The present invention may be more fully understood from the following description in conjunction with the appended drawing. In the drawing:
Referring now to
More particularly, the crystal oscillator configuration XOC′, fine frequency adjust stage F and output circuit B correspond generally to elements XOC, F and B of
The fine frequency adjust stage consists of binary weighted capacitors (capacitor pairs) that are switched into the tank through NMOS switches as illustrated in
Referring to
More particularly, a series of binary weighted varactors VS1 is formed with one plate of each varactor being connected to one side (CRYSTAL_IN) of the crystal oscillator configuration. The other plate of the respective varactors is connected to respective control voltage nodes N1, N1, etc. A complementary series of binary weighted varactors VS2 is connected to the other side of the crystal oscillator configuration. Capacitors of the same weight on opposite sides of the crystal oscillator configuration are paired together, and are commonly controlled. Hence, the state of each varactor pair is determined by a voltage applied to the control voltage node. That voltage may be a supply voltage VDD, a reference voltage VSS, or an intermediate control voltage (VOLTAGE_CONTROL) applied by the user. A circuit CTL1 that determines a voltage applied to the control voltage node N1 will be described.
The control voltage node N1 is connected to VDD through a pair of PMOS transistors M1, M2, to VSS through a pair of NMOS transistors M3, M4, and to a voltage control input signal through a pass gate P. An enable signal ENABLE_1X is applied in its true form to one side of the pass gate and to the PMOS transistor M2. The enable signal is inverted by an inverter INV and is applied in its inverted form to the other side of the pass gate P and to the NMOS transistor M3. When the enable signal is asserted, the pass gate is opened, and the VOLTAGE_CONTROL signal is applied to the control voltage node N1. At the same time, the PMOS transistor M2 and the NMOS transistor M3 are rendered non-conducting.
An UNUSED_VARACTOR_STATE signal is applied to the PMOS transistor M1 and to the NMOS transistor M4. Depending on the value of this signal, one of these two transistors is rendered conducting and the other non-conducting. As a result, when the UNUSED_VARACTOR_STATE signal is low, the voltage VDD is applied to the source of the PMOS transistor M1 while the source of the NMOS transistor M4 remains floating. When the UNUSED_VARACTOR_STATE signal is high, the voltage VSS is applied to the source of the NMOS transistor M4 while the drain of the NMOS transistor M1 remains floating. When the enable signal is deasserted, the voltage determined by the UNUSED_VARACTOR_STATE signal is applied to the control voltage node.
Note that UNUSED_VARACTOR_STATE signal is connected in common to all of the varactor pairs. Similarly, the VOLTAGE_CONTROL signal is connected in common to all of the varactor pairs. Hence, if a varactor pair is enabled, it will be controlled by the VOLTAGE_CONTROL signal. If a varactor pair is not enabled, it, along with any and all other varactor pairs not enabled, will be set to either a minimum capacitance state or a maximum capacitance state depending on the UNUSED_VARACTOR_STATE signal.
The VCXO pulling stage may be programmed to achieve a desired pulling gain, independent of the chosen frequency of operation (i.e., independent of the address number of the fine frequency adjust stage). To illustrate, the amount of pulling for a crystal, in parts per million (PPM) is given by the following first order equation:
Pulling=5×105*C1/(C0+Cload) (2)
where C1 and C0 are crystal parameters such as those found in table #1, and Cload is the total capacitance per side of the oscillator.
For the programmable case, it is convenient to decompose (1) into the components that determine the center pull value, P, and the pulling gain dP:
P+dP=5×105*C1/(C0+Cdig+Cdvar) (3)
where:
Cdig=Total fixed capacitance composed of capacitance from parasitics, programmed capacitance from the fine frequency adjust stage, and the minimum capacitance from the programmed VCXO pulling stage; and
Cdvar=the difference of the maximum minus minimum capacitance from the programmed VCXO pulling stage. This value represents the change in pulling, and therefore pulling gain.
As seen in (3), setting Cdvar equal to zero, which implies no varactors are programmed, leads to no change in pulling, and therefore dP is zero. By increasingly programming varators on to the control line, dP will increase in as shown in (3). It is therefore possible to select a center frequency for the oscillator (i.e., pulling), and then adjust dp (pulling gain), in a relatively independent manner.
Referring to
More particularly, the inverter stages INV1, INV2, etc. are connected in common with CRYSTAL_IN as the input signal and CRYSTAL_OUT as the output signal. Separate enable signals ENABLE_1, ENABLE_2, etc. are provided for each inverter and determine whether a particular inverter will be connected or will be disconnected (floating). Taking as example the first inverter INV1, the inverter itself is formed by a PMOS transistor M11 and an NMOS transistor M12 connected in series, drain to drain with the drains also being connected to the output signal CRYSTAL_OUT. The gates of the transistors are connected to the input signal CRYSTAL_IN. The voltage VDD is applied through a PMOS transistor M13 to the source of the PMOS transistor M11. A voltage VSS (ground) is applied through an NMOS transistor M14 to the source of the NMOS transistor M12. An enable signal ENABLE_1 is applied in its true form to the NMOS transistor M14. The enable signal is inverted by an inverter IN and is applied in its inverted form to the PMOS transistor M13. When the enable signal is asserted, the PMOS transistor M13 and the NMOS transistor M14 are both caused to conduct, thereby connecting the inverter INV1 to its supply voltages. When the enable signal is deasserted, both transistors are rendered non-conducting, removing the supply voltages from the inverter INV1.
Referring to
More particularly, if the signal plane containing the crystal signal CRYSTAL_OUT is assumed to be a Metal 1 layer, then that signal line 111 is flanked on both sides for the length of the tunnel by additional lines 113 and 115. A Metal 2 layer overlies the Metal 1 layer. A polysilicon layer underlies the Metal 1 layer. A “floor” 117 of the tunnel is formed within the polysilicon layer. A “roof” 119 of the tunnel is formed within the Metal 2 layer and is connected to ground, The “walls” of the tunnel are completed by forming multiple, minimum spaced contacts 121, 123 between the polysilicon floor feature 117 and the lines 113, 115 and by forming multiple, minimum spaced vias 125, 127 between the lines and Metal 2 roof feature 119. Dielectric material surrounds the CRYSTAL_OUT signal. The resulting structure is comparable to a length of coaxial cable at microscopic scale.
The buffer stage is shown in
More particularly, the inverter is formed by a PMOS transistor M15 and an NMOS transistor M16 connected in series, drain to drain with the drains also being connected to the output signal PH_DET. The gates of the transistors are connected through a coupling capacitor C to the input signal CRYSTAL_OUT. In addition, the input signal is connected to the output signal through a bias resistor R. Since the inverter is AC coupled to the crystal circuit, it is necessary to place a DC bias on the input. The bias resistor holds the inverter at its threshold, such that small input signals cause the input to swing around that threshold, and give symmetric output signals.
As described in the foregoing description, a flexible clock circuit is provided that achieves both economy and high performance. The ability to use a variety of different crystals (without sacrificing performance) tends to minimize crystal cost. The ability to configure a single die as either a PXO or PVCXO (without sacrificing performance) reduces inventory and supply chain cost. Performance is further increased by eliminating troublesome interconnect capacitance leading up to the phase detector of an on-chip PLL.
It will be appreciated by those of ordinary skill in the art that the invention can be embodied in other specific forms without departing from the spirit or essential character thereof. The foregoing description is therefore intended in all respects to be illustrative and not restrictive. The scope of the invention is indicated by the appended claims rather than the foregoing description, and all change with come within the meaning and range of equivalents thereof are intended to be embraced therein.