High-Mobility GeSi PMOS and SIMOX, IEEE Electron Device Letters, vol. 14, No. 11, Nov. 1993; Effects of GE on Material and Electrical Properties of Polycrystalline Si.sub.1 -Ge For TFT Applications; Julie A. Tsai, MIT, 1994 Fall Mtg of The Electrochemical Soc. |
Fabrication of Polycrystalline Si.sub.i- Ge Films on Oxide For Thin-Film Transistors, Julie Tsai, MIT. |
A Low Temperature Silicon-Germanium MOS Thin-Film Transistor Technology for Large-Area Electronics, 1991 IEEE, Tsu-Jae King and Krishna C. Saraswat. |
Applications of Polycrystalline Silicon-Germanium Thin Films in Metal Oxide Semiconductor Technologies; Tsu-Jae King, Mar. 1994, Technical Report No. ICL 94-031. |