This disclosure is directed to purge systems for use with chiller systems, particularly purge systems recovering working fluid using an adsorbent and/or a membrane.
Low-pressure chiller systems include refrigeration circuits that operate at pressures that are below atmospheric pressure. Accordingly, any leaks in the circuit of such chillers allow non-condensable gases to enter the circuit and mix with the working fluid, reducing effectiveness of the circuit. Vapor can be expelled from the system to purge the non-condensable gases from the circuit. Existing processes include recovery of the working fluid by thermal distillation.
This disclosure is directed to purge systems for use with chiller systems, particularly purge systems recovering working fluid using an adsorbent and/or a membrane.
Using either an adsorbent to which working fluid adsorbs, which is regenerated by vacuum, and/or a membrane selectively permeable to the working fluid to separate working fluid from the non-condensables can allow the separation to improved. Further, this improved separation can be performed at temperatures that will not lead to degradation of modern, low-global warming potential (GWP) refrigerants.
A pump of the purge system can be included upstream of the separation chamber. When the separation chamber contains an adsorbent, the pressurization of the purge gas flow by the pump can improve adsorption. When the separation chamber contains a membrane, the pressurization of the purge gas flow by the pump can result in more of the working fluid permeating the membrane. Further, this pressure can drive both the non-condensables to be purged and the recovered working fluid through the system, reducing the number of required pumps in some configurations.
The efficiency of the purge can be determined in such systems based on a mathematical model using a pressure relationship. The pressure relationship can be expressed as a ratio, removing variance with factors such as ambient temperature. This control allows non-condensables to be exhausted from the purge system at a rate that prevents excessive amounts of working fluid from being expelled with the non-condensable gasses.
In an embodiment, a purge system for a heating, ventilation, air conditioning, and refrigeration (HVACR) system includes a purge gas inlet configured to receive a mixture including one or more working fluids and one or more non-condensable gases, a first pump, and one or more separation chambers. Each separation chamber contains adsorbent material. Each separation chamber is configured to receive the mixture through a chamber valve. The purge system further includes an exhaust port configured to release gas into an ambient environment. The exhaust port is in fluid communication with the one or more separation chambers by way of an exhaust valve. The purge system includes a working fluid return line in communication with at least one of the one or more separation chambers. The working fluid return line is configured to be connected to the HVACR system. The purge system further includes a second pump. The second pump is in communication with at least one of the one or more separation chambers by way of a return line valve and the working fluid return line.
In an embodiment, the adsorbent material is configured to adsorb the one or more working fluids when the mixture is provided to the separation chamber through the chamber valve. In an embodiment, the adsorbent material is configured to release the one or more working fluids when the chamber valve and the exhaust valve are closed, the return line valve is open, and the second pump is in operation.
In an embodiment, the first pump is between the purge gas inlet and the one or more separation chambers. In an embodiment, the first pump is between the one or more separation chambers and the exhaust port.
In an embodiment, the purge system further includes a plurality of temperature sensors configured to measure temperatures at different points in the separation chamber and a controller configured to determine a temperature difference between temperature measurements from at least two of the plurality of temperature sensors and control the chamber valve, the exhaust valve, and the second pump based on the temperature difference.
In an embodiment, the purge system further includes a sensor configured to measure a weight of the separation chamber and a controller configured to control the chamber valve, the exhaust valve, and the second pump based on the weight of the separation chamber.
In an embodiment, the purge system further includes a pressure sensor configured to measure a pressure within the separation chamber, and a controller configured to control the chamber valve, the exhaust valve, and the second pump based on the pressure within the separation chamber.
In an embodiment, the pressure relationship is a ratio between the first pressure and the second pressure.
In an embodiment, determining operation of the discharge valve comprises comparing the pressure relationship to a threshold value.
In an embodiment, a heating, ventilation, air conditioning, and refrigeration (HVACR) system includes a refrigeration circuit. The refrigeration circuit includes a compressor, a condenser, an expander, and an evaporator. The refrigeration circuit configured to circulate one or more working fluids. The HVACR system further includes a purge system including a purge gas inlet configured to receive a mixture including the one or more working fluids and one or more non-condensable gases, a first pump, and one or more separation chambers. Each separation chamber contains adsorbent material. Each separation chamber is configured to receive the mixture through a chamber valve. The purge system further includes an exhaust port configured to release gas into an ambient environment. The exhaust port is in fluid communication the one or more separation chambers by way of an exhaust valve. The purge system also includes a working fluid return line in communication with at least one of the one or more separation chambers. The working fluid return line is configured to be connected to the HVACR system. The purge system further includes a second pump. The second pump is in communication with at least one of the one or more separation chambers by way of a return line valve and the working fluid return line.
In an embodiment, the purge gas inlet is in fluid communication with the condenser.
In an embodiment, the return line is in fluid communication with the evaporator.
In an embodiment, the working fluid circuit circulates the one or more working fluids at pressures less than atmospheric pressure.
In an embodiment, the one or more working fluids are selected from the group consisting of: 1-chloro-3,3,3 trifluoropropene, 1-chloro-3,3,3 trifluoropropene (E), 1-chloro-3,3,3 trifluoropropene (Z), 2-chloro-3,3,3 trifluoropropene, 1,1,dichloro-3,3,3 trifluoropropene, 1,2 dichloro-3,3,3 trifluoropropene (E), 1,2 dichloro-3,3,3 trifluoropropene (Z), 1,3,3,3 tetrafluoropropene (E), 1,3,3,3 tetrafluoropropene (Z), 2,3,3,3, tetrafluoropropene, 1,1,2 trichloro-3,3,3 trifluoropropene, 1,2 dichloroethylene (E), 1,2 dichloroethylene (Z), 1,1 dichloroethylene, 1,1,1,4,4,4 hexafluorobutene (Z), 1,1,1,4,4,4 hexafluorobutene (E), 1,1,3,3 tetrafluoropropane, 1,1,1,2,3 pentafluoropropane, 1,1,2,3,3 pentafluoropropane, 1,1,1,3,3 pentafluoropropane, 1,1,1,2,2 pentafluoropropane, 1,1,1,2,2,3 hexafluoropropane, 1,1,1,2,3,3 hexafluoropropane, 1,1,1,3,3,3 hexafluoropropane, isopentane, pentane, cyclopentane, 1,1 difluoroethane, 1,2-difluoroethane, difluoromethane, 1,1,1,2 tetrafluoroethane, 1,1 difluoroethene, 1,2 difluoroethene (E), 1,2 difluorethene (Z), and 2,2-dichloro-1,1,1-trifluoroethane and combinations thereof.
In an embodiment, a method of purging a heating, ventilation, air conditioning, and refrigeration (HVACR) system includes receiving a mixture of one or more working fluids and one or more non-condensable gases in a separation chamber, the separation chamber containing an adsorbent material and adsorbing at least some of the one or more working fluids to the adsorbent material. After adsorbing at least some of the one or more working fluids to the adsorbent material, the method includes exhausting the mixture through an exhaust port downstream of the separation chamber and in fluid communication with the separation chamber. The method further includes recovering the at least some of the one or more working fluids adsorbed by the adsorbent material by closing a first valve upstream of the separation chamber, closing a second valve between the separation chamber and the exhaust port, and operating a recovery pump to reduce a pressure within the separation chamber. The recovery pump is in fluid communication with the separation chamber and with a return line, the return line in fluid communication with the HVACR system.
In an embodiment, the one or more working fluids are selected from the group consisting of: 1-chloro-3,3,3 trifluoropropene, 1-chloro-3,3,3 trifluoropropene (E), 1-chloro-3,3,3 trifluoropropene (Z), 2-chloro-3,3,3 trifluoropropene, 1,1,dichloro-3,3,3 trifluoropropene, 1,2 dichloro-3,3,3 trifluoropropene (E), 1,2 dichloro-3,3,3 trifluoropropene (Z), 1,3,3,3 tetrafluoropropene (E), 1,3,3,3 tetrafluoropropene (Z), 2,3,3,3, tetrafluoropropene, 1,1,2 trichloro-3,3,3 trifluoropropene, 1,2 dichloroethylene (E), 1,2 dichloroethylene (Z), 1,1 dichloroethylene, 1,1,1,4,4,4 hexafluorobutene (Z), 1,1,1,4,4,4 hexafluorobutene (E), 1,1,3,3 tetrafluoropropane, 1,1,1,2,3 pentafluoropropane, 1,1,2,3,3 pentafluoropropane, 1,1,1,3,3 pentafluoropropane, 1,1,1,2,2 pentafluoropropane, 1,1,1,2,2,3 hexafluoropropane, 1,1,1,2,3,3 hexafluoropropane, 1,1,1,3,3,3 hexafluoropropane, isopentane, pentane, cyclopentane, 1,1 difluoroethane, 1,2-difluoroethane, difluoromethane, 1,1,1,2 tetrafluoroethane, 1,1 difluoroethene, 1,2 difluoroethene (E), 1,2 difluorethene (Z), and 2,2-dichloro-1,1,1-trifluoroethane and combinations thereof.
In an embodiment, a temperature of the mixture is below approximately 100° C. throughout the method and a temperature during the regeneration of the adsorbent is below approximately 100° C. throughout the recovering of the at least some of the one or more working fluids.
In an embodiment, the method further includes determining a change in temperature between two or more points within the separation chamber and determining when to recover the some of the at least one or more working fluids based on the change in temperature between the two or more points within the separation chamber.
In an embodiment, the method further includes determining a mass of the separation chamber and determining, based on the mass of the separation chamber, when to recover the some of the at least one or more working fluids based on the change in temperature between the two or more points within the separation chamber.
In an embodiment, the method further includes measuring a pressure within the separation chamber when recovering the at least some of the at least one or more working fluids, and based on the pressure, ending the recovering of the at least one or more working fluids.
In an embodiment, the method further includes pressurizing the separation chamber with the mixture using a pump located upstream of the separation chamber.
In an embodiment, a purge system for a heating, ventilation, air conditioning, and refrigeration (HVACR) system includes a purge gas inlet configured to receive a mixture including one or more working fluids and one or more non-condensable gases, a pump, and one or more separation chambers. Each separation chamber includes a membrane, the membrane dividing the separation chamber into a first side and a second side. The purge gas inlet is in fluid communication with the first side of the separation chamber. The membrane is configured to reject the one or more non-condensable gases. The purge system includes an exhaust port configured to release gas into an ambient environment. The exhaust port is in fluid communication with the first sides of the one or more separation chambers. The purge system further includes a working fluid return line in communication with at least one of the second sides of the one or more separation chambers, the working fluid return line configured to be connected to the HVACR system.
In an embodiment, the membrane in each of the one or more separation chambers is configured to reject the one or more non-condensable gases based on the solubility of the one or more non-condensable gases. In an embodiment, the membrane in each of the one or more separation chambers is coiled such that it has a cross-section having a spiral shape.
In an embodiment, the pump is between the purge gas inlet and the one or more separation chambers. In an embodiment, the pump is between the one or more separation chambers and the exhaust port, and the purge system further comprises a second pump, the second pump located along the working fluid return line.
In an embodiment, the purge system further includes a first pressure sensor between the purge gas inlet and the one or more separation chambers, and a second pressure sensor between the one or more separation chambers and the exhaust port.
In an embodiment, the purge system further includes a discharge valve configured to control flow out of the exhaust port, and a controller. The controller is configured to receive a first pressure from the first pressure sensor, receive a second pressure from the second pressure sensor, determine a pressure relationship, and determine operation of the discharge valve based on the pressure relationship.
In an embodiment, the purge system further includes a first temperature sensor between the purge gas inlet and the one or more separation chambers, and a second temperature sensor located between the one or more separation chambers and the exhaust port. The controller is further configured to determine a temperature adjustment based on one or more of a first temperature from the first temperature sensor and a second temperature from the second temperature sensor, and adjust one or more of the first pressure, the second pressure, or the pressure relationship based on the temperature adjustment. In an embodiment, the pressure relationship is a ratio between the first pressure and the second pressure. In an embodiment, determining operation of the discharge valve comprises comparing the pressure relationship to a threshold value.
In an embodiment, a heating, ventilation, air conditioning, and refrigeration (HVACR) system includes a refrigeration circuit, comprising a compressor, a condenser, an expander, and an evaporator, the refrigeration circuit configured to circulate one or more working fluids and a purge system. The purge system includes a purge gas inlet configured to receive a mixture including the one or more working fluids and one or more non-condensable gases from the refrigeration circuit, a pump, and one or more separation chambers. Each separation chamber includes a membrane, the membrane dividing the separation chamber into a first side and a second side. The purge gas inlet is in fluid communication with the first side of the separation chamber. The membrane is configured to reject the one or more non-condensable gases. The purge system further includes an exhaust port configured to release gas into an ambient environment. The exhaust port is in fluid communication with the first sides of the one or more separation chambers. The purge system further includes a working fluid return line in communication with at least one of the second sides of the one or more separation chambers. The working fluid return line is configured to be connected to the refrigeration circuit.
In an embodiment, the purge gas inlet is in fluid communication with the condenser.
In an embodiment, the return line is in fluid communication with the evaporator.
In an embodiment, the working fluid circuit is configured to circulate the one or more working fluids at pressures less than atmospheric pressure.
In an embodiment, the one or more working fluids are selected from the group consisting of: 1-chloro-3,3,3 trifluoropropene, 1-chloro-3,3,3 trifluoropropene (E), 1-chloro-3,3,3 trifluoropropene (Z), 2-chloro-3,3,3 trifluoropropene, 1,1,dichloro-3,3,3 trifluoropropene, 1,2 dichloro-3,3,3 trifluoropropene (E), 1,2 dichloro-3,3,3 trifluoropropene (Z), 1,3,3,3 tetrafluoropropene (E), 1,3,3,3 tetrafluoropropene (Z), 2,3,3,3, tetrafluoropropene, 1,1,2 trichloro-3,3,3 trifluoropropene, 1,2 dichloroethylene (E), 1,2 dichloroethylene (Z), 1,1 dichloroethylene, 1,1,1,4,4,4 hexafluorobutene (Z), 1,1,1,4,4,4 hexafluorobutene (E), 1,1,3,3 tetrafluoropropane, 1,1,1,2,3 pentafluoropropane, 1,1,2,3,3 pentafluoropropane, 1,1,1,3,3 pentafluoropropane, 1,1,1,2,2 pentafluoropropane, 1,1,1,2,2,3 hexafluoropropane, 1,1,1,2,3,3 hexafluoropropane, 1,1,1,3,3,3 hexafluoropropane, isopentane, pentane, cyclopentane, 1,1 difluoroethane, 1,2-difluoroethane, difluoromethane, 1,1,1,2 tetrafluoroethane, 1,1 difluoroethene, 1,2 difluoroethene (E), 1,2 difluorethene (Z), and 2,2-dichloro-1,1,1-trifluoroethane and combinations thereof.
In an embodiment, a method of purging a heating, ventilation, air conditioning, and refrigeration (HVACR) system includes receiving a mixture of one or more working fluids and one or more non-condensable gases in a separation chamber. The separation chamber includes a membrane dividing the separation chamber into a first side and a second side. The mixture is received on the first side of the separation chamber. The method further includes passing at least some of the one or more working fluids through the membrane, from the first side of the separation chamber to the second side of the separation chamber. After passing at least some of the one or more working fluids through the membrane, the method includes exhausting the mixture through an exhaust port downstream of the separation chamber and in fluid communication with the first side of the separation chamber. The method further includes providing fluid communication between the second side of the separation chamber and the HVACR system to return at least some of the one or more working fluids to the HVACR system.
In an embodiment, the one or more working fluids are selected from the group consisting of: 1-chloro-3,3,3 trifluoropropene, 1-chloro-3,3,3 trifluoropropene (E), 1-chloro-3,3,3 trifluoropropene (Z), 2-chloro-3,3,3 trifluoropropene, 1,1,dichloro-3,3,3 trifluoropropene, 1,2 dichloro-3,3,3 trifluoropropene (E), 1,2 dichloro-3,3,3 trifluoropropene (Z), 1,3,3,3 tetrafluoropropene (E), 1,3,3,3 tetrafluoropropene (Z), 2,3,3,3, tetrafluoropropene, 1,1,2 trichloro-3,3,3 trifluoropropene, 1,2 dichloroethylene (E), 1,2 dichloroethylene (Z), 1,1 dichloroethylene, 1,1,1,4,4,4 hexafluorobutene (Z), 1,1,1,4,4,4 hexafluorobutene (E), 1,1,3,3 tetrafluoropropane, 1,1,1,2,3 pentafluoropropane, 1,1,2,3,3 pentafluoropropane, 1,1,1,3,3 pentafluoropropane, 1,1,1,2,2 pentafluoropropane, 1,1,1,2,2,3 hexafluoropropane, 1,1,1,2,3,3 hexafluoropropane, 1,1,1,3,3,3 hexafluoropropane, isopentane, pentane, cyclopentane, 1,1 difluoroethane, 1,2-difluoroethane, difluoromethane, 1,1,1,2 tetrafluoroethane, 1,1 difluoroethene, 1,2 difluoroethene (E), 1,2 difluorethene (Z), and 2,2-dichloro-1,1,1-trifluoroethane and combinations thereof.
In an embodiment, a temperature of the mixture is below approximately 100° C. throughout the method and a temperature of the one or more working fluids passed through the membrane is below approximately 100° C. throughout the method.
In an embodiment, the method further includes determining a first pressure upstream of the separation chamber, determining a second pressure downstream of the separation chamber, and wherein exhausting the mixture comprises opening a discharge valve controlling flow through the exhaust port when a difference between the first pressure and the second pressure exceeds a threshold value.
In an embodiment, the method further includes pressurizing the separation chamber with the mixture using a pump located upstream of the separation chamber.
This disclosure is directed to purge systems for use with chiller systems, particularly purge systems recovering working fluid using an adsorbent and/or a membrane.
HVACR circuit 100 can be, for example, a chiller in a chilled-water HVACR system, or any other suitable refrigeration circuit in need of purging non-condensables from a working fluid used therein. The working fluid can be any suitable fluid for use in an HVACR circuit. The working fluid can include condensable fluids. The working fluid circulated in HVACR circuit 100 can include a low global warming potential (low-GWP) refrigerant. The working fluid circulated in HVACR circuit 100 can include, as non-limiting examples, one or more of: 1-chloro-3,3,3 trifluoropropene, 1-chloro-3,3,3 trifluoropropene (E), 1-chloro-3,3,3 trifluoropropene (Z), 2-chloro-3,3,3 trifluoropropene, 1,1, dichloro-3,3,3 trifluoropropene, 1,2 dichloro-3,3,3 trifluoropropene (E), 1,2 dichloro-3,3,3 trifluoropropene (Z), 1,3,3,3 tetrafluoropropene (E), 1,3,3,3 tetrafluoropropene (Z), 2,3,3,3, tetrafluoropropene, 1,1,2 trichloro-3,3,3 trifluoropropene, 1,2 dichloroethylene (E), 1,2 dichloroethylene (Z), 1,1 dichloroethylene, 1,1,1,4,4,4 hexafluorobutene (Z), 1,1,1,4,4,4 hexafluorobutene (E), 1,1,3,3 tetrafluoropropane, 1,1,1,2,3 pentafluoropropane, 1,1,2,3,3 pentafluoropropane, 1,1,1,3,3 pentafluoropropane, 1,1,1,2,2 pentafluoropropane, 1,1,1,2,2,3 hexafluoropropane, 1,1,1,2,3,3 hexafluoropropane, 1,1,1,3,3,3 hexafluoropropane, isopentane, pentane, cyclopentane, 1,1 difluoroethane, 1,2-difluoroethane, difluoromethane, 1,1,1,2 tetrafluoroethane, 1,1 difluoroethene, 1,2 difluoroethene (E), 1,2 difluorethene (Z), and 2,2-dichloro-1,1,1-trifluoroethane and combinations thereof, or the like. In an embodiment, HVACR circuit 100 can be a low-pressure HVACR circuit, where the pressure of the working fluid is less than atmospheric pressure in at least a portion of the HAVCR circuit 100 during operation. In an embodiment, working fluid at condenser 104 can be at a pressure that is above atmospheric pressure.
Compressor 102 is a compressor configured to compress the fluid within HVACR circuit 100 from a relatively lower pressure at a suction of the compressor to a relatively higher pressure at discharge from the compressor 102. Compressor 102 can be any suitable type of compressor for compressing a working fluid in an HVACR circuit. The compressor 102 can be, as non-limiting examples, a screw compressor, a scroll compressor, a centrifugal compressor, or the like. In an embodiment, the compressor 102 is a screw compressor.
Condenser 104 can be a heat exchanger that receives compressed working fluid from compressor 102 and allows the compressed working fluid to release heat, for example to an ambient environment. In an embodiment, condenser 104 can be where working fluid is provided to a purge system 110. In an embodiment, condenser 104 can receive working fluid that has been recovered from purge system 110.
Expander 106 reduces the pressure of a fluid to expand the fluid. Expander 106 can be any suitable structure for expansion of a fluid, such as an expansion valve, one or more expansion orifices, or the like.
Evaporator 108 can be a heat exchanger receiving the working fluid after it has been expanded by expander 106. At evaporator 108, the working fluid absorbs heat, for example to cool a process fluid. In an embodiment, the process fluid is water where HVACR circuit 100 is a water chiller for an HVACR system. In an embodiment, evaporator 108 can receive working fluid recovered by purge system 100. It will be appreciated that other process fluids may be cooled by the working fluid, such as but not limited to for example, glycol, air, water, mixtures thereof, or the like.
Purge system 110 includes a fluid line 112 to convey the flow of purge gas from the condenser 104 to separation chamber 114. Separation chamber 114 separates the flow of purge gas into a non-condensable flow, conveyed by exhaust line 116 to exhaust valve 118, with exhaust valve 118 controlling flow through exhaust port 120, and a working fluid return flow, returned to the HVACR circuit 100 through return line 122. Pumps 124, 126 can be included in the exhaust line 116 and the return line 122, respectively, to drive the respective flows.
Separation chamber 114 is a chamber including a separator configured to separate contaminants from the working fluid. The contaminants can include, for example, non-condensable gases incompatible with the refrigeration cycle of HVACR circuit 100. The contaminants can include, for example, air, its component gases, or the like. The separation chamber 114 can separate the contaminants and the working fluid without the addition of heat from an external source. In an embodiment, the process of separating the contaminants from the working fluid occurs at less than 150° C. In an embodiment, the process of separating the contaminants from the working fluid occurs at less than 100° C.
In an embodiment, the separator in separation chamber 114 can include a membrane configured to selectively pass one of the working fluid or the contaminants and reject the other of the working fluid or the contaminants. The membrane can divide the separation chamber 114 into a working fluid side and a contaminant side, based on what is passed through the membrane and where the flow is received from fluid line 112. In an embodiment, the membrane can pass or reject compounds based on the size of molecules. In an embodiment, the membrane can pass or reject compounds based on the solubility of the compounds. In an embodiment, the membrane passes the working fluid and rejects contaminants based on solubility. In this embodiment, the fluid line 112 and the exhaust line 116 are in communication with one another on the contaminant side of the membrane, and the return line 122 is in communication with the working fluid side of the membrane. In an embodiment, the working fluid side is an opposite side of the membrane from the contaminant side.
In an embodiment, the separator in separation chamber 114 includes an adsorbent material configured to have the working fluid adsorb to the surface under predetermined pressure conditions. The adsorbent material can be, for example, particles of silica such as beads or the like. In an embodiment where separation chamber 114 includes an adsorbent material, one or more valves can be provided to control flow between the separation chamber 114 and each of fluid line 112, exhaust line 116, and return line 122 such that either only fluid line 112 and exhaust line 116 are in communication with separation chamber 114 during purge operations, or only return line 122 is in communication with the separation chamber 114 during adsorbent regeneration operations.
Pump 124 can be included along exhaust line 116, between the separation chamber 114 and exhaust valve 118. Exhaust valve 118 controls flow through exhaust line 116 to exhaust port 120. Exhaust valve 118 can be any suitable controllable valve that can be varied between at least a closed position and an open position. In an embodiment, exhaust valve 118 can control a quantity of flow passing through. Fluid passing through exhaust valve 118 can then continue to exhaust port 120 where it leaves purge system 110 to enter an ambient environment. The fluid passing out of exhaust port 120 can be primarily contaminant. Exhaust valve 118 can be controlled, for example, based on an estimate of contaminant concentration or working fluid concentration in the exhaust line 116.
Pump 126 is included along return line 122. In an embodiment where separation chamber 114 includes a membrane, pump 126 can draw working fluid into and through return line 122. In an embodiment where separation chamber 114 includes an adsorbent material, pump 126 can be used in a regeneration operation to draw fluid out of separation chamber 114 when only return line 122 is in communication with the separation chamber 114 to lower pressure within the separation chamber 114 and release adsorbed working fluid from the adsorbent material to regenerate the adsorbent and recapture the working fluid. The return line 122 can convey working fluid recovered from separation chamber 114 to the HVACR circuit 100, for example to condenser 104 as shown or to evaporator 108.
Condenser 202 is a condenser of an HVACR circuit. Condenser 202 can be, for example, condenser 104 of HVACR circuit 100 described above and shown in
Intake line 204 is a fluid line configured to convey a mixture of working fluid and contaminant from the condenser 202 to adsorbent tank 210. Intake line 204 can include any suitable fluid line capable of conveying the working fluid at the typical temperature and pressure conditions for an HVACR system including purge system 200, such as tubes, piping, or the like. Intake line 204 can include any suitable material for such fluid lines that has sufficient mechanical properties for systems operation. In an embodiment, the intake line 204 is not reactive with the working fluid or contaminants.
Optionally, a filter and/or dryer 206 can be included along intake line 204. The filter and/or dryer can be used to condition the fluid flow in intake line 204 prior to it entering the adsorbent tank 208 to remove any moisture or particulates that may impair the function of the adsorbent. The filter and/or dryer 206 can be, for example, a moisture filter configured to absorb moisture from the flow through intake line 204.
Intake line valve 208 can be located along intake line 204 or where intake line 204 joins adsorbent tank 210. Intake line valve 208 controls the flow of fluid into adsorbent tank 210. Intake line valve 208 can be any suitable type of valve that can be controlled between an open position allowing flow and a fully closed position prohibiting flow. In an embodiment, intake line valve 208 can further include one or more intermediate positions allowing a restricted flow rate, less than a fully open flow rate, through the intake line valve 208. In an embodiment, intake line valve 208 can be controlled based on an operating mode of the purge system 200, either a purge operation where intake line valve 208 allows at least some flow or a regeneration operation where the intake line valve 208 completely obstructs flow.
Adsorbent tank 210 is a structure that contains an adsorbent material. The adsorbent material can be a material to which the working fluid can adsorb, but that contaminants such as non-condensable atmospheric gases will not adsorb to. The adsorbent material can be provided as powder, beads, or any other suitable structure of particle to pass fluid through such that the working fluid can adsorb to the adsorbent material. The adsorbent material can be, for example, a carbon-or silicon-based adsorbent material. The adsorbent material can be selected such that the adsorption and regeneration processes each can be performed at temperatures below approximately 150° C. The adsorbent material can be selected such that the adsorption and regeneration processes each can be performed at temperatures below approximately 100° C. The adsorbent material can be selected such that adsorption and release of the working fluid can be mediated by pressure or vacuum without requiring additional heating to be provided to the adsorbent material. The adsorbent tank 210 can be generally cylindrical in shape. An axis of the adsorbent tank 210 can extend in a vertical direction. In an embodiment where the adsorbent tank 210 extends in the vertical direction, the intake line 204 can provide flow into adsorbent tank 210 at a bottom of the adsorbent tank 210, and the exhaust line 216 can extend from a top of the adsorbent tank 210. The adsorbent tank 210 can be a vertical separation column. In an embodiment, a height to width ratio of the vertical separation column can be selected to improve the separation performance of adsorbent tank 210.
The adsorbent in adsorbent tank 210 can be selected based on the compounds to recover from the mixture of working fluid and contaminants received at intake line 204. As non-limiting examples, the compounds to recover can include one or more of: 1-chloro-3,3,3 trifluoropropene, 1-chloro-3,3,3 trifluoropropene (E), 1-chloro-3,3,3 trifluoropropene (Z), 2-chloro-3,3,3 trifluoropropene, 1,1,dichloro-3,3,3 trifluoropropene, 1,2 dichloro-3,3,3 trifluoropropene (E), 1,2 dichloro-3,3,3 trifluoropropene (Z), 1,3,3,3 tetrafluoropropene (E), 1,3,3,3 tetrafluoropropene (Z), 2,3,3,3, tetrafluoropropene, 1,1,2 trichloro-3,3,3 trifluoropropene, 1,2 dichloroethylene (E), 1,2 dichloroethylene (Z), 1,1 dichloroethylene, 1,1,1,4,4,4 hexafluorobutene (Z), 1,1,1,4,4,4 hexafluorobutene (E), 1,1,3,3 tetrafluoropropane, 1,1,1,2,3 pentafluoropropane, 1,1,2,3,3 pentafluoropropane, 1,1,1,3,3 pentafluoropropane, 1,1,1,2,2 pentafluoropropane, 1,1,1,2,2,3 hexafluoropropane, 1,1,1,2,3,3 hexafluoropropane, 1,1,1,3,3,3 hexafluoropropane, isopentane, pentane, cyclopentane, 1,1 difluoroethane, 1,2-difluoroethane, difluoromethane, 1,1,1,2 tetrafluoroethane, 1,1 difluoroethene, 1,2 difluoroethene (E), 1,2 difluorethene (Z), and 2,2-dichloro-1,1,1-trifluoroethane and combinations thereof, or the like.
Temperature sensors 212a-212h can be distributed along adsorbent tank 210. In an embodiment, adsorbent tank 210 has a major axis in a vertical direction, and the temperature sensors 212a-212h are distributed vertically at different heights with respect to the adsorbent tank 210. The temperature sensors 212a-212h can report temperatures at these different heights, which can in turn be used to determine adsorption of working fluid to the adsorbent material based on the heat of adsorption, for example to determine when to regenerate the sorbent or when fluid in exhaust line 216 can be exhausted through discharge valve 220.
Exhaust valve 214 is a valve configured to permit or prevent flow between adsorbent chamber 210 and exhaust line 216 or within exhaust line 216. Exhaust valve 214 can be any suitable type of valve that can be controlled between an open position allowing flow and a fully closed position prohibiting flow. In an embodiment, exhaust valve 214 can further include one or more intermediate positions allowing a restricted flow rate, less than a fully open flow rate, through the exhaust valve 214. In an embodiment, exhaust valve 214 can be controlled based on an operating mode of the purge system 200, either a purge operation where exhaust valve 214 allows at least some flow or a regeneration operation where the exhaust valve 214 completely obstructs flow.
Exhaust line 216 is a line from adsorbent tank 210 or exhaust valve 214 to discharge valve 220. Exhaust line 216 can include any suitable fluid line capable of conveying the working fluid at the typical temperature and pressure conditions for the purge system 202, such as tubes, piping, or the like. Exhaust line 216 can be include any suitable material for such fluid lines that has sufficient mechanical properties for systems operation. In an embodiment, the exhaust line is not reactive with the working fluid or contaminants.
Exhaust pump 218 is a pump located along exhaust line 216. Exhaust pump 218 can be downstream of the exhaust valve 214. Exhaust pump 218 can be any suitable pump configured to draw in fluid and increase its velocity. Exhaust pump 218 draws in fluid in exhaust line 216 which is in fluid communication with the adsorbent tank 210 during a purge mode of operation, thus drawing fluid from the adsorbent tank 210 into exhaust line 216. Exhaust pump 218 exhausts the fluid towards discharge valve 220.
Discharge valve 220 is a valve configured to control fluid communication between exhaust line 216 and an environment to which the contaminants are released. Since the contaminants are typically air or its constituent molecules, they can typically be discharged into an ambient environment of the purge system 200. The discharge valve 220 can be any suitable type of valve that can be controlled between an open position allowing flow and a fully closed position prohibiting flow. In an embodiment, discharge valve 220 can further include one or more intermediate positions allowing a restricted flow rate, less than a fully open flow rate, through the discharge valve 220. In an embodiment, discharge valve 220 can be opened or closed based on a concentration of contaminant in exhaust line 216. The concentration of contaminant can be determined, for example, based on pressure differentials in purge system 200. In an embodiment, discharge valve 220 opens directly to the ambient environment. In an embodiment, discharge valve 220 connects exhaust line 216 to another fluid line (not shown) conveying the contaminants to the ambient environment.
Regeneration valve 222 is a valve controlling fluid communication between the adsorbent chamber 210 and some or all of return line 224. Regeneration valve 222 can be located where return line 224 joins the adsorbent chamber 210, or along return line 224 upstream of return pump 226. Regeneration valve 222 can be any suitable type of valve that can be controlled between an open position allowing flow and a fully closed position prohibiting flow. In an embodiment, regeneration valve 222 can further include one or more intermediate positions allowing a restricted flow rate, less than a fully open flow rate, through the regeneration valve 222. In an embodiment, regeneration valve 222 can be controlled based on an operating mode of the purge system 200, either a purge operation where regeneration valve 222 completely obstructs flow, or a regeneration operation where the regeneration valve 222 allows at least some flow.
Return line 224 is configured to convey fluid from adsorbent chamber 210 to condenser 202. Return line 224 can include any suitable fluid line capable of conveying the working fluid at the typical temperature and pressure conditions for the purge system 202, such as tubes, piping, or the like. Return line 224 can be include any suitable material for such fluid lines that has sufficient mechanical properties for systems operation. In an embodiment, the return line 224 is not reactive with the working fluid.
Return pump 226 is a pump disposed along return line 224, downstream of regeneration valve 222. Return pump 226 can be any suitable pump for drawing in and expelling the working fluid. Return pump 226 can be a pump capable of producing a vacuum within adsorbent tank 210 when only regeneration valve 222 is open among the valves allowing fluid communication with the adsorbent tank 210.
Return valve 228 is a valve controlling flow through return line 224 back to the HVACR system including purge system 200. Return valve 228 can control flow from purge system 200 into the condenser 202 of the HVACR system. Return valve 228 can be along return line 224 downstream of return pump 226 or where return line 224 joins the HVACR system, for example at condenser 202. Return valve 228 can be any suitable type of valve that can be controlled between an open position allowing flow and a fully closed position prohibiting flow. In an embodiment, return valve 228 can further include one or more intermediate positions allowing a restricted flow rate, less than a fully open flow rate, through the return valve 228. In an embodiment, return valve 228 can be controlled based on an operating mode of the purge system 200, either a purge operation where return valve 228 completely obstructs flow, or a regeneration operation where the return valve 228 allows at least some flow.
In place of or in addition to temperature sensors 212a-212h, pressure sensors 230a-230c can optionally be included. Pressure sensors 230a-230c can be located, respectively, on intake line 204, exhaust line 216 and/or return line 224 to measure a pressure within each line. In an embodiment, a weight of the adsorbent tank 210 or the adsorbent contained within can be monitored, and when the weight of the tank reaches or exceeds a threshold, the regeneration operation can be initiated. In an embodiment, the weight of the adsorbent tank can be used to determine when to end the regeneration process, for example when the weight falls below a threshold value for ending the regeneration. The weight of the adsorbent tank 210 can be measured by a weight sensor 232. In an embodiment, a change in temperature across the temperature sensors 212a-212h can be used to determine, based on the heat of adsorption, when to carry out a regeneration operation for the purge system 200. In an embodiment, a pressure within the adsorbent tank 210 can be used to determine when to end a regeneration operation, for example when falling below a threshold value due to the slowing or stopping of release of previously adsorbed working fluid. In an embodiment, pressure sensor 230d can be included, measuring a pressure within adsorbent tank 210. The pressure measured by pressure sensor 230d can be used to control the regeneration operation, for example by having the regeneration operation ended when the pressure measured by a pressure sensor 230d falls below a threshold, for example as determined by a controller receiving the pressure measurement from pressure sensor 230d.
When in a purge mode, intake valve 208 and exhaust valve 214 both allow flow through them while return valve 228 prohibits flow. In this arrangement of valves, fluid from condenser 202 passes through intake line 204 and intake valve 208 to enter adsorption chamber 210, where the working fluid adsorbs to the adsorbent material. As the fluid from intake line 204 proceeds through the adsorption chamber 210, the proportion of the working fluid decreases as it adsorbs to the adsorbent material, and the contaminant accordingly becomes more concentrated. In the purge mode, fluid in the adsorption chamber 210 cannot pass through regeneration valve 222 and thus cannot flow through at least some of return line 224 or to return pump 226 and return valve 228. Accordingly, all fluid leaving the adsorption chamber 210 flows through exhaust valve 214, into exhaust line 216. In an embodiment, the action of pump 218 draws the fluid from adsorption chamber 210 into exhaust line 216. The fluid in exhaust line 216 can accumulate there until the discharge valve 220 is opened, allowing the fluid in exhaust line 216 to be discharged to the ambient environment. Discharge valve 220 can be controlled based on, for example, changes in the weight of adsorbent tank 210 and/or pressure differences observed within adsorbent tank 210, for example to open discharge valve 220 only when one or both of those variables exceed threshold values for release. In an embodiment, discharge valve 220 is open only during select periods of the purge mode and/or during portions of the regeneration mode described below. In an embodiment, discharge valve 220 is open only during the purge mode described below.
Purge system 200 can also operate in a regeneration mode, for example, when the adsorbent is at or near saturation, its affinity for the working fluid is decreased, and/or when working fluid is to be returned to the HVACR system including purge system 200. In an embodiment, the regeneration mode can be selected based on mass of the adsorbent tank 210, temperature differences observed within the adsorbent tank 210, a schedule of times, or based on flow through the purge system 200 over time. When in the regeneration mode, intake valve 208 and exhaust valve 214 are closed while regeneration valve 222 is the only valve controlling flow to and from adsorption chamber 210 that is open. Since regeneration valve 222 is the only valve that is open, pressure within adsorption chamber 210 is reduced as fluid is drawn through return line 224 by return pump 226. As the pressure in adsorption chamber 210 decreases, the working fluid adsorbed to the adsorbent material is released and then is drawn through the regeneration valve 222 into return line 224. The working fluid can accumulate in return line 224, and be returned to the HVACR system when return valve 228 is opened.
Condenser 302 and filter/dryer 306 can be the same as condenser 202 and filter/dryer 206 described above and shown in
Pusher pump 308 is a pump disposed along intake line 304. Pusher pump 308 can be any suitable pump for driving flow through intake line 304. Fluid discharged from pusher pump 308 can increase pressure within adsorbent tank 312. The increased pressure within adsorbent tank 312 can increase the extent of adsorption of the working fluid to the adsorbent material contained within adsorbent tank 312. In an embodiment, the velocity imparted to the fluid by pusher pump 308 can carry fluid to discharge valve 320 without requiring further pumps along the exhaust line 318.
Intake line valve 310, adsorbent tank 312, temperature sensors 314a-314f, and exhaust valve 316 can each be, respectively, the corresponding intake line valve 208, adsorbent tank 310, temperature sensors 212a-212f, and exhaust valve 214 as shown in
Exhaust line 318 can be similar to exhaust line 216 shown in
Regeneration valve 322, return line 324, and return valve 328 can each, respectively, be regeneration valve 222, return line 224, and return valve 228 as shown in
Condenser 402 can be, for example, condenser 104 of HVACR circuit 100 described above and shown in
Intake line 404 is a fluid line configured to direct fluid from condenser 402 to first stage membrane separation chamber 408. Optionally, a filter and/or dryer 406 can be included along the intake line 404. The filter and/or dryer can be used to condition the fluid flow in intake line 404 prior to it entering the first stage membrane separation chamber 408, for example to remove moisture and/or particulate matter that may damage or reduce the effectiveness of first and second separation membranes 410, 420. The filter and/or dryer 406 can be, for example, a moisture filter configured to absorb moisture from the flow through intake line 404.
First stage membrane separation chamber 408 is a chamber divided into a first side 408a and a second side 408b by the first separation membrane 410. The first side 408a can be in communication with the intake line 404 and one of the interstage line 412 or the first stage return line 414, depending on whether the first separation membrane 410 passes or rejects the contaminants. In the embodiment shown in
First separation membrane 410 is a selectively permeable membrane configured to pass one of the working fluid or the contaminant and to reject the other. First separation membrane 410 can have any suitable size, shape, and position within the first stage membrane separation chamber 408 that divides the chamber into first side 408a and second side 408b. In an embodiment, the first separation membrane forms a plane dividing first side 408a from second side 408b. In an embodiment, the first separation membrane can have a shape configured to increase a surface area of the membrane, such as folds, pleating, rolling, or any other suitable shape so long as it such a shape divides discrete first and second sides 408a,b, of the first stage membrane separation chamber 408. The first separation membrane 410 can be selective based on particle size or particle solubility. In an embodiment, first separation membrane 410 is selective based on solubility. In an embodiment, first separation membrane 410 is configured to pass working fluid and reject contaminant based on solubility. In an embodiment, first separation membrane 410 is configured to pass at least one of the following based on solubility: 1-chloro-3,3,3 trifluoropropene, 1-chloro-3,3,3 trifluoropropene (E), 1-chloro-3,3,3 trifluoropropene (Z), 2-chloro-3,3,3 trifluoropropene, 1,1,dichloro-3,3,3 trifluoropropene, 1,2 dichloro-3,3,3 trifluoropropene (E), 1,2 dichloro-3,3,3 trifluoropropene (Z), 1,3,3,3 tetrafluoropropene (E), 1,3,3,3 tetrafluoropropene (Z), 2,3,3,3, tetrafluoropropene, 1,1,2 trichloro-3,3,3 trifluoropropene, 1,2 dichloroethylene (E), 1,2 dichloroethylene (Z), 1,1 dichloroethylene, 1,1,1,4,4,4 hexafluorobutene (Z), 1,1,1,4,4,4 hexafluorobutene (E), 1,1,3,3 tetrafluoropropane, 1,1,1,2,3 pentafluoropropane, 1,1,2,3,3 pentafluoropropane, 1,1,1,3,3 pentafluoropropane, 1,1,1,2,2 pentafluoropropane, 1,1,1,2,2,3 hexafluoropropane, 1,1,1,2,3,3 hexafluoropropane, 1,1,1,3,3,3 hexafluoropropane, isopentane, pentane, cyclopentane, 1,1 difluoroethane, 1,2-difluoroethane, difluoromethane, 1,1,1,2 tetrafluoroethane, 1,1 difluoroethene, 1,2 difluoroethene (E), 1,2 difluorethene (Z), and 2,2-dichloro-1,1,1-trifluoroethane and combinations thereof, or the like.
Interstage line 412 is a fluid line configured to convey fluid containing contaminant and working fluid from the first stage membrane separation chamber 408 to the second stage membrane separation chamber 418. The fluid in interstage line 412 typically includes a higher proportion of contaminant compared to the fluid in intake line 404. Interstage line 412 can be connected to one of first side 408a or second side 408b of first stage membrane separation chamber 408 based on whether first separation membrane 410 passes or rejects contaminants, with interstage line 412 being on the side having fluid including the contaminants. In the embodiment shown in
First stage return line 414 is a fluid line configured to convey fluid from the first stage membrane separation chamber 410 to be returned to the HVACR system including purge system 400. The fluid conveyed by first stage return line 414 typically includes a higher proportion of working fluid compared to the fluid in intake line 404.
First stage return pump 416 is located along first stage return line 414. First stage return pump 416 can be any suitable pump for drawing in and expelling a mixture primarily composed of the working fluid to cause the fluid to move along first stage return line 414. In an embodiment where the first separation membrane 410 passes the working fluid, the action of first stage return pump can reduce pressure on the second side 408b of first membrane separation chamber 408 such that the working fluid is drawn through the first separation membrane 410 and then into first stage return line 414.
Second stage membrane separation chamber 418 is a chamber divided into a first side 418a and a second side 418b by the second separation membrane 420. The first side 418a can be in communication with the interstage line 412 and one of the exhaust line 422 or the second stage return line 428, depending on whether the second separation membrane 420 passes or rejects the contaminants. In the embodiment shown in
Second separation membrane 420 is a selectively permeable separation membrane dividing second stage membrane separation chamber 418 into first side 418a and second side 418b. Second separation membrane 420 can include the same membrane material as first separation membrane 410 or a different membrane material from first separation membrane 410. In an embodiment, the first separation membrane 410 can have a surface area that is greater than the surface area of the second separation membrane 420. Second separation membrane 420 can have any suitable size, shape, and position within the second stage membrane separation chamber 418 that divides the chamber into first side 418a and second side 418b. In an embodiment, the second separation membrane forms a plane dividing first side 418a from second side 418b. In an embodiment, the second separation membrane can have a shape configured to increase a surface area of the membrane, such as folds, pleating, rolling, or any other suitable shape so long as it such a shape divides discrete first and second sides 418a,b, of the second stage membrane separation chamber 418. The second separation membrane 420 can be selective based on particle size or particle solubility. In an embodiment, second separation membrane 420 is selective based on solubility. In an embodiment, second separation membrane 420 is configured to pass working fluid and reject contaminant based on solubility. In an embodiment, second separation membrane 420 is configured to pass at least one of the following based on solubility: 1-chloro-3,3,3 trifluoropropene, 1-chloro-3,3,3 trifluoropropene (E), 1-chloro-3,3,3 trifluoropropene (Z), 2-chloro-3,3,3 trifluoropropene, 1,1, dichloro-3 ,3 ,3 trifluoropropene, 1,2 dichloro-3 ,3 ,3 trifluoropropene (E), 1,2 dichloro-3,3,3 trifluoropropene (Z), 1,3,3,3 tetrafluoropropene (E), 1,3,3,3 tetrafluoropropene (Z), 2,3,3,3, tetrafluoropropene, 1,1,2 trichloro-3,3,3 trifluoropropene, 1,2 dichloroethylene (E), 1,2 dichloroethylene (Z), 1,1 dichloroethylene, 1,1,1,4,4,4 hexafluorobutene (Z), 1,1,1,4,4,4 hexafluorobutene (E), 1,1,3,3 tetrafluoropropane, 1,1,1,2,3 pentafluoropropane, 1,1,2,3,3 pentafluoropropane, 1,1,1,3,3 pentafluoropropane, 1,1,1,2,2 pentafluoropropane, 1,1,1,2,2,3 hexafluoropropane, 1,1,1,2,3,3 hexafluoropropane, 1,1,1,3,3,3 hexafluoropropane, isopentane, pentane, cyclopentane, 1,1 difluoroethane, 1,2-difluoroethane, difluoromethane, 1,1,1,2 tetrafluoroethane, 1,1 difluoroethene, 1,2 difluoroethene (E), 1,2 difluorethene (Z), and 2,2-dichloro-1,1,1-trifluoroethane and combinations thereof, and the like.
Exhaust line 422 is a fluid line configured to convey fluid from the second stage membrane separation chamber 418 to exhaust valve 426. Exhaust line 422 is connected to second stage separation chamber 418 on the side having a higher concentration of the contaminants. In an embodiment where the second separation membrane 420 passes the contaminants and rejects the working fluid, the exhaust line 422 is on a second side 418b of the second membrane separation chamber 418 from the interstage line 412 such that the contaminants passing the second separation membrane are received at the exhaust line 422. In an embodiment where the second separation membrane 420 rejects the contaminants and passes the working fluid, the exhaust line is connected to the second stage membrane separation chamber on a first side 418a of the second membrane separation chamber 418, with exhaust line 422 receiving fluid having an elevated concentration of contaminant compared to the fluid from interstage line 412 due to the working fluid passing through the second separation membrane 420.
Exhaust line pump 424 is a pump disposed along exhaust line 422 to draw in fluid and expel it, driving the flow in exhaust line 422 towards exhaust valve 426. Exhaust line pump can be any suitable pump for driving the flow through exhaust line 422.
Exhaust valve 426 is a valve is a valve configured to control fluid communication between exhaust line 422 and an environment to which the contaminants are released. Since the contaminants are typically air or its constituent molecules, they can typically be discharged into an ambient environment of the purge system 400. The exhaust valve 426 can be any suitable type of valve that can be controlled between an open position allowing flow and a fully closed position prohibiting flow. In an embodiment, exhaust valve 426 can further include one or more intermediate positions allowing a restricted flow rate, less than a fully open flow rate, through the exhaust valve 426. In an embodiment, exhaust valve 426 can be opened or closed based on a concentration of contaminant in exhaust line 422. The concentration of contaminant can be determined, for example, based on pressure differentials in purge system 400. In an embodiment, exhaust valve 426 opens directly to the ambient environment. In an embodiment, exhaust valve 426 connects exhaust line 422 to another fluid line (not shown) conveying the contaminants to the ambient environment.
Second stage return line 428 is a fluid line configured to convey fluid from the second stage membrane separation chamber 418 to be returned to the HVACR system including purge system 400. The second stage return line 428 can be any suitable fluid line for conveying the fluid. The fluid in second stage return line 428 can be connected to a side 418a,b of second stage membrane separation chamber 418 having a relatively higher concentration of the working fluid due to the action of the second separation membrane 420. In an embodiment where the second separation membrane allows contaminant to pass and rejects the working fluid, the second stage return line 428 can be connected to a first side 418a along with the interstage line 412. In an embodiment where the second separation membrane allows the working fluid to pass and rejects the contaminant, the second stage return line 428 can be connected to a second side 418b, opposite the second separation membrane 420 from interstage line 412.
Second stage return pump 430 is a pump disposed along the second stage return line 428 and configured to drive flow through second stage return line 428 from the second stage membrane separation chamber 418 towards the HVACR system including the purge system 400.
Combined return line 432 is connected to first and second stage return lines 414, 428 and is configured to combine the flows of working fluid to direct the working fluid to its location of reintroduction into the HVACR system including the purge system 400. The combined return line 432 can be joined to any suitable location along the HVACR circuit of the HVACR system where the working fluid can be reintroduced into the circuit. In the embodiment shown in
Releasables return line 434 can optionally be included to provide communication between the exhaust line 422 and the combined return line 432, for example to return fluid to the HVACR system if the concentration of working fluid in the fluid in return line 432 is greater than a threshold value permitting release.
One or more pressure sensors 436a-436d can be included along intake line 404, first stage return line 414, exhaust line 422, and second stage return line 428, respectively. The pressure sensors 436a-436d can provide pressure values for fluid in their respective fluid lines. In an embodiment, pressure sensors 436a-436d are connected to a controller 438 such that they can provide their respective pressure measurements to the controller 438. The controller 438 can determine operation of one or more of the valves and/or pumps of the purge system 400 based on differences in the pressure measurements, such as, for example, ratios of pressures in different fluid lines.
While the embodiment shown in
Condenser 502 can be, for example, condenser 104 of HVACR circuit 100 described above and shown in
Intake line 504 is a fluid line configured to convey fluid from condenser 502 to membrane separation chamber 510. Optionally, a filter and/or dryer 506 can be included along the intake line 504. The filter and/or dryer can be used to condition the fluid flow in intake line 504 prior to it entering membrane separation chamber 510. The filter and/or dryer 506 can be, for example, a moisture filter configured to absorb moisture from the flow through intake line 504.
Pusher pump 508 is a pump located along intake line 504, upstream of the membrane separation chamber 510. Pusher pump 508 is configured to draw in fluid and expel it through intake line 504 or directly into membrane separation chamber 510 with a relatively increased velocity. Pusher pump 508 can be any suitable pump for driving the flow of fluid through intake line 504. In the embodiment shown in
Membrane separation chamber 510 is a chamber divided into a first side 510a and a second side 510b by membrane 512. Intake line 504 provides fluid driven by pusher pump 508 into first side 510a. In an embodiment, membrane 512 passes the contaminant, such as non-condensable gases such as atmospheric gases, and prohibits flow of the working fluid. In this embodiment, exhaust line 514 connects to the second side 510b, opposite membrane 512 from intake line 504, and return line 518 is connected to first side 510a. In an embodiment, the membrane 512 passes the working fluid and prohibits flow of the contaminant. In this embodiment, the exhaust line is connected to the first side 510a, and the return line 518 is connected to the second side 510b, on an opposite side of membrane 512 from the intake line 504.
Membrane 512 is a selectively permeable membrane configured to pass one of working fluid or contaminant, and to reject the other. Membrane 512 can have any suitable size, shape, and position within the membrane separation chamber 510 that divides the chamber into first side 510a and second side 510b. In an embodiment, the separation membrane forms a plane dividing first side 510a from second side 510b. In an embodiment, the separation membrane can have a shape configured to increase a surface area of the membrane, such as folds, pleating, rolling, or any other suitable shape so long as it such a shape divides discrete first and second sides 510a,b, of the membrane separation chamber 510. The separation membrane 512 can be selective based on particle size or particle solubility. In an embodiment, separation membrane 512 is selective based on solubility. In an embodiment, separation membrane 512 is configured to pass working fluid and reject contaminant based on solubility. In an embodiment, separation membrane 512 is configured to pass at least one of the following based on solubility: 1-chloro-3,3,3 trifluoropropene, 1-chloro-3,3,3 trifluoropropene (E), 1-chloro-3,3,3 trifluoropropene (Z), 2-chloro-3,3,3 trifluoropropene, 1,1,dichloro-3,3,3 trifluoropropene, 1,2 dichloro-3,3,3 trifluoropropene (E), 1,2 dichloro-3,3,3 trifluoropropene (Z), 1,3,3,3 tetrafluoropropene (E), 1,3,3,3 tetrafluoropropene (Z), 2,3,3,3, tetrafluoropropene, 1,1,2 trichloro-3,3,3 trifluoropropene, 1,2 dichloroethylene (E), 1,2 dichloroethylene (Z), 1,1 dichloroethylene, 1,1,1,4,4,4 hexafluorobutene (Z), 1,1,1,4,4,4 hexafluorobutene (E), 1,1,3,3 tetrafluoropropane, 1,1,1,2,3 pentafluoropropane, 1,1,2,3,3 pentafluoropropane, 1,1,1,3,3 pentafluoropropane, 1,1,1,2,2 pentafluoropropane, 1,1,1,2,2,3 hexafluoropropane, 1,1,1,2,3,3 hexafluoropropane, 1,1,1,3,3,3 hexafluoropropane, isopentane, pentane, cyclopentane, 1,1 difluoroethane, 1,2-difluoroethane, difluoromethane, 1,1,1,2 tetrafluoroethane, 1,1 difluoroethene, 1,2 difluoroethene (E), 1,2 difluorethene (Z), and 2,2-dichloro-1,1,1-trifluoroethane and combinations thereof, or the like.
Exhaust line 514 conveys fluid relatively higher in contaminant from the separation chamber 510 to exhaust valve 516. Exhaust line 514 can be connected to either of first or second side 510a,b of separation chamber 510 based on whether the membrane 512 passes or rejects the contaminants. In an embodiment, no pump is included along exhaust line 514. Optionally, an exhaust pump can be included along exhaust line 514.
Exhaust valve 516 controls flow out of exhaust line 514 to an environment for receiving the contaminants. Exhaust valve 516 can be any suitable valve for controlling flow of the fluid in exhaust line 514. In an embodiment, exhaust valve 516 has a closed position obstructing flow completely and an open position permitting flow. In an embodiment, exhaust valve 516 includes one or more intermediate positions partially permitting and partially obstructing flow, or the flow can be continuously varied. In an embodiment, the environment is a tank or other receptacle. In an embodiment, the environment is an ambient environment of purge system 500. In an embodiment, exhaust valve 516 directly outlets to the environment. In an embodiment, exhaust valve 518 allows flow from exhaust line 514 to another line conveying the fluid to the environment. In an embodiment, exhaust valve 516 is operated based on differences in pressure between parts of purge system 500. In an embodiment, exhaust valve 516 is operated based on a model correlating differences in pressure in purge system 500 with a concentration of contaminants and/or a concentration of working fluid in the fluid within exhaust line 514.
Return line 518 is a fluid line configured to convey fluid having a relatively greater proportion of working fluid back to the HVACR system including the purge system 500. Return line 518 is connected to the membrane separation chamber 510 on a side having a relatively greater concentration of the working fluid compared to the intake line 504, for example on the same side, first side 510a, as intake line 504 when the membrane 512 passes contaminant and rejects working fluid, or on second side 510b, opposite the intake line 504 with respect to membrane 512 when the membrane 512 passes working fluid and rejects contaminant. In an embodiment, no pump is provided along return line 518. In an embodiment, a pump is included along return line 518.
Return valve 520 is a valve controlling flow of fluid within return line 518 and the HVACR system including purge system 500. Return valve 520 can be any suitable valve for controlling flow of the fluid in return line 518. In an embodiment, return valve 520 a closed position obstructing flow completely and an open position permitting flow. In an embodiment, return valve 520 includes one or more intermediate positions partially permitting and partially obstructing flow, or the flow can be continuously varied. In an embodiment, return valve 520 allows flow into a fluid line configured to convey fluid to the HVACR system. In an embodiment, return valve 520 directly permits or restricts flow directly into the point where working fluid is returned to the HVACR system.
In the embodiment shown in
Optionally, pressure sensors 524a-524c can be included in intake line 504, exhaust line 514, and return line 518, respectively. Each of pressure sensors 524a-524c can be any suitable pressure sensor capable of measuring the pressure within the respective fluid line. Pressure measurements from any or all of pressure sensors 524a-524c can be received at and subsequently processed by a controller 526, for example to determine operation of one or both of exhaust valve 516 and return valve 520. Controller 526 can process the pressure measurements from pressure sensors 524a-524c to determine differences in pressure at the respective pressure sensors. The differences in pressures can be expressed as ratios of the pressures. The differences in pressures can be used to determine concentrations of contaminant and/or working fluid in exhaust line 514 and/or return line 518, based, for example on a model correlating the concentrations with pressure differentials.
While the embodiment shown in
Condenser 602 can be, for example, condenser 104 of HVACR circuit 100 described above and shown in
Intake line 604 is a fluid line configured to direct fluid from condenser 602 to adsorbent tank 610. Optionally, a filter and/or dryer 606 can be included along the intake line 604. The filter and/or dryer can be used to condition the fluid flow in intake line 604 prior to it entering the adsorbent tank 610. The filter and/or dryer 606 can be, for example, a moisture filter configured to absorb moisture from the flow through intake line 604.
Intake valve 608 can be located along intake line 604 or where intake line 604 joins adsorbent tank 610. Intake valve 608 controls the flow of fluid into adsorbent tank 610. Intake valve 608 can be any suitable type of valve that can be controlled between an open position allowing flow and a fully closed position prohibiting flow. In an embodiment, intake valve 608 can further include one or more intermediate positions allowing a restricted flow rate, less than a fully open flow rate, through the intake valve 608. In an embodiment, intake valve 608 can be controlled based on an operating mode of the purge system 600, either a purge operation where intake valve 608 allows at least some flow or a regeneration operation where the intake line valve 608 completely obstructs flow.
Adsorbent tank 610 is a structure that contains an adsorbent material. The adsorbent material can be a material to which the working fluid can adsorb, but that contaminants such as non-condensable atmospheric gases will not adsorb to. The adsorbent material can be provided as powder, beads, or any other suitable structure of particle to pass fluid through such that the working fluid can adsorb to the adsorbent material. The adsorbent material can be, for example, a carbon- or silicon-based adsorbent material. The adsorbent material can be selected such that the adsorption and regeneration processes each can be performed at temperatures below approximately 150° C. The adsorbent material can be selected such that the adsorption and regeneration processes each can be performed at temperatures below approximately 100° C. The adsorbent material can be selected such that adsorption and release of the working fluid can be mediated by pressure or vacuum without requiring additional heating to be provided to the adsorbent material. The adsorbent tank 610 can be generally cylindrical in shape. An axis of the adsorbent tank 610 can extend in a vertical direction. In an embodiment where the adsorbent tank 610 extends in the vertical direction, the intake line 604 can provide flow into adsorbent tank 610 at a bottom of the adsorbent tank 610, and the interstage line 612 can extend from a top of the adsorbent tank 610. Adsorbent tank 610 can be a vertical separation column. In an embodiment, the height-width ratio of a vertical separation column using adsorbent tank 610 is selected to improve the effectiveness in separation working fluid.
The adsorbent in adsorbent tank 610 can be selected based on the compounds to recover from the mixture of working fluid and contaminants received at intake line 604. As non-limiting examples, the compounds to recover can include one or more of: 1-chloro-3,3,3 trifluoropropene, 1-chloro-3,3,3 trifluoropropene (E), 1-chloro-3,3,3 trifluoropropene (Z), 2-chloro-3,3,3 trifluoropropene, 1,1,dichloro-3,3,3 trifluoropropene, 1,2 dichloro-3,3,3 trifluoropropene (E), 1,2 dichloro-3,3,3 trifluoropropene (Z), 1,3,3,3 tetrafluoropropene (E), 1,3,3,3 tetrafluoropropene (Z), 2,3,3,3, tetrafluoropropene, 1,1,2 trichloro-3,3,3 trifluoropropene, 1,2 dichloroethylene (E), 1,2 dichloroethylene (Z), 1,1 dichloroethylene, 1,1,1,4,4,4 hexafluorobutene (Z), 1,1,1,4,4,4 hexafluorobutene (E), 1,1,3,3 tetrafluoropropane, 1,1,1,2,3 pentafluoropropane, 1,1,2,3,3 pentafluoropropane, 1,1,1,3,3 pentafluoropropane, 1,1,1,2,2 pentafluoropropane, 1,1,1,2,2,3 hexafluoropropane, 1,1,1,2,3,3 hexafluoropropane, 1,1,1,3,3,3 hexafluoropropane, isopentane, pentane, cyclopentane, 1,1 difluoroethane, 1,2-difluoroethane, difluoromethane, 1,1,1,2 tetrafluoroethane, 1,1 difluoroethene, 1,2 difluoroethene (E), 1,2 difluorethene (Z), and 2,2-dichloro-1,1,1-trifluoroethane and combinations thereof, or the like.
Interstage line 612 is a fluid line configured to convey fluid from adsorbent tank 610 to membrane separation chamber 624. Interstage line 612 can be any suitable fluid line for conveying the fluid leaving adsorbent tank 610.
Interstage valve 614 is a valve located along interstage line 612 or at a junction between adsorbent tank 610 and interstage line 612. Interstage valve 614 can be any suitable valve for controlling flow into or through interstage line 612. Interstage valve 614 is configured to have a fully closed position where it obstructs flow and at least one open position where it permits flow of fluid into or through interstage line 612. In an embodiment, interstage valve 614 includes a plurality of open positions permitting different quantities of flow or can be continuously varied with respect to the flow permitted. Interstage valve 614 can be in the closed position during a regeneration operation of the purge system 600 and in the open position during a purge operation of the purge system 600.
Interstage pump 616 is a pump located between interstage valve 614 and membrane separation chamber 624, disposed along interstage line 612. Interstage pump 616 can be any suitable pump for drawing in and expelling the fluid in interstage line 612 to direct the fluid towards membrane separation chamber 624.
Adsorbent return line 618 is a fluid line configured to convey working fluid from adsorbent tank 610 to combined return line 636, where it can subsequently be returned to an HVACR system including the purge system 600. Adsorbent return line can be any suitable fluid line for conveying the working fluid from adsorbent tank 610. Adsorbent return line 618 can be a fluid line capable of use under the negative pressure or vacuum provided by adsorbent return pump 622 during a regeneration operation.
Adsorbent return valve 620 controls flow through adsorbent return line 618 or between adsorbent tank 610 and adsorbent return line 618. The adsorbent return valve 620 can be any suitable valve for controlling flow into or through adsorbent return line 618. Adsorbent return valve 620 is configured to have a fully closed position where it obstructs flow and at least one open position where it permits flow of fluid into or through adsorbent return line 618. In an embodiment, adsorbent return valve 620 includes a plurality of open positions permitting different quantities of flow or can be continuously varied with respect to the flow permitted. Adsorbent return valve 620 can be in the open position during a regeneration operation of the purge system 600 and in the closed position during a purge operation of the purge system 600.
Adsorbent return pump 622 is a pump configured to draw in and expel fluid within adsorbent return line 618. Adsorbent return pump 622 is disposed along adsorbent return line 618, downstream of adsorbent return valve 620. Adsorbent return pump 622 can be any suitable pump for driving the fluid in adsorbent return line 618. Adsorbent return pump 622 can be configured to provide the interior of adsorbent tank 610 with a negative pressure or a vacuum when adsorbent return valve 620 is open and intake valve 608 and interstage valve 614 are closed. The negative pressure or vacuum can be negative pressure or vacuum sufficient to facilitate the release of working fluid from the adsorbent material in adsorbent tank 610.
In operation in a purge mode, intake valve 608 and interstage valve 614 are open, allowing fluid to enter the adsorbent tank 610, have working fluid adsorb to the adsorbent material contained therein, and exit through interstage line 612 for further separation in membrane separation chamber 612. In the purge mode, adsorbent return valve 620 is closed.
The purge system 600 can be operated in a regeneration mode to regenerate the adsorbent material in adsorbent tank 610 and to recover working fluid adsorbed to that adsorbent material. In the regeneration mode, adsorbent return valve 620 is open and adsorbent return pump 622 is in operation, while intake valve 608 and interstage valve 614 are closed. Adsorbent return pump 622 thus can produce a negative pressure or vacuum in adsorbent tank 610. The negative pressure or vacuum releases some or all of the working fluid adsorbed to the adsorbent material, which is drawn into adsorbent return line 618.
Membrane separation chamber 624 is a chamber separated into first side 624a and second side 624b by separation membrane 626. Membrane separation chamber 624 is configured to receive fluid from the interstage line 612 on first side 624a. Membrane separation chamber 624 is a chamber divided into a first side 624a and a second side 624b by membrane 626. In an embodiment, membrane 626 passes the contaminant, such as non-condensable gases such as atmospheric gases, and prohibits flow of the working fluid. In this embodiment, exhaust line 628 connects to the second side 624b, opposite membrane 626 from interstage line 612, and membrane return line 632 is connected to first side 624a. In an embodiment, the membrane 626 passes the working fluid and prohibits flow of the contaminant. In this embodiment, the exhaust line 628 is connected to the first side 624a, and the membrane return line 632 is connected to the second side 624b, on an opposite side of membrane 626 from the interstage line 612.
Separation membrane 626 is a selectively permeable membrane configured to pass one of working fluid or contaminant, and to reject the other. Separation membrane 626 can have any suitable size, shape, and position within the membrane separation chamber 624 that divides the chamber into first side 624a and second side 624b. In an embodiment, the separation membrane forms a plane dividing first side 624a from second side 624b. In an embodiment, the separation membrane can have a shape configured to increase a surface area of the membrane, such as folds, pleating, rolling, or any other suitable shape so long as it such a shape separates discrete first and second sides 624a,b, of the membrane separation chamber 624. The separation membrane 626 can be selective based on particle size or particle solubility. In an embodiment, separation membrane 626 is selective based on solubility. In an embodiment, separation membrane 626 is configured to pass working fluid and reject contaminant based on solubility. In an embodiment, separation membrane 626 is configured to pass at least one of the following based on solubility: 1-chloro-3,3,3 trifluoropropene, 1-chloro-3,3,3 trifluoropropene (E), 1-chloro-3,3,3 trifluoropropene (Z), 2-chloro-3,3,3 trifluoropropene, 1, 1, di chl oro-3,3,3 trifluoropropene, 1,2 dichloro-3,3,3 trifluoropropene (E), 1,2 dichloro-3,3,3 trifluoropropene (Z), 1,3,3,3 tetrafluoropropene (E), 1,3,3,3 tetrafluoropropene (Z), 2,3,3,3, tetrafluoropropene, 1,1,2 trichloro-3,3,3 trifluoropropene, 1,2 dichloroethylene (E), 1,2 dichloroethylene (Z), 1,1 dichloroethylene, 1,1,1,4,4,4 hexafluorobutene (Z), 1,1,1,4,4,4 hexafluorobutene (E), 1,1,3,3 tetrafluoropropane, 1,1,1,2,3 pentafluoropropane, 1,1,2,3,3 pentafluoropropane, 1,1,1,3,3 pentafluoropropane, 1,1,1,2,2 pentafluoropropane, 1,1,1,2,2,3 hexafluoropropane, 1,1,1,2,3,3 hexafluoropropane, 1,1,1,3,3,3 hexafluoropropane, isopentane, pentane, cyclopentane, 1,1 difluoroethane, 1,2-difluoroethane, difluoromethane, 1,1,1,2 tetrafluoroethane, 1,1 difluoroethene, 1,2 difluoroethene (E), 1,2 difluorethene (Z), and 2,2-dichloro-1,1,1-trifluoroethane and combinations thereof, or the like.
Exhaust line 628 is a fluid line configured to convey fluid from membrane separation chamber 624 to exhaust valve 630. Exhaust line 628 can be any suitable fluid line for conveying the fluid from membrane separation chamber 624. Exhaust line 628 is connected to membrane separation chamber 624 on a side having a relatively greater concentration of contaminant. In an embodiment where separation membrane 626 passes the contaminant and rejects the working fluid, the exhaust line 628 is connected to membrane separation chamber 624 on second side 624b, opposite the membrane 626 from interstage line 612. In an embodiment where separation membrane 626 rejects the contaminant and passes the working fluid, exhaust line 628 can be connected to membrane separation chamber 624 on the same side of membrane 626 as the interstage line 612, first side 624a.
Exhaust valve 630 is a valve configured to control flow out of exhaust line 628 to an environment for receiving the contaminants. Exhaust valve 630 can be any suitable valve for controlling flow of the fluid in exhaust line 628. In an embodiment, exhaust valve 630 has a closed position obstructing flow completely and an open position permitting flow. In an embodiment, exhaust valve 630 includes one or more intermediate positions partially permitting and partially obstructing flow, or the flow can be continuously varied. In an embodiment, the environment is a tank or other receptacle. In an embodiment, the environment is an ambient environment of purge system 600. In an embodiment, exhaust valve 630 directly outlets to the environment. In an embodiment, exhaust valve 630 allows flow from exhaust line 628 to another line conveying the fluid to the environment. In an embodiment, exhaust valve 630 is operated based on differences in pressure between parts of purge system 600. In an embodiment, exhaust valve 630 is operated based on a model correlating differences in pressure in purge system 600 with a concentration of contaminants and/or a concentration of working fluid in the fluid within exhaust line 628.
Membrane return line 632 is a fluid line configured to return fluid from membrane separation chamber 624 to combined return line 636, where it can be returned to the HVACR system including purge system 600. Membrane return line 632 can be connected to membrane separation chamber 624 on a side having a relatively greater concentration of the working fluid. In an embodiment where separation membrane 626 passes the contaminant and rejects the working fluid, the membrane return line 632 is connected to membrane separation chamber 624 on first side 624a, on the same side of the membrane 626 as interstage line 612. In an embodiment where separation membrane 626 rejects the contaminant and passes the working fluid, membrane return line 632 can be connected to membrane separation chamber 624 on an opposite side of membrane 626 from the interstage line 612, second side 624b.
Membrane return valve 634 is a valve along membrane return line 632 or at a junction of membrane return line 632 and combined return line 636. Membrane return valve 634 is a valve configured to control the flow through membrane return line 632 or into combined return line 636. Membrane return valve can be can be any suitable valve for controlling flow through membrane return line 632 or into combined return line 636. Membrane return valve 634 is configured to have a fully closed position where it obstructs flow and at least one open position where it permits flow of fluid through membrane return line 632 or into combined return line 636. In an embodiment, membrane return valve 634 includes a plurality of open positions permitting different quantities of flow, or can be continuously varied with respect to the amount of flow permitted between a minimum and a maximum flow.
Combined return line 636 receives fluid high in working fluid from adsorbent return line 618 and membrane return line 632 and conveys it to a location in the HVACR system where the working fluid is returned. In the embodiment shown in
Purge system 600 can further include pressure sensors 638a-638d, located on intake line 604, adsorbent return line 618, membrane return line 632, and exhaust line 628, respectively. The pressure sensors 638a-638d are each configured to measure pressures of fluid within their respective fluid lines. The pressure readings from pressure sensors 638a-638d can be received at and subsequently processed by a controller 640, for example to determine operation of one or both of exhaust valve 630 and membrane return valve 634. Controller 640 can process the pressure measurements from pressure sensors 638a-638d to determine differences in pressure at the respective pressure sensors. The differences in pressures can be expressed as ratios of the pressures. The differences in pressures can be used to determine concentrations of contaminant and/or working fluid in exhaust line 628 and/or membrane return line 632, based, for example on a model correlating the concentrations with pressure differentials.
While the embodiment shown in
An inlet pressure is obtained at 702a. The inlet pressure can be obtained using a pressure sensor located along an inlet line of a purge system, for example where the purge system receives fluid from an HVACR system, such as any of the intake lines described above and shown in
A return pressure is obtained at 704a. The inlet pressure can be obtained using a pressure sensor located along a return line of a purge system, for example where the purge system returns working fluid to an HVACR system, such as any of the return or combined return lines described above and shown in
An exhaust pressure is obtained at 706a. The exhaust pressure can be obtained using a pressure sensor located along an inlet line of a purge system, for example where the purge system receives fluid from an HVACR system, such as any of the exhaust lines or at any of the discharge or exhaust valves described above and shown in
Pressure relationships for at least two of the inlet, return, and exhaust pressures are determined at 708. The pressure relationships can be determined based on raw values obtained at 702a, 704a, and 706a or temperature-adjusted values where an adjustment was applied at 702c, 704c, and 706c. The differences can be determined by, for example, computing ratios among each of the inlet, return, and exhaust pressures. The pressure relationships can be determined at 708 using a controller.
The pressure relationships determined at 708 are correlated to a purge effectiveness value 710. The purge effectiveness value can be, for example, a purge efficiency or a concentration of contaminants in the exhaust flow. The purge efficiency can be a ratio of the mass of working fluid per mass of non-condensables in an exhaust stream being exhausted by the purge system. The concentration of contaminants can be, for example, a concentration of non-condensable atmospheric gases in the fluid within the exhaust line. The purge effectiveness value can be relative amounts of each of the constituents of the fluid within the purge system, such as a percentage of non-condensables. The correlation at 710 can be based on a multi-dimensional map including points for pressure ratios among the inlet, return, and exhaust pressures that has a purge effectiveness value associated with each point on the map. The multi-dimensional map used at 710 can be particular to a specific HVACR system and a specific purge system included therein. The correlation at 710 can be obtained using a controller, which can be the same controller or a different controller from the one used to determine pressure relationships at 708.
One or more of a return valve or an exhaust valve are controlled based on the purge effectiveness value at 712 (see, e.g. return valves and exhaust valves of
The method 700 can be carried out continuously or can iterate according to, for example, a set sampling schedule such as every minute. The sampling schedule can be selected based on the rate of change of purge effectiveness over time in a given purge system.
It is understood that any of aspects 1-8 can be combined with any of aspects 9-13, 14-20, 21-30, 31-35, or 36-40. It is understood that any of aspects 9-13 can be combined with any of aspects 14-20, 21-30, 31-35, or 36-40. It is understood that any of aspects 14-20 can be combined with any of aspects 21-30, 31-35, or 36-40. It is understood that any of aspects 21-30 can be combined with any of aspects 31-35 or 36-40. It is understood that any of aspects 31-35 can be combined with any of aspects 36-40.
Aspect 1. A purge system for a heating, ventilation, air conditioning, and refrigeration (HVACR) system, comprising:
Aspect 2. The purge system according to aspect 1, wherein the adsorbent material is configured to adsorb the one or more working fluids when the mixture is provided to the separation chamber through the chamber valve.
Aspect 3. The purge system according to any of aspects 1-2, wherein the adsorbent material is configured to release the one or more working fluids when the chamber valve and the exhaust valve are closed, the return line valve is open, and the second pump is in operation.
Aspect 4. The purge system according to any of aspects 1-3, wherein the first pump is between the purge gas inlet and the one or more separation chambers.
Aspect 5. The purge system according to any of aspects 1-4, wherein the first pump is between the one or more separation chambers and the exhaust port.
Aspect 6. The purge system according to any of aspects 1-5, further comprising a plurality of temperature sensors configured to measure temperatures at different points in the separation chamber and a controller configured to determine a temperature difference between temperature measurements from at least two of the plurality of temperature sensors and control the chamber valve, the exhaust valve, and the second pump based on the temperature difference.
Aspect 7. The purge system according to any of aspects 1-6, further comprising a sensor configured to measure a weight of the separation chamber and a controller configured to control the chamber valve, the exhaust valve, and the second pump based on the weight of the separation chamber.
Aspect 8. The purge system according to any of aspects 1-7, further comprising a pressure sensor configured to measure a pressure within the separation chamber, and a controller configured to control the chamber valve, the exhaust valve, and the second pump based on the pressure within the separation chamber.
Aspect 9. A heating, ventilation, air conditioning, and refrigeration (HVACR) system, comprising:
Aspect 10. The HVACR system according to aspect 9, wherein the purge gas inlet is in fluid communication with the condenser.
Aspect 11. The HVACR system according to any of aspects 9-10, wherein the return line is in fluid communication with the evaporator.
Aspect 12. The HVACR system according to any of aspects 9-11, wherein the working fluid circuit circulates the one or more working fluids at pressures less than atmospheric pressure.
Aspect 13. The HVACR system according to any of aspects 9-12, wherein the one or more working fluids are selected from the group consisting of: 1-chloro-3,3,3 trifluoropropene, 1-chloro-3,3,3 trifluoropropene (E), 1-chloro-3,3,3 trifluoropropene (Z), 2-chloro-3,3,3 trifluoropropene, 1,1,dichloro-3,3,3 trifluoropropene, 1,2 dichloro-3,3,3 trifluoropropene (E), 1,2 dichloro-3,3,3 trifluoropropene (Z), 1,3,3,3 tetrafluoropropene (E), 1,3,3,3 tetrafluoropropene (Z), 2,3,3,3, tetrafluoropropene, 1,1,2 trichloro-3,3,3 trifluoropropene, 1,2 dichloroethylene (E), 1,2 dichloroethylene (Z), 1,1 dichloroethylene, 1,1,1,4,4,4 hexafluorobutene (Z), 1,1,1,4,4,4 hexafluorobutene (E), 1,1,3,3 tetrafluoropropane, 1,1,1,2,3 pentafluoropropane, 1,1,2,3,3 pentafluoropropane, 1,1,1,3,3 pentafluoropropane, 1,1,1,2,2 pentafluoropropane, 1,1,1,2,2,3 hexafluoropropane, 1,1,1,2,3,3 hexafluoropropane, 1,1,1,3,3,3 hexafluoropropane, isopentane, pentane, cyclopentane, 1,1 difluoroethane, 1,2-difluoroethane, difluoromethane, 1,1,1,2 tetrafluoroethane, 1,1 difluoroethene, 1,2 difluoroethene (E), 1,2 difluorethene (Z), and 2,2-dichloro-1,1,1-trifluoroethane and combinations thereof.
Aspect 14. A method of purging a heating, ventilation, air conditioning, and refrigeration (HVACR) system, comprising:
Aspect 15. The method according to aspect 14, wherein the one or more working fluids are selected from the group consisting of: 1-chloro-3,3,3 trifluoropropene, 1-chloro-3,3,3 trifluoropropene (E), 1-chloro-3,3,3 trifluoropropene (Z), 2-chloro-3,3,3 trifluoropropene, 1,1,dichloro-3,3,3 trifluoropropene, 1,2 dichloro-3,3,3 trifluoropropene (E), 1,2 dichloro-3,3,3 trifluoropropene (Z), 1,3,3,3 tetrafluoropropene (E), 1,3,3,3 tetrafluoropropene (Z), 2,3,3,3, tetrafluoropropene, 1,1,2 trichloro-3,3,3 trifluoropropene, 1,2 dichloroethylene (E), 1,2 dichloroethylene (Z), 1,1 dichloroethylene, 1,1,1,4,4,4 hexafluorobutene (Z), 1,1,1,4,4,4 hexafluorobutene (E), 1,1,3,3 tetrafluoropropane, 1,1,1,2,3 pentafluoropropane, 1,1,2,3,3 pentafluoropropane, 1,1,1,3,3 pentafluoropropane, 1,1,1,2,2 pentafluoropropane, 1,1,1,2,2,3 hexafluoropropane, 1,1,1,2,3,3 hexafluoropropane, 1,1,1,3,3,3 hexafluoropropane, isopentane, pentane, cyclopentane, 1,1 difluoroethane, 1,2-difluoroethane, difluoromethane, 1,1,1,2 tetrafluoroethane, 1,1 difluoroethene, 1,2 difluoroethene (E), 1,2 difluorethene (Z), and 2,2-dichloro-1,1,1-trifluoroethane and combinations thereof.
Aspect 16. The method according to any of aspects 14-15, wherein a temperature of the mixture is below approximately 100° C. throughout the method and a temperature during the regeneration of the adsorbent is below approximately 100° C. throughout the recovering of the at least some of the one or more working fluids.
Aspect 17. The method according to any of aspects 14-16, further comprising determining a change in temperature between two or more points within the separation chamber and determining when to recover the some of the at least one or more working fluids based on the change in temperature between the two or more points within the separation chamber.
Aspect 18. The method according to any of aspects 14-17, further comprising determining a mass of the separation chamber and determining, based on the mass of the separation chamber, when to recover the some of the at least one or more working fluids based on the change in temperature between the two or more points within the separation chamber.
Aspect 19. The method according to any of aspects 14-18, further comprising measuring a pressure within the separation chamber when recovering the at least some of the at least one or more working fluids, and based on the pressure, ending the recovering of the at least one or more working fluids.
Aspect 20. The method according to any of aspects 14-19, further comprising pressurizing the separation chamber with the mixture using a pump located upstream of the separation chamber.
Aspect 21. A purge system for a heating, ventilation, air conditioning, and refrigeration (HVACR) system, comprising:
Aspect 22. The purge system according to aspect 21, wherein the membrane in each of the one or more separation chambers is configured to reject the one or more non-condensable gases based on the solubility of the one or more non-condensable gases.
Aspect 23. The purge system according to any of aspects 21-22, wherein the membrane in each of the one or more separation chambers is coiled such that it has a cross-section having a spiral shape.
Aspect 24. The purge system according to any of aspects 21-23, wherein the pump is between the purge gas inlet and the one or more separation chambers.
Aspect 25. The purge system according to any of aspects 21-24, wherein the pump is between the one or more separation chambers and the exhaust port, and the purge system further comprises a second pump, the second pump located along the refrigerant return line.
Aspect 26. The purge system according to any of aspects 21-25, further comprising a first pressure sensor between the purge gas inlet and the one or more separation chambers, and a second pressure sensor between the one or more separation chambers and the exhaust port.
Aspect 27. The purge system according to aspect 26, further comprising:
Aspect 28. The purge system according to aspect 27, further comprising a first temperature sensor between the purge gas inlet and the one or more separation chambers, and a second temperature sensor located between the one or more separation chambers and the exhaust port, wherein the controller is further configured to:
Aspect 29. The purge system according to any of aspects 27-28, wherein the pressure relationship is a ratio between the first pressure and the second pressure.
Aspect 30. The purge system according to any of aspects 27-29, wherein determining operation of the discharge valve comprises comparing the pressure relationship to a threshold value.
Aspect 31. A heating, ventilation, air conditioning, and refrigeration (HVACR) system, comprising:
Aspect 32. The HVACR system according to aspect 31, wherein the purge gas inlet is in fluid communication with the condenser.
Aspect 33. The HVACR system according to any of aspects 31-32, wherein the return line is in fluid communication with the evaporator.
Aspect 34. The HVACR system according to any of aspects 31-33, wherein the refrigerant circuit is configured to circulate the one or more refrigerants at pressures less than atmospheric pressure.
Aspect 35. The HVACR system according to any of aspects 31-34, wherein the one or more refrigerants are selected from the group consisting of: 1-chloro-3,3,3 trifluoropropene, 1-chloro-3,3,3 trifluoropropene (E), 1-chloro-3,3,3 trifluoropropene (Z), 2-chloro-3,3,3 trifluoropropene, 1,1,dichloro-3,3,3 trifluoropropene, 1,2 dichloro-3,3,3 trifluoropropene (E), 1,2 dichloro-3,3,3 trifluoropropene (Z), 1,3,3,3 tetrafluoropropene (E), 1,3,3,3 tetrafluoropropene (Z), 2,3,3,3, tetrafluoropropene, 1,1,2 trichloro-3,3,3 trifluoropropene, 1,2 dichloroethylene (E), 1,2 dichloroethylene (Z), 1,1 dichloroethylene, 1,1,1,4,4,4 hexafluorobutene (Z), 1,1,1,4,4,4 hexafluorobutene (E), 1,1,3,3 tetrafluoropropane, 1,1,1,2,3 pentafluoropropane, 1,1,2,3,3 pentafluoropropane, 1,1,1,3,3 pentafluoropropane, 1,1,1,2,2 pentafluoropropane, 1,1,1,2,2,3 hexafluoropropane, 1,1,1,2,3,3 hexafluoropropane, 1,1,1,3,3,3 hexafluoropropane, isopentane, pentane, cyclopentane, 1,1 difluoroethane, 1,2-difluoroethane, difluoromethane, 1,1,1,2 tetrafluoroethane, 1,1 difluoroethene, 1,2 difluoroethene (E), 1,2 difluorethene (Z), and 2,2-dichloro-1,1,1-trifluoroethane and combinations thereof.
Aspect 36. A method of purging a heating, ventilation, air conditioning, and refrigeration (HVACR) system, comprising:
Aspect 37. The method according to aspect 36, wherein the one or more refrigerants are selected from the group consisting of: 1-chloro-3,3,3 trifluoropropene, 1-chloro-3,3,3 trifluoropropene (E), 1-chloro-3,3,3 trifluoropropene (Z), 2-chloro-3,3,3 trifluoropropene, 1,1, dichloro-3,3,3 trifluoropropene, 1,2 dichloro-3,3,3 trifluoropropene (E), 1,2 dichloro-3,3,3 trifluoropropene (Z), 1,3,3,3 tetrafluoropropene (E), 1,3,3,3 tetrafluoropropene (Z), 2,3,3,3, tetrafluoropropene, 1,1,2 trichloro-3,3,3 trifluoropropene, 1,2 dichloroethylene (E), 1,2 dichloroethylene (Z), 1,1 dichloroethylene, 1,1,1,4,4,4 hexafluorobutene (Z), 1,1,1,4,4,4 hexafluorobutene (E), 1,1,3,3 tetrafluoropropane, 1,1,1,2,3 pentafluoropropane, 1,1,2,3,3 pentafluoropropane, 1,1,1,3,3 pentafluoropropane, 1,1,1,2,2 pentafluoropropane, 1,1,1,2,2,3 hexafluoropropane, 1,1,1,2,3,3 hexafluoropropane, 1,1,1,3,3,3 hexafluoropropane, isopentane, pentane, cyclopentane, 1,1 difluoroethane, 1,2-difluoroethane, difluoromethane, 1,1,1,2 tetrafluoroethane, 1,1 difluoroethene, 1,2 difluoroethene (E), 1,2 difluorethene (Z), and 2,2-dichloro-1,1,1-trifluoroethane and combinations thereof.
Aspect 38. The method according to any of aspects 36-37, wherein a temperature of the mixture is below approximately 100° C. throughout the method and a temperature of the one or more refrigerants passed through the membrane is below approximately 100° C. throughout the method.
Aspect 39. The method according to any of aspects 36-38, further comprising determining a first pressure upstream of the separation chamber, determining a second pressure downstream of the separation chamber, and wherein exhausting the mixture comprises opening a valve controlling flow through the exhaust port when a difference between the first pressure and the second pressure exceeds a threshold value.
Aspect 40. The method according to any of aspects 36-39, further comprising pressurizing the separation chamber with the mixture using a pump located upstream of the separation chamber.
The examples disclosed in this application are to be considered in all respects as illustrative and not limitative. The scope of the invention is indicated by the appended claims rather than by the foregoing description; and all changes which come within the meaning and range of equivalency of the claims are intended to be embraced therein.
Number | Date | Country | |
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63018269 | Apr 2020 | US | |
63018274 | Apr 2020 | US |