High Concentration Ozone Production for Semiconductor Manufacturing

Information

  • NSF Award
  • 9161024
Owner
  • Award Id
    9161024
  • Award Effective Date
    1/1/1992 - 33 years ago
  • Award Expiration Date
    9/30/1992 - 32 years ago
  • Award Amount
    $ 50,000.00
  • Award Instrument
    Standard Grant

High Concentration Ozone Production for Semiconductor Manufacturing

The objective of the research is to explore the feasibility of developing compact, high concentration, ozone generation equipment for the demanding requirements of the semiconductor manufacturing and materials processing industry. Emerging processing technologies using ozone chemistry have given rise to the need for such equipment. Current generators are inadequate for the task and too large to be installed in the clean room environment next to the chemical vapor deposition system or other semiconductor tool. Current double-cooled generator designs also require a dielectric coolant and a dedicated recirculating oil cooling system to remove heat from the generator electrodes. The experimental program will be directed toward establishing the feasibility of developing a compact generator module and excitation source with the required performance.

  • Program Officer
    Ritchie B. Coryell
  • Min Amd Letter Date
    12/19/1991 - 33 years ago
  • Max Amd Letter Date
    12/19/1991 - 33 years ago
  • ARRA Amount

Institutions

  • Name
    Adelphi Technology, Inc
  • City
    Redwood City
  • State
    CA
  • Country
    United States
  • Address
    2003 East Bayshore Rd
  • Postal Code
    940634121
  • Phone Number
    6504742750

Investigators

  • First Name
    David
  • Last Name
    Boyers
  • Email Address
    dboyers@phifersmith.com
  • Start Date
    1/1/1992 12:00:00 AM

FOA Information

  • Name
    Industrial Technology
  • Code
    308000