Claims
- 1. Apparatus for developing diazo film comprising means defining a developing chamber and including first and second, spaced apart, substantially parallel surfaces, a spacing between the surfaces exceeding a thickness of the film by no more than an amount required to readily move the film through the chamber; means defining an opening for introducing the film into the chamber and for removing it therefrom; means for moving the film through the opening and into and out of the chamber so that an emulsion side of the film passes immediately adjacent one of the surfaces; and means including an elongated shallow groove in the one surface for applying relatively low pressure aqueous ammonia vapor into a space between the film emulsion and the one surface; whereby a rapid, low ammonia pressure vapor developing of the emulsion is effected.
- 2. Apparatus according to claim 1 wherein the opening defining means defines an inlet opening adjacent one end of the chamber and a separate, spaced apart outlet opening adjacent another, opposite end of the chamber; and wherein the moving means comprises means for advancing the film through the inlet opening, the chamber and the outlet opening with the film emulsion passing in close proximity over the one surface.
- 3. Apparatus according to claim 2 wherein the ammonia vapor applying means includes an ammonia vapor discharge opening in the one surface and located proximate the inlet opening.
- 4. Apparatus according to claim 3 wherein said elongated shallow groove is in fluid communication with the discharge opening for distributing the ammonia vapor over a major portion of the width of the film passing through the chamber.
- 5. Apparatus according to claim 4 wherein the ammonia vapor distributing groove comprises a curved groove in the one surface fluidly communicating with the discharge opening and extending transversely to the film movement direction.
- 6. Apparatus according to claim 5 including additional grooves in the one surface extending transversely to the film movement and located downstream of the groove.
- 7. Apparatus according to claim 1 wherein the ammonia vapor applying means includes means for pressurizing the ammonia vapor to no more than a few inches of water column above atmospheric pressure.
- 8. Apparatus according to claim 1 including means for applying a metered amount of the ammonia vapor to the chamber for each fiche passing the chamber.
- 9. Apparatus for developing diazo film comprising:
- first and second, spaced apart substantially parallel platens defining between them a developing chamber, the height of the developing chamber as measured by the spacing between the platens exceeding a thickness of the film by no more than an amount required to readily move the film through the chamber; a
- first roller pair adjacent an intake opening for the chamber and a second roller pair adjacent an outlet opening for the chamber, the roller pairs being disposed in close proximity to the platens;
- spring biased means establishing a seal between the platens and the rollers of the respective roller pair;
- gasket means between the platens sealing the developing chamber from the exterior and extending in the travel direction of the film through the chamber; and
- means including a groove extending transverse of the direction of travel of the film for applying relatively low pressure aqueous ammonia vapor into the developing chamber; whereby the film is rapidly developed in a low pressure ammonia vapor atmosphere while the escape of substantially any ammonia vapor from the chamber is prevented.
- 10. Apparatus according to claim 9 wherein the sealing means comprises a relatively flexible sealing sheet for each roller, the sheet having a length substantially equal to the length of the rollers, and spring means intimately biasing the sheet against the roller.
- 11. Apparatus according to claim 10 wherein the spring biasing means comprises means securing the sheet to the proximate platen.
- 12. Apparatus according to claim 11 wherein the spring biasing means includes a leaf-spring arranged to bias a portion of the sealing sheet distal from the platen into engagement with a periphery of the roller.
- 13. Apparatus for developing diazo film of a given width and thickness and having a substrate carrying an emulsion on a side thereof, the apparatus comprising:
- a housing defining an upstream intake opening and a downstream outlet opening dimensioned to permit passage of the film therethrough;
- first and second platens disposed within the housing having opposing, parallel first and second surfaces, a width slightly greater than the width of the film to permit passage of the film through a space between the surfaces, and being positioned to receive incoming film from the intake opening and to discharge outgoing film to the outlet opening;
- means maintaining a spacing between the surfaces which is only slightly greater than the thickness of the film and which is selected so as to permit the uninhibited passage of the film between the surfaces while minimizing the spacing between the surfaces;
- means for sealing the space from the intake and the outlet openings;
- means for advancing film in a downstream direction from the intake opening, through the space and to the outlet opening with the film emulsion facing the first surface;
- means for heating the first platen to a temperature in the range of between about 150.degree. F. to about 200.degree. F;
- at least one passageway formed in the first platen, in communication with the first surface and located proximate an upstream end thereof;
- means for supplying the passageway with aqueous ammonia; and
- shallow groove means for permitting evaporation of the ammonia therein to effect a discharge of the ammonia from the passageway at only slightly above atmospheric pressure; whereby diazo film advanced through the space is contacted by ammonia vapor discharged from the passageway and causes the formation of a turbulent ammonia vapor layer between at least portions of the emulsion and the first surface to effect the rapid developing of the emulsion at relatively low temperatures and pressures.
- 14. Apparatus according to claim 13 including elongated transverse groove means in the first platen for distributing ammonia vapor discharged by the passageway over substantially the full width of the corresponding platen surface.
- 15. Apparatus according to claim 14 wherein the distribution means comprises a curved groove formed in the surface and communicating with the passageway.
- 16. Apparatus according to claim 15 wherein the groove has a longitudinal shape which is convex in the direction of film movement.
- 17. Apparatus according to claim 16 including a plurality of additional grooves in the first surface, downstream of the first mentioned groove, and also extending transversely across the width of the surface.
- 18. Apparatus according to claim 13 wherein the ammonia supplying means comprises pump means in fluid communication with a source of liquid ammonia and the passageway; means for sensing when a film approaches the space between the surfaces; and means operatively coupled with the sensing means and with the pump means for intermittently energizing the latter to supply a metered amount of liquid ammonia to the passageway for each film to be developed.
- 19. Apparatus according to claim 13, wherein the sealing means comprises sets of cooperating, elongate, opposite rollers disposed adjacent and parallel to the openings for receiving incoming film and discharging outgoing film, the rollers having resilient surfaces in mutual contact; low friction strip means sealingly disposed in corresponding grooves of the housing and arranged parallel to the rollers; and means resiliently biasing the strip means against the rollers so as to form a seal therewith and prevent the escape of ammonia vapors through the opening to the exterior.
- 20. Apparatus accoring to claim 19 including third and fourth platens defining a gap between them which is aligned with the space, the third and fourth platens being disposed between the first and second platens and the intake opening; and means for heating at least one of the third and fourth platens to effect a preheating of the film before it enters said space.
- 21. Apparatus according to claim 13 wherein the housing includes side walls extending beyond the first and second platens; a cover placed over the side walls and the first and second platens to confine the latter to the housing; and spring means disposed between the cover and an adjacent platen for biasing the latter against the other platen.
- 22. Apparatus according to claim 21 wherein the spring means comprises a plurality of angularly inclined leaf-spring means having an end secured to the cover and extending over a major portion of the width of the housing to effect drainage of condensed ammonia from the cover onto the platen and to prevent such condensed ammonia from contacting film passing through the housing.
RELATED APPLICATIONS
This is a Continuation-in-Part Application of the co-pending patent application bearing Ser. No. 862,720, filed Dec. 27, 1977, now U.S. Pat. No. 4,150,992, issued Apr. 24, 1979 and entitled HIGH SPEED, LOW TEMPERATURE AND PRESSURE DIAZO PROCESSING METHOD AND APPARATUS.
US Referenced Citations (15)
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
862720 |
Dec 1977 |
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