant enhancement of concentrations. The higher N chemical potentials (higher than ½μN2) due to the NO or NO2 molecules are the reason for the defect formation energy reduction. The same principal applies to other transparent conducting oxide films.

[0042] The use of NO or NO2 gas as dopants leads to an important result: an NO or an NO2 molecule occupying more than one 0 sites in ZnO is energetically highly preferred. We call these defects niulti-site substitutional molecules in order to distinguish them from the regular substitutional defects, in which a single host atom is replaced. As a result, high concentration p-type ZnO can be achieved. To demonstrate this point, we have calculated the formation energies for the various defects that could be formed by NO and NO2 molecules.

[0043] FIG. 1(a) shows the structures of an NO and an NO2 molecule.

[0044] FIG. 1(b) shows the single —O— site substitutional NO, denoted as (NO)O—O, which is formed by a NO molecule substituting an O atom. In effect, the N occupies a normally O site and the O of the molecule occupies an octahedral (O) interstitial site. The O of the molecule can also occupy a tetrahedral (T). This configuration is denoted as (NO)OT (not shown).

[0045] FIG.1(c) shows the double —O— site substitutional NO: (NO)OO. In effect, the N occupies a normally O site and the O of the NO molecule occupies a normally O site.

[0046] FIG. 1(d) shows the triple —O— site substitutional NO2, (NO2)−OOO, wherein in effect, the N occupies a normally O site and the two O's of the NO2 molecule occupy two normally O sites. The big and the small open circles represent Zn and O, respectively. The small block and gray circles represent N and O of the NO or NO2 molecules, respectively.

[0047] FIG. 2(a) shows the calculated formation energies as functions of the O chemical potential for the defects formed by: (NO and NO2) molecules.

[0048] FIG. 2(b) shows the calculated formation energies as functions of the O chemical potential for the defects formed by: the N2O molecule. μ0=−3.3 is the Zn - - - rich limit condition and μ0=0 is the O-rich limit condition. Since FIG. 2(a) shows the calculated formulation energies of these defects as functions of the O chemical potential, it is seen that the double —O— site substitutional NO and the triple —O— site substitutional NO2 have negative formation energies at the ZnO-rich conditions. The negative formation energies provide strong driving force for incorporating of NO and NO2 molecules into ZnO films. As it can be seen from FIGS. 1(b) and (d), the structures of (NO)OO and (NO2)OOO are in fact that of the conventional substitutional N, NO. The NO is a shallow acceptor. Hence, high hole concentration p-type ZnO films are achieved using NO or NO2 gas as dopant. In addition, (NO)OO can be viewed as a complex between an (NO)O and a VO, and (NO2)OOO can be viewed as a complex between (NO2)O and 2VO. This suggests that the formation of (NO)00 and (NO2)OOO will simultaneously eliminate most of the VO, the unwanted donor-like defects.

[0049] The formation of donor and donor-like defects in p-type materials are known to be detrimental to hole mobility. Thus, using NO or NO2 gas as dopants results in better carrier mobility than the films doped with atomic N.

[0050] From the above calculations we see that high carrier concentration p-type ZnO films with improved carrier mobility is achieved using NO or NO2 gas as a dopant. The concept of using molecules as dopants to prevent the formation of other unwanted forms of molecules in the growth chamber and the formation of multi-site substitutional defects are the keys.

[0051] While the present invention has been described and illustrated in detail, it is to be understood that the same is by way of illustration and that the spirit and scope of the invention is limited only by the appended claims.

Claims

1. A p-type transparent conducting oxide film consisting essentially of: a transparent conducting oxide and a molecular doping source, the oxide and doping source being grown under conditions sufficient to deliver the doping source intact onto the oxide.

2. The film of claim 1 wherein the doping source is a gas selected from the group consisting of NO and NO2.

3. The film of claim 2 wherein the transparent conducting oxide is selected from the group consisting of ZnO, CdO, In2O3, SnO3, Ga2O3, and the alloys thereof.

4. The film of claim 3 wherein said transparent conducting oxide is ZnO.

5. The film of claim 3 wherein said conditions sufficient to deliver said doping source include a temperature in the range of from about 200° to about 1000° C.

6. A method of producing p-type transparent conducting oxide films comprising: growing a transparent conducting oxide and doping the oxide using a molecular doping source under conditions sufficient to deliver the doping source intact on the oxide.

7. The method of claim 6 wherein the doping source is a gas selected from the group consisting of NO and NO2.

8. The method of claim 7 wherein the transparent conducting oxide is selected from the group consisting of ZnO, CdO, In2O3, SnO2, Ga2O3, and the alloys thereof.

9. The process of claim 8 wherein said transparent conducting oxide is ZnO.

10. The process of claim 7 wherein said conditions sufficient to deliver said doping source include a temperature in the range of from about 200° to about 1000° C.