High-frequency electrical connector

Information

  • Patent Grant
  • 11901663
  • Patent Number
    11,901,663
  • Date Filed
    Monday, December 5, 2022
    a year ago
  • Date Issued
    Tuesday, February 13, 2024
    2 months ago
Abstract
An electrical connector with improved high frequency performance. The connector has conductive elements, forming both signal and ground conductors, that have multiple points of contact distributed along an elongated dimension. The ground conductors may be formed with multiple beams of different length. The signal conductors may be formed with multiple contact regions on a single beam, with different characteristics. Signal conductors may have beams that are jogged to provide both a desired impedance and mating contact pitch. Additionally, electromagnetic radiation, inside and/or outside the connector, may be shaped with an insert electrically connecting multiple ground structures and/or a contact feature coupling ground conductors to a stiffener. The conductive elements in different columns may be shaped differently to reduce crosstalk.
Description
BACKGROUND

This disclosure relates generally to electrical interconnection systems and more specifically to improved signal integrity in interconnection systems, particularly in high speed electrical connectors.


Electrical connectors are used in many electronic systems. It is generally easier and more cost effective to manufacture a system on several printed circuit boards (“PCBs”) that are connected to one another by electrical connectors than to manufacture a system as a single assembly. A traditional arrangement for interconnecting several PCBs is to have one PCB serve as a backplane. Other PCBs, which are called daughter boards or daughter cards, are then connected through the backplane by electrical connectors.


Electronic systems have generally become smaller, faster, and functionally more complex. These changes mean that the number of circuits in a given area of an electronic system, along with the frequencies at which the circuits operate, have increased significantly in recent years. Current systems pass more data between printed circuit boards and require electrical connectors that are electrically capable of handling more data at higher speeds than connectors of even a few years ago.


One of the difficulties in making a high density, high speed connector is that electrical conductors in the connector can be so close that there can be electrical interference between adjacent signal conductors. To reduce interference, and to otherwise provide desirable electrical properties, shield members are often placed between or around adjacent signal conductors. The shields prevent signals carried on one conductor from creating “crosstalk” on another conductor. The shield also impacts the impedance of each conductor, which can further contribute to desirable electrical properties. Shields can be in the form of grounded metal structures or may be in the form of electrically lossy material.


Other techniques may be used to control the performance of a connector. Transmitting signals differentially can also reduce crosstalk. Differential signals are carried on a pair of conducting paths, called a “differential pair.” The voltage difference between the conductive paths represents the signal. In general, a differential pair is designed with preferential coupling between the conducting paths of the pair. For example, the two conducting paths of a differential pair may be arranged to run closer to each other than to adjacent signal paths in the connector. No shielding is desired between the conducting paths of the pair, but shielding may be used between differential pairs. Electrical connectors can be designed for differential signals as well as for single-ended signals.


Differential connectors are generally regarded as “edge coupled” or “broadside coupled.” In both types of connectors the conductive members that carry signals are generally rectangular in cross section. Two opposing sides of the rectangle are wider than the other sides, forming the broad sides of the conductive member. When pairs of conductive members are positioned with broad sides of the members of the pair closer to each other than to adjacent conductive members, the connector is regarded as being broadside coupled. Conversely, if pairs of conductive members are positioned with the narrower edges joining the broad sides closer to each other than to adjacent conductive members, the connector is regarded as being edge coupled.


Maintaining signal integrity can be a particular challenge in the mating interface of the connector. At the mating interface, force must be generated to press conductive elements from the separable connectors together so that a reliable electrical connection is made between the two conductive elements. Frequently, this force is generated by spring characteristics of the mating contact portions in one of the connectors. For example, the mating contact portions of one connector may contain one or more members shaped as beams. As the connectors are pressed together, each beam is deflected by a mating contact, shaped as a post or pin, in the other connector. The spring force generated by the beam as it is deflected provides a contact force.


For mechanical reliability, contacts may have multiple beams. In some implementations, the beams are opposing, pressing on opposite sides of a mating contact portion of a conductive element from another connector. In some alternative implementations, the beams may be parallel, pressing on the same side of a mating contact portion.


Regardless of the specific contact structure, the need to generate mechanical force imposes requirements on the shape of the mating contact portions. For example, the mating contact portions must be large enough to generate sufficient force to make a reliable electrical connection. These mechanical requirements may preclude the use of shielding, or may dictate the use of conductive material in places that alters the impedance of the conductive elements in the vicinity of the mating interface. Because abrupt changes in impedance may alter the signal integrity of a signal conductor, mating contact portions are often accepted as being noisier portions of a connector.


SUMMARY

Aspects of the present disclosure relate to improved high speed, high density interconnection systems. The inventors have recognized and appreciated techniques for configuring connector mating interfaces and other connector components to improve signal integrity. These techniques may be used together, separately, or in any suitable combination.


In some embodiments, relate to providing mating contact structures that support multiple points of contact distributed along an elongated dimension of a conductive elements of a connector. Different contact structures may be used for signal conductors and ground conductors, but, in some embodiments, multiple points of contact may be provided for each.


Accordingly, in some aspects, the invention may be embodied as an electrical connector comprising a plurality of conductive elements disposed in a column, each of the plurality of conductive members comprising a mating contact portion, a contact tail, and an intermediate portion between the mating contact portion and the contact tail. The electrical connector may be a first electrical connector. A first mating contact portion of a first conductive element of the plurality of conductive elements may comprise a first beam, a second beam and a third beam, the first beam being shorter than the second beam and the third beam. The first beam of the first mating contact portion may comprise a first contact region adapted to make electrical contact with a second mating contact portion of a second conductive element of a second electrical connector at a first point of contact. The second beam of the first mating contact portion may comprise a second contact region adapted to make electrical contact with the second mating contact portion of the second conductive element of the second electrical connector at a second point of contact, the second point of contact being farther from a distal end of the second mating contact portion than the first point of contact. The third beam of the first mating contact portion may comprise a third contact region adapted to make electrical contact with the second mating contact portion of the second conductive element of the second electrical connector at a third point of contact, the third point of contact being farther away from a distal end of the second mating contact portion than the first point of contact.


In some embodiments, the conductive elements may be ground conductors, which may separate signal conductors within the column.


In some embodiments, the first beam may be disposed between the second beam and the third beam.


In some embodiments, the first contact region may comprise a first protruding portion, and the second contact region may comprise a second protruding portion that protrudes to a greater extent than the first protruding portion.


In some embodiments, the first mating contact portion of the first conductive element may be adapted to apply a spring force to the second mating contact portion of the second conductive element when the first electrical connector is mated with the second electrical connector. In some embodiments, the first mating contact portion of the first conductive element may be adapted to be deflected by the second mating contact portion of the second conductive element by about 1/1000 inch when the first electrical connector is mated with the second electrical connector.


In some embodiments, the second beam may be about twice as long as the first beam.


In some embodiments, the plurality of conductive elements may comprise a third conductive element disposed adjacent to the first conductive element, and a third mating contact portion of the third conductive element may comprise a fourth beam and a fifth beam, the fourth and fifth beams being roughly equal in length. In some embodiments, a first combined width of the first, second, and third beams may be greater than a second combined width of the fourth and fifth beams. In some embodiments, the fourth beam of the third mating contact portion may comprise a fourth contact region adapted to make electrical contact with a fourth mating contact portion of a fourth conductive element of the second electrical connector, and the fifth beam of the third mating contact portion may comprise a fifth contact region adapted to make electrical contact with the fourth mating contact portion of the fourth conductive element of the second electrical connector. In some embodiments, the fourth beam of the third mating contact portion may be disposed closer to the first mating contact portion than the fifth beam of the third mating contact portion, and the fourth beam may further comprise a sixth contact region adapted to make electrical contact with the fourth mating contact portion of the fourth conductive element of the second electrical connector, the sixth contact region being farther away from a distal end of the fourth mating contact portion than the fourth contact region.


In another aspect, an electrical connector may comprise a plurality of conductive elements disposed in a column of conductive elements. Each of the plurality of conductive elements may comprise at least one beam. The plurality of conductive elements may be arranged in a plurality of pairs of conductive elements, each of the conductive elements in each pair having a first width. The plurality of conductive elements may comprise a plurality of wide conductive elements, each of the wide conductive elements being disposed between adjacent pairs of the plurality of pairs. Each of the wide conductive elements may comprise a plurality of beams, the plurality of beams comprising at least one longer beam and at least one shorter beam, the shorter beam being disposed separate from the longer beam and positioned such that when the electrical connector is mated to a mating electrical connector and the wide conductive element makes contact with a corresponding conductive element in mating connector, the shorter beam terminates a stub of the corresponding conductive element comprising a wipe region for the longer beam on the corresponding conductive element.


In some embodiments, the plurality of conductive elements disposed on the column may form a plurality of coplanar waveguides, each of the coplanar waveguides comprising a pair or the plurality of pairs and at least one adjacent wide conductive element of the plurality of wide conductive elements.


In some embodiments, the electrical connector may comprise a wafer, the wafer comprising a housing, the plurality of conductive elements being at least partially enclosed in the housing. In some embodiments, the housing may comprise insulative material and lossy material.


In some embodiments, each beam of the plurality of beams may comprise a contact region on a distal portion of the beam, and the contact regions of the beams of each pair of the plurality of pairs and the contact regions of each longer beam of the wide conductive elements may be disposed in a line adjacent a mating face of the connector.


In some embodiments, the plurality of beams for each of the wide conductive elements may comprise two longer beams and one shorter beam disposed between the two longer beams, the two longer beams being disposed along adjacent edges of the wide conductive elements. In some embodiments, each of the plurality of conductive elements in each of the plurality of pairs may comprise two beams. In some embodiments, the electrical connector may comprise a housing, each of the plurality of conductive elements may comprise an intermediate portion within the housing and a contact portion extending from the housing, the contact portion comprising a corresponding beam, the intermediate portions of the plurality of conductive elements may be configured with a first spacing between an edge of a wide conductive element and an edge of a conductive element of an adjacent pair of conductive elements, and the beams of the plurality of conductive elements may be configured such that the beams of conductive elements of the pairs have first regions and second regions, the first regions providing a spacing between a conductive element of a pair and an adjacent wide conductive element that approximates the first spacing and the second regions providing a spacing between the conductive element of the pair and the adjacent wide conductive element that is greater than the first spacing. In some embodiments, the spacing that is greater than the first spacing may provide a uniform spacing of contact regions along a mating interface of the connector. In some embodiments, each of the at least one beams of each of the pairs may comprise two beams.


In other aspects, the conductive elements in the connector may be shaped to provide desirable electrical and mechanical properties. Accordingly, in some embodiments, an electrical connector may comprise a housing and a plurality of conductive elements disposed in a column. Each of the plurality of conductive members may comprise a mating contact portion, a contact tail, and an intermediate portion between the mating contact portion and the contact tail. The intermediate portions of the plurality of conductive elements may be disposed within the housing and the mating contact portions of the plurality of conductive elements may extend from the housing. The plurality of conductive elements may comprise a first conductive element and a second conductive element disposed adjacent the first conductive element. A first proximal end of a first mating contact portion of the first conductive element may be spaced apart from a second proximal end of a second mating contact portion of the second conductive element by a first distance. A first distal end of the first mating contact portion of the first conductive element may be spaced apart from a second distal end of the second mating contact portion of the second conductive element by a second distance that is greater than the first distance.


In some embodiments, the first and second conductive elements may form an edge-coupled pair of conductive elements adapted to carry a differential signal.


In some embodiments, the electrical connector may be a first electrical connector, the first mating contact portion may comprise a first contact region adapted to make electrical contact with a third mating contact portion of a third conductive element of a second electrical connector at a first point of contact, and the first mating contact portion may further comprise a second contact region adapted to make electrical contact with the third mating contact portion of the third conductive element of the second electrical connector at a second point of contact, the second point of contact being closer to a third distal end of the third mating contact portion than the first point of contact. In some embodiments, the first contact region may be near the first distal end of the first mating contact portion, and the second contact region may be near a midpoint between the first proximal end and the first distal end of the first mating contact portion.


In some embodiments, the first mating contact portion of the first conductive element may comprise a first beam and a second beam, and the second mating contact portion of the second conductive element may comprise a third beam and a fourth beam. In some embodiments, the first, second, third, and fourth beams may be disposed adjacent to each other in a sequence, the first beam may comprise a first contact region near the first distal end, the second beam may comprise a second contact region near the first distal end, the third beam may comprise a third contact region near the second distal end, the fourth beam may comprise a fourth contact region near the second distal end, the first beam may further comprise a fifth contact region that is farther away from the first distal end than the first contact region, the fourth beam may further comprise a sixth contact region that is farther away from the second distal end than the fourth contact region, and each mating contact portion may comprise two beams.


In another aspect, an electrical connector may comprise a housing and a plurality of conductive elements disposed in a plurality of columns, each of the plurality of conductive members comprising a mating contact portion, a contact tail, and an intermediate portion between the mating contact portion and the contact tail. The intermediate portions of the plurality of conductive elements may be disposed within the housing and the mating contact portions of the plurality of conductive elements may extend from the housing. Within each of the plurality of columns the intermediate portions of the conductive elements may comprise a plurality of pairs of conductive elements, the conductive elements of the pairs having a first width. The intermediate portions may also comprise a plurality of wider conductive elements, the wider conductive elements having a second width, wider than the first width. Adjacent pairs of the plurality of pairs may be separated by a wider conductive element. Each of the pairs may have a first edge-to-edge spacing from an adjacent wider conductor. The mating contact portions of the conductive elements of each of the pairs may be jogged to provide the first edge-to-edge spacing from the adjacent wider conductor adjacent the housing and a second edge-to-edge spacing at the distal ends of the mating contact portions.


In some embodiments, the plurality of pairs of conductive elements may comprise differential signal pairs and the plurality of wider conductive elements may comprise ground conductors.


In some embodiments, the mating contact portions of the conductive elements of each pair may comprise at least one first beam and at least one second beam; and the at least one first beam and the at least one second beam may both jog away from a center line between the at least one first beam and the at least one second beam. In some embodiments, the at least one first beam may comprise two beams and the at least one second beam may comprise two beams.


In some aspects, an improved ground structure maybe provided. The structure may include features that controls the electromagnetic energy within and/or radiating from a connector.


In some embodiments, an electrical connector may comprise a plurality of conductive elements disposed in a plurality of parallel columns, each of the plurality of conductive members comprising a mating contact portion, a contact tail, and an intermediate portion between the mating contact portion and the contact tail. The plurality of conductive elements may comprise at least a first conductive element and a second conductive element. The connector may also comprise a conductive insert adapted to make electrical connection with at least the first conductive element and second conductive element when the conductive insert is disposed in a plane that is transverse to a direction along which each of the first and second conductive elements is elongated. Such an insert may be integrated into the connector at any suitable time, including as a separable member added after the connector is manufactured as a retrofit for improved performance or as an integral portion of another component formed during connector manufacture.


In some embodiments, the first and second conductive elements may be adapted to be ground conductors, the plurality of conductive elements may further comprise at least one third conductive element that is adapted to be a signal conductor, and the conductive insert may be adapted to avoid making an electrical connection with the third conductive element when the conductive insert is disposed in the plane transverse to the direction along which each of the first and second conductive elements is elongated. In some embodiments, the conductive insert may comprise a sheet of conductive material having at least one cutout such that the third conductive element extends through the at least one cutout without making electrical contact with the conductive insert when the conductive insert is disposed in the plane transverse to the direction along which each of the first and second conductive elements is elongated.


In some embodiments, the first and second conductive elements may have a first width, the plurality of conductive elements may further comprise at least one third conductive element having a second width that is less than the first width, and the conductive insert may comprise an opening providing a clearance around the third conductive element when the conductive insert is disposed in the plane transverse to the direction along which each of the first and second conductive elements is elongated.


In some embodiments, the electrical connector may be a first electrical connector, and the conductive insert may be disposed at a mating interface between the first electrical connector and a second electrical connector and may be in physical contact with mating contact portions of the first and second conductive elements.


In some embodiments, the electrical connector may further comprise a conductive support member, the first conductive element may be disposed in a first wafer of the electrical connector and may comprise a first engaging feature extending from the first wafer in a position to engage the conductive support member, the second conductive element may be disposed in a second wafer of the electrical connector and may comprise a second engaging feature extending from the second wafer in a position to engage the conductive support member, and when the first and second engaging features engage the conductive support member, the first and second conductive elements may be electrically connected to each other via the conductive support member.


In yet other aspects, the positioning of conductive elements within different columns may be different.


In some embodiments, an electrical connector may comprise: a plurality of wafers comprising a housing having first edge and a second edge. The wafers may also comprise a plurality of conductive elements, each of the conductive elements comprising a contact tail extending through the first edge and a mating contact portion extending through the second edge and an intermediate portion joining the contact tail and the mating contact portion. The conductive elements may be arranged in an order such that the contact tails extend from the first edge at a distance from a first end of the first edge that increases in accordance with the order and the mating contact portions extend from the second edge at a distance from a first end of the second edge that increases in accordance with the order. The plurality of wafers may comprise wafers of a first type and wafers of a second type arranged in an alternating pattern of a wafer of the first type and a wafer of the second type. The plurality of conductive elements in each of the plurality of wafers of the first type may be arranged to form at least one pair. The plurality of conductive elements in each of the plurality of wafers of the second type also may be arranged to form at least one pair, corresponding to the at least one pair of wafers of the first type. The contact tails of each pair of the first type wafer may be closer to the first end of the first edge than the contact tails of the corresponding pair of the second type wafer; and the mating contact portions of each pair of the first type wafer may be further from the first end of the second edge than the mating contact portions of the corresponding pair of the second type wafer.


In some embodiments, the plurality of conductive elements in each of the plurality of wafers of the first type may be arranged to form a plurality of pairs, and the plurality of conductive elements in each of the plurality of wafers of the first type may further comprise ground conductors disposed between adjacent pairs of the plurality of pairs.


In some embodiments, the second edge may be perpendicular to the first edge.


In some embodiments, the plurality of conductive elements comprise a first plurality of conductive elements, the connector may further comprise a second plurality of conductive elements, and conductive elements of the second plurality of conductive elements may be wider than the conductive elements of the first plurality of conductive elements.


In some embodiments, the plurality of conductive elements may comprise a first plurality of conductive elements, the connector may further comprise a second plurality of conductive elements. In some embodiments, for each of the at least one pair, the conductive elements of the pair may be separated by a first distance, and a conductive element of the pair may be adjacent a conductive element of the second plurality of conductive elements and separated from the conductive element of the second plurality of conductive elements by a second distance that is greater than a first distance.


In yet other embodiments, an electrical connector may comprise a plurality of conductive elements, the plurality of conductive elements being disposed in at least a first column and a second column parallel to the first column. Each of the first column and the second column may comprise at least one pair comprising a first conductive element and a second conductive element. Each of the plurality of conductive elements may have a first end and a second end. The plurality of conductive elements may be configured such that at the first end, a first conductive element of each pair of the at least one pair in the first column electrically couples more strongly to the first conductive element of a corresponding pair of the at least one pair in the second column, and at the second end, a second conductive element of each pair of the at least one pair in the first column electrically couples more strongly to the second conductive element of the corresponding pair of the at least one pair in the second column.


In some embodiments, the first end of each of the plurality of conductive elements may comprise a contact tail, and the second end of each of the plurality of conductive elements may comprise a mating contact portion.


In some embodiments, each of the plurality of conductive elements may comprise an intermediate portion between the contact tail and the mating contact portion, and for each of the at least one pair in each of the first column and the second column, the first conductive element and the second conductive elements of the pair may be uniformly spaced over the intermediate portions of the first conductive element and the second conductive element.


In some embodiments, an electrical connector may comprise a plurality of conductive elements disposed in a column, each of the plurality of conductive members comprising a mating contact portion, a contact tail, and an intermediate portion between the mating contact portion and the contact tail, wherein the mating contact portion of at least a portion of the plurality of conductive elements may comprise a beam, the beam comprising a first contact region and a second contact region, the first contact region may comprise a first curved portion of a first depth, the second contact region may comprise a second curved portion of a second depth, and the first depth may be greater than the second depth.


In some embodiments, for each mating contact portion of the at least the portion of the plurality of conductive elements, the beam may comprise a first beam, and the mating contact portion may further comprise a second beam. In some embodiments, each second beam may comprise a single contact region.


In some embodiments, the first curved portion may have a shape providing a contact resistance of less than 1 Ohm, and the second curved portion may have a shape providing a contact resistance in excess of 1 Ohm.


In some embodiments, the plurality of conductive elements may comprise first-type conductive elements, and the column may further comprise second-type conductive elements, the first-type conductive elements being disposed in pairs with a second-type conductive element between each pair. In some embodiments, the first-type conductive elements may be signal conductors and the second type conductive elements may be ground conductors.


Other advantages and novel features will become apparent from the following detailed description of various non-limiting embodiments of the present disclosure when considered in conjunction with the accompanying figures and from the claims.





BRIEF DESCRIPTION OF DRAWINGS

In the drawings:



FIG. 1 is a perspective view of an illustrative electrical interconnection system comprising a backplane connector and a daughter card connector, in accordance with some embodiments;



FIG. 2 is a plan view of an illustrative lead frame suitable for use in a wafer of the daughter card connector of FIG. 1, in accordance with some embodiments;



FIG. 3 is an enlarged view of region 300 of the illustrative lead frame shown in FIG. 2, showing a feature for shorting a ground conductor with a support member of a connector, in accordance with some embodiments;



FIG. 4 is a plan view of an illustrative insert suitable for use at a mating interface of a daughter card connector to short together one or more ground conductors, in accordance with some embodiments;



FIG. 5 is a schematic diagram illustrating electrical connections between ground conductors and other conductive members of a connector, in accordance with some embodiments;



FIG. 6 is an enlarged plan view of region 600 of the illustrative lead frame shown in FIG. 2, showing mating contact portions of conductive elements, in accordance with some embodiments;



FIG. 7A is an enlarged, perspective view of region 700 of the illustrative lead frame shown in FIGS. 6, showing a dual-beam structure for a mating contact portion, in accordance with some embodiments;



FIG. 7B is a side view of a beam of the mating contact portion shown in FIG. 7A, in accordance with some embodiments;



FIG. 8A is a side view of a mating contact portion of a conductive element of a daughter card connector and a mating contact portion of a conductive element of a backplane connector, when the mating contact portions are fully mated with each other, in accordance with some embodiments;



FIG. 8B is a side view of a mating contact portion of a conductive element of a daughter card connector and a mating contact portion of a conductive element of a backplane connector, when the mating contact portions are partially mated with each other, in accordance with some embodiments;



FIG. 8C is a side view of a mating contact portion of a conductive element of a daughter card connector, the mating contact portion being in a biased position and applying a spring force to a conductive element of a backplane connector, in accordance with some embodiments;



FIG. 8D is a side view of a mating contact portion of a conductive element of a daughter card connector, the mating contact portion being in an unbiased position, in accordance with some embodiments;



FIG. 9A is a perspective view of a mating contact portion of a ground conductor, showing a triple-beam structure, in accordance with some embodiments;



FIG. 9B is a side view of two beams of the mating contact portion shown in FIG. 9A, in accordance with some embodiments;



FIG. 10 is a schematic diagram of two differential pairs of signal conductors crossing over each other, in accordance with some embodiments; and



FIG. 11 shows two illustrative types of wafers embodying the “crossover” concept illustrated in FIG. 10, in accordance with some embodiments.





DETAILED DESCRIPTION

The inventors have recognized and appreciated that various techniques may be used, either separately or in any suitable combination, to improve the performance of a high speed interconnection system.


One such technique for improving performance of a high speed electrical connector may entail configuring mating contact portions of a first connector in such a manner that, when the first connector is mated with a second connector, a first mating contact portion of the first connector is in electrical contact with an intended contact region of a second mating contact portion of the second connector, where the intended contact region is at least a certain distance away from a distal end of the second mating contact portion. The portion of the second mating contact portion between the distal end and the intended contact region is sometimes referred to as a “wipe” region. Providing sufficient wipe may help to ensure that adequate electrical connection is made between the mating contact portions even if the first mating contact portion does not reach the intended contact region of the second mating contact portion due to manufacturing or assembly variances.


However, the inventors have also recognized and appreciated that a wipe region may form an unterminated stub when electrical currents flow between mating contact portions of two mated connectors. The presence of such an unterminated stub may lead to unwanted resonances, which may lower the quality of the signals carried through the mated connectors. Therefore, it may be desirable to provide a simple, yet reliable, structure to reduce such an unterminated stub while still providing sufficient wipe to ensure adequate electrical connection.


Accordingly, in some embodiments, multiple contact regions may be provided on a first mating contact portion in a first connector so that the first mating contact portion may have at least an larger contact region and a smaller contact region, with the larger contact region being closer to a distal end of the first mating contact portion than the smaller contact region. The larger region may be adapted to reach an intended contact region on a second mating contact portion of a second connector. The smaller contact region may be adapted to make electrical contact with the second mating contact portion at a location between the intended contact region and a distal end of the second mating contact portion. In this manner, a stub length is reduced when the first and second connectors are mated with each other, for example, to include only the portion of the second mating contact portion between the distal end and the location in electrical contact with the upper contact region of the first mating contact portion. However, the smaller contact region may entail a relatively low risk of separating the larger contact region from the mating contact, which could create an unintended stub.


In some embodiments, contact regions of a first mating contact portion of a first connector may each be provided by a protruding portion, such as a “ripple” formed in the first mating contact portion. The inventors have recognized and appreciated that the dimensions and/or locations of such ripples may affect whether adequate electrical connection is made when the first connector is mating with a second connector. The inventors also have recognized and appreciated that it may simplify manufacture, and/or more increase reliability, if the contact regions are designed to have different sizes and/or contact resistances. For example, if a proximal ripple (e.g. a ripple located farther away from a distal end of the first mating contact portion) is too large relative to a distal ripple (e.g. a ripple located closer to the distal end of the first mating contact portion), the distal ripple may not make sufficient electrical contact with a second mating contact portion of the second connector because the proximal ripple may, when pressed against the second mating contract portion, cause excessive deflection of the first mating contract portion, which may lift the distal ripple away from the second mating contact portion.


Accordingly, in some embodiments, contact regions of a mating contact portion of a first connector may be configured such that a distal contact region (e.g., a contact region closer to a distal end of the mating contact portion) may protrude to a greater extent than an proximal contact region (e.g., a contact region farther away from the distal end of the mating contact portion). The difference in the extents of protrusion may depend on a distance between the distal and proximal contact regions and a desired angle of deflection of the mating contact portion when the first connector is mated with a second connector.


The inventors have further recognized and appreciated that, in a connector with one or more conductive elements adapted to be ground conductors the performance of an electrical connector system may be impacted by connections to ground conductors in the connector. Such connections may shape the electromagnetic fields inside or outside, but in the vicinity of, the electrical connector, which may in turn improve performance.


Accordingly, in some embodiments, a feature is provided to short together one or more conductive elements adapted to be ground conductors in a connector. In one implementation, such a feature comprises a conductive insert made by forming one or more cutouts in a sheet of conductive material. The cutouts may be arranged such that, when the conductive insert is disposed across a mating interface of the connector, the conductive insert is in electrical contact with at least some of the ground conductors, but not with any signal conductor. For example, the cutouts may be aligned with the signal conductors at the mating interface so that each signal conductor extends through a corresponding cutout without making electrical contact with the conductive insert. Though, alternatively or additionally, such an insert may be integrated into the connector near the contact tails.


In some connector systems, “wafers” or other subassemblies of a connector may be held together with a conductive member, sometimes called a “stiffener.” In some embodiments, a lead frame used in forming the wafers may be formed with a conductive portion extending outside of the wafer in a position in which it will contact the stiffener when the wafer is attached to the stiffener. That portion may be shaped as a compliant member such that electrical contact is formed between the conductive member and the stiffener. In some embodiments, the conductive element with the projecting portion may be designed for use as a ground conductor such that the stiffener is grounded. Such a configuration may also tie together some ground conductors in different wafers, such that performance of the connector is improved.


The inventors have also recognized and appreciated that incorporating jogs into the beams of the mating contact portions of conductive elements may also lead to desirable electrical and mechanical properties of the connector system. Such a configuration may allow close spacing between signal conductors within a subassembly, with a desirable impact on performance parameters of the connector, such as crosstalk or impedance, while providing desired mechanical properties, such as mating contact portions on a small pitch, which in some embodiments may be uniform.


Such techniques may be used alone or in any suitable combination, examples of which are provided in the exemplary embodiments described below.



FIG. 1 shows an illustrative electrical interconnection system 100 having two connectors, in accordance with some embodiments. In this example, the electrical interconnection system 100 includes a daughter card connector 120 and a backplane connector 150 adapted to mate with each other to create electrically conducting paths between a backplane 160 and a daughter card 140. Though not expressly shown, the interconnection system 100 may interconnect multiple daughter cards having similar daughter card connectors that mate to similar backplane connectors on the backplane 160. Accordingly, aspects of the present disclosure are not limited to any particular number or types of subassemblies connected through an interconnection system. Furthermore, although the illustrative daughter card connector 120 and the illustrative backplane connector 150 form a right-angle connector, it should be appreciated that aspects of the present disclosure are not limited to the use of right-angle connectors. In other embodiments, an electrical interconnection system may include other types and combinations of connectors, as the inventive concepts disclosed herein may be broadly applied in many types of electrical connectors, including, but not limited to, right angle connectors, orthogonal connectors, mezzanine connectors, card edge connectors, cable connectors and chip sockets.


In the example shown in FIG. 1, the backplane connector 150 and the daughter connector 120 each contain conductive elements. The conductive elements of the daughter card connector 120 may be coupled to traces (of which a trace 142 is numbered), ground planes, and/or other conductive elements within the daughter card 140. The traces may carry electrical signals, while the ground planes may provide reference levels for components on the daughter card 140. Such a ground plane may have a voltage that is at earth ground, or positive or negative with respect to earth ground, as any voltage level maybe used as a reference level.


Similarly, conductive elements in the backplane connector 150 may be coupled to traces (of which trace 162 is numbered), ground planes, and/or other conductive elements within the backplane 160. When the daughter card connector 120 and the backplane connector 150 mate, the conductive elements in the two connectors complete electrically conducting paths between the conductive elements within the backplane 160 and the daughter card 140.


In the example of FIG. 1, the backplane connector 150 includes a backplane shroud 158 and a plurality of conductive elements that extend through a floor 514 of the backplane shroud 158 with portions both above and below the floor 514. The portions of the conductive elements that extend above the floor 514 form mating contacts, shown collectively as mating contact portions 154, which are adapted to mate with corresponding conductive elements of the daughter card connector 120. In the illustrated embodiment, the mating contacts portions 154 are in the form of blades, although other suitable contact configurations may also be employed, as aspects of the present disclosure are not limited in this regard.


The portions of the conductive elements that extend below the floor 514 form contact tails, shown collectively as contact tails 156, which are adapted to be attached to backplane 160. In the example shown in FIG. 1, the contact tails 156 are in the form of press fit, “eye of the needle,” compliant sections that fit within via holes, shown collectively as via holes 164, on the backplane 160. However, other configurations may also be suitable, including, but not limited to, surface mount elements, spring contacts, and solderable pins, as aspects of the present disclosure are not limited in this regard.


In the embodiment illustrated in FIG. 1, the daughter card connector 120 includes a plurality of wafers 1221, 1221, . . . 1226 coupled together, each wafer having a housing (e.g., a housing 1231 of the wafer 1221) and a column of conductive elements disposed within the housing. The housings may be partially or totally formed of an insulative material. Portions of the conductive elements in the column may be held within the insulative portions of the housing for a wafer, Such a wafer may be formed by insert molding insulative material around the conductive elements. If conductive or lossy material is to be included in the housing, a multi-shot molding operation may be used, with the conductive or lossy material being applied in a second or subsequent shot.


As explained in greater detail below in connection with FIG. 2, some conductive elements in the column may be adapted for use as signal conductors, while some other conductive elements may be adapted for use as ground conductors. The ground conductors may be employed to reduce crosstalk between signal conductors or to otherwise control one or more electrical properties of the connector. The ground conductors may perform these functions based on their shape and/or position within the column of conductive elements within a wafer or position within an array of conductive elements formed when multiple wafers are arranged side-by-side.


The signal conductors may be shaped and positioned to carry high speed signals. The signal conductors may have characteristics over the frequency range of the high speed signals to be carried by the conductor. For example, some high speed signals may include frequency components of up to 12.5 GHz, and a signal conductor designed for such signals may present a substantially uniform impedance of 50 Ohms+/−10% at frequencies up to 12.5 GHz. Though, it should be appreciated that these values are illustrative rather than limiting. In some embodiments, signal conductors may have an impedance of 85 Ohms or 100 Ohms. Also, it should be appreciated that other electrical parameters may impact signal integrity for high speed signals. For example, uniformity of insertion loss over the same frequency ranges may also be desirable for signal conductors.


The different performance requirements may result in different shapes of the signal and ground conductors. In some embodiments, ground conductors may be wider than signal conductors. In some embodiments, a ground conductor may be coupled to one or more other ground conductors while each signal conductor may be electrically insulated from other signal conductors and the ground conductors. Also, in some embodiments, the signal conductors may be positioned in pairs to carry differential signals whereas the ground conductors may be positioned to separate adjacent pairs.


In the illustrated embodiment, the daughter card connector 120 is a right angle connector and has conductive elements that traverse a right angle. As a result, opposing ends of the conductive elements extend from perpendicular edges of the wafers 1221, 1221, . . . 1226. For example, contact tails of the conductive elements of the wafers 1221, 1221, . . . 1226, shown collectively as contact tails 126, extend from side edges of the wafers 1221, 1221, . . . 1226 and are adapted to be connected to the daughter card 140. Opposite from the contact tails 126, mating contacts of the conductive elements, shown collectively as mating contact portions 124, extend from bottom edges of the wafers 1221, 1221, . . . 1226 and are adapted to be connected corresponding conductive elements in the backplane connector 150. Each conductive element also has an intermediate portion between the mating contact portion and the contact tail, which may be enclosed by, embedded within or otherwise held by the housing of the wafer (e.g., the housing 1231 of the wafer 1221).


The contact tails 126 may be adapted to electrically connect the conductive elements within the daughter card connector 120 to conductive elements (e.g., the trace 142) in the daughter card 140. In the embodiment illustrated in FIG. 1, contact tails 126 are press fit, “eye of the needle” contacts adapted to make an electrical connection through via holes in the daughter card 140. However, any suitable attachment mechanism may be used instead of, or in addition to, via holes and press fit contact tails.


In the example illustrated in FIG. 1, each of the mating contact portions 124 has a dual beam structure configured to mate with a corresponding one of the mating contact portions 154 of the backplane connector 150. However, it should be appreciated that aspects of the present disclosure are not limited to the use of dual beam structures. For example, as discussed in greater detail below in connection with FIG. 2, some or all of the mating contact portions 124 may have a triple beam structure. Other types of structures, such as single beam structures, may also be suitable. Furthermore, as discussed in greater detail below in connection with FIGS. 7A-B and 9A-B, a mating contact portion may have a wavy shape adapted to improve one or more electrical and/or mechanical properties and thereby improve the quality of a signal coupled through the mating contact portion.


In the example of FIG. 1, some conductive elements of the daughter card connector 120 are intended for use as signal conductors, while some other conductive elements of the daughter card connector 120 are intended for use as ground conductors. The signal conductors may be grouped in pairs that are separated by the ground conductors, in a configuration suitable for carrying differential signals. Such pairs may be designated as “differential pairs”, as understood by one of skill in the art. For example, though other uses of the conductive elements may be possible, a differential pair may be identified based on preferential coupling between the conductive elements that make up the pair. Electrical characteristics of a pair of conductive elements, such as impedance, that make the pair suitable for carrying differential signals may provide an alternative or additional method of identifying the pair as a differential pair. Furthermore, in a connector with differential pairs, ground conductors may be identified by their positions relative to the differential pairs. In other instances, ground conductors may be identified by shape and/or electrical characteristics. For example, ground conductors may be relatively wide to provide low inductance, which may be desirable for providing a stable reference potential, but may provide an impedance that is undesirable for carrying a high speed signal.


While a connector with differential pairs is shown in FIG. 1 for purposes of illustration, it should be appreciated that embodiments are possible for single-ended use in which conductive elements are evenly spaced without designated ground conductors separating designated differential pairs, or with designated ground conductors between adjacent designated signal conductors.


In the embodiment illustrated in FIG. 1, the daughter card connector 120 includes six wafers 1221, 1221, . . . 1226, each of which has a plurality of pairs of signal conductors and a plurality ground conductors arranged in a column in an alternating fashion. Each of the wafers 1221, 1222, . . . 1226 is inserted into a front housing 130 such that the mating contact portions 124 are inserted into and held within openings in the front housing 130. The openings in the front housing 130 are positioned so as to allow the mating contacts portions 154 of the backplane connector 150 to enter the openings in the front housing 130 and make electrical connections with the mating contact portions 124 when the daughter card connector 120 is mated with the backplane connector 150.


In some embodiments, the daughter card connector 120 may include a support member instead of, or in addition to, the front housing 130 to hold the wafers 1221, 1222, . . . 1226. In the embodiment shown in FIG. 1, a stiffener 128 is used to support the wafers 1221, 1222, . . . 1226. In some embodiments, stiffener 128 may be formed of a conductive material. The stiffener 128 may be made of stamped metal, or any other suitable material, and may be stamped with slots, holes, grooves and/or any other features for engaging a plurality of wafers to support the wafers in a desired orientation. However, it should be appreciated that aspects of the present disclosure are not limited to the use of a stiffener. Furthermore, although the stiffener 128 in the example of FIG. 1 is attached to upper and side portions of the plurality of wafers, aspects of the present disclosure are not limited to this particular configuration, as other suitable configurations may also be employed. Also, it should be appreciated that FIG. 1 represents a portion of an interconnection system. For example, front housing 130 and wafers 1221, 1222, . . . 1226 may be regarded as a module, and multiple such modules may be used to form a connector. In embodiments in which multiple modules are used, stiffener 128 may serve as a support member for multiple such modules, holding them together as one connector.


In some further embodiments, each of the wafers 1221, 1222, . . . 1226 may include one or more features for engaging the stiffener 128. Such features may function to attach the wafers 1221, 1222, . . . 1226 to the stiffener 128, to locate the wafers with respect to one another, and/or to prevent rotation of the wafers. For instance, a wafer may include an attachment feature in the form of a protruding portion adapted to be inserted into a corresponding slot, hole, or groove formed in the stiffener 128. Other types of attachment features may also be suitable, as aspects of the present disclosure are not limited in this regard.


In some embodiments, stiffener 128 may, instead of or in addition to providing mechanical support, may be used to alter the electrical performance of a connector. For example, a feature of a wafer may also be adapted to make an electrical connection with the stiffener 128. Examples of such connection are discussed in greater detail below in connection with FIGS. 2-3. For instance, a wafer may include one or more shorting features for electrically connecting one or more ground conductors in the wafer to the stiffener 128. In this manner, the ground conductors of the wafers 1221, 1221, . . . 1226 may be electrically connected to each other via the stiffener 128.


Such a connection may impact the signal integrity of the connector by changing a resonant frequency of the connector. A resonant frequency may be increased, for example, such that it occurs at a frequency outside of a desired operating range of the connector. As an example, coupling between ground conductors and the stiffener 128 may, alone or in combination with other design features, raise the frequency of a resonance to be in excess of 12.5 GHz, 15 GHz or some other frequency selected based on the desired speed of signals to pass through the connector.


Any suitable features may be used instead of or in addition to connecting ground conductors to the stiffener 128. As an example, in the embodiment shown in FIG. 1, the daughter card connector 120 further includes an insert 180 disposed at a mating interface between the daughter card connector 120 and the backplane connector 150. For instance, the insert 180 may be disposed across a top surface of the front housing 130 and may include one or more openings (e.g., openings 182 and 184) adapted to receive corresponding ones of the mating contact portions 124 of the daughter card connector 120. The openings may be shaped and positioned such that the insert 180 is in electrical contact with mating contact portions of ground conductors, but not with mating contact portions of signal conductors. In this manner, the ground conductors of the wafers 1221, 1221, . . . 1226 may be electrically connected to each other via the insert 180 (in addition to, or instead of, being connected via the stiffener 128).


While examples of specific arrangements and configurations are shown in FIG. 1 and discussed above, it should be appreciated that such examples are provided solely for purposes of illustration, as various inventive concepts of the present disclosure are not limited to any particular manner of implementation. For example, aspects of the present disclosure are not limited to any particular number of wafers in a connector, nor to any particular number or arrangement of signal conductors and ground conductors in each wafer of the connector. Moreover, though it has been described that ground conductors may be connected through conductive members, such as stiffener 128 or insert 180, which may be metal components, the interconnection need not be through metal structures nor is it a requirement that the electrical coupling between ground conductors be fully conductive. Partially conductive or lossy members may be used instead or in addition to metal members. Either or both of stiffener 128 and insert 180 may be made of metal with a coating of lossy material thereon or may be made entirely from lossy material.


Any suitable lossy material may be used. Materials that conduct, but with some loss, over the frequency range of interest are referred to herein generally as “lossy” materials. Electrically lossy materials can be formed from lossy dielectric and/or lossy conductive materials. The frequency range of interest depends on the operating parameters of the system in which such a connector is used, but will generally have an upper limit between about 1 GHz and 25 GHz, though higher frequencies or lower frequencies may be of interest in some applications. Some connector designs may have frequency ranges of interest that span only a portion of this range, such as 1 to 10 GHz or 3 to 15 GHz or 3 to 6 GHz.


Electrically lossy material can be formed from material traditionally regarded as dielectric materials, such as those that have an electric loss tangent greater than approximately 0.003 in the frequency range of interest. The “electric loss tangent” is the ratio of the imaginary part to the real part of the complex electrical permittivity of the material. Electrically lossy materials can also be formed from materials that are generally thought of as conductors, but are either relatively poor conductors over the frequency range of interest, contain particles or regions that are sufficiently dispersed that they do not provide high conductivity or otherwise are prepared with properties that lead to a relatively weak bulk conductivity over the frequency range of interest. Electrically lossy materials typically have a conductivity of about 1 siemens/meter to about 6.1×107 siemens/meter, preferably about 1 siemens/meter to about 1×107 siemens/meter and most preferably about 1 siemens/meter to about 30,000 siemens/meter. In some embodiments material with a bulk conductivity of between about 10 siemens/meter and about 100 siemens/meter may be used. As a specific example, material with a conductivity of about 50 siemens/meter may be used. Though, it should be appreciated that the conductivity of the material may be selected empirically or through electrical simulation using known simulation tools to determine a suitable conductivity that provides both a suitably low cross talk with a suitably low insertion loss.


Electrically lossy materials may be partially conductive materials, such as those that have a surface resistivity between 1 Ω/square and 106 Ω/square. In some embodiments, the electrically lossy material has a surface resistivity between 1 Ω/square and 103 Ω/square. In some embodiments, the electrically lossy material has a surface resistivity between 10 Ω/square and 100 Ω/square. As a specific example, the material may have a surface resistivity of between about 20 Ω/square and 40 Ω/square.


In some embodiments, electrically lossy material is formed by adding to a binder a filler that contains conductive particles. In such an embodiment, a lossy member may be formed by molding or otherwise shaping the binder into a desired form. Examples of conductive particles that may be used as a filler to form an electrically lossy material include carbon or graphite formed as fibers, flakes or other particles. Metal in the form of powder, flakes, fibers or other particles may also be used to provide suitable electrically lossy properties. Alternatively, combinations of fillers may be used. For example, metal plated carbon particles may be used. Silver and nickel are suitable metal plating for fibers. Coated particles may be used alone or in combination with other fillers, such as carbon flake. The binder or matrix may be any material that will set, cure or can otherwise be used to position the filler material. In some embodiments, the binder may be a thermoplastic material such as is traditionally used in the manufacture of electrical connectors to facilitate the molding of the electrically lossy material into the desired shapes and locations as part of the manufacture of the electrical connector. Examples of such materials include LCP and nylon. However, many alternative forms of binder materials may be used. Curable materials, such as epoxies, may serve as a binder. Alternatively, materials such as thermosetting resins or adhesives may be used.


Also, while the above described binder materials may be used to create an electrically lossy material by forming a binder around conducting particle fillers, the invention is not so limited. For example, conducting particles may be impregnated into a formed matrix material or may be coated onto a formed matrix material, such as by applying a conductive coating to a plastic component or a metal component. As used herein, the term “binder” encompasses a material that encapsulates the filler, is impregnated with the filler or otherwise serves as a substrate to hold the filler.


Preferably, the fillers will be present in a sufficient volume percentage to allow conducting paths to be created from particle to particle. For example, when metal fiber is used, the fiber may be present in about 3% to 40% by volume. The amount of filler may impact the conducting properties of the material.


Filled materials may be purchased commercially, such as materials sold under the trade name Celestran® by Ticona. A lossy material, such as lossy conductive carbon filled adhesive preform, such as those sold by Techfilm of Billerica, Massachusetts, US may also be used. This preform can include an epoxy binder filled with carbon particles. The binder surrounds carbon particles, which acts as a reinforcement for the preform. Such a preform may be inserted in a wafer to form all or part of the housing. In some embodiments, the preform may adhere through the adhesive in the preform, which may be cured in a heat treating process. In some embodiments, the adhesive in the preform alternatively or additionally may be used to secure one or more conductive elements, such as foil strips, to the lossy material.


Various forms of reinforcing fiber, in woven or non-woven form, coated or non-coated may be used. Non-woven carbon fiber is one suitable material. Other suitable materials, such as custom blends as sold by RTP Company, can be employed, as the present invention is not limited in this respect.


In some embodiments, a lossy member may be manufactured by stamping a preform or sheet of lossy material. For example, insert 180 may be formed by stamping a preform as described above with an appropriate patterns of openings. Though, other materials may be used instead of or in addition to such a preform. A sheet of ferromagnetic material, for example, may be used.


Though, lossy members also may be formed in other ways. In some embodiments, a lossy member may be formed by interleaving layers of lossy and conductive material, such as metal foil. These layers may be rigidly attached to one another, such as through the use of epoxy or other adhesive, or may be held together in any other suitable way. The layers may be of the desired shape before being secured to one another or may be stamped or otherwise shaped after they are held together.



FIG. 2 shows a plan view of an illustrative lead frame 200 suitable for use in a wafer of a daughter card connector (e.g., the wafer 1221 of the daughter card connector 120 shown in FIG. 1), in accordance with some embodiments. In this example, the lead frame 200 includes a plurality of conductive elements arranged in a column, such as conductive elements 210, 220, 230, and 240. In some embodiments, such a lead frame may be made by stamping a single sheet of metal to form the column of conductive elements, and may be enclosed in an insulative housing (not shown) to form a wafer (e.g., the wafer 1221 shown in FIG. 1) suitable for use in a daughter card connector.


In some embodiments, separate conductive elements may be formed in a multi-step process. For example, it is known in the art to stamp multiple lead frames from a strip of metal and then mold an insulative material forming a housing around portions of the conductive elements, thus formed. To facilitate handling, though, the lead frame may be stamped in a way that leaves tie bars between adjacent conductive elements to hold those conductive elements in place. Additionally, the lead frame may be stamped with a carrier strip, and tie bars between the carrier strip and conductive elements. After the housing is molded around the conductive elements, locking them in place, a punch may be used to sever the tie bars. However, initially stamping the lead frame with tie bars facilitates handling. FIG. 2 illustrates a lead frame 200 with tie bars, such as tie bar 243, but a carrier strip is not shown.


Each conductive element of the illustrative lead frame 200 may have one or more contact tails at one end and a mating contact portion at the other end. As discussed above in connection with FIG. 1, the contact tails may be adapted to be attached to a printed circuit board or other substrate (e.g., the daughter card 140 shown in FIG. 1) to make electrical connections with corresponding conductive elements of the substrate. The mating contact portions may be adapted to make electrical connections to corresponding mating contact portions of a mating connector (e.g., the backplane connector 150 shown in FIG. 1)


In the embodiment shown in FIG. 2, some conductive elements, such as conductive elements 210 and 240, are adapted for use as ground conductors and are relatively wide. As such, it may be desirable to provide multiple contact tails for each of the conductive elements 210 and 240, such as contact tails 214a and 214b for the conductive element 210, and contact tails 244a and 244b for the conductive element 240.


In some embodiments, it may be desirable to provide signal and/or ground conductors with mating contact portions with multiple points of contact spaced apart in a direction that corresponds to an elongated dimension of the conductive element. In some embodiments, such multiple points of contact may be provided by a multi-beam structure using beams of different length. Such a contact structure may be provided in any suitable way, including by shaping beams forming the mating contact portions to each provide multiple points of contact at different distances from a distal end of the beam or by providing a mating contact portion with multiple beams of different length. In some embodiments, different techniques may be used in the same connector. As a specific example, in some embodiments, signal conductors may be configured to provide points of contact by forming at least two contact regions on the same beam and ground conductors may be configured to provide points of contact using beams of different length.


In the example of FIG. 2 a triple beam mating contact portion for each of the conductive elements 210 and 240, such as mating contact portion 212 for the conductive element 210, and mating contact portion 242 for the conductive element 240, is used to provide multiple points of contact for ground conductors. However, it should be appreciated that other types of mating contact portion structures (e.g., a single beam structure or a dual beam structure) may also be suitable for each ground conductor.


In the embodiment shown in FIG. 2, other conductive elements, such as conductive elements 220 and 230, are adapted for use as signal conductors and are relatively narrow. As such, the conductive elements 220 and 230 may have only one contact tail each, respectively, contact tail 224 and contact tail 234. In this example, the signal conductors are configured as an edge coupled differential pair. Also, each of the conductive elements 220 and 230 has a dual beam mating contact portion, such as mating contact portion 222 for the conductive element 220, and mating contact portion 232 for the conductive element 230. Multiple points of contact separated along the elongated dimension of the mating contact portion may be achieved by shaping one or more of the beams with two or more contact regions. Such a structure is shown in greater detail, for example, in FIGS. 7A, 7B, 8A, 8B, 8C, and 8D. Again, it should be appreciated that other numbers of contact tails and other types of mating contact portion structures may also be suitable for signal conductors.


Other conductive elements in lead frame 200, though not numbered, may similarly be shaped as signal conductors or ground conductors. Various inventive features relating to mating contact portions are described in greater detail below in connection with FIG. 6, which shows an enlarged view of the region of the lead frame 200 indicated by the dashed circle in FIG. 2.


In the embodiment shown in FIG. 2, the lead frame 200 further includes two features, 216 and 218, either or both of which may be used for engaging one or more other members of a connector. For instance, as discussed above in connection with FIG. 1, such a feature may be provided to electrically couple a conductive element of the lead frame 200 to the stiffener 128. In this example, each of the features 216 and 218 is in the form of a metal tab protruding from a ground conductor 210, and is capable of making an electrical connection between the ground conductor 210 and the stiffener 128. Though, the features may be bent or otherwise formed to create a compliant structure that presses against stiffener 128 when a wafer encompassing lead from 200 is attached to the stiffener.



FIG. 3 shows an enlarged view, partially cut away, of the region of the lead frame 200 indicated by the dashed oval 300 in FIG. 2, in accordance with some embodiments. In this view, the lead frame 200 is enclosed by a wafer housing 323 made of a suitable insulative material. The resulting wafer is installed in a connector having a stiffener 328, a cross section of which is also shown in FIG. 3. The stiffener 328 may be similar to the stiffener 128 in the example shown in FIG. 1.


In the embodiment shown in FIG. 3, the feature 218 of the lead frame 200 is in the form of a bent-over spring tab adapted to press against the stiffener 328. As discussed above in connection with FIG. 1, such a feature may allow ground conductors of different wafers to be electrically connected to each other via a stiffener, thereby impacting resonances with can change electrical characteristics of the connector, such as insertion loss, at frequencies within a desired operating range of the connector. Alternatively or additionally, coupling the stiffener to a conductive element that is in turn grounded may reduce radiation from or through the stiffener, which may in turn improve performance of the connector system,


The spring force exerted by the feature 218 may facilitate electrical connection between the ground conductor 210 and the stiffener 328. However, it should be appreciated that the feature 218 may take any other suitable form, as aspects of the present disclosure are not limited to the use of a spring tab for electrically connecting a ground conductor and a stiffener. For example, the feature may be a tab inserted into a portion of stiffener 328. A connection may be formed through interference fit. In some embodiments, stiffener 328 may be molded of or contain portions formed of a lossy polymer material, and an interference fit may be created between feature 218 and the lossy polymer. Though, in other embodiments, it is not a requirement that feature 218 make a mechanical connection to stiffener 328. In some embodiments, capacitive or other type of coupling may be used.


In the embodiment illustrated in FIG. 3, ground conductors in multiple wafers within a connector module are shown connected to a common ground structure, here stiffener 328, The common ground structure may similarly be coupled to ground conductors in other connector modules (not shown), Using the technique illustrated in FIG. 3, these connections are made adjacent one end of the conductor. In this example, the contact is made near contact tails of the conductor. In some embodiments, ground conductors within a connector alternatively or additionally may be coupled to a common ground structure at other locations along the length of the ground conductors.


In some embodiments, connection at other locations may be made by features extending from the ground conductor, such as feature 216 (FIG. 2). In other embodiments, other types of connection to a common ground structure may be made, such as by using an insert 180 (FIG. 1).



FIG. 4 shows an illustrative insert 400 suitable for use at or near an end of the conductive elements within a connector to electrically connect ground conductors. In this example, insert 400 is adapted for use near a mating interface of a daughter card connector to short together one or more ground conductors of the daughter card connector, in accordance with some embodiments. For instance, with reference to the example shown in FIG. 1, the insert 400 may be used as the insert 180 and may be disposed across the top surface of the front housing 130 of the daughter card connector 120. Insert 400 may be made of any suitable material. For example, in some embodiments, insert 400 may be stamped from a metal sheet, but in other embodiments, insert 400 may include lossy material.


In the embodiment shown in FIG. 4, the insert 400 includes a plurality of openings adapted to receive corresponding mating contact portions of a daughter card connector. For example, the plurality of openings may be arranged in a plurality of columns, each column corresponding to a wafer in the daughter card connector. As a more specific example, the insert 400 may include openings 410A, 420A, 430A, . . . , which are arranged in a column and adapted to receive mating contact portions 212, 222, 232, . . . of the illustrative lead frame 200 shown in FIG. 2.


In some embodiments, the openings of the insert 400 may be shaped and positioned such that the insert 400 is in electrical contact with mating contact portions of ground conductors, but not with mating contact portions of signal conductors. For instance, the openings 410A and 430A may be adapted to receive and make electrical connection with, respectively, the mating contact portions 212 and 242 shown in FIG. 2. On the other hand, the opening 420A may be adapted to receive both of the mating contact portions 222 and 232 shown in FIG. 2, but without making electrical connection with either of the mating contact portions 222 and 232. For instance, the opening 420A may have a width w that is selected to accommodate both of the mating contact portions 222 and 232 with sufficient clearance to avoid any contact between the insert 400 and either of the contact portions 222 and 232.


Similarly, openings 410B and 430B of the insert 400 may be adapted to receive and make electrical connection with mating contact portions of ground conductors in an anther wafer, and opening 420B of the insert 400 may be adapted to receive mating contact portions of signal conductors in that wafer. The connections, in some embodiments, may be made by sizing openings adapted to receive ground conductors to be approximately the same size as the ground conductors in one or more dimensions. The openings may be the same as or slightly smaller than the ground conductors, creating an interference fit. Though, in some embodiments, the openings may be slightly larger than the ground conductors. In such embodiments, one side of the ground conductors may contact the insert. Though, even if no contact is made, the ground conductor may be sufficiently close to the insert for capacitive or other indirect coupling. In yet other embodiments, insert 400 may be formed with projections or other features that extend into the openings adapted to receive ground conductors. In this way, the openings may have nominal dimensions larger than those of the ground conductors, facilitating easy insertion, yet contact may be made between the ground conductor and the insert. Regardless of the specific contact mechanism, ground conductors in different wafers may be electrically connected to each other via the insert 400, thereby providing a more uniform reference level across the different wafers.


Although FIG. 4 shows an illustrative insert having a specific arrangement of openings, it should be appreciated that aspects of the present disclosure are not limited in this respect, as other arrangements of openings having other shapes and/or dimensions may also be used to short together ground conductors in a connector.


Moreover, it should be appreciated that insert 400 may be integrated into a connector at any suitable time. Such an insert may, for example, be integrated into the connector as part of its manufacture. For example, if insert 400 is used like insert 180 (FIG. 1), the insert may be placed over front housing 130 before wafers are inserted into the front housing. Such an approach facilitates retrofit of a connector system for higher performance without changing the design of existing components of the connector system. Accordingly, a user of electrical connectors may alter the performance characteristics of connectors by incorporating an insert. This modification may be done either before or after the connectors are attached to a printed circuit board or otherwise put into use.


Though, a manufacturer of electrical connectors may incorporate such an insert into connectors before they are shipped to customers. Such an approach may allow existing manufacturing tools to be used in the production of connectors that support higher data speeds. Though, in other embodiments, an insert 400 may be integrated into another component of a connector. For example, front housing 130 (FIG. 1) may be molded around an insert.


Regardless of when and how an insert is integrated into a connector, the presence of an insert may improve the performance of the connector for carrying high speed signals. FIG. 5 is a schematic diagram illustrating electrical connections between ground conductors and other conductive members of a connector, in accordance with some embodiments. For example, the connector may be the illustrative daughter card connector 120 shown in FIG. 1, where the ground conductors may be electrically connected to the stiffener 128 and insert 180.


In the embodiment shown in FIG. 5, the connector includes a plurality of conductive elements arranged in a plurality of parallel columns. Each column may correspond to a wafer installed in the connector (e.g., the wafers 1221, 1222, . . . , 1226 shown in FIG. 1). Each column may include pairs of signal conductors separated by ground conductors. However, for clarity, only ground conductors are shown in FIG. 5. For instance, the connector may include ground conductors 510A, 540A, 570A, . . . arranged in a first column, ground conductors 510B, 540B, 570B, . . . arranged in a second column, ground conductors 510C, 540C, 570C, . . . arranged in a third column, ground conductors 510D, 540D, 570D, . . . arranged in a fourth column, and so on.


In some embodiments, ground conductors of the connector may be electrically connected to various other conductive members, which are represented as lines in FIG. 5. For example, a stiffener (e.g., the stiffener 128 shown in FIG. 1), represented as line 528, may be electrically connected to an outer ground conductor of every other wafer, such as the ground conductors 510A and 510C. As another example, an insert (e.g., the insert 180 shown in FIG. 1), represented as a collection of lines 580, 582, 584, 586, 588, 590, . . . , may be electrically connected to all ground conductors of the connector. Thus, in this embodiment, all ground conductors may be shorted together, which may provide desirable electrical properties, such as reduced insertion loss over an intended operating frequency range for a high speed conductor. However, it should be appreciated that aspects of the present disclosure are not limited to use of conductive members for shorting together ground conductors.


Turning now to FIG. 6, further detail of the features described above and additional features that may improve performance of a high speed connector are illustrated. FIG. 6 shows an enlarged view of the region of the illustrative lead frame 200 indicated by dashed circle 600 in FIG. 2, in accordance with some embodiments. As discussed above in connection with FIG. 2, the lead frame 200 may be suitable for use in a wafer of a daughter card connector (e.g., the wafer 1221 of the daughter card connector 120 shown in FIG. 1). Though, similar construction techniques may be used in connectors of any suitable type. The region of the lead frame 200 shown in FIG. 6 includes a plurality of mating contact portions adapted to mate with corresponding mating contact portions in a backplane connector (e.g., the backplane connector 150 shown in FIG. 1). Some of these mating contact portions (e.g., mating contact portions 622, 632, 652, 662, 682, and 692) may be associated with conductive elements designated as signal conductors, while some other mating contact portions (e.g., mating contact portions 642 and 672) may be associated with conductive elements designated as ground conductors.


In the embodiment shown in FIG. 6, some or all of the mating contact portions associated with signal conductors may have a dual beam structure. For example, the mating contact portion 622 may include two beams 622a and 622b running substantially parallel to each other. In some embodiments, some or all of the mating contact portions associated with ground conductors may have a triple beam structure. For example, the mating contact portion 642 may include two longer beams 642a and 642b, with a shorter beam 642 disposed therebetween.


As discussed above, it may be desirable to have ground conductors that are relatively wide and signal conductors that are relatively narrow. Furthermore, it may be desirable to keep signal conductors of a pair that is designated as a differential pair running close to each other so as to improve coupling and/or establish a desired impedance. Therefore, in some embodiments, substantial portions of a column of conductive elements may have non-uniform pitch between conductive elements. These portions of non-uniform pitch may encompass all or portions of the intermediate portion of the conductive elements and/or all or portions of the conductive elements within the conductive elements within the wafer housing. For instance, in the example FIG. of 6, in the region 601 of the intermediate portions, distances between centerlines of adjacent conductive elements may differ, where a distance between centerlines of two adjacent signal conductors (e.g., distance s1 or s4) may be smaller than a distance between centerlines of a ground conductor and an adjacent signal conductor (e.g., distance s2, s3, or s5).


However, at a mating interface, it may be desirable to have a more uniform pitch between adjacent conductive elements, for example, to more readily facilitate construction of a housing to guide and avoid shorting of mating contact portions of a daughter card connector and corresponding mating contact portions of a backplane connector. Accordingly, in the embodiment shown in FIG. 6, the distances between adjacent mating contact portions (e.g., between the mating contact portions 622 and 632, between the mating contact portions 632 and 642, etc.) may be substantially similar.


This change in pitch from intermediate portions of conductive elements to mating contact portions may be achieved with a jog in the beams themselves in the region 603 of the mating interface. Jogs may be included in signal conductors as well as in ground conductors, and the jogs may be shaped differently for different types of conductors. In some embodiments, a ground conductor may have a mating contact portion that is wider at a proximal end and narrower at a distal end. Such a configuration may be achieved by the beams of the same ground conductor jogging toward each other. For example, in the embodiment shown in FIG. 6, the two longer beams 642a and 642b of the mating contact portion 642 curve around the shorter beam 642 and approach each other near the distal end of the mating contact portion 642, so that the mating contact portion 642 has a smaller overall width at the distal end than at the proximal end. In the embodiment illustrated in FIG. 6, the beams of the same signal conductor jog in the same direction. Though, within a pair, the beams jog in opposite directions such that the signal conductors can be closer together over a portion of their length than they are at the mating interface.


Accordingly, mating contact portions of a differential pair of signal conductors may be configured to be closer to each other near the proximal end and farther apart near the distal end. For example, in the embodiment shown in FIG. 6, the mating contact portions 682 and 692 are spaced apart by a smaller distance d1 near the proximal end, but jog away from each other so as to be spaced apart by a larger distance d2 near the distal end. This may be advantageous because the differential edges of the conductors of the pair remain close to each other until the mating contact portions 682 and 692 jog apart. Moreover, this spacing and the coupling may remain relatively constant over the intermediate portions of the signal conductors and into the mating contact portions.


Although FIG. 6 illustrates specific techniques for maintaining the spacing of conductive elements from intermediate portions into the mating contact portions, it should be appreciated that aspects of the present disclosure are not limited to any particular spacing, nor to the use of any particular technique for changing the spacing.



FIGS. 7A, 7B, 8A, 8B, 8C and 8D provide additional details of a beam design for providing multiple points of contact along an elongated dimension of the beam. FIG. 7A shows an enlarged, perspective view of the region of the illustrative lead frame 200 indicated by the dashed oval 700 in FIG. 6, in accordance with some embodiments. The region of the lead frame shown in FIG. 7A includes a plurality of mating contact portions adapted to mate with corresponding mating contact portions in a another connector (e.g., the backplane connector 150 shown in FIG. 1). Some of these mating contact portions (e.g., mating contact portions 722 and 732) may be associated with conductive elements designated as signal conductors, while some other mating contact portions (e.g., mating contact portion 742) may be associated with conductive elements designated as ground conductors.


In the example shown in FIG. 7A, each of the mating contact portions 722 and 732 has a dual-beam structure. For instance, the mating contact portion 722 includes two elongated beams 722a and 722b, and the mating contact portion 732 includes two elongated beams 732a and 732b. Furthermore, each of the mating contact portions 722 and 732 may include at least one contact region adapted to be in electrical contact with a corresponding mating contact portion in a backplane connector. For example, in the embodiment shown in FIG. 7A, the mating contact portion 722 has two contact regions near the distal end, namely, contact region 726a of the beam 722a and contact region 726b of the beam 722b. In this example, these contact regions are formed on convex surfaces of the beam and may be coated with gold or other malleable metal or conductive material resistant to oxidation. Additionally, the mating contact portion 722 has a third contact region 728a, which is located on the beam 722a away from the distal end (e.g., roughly at a midpoint along the length of the beam 722a). As explained in greater detail below in connection with FIGS. 8A-D, such an additional contact region may be used to short an unterminated stub of a corresponding mating contact portion in a backplane connector when the mating contact portion 772 is mated with the corresponding mating contact portion.



FIG. 7B shows a side view of the beam 722a of the mating contact portion 722 of FIG. 7A, in accordance with some embodiments. In this example, the contact regions 726a and 728a are in the form of protruding portions (e.g., “bumps” or “ripples”) on the respective beams, creating a convex surface to press against a mating contact. However, other types of contact regions may also be used, as aspects of the present disclosure are not limited in this regard.


Returning to FIG. 7A, the illustrative mating contact portion 732 may also have three contact regions: contact region 736a of the beam 732a and contact region 736b of the beam 732b, and contact region 738b located on the beam 732b roughly midway between the distal end and the proximal end of the beam 732b. In the embodiment shown in FIG. 7, the mating contact portions 722 and 732 may be mirror images of each other, with a third contact region on an outer beam (e.g., a beam farther away from the other signal conductor in the differential pair) but not on an inner beam (e.g., a beam closer to the other signal conductor in the differential pair).


Though not a requirement, such a configuration may be used on connection with the “jogged” contact structure described above in connection with FIG. 6. In the example, the beam of the pair on the side toward which the pair of beams jogs contains a second contact region. As can be seen in FIG. 6, this second, more proximal contact region (e.g. 728a and 738b), aligns with distal contact regions (e.g. 726a, 726b, 736a and 736b). In this way, mating contacts that slide along distal contact regions (e.g. 726a, 726b, 736a and 736b) during mating will also make contact with proximal contact region (e.g. 728a and 738b). Because of the jogs, a corresponding proximal contact region on beams 722b or 732a might not align with the mating contacts from another connector (such as backplane connector 150, FIG. 1).


In the embodiment illustrated, each of the contact regions is formed by a bend in the beam. As shown in FIG. 7B, these bends create curved portions in the beam of different dimensions. The inventors have recognized and appreciated that, when multiple contact regions are formed in a beam, the shape of the contact regions may impact the effectiveness of the contact structure. A desirable contact structure will reliably make a low resistance contact with a low chance of a stub of a length sufficient to impact performance.


Accordingly, in the example illustrated, contact region 728a has a shallower arc than contact region 726a. The specific dimensions of each contact may be selected to provide a desired force at each contact region. In the configuration illustrated, contact region 728a exerts less force on a mating contact than contract region 726b. Such a configuration provides a low risk that contact region 726a will be forced away from a mating contact of another connector which might result if contact region 728a was designed with approximately the same dimensions as contact region 726a, but imprecisions in manufacturing, misalignment during mating or other factors caused deviations from the designed positions. Such a force on contact region 726a could cause contact region 726a to form an unreliable contact, possibly even separating from the mating contact. Were that to occur, contact formed at contact region 726a might be inadequate or a stub might form from the portion of the beam distal to contact region 728a.


Though contact region 728 may have a smaller size, contact region 728a may nonetheless exert sufficient force to short out a stub that might otherwise be caused by a mating contact of a mating connector extending past contact region 726a, The difference in force may lead to a difference in contact resistance. For example, the large contact region, which in the illustrated example is distal contact region 726a, when mated with a contact region from a corresponding connector, may have a contact resistance in the milliohm range, such as less than 1 Ohm. In some embodiments, the contact resistance may be less than 100 milliOhms. In yet other embodiments, the contact resistance may be less than 50 milliOhms. As a specific example, the contact resistance may be in the range of 5 to 10 milliOhms. On the other hand, the smaller contact, when mated with a contact region from a corresponding connector, may have a contact resistance in on the order of an Ohm or more, In some embodiments, the contact resistance may be greater than 5 Ohms or 10 Ohms. The contact resistance, for example, may be in the range of 10 to 20 Ohms. Despite this higher resistance, a contact sufficient to eliminate a stub may be formed. However, any suitable dimensions may be used to achieve any suitable force or other parameters.


Although specific examples of contact regions and arrangements thereof are shown in FIGS. 7A-B and described above, it should be appreciated that aspects of the present disclosure are not limited to any particular types or arrangements of contact regions. For example, more or fewer contact regions may be used on each mating contact portion, and the location of each contact region may be varied depending on a number of factors, such as desired mechanical and electrical properties, and manufacturing variances. As a more specific example, the beam 722b of the mating contact portion 722 may be have two contact regions, instead of just one contact region, which may be located at any suitable locations along the beam 722b (e.g., the first contact region at the distal end of the beam 722b and the second contact region at about one third of the length of the beam 722b away from the distal end).



FIGS. 8A . . . 8D illustrate how, despite differences in sizes of the contact regions on a beam, desirable mating characteristics may be achieved. FIG. 8A shows a side view of a mating contact portion 822 of a daughter card connector fully mated with a corresponding mating contact portion 854 of a backplane connector, in accordance with some embodiments. For example, the mating contact portion 822 may be the mating contact portion 622 shown in FIG. 6, while the mating contact portion 854 may be one of the contact blades 154 of the backplane connector 150 shown in FIG. 1. The direction of relative motion of the mating portions during mating is illustrated by arrows, which is in the elongated dimension of the mating contacts.


In the illustrative configuration shown in FIG. 8A, a contact region 826 of the mating contact portion 822 is in electrical contact with a contact region R1 of the mating contact portion 854. The portion of the mating contact portion 854 between the distal end and the contact region R1 is sometimes referred to as a “wipe” region.


In some embodiments, the contact region R1 may be at least a selected distance T1 away from the distal end of the mating contact portion 854, so as to provide a sufficiently large wipe region. This may help to ensure that adequate electrical connection is made between the mating contact portions 822 and 854 even if the mating contact portion 822 does not reach the contact region R1 due to manufacturing or assembly variances.


However, a wipe region may form an unterminated stub when electrical currents flow between the mating contact portions 822 and 854. The presence of such an unterminated stub may lead to unwanted resonances, which may lower the quality of the signals carried through the mating contact portions 822 and 854. Therefore, it may be desirable to reduce such an unterminated stub while still providing sufficient wipe to ensure adequate electrical connection.


Accordingly, in the embodiment shown in FIG. 8A, an additional contact region 828 is provided on the mating contact portion 822 to make electrical contact with the mating contact portion 854 at a location (e.g., contact region R2) between the contact region R1 and the distal end of the mating contact portion 854. In this manner, a stub length is reduced from T1 (i.e., the distance between the contact region R1 and the distal end of the mating contact portion 854) to T2 (i.e., the distance between the contact region R2 and the distal end of the mating contact portion 854). This may reduce unwanted resonances and thereby improve signal quality.



FIG. 8B shows a side view of the mating contact portions 822 and 854 shown in FIG. 8A, but only partially mated with each other, in accordance with some embodiments. In this example, the contact region 826 of the mating contact portion 822 does not reach the contact region R1 of the mating contact portion 854. This may happen, for instance, due to manufacturing or assembly variances. As a result, the contact region 826 of the mating contact portion 822 only reaches a contact region R3 of the mating contact portion 854, resulting in an unterminated stub of length T3 (i.e., the distance between the contact region R3 and the distal end of the mating contact portion 854). However, the length T3 is at most the distance T4 between the contact regions 826 and 828 of the mating contact portion 822. This is because, if T3 were great than T4, the contact region 828 would have made electrical contact with the mating contact portion 854, thereby shorting the unterminated stub. Therefore, a stub length may be limited by positioning the contact regions 826 and 828 at appropriate locations along the mating contact portion 822 so that the contact regions 826 and 828 are no more than a selected distance apart.


As discussed above, a contact force may be desirable to press together two conductive elements at a mating interface so as to form a reliable electrical connection. Accordingly, in some embodiments, mating contact portions of a daughter card connector (e.g., the mating contact portion 822 shown in FIGS. 8A-B) may be relatively compliant, whereas corresponding mating contact portions of a backplane connector (e.g., the mating contact portion 854 shown in FIGS. 8A-B) may be relatively rigid. When the daughter card connector and the backplane connector are mated with each other, a mating contact portion of the daughter card connector may be deflected by the corresponding mating contact portion of the backplane connector, thereby generating a spring force that presses the mating contact portions together to form a reliable electrical connection.



FIG. 8C shows another side view of the mating contact portions 822 and 854 of FIG. 8A, in accordance with some embodiments. In this view, the mating contact portions 822 and 854 are fully mated with each other, and the mating contact portion 822 is deflected by the mating contact portion 854. Due to this deflection, the distal end of the mating contact portion 822 may be at a distance h3 away from the mating contact portion 854. The distance h3 may be roughly 1/1000 of an inch, although other values may also be possible.


Furthermore, due to the deflection, the mating contact portion 822 may be at an angle θ from the mating contact portion 854. Because of this angle, it may be desirable to form the contact regions 826 and 828 such that the contact region 828 protrudes to a lesser extent compared to the contact region 826. For instance, in the embodiment shown in FIG. 8D, the contact regions 826 and 828 are in the form of ripples formed on the mating contact portion 822, and the ripple of the contact region 828 has a height h2 that is smaller than a height h1 of the ripple of the contact region 826. If the contact region 828 is too big (e.g., if h2 is the same as h1), the contact region 826 may be lifted away from the mating contact portion 854 when the mating contact portion 822 is mated with the mating contact portion 854, which may prevent formation of a reliable electrical connection.


The heights h1 and h2 may have any suitable dimension and may be in any suitable ratio. For example, in some embodiments, the height h2 may be between 25% and 75% of h1. Though, in other embodiments, the h2 may be between 45% and 75% or 25% and 55% of h1.


It should be appreciated that FIG. 8C illustrates how a contact structure may be used to eliminate a stub in a signal conductor Eliminating stubs may avoid reflections that may contribute to near end cross talk, increase insertion loss or otherwise impact propagation of high speed signals through a connector system.


The inventors have recognized and appreciated that avoiding unterminated portions of ground conductors, even though ground conductors are not intended for carrying high frequency signals, may also improve signal integrity. Techniques for avoiding stubs in signal as described above may be applied to ground conductors as well. FIG. 9A shows a perspective view, partially cut away, of a cross section of a mating contact portion 942 of a ground conductor, in accordance with some embodiments. For example, the mating contact portion 942 may be the mating contact portion 642 of FIG. 6, and the cross section may be taken along the line L1 shown in FIG. 6.


In the embodiment shown in FIG. 9A, the mating contact portion 942 has a triple-beam structure, including two longer beams, of which beam 942b is shown, and a shorter beam 942c disposed between the two longer beams. Each of these beams may include at least one contact region adapted to be in electrical contact with a corresponding mating contact portion in a backplane connector (e.g., the backplane connector 150 shown in FIG. 1), so that the mating contact portion 942 may have at least three contact regions. These contact regions may create points of contact at different locations relative to the distal end of the mating contact portion.


For example, in the embodiment shown in FIG. 9A, a contact region 946b is located near the distal end of the longer beam 942b, and a contact region 946c is located near the distal end of the shorter beam 942c. Similar to the contact region 728a of the beam 722a shown in FIG. 7A and discussed above, the contact region 946c may be used to short an unterminated stub of a corresponding mating contact portion in a backplane connector when the mating contact portion 942 is mated with the corresponding mating contact portion.



FIG. 9B shows a side view of the beams 942b and 942c of the mating contact portion 942 of FIG. 9A, in accordance with some embodiments. In this example, the contact regions 946b and 946c are in the form of protruding portions (e.g., “bumps” or “ripples”) on the respective beams, with a contact surface on a convex side of these bumps.


Other techniques may be used instead of or in addition to the techniques as described above for improving signal integrity in a high speed connector. In some embodiments, relative positioning of adjacent pairs of signal conductors may be established to improve signal integrity, In some embodiments, the positioning may be established to improve signal integrity, for example, by reducing cross talk.



FIG. 10 shows a schematic diagram of a first differential pair of signal conductors 1022A and 1032A (shown in solid lines), and a second differential pair of signal conductors 1022B and 1032B (shown in dashed lines), in accordance with some embodiments. The signal conductors 1022A and 1032A may be part of a first wafer (e.g., the wafer 1221 shown in FIG. 1) of a daughter card connector (e.g., the daughter card connector 120 shown in FIG. 1), while the signal conductors 1022B and 1032B may be part of a second wafer (e.g., the wafer 1222 shown in FIG. 1) that is installed adjacent to the first wafer.


In the embodiment shown in FIG. 10, the signal conductors 1022A and 1032A have respective starting points 1024A and 1034A and respective endpoints 1026A and 1036A. Similarly, the signal conductors 1022B and 1032B have respective starting points 1024B and 1034B and respective endpoints 1026B and 1036B. These starting points and ending points may represent a contact tail or a mating contact portion of a conductive element. Between the starting point and the endpoint, each signal conductor may follow a generally arcuate path.


In the example of FIG. 10, the signal conductors 1022A and 1022B cross each other at an intermediate point P1, and the signal conductors 1032A and 1032B cross each other at an intermediate point P2. As a result, the starting points 1024A and 1034A may be “ahead of” the starting points 1024B and 1034B, but the endpoints 1026A and 1036A may be “behind” the endpoints 1026B and 1036B.


In this case, ahead and behind act as an indication of distance from an end of the column of conductive elements. The starting points 1024A, 1024B, 1034A and 1034B are positioned along an edge of a connector and are a different distance from the end of the column, which in this case is indicated by a distance along the axis labeled D1. At the end points, these signal conductors have distances from the end of the column measured as a distance along the axis labeled D2. As can be seen, conductor 1022B starts out “ahead” of a corresponding conductor 1022A, but ends behind. Likewise, conductor 1032B starts out ahead of 1032A and ends behind. One pair thus crosses over the other to go from being ahead to being behind.


Without being bound by any theory of operation, this configuration is believed to be advantageous for reducing cross talk. Cross talk may occur when a signal couples to a signal conductor from other nearby signal conductors. For a differential pair, one conductor of the pair will carry a positive-going signal at the same time that the other conductor of the pair is carrying a similar, but negative-going, signal. In a differential connector, crosstalk on a signal conductor can be avoided by having that signal conductor equal distance from the positive-going and negative-going signal conductors of any adjacent signal carrying pair over the entire length of the signal conductor.


However, such a configuration may be difficult to achieve in a dense connector. In some connectors, for example, different wafer styles are used to form the connectors. The wafers of different style may be arranged in an alternating arrangement. Using different wafer styles may allow signal pairs in each wafer to more closely align with a ground conductor in an adjacent wafer than a signal pair. Such a configuration may also limit crosstalk because a signal from a pair in one wafer may couple more to a ground conductor in adjacent wafers than to signal conductors in the adjacent wafer.


However, the inventors have recognized and appreciated that crosstalk may also be reduced by routing signal conductors such that the spacing between a signal conductor and the positive and negative-going signal conductors in an adjacent pair changes over the length of the signal conductor. The spacing may be such that the amount of coupling to the positive and negative-going signal conductors in the adjacent pair changes over the length of the signal.


One approach to achieving such cancellation may be, near the midpoint of a signal conductor, to change the position of the position of the positive and negative-going signal conductors of the adjacent pair. Accordingly, in some embodiments, a connector may be made of at least two types of wafers. In at least one type of wafer, for each pair, one signal conductor may start ahead of the other signal conductor and end behind it. When such a wafer is placed adjacent a wafer with another signal conductor routed generally along a corresponding path as the pair in a parallel plane, that signal conductor will be, over half of its length closer to the positive-going signal conductor of the pair and over half of its length closer to the negative-going signal conductor. Such a configuration may result in, on average over the length of the signal conductor, equal separation between the signal conductor and the positive and negative-going conductors of the adjacent pair. Such a configuration may provide on average, the same coupling between the signal conductor and the positive and negative-going signal conductors of the adjacent pair, which can provide a desirable low level of crosstalk.


By reversing the position of the signal conductors of each pair in every other wafer, each pair will have a relatively low level of crosstalk with its adjacent pairs. However, reversing the position of the signal conductors in the same pair, if the pairs are formed by conductive elements in the same column, may require non-standard manufacturing techniques in order to allow the conductors of the pair to cross over each other.


In some embodiments, a similar cross-talk canceling effect may be achieved by crossing over the pairs in adjacent wafers, as illustrated in FIG. 10. For example, FIG. 10, shows a pair 1022A and 1032A, which may be in a first wafer, and another pair 1022B and 1032B, which may be in a second, adjacent wafer. In this example, conductor 1022B is ahead of conductor 1022A at ends 1024B and 1024A, but behind at ends 1026A and 1026B. This configuration is believed to also reduce crosstalk.


Without being bound by any theory of operation, it can be seen that the coupling between the pair formed by conductors 1022A and 1032A to pair 1022B and 1032B changes over the length of the pair in a way that tends to cancel out crosstalk. For illustration, conductors 1022A and 1022B may be regarded as the positive-going conductors of the pairs, with conductors 1032A and 1032B being the negative-going conductors. Near ends 1024A and 1024B, positive going conductor 1024B is between positive and negative-going conductors 1024A and 1034A of the adjacent pair, thus coupling a positive-going signal to both the positive and negative-going conductors of the adjacent pair. Because of the differential nature of conductors 1024A and 1034A, equal coupling of the positive-going signal does not create crosstalk.


However, negative-going conductor 1034B, is, near ends 1034A and 1034B, closer to conductor 1034A than it is to 1024A. This asymmetric positioning could tend to create negative-going cross-talk. However, the relative positioning the positive and negative-gong conductors are reversed at the other end, which tends to cancel out that crosstalk.


For example, near ends 1036A and 1026A, negative-going conductor 1032B is more evenly spaced relative to conductors 1024A and 1034A. Positive going conductor 1024B is asymmetrically positioned with respect to conductors 1022A and 1032A of the adjacent pair. Such a positioning could tend to create positive-going cross-talk. However, such positive going cross-talk would tend to cancel the negatives-going cross talk arising near ends 1024A and 1034A. In this way, by introducing a crossover, as illustrated in FIG. 10, overall crosstalk between adjacent pairs.



FIG. 11 shows lead frames from two illustrative types of wafers embodying the “crossover” concept discussed above in connection with FIG. 10, in accordance with some embodiments. To show the crossover, a type “A” wafer 1100A is shown aligned horizontally with a type “B” wafer 1100B and vertically with another type “B” wafer 1105B that is identical to the type “B” wafer 1100B. The wafer 1100A includes a group of four conductive elements, identified collectively as conductive elements 1110A. Two of these conductive elements may be adapted for use as a differential pair of signal conductors, while the other two may be adapted for use as ground conductors and may be disposed on either side of the differential pair. Contact tails of the conductive elements 1110A are identified collectively as contact tails 1112A, while mating contact portions of the conductive elements 1110A are identified collectively as mating contact portions 1114A.


Similarly, the wafer 1100B includes a group of four conductive elements identified collectively as conductive elements 1110B, whose mating contact portions are identified collectively as mating contact portions 1114B, and the wafer 1105B includes a group of four conductive elements identified collectively as conductive elements 1115B, whose contact tails are identified collectively as contact tails 1112B.


These groups, 1110A and 1110B may represent corresponding signal conductor pairs in adjacent wafers. Though, just one signal conductor pairs is described, it should be appreciated that the same relative positioning of other pairs may be provided for other pairs in the wafers.


As emphasized by the vertical and horizontal bands shown in FIG. 11, the contact tails 1112A of the type “A” wafer 1100A are “ahead of” the contact tails 1112B of the type “B” wafer 1105B, but the mating contact portions 1114A of the type “A” wafer 1100A are “behind” the mating contact portions 1114B of the type “B” wafer 1100B. Thus, when a type “A” wafer is installed adjacent a type “B” wafer in a connector, a “crossover” configuration similar to that shown in FIG. 10 would occur, which may reduce crosstalk in comparison to a connector in which no such crossover occurs.


In this example, it can be seen that the crossover may be created based on the configuration of the conductive elements in the lead frames 1100A and 1100B. Because the configuration of the conductive elements is formed by a conventional stamping operation, a connector configuration with desirable crosstalk properties may be simply created as illustrated in FIG. 11.


Various inventive concepts disclosed herein are not limited in their applications to the details of construction and the arrangements of components set forth in the following description or illustrated in the drawings. Such concepts are capable of other embodiments and of being practiced or of being carried out in various ways. Also, the phraseology and terminology used herein is for the purpose of description and should not be regarded as limiting. The use of “including,” “comprising,” “having,” “containing,” and “involving,” and variations thereof, is meant to encompass the items listed thereafter and equivalents thereof as well as possible additional items.


Having thus described several inventive concepts of the present disclosure, it is to be appreciated that various alterations, modifications, and improvements will readily occur to those skilled in the art.


For example, portions of the connectors described above may be made of insulative material. Any suitable insulative material may be used, include those known in the art. Examples of suitable materials are liquid crystal polymer (LCP), polyphenyline sulfide (PPS), high temperature nylon or polypropylene (PPO). Other suitable materials may be employed, as the present invention is not limited in this regard. All of these are suitable for use as binder materials in manufacturing connectors according to some embodiments of the invention. One or more fillers may be included in some or all of the binder material used to form insulative housing portions of a connector. As a specific example, thermoplastic PPS filled to 30% by volume with glass fiber may be used.


Such alterations, modifications, and improvements are intended to be within the spirit of the inventive concepts of the present disclosure. Accordingly, the foregoing description and drawings are by way of example only.

Claims
  • 1. An electrical connector configured to be mated with a complementary electrical connector along a mating direction, the electrical connector comprising: a plurality of conductive elements disposed in a column, each of the plurality of conductive elements comprising a mating contact portion, a contact tail, and an intermediate portion between the mating contact portion and the contact tail, wherein: a first mating contact portion of a first conductive element of the plurality of conductive elements comprises a first beam and a second beam;the first beam comprises a first contact region adapted to make electrical contact with a surface of the complementary electrical connector at a first point of contact;the second beam comprises a second contact region adapted to make electrical contact with the surface of the complementary electrical connector at a second point of contact, wherein the first point of contact and the second point of contact are offset relative to each other with respect to the mating direction, wherein the first point of contact is ahead of the second point of contact with respect to the mating direction;the first beam is adapted to exert a first force normal to a plane defined by the surface of the second electrical connector when the electrical connector and the commentary electrical connectors are mated; andthe second beam is adapted to exert a second force normal to the plane when the electrical connector and the commentary electrical connectors are mated, the first force being greater than the second force.
  • 2. The electrical connector of claim 1, wherein the first conductive element is configured as a ground conductor.
  • 3. The electrical connector of claim 1, wherein the first contact region comprises a first protruding portion, and the second contact region comprises a second protruding portion, wherein the first protruding portion protrudes to a greater extent than the second protruding portion.
  • 4. The electrical connector of claim 1, wherein the second beam is shorter than the first beam.
  • 5. The electrical connector of claim 4, wherein the second beam is about half as long as the first beam.
  • 6. The electrical connector of claim 1, wherein both the first and second beams extend along the mating direction.
  • 7. The electrical connector of claim 1, wherein the second beam terminates a stub of the complementary electrical connector when mated with the electrical connector.
  • 8. The electrical connector of claim 1, wherein: the electrical connector comprises a wafer, the wafer comprising a housing, the plurality of conductive elements being at least partially enclosed in the housing.
  • 9. The electrical connector of claim 8, wherein the housing comprises insulative material and lossy material.
  • 10. The electrical connector of claim 1, wherein the first beam and the second beam have different lengths.
  • 11. The electrical connector of claim 1, wherein: the first beam is adapted to contact the surface of the complementary electrical connector only at the first point of contact, andthe second beam is adapted to contact the surface of the complementary electrical connector only at the second point of contact.
  • 12. An electrical interconnection system comprising: a first electrical connector and a second electrical connector, the first and second electrical connectors being configured to be mated with each other along a mating direction, the first electrical connector comprising:a plurality of conductive elements disposed in a column, each of the plurality of conductive elements comprising a mating contact portion, a contact tail, and an intermediate portion between the mating contact portion and the contact tail, wherein: the plurality of conductive elements comprise first conductive elements comprising intermediate portions of a first width and second conductive elements comprising intermediate portions of a second width, less than the first width;for each of the first conductive elements: a first mating contact portion of a first conductive element of the plurality of conductive elements comprises a first beam and a second beam;the first beam comprises a first contact region adapted to make electrical contact with a surface of the second electrical connector at a first point of contact;the second beam comprises a second contact region adapted to make electrical contact with the surface of the second electrical connector at a second point of contact, wherein the first point of contact and the second point of contact are offset relative to each other with respect to the mating direction;the first beam is adapted to exert a first force normal to a plane defined by the surface of the second electrical connector when the first electrical connector and the second electrical connectors are mated;the second beam is adapted to exert a second force normal to the plane when the first electrical connector and the second electrical connectors are mated, the first force being greater than the second force; andthe first point of contact is ahead of the second point of contact with respect to the mating direction.
  • 13. The electrical interconnection system of claim 12, wherein the first conductive elements are configured to be ground conductors.
  • 14. The electrical interconnection system of claim 12, wherein a plurality of the first conductive elements are coupled through a common ground structure, the common ground structure comprising lossy material.
  • 15. The electrical interconnection system of claim 12, wherein for each of the first conductive elements the second beam is shorter than the first beam.
  • 16. The electrical interconnection system of claim 12, wherein the second beam terminates a stub of the second electrical connector when mated with the first electrical connector.
  • 17. The method of claim 12, wherein the first plurality of conductive elements are configured to be ground conductors.
  • 18. The electrical interconnection system of claim 12, wherein, for each of the first conductive elements, the first beam and the second beam have different lengths.
  • 19. The electrical interconnection system of claim 12, wherein, for each of the first conductive elements: the first beam is adapted to contact the surface of the second electrical connector only at the first point of contact, andthe second beam is adapted to contact the surface of the second electrical connector only at the second point of contact.
  • 20. A method for mating a first electrical connector with a second electrical connector along a mating direction, the first electrical connector comprising a first plurality of conductive elements, each of the first plurality of conductive elements comprising a mating contact portion, a contact tail, and an intermediate portion between the mating contact portion and the contact tail, a first mating contact portion of a first conductive element of the first plurality of conductive elements comprising a first beam and a second beam, and the second electrical connector comprising a second plurality of conductive elements, the method comprising: placing the first plurality of conductive elements in electrical contact with respective conductive elements of the second plurality of conductive elements, at least in part by: placing the first beam in electrical contact with a second conductive element of the second plurality of conductive elements at a first point of contact;placing the second beam in electrical contact with the second conductive element of the second plurality of conductive elements at a second point of contact, wherein the first point of contact and the second point of contact are offset relative to each other with respect to the mating direction, wherein the first point of contact is ahead of the second point of contact with respect to the mating direction;causing the first beam to exert a first force normal to a plane defined by a surface of the second electrical connector; andcausing the second beam to exert a second force normal to the plane, wherein the first force is greater than the second force.
  • 21. The method of claim 20, wherein placing the second beam in electrical contact with the second conductive element comprises terminating a stub of the second conductive element.
  • 22. The method of claim 20, wherein the first beam and the second beam have different lengths.
  • 23. The method of claim 20, wherein, when the first electrical connector is mated with the second electrical connector: the first beam contacts the second conductive element only at the first point of contact, andthe second beam contacts the second conductive element only at the second point of contact.
CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation claiming the benefit under 35 U.S.C. § 120 of U.S. patent application Ser. No. 17/181,639, filed on Feb. 22, 2021, entitled “HIGH-FREQUENCY ELECTRICAL CONNECTOR,” which is a continuation claiming the benefit under 35 U.S.C. § 120 of U.S. patent application Ser. No. 15/823,494, filed on Nov. 27, 2017, entitled “HIGH-FREQUENCY ELECTRICAL CONNECTOR,” which is a continuation claiming the benefit under 35 U.S.C. § 120 of U.S. patent application Ser. No. 13/973,921, filed on Aug. 22, 2013, entitled “HIGH-FREQUENCY ELECTRICAL CONNECTOR,” which claims the benefit under 35 U.S.C. § 119(e) to U.S. Provisional Application No. 61/691,901, filed on Aug. 22, 2012, entitled “HIGH-FREQUENCY ELECTRICAL CONNECTOR,” each of which is hereby incorporated in its entirety by reference herein.

US Referenced Citations (1034)
Number Name Date Kind
2124207 Carl Jul 1938 A
2996710 Pratt Aug 1961 A
3002162 Garstang Sep 1961 A
3007131 Dahlgren et al. Oct 1961 A
3134950 Cook May 1964 A
3229240 Harrison et al. Jan 1966 A
3243756 Ruete et al. Mar 1966 A
3322885 May et al. May 1967 A
3390369 Zavertnik et al. Jun 1968 A
3390389 Bluish Jun 1968 A
3505619 Bishop Apr 1970 A
3573677 Detar Apr 1971 A
3594613 Prietula Jul 1971 A
3715706 Michel et al. Feb 1973 A
3731259 Occhipinti May 1973 A
3743978 Fritz Jul 1973 A
3745509 Woodward et al. Jul 1973 A
3786372 Epis et al. Jan 1974 A
3825874 Peverill Jul 1974 A
3848073 Simons et al. Nov 1974 A
3863181 Glance et al. Jan 1975 A
3999830 Herrmann, Jr. et al. Dec 1976 A
4083615 Volinskie Apr 1978 A
4155613 Brandeau May 1979 A
4157612 Rainal Jun 1979 A
4175821 Hunter Nov 1979 A
4195272 Boutros Mar 1980 A
4215910 Walter Aug 1980 A
4272148 Knack, Jr. Jun 1981 A
4276523 Boutros et al. Jun 1981 A
4307926 Smith Dec 1981 A
4371742 Manly Feb 1983 A
4408255 Adkins Oct 1983 A
4447105 Ruehl May 1984 A
4457576 Cosmos et al. Jul 1984 A
4471015 Ebneth et al. Sep 1984 A
4472765 Hughes Sep 1984 A
4484159 Whitley Nov 1984 A
4490283 Kleiner Dec 1984 A
4518651 Wolfe, Jr. May 1985 A
4519664 Tillotson May 1985 A
4519665 Althouse et al. May 1985 A
4571014 Robin et al. Feb 1986 A
4605914 Harman Aug 1986 A
4607907 Bogursky Aug 1986 A
4615578 Stadler et al. Oct 1986 A
4632476 Schell Dec 1986 A
4636752 Saito Jan 1987 A
4639054 Kersbergen Jan 1987 A
4655518 Johnson et al. Apr 1987 A
4674812 Thom et al. Jun 1987 A
4678260 Gallusser et al. Jul 1987 A
4682129 Bakermans et al. Jul 1987 A
4686607 Johnson Aug 1987 A
4697862 Hasircoglu Oct 1987 A
4708660 Claeys et al. Nov 1987 A
4724409 Lehman Feb 1988 A
4728762 Roth et al. Mar 1988 A
4737598 O'Connor Apr 1988 A
4751479 Parr Jun 1988 A
4761147 Gauthier Aug 1988 A
4795375 Williams Jan 1989 A
4806107 Arnold et al. Feb 1989 A
4824383 Lemke Apr 1989 A
4826443 Lockard May 1989 A
4836791 Grabbe et al. Jun 1989 A
4846724 Sasaki et al. Jul 1989 A
4846727 Glover et al. Jul 1989 A
4871316 Herrell et al. Oct 1989 A
4876630 Dara Oct 1989 A
4878155 Conley Oct 1989 A
4889500 Lazar et al. Dec 1989 A
4902243 Davis Feb 1990 A
4913667 Muz Apr 1990 A
4924179 Sherman May 1990 A
4948922 Varadan et al. Aug 1990 A
4949379 Cordell Aug 1990 A
4970354 Iwasa et al. Nov 1990 A
4971726 Maeno et al. Nov 1990 A
4975084 Fedder et al. Dec 1990 A
4984992 Beamenderfer et al. Jan 1991 A
4990099 Marin et al. Feb 1991 A
4992060 Meyer Feb 1991 A
5000700 Masubuchi et al. Mar 1991 A
5046084 Barrett et al. Sep 1991 A
5046952 Cohen et al. Sep 1991 A
5046960 Fedder Sep 1991 A
5066236 Broeksteeg Nov 1991 A
5135405 Fusselman et al. Aug 1992 A
5141454 Garrett et al. Aug 1992 A
5150086 Ito Sep 1992 A
5166527 Solymar Nov 1992 A
5168252 Naito Dec 1992 A
5168432 Murphy et al. Dec 1992 A
5176538 Hansell, III et al. Jan 1993 A
5190472 Voltz et al. Mar 1993 A
5197893 Morlion et al. Mar 1993 A
5246388 Collins et al. Sep 1993 A
5259773 Champion et al. Nov 1993 A
5266055 Naito et al. Nov 1993 A
5280257 Cravens et al. Jan 1994 A
5281762 Long et al. Jan 1994 A
5287076 Johnescu et al. Feb 1994 A
5306171 Marshall Apr 1994 A
5323299 Weber Jun 1994 A
5332979 Roskewitsch et al. Jul 1994 A
5334050 Andrews Aug 1994 A
5335146 Stucke Aug 1994 A
5340334 Nguyen Aug 1994 A
5346410 Moore, Jr. Sep 1994 A
5352123 Sample et al. Oct 1994 A
5387130 Fedder et al. Feb 1995 A
5402088 Pierro et al. Mar 1995 A
5403206 McNamara et al. Apr 1995 A
5407622 Cleveland et al. Apr 1995 A
5429520 Morlion et al. Jul 1995 A
5429521 Morlion et al. Jul 1995 A
5433617 Morlion et al. Jul 1995 A
5433618 Morlion et al. Jul 1995 A
5435757 Fedder et al. Jul 1995 A
5441424 Morlion et al. Aug 1995 A
5456619 Belopolsky et al. Oct 1995 A
5461392 Mott et al. Oct 1995 A
5474472 Niwa et al. Dec 1995 A
5484310 McNamara et al. Jan 1996 A
5487673 Hurtarte Jan 1996 A
5490372 Schlueter Feb 1996 A
5496183 Soes et al. Mar 1996 A
5499935 Powell Mar 1996 A
5509827 Huppenthal et al. Apr 1996 A
5539148 Konishi et al. Jul 1996 A
5551893 Johnson Sep 1996 A
5554038 Morlion et al. Sep 1996 A
5554050 Marpoe, Jr. Sep 1996 A
5562497 Yagi et al. Oct 1996 A
5564949 Wellinsky Oct 1996 A
5571991 Highum et al. Nov 1996 A
5597328 Mouissie Jan 1997 A
5598627 Saka et al. Feb 1997 A
5605469 Wellinsky et al. Feb 1997 A
5620340 Andrews Apr 1997 A
5632634 Soes May 1997 A
5651702 Hanning et al. Jul 1997 A
5660551 Sakurai Aug 1997 A
5669789 Law Sep 1997 A
5691506 Miyazaki et al. Nov 1997 A
5702258 Provencher et al. Dec 1997 A
5733148 Kaplan et al. Mar 1998 A
5743765 Andrews et al. Apr 1998 A
5755597 Panis et al. May 1998 A
5781759 Kashiwabara Jul 1998 A
5795191 Preputnick et al. Aug 1998 A
5796323 Uchikoba et al. Aug 1998 A
5803768 Zell et al. Sep 1998 A
5831491 Buer et al. Nov 1998 A
5833486 Shinozaki Nov 1998 A
5833496 Hollander et al. Nov 1998 A
5842887 Andrews Dec 1998 A
5870528 Fukuda Feb 1999 A
5885095 Cohen et al. Mar 1999 A
5887158 Sample et al. Mar 1999 A
5904594 Longueville et al. May 1999 A
5924899 Paagman Jul 1999 A
5931686 Sasaki et al. Aug 1999 A
5959591 Aurand Sep 1999 A
5961355 Morlion et al. Oct 1999 A
5971809 Ho Oct 1999 A
5980321 Cohen et al. Nov 1999 A
5981869 Kroger Nov 1999 A
5982253 Perrin et al. Nov 1999 A
5993259 Stokoe et al. Nov 1999 A
5997361 Driscoll et al. Dec 1999 A
6019616 Yagi et al. Feb 2000 A
6042394 Mitra et al. Mar 2000 A
6053770 Blom Apr 2000 A
6083046 Wu et al. Jul 2000 A
6083047 Paagman Jul 2000 A
6095825 Liao Aug 2000 A
6095872 Lang et al. Aug 2000 A
6102747 Paagman Aug 2000 A
6116926 Ortega et al. Sep 2000 A
6120306 Evans Sep 2000 A
6123554 Ortega et al. Sep 2000 A
6132255 Verhoeven Oct 2000 A
6132355 Derie Oct 2000 A
6135824 Okabe et al. Oct 2000 A
6144559 Johnson et al. Nov 2000 A
6146202 Ramey et al. Nov 2000 A
6152274 Blard et al. Nov 2000 A
6152742 Cohen et al. Nov 2000 A
6152747 McNamara Nov 2000 A
6163464 Ishibashi et al. Dec 2000 A
6168466 Chiou Jan 2001 B1
6168469 Lu Jan 2001 B1
6171115 Mickievicz et al. Jan 2001 B1
6171149 van Zanten Jan 2001 B1
6174202 Mitra Jan 2001 B1
6174203 Asao Jan 2001 B1
6174944 Chiba et al. Jan 2001 B1
6179651 Huang Jan 2001 B1
6179663 Bradley et al. Jan 2001 B1
6196853 Harting et al. Mar 2001 B1
6203376 Magajne et al. Mar 2001 B1
6203396 Asmussen et al. Mar 2001 B1
6206729 Bradley et al. Mar 2001 B1
6210182 Elco et al. Apr 2001 B1
6210227 Yamasaki et al. Apr 2001 B1
6217372 Reed Apr 2001 B1
6227875 Wu et al. May 2001 B1
6231391 Ramey et al. May 2001 B1
6238245 Stokoe et al. May 2001 B1
6267604 Mickievicz et al. Jul 2001 B1
6273753 Ko Aug 2001 B1
6273758 Lloyd et al. Aug 2001 B1
6285542 Kennedy, III et al. Sep 2001 B1
6293827 Stokoe Sep 2001 B1
6296496 Trammel Oct 2001 B1
6299438 Sahagian et al. Oct 2001 B1
6299483 Cohen et al. Oct 2001 B1
6299484 Van Woensel Oct 2001 B2
6299492 Pierini et al. Oct 2001 B1
6322379 Ortega et al. Nov 2001 B1
6328572 Higashida et al. Dec 2001 B1
6328601 Yip et al. Dec 2001 B1
6333468 Endoh et al. Dec 2001 B1
6343955 Billman et al. Feb 2002 B2
6343957 Kuo et al. Feb 2002 B1
6347962 Kline Feb 2002 B1
6350134 Fogg et al. Feb 2002 B1
6358088 Nishio et al. Mar 2002 B1
6358092 Siemon et al. Mar 2002 B1
6364711 Berg et al. Apr 2002 B1
6364713 Kuo Apr 2002 B1
6364718 Polgar et al. Apr 2002 B1
6366471 Edwards et al. Apr 2002 B1
6371788 Bowling et al. Apr 2002 B1
6375510 Asao Apr 2002 B2
6379188 Cohen et al. Apr 2002 B1
6380485 Beaman et al. Apr 2002 B1
6392142 Uzuka et al. May 2002 B1
6394839 Reed May 2002 B2
6396712 Kuijk May 2002 B1
6398588 Bickford Jun 2002 B1
6409543 Astbury, Jr. et al. Jun 2002 B1
6413119 Gabrisko, Jr. et al. Jul 2002 B1
6428344 Reed Aug 2002 B1
6431914 Billman Aug 2002 B1
6435913 Billman Aug 2002 B1
6435914 Billman Aug 2002 B1
6441313 Novak Aug 2002 B1
6452789 Pallotti et al. Sep 2002 B1
6454605 Bassler et al. Sep 2002 B1
6461202 Kline Oct 2002 B2
6471549 Lappohn Oct 2002 B1
6478624 Ramey et al. Nov 2002 B2
6482017 Van Doorn Nov 2002 B1
6489563 Zhao et al. Dec 2002 B1
6491545 Spiegel et al. Dec 2002 B1
6503103 Cohen et al. Jan 2003 B1
6506076 Cohen et al. Jan 2003 B2
6517360 Cohen Feb 2003 B1
6520803 Dunn Feb 2003 B1
6527587 Ortega et al. Mar 2003 B1
6528737 Kwong et al. Mar 2003 B1
6530790 McNamara et al. Mar 2003 B1
6533613 Turner et al. Mar 2003 B1
6535367 Carpenter et al. Mar 2003 B1
6537086 Mac Mullin Mar 2003 B1
6537087 McNamara et al. Mar 2003 B2
6538524 Miller Mar 2003 B1
6538899 Krishnamurthi et al. Mar 2003 B1
6540522 Sipe Apr 2003 B2
6540558 Paagman Apr 2003 B1
6540559 Kemmick et al. Apr 2003 B1
6541712 Gately et al. Apr 2003 B1
6544072 Olson Apr 2003 B2
6544647 Hayashi et al. Apr 2003 B1
6551140 Billman et al. Apr 2003 B2
6554647 Cohen et al. Apr 2003 B1
6565387 Cohen May 2003 B2
6565390 Wu May 2003 B2
6574115 Asano et al. Jun 2003 B2
6575772 Soubh et al. Jun 2003 B1
6579116 Brennan et al. Jun 2003 B2
6582244 Fogg et al. Jun 2003 B2
6585540 Gutierrez et al. Jul 2003 B2
6592381 Cohen et al. Jul 2003 B2
6592390 Davis et al. Jul 2003 B1
6592401 Gardner et al. Jul 2003 B1
6595802 Watanabe et al. Jul 2003 B1
6602095 Astbury, Jr. et al. Aug 2003 B2
6607402 Cohen et al. Aug 2003 B2
6608762 Patriche Aug 2003 B2
6609933 Yamasaki Aug 2003 B2
6612871 Givens Sep 2003 B1
6616482 De La Cruz et al. Sep 2003 B2
6616864 Jiang et al. Sep 2003 B1
6621373 Mullen et al. Sep 2003 B1
6652296 Kuroda et al. Nov 2003 B2
6652318 Winings et al. Nov 2003 B1
6652319 Billman Nov 2003 B1
6655966 Rothermel et al. Dec 2003 B2
6663427 Billman et al. Dec 2003 B1
6663429 Korsunsky et al. Dec 2003 B1
6685501 Wu et al. Feb 2004 B1
6692262 Loveless Feb 2004 B1
6692272 Lemke et al. Feb 2004 B2
6705893 Ko Mar 2004 B1
6705895 Hasircoglu Mar 2004 B2
6706974 Chen et al. Mar 2004 B2
6709294 Cohen et al. Mar 2004 B1
6712648 Padro et al. Mar 2004 B2
6713672 Stickney Mar 2004 B1
6717825 Volstorf Apr 2004 B2
6722897 Wu Apr 2004 B1
6741141 Kormanyos May 2004 B2
6743057 Davis et al. Jun 2004 B2
6749444 Murr et al. Jun 2004 B2
6762941 Roth Jul 2004 B2
6764341 Lappoehn Jul 2004 B2
6776645 Roth et al. Aug 2004 B2
6776659 Stokoe et al. Aug 2004 B1
6786771 Gailus Sep 2004 B2
6792941 Andersson Sep 2004 B2
6797891 Blair et al. Sep 2004 B1
6806109 Furuya et al. Oct 2004 B2
6808419 Korsunsky et al. Oct 2004 B1
6808420 Whiteman, Jr. et al. Oct 2004 B2
6814519 Policicchio et al. Nov 2004 B2
6814619 Stokoe et al. Nov 2004 B1
6816486 Rogers Nov 2004 B1
6817870 Kwong et al. Nov 2004 B1
6823587 Reed Nov 2004 B2
6824426 Spink, Jr. Nov 2004 B1
6830478 Ko et al. Dec 2004 B1
6830483 Wu Dec 2004 B1
6830489 Aoyama Dec 2004 B2
6843657 Driscoll et al. Jan 2005 B2
6857899 Reed et al. Feb 2005 B2
6872085 Cohen et al. Mar 2005 B1
6875031 Korsunsky et al. Apr 2005 B1
6899566 Kline et al. May 2005 B2
6903934 Lo et al. Jun 2005 B2
6903939 Chea, Jr. et al. Jun 2005 B1
6913490 Whiteman, Jr. et al. Jul 2005 B2
6916183 Alger et al. Jul 2005 B2
6932649 Rothermel et al. Aug 2005 B1
6955565 Lloyd et al. Oct 2005 B2
6957967 Petersen et al. Oct 2005 B2
6960103 Tokunaga Nov 2005 B2
6971887 Trobough Dec 2005 B1
6971916 Tokunaga Dec 2005 B2
6979202 Benham et al. Dec 2005 B2
6979226 Otsu et al. Dec 2005 B2
6982378 Dickson Jan 2006 B2
7004793 Scherer et al. Feb 2006 B2
7021969 Matsunaga Apr 2006 B2
7044794 Consoli et al. May 2006 B2
7056128 Driscoll et al. Jun 2006 B2
7057570 Irion, II et al. Jun 2006 B2
7070446 Henry et al. Jul 2006 B2
7074086 Cohen et al. Jul 2006 B2
7077658 Ashman et al. Jul 2006 B1
7094102 Cohen et al. Aug 2006 B2
7108556 Cohen et al. Sep 2006 B2
7120327 Bozso et al. Oct 2006 B2
7137849 Nagata Nov 2006 B2
7148428 Meier et al. Dec 2006 B2
7163421 Cohen et al. Jan 2007 B1
7182643 Winings et al. Feb 2007 B2
7214097 Hsu et al. May 2007 B1
7223915 Hackman May 2007 B2
7229318 Winings et al. Jun 2007 B2
7234944 Nordin et al. Jun 2007 B2
7244137 Renfro et al. Jul 2007 B2
7261591 Korsunsky et al. Aug 2007 B2
7267515 Lappohn Sep 2007 B2
7270573 Houtz Sep 2007 B2
7280372 Grundy et al. Oct 2007 B2
7285018 Kenny et al. Oct 2007 B2
7303427 Swain Dec 2007 B2
7307293 Fjelstad et al. Dec 2007 B2
7309239 Shuey et al. Dec 2007 B2
7309257 Minich Dec 2007 B1
7316585 Smith et al. Jan 2008 B2
7322855 Mongold et al. Jan 2008 B2
7331816 Krohn et al. Feb 2008 B2
7331830 Minich Feb 2008 B2
7335063 Cohen et al. Feb 2008 B2
7347721 Kameyama Mar 2008 B2
7351114 Benham et al. Apr 2008 B2
7354274 Minich Apr 2008 B2
7365269 Donazzi et al. Apr 2008 B2
7371117 Gailus May 2008 B2
7384275 Ngo Jun 2008 B2
7390218 Smith et al. Jun 2008 B2
7390220 Wu Jun 2008 B1
7402048 Meier et al. Jul 2008 B2
7407413 Minich Aug 2008 B2
7422483 Avery et al. Sep 2008 B2
7431608 Sakaguchi et al. Oct 2008 B2
7445471 Scherer et al. Nov 2008 B1
7462942 Tan et al. Dec 2008 B2
7485012 Daugherty et al. Feb 2009 B2
7494383 Cohen et al. Feb 2009 B2
7534142 Avery et al. May 2009 B2
7540781 Kenny et al. Jun 2009 B2
7549897 Fedder et al. Jun 2009 B2
7554096 Ward et al. Jun 2009 B2
7581990 Kirk et al. Sep 2009 B2
7585186 McAlonis et al. Sep 2009 B2
7588464 Kim Sep 2009 B2
7588467 Chang Sep 2009 B2
7594826 Kobayashi et al. Sep 2009 B2
7604490 Chen et al. Oct 2009 B2
7604502 Pan Oct 2009 B2
7613011 Grundy et al. Nov 2009 B2
7621779 Laurx et al. Nov 2009 B2
7652381 Grundy et al. Jan 2010 B2
7654831 Wu Feb 2010 B1
7658654 Ohyama et al. Feb 2010 B2
7674133 Fogg et al. Mar 2010 B2
7686659 Peng Mar 2010 B2
7690930 Chen et al. Apr 2010 B2
7690946 Knaub et al. Apr 2010 B2
7699644 Szczesny et al. Apr 2010 B2
7699663 Little et al. Apr 2010 B1
7713077 McGowan et al. May 2010 B1
7719843 Dunham May 2010 B2
7722401 Kirk et al. May 2010 B2
7731537 Amleshi et al. Jun 2010 B2
7744414 Scherer et al. Jun 2010 B2
7753731 Cohen et al. Jul 2010 B2
7758357 Pan et al. Jul 2010 B2
7771233 Gailus Aug 2010 B2
7775802 Defibaugh et al. Aug 2010 B2
7789676 Morgan et al. Sep 2010 B2
7794240 Cohen et al. Sep 2010 B2
7794278 Cohen et al. Sep 2010 B2
7806729 Nguyen et al. Oct 2010 B2
7811129 Glover et al. Oct 2010 B2
7819675 Ko et al. Oct 2010 B2
7824197 Westman et al. Nov 2010 B1
7828595 Mathews Nov 2010 B2
7833068 Bright et al. Nov 2010 B2
7857630 Hermant et al. Dec 2010 B2
7862344 Morgan et al. Jan 2011 B2
7871296 Fowler et al. Jan 2011 B2
7874873 Do et al. Jan 2011 B2
7887371 Kenny et al. Feb 2011 B2
7887379 Kirk Feb 2011 B2
7906730 Atkinson et al. Mar 2011 B2
7914304 Cartier et al. Mar 2011 B2
7927143 Helster et al. Apr 2011 B2
7967637 Fedder et al. Jun 2011 B2
7976318 Fedder et al. Jul 2011 B2
7985097 Gulla Jul 2011 B2
8002581 Whiteman, Jr. et al. Aug 2011 B1
8016616 Glover et al. Sep 2011 B2
8018733 Jia Sep 2011 B2
8036500 McColloch Oct 2011 B2
8057267 Johnescu Nov 2011 B2
8083553 Manter et al. Dec 2011 B2
8100699 Costello Jan 2012 B1
8157573 Tanaka Apr 2012 B2
8162675 Regnier et al. Apr 2012 B2
8167631 Ito et al. May 2012 B2
8167651 Glover et al. May 2012 B2
8182289 Stokoe et al. May 2012 B2
8192222 Kameyama Jun 2012 B2
8197285 Farmer Jun 2012 B2
8210877 Droesbeke Jul 2012 B2
8215968 Cartier et al. Jul 2012 B2
8216001 Kirk Jul 2012 B2
8226441 Regnier et al. Jul 2012 B2
8251745 Johnescu Aug 2012 B2
8267721 Minich Sep 2012 B2
8272877 Stokoe et al. Sep 2012 B2
8308491 Nichols et al. Nov 2012 B2
8308512 Ritter et al. Nov 2012 B2
8328565 Westman et al. Dec 2012 B2
8337243 Elkhatib et al. Dec 2012 B2
8338713 Fjelstad et al. Dec 2012 B2
8348701 Lan et al. Jan 2013 B1
8371875 Gailus Feb 2013 B2
8371876 Davis Feb 2013 B2
8382524 Khilchenko et al. Feb 2013 B2
8398433 Yang Mar 2013 B1
8419472 Swanger et al. Apr 2013 B1
8439704 Reed May 2013 B2
8449312 Lang et al. May 2013 B2
8449330 Schroll et al. May 2013 B1
8465302 Regnier et al. Jun 2013 B2
8469745 Davis et al. Jun 2013 B2
8475209 Whiteman, Jr. et al. Jul 2013 B1
8535065 Costello Sep 2013 B2
8540525 Regnier et al. Sep 2013 B2
8545240 Casher et al. Oct 2013 B2
8550861 Cohen et al. Oct 2013 B2
8553102 Yamada Oct 2013 B2
8556657 Nichols Oct 2013 B1
8588561 Zbinden et al. Nov 2013 B2
8588562 Zbinden et al. Nov 2013 B2
8597055 Regnier et al. Dec 2013 B2
8657627 McNamara et al. Feb 2014 B2
8662924 Davis et al. Mar 2014 B2
8672707 Nichols et al. Mar 2014 B2
8678860 Minich et al. Mar 2014 B2
8690604 Davis Apr 2014 B2
8715003 Buck et al. May 2014 B2
8715005 Pan May 2014 B2
8740644 Long Jun 2014 B2
8753145 Lang et al. Jun 2014 B2
8758051 Nonen et al. Jun 2014 B2
8764460 Smink et al. Jul 2014 B2
8764488 Zeng Jul 2014 B2
8771016 Atkinson et al. Jul 2014 B2
8787711 Zbinden et al. Jul 2014 B2
8804342 Behziz et al. Aug 2014 B2
8814595 Cohen et al. Aug 2014 B2
8845364 Wanha et al. Sep 2014 B2
8864521 Atkinson et al. Oct 2014 B2
8888531 Jeon Nov 2014 B2
8888533 Westman et al. Nov 2014 B2
8911255 Scherer et al. Dec 2014 B2
8926377 Kirk et al. Jan 2015 B2
8944831 Stoner et al. Feb 2015 B2
8944863 Yang Feb 2015 B1
8992236 Wittig et al. Mar 2015 B2
8992237 Regnier et al. Mar 2015 B2
8998642 Manter et al. Apr 2015 B2
9004942 Paniauqa Apr 2015 B2
9011177 Lloyd et al. Apr 2015 B2
9022806 Cartier, Jr. et al. May 2015 B2
9028201 Kirk et al. May 2015 B2
9028281 Kirk et al. May 2015 B2
9035183 Kodama et al. May 2015 B2
9040824 Guetig et al. May 2015 B2
9065230 Milbrand, Jr. Jun 2015 B2
9071001 Scherer et al. Jun 2015 B2
9077115 Yang Jul 2015 B2
9083130 Casher et al. Jul 2015 B2
9118151 Tran et al. Aug 2015 B2
9119292 Gundel Aug 2015 B2
9124009 Atkinson et al. Sep 2015 B2
9142896 Wickes et al. Sep 2015 B2
9142921 Wanha et al. Sep 2015 B2
9166317 Briant et al. Oct 2015 B2
9203171 Yu et al. Dec 2015 B2
9214768 Pao et al. Dec 2015 B2
9219335 Atkinson et al. Dec 2015 B2
9225083 Krenceski et al. Dec 2015 B2
9225085 Cartier, Jr. et al. Dec 2015 B2
9232676 Sechrist et al. Jan 2016 B2
9246251 Regnier et al. Jan 2016 B2
9257778 Buck et al. Feb 2016 B2
9257794 Wanha et al. Feb 2016 B2
9300074 Gailus Mar 2016 B2
9312618 Regnier et al. Apr 2016 B2
9350108 Long May 2016 B2
9356401 Horning et al. May 2016 B1
9362678 Wanha et al. Jun 2016 B2
9373917 Sypolt et al. Jun 2016 B2
9374165 Zbinden et al. Jun 2016 B2
9385455 Regnier et al. Jul 2016 B2
9391407 Bucher et al. Jul 2016 B1
9401570 Phillips et al. Jul 2016 B2
9413112 Helster et al. Aug 2016 B2
9450344 Cartier, Jr. et al. Sep 2016 B2
9461378 Chen Oct 2016 B1
9484674 Cartier, Jr. et al. Nov 2016 B2
9490558 Wanha et al. Nov 2016 B2
9490585 Yang Nov 2016 B2
9490587 Phillips et al. Nov 2016 B1
9509101 Cartier, Jr. et al. Nov 2016 B2
9520689 Cartier, Jr. et al. Dec 2016 B2
9531133 Horning et al. Dec 2016 B1
9553381 Regnier Jan 2017 B2
9559446 Wetzel et al. Jan 2017 B1
9564696 Gulla Feb 2017 B2
9608348 Wanha et al. Mar 2017 B2
9634432 Su et al. Apr 2017 B2
9651752 Zbinden et al. May 2017 B2
9660364 Wig et al. May 2017 B2
9666961 Horning et al. May 2017 B2
9685736 Gailus et al. Jun 2017 B2
9692183 Phillips Jun 2017 B2
9692188 Godana et al. Jun 2017 B2
9705218 Ito Jul 2017 B2
9705255 Atkinson et al. Jul 2017 B2
9728903 Long et al. Aug 2017 B2
9742132 Hsueh Aug 2017 B1
9748698 Morgan et al. Aug 2017 B1
9774144 Cartier, Jr. et al. Sep 2017 B2
9801301 Costello Oct 2017 B1
9831588 Cohen Nov 2017 B2
9841572 Zbinden et al. Dec 2017 B2
9843135 Guetig et al. Dec 2017 B2
9876319 Zhao et al. Jan 2018 B2
9899774 Gailus Feb 2018 B2
9923309 Aizawa et al. Mar 2018 B1
9929512 Trout et al. Mar 2018 B1
9972945 Huang et al. May 2018 B1
9979136 Wu et al. May 2018 B1
9985367 Wanha et al. May 2018 B2
9985389 Morgan et al. May 2018 B1
10038284 Krenceski et al. Jul 2018 B2
10056706 Wanha et al. Aug 2018 B2
10062984 Regnier Aug 2018 B2
10069225 Wanha et al. Sep 2018 B2
10096921 Johnescu et al. Oct 2018 B2
10096945 Cartier, Jr. et al. Oct 2018 B2
10122129 Milbrand, Jr. et al. Nov 2018 B2
10148025 Trout et al. Dec 2018 B1
10170869 Gailus et al. Jan 2019 B2
10181663 Regnier Jan 2019 B2
10186814 Khilchenko et al. Jan 2019 B2
10205286 Provencher et al. Feb 2019 B2
10211577 Milbrand, Jr. et al. Feb 2019 B2
10243304 Kirk et al. Mar 2019 B2
RE47342 Lloyd et al. Apr 2019 E
10270191 Li et al. Apr 2019 B1
10283910 Chen et al. May 2019 B1
10283914 Morgan et al. May 2019 B1
10305224 Girard, Jr. May 2019 B2
10348040 Cartier, Jr. et al. Jul 2019 B2
10355416 Pickel et al. Jul 2019 B1
10381767 Milbrand, Jr. et al. Aug 2019 B1
10431936 Horning et al. Oct 2019 B2
10446983 Krenceski et al. Oct 2019 B2
10511128 Kirk et al. Dec 2019 B2
10601181 Lu et al. Mar 2020 B2
10651603 Kurudamannil et al. May 2020 B2
10720735 Provencher et al. Jul 2020 B2
RE48230 Lloyd et al. Sep 2020 E
10777921 Lu et al. Sep 2020 B2
10797417 Scholeno et al. Oct 2020 B2
10847936 Tang et al. Nov 2020 B2
10916894 Kirk et al. Feb 2021 B2
10931050 Cohen Feb 2021 B2
10931062 Cohen et al. Feb 2021 B2
10938162 Lin Mar 2021 B2
10965063 Krenceski et al. Mar 2021 B2
11189971 Lu Nov 2021 B2
11251558 Lee Feb 2022 B1
11381039 Hsiao et al. Jul 2022 B2
11469553 Johnescu et al. Oct 2022 B2
11469554 Ellison et al. Oct 2022 B2
11522310 Cohen Dec 2022 B2
11539171 Kirk et al. Dec 2022 B2
11600950 Takai et al. Mar 2023 B2
20010012730 Ramey et al. Aug 2001 A1
20010041477 Billman et al. Nov 2001 A1
20010042632 Manov et al. Nov 2001 A1
20010046810 Cohen et al. Nov 2001 A1
20020042223 Belopolsky et al. Apr 2002 A1
20020086582 Nitta et al. Jul 2002 A1
20020088628 Chen Jul 2002 A1
20020089464 Joshi Jul 2002 A1
20020098738 Astbury et al. Jul 2002 A1
20020102885 Kline Aug 2002 A1
20020111068 Cohen et al. Aug 2002 A1
20020111069 Astbury et al. Aug 2002 A1
20020115335 Saito Aug 2002 A1
20020123266 Ramey et al. Sep 2002 A1
20020136506 Asada et al. Sep 2002 A1
20020146926 Fogg et al. Oct 2002 A1
20020157865 Noda Oct 2002 A1
20020168898 Billman et al. Nov 2002 A1
20020172469 Benner et al. Nov 2002 A1
20020181215 Guenthner Dec 2002 A1
20020187688 Marvin et al. Dec 2002 A1
20020192988 Droesbeke et al. Dec 2002 A1
20030003803 Billman et al. Jan 2003 A1
20030008561 Lappoehn Jan 2003 A1
20030008562 Yamasaki Jan 2003 A1
20030022555 Vicich et al. Jan 2003 A1
20030027439 Johnescu et al. Feb 2003 A1
20030073331 Peloza et al. Apr 2003 A1
20030109174 Korsunsky et al. Jun 2003 A1
20030119362 Nelson et al. Jun 2003 A1
20030143894 Kline et al. Jul 2003 A1
20030147227 Egitto et al. Aug 2003 A1
20030162441 Nelson et al. Aug 2003 A1
20030220018 Winings et al. Nov 2003 A1
20030220021 Whiteman et al. Nov 2003 A1
20040001299 van Haaster et al. Jan 2004 A1
20040005815 Mizumura et al. Jan 2004 A1
20040018757 Lang et al. Jan 2004 A1
20040020674 McFadden et al. Feb 2004 A1
20040043661 Okada et al. Mar 2004 A1
20040072473 Wu Apr 2004 A1
20040094328 Fjelstad et al. May 2004 A1
20040097112 Minich et al. May 2004 A1
20040110421 Broman et al. Jun 2004 A1
20040115968 Cohen Jun 2004 A1
20040121633 David et al. Jun 2004 A1
20040121652 Gailus Jun 2004 A1
20040155328 Kline Aug 2004 A1
20040171305 McGowan et al. Sep 2004 A1
20040196112 Welbon et al. Oct 2004 A1
20040224559 Nelson et al. Nov 2004 A1
20040229510 Lloyd et al. Nov 2004 A1
20040235352 Takemasa Nov 2004 A1
20040259419 Payne et al. Dec 2004 A1
20040264894 Cooke et al. Dec 2004 A1
20050006119 Cunningham et al. Jan 2005 A1
20050006126 Aisenbrey Jan 2005 A1
20050020135 Whiteman et al. Jan 2005 A1
20050032430 Otsu et al. Feb 2005 A1
20050039331 Smith Feb 2005 A1
20050048838 Korsunsky et al. Mar 2005 A1
20050048842 Benham et al. Mar 2005 A1
20050070160 Cohen et al. Mar 2005 A1
20050090299 Tsao et al. Apr 2005 A1
20050093127 Fjelstad et al. May 2005 A1
20050118869 Evans Jun 2005 A1
20050133245 Katsuyama et al. Jun 2005 A1
20050142944 Ling et al. Jun 2005 A1
20050148239 Hull et al. Jul 2005 A1
20050176300 Hsu et al. Aug 2005 A1
20050176835 Kobayashi et al. Aug 2005 A1
20050215121 Tokunaga Sep 2005 A1
20050233610 Tutt et al. Oct 2005 A1
20050239339 Pepe Oct 2005 A1
20050277315 Mongold et al. Dec 2005 A1
20050283974 Richard et al. Dec 2005 A1
20050287869 Kenny et al. Dec 2005 A1
20060001163 Kolbehdari et al. Jan 2006 A1
20060009080 Regnier et al. Jan 2006 A1
20060019517 Raistrick et al. Jan 2006 A1
20060019538 Davis et al. Jan 2006 A1
20060024983 Cohen et al. Feb 2006 A1
20060024984 Cohen et al. Feb 2006 A1
20060068640 Gailus Mar 2006 A1
20060073709 Reid Apr 2006 A1
20060079119 Wu Apr 2006 A1
20060091507 Fjelstad et al. May 2006 A1
20060104010 Donazzi et al. May 2006 A1
20060110977 Matthews May 2006 A1
20060141866 Shiu Jun 2006 A1
20060166551 Korsunsky et al. Jul 2006 A1
20060216969 Bright et al. Sep 2006 A1
20060228922 Morriss Oct 2006 A1
20060255876 Kushta et al. Nov 2006 A1
20060292932 Benham et al. Dec 2006 A1
20070004282 Cohen et al. Jan 2007 A1
20070004828 Khabbaz Jan 2007 A1
20070021000 Laurx Jan 2007 A1
20070021001 Laurx et al. Jan 2007 A1
20070021002 Laurx et al. Jan 2007 A1
20070021003 Laurx et al. Jan 2007 A1
20070021004 Laurx et al. Jan 2007 A1
20070032104 Yamada et al. Feb 2007 A1
20070037419 Sparrowhawk Feb 2007 A1
20070042639 Manter et al. Feb 2007 A1
20070054554 Do et al. Mar 2007 A1
20070059961 Cartier et al. Mar 2007 A1
20070111597 Kondou et al. May 2007 A1
20070141872 Szczesny et al. Jun 2007 A1
20070155241 Lappohn Jul 2007 A1
20070197095 Feldman et al. Aug 2007 A1
20070207641 Minich Sep 2007 A1
20070218765 Cohen et al. Sep 2007 A1
20070243741 Yang Oct 2007 A1
20070254517 Olson et al. Nov 2007 A1
20070275583 McNutt et al. Nov 2007 A1
20080026638 Cohen et al. Jan 2008 A1
20080050968 Chang Feb 2008 A1
20080194146 Gailus Aug 2008 A1
20080200955 Tepic Aug 2008 A1
20080207023 Tuin et al. Aug 2008 A1
20080246555 Kirk et al. Oct 2008 A1
20080248658 Cohen et al. Oct 2008 A1
20080248659 Cohen et al. Oct 2008 A1
20080248660 Kirk et al. Oct 2008 A1
20080264673 Chi et al. Oct 2008 A1
20080267620 Cole et al. Oct 2008 A1
20080297988 Chau Dec 2008 A1
20080305689 Zhang et al. Dec 2008 A1
20080318455 Beaman et al. Dec 2008 A1
20090011641 Cohen et al. Jan 2009 A1
20090011643 Amleshi et al. Jan 2009 A1
20090011645 Laurx et al. Jan 2009 A1
20090011664 Laurx et al. Jan 2009 A1
20090017682 Amleshi et al. Jan 2009 A1
20090023330 Stoner et al. Jan 2009 A1
20090029602 Cohen et al. Jan 2009 A1
20090035955 McNamara Feb 2009 A1
20090051558 Dorval Feb 2009 A1
20090061661 Shuey et al. Mar 2009 A1
20090098767 Long Apr 2009 A1
20090117386 Vacanti et al. May 2009 A1
20090124101 Minich et al. May 2009 A1
20090130913 Yi et al. May 2009 A1
20090130918 Nguyen et al. May 2009 A1
20090149045 Chen et al. Jun 2009 A1
20090166082 Liu et al. Jul 2009 A1
20090176400 Davis et al. Jul 2009 A1
20090203259 Nguyen et al. Aug 2009 A1
20090205194 Semba et al. Aug 2009 A1
20090215309 Mongold et al. Aug 2009 A1
20090227141 Pan Sep 2009 A1
20090239395 Cohen et al. Sep 2009 A1
20090247012 Pan Oct 2009 A1
20090258516 Hiew et al. Oct 2009 A1
20090291593 Atkinson et al. Nov 2009 A1
20090305530 Ito et al. Dec 2009 A1
20090305533 Feldman et al. Dec 2009 A1
20090305553 Thomas et al. Dec 2009 A1
20090311908 Fogg et al. Dec 2009 A1
20100009571 Scherer et al. Jan 2010 A1
20100048058 Morgan et al. Feb 2010 A1
20100081302 Atkinson et al. Apr 2010 A1
20100099299 Moriyama et al. Apr 2010 A1
20100112850 Rao et al. May 2010 A1
20100144167 Fedder et al. Jun 2010 A1
20100144168 Glover et al. Jun 2010 A1
20100144175 Helster et al. Jun 2010 A1
20100144201 Defibaugh et al. Jun 2010 A1
20100144203 Glover et al. Jun 2010 A1
20100144204 Knaub et al. Jun 2010 A1
20100177489 Yagisawa Jul 2010 A1
20100183141 Arai et al. Jul 2010 A1
20100203768 Kondo et al. Aug 2010 A1
20100221951 Pepe et al. Sep 2010 A1
20100273359 Walker et al. Oct 2010 A1
20100291806 Minich et al. Nov 2010 A1
20100294530 Atkinson et al. Nov 2010 A1
20110003509 Gailus Jan 2011 A1
20110067237 Cohen Mar 2011 A1
20110074213 Schaffer et al. Mar 2011 A1
20110104948 Girard, Jr. et al. May 2011 A1
20110130038 Cohen et al. Jun 2011 A1
20110177699 Crofoot et al. Jul 2011 A1
20110212632 Stokoe et al. Sep 2011 A1
20110212633 Regnier et al. Sep 2011 A1
20110212649 Stokoe et al. Sep 2011 A1
20110212650 Amleshi et al. Sep 2011 A1
20110223807 Jeon et al. Sep 2011 A1
20110230095 Atkinson et al. Sep 2011 A1
20110230096 Atkinson et al. Sep 2011 A1
20110230104 Lang et al. Sep 2011 A1
20110256739 Toshiyuki et al. Oct 2011 A1
20110263156 Ko Oct 2011 A1
20110287663 Gailus et al. Nov 2011 A1
20110300757 Regnier et al. Dec 2011 A1
20120003848 Casher et al. Jan 2012 A1
20120034820 Lang et al. Feb 2012 A1
20120077369 Andersen Mar 2012 A1
20120077380 Minich et al. Mar 2012 A1
20120094536 Khilchenko et al. Apr 2012 A1
20120115371 Chuang et al. May 2012 A1
20120135643 Lange et al. May 2012 A1
20120156929 Manter et al. Jun 2012 A1
20120184136 Ritter Jul 2012 A1
20120184154 Frank et al. Jul 2012 A1
20120202363 McNamara et al. Aug 2012 A1
20120202386 McNamara et al. Aug 2012 A1
20120202387 McNamara Aug 2012 A1
20120214343 Buck et al. Aug 2012 A1
20120214344 Cohen et al. Aug 2012 A1
20120329294 Raybold et al. Dec 2012 A1
20130012038 Kirk et al. Jan 2013 A1
20130017715 Laarhoven et al. Jan 2013 A1
20130017733 Kirk et al. Jan 2013 A1
20130065454 Milbrand Jr. Mar 2013 A1
20130078870 Milbrand, Jr. Mar 2013 A1
20130078871 Milbrand, Jr. Mar 2013 A1
20130089993 Jeon Apr 2013 A1
20130090001 Kagotani Apr 2013 A1
20130092429 Ellison Apr 2013 A1
20130109232 Paniaqua May 2013 A1
20130143442 Cohen et al. Jun 2013 A1
20130178107 Costello et al. Jul 2013 A1
20130196553 Gailus Aug 2013 A1
20130210246 Davis et al. Aug 2013 A1
20130217263 Pan Aug 2013 A1
20130223036 Herring et al. Aug 2013 A1
20130225006 Khilchenko et al. Aug 2013 A1
20130237092 Rubens Sep 2013 A1
20130273781 Buck et al. Oct 2013 A1
20130288513 Masubuchi et al. Oct 2013 A1
20130288521 McClellan et al. Oct 2013 A1
20130288525 McClellan et al. Oct 2013 A1
20130288539 McClellan et al. Oct 2013 A1
20130316590 Hon Nov 2013 A1
20130340251 Regnier et al. Dec 2013 A1
20140004724 Cartier, Jr. et al. Jan 2014 A1
20140004726 Cartier, Jr. et al. Jan 2014 A1
20140004746 Cartier, Jr. et al. Jan 2014 A1
20140041937 Lloyd et al. Feb 2014 A1
20140057493 De Geest et al. Feb 2014 A1
20140057494 Cohen Feb 2014 A1
20140057498 Cohen Feb 2014 A1
20140065883 Cohen et al. Mar 2014 A1
20140073174 Yang Mar 2014 A1
20140073181 Yang Mar 2014 A1
20140080331 Jeon Mar 2014 A1
20140194004 Pickel et al. Jul 2014 A1
20140242844 Wanha et al. Aug 2014 A1
20140273551 Resendez et al. Sep 2014 A1
20140273557 Cartier, Jr. et al. Sep 2014 A1
20140273627 Cartier, Jr. et al. Sep 2014 A1
20140287627 Cohen Sep 2014 A1
20140308852 Gulla Oct 2014 A1
20140322974 Chang et al. Oct 2014 A1
20140335707 Johnescu et al. Nov 2014 A1
20140335736 Regnier et al. Nov 2014 A1
20150031238 Davis et al. Jan 2015 A1
20150056856 Atkinson et al. Feb 2015 A1
20150079829 Brodsgaard Mar 2015 A1
20150079845 Wanha et al. Mar 2015 A1
20150111427 Wu et al. Apr 2015 A1
20150180578 Leigh et al. Jun 2015 A1
20150188250 Liu et al. Jul 2015 A1
20150194751 Herring Jul 2015 A1
20150200496 Simpson et al. Jul 2015 A1
20150207247 Regnier et al. Jul 2015 A1
20150236450 Davis Aug 2015 A1
20150236451 Cartier, Jr. et al. Aug 2015 A1
20150236452 Cartier, Jr. et al. Aug 2015 A1
20150255926 Paniagua Sep 2015 A1
20150280351 Bertsch Oct 2015 A1
20150303608 Zerebilov et al. Oct 2015 A1
20150357736 Tran et al. Dec 2015 A1
20150357761 Wanha et al. Dec 2015 A1
20150380868 Chen et al. Dec 2015 A1
20160000616 Lavoie Jan 2016 A1
20160013594 Costello et al. Jan 2016 A1
20160013596 Regnier Jan 2016 A1
20160028189 Resendez et al. Jan 2016 A1
20160104956 Santos et al. Apr 2016 A1
20160111825 Wanha et al. Apr 2016 A1
20160134057 Buck et al. May 2016 A1
20160141807 Gailus et al. May 2016 A1
20160149343 Atkinson et al. May 2016 A1
20160149362 Ritter et al. May 2016 A1
20160150633 Cartier, Jr. May 2016 A1
20160150639 Gailus et al. May 2016 A1
20160150645 Gailus et al. May 2016 A1
20160156133 Masubuchi et al. Jun 2016 A1
20160172794 Sparrowhawk et al. Jun 2016 A1
20160181713 Peloza et al. Jun 2016 A1
20160181732 Laurx et al. Jun 2016 A1
20160190747 Regnier et al. Jun 2016 A1
20160197423 Regnier Jul 2016 A1
20160211618 Gailus Jul 2016 A1
20160218455 Sayre et al. Jul 2016 A1
20160233598 Wittig Aug 2016 A1
20160268714 Wanha et al. Sep 2016 A1
20160274316 Verdiell Sep 2016 A1
20160308296 Pitten et al. Oct 2016 A1
20160322770 Zerebilov Nov 2016 A1
20160344141 Cartier, Jr. et al. Nov 2016 A1
20170025783 Astbury et al. Jan 2017 A1
20170033478 Wanha et al. Feb 2017 A1
20170042070 Baumler et al. Feb 2017 A1
20170047692 Cartier, Jr. et al. Feb 2017 A1
20170077643 Zbinden et al. Mar 2017 A1
20170093093 Cartier, Jr. et al. Mar 2017 A1
20170098901 Regnier Apr 2017 A1
20170162960 Wanha et al. Jun 2017 A1
20170294743 Gailus et al. Oct 2017 A1
20170302011 Wanha et al. Oct 2017 A1
20170338595 Girard, Jr. Nov 2017 A1
20170352970 Liang et al. Dec 2017 A1
20170365942 Regnier Dec 2017 A1
20170365943 Wanha et al. Dec 2017 A1
20180006416 Lloyd et al. Jan 2018 A1
20180034175 Lloyd et al. Feb 2018 A1
20180034190 Ngo Feb 2018 A1
20180040989 Chen Feb 2018 A1
20180062323 Kirk et al. Mar 2018 A1
20180109043 Provencher et al. Apr 2018 A1
20180145438 Cohen May 2018 A1
20180166828 Gailus Jun 2018 A1
20180198220 Sasame et al. Jul 2018 A1
20180205177 Zhou et al. Jul 2018 A1
20180212376 Wang et al. Jul 2018 A1
20180219331 Cartier, Jr. et al. Aug 2018 A1
20180219332 Brungard et al. Aug 2018 A1
20180269607 Wu et al. Sep 2018 A1
20180366880 Zerebilov et al. Dec 2018 A1
20190013625 Gailus et al. Jan 2019 A1
20190020155 Trout et al. Jan 2019 A1
20190036256 Martens et al. Jan 2019 A1
20190044284 Dunham Feb 2019 A1
20190052019 Huang et al. Feb 2019 A1
20190067854 Ju et al. Feb 2019 A1
20190131743 Hsu et al. May 2019 A1
20190157812 Gailus et al. May 2019 A1
20190173209 Lu et al. Jun 2019 A1
20190173232 Lu et al. Jun 2019 A1
20190173236 Provencher et al. Jun 2019 A1
20190221973 Kirk et al. Jul 2019 A1
20190296469 Stokoe et al. Sep 2019 A1
20190312389 Little Oct 2019 A1
20190334292 Cartier, Jr. et al. Oct 2019 A1
20200021052 Milbrand, Jr. et al. Jan 2020 A1
20200076132 Yang et al. Mar 2020 A1
20200161811 Lu May 2020 A1
20200194940 Cohen et al. Jun 2020 A1
20200212632 Liong et al. Jul 2020 A1
20200220289 Scholeno et al. Jul 2020 A1
20200235529 Kirk et al. Jul 2020 A1
20200251841 Stokoe et al. Aug 2020 A1
20200259294 Lu Aug 2020 A1
20200266584 Lu Aug 2020 A1
20200266585 Paniagua et al. Aug 2020 A1
20200303879 Provencher et al. Sep 2020 A1
20200315027 Muronoi et al. Oct 2020 A1
20200350717 Dong et al. Nov 2020 A1
20200350732 Hsueh et al. Nov 2020 A1
20200395698 Hou et al. Dec 2020 A1
20200403350 Hsu Dec 2020 A1
20200412060 Hsieh et al. Dec 2020 A1
20210036465 Tang et al. Feb 2021 A1
20210050683 Sasame et al. Feb 2021 A1
20210159643 Kirk et al. May 2021 A1
20210175670 Cartier, Jr. et al. Jun 2021 A1
20210184404 Cohen et al. Jun 2021 A1
20210194187 Chen et al. Jun 2021 A1
20210203096 Cohen Jul 2021 A1
20210234314 Johnescu et al. Jul 2021 A1
20210234315 Ellison et al. Jul 2021 A1
20210242632 Trout et al. Aug 2021 A1
20210320461 Buck et al. Oct 2021 A1
20210336362 Shen et al. Oct 2021 A1
20220094099 Liu et al. Mar 2022 A1
20220102916 Liu et al. Mar 2022 A1
20220399663 Chang et al. Dec 2022 A1
20220407269 Ellison et al. Dec 2022 A1
20230062661 Johnescu et al. Mar 2023 A1
Foreign Referenced Citations (228)
Number Date Country
1075390 Aug 1993 CN
1098549 Feb 1995 CN
1237652 Dec 1999 CN
1265470 Sep 2000 CN
2400938 Oct 2000 CN
1276597 Dec 2000 CN
1280405 Jan 2001 CN
1299524 Jun 2001 CN
2513247 Sep 2002 CN
2519434 Oct 2002 CN
2519458 Oct 2002 CN
2519592 Oct 2002 CN
1394829 Feb 2003 CN
1398446 Feb 2003 CN
1401147 Mar 2003 CN
1126212 Oct 2003 CN
1127783 Nov 2003 CN
1471749 Jan 2004 CN
1489810 Apr 2004 CN
1491465 Apr 2004 CN
1502151 Jun 2004 CN
1516723 Jul 2004 CN
1179448 Dec 2004 CN
1561565 Jan 2005 CN
1203341 May 2005 CN
1639866 Jul 2005 CN
1650479 Aug 2005 CN
1764020 Apr 2006 CN
1799290 Jul 2006 CN
2798361 Jul 2006 CN
2865050 Jan 2007 CN
1985199 Jun 2007 CN
101032060 Sep 2007 CN
201000949 Jan 2008 CN
101124697 Feb 2008 CN
201022125 Feb 2008 CN
201038469 Mar 2008 CN
101164204 Apr 2008 CN
101176389 May 2008 CN
101208837 Jun 2008 CN
101273501 Sep 2008 CN
201112782 Sep 2008 CN
101312275 Nov 2008 CN
101316012 Dec 2008 CN
201222548 Apr 2009 CN
201252183 Jun 2009 CN
101471515 Jul 2009 CN
101552410 Oct 2009 CN
101600293 Dec 2009 CN
201374433 Dec 2009 CN
101752700 Jun 2010 CN
101790818 Jul 2010 CN
201562814 Aug 2010 CN
101854748 Oct 2010 CN
101120490 Nov 2010 CN
101964463 Feb 2011 CN
101124697 Mar 2011 CN
201846527 May 2011 CN
102106041 Jun 2011 CN
102157860 Aug 2011 CN
102195173 Sep 2011 CN
201966361 Sep 2011 CN
102232259 Nov 2011 CN
102239605 Nov 2011 CN
102282731 Dec 2011 CN
102292881 Dec 2011 CN
102299429 Dec 2011 CN
101600293 May 2012 CN
102570100 Jul 2012 CN
102598430 Jul 2012 CN
101258649 Sep 2012 CN
102738621 Oct 2012 CN
102176586 Nov 2012 CN
102859805 Jan 2013 CN
202678544 Jan 2013 CN
202695788 Jan 2013 CN
202695861 Jan 2013 CN
102986091 Mar 2013 CN
103036081 Apr 2013 CN
103151651 Jun 2013 CN
103594871 Feb 2014 CN
103915727 Jul 2014 CN
104241973 Dec 2014 CN
204190038 Mar 2015 CN
104577577 Apr 2015 CN
205212085 May 2016 CN
102820589 Aug 2016 CN
106099546 Nov 2016 CN
107069274 Aug 2017 CN
304240766 Aug 2017 CN
304245430 Aug 2017 CN
206712089 Dec 2017 CN
207677189 Jul 2018 CN
108832338 Nov 2018 CN
109994892 Jul 2019 CN
111555069 Aug 2020 CN
112134095 Dec 2020 CN
213636403 Jul 2021 CN
3447556 Jul 1986 DE
4109863 Oct 1992 DE
4238777 May 1993 DE
19853837 Feb 2000 DE
102006044479 May 2007 DE
60216728 Nov 2007 DE
0560551 Sep 1993 EP
0774807 May 1997 EP
0903816 Mar 1999 EP
1018784 Jul 2000 EP
1207587 May 2002 EP
1779472 May 2007 EP
1794845 Jun 2007 EP
2169770 Mar 2010 EP
2262061 Dec 2010 EP
2388867 Nov 2011 EP
2390958 Nov 2011 EP
2405537 Jan 2012 EP
1794845 Mar 2013 EP
2811589 Dec 2014 EP
1272347 Apr 1972 GB
2161658 Jan 1986 GB
2283620 May 1995 GB
1043254 Sep 2002 HK
H02-079571 Jun 1990 JP
H05-54201 Mar 1993 JP
H05-234642 Sep 1993 JP
H07-57813 Mar 1995 JP
H07-302649 Nov 1995 JP
H09-63703 Mar 1997 JP
H09-274969 Oct 1997 JP
2711601 Feb 1998 JP
H11-67367 Mar 1999 JP
2896836 May 1999 JP
H11-233200 Aug 1999 JP
H11-260497 Sep 1999 JP
2000-013081 Jan 2000 JP
2000-311749 Nov 2000 JP
2001-068888 Mar 2001 JP
2001-510627 Jul 2001 JP
2001-217052 Aug 2001 JP
2002-042977 Feb 2002 JP
2002-053757 Feb 2002 JP
2002-075052 Mar 2002 JP
2002-075544 Mar 2002 JP
2002-117938 Apr 2002 JP
2002-246107 Aug 2002 JP
2003-017193 Jan 2003 JP
2003-309395 Oct 2003 JP
2004-192939 Jul 2004 JP
2004-259621 Sep 2004 JP
3679470 Aug 2005 JP
2006-108115 Apr 2006 JP
2006-344524 Dec 2006 JP
2008-515167 May 2008 JP
2009-043717 Feb 2009 JP
2009-110956 May 2009 JP
2011-018651 Jan 2011 JP
2012-516021 Jul 2012 JP
2016-528688 Sep 2016 JP
9907324 Aug 2000 MX
466650 Dec 2001 TW
517002 Jan 2003 TW
534494 May 2003 TW
200501874 Jan 2005 TW
200515773 May 2005 TW
M274675 Sep 2005 TW
M329891 Apr 2008 TW
M357771 May 2009 TW
200926536 Jun 2009 TW
M403141 May 2011 TW
M494411 Jan 2015 TW
I475770 Mar 2015 TW
M518837 Mar 2016 TW
M558481 Apr 2018 TW
M558482 Apr 2018 TW
M558483 Apr 2018 TW
M559006 Apr 2018 TW
M559007 Apr 2018 TW
M560138 May 2018 TW
M562507 Jun 2018 TW
M565894 Aug 2018 TW
M565895 Aug 2018 TW
M565899 Aug 2018 TW
M565900 Aug 2018 TW
M565901 Aug 2018 TW
M623128 Feb 2022 TW
WO 8502265 May 1985 WO
WO 8805218 Jul 1988 WO
WO 9835409 Aug 1998 WO
WO 9956352 Nov 1999 WO
WO 0139332 May 2001 WO
WO 0157963 Aug 2001 WO
WO 2002061892 Aug 2002 WO
WO 03013199 Feb 2003 WO
WO 03047049 Jun 2003 WO
WO 2004034539 Apr 2004 WO
WO 2004051809 Jun 2004 WO
WO 2004059794 Jul 2004 WO
WO 2004059801 Jul 2004 WO
WO 2004114465 Dec 2004 WO
WO 2005011062 Feb 2005 WO
WO 2005114274 Dec 2005 WO
WO 2006002356 Jan 2006 WO
WO 2006039277 Apr 2006 WO
WO 2007005597 Jan 2007 WO
WO 2007005598 Jan 2007 WO
WO 2007005599 Jan 2007 WO
WO 2008072322 Jun 2008 WO
WO 2008124052 Oct 2008 WO
WO 2008124054 Oct 2008 WO
WO 2008124057 Oct 2008 WO
WO 2008124101 Oct 2008 WO
WO 2009111283 Sep 2009 WO
WO 2010030622 Mar 2010 WO
WO 2010039188 Apr 2010 WO
WO 20110601236 May 2011 WO
WO 2011100740 Aug 2011 WO
WO 2011106572 Sep 2011 WO
WO 2011139946 Nov 2011 WO
WO 2011140438 Nov 2011 WO
WO 2011140438 Dec 2011 WO
WO 2012078434 Jun 2012 WO
WO 2012106554 Aug 2012 WO
WO 2013006592 Jan 2013 WO
WO 2013059317 Apr 2013 WO
WO 2013013430 Jan 2015 WO
WO 2015112717 Jul 2015 WO
WO 2016008473 Jan 2016 WO
WO 2018039164 Mar 2018 WO
Non-Patent Literature Citations (182)
Entry
Chinese Invalidation Request dated Aug. 17, 2021 in connection with Chinese Application No. 200580040906.5.
Chinese Invalidation Request dated Jun. 1, 2021 in connection with Chinese Application No. 200680023997.6.
Chinese Invalidation Request dated Sep. 9, 2021 in connection with Chinese Application No. 201110008089.2.
Chinese Invalidation Request dated Jun. 15, 2021 in connection with Chinese Application No. 201180033750.3.
Chinese Supplemental Observations dated Jun. 17, 2021 in connection with Chinese Application No. 201210249710.9.
Chinese communication for Chinese Application No. 201580014851.4, dated Jun. 1, 2020.
Chinese Office Action for Chinese Application No. 201580014851.4 dated Sep. 4, 2019.
Chinese Office Action for Application No. CN201580069567.7 dated Jun. 17, 2019.
Chinese Office Action for Application No. CN201580069567.7 dated Oct. 9, 2019.
Chinese Invalidation Request dated Mar. 17, 2021 in connection with Chinese Application No. 201610952606.4.
Chinese Office Action for Chinese Application No. 201780064531.9 dated Jan. 2, 2020.
Chinese Office Action for Chinese Application No. 202010467444.1 dated Apr. 2, 2021.
Chinese Office Action for Chinese Application No. 202010825662.8 dated Sep. 3, 2021.
Chinese Office Action for Chinese Application No. 202010922401.8 dated Aug. 6, 2021.
Extended European Search Report for European Application No. EP 11166820.8 dated Jan. 24, 2012.
International Search Report and Written Opinion dated Dec. 28, 2021 in connection with International Application No. PCT/CN2021/119849.
International Preliminary Report on Patentability for International Application No. PCT/US2005/034605 dated Apr. 3, 2007.
International Search Report and Written Opinion for International Application No. PCT/US2005/034605 dated Jan. 26, 2006.
International Preliminary Report on Patentability for International Application No. PCT/US2006/025562 dated Jan. 9, 2008.
International Search Report and Written Opinion for International Application No. PCT/US2006/25562 dated Oct. 31, 2007.
International Search Report with Written Opinion for International Application No. PCT/US2006/025562 dated Oct. 31, 2007.
International Preliminary Report on Patentability for International Application No. PCT/US2010/056482 dated May 24, 2012.
International Search Report and Written Opinion for International Application No. PCT/US2010/056482 dated Mar. 14, 2011.
International Search Report and Written Opinion for International Application No. PCT/US2010/056495 dated Jan. 25, 2011.
International Preliminary Report on Patentability for International Application No. PCT/US2011/026139 dated Sep. 7, 2012.
International Search Report and Written Opinion for International Application No. PCT/US2011/026139 dated Nov. 22, 2011.
International Search Report and Written Opinion for International Application No. PCT/US2011/034747 dated Jul. 28, 2011.
International Preliminary Report on Patentability for International Application No. PCT/US2012/023689 dated Aug. 15, 2013.
International Search Report and Written Opinion for International Application No. PCT/US2012/023689 dated Sep. 12, 2012.
International Preliminary Report on Patentability for International Application No. PCT/US2012/060610 dated May 1, 2014.
International Search Report and Written Opinion for International Application No. PCT/US2012/060610 dated Mar. 29, 2013.
International Search Report and Written Opinion for International Application No. PCT/US2014/026381 dated Aug. 12, 2014.
International Preliminary Report on Patentability for International Application No. PCT/US2015/012463 dated Aug. 4, 2016.
International Search Report and Written Opinion for International Application No. PCT/US2015/012463 dated May 13, 2015.
International Search Report and Written Opinion for International Application No. PCT/US2015/012542 dated Apr. 30, 2015.
International Search Report and Written Opinion for International Application No. PCT/US2015/060472 dated Mar. 11, 2016.
International Search Report and Written Opinion for International Application No. PCT/US2016/043358 dated Nov. 3, 2016.
International Search Report and Written Opinion for International Application No. PCT/US2017/033122 dated Aug. 8, 2017.
International Preliminary Report on Patentability for International Application No. PCT/US2017/047905, dated Mar. 7, 2019.
International Search Report and Written Opinion for International Application No. PCT/US2017/047905 dated Dec. 4, 2017.
International Preliminary Report on Patentability for International Application No. PCT/US2017/057402 dated May 2, 2019.
International Search Report and Written Opinion for International Application No. PCT/US2017/057402 dated Jan. 19, 2018.
International Search Report and Written Opinion for International Application No. PCT/US2018/045207 dated Nov. 29, 2018.
International Preliminary Report on Patentability Chapter II dated Apr. 5, 2022 in connection with International Application No. PCT/US2021/015048.
International Search Report and Written Opinion dated Jul. 1, 2021 in connection with International Application No. PCT/US2021/015048.
International Preliminary Report on Patentability Chapter II dated Apr. 1, 2022 in connection with International Application No. PCT/US2021/015073.
International Search Report and Written Opinion dated May 17, 2021 in connection with International Application No. PCT/US2021/015073.
Taiwanese Office Action dated Mar. 5, 2021 in connection with Taiwanese Application No. 106128439.
Taiwanese Office Action dated Mar. 15, 2022 in connection with Taiwanese Application No. 110140608.
Decision Invalidating CN Patent Application No. 201610952606.4, which issued as CN Utility Model Patent No. 107069274B, and Certified Translation.
In re Certain Electrical Connectors and Cages, Components Thereof, and Prods. Containing the Same, Inv. No. 337-TA-1241, Order No. 31 (Oct. 19, 2021): Construing Certain Terms of the Asserted Claims of the Patents at Issue.
In re Matter of Certain Electrical Connectors and Cages, Components Thereof, and Products Containing the Same, Inv. No. 337-TA-1241, Complainant Amphenol Corporation's Corrected Initial Post-Hearing Brief. Public Version. Jan. 5, 2022. 451 pages.
In re Matter of Certain Electrical Connectors and Cages, Components Thereof, and Products Containing the Same, Inv. No. 337-TA-1241, Complainant Amphenol Corporation's Post-Hearing Reply Brief. Public Version. Dec. 6, 2021. 159 pages.
In re Matter of Certain Electrical Connectors and Cages, Components Thereof, and Products Containing the Same, Inv. No. 337-TA-1241, Luxshare Respondents' Initial Post-Hearing Brief. Public Version. Nov. 23, 2021. 348 pages.
In re Matter of Certain Electrical Connectors and Cages, Components Thereof, and Products Containing the Same, Inv. No. 337-TA-1241, Luxshare Respondents' Reply Post-Hearing Brief. Public Version. Dec. 6, 2021. 165 pages.
In re Matter of Certain Electrical Connectors and Cages, Components Thereof, and Products Containing the Same, Inv. No. 337-TA-1241, Notice of Prior Art. Jun. 3, 2021. 319 pages.
In re Matter of Certain Electrical Connectors and Cages, Components Thereof, and Products Containing the Same, Inv. No. 337-TA-1241, Respondents' Pre-Hearing Brief. Redacted. Oct. 21, 2021. 219 pages.
In the Matter of Certain Electrical Connectors and Cages, Components Thereof, and Products Containing the Same, Inv. No. 337-TA-1241, Final Initial Determination on Violation of Section 337. Public Version. Mar. 11, 2022. 393 pages.
Invalidity Claim Charts Based on CN 201112782Y (“Cai”). Luxshare Respondents' Supplemental Responses to Interrogatories Nos. 13 and 14, Exhibit 25. May 7, 2021. 147 pages.
Invalidity Claim Charts Based on U.S. Pat. No. 6,179,651 (“Huang”). Luxshare Respondents' Supplemental Responses to Interrogatories Nos. 13 and 14, Exhibit 26. May 7, 2021. 153 pages.
Invalidity Claim Charts Based on U.S. Pat. No. 7,261,591 (“Korsunsky”). Luxshare Respondents' Supplemental Responses to Interrogatories Nos. 13 and 14, Exhibit 27. May 7, 2021. 150 pages.
Petition for Inter Partes Review. Luxshare Precision Industry Co., Ltd v. Amphenol Corp. U.S. Pat. No. 10,381,767. IPR2022-00132. Nov. 4, 2021. 112 pages.
[No Author Listed], Amphenol TCS expands the Xcede Platform with 85 Ohm Connectors and High-Speed Cable Solutions. Press Release. Published Feb. 25, 2009. http://www.amphenol.com/about/news_archive/2009/58 [Retrieved on Mar. 26, 2019 from Wayback Machine]. 4 pages.
[No Author Listed], Agilent. Designing Scalable 10G Backplane Interconnect Systems Utilizing Advanced Verification Methodologies. White Paper, Published May 5, 2012. 24 pages.
[No Author Listed], All About ESD Plastics. Evaluation Engineering. Jul. 1, 1998. 8 pages. https://www.evaluationengineering.com/home/article/13001136/all-about-esdplastics [last accessed Mar. 14, 2021].
[No Author Listed], AMP Incorporated Schematic, Cable Assay, 2 Pair, HMZD. Oct. 3, 2002. 1 page.
[No Author Listed], Board to Backplane Electrical Connector. The Engineer. Mar. 13, 2001, [last accessed Apr. 30, 2021]. 2 pages.
[No Author Listed], Borosil Vision Mezzo Mug Set of 2. Zola. 3 pages. https://www.zola.com/shop/product/borosil_vision_mezzao_mug_setof2_3.25. [date retrieved May 4, 2021].
[No Author Listed], Cable Systems. Samtec. Aug. 2010. 148 pages.
[No Author Listed], Carbon Nanotubes For Electromagnetic Interference Shielding. SBIR/STTR. Award Information. Program Year 2001. Fiscal Year 2001. Materials Research Institute, LLC. Chu et al. Available at http://sbir.gov/sbirsearch/detail/225895. Last accessed Sep. 19, 2013.
[No Author Listed], Coating Electrical Contacts. Brush Wellman Engineered Materials. Jan. 2002;4(1). 2 pages.
[No Author Listed], Common Management Interface Specification. Rev 4.0. MSA Group. May 8, 2019. 265 pages.
[No Author Listed], Electronics Connector Overview. FCI. Sep. 23, 2009. 78 pages.
[No Author Listed], Emi Shielding Compounds Instead of Metal. RTP Company. Last Accessed Apr. 30, 2021. 2 pages.
[No Author Listed], EMI Shielding Solutions and EMC Testing Services from Laird Technologies. Laird Technologies. Last acessed Apr. 30, 2021. 1 page.
[No Author Listed], Emi Shielding, Dramatic Cost Reductions for Electronic Device Protection. RTP. Jan. 2000. 10 pages.
[No Author Listed], Excerpt from The Concise Oxford Dictionary, Tenth Edition. 1999. 3 pages.
[No Author Listed], Excerpt from The Merriam-Webster Dictionary, Between. 2005. 4 pages.
[No Author Listed], Excerpt from Webster's Third New International Dictionary, Contact. 1986. 3 pages.
[No Author Listed], FCI—High Speed Interconnect Solutions, Backpanel Connectors. FCI. [last accessed Apr. 30, 2021). 2 pages.
[No Author Listed], File: Wrt54gl-layout.jpg Sep. 8, 2006. Retrieved from the Internet: https://xinu.mscs.mu.edu/File:Wrt54gl-layout.jpg [retrieved on Apr. 9, 2019]. 2 pages.
[No Author Listed], General Product Specification for GbX Backplane and Daughtercard Interconnect System. Revision “B”. Teradyne. Aug. 23, 2005. 12 pages.
[No Author Listed], High Speed Backplane Connectors. Tyco Electronics. Product Catalog No. 1773095. Revised Dec. 2008. 1-40 pages.
[No Author Listed], Hitachi Cable America Inc. Direct Attach Cables. 8 pages. Retrieved Aug. 10, 2017 from http://www.hca.hitachi-cable.com/products/hca/catalog/pdfs/direct-attach-cable-assemblies.pdf [last accessed Mar. 6, 2019].
[No Author Listed], Hozox EMI Absorption Sheet and Tape. Molex. Laird Technologies. 2013. 2 pages.
[No Author Listed], INF-8074i Specification for SFP (Small Formfactor Pluggable) Transceiver. SFF Committee. Revision 1.0. May 12, 2001. 39 pages.
[No Author Listed], INF-8438i Specification for QSFP (Quad Small Formfactor Pluggable) Transceiver. Rev 1.0 Nov. 2006. SFF Committee. 76 pages.
[No Author Listed], Interconnect Signal Integrity Handbook. Samtec. Aug. 2007. 21 pages.
[No Author Listed], Metallized Conductive Products: Fabric-Over-Foam, Conductive Foam, Fabric, Tape. Laird Technologies. 2003. 32 pages.
[No Author Listed], Metral® 2000 Series. FCI. 2001. 2 pages.
[No Author Listed], Metral® 2mm High-Speed Connectors 1000, 2000, 3000 Series. FCI. 2000. 119 pages.
[No Author Listed], Metral® 3000 Series. FCI. 2001. 2 pages.
[No Author Listed], Metral® 4000 Series. FCI. 2002. 2 pages.
[No Author Listed], Metral® 4000 Series: High-Speed Backplane Connectors. FCI, Rev. 3. Nov. 30, 2001. 21 pages.
[No Author Listed], Military Fibre Channel High Speed Cable Assembly. www.gore.com. 2008. [last accessed Aug. 2, 2012 via Internet Archive: Wayback Machine http://web.archive.org] Link archived: http://www.gore.com/en.sub .--xx/products/cables/copper/networking/militar-y/military.sub .-- fibre . . . Last archive date Apr. 6, 2008.
[No Author Listed], Molex Connectors as InfiniBand Solutions. Design World. Nov. 19, 2008. 7 pages. https://www.designworldonline.com/molex-connectors-as-infiniband-solutions/. [last accessed May 3, 2021].
[No Author Listed], OSFP MSA Specification for OSFP Octal Small Form Factor Pluggable Module. Revision 1.11. OSFP MSA. Jun. 26, 2017. 53 pages.
[No Author Listed], OSFP MSA Specification for OSFP Octal Small Form Factor Pluggable Module. Revision 1.12. OSFP MSA. Aug. 1, 2017. 53 pages.
[No Author Listed], OSFPA MSA Specification for OSFP Octal Small Form Factor Pluggable Module. Revision 2.0 OSFP MSA. Jan. 14, 2019. 80 pages.
[No Author Listed], OSFPA MSA Specification for OSFP Octal Small Form Factor Pluggable Module. Revision 3.0 OSFPA MSA. Mar. 14, 2020. 99 pages.
[No Author Listed], Photograph of Molex Connector. Oct. 2021. 1 page.
[No Author Listed], Photograph of TE Connector. Oct. 2021. 1 page.
[No Author Listed], Pluggable Form Products. Tyco Electronics. Mar. 5, 2006. 1 page.
[No Author Listed], Pluggable Input/Output Solutions. Tyco Electronics Catalog 1773408-1. Revised Feb. 2009. 40 pages.
[No Author Listed], QSFP Market Evolves, First Products Emerge. Lightwave. Jan. 2, 20082. pp. 1-8. https://www.lightwaveonline.com/home/article/16662662.
[No Author Listed], QSFP-DD Hardware Specification for QSFP Double Density 8X Pluggable Transceiver, Rev 3.0. QSFP-DD MSA. Sep. 19, 2017. 69 pages.
[No Author Listed], QSFP-DD Hardware Specification for QSFP Double Density 8X Pluggable Transceiver, Rev 4.0. QSFP-DD MSA. Sep. 18, 2018. 68 pages.
[No Author Listed], QSFP-DD MSA QSFP-DD Hardware Specification for QSFP Double Density 8X Pluggable Transceiever. Revision 5.0. QSFP-DD-MSA. Jul. 9, 2019. 82 pages.
[No Author Listed], QSFP-DD MSA QSFP-DD Hardware Specification for QSFP Double Density 8X Pluggable Transceiver. Revision 5.1. QSFP-DD MSA. Aug. 7, 2020. 84 pages.
[No Author Listed], QSFP-DD MSA QSFP-DD Specification for QSFP Double Density 8X Pluggable Transceiver. Revision 1.0. QSFP-DD-MSA. Sep. 15, 2016. 69 pages.
[No Author Listed], QSFP-DD Specification for QSFP Double Density 8X Pluggable Transceiver Specification, Rev. 2.0. QSFP-DD MSA. Mar. 13, 2017. 106 pages.
[No Author Listed], RTP Company Introduces “Smart” Plastics for Bluetooth Standard. Press Release. RTP. Jun. 4, 2001. 2 pages.
[No Author Listed], RTP Company Specialty Compounds. RTP. Mar. 2002. 2 pages.
[No Author Listed], RTP Company-EMI/RFI Shielding Compounds (Conductive) Data Sheets. RTP Company. Last accessed Apr. 30, 2021. 4 pages.
[No Author Listed], Samtec Board Interface Guide. Oct. 2002. 253 pages.
[No Author Listed], SFF Committee SFF-8079 Specification for SFP Rate and Application Selection. Revision 1.7. SFF Committee. Feb. 2, 2005. 21 pages.
[No Author Listed], SFF Committee SFF-8089 Specification for SFP (Small Formfactor Pluggable) Rate and Application Codes. Revision 1.3. SFF Committee. Feb. 3, 2005. 18 pages.
[No Author Listed], SFF Committee SFF-8436 Specification for QAFP+ 4X 10 GB/s Pluggable Transceiver. Revision 4.9. SFF Committee. Aug. 31, 2018. 88 pages.
[No Author Listed], SFF Committee SFF-8665 Specification for QSFP+ 28 GB/s 4X Pluggable Transceiver Solution (QSFP28). Revision 1.9. SFF Committee. Jun. 29, 2015. 14 pages.
[No Author Listed], SFF-8075 Specification for PCI Card Version of SFP Cage. Rev 1.0. SFF Committee. Jul. 3, 2001. 11 pages.
[No Author Listed], SFF-8431 Specifications for Enhanced Small Form Factor Pluggable Module SFP+. Revision 4.1. SFF Committee. Jul. 6, 2009. 132 pages.
[No Author Listed], SFF-8432 Specification for SFP+ Module and Cage. Rev 5.1. SFF Committee. Aug. 8, 2012. 18 pages.
[No Author Listed], SFF-8433 Specification for SFP+ Ganged Cage Footprints and Bezel Openings. Rev 0.7. SFF Committee. Jun. 5, 2009. 15 pages.
[No Author Listed], SFF-8477 Specification for Tunable XFP for ITU Frequency Grid Applications. Rev 1.4. SFF Committee. Dec. 4, 2009. 13 pages.
[No Author Listed], SFF-8672 Specification for QSFP+ 4x 28 GB/s Connector (Style B). Revision 1.2. SNIA. Jun. 8, 2018. 21 pages.
[No Author Listed], SFF-8679 Specification for QSFP+ 4X Base Electrical Specification. Rev 1.7. SFF Committee. Aug. 12, 2014. 31 pages.
[No Author Listed], SFF-8682 Specification for QSFP+ 4X Connector. Rev 1.1. SNIA SFF TWG Technology Affiliate. Jun. 8, 2018. 19 pages.
[No Author Listed], Shielding Theory and Design. Laird Technologies. Last accessed Apr. 30, 2021. 1 page.
[No Author Listed], Shielding Theory and Design. Laird Technologies. Last accessed Apr. 30, 2021. 2 pages. URL:web.archive.org/web/20030226182710/http://www.lairdtech.com/catalog/staticdata/shielding theorydesign/std_3.htm.
[No Author Listed], Shielding Theory and Design. Laird Technologies. Last accessed Apr. 30, 2021. 2 pages. URL:web.archive.org/web/20021223144443/http://www.lairdtech.com/catalog/staticdata/shielding theorydesign/std_2.htm.
[No Author Listed], Signal Integrity—Multi-Gigabit Transmission Over Backplane Systems. International Engineering Consortium. 2003;1-8.
[No Author Listed], Signal Integrity Considerations for 10Gbps Transmission over Backplane Systems. DesignCon2001. Teradyne Connections Systems, Inc. 2001. 47 pages.
[No Author Listed], Size 8 High Speed Quadrax and Differential Twinax Contacts for Use in MIL-DTL-38999 Special Subminiature Cylindrical and ARINC 600 Rectangular Connectors. Published May 2008. 10 pages. Retrieved from https://www.peigenesis.com/images/content/news/amphenol_quadrax.pdf.
[No Author Listed], Specification for OSFP Octal Small Form Factor Pluggable Module. Rev 1.0. OSFP MSA. Mar. 17, 2017. 53 pages.
[No Author Listed], TB-2092 GbX Backplane Signal and Power Connector Press-Fit Installation Process. Teradyne. Aug. 8, 2002;1-9.
[No Author Listed], Teradyne Beefs Up High-Speed GbX Connector Platform. EE Times. Sep. 20, 2005. 3 pages.
[No Author Listed], Teradyne Connection Systems Introduces the GbX L-Series Connector. Press Release. Teradyne. Mar. 22, 2004. 5 pages.
[No Author Listed], Teradyne Schematic, Daughtercard Connector Assembly 5 Pair GbX, Drawing No. C-163-5101-500. Nov. 6, 2002. 1 page.
[No Author Listed], Tin as a Coating Material. Brush Wellman Engineered Materials. Jan. 2002;4(2). 2 pages.
[No Author Listed], Two and Four Pair HM-Zd Connectors. Tyco Electronics. Oct. 14, 2003;1-8.
[No Author Listed], Tyco Electronics Schematic, Header Assembly, Right Angle, 4 Pair HMZd, Drawing No. C-1469048. Jan. 10, 2002. 1 page.
[No Author Listed], Tyco Electronics Schematic, Receptacle Assembly, 2 Pair 25mm HMZd, Drawing No. C-1469028. Apr. 24, 2002. 1 page.
[No Author Listed], Tyco Electronics Schematic, Receptacle Assembly, 3 Pair 25mm HMZd, Drawing No. C1469081. May 13, 2002. 1 page.
[No Author Listed], Tyco Electronics Schematic, Receptacle Assembly, 4 Pair HMZd, Drawing No. C1469001. Apr. 23, 2002. 1 page.
[No Author Listed], Tyco Electronics Z-Dok+ Connector. May 23, 2003. pp. 1-15. http://zdok.tycoelectronics.com.
[No Author Listed], Tyco Electronics, SFP System. Small Form-Factor Pluggable (SFP) System. Feb. 2001. 1 page.
[No Author Listed], Typical conductive additives—Conductive Compounds. RTP Company. https://www.rtpcompany.com/products/conductive/additives.htm. Last accessed Apr. 30, 2021. 2 pages.
[No Author Listed], Z-Pack HM-Zd Connector, High Speed Backplane Connectors. Tyco Electronics. Catalog 1773095. 2009;5-44.
[No Author Listed], Z-Pack HM-Zd: Connector Noise Analysis for XAUI Applications. Tyco Electronics. Jul. 9, 2001. 19 pages.
Atkinson et al., High Frequency Electrical Connector, U.S. Appl. No. 15/645,931, filed Jul. 10, 2017.
Beaman, High Performance Mainframe Computer Cables. 1997 Electronic Components and Technology Conference. 1997;911-7.
Chung, Electrical applications of carbon materials. J. of Materials Science. 2004;39:2645-61.
Dahman, Recent Innovations of Inherently Conducting Polymers for Optimal (106-109 Ohm/Sq) ESD Protection Materials. RTD Company. 2001. 8 pages.
Do et al., A Novel Concept Utilizing Conductive Polymers on Power Connectors During Hot Swapping in Live Modular Electronic Systems. IEEE Xplore 2005; downloaded Feb. 18, 2021;340-345.
Eckardt, Co-Injection Charting New Territory and Opening New Markets. Battenfeld GmbH. Journal of Cellular Plastics. 1987;23:555-92.
Elco, Metral® High Bandwidth—A Differential Pair Connector for Applications up to 6 GHz. FCI. Apr. 26, 1999;1-5.
Feller et al., Conductive polymer composites: comparative study of poly(ester)-short carbon fibres and poly(epoxy)-short carbon fibres mechanical and electrical properties. Materials Letters. Feb. 21, 2002;57:64-71.
Fjelstad, Flexible Circuit Technology. Third Edition. BR Publishing, Inc. Sep. 2006. 226 pages. ISBN 0-9667075-0-8.
Getz et al., Understanding and Eliminating EMI in Microcontroller Applications. National Semiconductor Corporation. Aug. 1996. 30 pages.
Grimes et al., A Brief Discussion of EMI Shielding Materials. IEEE. 1993:217-26.
Housden et al., Moulded Interconnect Devices. Prime Faraday Technology Watch. Feb. 2002. 34 pages.
Kirk et al., Connector Configurable for High Performance, U.S. Appl. No. 18/085,093, filed Dec. 20, 2022.
Mcalexander, CV of Joseph C. McAlexander III. Exhibit 1009. 2021. 31 pages.
Mcalexander, Declaration of Joseph C. McAlexander III in Support of Petition for Inter Partes Review of U.S. Pat. No. 10,381,767. Exhibit 1002. Nov. 4, 2021. 85 pages.
Nadolny et al., Optimizing Connector Selection for Gigabit Signal Speeds. Sep. 2000. 5 pages.
Neelakanta, Handbook of Electromagnetic Materials: Monolithic and Composite Versions and Their Applications. CRC. 1995. 246 pages.
Okinaka, Significance of Inclusions in Electroplated Gold Films for Electronics Applications. Gold Bulletin. Aug. 2000;33(4):117-127.
Ott, Noise Reduction Techniques In Electronic Systems. Wiley. Second Edition. 1988. 124 pages.
Patel et al., Designing 3.125 Gbps Backplane System. Teradyne. 2002. 58 pages.
Preusse, Insert Molding vs. Post Molding Assembly Operations. Society of Manufacturing Engineers. 1998. 8 pages.
Reich et al., Microwave Theory and Techniques. Boston Technical Publishers, Inc. 1965;182-91.
Ross, Focus on Interconnect: Backplanes Get Reference Designs. EE Times. Oct. 27, 2003 [last accessed Apr. 30, 2021]. 4 pages.
Ross, GbX Backplane Demonstrator Helps System Designers Test High-Speed Backplanes. EE Times. Jan. 27, 2004 [last accessed May 5, 2021]. 3 pages.
Shi et al, Improving Signal Integrity In Circuit Boards By Incorporating Absorbing Materials. 2001 Proceedings. 51st Electronic Components and Technology Conference, Orlando FL. 2001:1451-56.
Silva et al., Conducting Materials Based on Epoxy/Graphene Nanoplatelet Composites With Microwave Absorbing Properties: Effect of the Processing Conditions and Ionic Liquid. Frontiers in Materials. Jul. 2019;6(156):1-9. doi: 10.3389/fmats.2019.00156.
Tracy, Rev. 3.0 Specification IP (Intellectual Property). Mar. 20, 2020. 8 pages.
Violette et al., Electromagnetic Compatibility Handbook. Van Nostrand Reinhold Company Inc. 1987. 229 pages.
Wagner et al., Recommended Engineering Practice to Enhance the EMI/EMP Immunity of Electric Power Systems. Electric Research and Management, Inc. Dec. 1992. 209 pages.
Weishalla, Smart Plastic for Bluetooth. RTP Imagineering Plastics. Apr. 2001. 7 pages.
White, A Handbook on Electromagnetic Shielding Materials and Performance. Don Whie Consultants. 1998. Second Edition. 77 pages.
White, EMI Control Methodology and Procedures. Don White Consultants, Inc. Third Edition 1982. 22 pages.
Williams et al., Measurement of Transmission and Reflection of Conductive Lossy Polymers at Millimeter-Wave Frequencies. IEEE Transactions on Electromagnetic Compatibility. Aug. 1990;32(3):236-240.
Related Publications (1)
Number Date Country
20230099389 A1 Mar 2023 US
Provisional Applications (1)
Number Date Country
61691901 Aug 2012 US
Continuations (3)
Number Date Country
Parent 17181639 Feb 2021 US
Child 18075313 US
Parent 15823494 Nov 2017 US
Child 17181639 US
Parent 13973921 Aug 2013 US
Child 15823494 US