High-temperature alloy

Information

  • Patent Grant
  • 6676897
  • Patent Number
    6,676,897
  • Date Filed
    Wednesday, October 3, 2001
    23 years ago
  • Date Issued
    Tuesday, January 13, 2004
    21 years ago
Abstract
The invention relates to a high-temperature alloy for a mechanically highly stressed component of a thermal machine based on doped TiAl and a method to improve a mechanical property of the alloy. The alloy has the following composition (in atomic %): 44.5 to <46 Al, 1-4 W, 0.1-1.5 Si, 0.0001-4 B, and the rest Ti and contaminations due to the manufacturing process. The alloy is characterized by improved heat resistance and ductility at high temperatures, and at the same time good oxidation and corrosion resistance.
Description




FIELD OF THE INVENTION




The invention relates to a high-temperature alloy for thermal machines based on intermetallic compounds that are suitable for waste-wax casting and directional solidification and that supplement conventional nickel-based super alloys.




It concerns an improvement of alloys based on an intermetallic compound of the titanium aluminide TiAl type with other additives that increase strength, toughness, and ductility as well as oxidation and creep resistance.




BACKGROUND OF THE INVENTION




Intermetallic compounds of titanium with aluminum have several interesting properties that make them attractive as construction materials in the intermediate and higher temperature range. This includes their lower density than supper alloys. However, their technical utility in the present form is adversely affected by their brittleness. This can be improved by specific additives.




It has been suggested, for example, to add alternatively Cr, B, V, Si, Ta as well as Mn, W, Mo, Nb, Hf or (Ni+Si) to reduce brittleness on the one hand and to achieve the highest possible strength in the temperature range of interest between room temperature and operating temperature on the other hand. A sufficiently high oxidation resistance also has been desired. These objectives were only partially realized, however.




Especially the heat resistance of known aluminides is falling short of desired values. In accordance with the relatively low fusion point of these materials, the strength, in particular creep resistance, in the upper temperature is insufficient.




U.S. Pat No. 3,203,794 discloses a TiAl high-temperature alloy with 37 wt. % Al, 1 wt. % Zr, and the rest Ti. The relatively small addition of Zr results in this alloy having properties comparable to pure TiAl.




EP-A1-0 363 598 discloses a high-temperature alloy based on TiAl with additives of Si and Nb, while EP-A1-0 405 134 discloses a high-temperature alloy based on TiAl with additives of Si and Cr.




However, these known, modified intermetallic compounds do not fulfill the technical requirements.




In order to improve the properties, EP-B1-0 455 005 therefore disclosed a high-temperature alloy based on doped TiAl and having the following chemical composition:






Ti


x


E


1




y


Me


z


Al


1−


(x+Y+z), whereby






E


1


=B, Ge or Si and Me=Cr, Mn, Nb, Pd, Ta, W, Y, Zr, and the following applies:




0.46≦x≦0.54,




0.001≦y<0.015 for E


1


=Si and Me=W




0.001≦y≦0.015 for E


1


=Ge and Me=Cr, Ta, W




0<y≦0.02 for E


1


=Ge and Me=Pd, Y, Zr




0.0001≦y≦0.01 for E


1


=B




0.01<z≦0.04, if Me=single element,




0.01<z≦0.08, if Me=two or more single elements




and 0.46≦(x+y+z)<0.54.




By adding W, Cr, Mn, Nb, Y, Zr, Pd to the alloy, a higher hardness and strength is achieved than with the TiAl base alloy. The addition of B increases ductility. Si increases oxidation resistance. The range of application for these modified titanium aluminides extends to temperatures between 600° C. and 1000° C.




Another improvement, especially of creep resistance and oxidation resistance, in the above described alloy is achieved if E


1


is in each case a combination of two elements from the group B, Si, and Ge (DE 199 33 633.4).




SUMMARY OF THE INVENTION




A high-temperature alloy for a mechanically highly stressed component of a thermal machine has the following composition (in atomic %) based on doped TiAl:




44.5 to<46 Al,




1-4 W,




0.1-1.5 Si,




0.0001-4 B, and




Rest Ti and contaminations due to the manufacturing process.




The alloy has an Al content that is lower than in known alloys on the one hand, and, on the other hand, a significantly higher B content.




In one aspect, the combination of the mentioned alloy elements, in particular, however, the higher B contents, makes it possible to produce, on the one hand, a very fine grain both for thin and large cross-sections, and in this way to increase the strength and creep resistance and on the other hand achieve a good oxidation resistance. The reduction of the Al content in comparison to the known state of the art increases strength, but at the same time promotes a larger grain size. Boron in contrast stabilizes the grain limits, i.e., higher boron levels reduce the amount of grain enlargement.




In one embodiment, the high-temperature alloy has the following composition (in atomic %):




44.5 to<46 Al,




1-3 W,




0.4-1 Si,




1-4 B, and




Rest Ti and contaminations due to the manufacturing process.




In a further embodiment, the high-temperature alloy has the following composition (in atomic %):




45 Al,




2 W,




0.5 Si,




2 B, and




Rest Ti and contaminations due to the manufacturing process.











BRIEF DESCRIPTION OF DRAWINGS




Preferred embodiments of the invention are disclosed in the following description and illustrated in the accompanying drawings, in which:





FIG. 1

shows the structure of an alloy L


1


according to the invention with the following composition: Al 45 atomic %, W 2 atomic %, Si 0.4 atomic %, B 1.8 atomic %, rest Ti.





FIG. 2

shows the structure of an alloy L


2


according to the invention with the following composition: Al 45 atomic %, W 2 atomic %, Si 0.47 atomic %, B 2.5 atomic %, rest Ti.





FIG. 3

shows the structure of an alloy L


3


according to the invention with the following composition: Al 45 atomic %, W 1.9 atomic %, Si 0.46 atomic %, B 3.5 atomic %, rest Ti.





FIG. 4

shows the structure of an alloy L


4


according to the invention with the following composition: Al 44.9 atomic %, W 1.9 atomic %, Si 0.46 atomic %, B 4 atomic %, rest Ti.





FIG. 5

shows the structure of a control alloy V


1


with the following composition: Al 46 atomic %, W 2 atomic %, Si 0.48 atomic %, B 0.7 atomic %, rest Ti.





FIG. 6

shows the structure of a control alloy V


2


with the following composition: Al 47 atomic %, W 2 atomic %, Si 0.5 atomic %, rest Ti.





FIG. 7

shows an illustration of the hardness in relation to the boron content.











DETAILED DESCRIPTION OF THE INVENTION




The invention improves a TiAl doped high-temperature alloy. It is based on a light alloy with improved heat resistance and ductility at high temperatures (in the range from 600 to 1000° C.) and good oxidation and corrosion resistance that is well-suited for directional solidification or waste-wax casting and essentially consists of an intermetallic compound with a high fusion point.




The following explains the invention in more detail, using several exemplary embodiments and

FIGS. 1

to


7


.




In an arc furnace, under argon as a protective gas, alloys with the following composition (numbers in atomic %) were melted, whereby L


1


, L


2


, L


3


, and L


4


stand for alloys according to the invention, and V


1


and V


2


are control alloys:























Alloy




Ti




Al




W




Si




B































L1




rest




45




2




0.40




1.8







L2




rest




45




2




0.47




2.5







L3




rest




45




1.9




0.46




3.5







L4




rest




44.9




1.9




0.46




4.0







V1




rest




46




2




0.48




0.7







V2




rest




47




2




0.50




0















The starting materials are the individual elements with a purity of 99.99%. The molten mass was cast to form a blank with a diameter of approximately 50 mm and a height of approximately 70 mm. These blanks were again melted under protective gas, and, again under protective gas, were forced to solidify in the form of rods with a diameter of approximately 9 mm and a length of approximately 70 mm. These rods then underwent HIP (HOT ISOSTATIC PRESSING) and a thermal treatment, and were then processed into tensile test samples. The HIP treatment was performed for 4 hours at a temperature of 1,260° C. and a pressure of 172 MPa. The heat treatment was performed under protective gas with the following parameters: 1,350° C./1 h+1,000° C./6 h.




Further improvement of the mechanical properties by optimizing the thermal treatment is possible, as is an improvement by directional solidification, for which such alloys are particularly suitable.




The addition of W results in an increase in strength over pure TiAl alloys, but to a reduction in ductility. B increases ductility, and Si the oxidation resistance.





FIGS. 1

to


6


show the structure of alloys L


1


, L


2


, L


3


, L


4


, as well as of V


1


and V


2


.




The structure of the alloys according to the invention L


1


, L


2


, L


3


, and L


4


(

FIG. 1

to


4


) has a significantly smaller grain than the structure of control alloy V


1


(

FIG. 5

) that is alloyed with lower boron contents, or the alloy V


2


that does not contain any boron.





FIG. 7

shows a diagram of the hardness values in relation to the boron content for the alloys according to the invention L


1


, L


2


, and L


3


, as well as for the control alloys V


1


and V


2


. Alloys L


1


, L


2


, and L


3


hereby show a greater hardness than the control alloys. The alloy L


1


according to the invention with 1.8 atomic % of boron shows particularly good hardness values.




These excellent properties can be attributed to the higher concentration of the alloy element B. By adding 2 atomic % of B, practically all of the ductility losses due to the W are compensated. No higher additions than 4 atomic % of B are necessary.




The range of use for the modified titanium aluminides advantageously extends over a temperature range between 600 and 1,000° C.




Naturally, this invention is not limited to the shown exemplary embodiments.



Claims
  • 1. A high-temperature alloy for a mechanically highly stressed component of a thermal machine based on doped TiAl, the alloy consisting eventually of (in atomic %):44.5 to<46 Al; 1-3 W; 0.4-1 Si; 1-4 B; and balance Ti and contaminations due to the manufacturing process.
  • 2. The high-temperature alloy as claimed in claim 1, wherein the alloy has a Vickers hardness of greater than 350.
  • 3. The high-temperature alloy as claimed in claim 1, wherein the alloy consist essentially of (in atomic %):45 Al; 2 W; 0.5 Si; 2 B; and balance Ti and contaminations due to the manufacturing process.
  • 4. The high-temperature alloy as claimed in claim 1, wherein the alloy consist essentially of (in atomic %):44.5 to<46 at % Al; 1.9-2 at % W; 0.4-0.47 at % Si; 1.8-4.0 at % B; and balance Ti.
  • 5. A high-temperature alloy for a mechanically highly stressed component of a thermal machine based on doped TiAl, the alloy comprising (in atomic %):45 Al; 2 W; 0.5 Si; 2 B; and balance Ti and contaminations due to the manufacturing process.
  • 6. A high-temperature alloy based on doped TiAl, the alloy comprising:44.5 to<46 at % Al; 1.9-2 at % W; 0.4-0.47 at % Si; 1.8-4.0 at % B; and balance Ti.
  • 7. The alloy of claim 6, wherein the alloy has a Vickers hardness of greater than 350.
Priority Claims (1)
Number Date Country Kind
100 49 026 Oct 2000 DE
US Referenced Citations (11)
Number Name Date Kind
3203794 Jaffee et al. Aug 1965 A
4842820 Huang et al. Jun 1989 A
5207982 Nazmy et al. May 1993 A
5226985 Kim et al. Jul 1993 A
5286443 Nazmy et al. Feb 1994 A
5328530 Semiatin et al. Jul 1994 A
5342577 Nazmy et al. Aug 1994 A
5370839 Masahashi et al. Dec 1994 A
H1659 Semiatin et al. Jul 1997 H
5653828 Zhao et al. Aug 1997 A
5908516 Nguyen-Dinh Jun 1999 A
Foreign Referenced Citations (5)
Number Date Country
197 56 354 Jun 1999 DE
199 33 633 Jan 2001 DE
0 363 598 Apr 1990 EP
0 405 134 Jan 1991 EP
0 455 005 Nov 1991 EP